CN108975721A - A kind of etch combination for glass substrate of liquid crystal display thinning processing - Google Patents
A kind of etch combination for glass substrate of liquid crystal display thinning processing Download PDFInfo
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- CN108975721A CN108975721A CN201811286743.4A CN201811286743A CN108975721A CN 108975721 A CN108975721 A CN 108975721A CN 201811286743 A CN201811286743 A CN 201811286743A CN 108975721 A CN108975721 A CN 108975721A
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- glass substrate
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- liquid crystal
- crystal display
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- ing And Chemical Polishing (AREA)
Abstract
A kind of etch combination for glass substrate of liquid crystal display thinning processing, it is characterized in that the composition is composed of the following components: the hydrochloric acid of weight percent 7~10% (in terms of HCl), the hydrofluoric acid of weight ratio 4~8% (in terms of HF), the Sulfobutyl ether β _ cyclodextrin of weight ratio 1~2%, the ammonium chloride of weight percent content 1.0~1.5%, 0.1%~0.2% zinc chloride, the glucolactone of weight ratio 2~5%, the Cithrol 2ML of weight percent content 0.5~1%, the polypropylene glycol 1500 of weight percent content 4~7% and the water of surplus.
Description
Technical field
The present invention relates to be used for TFT glass substrate etching composition.
Background technique
To meet the requirement for making ultra-thin TFT (ThinFilmTransistor, thin film transistor (TFT)) display screen, need to existing
There is specification glass substrate to carry out thinning processing.The hydrofluoric acid currently generallyd use is etched thinning, but one to TFT glass substrate
Aspect can generate local defect, need to carry out prolonged polishing treatment, and on the other hand the glass baseplate surface of polishing is easy to produce
Raw dazzle.The prior art using disclosing a kind of thinning pretreating agent, for before thinning to glass substrate pre-processed with
Surface defect after reducing thinning is located as Chinese patent 2016112699779 discloses one kind for TFT glass thin chemical industry skill in advance
Liquid is managed, formula is with the hydrochloric acid (HCl) of mass percentage content 10-15%, the hydrogen fluorine of mass percentage content 2%~5%
Sour (HF), the Sulfobutyl ether β _ cyclodextrin of mass percentage content 1~2%, the alginic acid of mass percentage content 0.1-0.2%
The water of sodium, the Macrogol 6000 of mass percent 5-6% and surplus, the pretreating agent are either used as thinning pretreating agent also
It is that can not form mist degree appropriate in glass surface directly as thinning etching solution with anti-dazzle.Chinese patent literature
CN2011102930815 discloses a kind of etching solution of anti-dazzle glas, but finds under study for action, obtained anti-in this way
Dizzy glass be simply possible to use in TFT substrate carry out surface handle, cannot be used directly for thinning, especially cannot achieve in thinning
While improve the surface quality of thinning metacoxal plate, and it is anti-dazzle to generate that glass baseplate surface can be made to generate mist degree appropriate
Effect.Therefore provide it is a kind of for glass substrate of liquid crystal display thinning processing etch combination, can glass substrate into
While row thinning, surface is made to generate suitable mist degree to realize antiglare effect, becomes urgently to be resolved in the prior art and ask
Topic.
Summary of the invention
To solve aforementioned technical problem, the present invention provides handle for a kind of for glass substrate of liquid crystal display thinning
Etch combination, by the prescription of preferred composition, and use thinning treatment process appropriate, can be to TFT glass base
While the carry out thinning of plate, the effect that anti-dazzle antireflective processing is carried out to substrate surface is realized.To solve aforementioned technical problem
The technical solution adopted by the present invention are as follows:
Provide a kind of etch combination for glass substrate of liquid crystal display thinning processing, it is characterised in that described group
It is composed of the following components to close object:
The hydrochloric acid (in terms of HCl) of weight percent 7~10%, the hydrofluoric acid (in terms of HF) of weight ratio 4~8%, weight ratio 1
~2% Sulfobutyl ether β _ cyclodextrin, the ammonium chloride of weight percent content 1.0~1.5%, the glucose of weight ratio 2~5%
Acid lactone, the Cithrol 2ML of weight percent content 0.5~1%, weight percent content 4~7% gather
The water of propylene glycol 1500 and surplus.
A kind of etch combination for glass substrate of liquid crystal display thinning processing as described in claim 1, it is special
Sign is that the composition is composed of the following components:
The hydrochloric acid (in terms of HCl) of weight percent 7~10%, the hydrofluoric acid (in terms of HF) of weight ratio 5~7%, weight ratio
1.5~2% Sulfobutyl ether β _ cyclodextrin, the ammonium chloride of weight percent content 1.0~1.5%, the grape of weight ratio 2~3%
Saccharic acid lactone, the Cithrol 2ML of weight percent content 0.8~1%, weight percent content 5%~6%
Polypropylene glycol 1500 and surplus water.
The composition for the thinning of TFT glass baseplate surface, it is characterised in that it prepares in the following manner,
1) recipe quantity hydrochloric acid is mixed with hydrofluoric acid, after suitable quantity of water dilution is added, the chloride leach of recipe quantity is added,
2) it is dissolved in water after mixing the Sulfobutyl ether β _ cyclodextrin of recipe quantity and polypropylene glycol 1500, polyethylene glycol 200 is added
Monolaurate is dispersed with stirring；
3) mixed liquor of step 2) is slowly added into the mixed liquor of step 1) under agitation, adds gluconic acid
Lactone is uniformly mixed.
Cithrol 2ML is chiefly used in disappearing in water paint as a kind of surfactant in the prior art
Infusion, and as metal working lubricant etc., although glucolactone is also used as a kind of polyol, in glass
Etching domain variability is of little use, under study for action we have found that by Cithrol 2ML (PEG200ML) and sulphur butyl-β-
After cyclodextrin, polypropylene glycol 1500, glucolactone are used in combination and mix it with appropriate hydrochloric acid, hydrofluoric acid and ammonium chloride
The obtained etch combination for the thinning of glass substrate of liquid crystal display surface is carrying out thinning processing to TFT glass substrate
Afterwards, improve thinning processing quality simultaneously, in the suitable mist degree of glass substrate table surface production when can etch, to realize
Antiglare effect.In prescription screening it was found that change etching solution prescription or amounts of components can be bad to etching quality generation
It influences.
Specific embodiment
TFT glass substrate thinning etching solution provided by the invention, is prepared in the following manner,
1) recipe quantity hydrochloric acid is mixed with hydrofluoric acid, after suitable quantity of water dilution is added, the chloride leach of recipe quantity is added,
2) it is dissolved in water after mixing the Sulfobutyl ether β _ cyclodextrin of recipe quantity and polypropylene glycol 1500, polyethylene glycol 200 is added
Monolaurate is dispersed with stirring；
3) mixed liquor of step 2) is slowly added into the mixed liquor of step 1) under agitation, adds gluconic acid
Lactone is uniformly mixed.
The formula of embodiment and comparative example see the table below (mass percent wt%)
The method for carrying out thin processingization to the etching liquor that embodiment and comparative example obtain is as follows
Taking raw material is glass substrate of the identical producer of plate nitre NA35 with batch, with a thickness of 1.000mm, having a size of
100mm×100mm。
Etch process is
1) thinning of TFT glass substrate is prepared with etching solution 10L (hereinafter referred to as etching solution)
2) etching solution is squeezed into etching machine acid tank and controls pretreating agent temperature at 40 DEG C ± 2 DEG C, using as experimental group
The glass substrate of sample is immersed in etching solution, and removal glass surface is thinned to 0.5mm；
3) glass surface is cleaned with clear water.
Detect embodiment
Glossiness, mist degree and the transmitance of TFT glass substrate sample by thinning processing are detected, wherein mist degree
Using WGW photoelectricity mist degree instrument, transmitance using BTR-1 type visible light thoroughly/reflectance test instrument, glossiness detection uses glossiness
It is tested under the conditions of instrument, with 60 °
Detection method should meet the GBT_36260_20189 electronical display regulation of anti-dazzle anti reflection glass
Inspection result is as follows
Comparative example 1~5 is added without PEG200ML on the basis of 2/3/6/7 prescription of embodiment respectively, and sulphur butyl-β-ring is pasted
Essence is changed to polypropylene glycol 1500, and polypropylene glycol 1500 is changed to Sulfobutyl ether β _ cyclodextrin, glucolactone is added without, is not added
Enter ammonium chloride.
It should be less than 70 with the glossiness of anti-dazzle anti reflection glass according to regulation electronical display in GBT_36260_2018, mist degree
Should be less than 4%, it is seen that luminous transmittance (being equivalent to glossiness) should be about 98%, the experimental results showed that, only mentioned when using the present invention
The etching solution of confession carries out glass substrate when thinning processing to glass substrate, after the completion of thinning processing, can substantially conform to
The regulation of GBT_36260_20189.While keeping high-permeability energy, ideal anti-dazzle effect is realized in glass surface
Fruit.And the sample that embodiment 2/3/6/7 obtains, then better light transmittance is shown while realizing anti-dazzle.And comparative example
Obtained glass is not able to satisfy above-mentioned standard then, illustrates that each component is produced when being etched in technical solution of the present invention prescription
Synergistic effect also achieves antiglare effect to make the glass substrate after etching while meeting thinning requirement, substantially can be with
Meet the regulation of GBT_36260_2018.
Claims (2)
1. it is a kind of for glass substrate of liquid crystal display thinning processing etch combination, it is characterised in that the composition by with
The following group is grouped as:
The hydrochloric acid (in terms of HCl) of weight percent 7~10%, the hydrofluoric acid (in terms of HF) of weight ratio 4~8%, weight ratio 1~
2% Sulfobutyl ether β _ cyclodextrin, the ammonium chloride of weight percent content 1.0~1.5%, 0.1%~0.2% zinc chloride, weight
Measure the glucolactone than 2~5%, the Cithrol 2ML of weight percent content 0.5~1%, weight hundred
Divide than the polypropylene glycol 1500 of content 4~7% and the water of surplus.
2. a kind of etch combination for glass substrate of liquid crystal display thinning processing as described in claim 1, feature
It is that the composition is composed of the following components:
The hydrochloric acid (in terms of HCl) of weight percent 7~10%, the hydrofluoric acid (in terms of HF) of weight ratio 5~7%, weight ratio 1.5~
2% Sulfobutyl ether β _ cyclodextrin, the ammonium chloride of weight percent content 1.0~1.5%, 0.1%~0.2% zinc chloride, weight
Measure the glucolactone than 2~3%, the Cithrol 2ML of weight percent content 0.8~1%, weight hundred
Divide than the polypropylene glycol 1500 of content 5%~6% and the water of surplus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811286743.4A CN108975721A (en) | 2018-10-31 | 2018-10-31 | A kind of etch combination for glass substrate of liquid crystal display thinning processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811286743.4A CN108975721A (en) | 2018-10-31 | 2018-10-31 | A kind of etch combination for glass substrate of liquid crystal display thinning processing |
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| CN108975721A true CN108975721A (en) | 2018-12-11 |
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| CN201811286743.4A Withdrawn CN108975721A (en) | 2018-10-31 | 2018-10-31 | A kind of etch combination for glass substrate of liquid crystal display thinning processing |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102432185A (en) * | 2011-09-30 | 2012-05-02 | 郑州恒昊玻璃技术有限公司 | Etching liquid and etching process for anti-dazzle glass product |
| CN102887647A (en) * | 2012-10-11 | 2013-01-23 | 郑州恒昊玻璃技术有限公司 | Process for producing anti-glare glass by using high-boron silicon and high-aluminium silicon glasses |
| CN106673455A (en) * | 2016-12-31 | 2017-05-17 | 庞绮琪 | Composition for processing surface of glass substrate of liquid crystal display |
| CN106746701A (en) * | 2016-12-31 | 2017-05-31 | 庞绮琪 | TFT glass thin chemical industry skill pretreatment fluids |
-
2018
- 2018-10-31 CN CN201811286743.4A patent/CN108975721A/en not_active Withdrawn
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102432185A (en) * | 2011-09-30 | 2012-05-02 | 郑州恒昊玻璃技术有限公司 | Etching liquid and etching process for anti-dazzle glass product |
| CN102887647A (en) * | 2012-10-11 | 2013-01-23 | 郑州恒昊玻璃技术有限公司 | Process for producing anti-glare glass by using high-boron silicon and high-aluminium silicon glasses |
| CN106673455A (en) * | 2016-12-31 | 2017-05-17 | 庞绮琪 | Composition for processing surface of glass substrate of liquid crystal display |
| CN106746701A (en) * | 2016-12-31 | 2017-05-31 | 庞绮琪 | TFT glass thin chemical industry skill pretreatment fluids |
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Application publication date: 20181211 |
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