CN103626400A - Production method for glass surface without glare and with low reflection - Google Patents
Production method for glass surface without glare and with low reflection Download PDFInfo
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- CN103626400A CN103626400A CN201210311758.8A CN201210311758A CN103626400A CN 103626400 A CN103626400 A CN 103626400A CN 201210311758 A CN201210311758 A CN 201210311758A CN 103626400 A CN103626400 A CN 103626400A
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Abstract
The invention discloses a production method for a glass surface without glare and with low reflection. The production method comprises: a glass substrate containing at least one surface to be processed is provided, a first etching solution is provided, and the first solution is formed through mixing of 10%-35% of water-soluble inorganic salts, 5%-60% of acid solution, 0.5%-5% of dispersants, 1%-10% of stabilizing agents, deionized water and the like; the first etching solution is applied on the surface to be processed of the glass substrate, a plurality of fine recessions are formed on the surface, the surface is roughened and the reflection of light is reduced; a second etching solution is provided, and the second etching solution is formed through mixing of hydrofluoric acid, inorganic acid, modifiers, deionized water and the like, the second etching solution is applied on the surface to be processed after the first etching production, the shapes of the fine recessions on the surface to be processed are subjected to passivation, the difference of depths of the recessions is lowered, the roughness of the surface to be processed is homogenized and the glossiness of the surface is raised, and therefore the light transmission of the glass surface is raised greatly, and a glass surface without glare and with low reflection and high light transmittance is formed.
Description
Technical field
The present invention relates to a kind of method of optimizing glass surface, espespecially a kind ofly can be applicable to various indicating meter, touch on the glass substrate and various glass material goods that blank panel uses, utilize Wet-type etching means on glass substrate, to form the method for the low reflecting surface of free from glare.
Background technology
Along with epoch and scientific and technological progress, video display has been widely used on various electronic products now, and industry is all made great efforts the quality that can present in promoting indicating meter at present, to allow user can have better visual effect and enjoyment; As known, adopt the glass substrate of free from glare and low reflection can make the light of the standby preferably vision quality of displaying appliance, reduction external environment disturb, improve the visible angle of display frame simultaneously and reduce screen reflecting, allowing display image screen is more clear, color is more saturated.
The current mode that produces of the glass substrate of free from glare and low reflection, be mostly use different refractivity resin stacked film mode or utilize physical impacts mode to carry out processing treatment, to form the characteristics such as free from glare and low reflection at glass baseplate surface; Wherein, use resin stacked film to form the means of anti-dazzle, anti-reflective glass face, by folding and establish resin film at glass baseplate surface, and in resin, be added into particle, and utilize particle the scattering phenomenon of light to be produced to the effect of anti-dazzle, another, again by the resin film that multilayer has different refractivity being set glass baseplate surface is stacking, make to produce complete destruction interference by the optical wavelength of each layer of resin film, the light of reflection is offseted, to reach antireflecting object; The aforementioned mode at the stacking resin film of glass baseplate surface is to utilize coating technique means to reach mostly, but the processing procedure of coating has the puzzlement of crawling all the time, and the resin film of crawling not only can be brought into play anti-reflection effect, cause finished product yield to reduce, and inhomogeneous resin thin film layer must carry out being coated with for the second time or more frequently heavy industry processing procedure again, not only increase production cost, also can make the thickness of the resin film of coating increase, cannot meet the demand of glass substrate slimming.
In addition, aforementioned physical impacts mode is the surface of fine steel sand being clashed into glass substrate in the spray mode of hitting at a high speed by blast, make surface roughening reduce catoptrical effect to reach, and after sandblast, carry out glossing processing, to form the glass surface that has anti-dazzle, antireflection usefulness concurrently; Utilize physical impacts mode to carry out glass baseplate surface processing, though can possess the advantages such as high-level efficiency, low cost and reworking, but also there are a lot of uncontrollable factors in this technique means, for example the life-span of consumptive material short, clash into that the degree of depth differs, poor working environment and the generation that has static; The polishing processing procedure carrying out after aforementioned sandblast is to adopt mechanical mill mode mostly, the stress producing while removing glass surface material in polishing processing procedure often can cause the fragmentation of glass substrate, again owing to can making glass surface form the pit that many depths, pore size differ after sandblast processing, though use mechanical mill mode, can remove the part material of glass surface, though can promote surface luster and Flatness, but the anti-dazzle that can reach, antireflecting usefulness are limited, be difficult to effectively improve anti-dazzle effect and the visual imaging quality of indicating meter; Known except aforementioned mechanical mill mode, also can utilize Wet-type etching means to carry out polishing processing procedure, described Wet-type etching is to process by etching solution, and etching solution is the strong acid solution being mixed by multiple compounds, conventionally the fluorochemicals such as potassium bifluoride, Calcium Fluoride (Fluorspan) of take are main component, in wet etch process, be that glass substrate is flooded in this strong acid solution, the hydrofluoric acid being generated by reaction corrodes glass surface, to reach anti-dazzle effect; Wet-type etching means are carried out the common problem of polishing processing procedure at present, comprising: 1, finished product yield is low, and the follow-up surface finish treatment time is long; 2, the limitation of the mode of production is large, and processing achievement is difficult controls, and 3, the tart flavour of etching solution is excessive, has a strong impact on personnel's production operation; 4, the high and high volatility of the toxicity of etching solution, all has strong aggressiveness to skin and respiratory tract, serious harm workman's health; 5, etching and processing required time is long; 6, cannot be in enormous quantities, produce expeditiously; 7, the poor stability of etching solution, validity life-span are short; And 8, personnel costs are high; Because the technique means of common Wet-type etching is not mature enough, still there is shortcomings, cause still cannot being applied to volume production processing procedure at present.
Just as above-mentioned, various prior arts have its advantage, but shortcoming can not be ignored also, so develop, a kind ofly have above-mentioned advantage concurrently and without the method for above-mentioned shortcoming, are the targets that industry is made joint efforts.
Summary of the invention
In view of this, main purpose of the present invention is to provide a manufacture method that possesses the free from glare low-reflection glass face of low cost, high volume production usefulness, it arranges most equally distributed tiny pits by Wet-type etching means in glass surface, can anti-reflective glass face to form, then the depth diversity factor of these tiny pits of passivation, to promote the glossiness of glass surface, can obtain accordingly the glass surface of the low reflection of free from glare of tool high transmission rate, the inventive method can overcome the shortcoming of prior art, simplify Production Flow Chart and produce this to reduce, simultaneously improving production efficiency and finished product yield.
In order to reach foregoing invention object, the manufacture method of free from glare low-reflection glass face provided by the present invention, it mainly comprises the following steps:
A, provide a glass substrate: the material of this glass substrate is to be selected from soda lime glass, sodium borosilicate glass, lead crystal glass, alumina silicate glass, low iron glass etc., but the material ranges of implementing is not limited with previous materials; Particularly, this glass substrate at least comprises a surface to be machined, and this surface to be machined can be tabular surface, arc, sphere or other various rules or erose glass surface is all applicable; In processing procedure of the present invention, on this glass substrate except this surface to be machined keeps open state, remaining surface all can be covered by corrosion proof shade, and be familiar with technique personage, know, this shade can be selected the plastics such as polymethylmethacrylate glue, silica gel, with stencil methods, method of spin coating (spin coating) and slit coating method (slot coating) or kapillary coating method, film, posts the technique means such as mode and is deployed to glass baseplate surface;
B, provide the first etching solution: it is evenly to mix solution by materials such as water-soluble inorganic salt, acid solution, dispersion agent, stablizer and deionized waters; Particularly, this water-soluble inorganic salt account for gross weight than 10% to 35%, this acid solution account for gross weight than 5% to 60%, this dispersion agent account for gross weight than 0.5% to 5%, this stablizer account for gross weight than 1% to 10% and its surplus be deionized water; This water-soluble inorganic salt is to be selected from one of Potassium monofluoride, sodium bicarbonate, saleratus, hydrofluoric acid, ammonium perchlorate or its mixture, this acid solution is to be selected from one of phosphoric acid, citric acid, acetic acid, lactic acid, boric acid, tartrate or its mixture, and this dispersion agent is to be selected from one of nitric acid, sulfuric acid, hydrofluoric acid, hydrochloric acid or this stablizer of its mixture is to be selected from one of ethanethio tin, magnesium chloride, the sodium that silicifies, organic nickel compounds or its mixture;
C, carry out the first etch process: the surface to be machined that the first etching solution is acted on to this glass substrate, this etching solution temperature is maintained between 40 ℃ to 50 ℃, approximately 10 to 30 minutes action time, then this surface to be machined is bestowed and cleaned to remove residual etching solution, therefore can form most tiny pits at this surface to be machined, make surface roughening reduce catoptrical effect to reach; Particularly, the mode of action of aforementioned etching solution and this surface to be machined can be put into practice via multiple means, for example, can be by this etching solution splendid attire in a work nest, and this glass substrate is dropped in this work nest, make this surface to be machined thorough impregnation in this etching solution to carry out etching, and be familiar with technique personage, know, except the aforementioned mode of action, also can use continuity spray pattern, for example, this etching solution is to be sprayed on constantly on this surface to be machined to carry out etching; Therefore the mode of action of this etching solution and this surface to be machined is not limited with aforesaid technique means; And
D, provide the second etching solution: it is evenly to mix solution by materials such as hydrofluoric acid (HF), mineral acid, modification agent and deionized waters; Particularly, this hydrofluoric acid account for gross weight than 15% to 45%, this mineral acid account for gross weight than 15% to 45%, this modification agent account for gross weight than 0.1% to 5% and its surplus be deionized water; This mineral acid is to be selected from one of phosphoric acid, hydrochloric acid, carbonic acid, chloric acid or its mixture; This modification agent is to be selected from one of oxysuccinic acid, gluconic acid, Sorbic Acid, citric acid or its mixture;
E, carry out the second etch process: the second etching solution is acted on to the surface to be machined through aforementioned the first etch process, this etching solution temperature is maintained between 40 ℃ to 50 ℃, approximately 20 to 40 minutes action time, then this surface to be machined is bestowed and cleaned and be dried, utilize the material of the second etching solution removal glass surface to carry out thinning processing procedure, and side by side by the shape passivation of these tiny pits of glass surface, reduce the depth diversity factor of pit, thereby promote glossiness (gloss) and the Flatness of glass surface, obtain accordingly the glass substrate of the low reflecting surface of a free from glare, wherein, the means of putting into practice of the mode of action of aforementioned the second etching solution and this surface to be machined, are identical with aforementioned the first etch process, therefore do not repeat them here.
In aforementioned manufacture method of the present invention, by the first etch process, can form most tiny pits at this surface to be machined, make surface roughening reduce catoptrical effect to reach; Depth diversity factor that again can these tiny pits of passivation through the second etch process, make the roughness homogenization of this surface to be machined and promote surperficial glossiness, therefore can significantly promote the transmitance of glass surface, form the free from glare low-reflection glass face with high transmission rate.
The low reflecting surface of free from glare of the present invention is consisted of the tiny pit of majority being formed on light transmission substrate surface, and can pass through to control the distribution density of these tiny pits and the depth diversity factor of pit, and then adjust reflectivity and the light transmittance of this light transmission substrate surface; Therefore, according to the present invention, also can be after aforementioned the second etch process increase again the second etch process that carries out one or many, in order to control the roughness at this surface to be machined, adjust accordingly the effect of the glossiness of glass surface and free from glare, low reflection.
According to the low reflecting surface of free from glare that the present invention formed, see through after microscope amplifies several times and can clearly show, in glass surface, be distributed with equably most hexagon pits, and these hexagon pits form the cross-hatched pattern of turtle shell shape jointly.
The present invention further provides a kind of etching solution of optimizing glass surface, it can form the surface of low reflection performance on glass substrate; The constituent of described etching solution at least comprises:
A, water-soluble inorganic salt: described water-soluble inorganic salt is to be selected from Potassium monofluoride (KF), sodium bicarbonate (NaHCO
3), saleratus (KHCO
3), hydrofluoric acid (HF), ammonium perchlorate (ClH
4nO
4) one of or they's mixture, but the material ranges of implementing is not limited with previous materials, the main raw composition that this water-soluble inorganic salt is surface etching, best, it accounts for gross weight than 10% to 35%, when water-soluble inorganic salt is when gross weight is following than 10%, form low reflecting surface speed slower, cannot produce by rapid, high volume, again when water-soluble inorganic salt is when gross weight is above than 35%, form low reflecting surface speed very fast, but evenly mix the time that the constituent of this etching solution need be longer, in addition, use separately water-soluble inorganic salt to carry out etching to glass surface, can only obtain higher surfaceness (Ra), and cannot obtain more smooth exquisiteness and even surface, because water-soluble inorganic salt cannot completely tightly be attached on glass surface, and cause the slow landing of inorganic salts, cause the time of surface erosion different in size, and the different depression of the generation depth, and for avoiding status, therefore select to add other acid solution as subsidiary material, to strengthen the adhesive ability of water-soluble inorganic salt, making inorganic salt rest on for a long time glass surface corrodes, bring up the depression that comparatively evenly corrodes the depth.
B, acid solution: described acid solution can be various organic acids or mineral acid, its material system is selected from one of phosphoric acid, citric acid, acetic acid, lactic acid, boric acid, tartrate or they's mixture, but the material ranges of implementing is not limited with previous materials; Use aforementioned acid solution as subsidiary material, can strengthen water-soluble inorganic salt and tightly be attached to the ability in glass surface, best, the usage quantity of this acid solution is about and accounts for gross weight than 5% to 60%; When acid solution lower than gross weight than 5% time, water-soluble inorganic salt is difficult for being attached in glass surface, again when acid solution usage quantity higher than gross weight than 60% time, cannot make water-soluble inorganic salt be attached to uniformly on glass surface, therefore can cause the bad low-reflection glass face of inhomogeneous, true Pingdu that corrodes.
C, dispersion agent, it accounts for gross weight than 0.5% to 5%, and described dispersion agent is to be selected from one of nitric acid, sulfuric acid, hydrofluoric acid, hydrochloric acid or they's mixture; Described dispersion agent is to be selected from nitric acid (HNO
3), sulfuric acid (H
2sO
4), one of hydrofluoric acid (HF), hydrochloric acid (HCl) or they's mixture, but the material ranges of implementing is not limited with previous materials; Use aforementioned dispersion agent can promote water-soluble inorganic salt to be evenly attached to the effect on glass surface, best, the usage quantity of this dispersion agent is about and accounts for gross weight than 0.5% to 5%, when dispersion agent lower than gross weight than 0.5% time, water-soluble inorganic salt does not have the effect being evenly attached on glass surface, when the usage quantity of dispersion agent is when gross weight is above than 5%, the ability that water-soluble inorganic salt is attached on glass surface declines again.
D, stablizer: described stablizer is to be selected from ethanethio tin, magnesium chloride (MgCl
2), sodium (Na silicifies
2siO
3), one of organic nickel compounds or they's mixture, but the material ranges of implementing is not limited with previous materials; Use stablizer can make each constituent in aforementioned etching solution be easy to fully mix and keep stable, and the long-acting performance that can promote etching solution; Best, the usage quantity of this stablizer is for accounting for gross weight than 1% to 10%, when stablizer lower than gross weight than 1.0% time, cannot make the constituent in etching solution keep stable mixing and increase long-acting performance, but when stablizer usage quantity is when gross weight is above than 10%, can make water-soluble inorganic salt produce chemical reaction to form the surface of low reflection with glass material; And
E, deionized water (Deionized Water), it accounts for gross weight than being amount after aforementioned each material weight ratio of deduction.
Etching solution of the present invention can corrode glass surface, can make glass surface pattern change to form the surface that possesses the low reflecting effect of free from glare; And the present invention is by adding dispersion agent and stablizer at etching solution, can strengthen ability that inorganic salts adheres to and the homogeneity of distribution, reach the significantly object of improving product yield and quality of finished.
The present invention is not limited to the above form, clearly, with reference to after above-mentioned explanation, can have improvement and the variation of more technology isotropisms; Therefore be such as familiar with the personage of this case skill, have and under identical creation spirit, do relevant any modification of the present invention or change, all must be included in the category that the invention is intended to protection.
Accompanying drawing explanation
embodiment:
About aforementioned and other technology contents, feature and effect of the present invention, in the detailed description of following examples, can clearly present; And these embodiment are for illustration the present invention, can not be interpreted as limiting patent right scope of the present invention.
The opticglass of unlike material and thickness is cut into the glass substrate of 10cm * 5cm specification, and will the solidity to corrosion shade of silica gel material be set on a surface wherein, to facilitate the immersion etching test of carrying out single of glass.
Before soaking etching, do in advance the action that glass surface cleans, then glass substrate is dropped in the work nest of the etching solution be loaded with the present invention's formula, the surperficial thorough impregnation that makes this glass substrate in this etching solution to carry out etching (chemical milling); In the present embodiment, this work nest is the container of being made by acid resistance material, and its volume size is about 1,000 ml.
In described test experiments, at least comprise secondary and soak etching process.
For the first time, soak etching process, in this acid-resistant container, be loaded with the first etching solution, its composition be account for gross weight than 10% to 35% water-soluble inorganic salt (for example Potassium monofluoride), account for gross weight than 5% to 60% acid solution (for example phosphoric acid), account for gross weight for example, than 0.5% to 5% dispersion agent (nitric acid), to account for gross weight for example, be deionized water than stablizer (ethanethio tin) and its surplus of 1% to 10%; Embodiment is: the working temperature of this first etching solution is maintained to 45 ℃ of left and right, and the glass substrate of tested person is dropped into and is loaded with in the work nest of aforementioned the first etching solution, make the surperficial thorough impregnation of this glass substrate in the first etching solution, and carry out the immersion etching about approximately 20 minutes, after completing, carry out again cleaning step, use pure water to clean glass baseplate surface.
Soak for the second time etching process, in the acid-resistant container using, be loaded with the second etching solution, its composition be account for gross weight than 15% to 45% hydrofluoric acid, account for gross weight for example, than 15% to 45% mineral acid (phosphoric acid), to account for gross weight for example, be deionized water than modification agent (oxysuccinic acid) and its surplus of 0.1% to 5%; Embodiment is: the working temperature of this second etching solution is maintained to 45 ℃ of left and right, and will drop into and be loaded with in the work nest of aforementioned the second etching solution through the aforementioned tested person glass substrate that soaks for the first time etching process, make the surperficial thorough impregnation of this glass substrate in the second etching solution, and carry out the immersion etching about approximately 30 minutes, after completing, carry out again cleaning step, use pure water to clean glass baseplate surface; When completing aforementioned immersion for the second time after etching process, take out this glass substrate and carry out cleaning, drying program again, continuing and this glass substrate is carried out to the test of surfaceness and glossiness.
embodiment 1
Take the blue or green sheet glass (soda-Lime) of Asahi Glass (AGC), the glass substrate that thickness is about 1.10 mm is experiment sample, and after aforementioned immersion etching step, the test result of this glass substrate being carried out to surfaceness and glossiness is listed in the table below.
embodiment 2
The optics of healthy and free from worry Gorilla glass (Corning Gorilla Glass) of take is about 0.72 mm glass substrate without alkali glass, thickness is experiment sample, after aforementioned immersion etching step, the test result of this glass substrate being carried out to surfaceness and glossiness is listed in the table below.
From aforementioned experimental result data, in etching process, the glossiness of this glass baseplate surface (gloss) lift velocity, will, because of the higher lift velocity more and more slowly that presents of its glossiness (gloss), therefore also can increase the etch quantity to this glass baseplate surface; In addition, experimental result shows, 60 ° of glossiness of this glass baseplate surface can be controlled accurately, so the present invention can regulate and control by soaking for the second time etching process the height of 60 ° of glossiness, to reach client's demand.
Should be understood that these embodiments are only not used in and limit the scope of the invention for the present invention is described.In addition should be understood that those skilled in the art can make various changes or modifications the present invention after having read the content of the present invention's instruction, these equivalent form of values fall within the application's appended claims limited range equally.
Claims (13)
1. a manufacture method for free from glare low-reflection glass face, is characterized in that, comprises the following steps:
A, provide a glass substrate, it at least comprises a surface to be machined;
B, provide the first etching solution, its material composition at least comprises water-soluble inorganic salt, acid solution, dispersion agent, stablizer and deionized water;
C, carry out the first etch process: the surface to be machined that described the first etching solution is acted on to described glass substrate, this the first etching solution temperature is maintained between 40 ℃ to 50 ℃, approximately 10 to 30 minutes action time, then described surface to be machined is bestowed and cleaned to remove after residual described the first etching solution, can be made into the glass substrate of the low reflecting surface of tool;
D, provide the second etching solution, its material composition at least comprises hydrofluoric acid, mineral acid, modification agent and deionized water; And
E, carry out the second etch process, described the second etching solution is acted on to the glass substrate surface to be machined through described the first etch process gained, described the second etching solution temperature is maintained between 40 ℃ to 50 ℃, approximately 20 to 40 minutes action time, then, after described surface to be machined being bestowed and cleaned to remove residual described the second etching solution and be dried, obtain the glass substrate of the low reflecting surface of a free from glare.
2. the manufacture method of free from glare low-reflection glass face according to claim 1, is characterized in that: the material of wherein said glass substrate is to be selected from one of soda lime glass, sodium borosilicate glass, lead crystal glass, alumina silicate glass, low iron glass.
3. the manufacture method of free from glare low-reflection glass face according to claim 1, is characterized in that: the water-soluble inorganic salt of wherein said the first etching solution is to be selected from one of Potassium monofluoride, sodium bicarbonate, saleratus, hydrofluoric acid, ammonium perchlorate or its mixture.
4. the manufacture method of free from glare low-reflection glass face according to claim 1, is characterized in that: the acid solution of wherein said the first etching solution is to be selected from one of phosphoric acid, citric acid, acetic acid, lactic acid, boric acid, tartrate or its mixture.
5. the manufacture method of free from glare low-reflection glass face according to claim 1, is characterized in that: the dispersion agent of wherein said the first etching solution is to be selected from one of nitric acid, sulfuric acid, hydrofluoric acid, hydrochloric acid or its mixture.
6. the manufacture method of free from glare low-reflection glass face according to claim 1, is characterized in that: the stablizer of wherein said the first etching solution is to be selected from one of ethanethio tin, magnesium chloride, the sodium that silicifies, organic nickel compounds or its mixture.
7. the manufacture method of free from glare low-reflection glass face according to claim 1, is characterized in that: wherein said the first etching solution comprises: account for gross weight than 10% to 35% water-soluble inorganic salt, account for gross weight than 5% to 60% acid solution, account for gross weight than 0.5% to 5% dispersion agent, to account for gross weight be deionized water than 1% to 10% stablizer and its surplus.
8. the manufacture method of free from glare low-reflection glass face according to claim 1, is characterized in that: the mineral acid of wherein said the second etching solution is to be selected from one of phosphoric acid, hydrochloric acid, carbonic acid, chloric acid or its mixture.
9. the manufacture method of free from glare low-reflection glass face according to claim 1, is characterized in that: the modification agent of wherein said the second etching solution is to be selected from one of oxysuccinic acid, gluconic acid, Sorbic Acid, citric acid or its mixture.
10. the manufacture method of free from glare low-reflection glass face according to claim 1, is characterized in that: wherein said the second etching solution comprises: account for gross weight than 15% to 45% hydrofluoric acid, account for gross weight than 15% to 45% mineral acid, to account for gross weight be deionized water than 0.1% to 5% modification agent and its surplus.
The manufacture method of 11. free from glare low-reflection glass faces according to claim 1, it is characterized in that: be wherein also included in before described the first etch process, the corrosion proof shade of tool is set on described glass substrate, by the surface shaded of this glass substrate, open described surface to be machined only.
The manufacture method of 12. free from glare low-reflection glass faces according to claim 1, is characterized in that: after being wherein more included in described the second etch process, increase described the second etch process that carries out one or many again.
The 13. 1 kinds of etching solutions that can optimize glass surface, is characterized in that, its constituent at least comprises:
A, water-soluble inorganic salt, it accounts for gross weight than 10% to 35%, and described water-soluble inorganic salt is to be selected from one of Potassium monofluoride, sodium bicarbonate, saleratus, hydrofluoric acid, ammonium perchlorate or its mixture;
B, acid solution, it accounts for gross weight than 5% to 60%, and described acid solution is to be selected from one of phosphoric acid, citric acid, acetic acid, lactic acid, boric acid, tartrate or its mixture;
C, dispersion agent, it accounts for gross weight than 0.5% to 5%, and described dispersion agent is to be selected from one of nitric acid, sulfuric acid, hydrofluoric acid, hydrochloric acid or its mixture;
D, stablizer, it accounts for gross weight than 1% to 10%, and described stablizer is to be selected from one of ethanethio tin, magnesium chloride, the sodium that silicifies, organic nickel compounds or its mixture; And
E, deionized water, it accounts for gross weight than the surplus for aforementioned each material weight ratio of deduction.
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