CN106186713A - A kind of anti-dazzle glas etching solution and the method utilizing this anti-dazzle liquid processing anti-dazzle glas - Google Patents
A kind of anti-dazzle glas etching solution and the method utilizing this anti-dazzle liquid processing anti-dazzle glas Download PDFInfo
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- CN106186713A CN106186713A CN201610553311.XA CN201610553311A CN106186713A CN 106186713 A CN106186713 A CN 106186713A CN 201610553311 A CN201610553311 A CN 201610553311A CN 106186713 A CN106186713 A CN 106186713A
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- etching solution
- dazzle
- dazzle glas
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- glas
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- 238000005530 etching Methods 0.000 title claims abstract description 65
- 238000000034 method Methods 0.000 title claims abstract description 17
- 239000007788 liquid Substances 0.000 title abstract description 5
- 239000011521 glass Substances 0.000 claims abstract description 43
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000002994 raw material Substances 0.000 claims abstract description 18
- 229910052939 potassium sulfate Inorganic materials 0.000 claims abstract description 15
- 239000011592 zinc chloride Substances 0.000 claims abstract description 15
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims abstract description 15
- 229910004883 Na2SiF6 Inorganic materials 0.000 claims abstract description 14
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims abstract description 14
- 229910001634 calcium fluoride Inorganic materials 0.000 claims abstract description 14
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 claims abstract description 12
- 235000019982 sodium hexametaphosphate Nutrition 0.000 claims abstract description 12
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 claims abstract description 12
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims abstract description 9
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 claims abstract description 6
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims abstract description 4
- 238000003756 stirring Methods 0.000 claims description 20
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 8
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 7
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 5
- 230000032683 aging Effects 0.000 claims description 5
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 5
- 238000011010 flushing procedure Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 5
- 239000012188 paraffin wax Substances 0.000 claims description 5
- 239000003595 mist Substances 0.000 claims description 3
- PYIDGJJWBIBVIA-UYTYNIKBSA-N lauryl glucoside Chemical compound CCCCCCCCCCCCO[C@@H]1O[C@H](CO)[C@@H](O)[C@H](O)[C@H]1O PYIDGJJWBIBVIA-UYTYNIKBSA-N 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 6
- 230000005540 biological transmission Effects 0.000 abstract description 2
- 239000002245 particle Substances 0.000 abstract description 2
- 238000010129 solution processing Methods 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 4
- 230000029087 digestion Effects 0.000 description 3
- 235000011149 sulphuric acid Nutrition 0.000 description 3
- 239000001117 sulphuric acid Substances 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 238000006557 surface reaction Methods 0.000 description 2
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 229930182478 glucoside Natural products 0.000 description 1
- 150000008131 glucosides Chemical class 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The present invention relates to a kind of anti-dazzle glas etching solution and the method utilizing this etching solution processing anti-dazzle glas, glass etching liquid comprises the following raw materials by weight percent: H2SO48.2‑9.6%、Na2SiF6 1.8‑2.2%、ZnCl2 4.5‑5.5%、NH4F 21.5‑22.5%、CaF2 3.6‑4.2%、(NH4)2SO4 3.6‑4.2%、K2SO4 2.1 2.5%, lauryl glucosyl 1.6 1.8%, sodium hexameta phosphate 1.8 2.2% and water 46 50%.Simply, easily operate, the glass sample prepared has the advantages such as surface particles is tiny, be evenly distributed, light transmission rate is high, anti-dazzle is effective to present invention process.
Description
Technical field
The present invention relates to anti-dazzle glas preparing technical field, be specifically related to a kind of anti-dazzle glas etching solution and utilize this etching
The method of liquid processing anti-dazzle glas.
Background technology
Glass is because of advantages such as its intensity height, excellent optical performance, long-term working stability good (being difficult to aging), in daily life
Work is widely used.But due to the reflectance that glass surface is higher, often resulting in " dazzle attack ", namely we often say
" light pollution ", such as we when operating computer, usually from scenery outside display cannot in the reflection of display surface
See clearly display content and worried；When we stop and probe into scenery in show window before showcase, glass surface is reflective often to be made
We cannot scenery etc. in window visible in detail, these luminous reflectance being all because glass surface cause.Glass to be reduced
Glass launches the impact of light, carries out glass to play good effect without optical processing.
The anti-dazzle glas sold on domestic market is typically realized by the method that glass surface carries out plated film
's.The antiglare effect of this plated film anti-dazzle glas is preferable, but production cost is high, and plated film is easy to come off, and surface is easy
Leave cut etc., thus affect transparency.Now with producer use the Fluohydric acid. of high concentration and sulphuric acid to process anti-dazzle glas,
Although can overcome, plated film is easy to fall off, the defect of the easy scratching in surface, but the water quality after processing is difficult to thoroughly process, and causes environment dirty
Dye, and yield rate is low, the grained matte of glass surface.
Summary of the invention
It is an object of the invention to the deficiency for solving above-mentioned technical problem, it is provided that a kind of anti-dazzle glas etching solution and utilization should
The method of etching solution processing anti-dazzle glas, overcomes presently used coated glass ground the most durable in use shortcoming, solves glass
Glare problem under high light direct projection, and due to its relative inexpensiveness, thus can reach the mesh progressively replacing coated glass
's.Simply, easily operate, the glass sample prepared has that surface particles is tiny, is evenly distributed present invention process, light transmission rate
The advantages such as height, anti-dazzle are effective.
The present invention solves the deficiency of above-mentioned technical problem, be the technical scheme is that a kind of anti-dazzle glas etching solution,
Comprise the following raw materials by weight percent: H2SO4 8.2-9.6%、Na2SiF6 1.8-2.2%、ZnCl2 4.5-5.5%、NH4F
21.5-22.5%、CaF2 3.6-4.2%、(NH4)2SO4 3.6-4.2%、K2SO4 2.1-2.5%, lauryl glucosyl 1.6-
1.8%, sodium hexameta phosphate 1.8-2.2% and water 45-55%.
Further optimization as the present invention a kind of anti-dazzle glas etching solution: comprise the following raw materials by weight percent:
H2SO48.6%、Na2SiF6 2%、ZnCl2 5%、NH4F 22.1%、CaF23.8%、(NH4)2SO43.8%、K2SO42.3%, dodecane
Base glucoside 1.6%, sodium hexameta phosphate 1.8% and water 49%.
Utilize the method that above-mentioned etching solution prepares anti-dazzle glas: the anti-dazzle glas made, its transmitance ＞ 94.8%, and can
More than 98%；Mist degree ＞ 1.4%；Sharpen ＜ 72.2%, and be smaller than 66.3%；The reflectance ＜ 6.9% of light, preparation method include with
Lower step:
(1), weigh each raw material by the composition of raw materials of etching solution, add water to H2SO4In, it is stirring evenly and then adding into Na2SiF6 、
NH4F and CaF2, after stirring, add ZnCl2 、(NH4)2SO4And K2SO4Stir, add dodecyl Portugal afterwards
Polyglycoside and sodium hexameta phosphate, carry out ageing and obtain anti-dazzle glas etching solution after stirring；
(2), the glass abluent of pre-etched is carried out and is dried；
(3) the one side paraffin that, cleaned glass be not required to etching covers；
(4), by glass immersing in the etching solution prepared and soak, the temperature controlling etching solution is 20 DEG C, and etching period is 10min
It is etched processing；
(5), take out the flushing of used in glass products clear water, be then placed in the drying baker of 200-300 DEG C, dry 60-80min, close
Baking oven for heating switchs, and takes out, make anti-dazzle glas finished product during Temperature fall to 50 DEG C from baking oven.
Further improvement as the present invention a kind of anti-dazzle glas preparation method: the ageing in described etching solution preparation process
Time is 24 hours.
Further improvement as the present invention a kind of anti-dazzle glas preparation method: described abluent is acetone and butyl acetate
Arbitrary proportion mixture.
Beneficial effect
One, the anti-dazzle glas etching solution of the present invention have selected Na2SiF6 、NH4F and CaF2Combination, and optimize
Proportioning between three kinds of fluorides so that it is performance is worked in coordination with, has laid in enough fluorions while improving ionic strength；
ZnCl2 And K2SO4 Coordinating joins in system, have adjusted the salinity of system, promotes formation and the refinement of crystal grain of nucleus, makes erosion
Quarter, layer was thinning, kept the true of image, added (NH in etching solution4)2SO4, cooperate can be formed in system hydroxyl from
Son, the glass etching liquid of the present invention is at ZnCl2 And K2SO4 (NH4)2SO4Auxiliary under better to the etch effect of glass；
The sodium hexameta phosphate added in etching solution, it is possible to make etching solution be more prone to be hydrolyzed, and biological decomposition can be carried out；The opposing party
Face, under the auxiliary of lauryl glucosyl, it is possible to the etching reaction speed of regulation glass, lauryl glucosyl molecule
On hydroxyl easily and form hydrogen bond between sulphuric acid and glass, the medium that therefore can react as sulphuric acid and glass surface, to control
Making they response speeds and the uniformity of surface reaction, thus the low cost prepared and product surface granule are fine and smooth, transmitance is high
Anti-dazzle glas；
Two, in the chemical etching process of the present invention, etching solution temperature and etching period are optimized, utilize the present invention
Etching solution carry out glass etching process time, control etch temperature be 20 DEG C, etching period is 10min, is beneficial to reduce etching solution
In molecular migration speed, make glass surface reaction more uniform, thus obtain more preferable etch effect.
Three, the anti-dazzle glas that the present invention makes, its transmitance ＞ 94.8%, and can be more than 98%；Mist degree ＞ 1.4%；Sharpen ＜
72.2%, and it is smaller than 66.3%；The reflectance ＜ 6.9% of light.
Detailed description of the invention
Embodiment 1
A kind of anti-dazzle glas etching solution, comprises the following raw materials by weight percent: H2SO48.2%、Na2SiF6 1.8%、ZnCl2
4.5%、NH4F 21.5%、CaF2 4.2%、(NH4)2SO4 4.2%、K2SO4 2.5%, the inclined phosphorus of lauryl glucosyl 1.8%, six
Acid sodium 2.2% and water 49.1%.
Utilize the method that above-mentioned etching solution prepares anti-dazzle glas: comprise the following steps:
(1), weigh each raw material by the composition of raw materials of etching solution, add water to H2SO4In, it is stirring evenly and then adding into Na2SiF6、
NH4F and CaF2, after stirring, add ZnCl2 、(NH4)2SO4And K2SO4Stir, add dodecyl Portugal afterwards
Polyglycoside and sodium hexameta phosphate, carry out being aged (digestion time is 24 hours) and obtain anti-dazzle glas etching solution after stirring；
(2), the glass abluent of the pre-etched 1:1 scalemic thereof of acetone and butyl acetate (abluent be) is carried out
And be dried；
(3) the one side paraffin that, cleaned glass be not required to etching covers；
(4), by glass immersing in the etching solution prepared and soak, the temperature controlling etching solution is 20 DEG C, and etching period is 10min
It is etched processing；
(5), take out the flushing of used in glass products clear water, be then placed in the drying baker of 200 DEG C, dry 80min, close baking oven for heating
Switch, takes out from baking oven during Temperature fall to 50 DEG C, makes anti-dazzle glas finished product.
Embodiment 2
A kind of anti-dazzle glas etching solution, comprises the following raw materials by weight percent: H2SO48.6%、Na2SiF6 2%、ZnCl2
5%、NH4F 22.1%、CaF23.8%、(NH4)2SO43.8%、K2SO42.3%, lauryl glucosyl 1.6%, sodium hexameta phosphate
1.8% and water 49%.
Utilize the method that above-mentioned etching solution prepares anti-dazzle glas: comprise the following steps:
(1), weigh each raw material by the composition of raw materials of etching solution, add water to H2SO4In, it is stirring evenly and then adding into Na2SiF6、
NH4F and CaF2, after stirring, add ZnCl2 、(NH4)2SO4And K2SO4Stir, add dodecyl Portugal afterwards
Polyglycoside and sodium hexameta phosphate, carry out being aged (digestion time is 24 hours) and obtain anti-dazzle glas etching solution after stirring；
(2), the glass abluent of the pre-etched 1:1 scalemic thereof of acetone and butyl acetate (abluent be) is carried out
And be dried；
(3) the one side paraffin that, cleaned glass be not required to etching covers；
(4), by glass immersing in the etching solution prepared and soak, the temperature controlling etching solution is 20 DEG C, and etching period is 10min
It is etched processing；
(5), take out the flushing of used in glass products clear water, be then placed in the drying baker of 260 DEG C, dry 70min, close baking oven for heating
Switch, takes out from baking oven during Temperature fall to 50 DEG C, makes anti-dazzle glas finished product.
Embodiment 3
A kind of anti-dazzle glas etching solution, comprises the following raw materials by weight percent: H2SO49.6%、Na2SiF62.2%、ZnCl2
5.5%、NH4F 22.5%、CaF23.6%、(NH4)2SO43.6%、K2SO42.1%, lauryl glucosyl 1.6%, hexa metaphosphoric acid
Sodium 1.6% and water 47.7%.
Utilize the method that above-mentioned etching solution prepares anti-dazzle glas: comprise the following steps:
(1), weigh each raw material by the composition of raw materials of etching solution, add water to H2SO4In, it is stirring evenly and then adding into Na2SiF6、
NH4F and CaF2, after stirring, add ZnCl2 、(NH4)2SO4And K2SO4Stir, add dodecyl Portugal afterwards
Polyglycoside and sodium hexameta phosphate, carry out being aged (digestion time is 24 hours) and obtain anti-dazzle glas etching solution after stirring；
(2), the glass abluent of the pre-etched 1:1 scalemic thereof of acetone and butyl acetate (abluent be) is carried out
And be dried；
(3) the one side paraffin that, cleaned glass be not required to etching covers；
(4), by glass immersing in the etching solution prepared and soak, the temperature controlling etching solution is 20 DEG C, and etching period is 10min
It is etched processing；
(5), take out the flushing of used in glass products clear water, be then placed in the drying baker of 300 DEG C, dry 60min, close baking oven for heating
Switch, takes out from baking oven during Temperature fall to 50 DEG C, makes anti-dazzle glas finished product.
Anti-dazzle glas detection data
Anti-dazzle glas after being processed with embodiment 1-3 by untreated simple glass contrasts, and result is as follows:
。
Claims (5)
1. an anti-dazzle glas etching solution, it is characterised in that: comprise the following raw materials by weight percent: H2SO4 8.2-9.6%、
Na2SiF6 1.8-2.2%、ZnCl2 4.5-5.5%、NH4F 21.5-22.5%、CaF2 3.6-4.2%、(NH4)2SO4 3.6-4.2%、
K2SO4 2.1-2.5%, lauryl glucosyl 1.6-1.8%, sodium hexameta phosphate 1.8-2.2% and water 46-50%.
2. anti-dazzle glas etching solution as claimed in claim 1, it is characterised in that: comprise the following raw materials by weight percent:
H2SO48.6%、Na2SiF6 2%、ZnCl2 5%、NH4F 22.1%、CaF23.8%、(NH4)2SO43.8%、K2SO42.3%, dodecyl
Glucoside 1.6%, sodium hexameta phosphate 1.8% and water 49%.
3. utilize the method that etching solution described in claim 1 prepares anti-dazzle glas, it is characterised in that: the anti-dazzle glas made, its
Transmitance ＞ 94.8%, and can be more than 98%；Mist degree ＞ 1.4%；Sharpen ＜ 72.2%, and be smaller than 66.3%；The reflectance ＜ of light
6.9%, preparation method comprises the following steps:
(1), weigh each raw material by the composition of raw materials of etching solution, add water to H2SO4In, it is stirring evenly and then adding into Na2SiF6 、
NH4F and CaF2, after stirring, add ZnCl2 、(NH4)2SO4And K2SO4Stir, add dodecyl Portugal afterwards
Polyglycoside and sodium hexameta phosphate, carry out ageing and obtain anti-dazzle glas etching solution after stirring；
(2), the glass abluent of pre-etched is carried out and is dried；
(3) the one side paraffin that, cleaned glass be not required to etching covers；
(4), by glass immersing in the etching solution prepared and soak, the temperature controlling etching solution is 20 DEG C, and etching period is 10min
It is etched processing；
(5), take out the flushing of used in glass products clear water, be then placed in the drying baker of 200-300 DEG C, dry 60-80min, close
Baking oven for heating switchs, and takes out, make anti-dazzle glas finished product during Temperature fall to 50 DEG C from baking oven.
4. the preparation method of anti-dazzle glas as claimed in claim 3, it is characterised in that: the ageing in described etching solution preparation process
Time is 24 hours.
5. the preparation method of anti-dazzle glas as claimed in claim 3, it is characterised in that: described abluent is acetone and butyl acetate
Arbitrary proportion mixture.
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|---|---|---|---|
| CN201610553311.XA CN106186713A (en) | 2016-07-14 | 2016-07-14 | A kind of anti-dazzle glas etching solution and the method utilizing this anti-dazzle liquid processing anti-dazzle glas |
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| CN201610553311.XA CN106186713A (en) | 2016-07-14 | 2016-07-14 | A kind of anti-dazzle glas etching solution and the method utilizing this anti-dazzle liquid processing anti-dazzle glas |
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108840577A (en) * | 2018-08-20 | 2018-11-20 | 郑州恒昊光学科技有限公司 | A kind of glass etching liquid and preparation method thereof and the method for preparing glare proof glass using glass etching liquid |
| CN110734229A (en) * | 2019-11-21 | 2020-01-31 | 陕西科技大学 | super-hydrophobic anti-reflection frosted glass and preparation method thereof |
| CN111393031A (en) * | 2020-03-21 | 2020-07-10 | 郑州恒昊光学科技有限公司 | Etching solution for preparing filter glass and preparation method of filter glass |
| CN111977984A (en) * | 2020-08-27 | 2020-11-24 | 郑州恒昊光学科技有限公司 | Etching solution with velvet satin silky effect and manufacturing process of mobile phone glass rear shell of etching solution |
| CN112321170A (en) * | 2020-12-22 | 2021-02-05 | 郑州恒昊光学科技有限公司 | Glass etching solution and method for simulating ceramic kiln-transmutation ice-patterned glass by using same |
| CN112777941A (en) * | 2021-01-13 | 2021-05-11 | 赣州帝晶光电科技有限公司 | Preparation method of AG anti-dazzle glass etching process |
| CN112919816A (en) * | 2021-01-29 | 2021-06-08 | 郑州市亚美凯新材料有限公司 | Frosting powder for processing electronic black-white plate anti-dazzle glass and application thereof |
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| CN108840577A (en) * | 2018-08-20 | 2018-11-20 | 郑州恒昊光学科技有限公司 | A kind of glass etching liquid and preparation method thereof and the method for preparing glare proof glass using glass etching liquid |
| CN108840577B (en) * | 2018-08-20 | 2021-05-14 | 郑州恒昊光学科技有限公司 | Glass etching solution, preparation method thereof and method for preparing anti-glare glass by using glass etching solution |
| CN110734229A (en) * | 2019-11-21 | 2020-01-31 | 陕西科技大学 | super-hydrophobic anti-reflection frosted glass and preparation method thereof |
| CN111393031A (en) * | 2020-03-21 | 2020-07-10 | 郑州恒昊光学科技有限公司 | Etching solution for preparing filter glass and preparation method of filter glass |
| CN111393031B (en) * | 2020-03-21 | 2022-02-15 | 郑州恒昊光学科技有限公司 | Etching solution for preparing filter glass and preparation method of filter glass |
| CN111977984A (en) * | 2020-08-27 | 2020-11-24 | 郑州恒昊光学科技有限公司 | Etching solution with velvet satin silky effect and manufacturing process of mobile phone glass rear shell of etching solution |
| CN111977984B (en) * | 2020-08-27 | 2022-08-26 | 郑州恒昊光学科技有限公司 | Etching solution with velvet satin silky effect and manufacturing process of mobile phone glass rear shell of etching solution |
| CN112321170A (en) * | 2020-12-22 | 2021-02-05 | 郑州恒昊光学科技有限公司 | Glass etching solution and method for simulating ceramic kiln-transmutation ice-patterned glass by using same |
| CN112321170B (en) * | 2020-12-22 | 2022-08-19 | 郑州恒昊光学科技有限公司 | Glass etching solution and method for simulating ceramic kiln-transmutation ice-patterned glass by using same |
| CN112777941A (en) * | 2021-01-13 | 2021-05-11 | 赣州帝晶光电科技有限公司 | Preparation method of AG anti-dazzle glass etching process |
| CN112919816A (en) * | 2021-01-29 | 2021-06-08 | 郑州市亚美凯新材料有限公司 | Frosting powder for processing electronic black-white plate anti-dazzle glass and application thereof |
| CN112919816B (en) * | 2021-01-29 | 2023-05-23 | 郑州市亚美凯新材料有限公司 | Frosting powder for processing anti-dazzle glass of electronic black-and-white plate and application thereof |
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