CN115677229A - Frosting etching composition and preparation method and application thereof - Google Patents
Frosting etching composition and preparation method and application thereof Download PDFInfo
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- CN115677229A CN115677229A CN202211378852.5A CN202211378852A CN115677229A CN 115677229 A CN115677229 A CN 115677229A CN 202211378852 A CN202211378852 A CN 202211378852A CN 115677229 A CN115677229 A CN 115677229A
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- 239000000203 mixture Substances 0.000 title claims abstract description 106
- 238000005530 etching Methods 0.000 title claims abstract description 91
- 238000002360 preparation method Methods 0.000 title description 12
- 239000011521 glass Substances 0.000 claims abstract description 101
- 239000002253 acid Substances 0.000 claims abstract description 29
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims abstract description 20
- 150000007524 organic acids Chemical class 0.000 claims abstract description 19
- 150000004673 fluoride salts Chemical class 0.000 claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 claims abstract description 17
- 239000002270 dispersing agent Substances 0.000 claims abstract description 16
- 239000000375 suspending agent Substances 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229940104869 fluorosilicate Drugs 0.000 claims abstract description 12
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 57
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims description 38
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 36
- -1 ammonium fluorosilicate Chemical compound 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 25
- 229910000343 potassium bisulfate Inorganic materials 0.000 claims description 20
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 claims description 20
- 229910000342 sodium bisulfate Inorganic materials 0.000 claims description 20
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 19
- DLHONNLASJQAHX-UHFFFAOYSA-N aluminum;potassium;oxygen(2-);silicon(4+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Si+4].[Si+4].[Si+4].[K+] DLHONNLASJQAHX-UHFFFAOYSA-N 0.000 claims description 19
- JTNCEQNHURODLX-UHFFFAOYSA-N 2-phenylethanimidamide Chemical compound NC(=N)CC1=CC=CC=C1 JTNCEQNHURODLX-UHFFFAOYSA-N 0.000 claims description 18
- 235000013024 sodium fluoride Nutrition 0.000 claims description 18
- 239000011775 sodium fluoride Substances 0.000 claims description 18
- 238000002156 mixing Methods 0.000 claims description 14
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims description 8
- 238000003756 stirring Methods 0.000 claims description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 7
- 150000003839 salts Chemical class 0.000 claims description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052708 sodium Inorganic materials 0.000 claims description 6
- 239000011734 sodium Substances 0.000 claims description 6
- BIGPRXCJEDHCLP-UHFFFAOYSA-N ammonium bisulfate Chemical compound [NH4+].OS([O-])(=O)=O BIGPRXCJEDHCLP-UHFFFAOYSA-N 0.000 claims description 5
- 238000004806 packaging method and process Methods 0.000 claims description 4
- 235000003270 potassium fluoride Nutrition 0.000 claims description 4
- 239000011698 potassium fluoride Substances 0.000 claims description 4
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 3
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 3
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 claims description 3
- 229910001950 potassium oxide Inorganic materials 0.000 claims description 3
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 claims description 3
- 229910052939 potassium sulfate Inorganic materials 0.000 claims description 3
- 235000011151 potassium sulphates Nutrition 0.000 claims description 3
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 claims description 3
- 235000011152 sodium sulphate Nutrition 0.000 claims description 3
- BFXAWOHHDUIALU-UHFFFAOYSA-M sodium;hydron;difluoride Chemical compound F.[F-].[Na+] BFXAWOHHDUIALU-UHFFFAOYSA-M 0.000 claims description 3
- 238000002834 transmittance Methods 0.000 abstract description 18
- 230000000007 visual effect Effects 0.000 abstract description 5
- 230000000694 effects Effects 0.000 description 16
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 14
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 14
- 238000005498 polishing Methods 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 239000000047 product Substances 0.000 description 9
- 239000002245 particle Substances 0.000 description 8
- 238000005303 weighing Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 230000032683 aging Effects 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- 150000007522 mineralic acids Chemical class 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 230000002378 acidificating effect Effects 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 239000012670 alkaline solution Substances 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000005034 decoration Methods 0.000 description 2
- 230000002431 foraging effect Effects 0.000 description 2
- 230000036541 health Effects 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000012216 screening Methods 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- OWEGMIWEEQEYGQ-UHFFFAOYSA-N 100676-05-9 Natural products OC1C(O)C(O)C(CO)OC1OCC1C(O)C(O)C(O)C(OC2C(OC(O)C(O)C2O)CO)O1 OWEGMIWEEQEYGQ-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- GUBGYTABKSRVRQ-PICCSMPSSA-N Maltose Natural products O[C@@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@@H]1O[C@@H]1[C@@H](CO)OC(O)[C@H](O)[C@H]1O GUBGYTABKSRVRQ-PICCSMPSSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- GUBGYTABKSRVRQ-QUYVBRFLSA-N beta-maltose Chemical compound OC[C@H]1O[C@H](O[C@H]2[C@H](O)[C@@H](O)[C@H](O)O[C@@H]2CO)[C@H](O)[C@@H](O)[C@@H]1O GUBGYTABKSRVRQ-QUYVBRFLSA-N 0.000 description 1
- 235000013361 beverage Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000003426 chemical strengthening reaction Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
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Images
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- Surface Treatment Of Glass (AREA)
Abstract
The application relates to a frosting etching composition which comprises the following components in percentage by weight: 15-40% of acid sulfate, 1-10% of organic acid, 0.5-6% of dispersant, 25-50% of fluoride salt, 1-8% of fluorosilicate, 2-8% of suspending agent and 15-35% of water. The frosted etching composition can be used for manufacturing anti-dazzle glass, and after the glass is frosted by the frosted etching composition, spherical pit grains can be formed on the glass microcosmically, so that the glass has frosted visual effect and touch but is not too rough, has the performance advantages of fingerprint resistance, anti-dazzle and the like, and can keep the high transmittance of the original glass.
Description
Technical Field
The application relates to the technical field of glass surface processing, in particular to a frosting etching composition and a preparation method and application thereof.
Background
Frosting is a method for chemically etching glass, and frosting processing is carried out on the glass, so that the glass can generate hazy artistic aesthetic feeling, is widely used in various fields such as the field of packaging glass, the field of artware, the field of electronic products and the like, and is deeply loved by people. Furthermore, the Glass is subjected to steps of water washing, acid washing, frosting etching, polishing and the like to form Anti-dazzle Glass (AG Glass), and the Anti-dazzle Glass has the advantages of reducing the interference of ambient light, improving the visual angle and brightness of a display picture, reducing screen reflection, enabling an image to be clearer, being more bright in color, being more saturated in color and the like, and has a very wide application prospect in the field of electronic products.
In the frosting etching step, the frosting etching solution formula plays a crucial role in the frosting effect, and the problems of overlarge roughness, low transmittance and the like often occur in the formula of the traditional frosting etching solution, so that the decorative effect of the glass is influenced.
Disclosure of Invention
Accordingly, there is a need for a frosting etching composition, a method for preparing the same, and applications thereof, which can reduce roughness and improve transmittance.
The application provides a frosting etching composition which comprises the following components in percentage by weight:
in one embodiment, the paint comprises the following components in percentage by weight:
in one embodiment, the components of the frosting etching composition satisfy at least one of the following conditions:
the acid sulfate comprises one or more of sodium bisulfate, potassium bisulfate and ammonium bisulfate;
the organic acid comprises one or more of citric acid and oxalic acid;
the dispersant comprises one or more of potassium feldspar, potassium oxide, aluminum oxide and silicon dioxide;
the fluoride salt comprises one or more of ammonium bifluoride, sodium bifluoride, potassium bifluoride, ammonium fluoride, sodium fluoride and potassium fluoride;
the fluorosilicate comprises one or more of ammonium fluorosilicate, sodium fluorosilicate and potassium fluorosilicate;
the suspending agent comprises one or more of barium sulfate, potassium sulfate, sodium sulfate and ammonium sulfate.
In one embodiment, the components of the frosting etching composition satisfy at least one of the following conditions:
the acid sulfate comprises one or more of sodium bisulfate and potassium bisulfate;
the organic acid comprises citric acid;
the dispersant comprises potassium feldspar;
the fluoride salt comprises one or more of ammonium bifluoride and sodium fluoride;
the fluorosilicate comprises one or more of ammonium fluorosilicate and sodium fluorosilicate;
the suspending agent comprises barium sulfate.
In one embodiment, the components of the frosting etching composition, the acid sulfate includes sodium bisulfate and potassium bisulfate, the organic acid includes citric acid, the dispersant includes potassium feldspar, the fluoride salts include ammonium bifluoride and sodium fluoride, the fluorosilicate salts include ammonium fluorosilicate and sodium fluorosilicate, and the suspending agent includes barium sulfate;
the frosting etching composition comprises the following components in percentage by weight:
an embodiment of the present application further provides a method for preparing a frosting etching composition as described in any one of the above embodiments, which is characterized by comprising the following steps:
mixing the acid sulfate, the organic acid, and the dispersant to form a first mixture;
mixing the fluoride salt, the fluorosilicate salt, and the suspending agent to form a second mixture;
mixing the first mixture and the second mixture with the water, and curing.
In one embodiment, the conditions for aging satisfy at least one of the following conditions:
the curing temperature is 55 +/-8 ℃;
the curing time is 24 to 96 hours;
the stirring condition for curing is 2 to 4 minutes per hour.
An embodiment of the present application further provides a method for manufacturing an anti-glare glass, including the following steps:
and (3) carrying out frosting treatment on the glass by adopting a frosting etching composition, wherein the frosting etching composition is the frosting etching composition in any embodiment.
An embodiment of the application also provides anti-dazzle glass which is manufactured by the manufacturing method of the anti-dazzle glass in the embodiment.
An embodiment of the present application further provides an application of the anti-glare glass in the manufacturing of packaging products, artware or electronic products.
The frosted etching composition provided by the embodiment can be used for manufacturing anti-dazzle glass, and after the glass is frosted by the frosted etching composition, spherical pit grains can be formed on the microcosmic surface of the glass, so that the glass has frosted visual effect and touch but is not too rough, has the performance advantages of fingerprint resistance, anti-dazzle and the like, and can keep the high transmittance of the original glass.
Drawings
Fig. 1 is an SEM micrograph of the antiglare glass produced in example 1.
Fig. 2 is a microscopic topography view of the antiglare glass produced in example 1 under a laser microscope.
Detailed Description
To facilitate an understanding of the present application, the present application will now be described more fully with reference to the accompanying drawings. Preferred embodiments of the present application are shown in the drawings. This application may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically defined otherwise.
In the present application, the technical features described in the open manner include a closed technical solution including the listed features, and also include an open technical solution including the listed features.
The inventor researches and discovers that when the anti-dazzle glass is manufactured, a frosting etching process is a key for determining the quality of the anti-dazzle glass, if the frosting etching degree is too deep, the haze and the roughness of the glass are too large, the transmittance is too low, if the frosting etching degree is too shallow, the haze and the roughness of the glass are too small, the transmittance is too high, and for the anti-dazzle glass, the transmittance, the haze and the roughness need to be controlled within a proper range so that a product can be comfortable to use in a specific application scene. The key to controlling the effect of the frosting etching process is the frosting etching composition. The anti-dazzle glass obtained by frosting glass by adopting the traditional frosting etching composition has overlarge roughness, obvious rough feeling, poor hand feeling, overlarge haze and overlow transmittance, and further decoration and use are influenced.
Further, the inventor of the present invention has found that, in a conventional formula of a frosting etching composition, inorganic acids such as nitric acid, hydrochloric acid, sulfuric acid and hydrofluoric acid are generally contained, and have the disadvantages of being easy to corrode, easy to volatilize, irritating, not easy to store and transport, and not friendly to the environment and human body, on the other hand, the conventional formula of a frosting etching composition may also contain raw materials such as sucrose and maltose, which are easily oxidized and denatured in a strong acid environment such as nitric acid, so that the dispersion effect of the frosting etching composition is poor, and the frosting effect is affected.
To this end, an embodiment of the present application provides a frosting etching composition, which comprises the following components by weight percent:
the frosting etching composition provided in the above embodiment can provide glass with appropriate transmittance, haze and roughness after frosting treatment of glass, and has comfortable use effect and is beneficial for further decoration.
Further, the frosting etching composition provided in the above embodiment adopts the organic acid and the acid sulfate to compound and provide sufficient hydrogen ions, and then combines with the fluoride salt to form the effective component for frosting etching, so that the frosting effect can be greatly improved. In the frosting etching composition provided in the above embodiment, a compound manner of organic acid and acid sulfate is adopted to replace inorganic acid such as nitric acid, sulfuric acid, hydrochloric acid, hydrofluoric acid and the like in the traditional formula, and the defects that the traditional frosting etching composition has the characteristics of easy corrosion, easy volatility, pungent smell, difficult storage and transportation, environmental and human body friendliness and the like are overcome.
In one embodiment, the composition comprises the following components in percentage by weight:
in one embodiment, the acid sulfate may include, for example, but is not limited to, one or more of sodium bisulfate, potassium bisulfate, and ammonium bisulfate. Further, the acid sulfate includes one or more of sodium hydrogen sulfate and potassium hydrogen sulfate. Further, the acid sulfate includes sodium hydrogen sulfate and potassium hydrogen sulfate.
In one embodiment, the organic acid may include, for example, but is not limited to, one or more of citric acid and oxalic acid. Further, the organic acid includes citric acid.
In one embodiment, for example, but not limited to, the dispersant may include one or more of potassium feldspar, potassium oxide, aluminum oxide, and silicon dioxide. Further, the dispersant comprises potassium feldspar.
It is understood that the fluorinated salt referred to in the present application means an inorganic fluorine-containing compound which can be obtained by using HF and an alkaline solution as raw materials. In one embodiment, for example, but not limited to, fluoride salts may include one or more of ammonium bifluoride, sodium bifluoride, potassium bifluoride, ammonium fluoride, sodium fluoride, and potassium fluoride. Further, the fluoride salt includes one or more of ammonium bifluoride and sodium fluoride. Further, fluoride salts include ammonium bifluoride and sodium fluoride.
It is understood that reference to fluorosilicates in this application means that H can be utilized 2 SiF 6 And alkaline solution as raw material. In one embodiment, for example, without limitation, fluorosilicates may include one or more of ammonium fluorosilicate, sodium fluorosilicate, and potassium fluorosilicate. Further, the fluorosilicate includes one or more of ammonium fluorosilicate and sodium fluorosilicate. Further, fluorosilicates include ammonium fluorosilicate and sodium fluorosilicate.
In one embodiment, for example, but not limited to, suspending agents may include one or more of barium sulfate, potassium sulfate, sodium sulfate, and ammonium sulfate. Further, the suspending agent comprises barium sulfate.
In one embodiment, the components of the frosting etching composition, the acid sulfate includes sodium bisulfate and potassium bisulfate, the organic acid includes citric acid, the dispersant includes potassium feldspar, the fluoride salt includes ammonium bifluoride and sodium fluoride, the fluorosilicate salt includes ammonium fluorosilicate and sodium fluorosilicate, and the suspending agent includes barium sulfate;
the frosting etching composition comprises the following components in percentage by weight:
the frosting etching composition in any embodiment adopts a compounding mode of acid sulfate and organic acid to provide hydrogen ions for the formula, and can be combined with fluoride in the formula to form corrosive acid components such as hydrofluoric acid, sulfuric acid and the like, the corrosive acid components can corrode glass and damage the structure of the glass, so that some binding sites are exposed out of the glass, fluosilicate in the frosting etching composition can be crystallized to form frosting particles to be combined with the exposed binding sites on the glass, and the frosting particles are attached to the surface of the glass to form a frosting surface, so that the specific frosting etching appearance effect is achieved.
Furthermore, the frosting etching composition in any embodiment does not directly use corrosive acid components such as hydrofluoric acid and sulfuric acid, and overcomes the defects that the traditional frosting etching composition has the characteristics of easy corrosion, easy volatility, pungent smell, difficult storage and transportation, and no environment and human body friendliness.
Further, the acid sulfate and the organic acid in the frosting etching composition of any of the above embodiments can be used as a hydrogen ion buffer to stabilize the corrosive acid component in the composition and prolong the service life of the frosting etching composition.
Furthermore, the frosting etching composition in any of the above embodiments is a supersaturated solution, and a dispersant and a suspending agent are adopted for matching, so that the stability of the composition solution can be maintained, direct crystallization and sedimentation can be avoided, and the frosting effect is more uniform. Furthermore, the dispersing agent can be rapidly dispersed in the composition system to play a role in thickening, and can control and disperse crystal nuclei formed by the fluosilicate of the frosted particles, prevent the crystal nuclei from excessively growing, maintain a certain viscosity of the solution, prevent the sedimentation speed of crystals and components in the composition from excessively high, and ensure that the stability of the composition can meet the requirement of uniformly frosting and etching glass. Furthermore, the suspending agent can suspend undissolved powder particles in the frosting etching composition and tiny crystals in the solution, so as to prevent the powder particles from rapidly settling to form large particles to affect the frosting effect.
Further, the frosting etching composition in any of the above embodiments, based on the specific components and the specific weight percentage composition, can control the range and shape of the defect site and the binding site on the glass surface, the size of the frosting particles and the reaction concentration of the composition, and further can realize the control of the size and arrangement of the microparticles on the frosting surface, and further can influence the crystal form effect of the frosting particles in the glass frosting surface, thereby realizing the specific etching appearance of the glass.
Further, any of the above-mentioned frosting etching compositions need to be mixed together when in use, and the components of the frosting etching composition can be stored separately or in a manner of mixing some of them when not in use during the daily storage process, as long as it is ensured that the components do not react with each other during the daily storage process to volatilize the frosting effect of the composition. In one embodiment, the acid sulfate, the organic acid and the dispersant can be mixed to form a first mixture and then stored together, the fluoride salt, the fluorosilicate and the suspending agent can be mixed to form a second mixture and then stored together, transportation, storage and use are facilitated, the fluoride salt, the acid sulfate and the organic acid are stored separately, and potential safety hazards caused by corrosive acid components in the daily storage process can be avoided.
An embodiment of the present application further provides a method for preparing a frosting etching composition as in any of the above embodiments, comprising the following steps:
mixing the above components, and aging.
In one embodiment, a method of making a frosted etching composition comprises the steps of:
mixing an acid sulfate, an organic acid, and a dispersant to form a first mixture;
mixing a fluoride salt, a fluorosilicate salt, and a suspending agent to form a second mixture;
mixing the first mixture and the second mixture with water, and aging.
In one embodiment, the temperature of maturation is 55 ℃. + -. 8 ℃. It is understood that the temperature of the aging may be, but not limited to, 47 ℃, 48 ℃, 49 ℃, 50 ℃, 51 ℃, 52 ℃, 53 ℃, 54 ℃, 55 ℃, 56 ℃, 57 ℃, 58 ℃, 59 ℃, 60 ℃, 61 ℃, 62 ℃, 63 ℃ and the like.
In one embodiment, the aging time is 24 hours to 96 hours. It is understood that the time of aging may be, for example, but not limited to, 24 hours, 30 hours, 36 hours, 40 hours, 44 hours, 50 hours, 53 hours, 58 hours, 63 hours, 68 hours, 70 hours, 75 hours, 79 hours, 82 hours, 84 hours, 90 hours, 94 hours, 96 hours, and the like.
In one embodiment, the aging is performed under stirring conditions of 2 to 4 minutes per hour. It is to be understood that the stirring conditions for aging are, for example, but not limited to, 2 minutes per hour of stirring, 3 minutes per hour of stirring, 4 minutes per hour of stirring, and the like.
An embodiment of the present application further provides a method for manufacturing an anti-glare glass, including the following steps:
the glass is subjected to a frosting treatment using a frosting etching composition, which is the frosting etching composition of any of the above embodiments.
In one embodiment, the step of frosting the glass with the frosting etch composition comprises:
the glass is put into a frosting machine and is subjected to spraying type frosting treatment by using a frosting etching composition.
It will be appreciated that the glass has a first surface and a second surface and that either only one or both surfaces of the glass may be frosted, typically only one surface of the glass. In one embodiment, the first surface of the glass is frosted, the second surface of the glass is not frosted, and the following pretreatment steps can be included before the frosting treatment of the first surface of the glass:
firstly, silk-screening protective oil on the second surface of the glass; the first surface of the glass is then cleaned.
It will be appreciated that cleaning includes water washing, acid washing, etc., by which the glass surface is degreased and dusted.
In one embodiment, in the step of manufacturing the anti-glare glass, after the glass is subjected to frosting treatment, the processing steps of polishing, cleaning, deoiling, tempering and the like can be further performed on the glass.
Further, the step of polishing the glass comprises:
and cleaning the glass after the frosting treatment, and then putting the glass into an acidic polishing solution for polishing treatment.
Furthermore, the time of the polishing treatment is 9-30 minutes. It is to be understood that the polishing process may be, for example, but not limited to, 9 minutes, 15 minutes, 18 minutes, 22 minutes, 25 minutes, 30 minutes, and the like.
Further, the main component of the acidic polishing solution may include, but is not limited to, sulfuric acid, hydrofluoric acid, and the like, for example.
The frosting treatment and the polishing treatment are two independent process procedures in the manufacturing process of the anti-dazzle glass, and in the frosting treatment process, if inorganic acids such as sulfuric acid and hydrofluoric acid are used as main components in the frosting etching composition, the inorganic acids can cause great harm to human health and environmental protection due to the large using amount of the frosting etching composition; in the chemical polishing process, chemical polishing can be completed only by adopting a small amount of acidic polishing solution, so that even if inorganic acid such as sulfuric acid, hydrofluoric acid and the like is used as the main component of the acidic polishing solution, the influence on human health and environmental protection is very small due to the small amount of the inorganic acid.
It is understood that the machining process in any of the above embodiments may further include a conventional CNC machining and a cleaning and drying process, which may be added or deleted according to actual situations, and is within the protection scope of the present application.
The anti-dazzle glass prepared by the frosting etching composition provided by any one of the embodiments can form spherical pit lines on the microcosmic surface of the glass after frosting treatment, can enable the glass to have frosted visual effect and touch but not too rough, has the performance advantages of fingerprint resistance, anti-dazzle and the like, and can keep the high transmittance of the original glass. In any of the above embodiments, the frosting etching composition is used to perform frosting treatment on the glass, so that continuous large-scale frosting can be realized, the frosting effect is uniform, the effect of further chemical strengthening of the glass is not affected, and the final product can still maintain high surface strength.
An embodiment of the present application also provides an antiglare glass produced by the method for producing an antiglare glass according to any one of the embodiments.
In one embodiment, the microstructure of the frosted surface of the antiglare glass is spherical.
In one embodiment, the antiglare glass has a roughness of 0.5 μm to 0.8 μm.
In one embodiment, the haze of the antiglare glass is from 65% to 80%.
In one embodiment, the transmittance of the antiglare glass is from 85% to 90%.
An embodiment of the present application further provides a use of the frosted etching composition according to any of the above embodiments or the anti-glare glass according to any of the above embodiments in the manufacture of a packaging product, an art craft or an electronic product. It is understood that the packaged product may include, but is not limited to, beverage bottles, wine bottles, packing cases, and the like, the craft may include, but is not limited to, vases, ornaments, candlesticks, lights, and the like, and the electronic product may include, but is not limited to, displays, cell phone covers, and the like. Further, the above-mentioned frosted etching composition or the above-mentioned antiglare glass is used for manufacturing a cover sheet of a cellular phone, and it is understood that the cover sheet of a cellular phone may include, for example, a front cover sheet and a back cover sheet.
The frosting etching composition of the present application, the preparation method thereof, and the use thereof will be described in further detail by specific examples and comparative examples. The following embodiments are more specific, and it is to be understood that other embodiments are not limited thereto. In the following specific examples, all starting materials are commercially available unless otherwise specified.
Example 1
The method comprises the following steps: preparation of frosting etching composition
(1) Weighing the following components in percentage by weight:
18% of sodium bisulfate, 6% of potassium bisulfate, 5% of citric acid and 3% of potassium feldspar;
27% of ammonium bifluoride, 5% of sodium fluoride, 3% of ammonium fluosilicate, 2% of sodium fluosilicate and 5% of barium sulfate; and
26% of water.
(2) Mixing the sodium bisulfate, the potassium bisulfate, the citric acid and the potassium feldspar weighed in the step (1) to form a first mixture; mixing the ammonium bifluoride, the sodium fluoride, the ammonium fluorosilicate, the sodium fluorosilicate and the barium sulfate weighed in the step (1) to form a second mixture; and (3) mixing the first mixture, the second mixture and the water weighed in the step (1) to form a mixed solution.
(3) And (3) heating the mixed solution formed in the step (2) to 55 ℃, and then carrying out sealed curing, wherein the curing condition is set to be automatic stirring for 3 minutes per hour, and the curing time is 24 hours.
Step two: production of anti-dazzle glass
(1) Preparing a cut glass, and silk-screening protective oil on one surface of the glass which does not need frosting treatment.
(2) Cleaning the other surface of the glass to be subjected to frosting treatment, putting the glass into a frosting machine, enabling the surface to be subjected to frosting treatment to face upwards, and spraying and frosting the glass by using the frosting etching composition prepared in the step one.
(3) And (3) putting the glass subjected to the frosting treatment in the step (2) into an acid polishing solution for polishing for 30 minutes, and then sequentially carrying out cleaning, deoiling and toughening treatment.
Example 2
Substantially the same as in example 1, except that:
the method comprises the following steps: preparation of frosting etching composition
(1) Weighing the following components in percentage by weight:
23% of sodium bisulfate, 5% of potassium bisulfate, 4% of citric acid and 3% of potassium feldspar;
25% of ammonium bifluoride, 4% of sodium fluoride, 3% of ammonium fluosilicate, 2% of sodium fluosilicate and 5% of barium sulfate; and
water: 26 percent.
Example 3
Substantially the same as in example 1, except that:
the method comprises the following steps: preparation of frosting etching composition
(1) Weighing the following components in percentage by weight:
18% of sodium bisulfate, 6% of potassium bisulfate, 5% of citric acid and 3% of potassium feldspar;
35% of ammonium bifluoride, 2% of sodium fluoride, 2% of ammonium fluorosilicate, 2% of sodium fluorosilicate and 4% of barium sulfate; and
water: 23 percent.
Example 4
Substantially the same as in example 1, except that:
the method comprises the following steps: preparation of frosting etching composition
(1) Weighing the following components in percentage by weight:
18% of sodium bisulfate, 6% of potassium bisulfate, 3% of citric acid and 3% of potassium feldspar;
25% of ammonium bifluoride, 10% of sodium fluoride, 3% of ammonium fluosilicate, 2% of sodium fluosilicate and 5% of barium sulfate; and
water: 25 percent.
Example 5
Substantially the same as in example 1, except that:
the method comprises the following steps: preparation of a frosting etching composition
(1) Weighing the following components in percentage by weight:
25% of sodium bisulfate, 5% of potassium bisulfate, 6% of citric acid and 3% of potassium feldspar;
29% of ammonium bifluoride, 2% of sodium fluoride, 2% of ammonium fluosilicate, 2% of sodium fluosilicate and 4% of barium sulfate; and
water: 22 percent.
Example 6
Substantially the same as in example 1, except that:
the method comprises the following steps: preparation of a frosting etching composition
(1) Weighing the following components in percentage by weight:
10% of sodium bisulfate, 3% of potassium bisulfate, 3% of ammonium bisulfate, 8% of citric acid and 3% of potassium feldspar;
26% of ammonium bifluoride, 12% of sodium fluoride, 3% of ammonium fluosilicate, 3% of potassium fluosilicate and 4% of barium sulfate; and
water: 25 percent.
Example 7
Substantially the same as in example 1, except that:
the method comprises the following steps: preparation of frosting etching composition
(1) Weighing the following components in percentage by weight:
22% of sodium bisulfate, 8% of potassium bisulfate, 6% of ammonium bisulfate, 1.5% of citric acid and 2.5% of potassium feldspar;
22% of ammonium bifluoride, 5% of potassium fluoride, 2% of ammonium fluorosilicate, 2% of potassium fluorosilicate and 3% of barium sulfate; and
water: 26 percent.
Comparative example 1
Substantially the same as in example 1, except that: the frosting etching composition prepared in the first step does not contain potassium feldspar.
Comparative example 2
Substantially the same as in example 1, except that: the frosting etching composition prepared in the first step does not contain barium sulfate.
Comparative example 3
Substantially the same as in example 1, except that: the frosting etching composition prepared in the first step does not contain sodium bisulfate and potassium bisulfate.
Comparative example 4
Substantially the same as in example 1, except that: the frosting etching composition prepared in the first step does not contain citric acid.
Comparative example 5
Substantially the same as in example 1, except that:
the method comprises the following steps: preparation of frosting etching composition
(1) Weighing the following components in percentage by weight:
36% of sodium bisulfate, 12% of potassium bisulfate, 3.4% of citric acid and 2% of potassium feldspar;
18.5% of ammonium bifluoride, 3.4% of sodium fluoride, 2.1% of ammonium fluosilicate, 1.4% of sodium fluosilicate and 3.4% of barium sulfate; and
water: 17.8 percent.
As shown in fig. 1, the antiglare glass produced in example 1 was SEM-scanned, and the spherical shape thereof was seen from the SEM micrograph.
As shown in fig. 2, when the antiglare glass produced in example 1 was observed under a laser microscope, the spherical pit patterns were observed from a microscopic topography under the laser microscope.
The anti-glare glasses prepared in examples 1 to 7 and comparative examples 1 to 5 were subjected to haze, transmittance, and roughness tests, and the test results are shown in table 1 below.
The haze is a ratio of a scattered light flux and a transmitted light flux which are transmitted through the glass sample and deviated from the incident light direction, and the haze is calculated from the amount of scattered light energy measured in accordance with standard GB/T2410-2008 at an angle of 2.5 ° or more from the incident light direction.
The transmittance is a ratio of the light flux transmitted through the glass sample to the light flux incident on the sample, and is measured according to the standard GB/T2410-2008.
The roughness is measured by a stylus method according to GB/T3505-2009 to obtain the arithmetic mean deviation Ra of the profile.
TABLE 1. Results of transmittance, haze and roughness test of anti-glare glass
| Transmittance (%) | Haze (%) | Roughness (μm) | |
| Example 1 | 89 | 68 | 0.65 |
| Example 2 | 87 | 70 | 0.69 |
| Example 3 | 86 | 73 | 0.71 |
| Example 4 | 88 | 70 | 0.68 |
| Example 5 | 89 | 72 | 0.70 |
| Example 6 | 86 | 74 | 0.73 |
| Example 7 | 85 | 72 | 0.72 |
| Comparative example 1 | 75 | 88 | 0.89 |
| Comparative example 2 | 72 | 91 | 0.95 |
| Comparative example 3 | 92 | 56 | 0.47 |
| Comparative example 4 | 81 | 76 | 0.92 |
| Comparative example 5 | 87 | 62 | 0.45 |
As can be seen from table 1, the transmittance of the anti-glare glasses manufactured in examples 1 to 7 is controlled to be within 85% to 90%, the haze is controlled to be within 65% to 80%, and the roughness is controlled to be within 0.5 μm to 0.8 μm, so that the anti-glare glasses have certain frosted visual effect and touch but are not too coarse, and simultaneously, the high transmittance of the original glass can be maintained, and the frosting effect is good.
The antiglare glasses produced in comparative examples 1, 2 and 4 were too rough and had too low transmittance. The anti-glare glasses manufactured in comparative examples 3 and 5 had too low roughness and poor frosting effect.
All possible combinations of the technical features of the above embodiments may not be described for the sake of brevity, but should be considered as within the scope of the present disclosure as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. The frosting etching composition is characterized by comprising the following components in percentage by weight:
2. the frosting etching composition according to claim 1, comprising the following components in percentage by weight:
3. the frosting etching composition according to any of claims 1 to 2, wherein the components of the frosting etching composition satisfy at least one of the following conditions:
the acid sulfate comprises one or more of sodium bisulfate, potassium bisulfate and ammonium bisulfate;
the organic acid comprises one or more of citric acid and oxalic acid;
the dispersant comprises one or more of potassium feldspar, potassium oxide, aluminum oxide and silicon dioxide;
the fluoride salt comprises one or more of ammonium bifluoride, sodium bifluoride, potassium bifluoride, ammonium fluoride, sodium fluoride and potassium fluoride;
the fluorosilicate comprises one or more of ammonium fluorosilicate, sodium fluorosilicate and potassium fluorosilicate;
the suspending agent comprises one or more of barium sulfate, potassium sulfate, sodium sulfate and ammonium sulfate.
4. The frosting etching composition according to any one of claims 1 to 2, wherein each component of the frosting etching composition satisfies at least one of the following conditions:
the acid sulfate comprises one or more of sodium bisulfate and potassium bisulfate;
the organic acid comprises citric acid;
the dispersant comprises potassium feldspar;
the fluoride salt comprises one or more of ammonium bifluoride and sodium fluoride;
the fluosilicate comprises one or more of ammonium fluosilicate and sodium fluosilicate;
the suspending agent comprises barium sulfate.
5. The frosting etching composition of claim 4, wherein in the components of the frosting etching composition, the acid sulfate comprises sodium bisulfate and potassium bisulfate, the organic acid comprises citric acid, the dispersant comprises potassium feldspar, the fluoride salts comprise ammonium bifluoride and sodium fluoride, the fluorosilicate salts comprise ammonium fluorosilicate and sodium fluorosilicate, and the suspending agent comprises barium sulfate;
the frosting etching composition comprises the following components in percentage by weight:
6. a process for preparing a frosting etching composition according to any of claims 1 to 5, comprising the steps of:
mixing the acid sulfate, the organic acid, and the dispersant to form a first mixture;
mixing the fluoride salt, the fluorosilicate salt, and the suspending agent to form a second mixture;
mixing the first mixture and the second mixture with the water, and curing.
7. The method of claim 6, wherein the curing condition is at least one of the following conditions:
the curing temperature is 55 +/-8 ℃;
the curing time is 24 to 96 hours;
the stirring condition for curing is 2 to 4 minutes per hour.
8. The method for manufacturing the anti-dazzle glass is characterized by comprising the following steps of:
the glass is subjected to a frosting treatment using a frosting etching composition, which is the frosting etching composition according to any one of claims 1 to 5.
9. An antiglare glass produced by the method for producing an antiglare glass according to claim 8.
10. Use of the antiglare glass of claim 9 in the manufacture of packaging, artware or electronic products.
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