CN109202637A - Polishing pad, backing pad and hand-hold power tool - Google Patents
Polishing pad, backing pad and hand-hold power tool Download PDFInfo
- Publication number
- CN109202637A CN109202637A CN201810691132.1A CN201810691132A CN109202637A CN 109202637 A CN109202637 A CN 109202637A CN 201810691132 A CN201810691132 A CN 201810691132A CN 109202637 A CN109202637 A CN 109202637A
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- CN
- China
- Prior art keywords
- pad
- polishing pad
- backing
- backing pad
- protrusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B23/00—Portable grinding machines, e.g. hand-guided; Accessories therefor
- B24B23/02—Portable grinding machines, e.g. hand-guided; Accessories therefor with rotating grinding tools; Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/04—Headstocks; Working-spindles; Features relating thereto
Abstract
The present invention relates to a kind of hand-held tool power tools (1) comprising plate backing pad (9) with bottom surface (9a) and has the polishing pad (11) for polishing pad (11) to be releasably attached to the top surface (11a) of the bottom surface (9a) of backing pad (9).Power tool (1) further include it is electric or pneumatic, be suitable for driving backing pad (9).In order to provide easily and rapidly positioning of the polishing pad (11) relative to backing pad (9), it is proposed that the bottom surface (9a) of plate backing pad (9) includes bottom surface (9a) at least one protrusion (13a outstanding from backing pad (9)；13b；13c；13d), and the top surface (11a) of polishing pad (11) includes at least one corresponding recess portion (12a；12b；12c；12d), when the polishing pad (11) is attached to backing pad (9), at least one protrusion (13a；13b；13c；13d) by least one recess portion (12a；12b；12c；12d) receive.
Description
Technical field
The present invention relates to a kind of polishing pad (or burnishing pads) comprising top surface and bottom surface, top surface are used for
Polishing pad is releasably attached to the bottom surface of the plate backing pad of hand-hold power tool, bottom surface is dynamic in hand-held
Towards the surface to be polished of workpiece between the intended performance of power tool.Pass through the electric or pneumatic of hand-hold power tool
It activates backing pad (or lining pad), to make backing pad execute pure rotary operation fortune together with the polishing pad for being attached to it
Dynamic, random orbit Working motion or rotation-track operation movement.
The invention further relates to the plate backing pads of hand-hold power tool, and backing pad includes bottom surface, and polishing pad passes through
Its top surface is releasably attached to bottom surface.Backing pad by hand-hold power tool electric or pneumatic actuating,
So that backing pad carries out pure rotary operation movement, random orbit Working motion or rotation with being attached to together with its polishing pad
Turn-track operation movement.
Finally, the present invention relates to a kind of hand-hold power tools comprising plate backing pad and throwing with bottom surface
Light pad, polishing pad have the top surface for polishing pad to be releasably attached to the bottom surface of backing pad.Power tool
Further include it is electric or pneumatic, be suitable for driving backing pad so that backing pad be attached to together with its polishing pad execute it is pure
Pure rotary operation movement, random orbit Working motion or rotation-track operation movement.
Background technique
The polishing pad of mentioned kind is well known in the prior art, they are used for the work to such as vehicle body or hull
Part is polished.Polishing pad is worn during polishing process.Therefore, polishing pad must be replaced every now and then with new polishing
Pad.In addition, there are also different types of polishing actions to use (the different degrees of intensity of polishing process).For example, having larger rigidity
Foam pad be adapted to carry out the stronger cutting and polishing movement of workpiece to be polished, to be gone from the surface of workpiece to be polished
Except a greater amount of materials and eliminate the bigger scratch in workpiece surface and other defects.In contrast, have smaller rigid
Foam pad is adapted to carry out the soft finishing polishing action of workpiece to be polished, may be by previous cutting and polishing to eliminate
Any whirlpool or other tiny traces generated is acted, and obtains highly uniform and smooth polished surface.Foamed material is not
With the different materials (such as polyamide (PA), polyester etc.) that rigidity is due to using, different pore structures (closed pore or aperture knot
Structure), caused by the polishing pad of various sizes of hole and different-thickness.Therefore, polishing pad also must be by other types of polishing
Pad replacement is to carry out another type of polishing action.
The bottom surface of conventional backing pad is flat or uniformly.Similarly, the top surface of conventional polishing pad is flat
It is smooth or uniform.Conventional polishing pad generally by means of releasable attachment device (such as loop fasteners (such as) it is attached to the bottom surface of backing pad, the attachment device includes (such as backing a pad in respective surfaces
Bottom surface) on hook and the ring on another (such as top surface of polishing pad) in respective surfaces.Hook and ring that
This interacts to provide the releasable attachment of polishing pad to backing pad.Optionally, attachment device can also be in respective surfaces
At least one on include adhesive appropriate.Conventional polishing pad can substantially any (translation and rotation) position and alignment side
Formula is attached on conventional backing pad.
One problem of known power tools is positioning of the polishing pad in the bottom surface of backing pad.If polishing pad point
It not being attached concentrically not exclusively with backing pad or its rotation axis, then entire power tool will be subjected to considerably more intense vibration, this
Appropriate long-time service for power tool is harmful, and can even can not using power tool progress operation
Can.In addition, backing pad and polishing pad may be provided with corresponding through-hole, through-hole is flowed through from operation surface for realizing air-flow
Filter or suction unit, such as vacuum cleaner are flow to at least part of power tool.Air-flow is used for from workpiece
Working surface removes the particle and other powdered granules of dust, abrasive pastes.This be dust exhaust apparatus work normally prerequisite, one
The through-hole in through-hole and another aspect polishing pad in aspect backing pad suitably positions relative to each other, especially with respect to each other
Alignment.
Summary of the invention
It is an object of the present invention to provide a kind of simple and effective modes, so that polishing pad is being attached to backing pad
During, polishing pad is radially correctly positioned and is aligned relative to backing pad by the rotation axis relative to backing pad, with
And the rotation axis relative to backing pad is in rotation (angle) position appropriate.
The purpose by polishing pad with feature described in claim 1, with the backing pad of feature described in claim 7
And hand-hold power tool with feature described in claim 14 solves.
In particular it is proposed that the top surface of polishing pad includes at least one recess portion, which, which is suitable for receiving, is located at plate
At the bottom surface of backing pad and from its at least one corresponding protrusion outstanding.When the bottom that polishing pad is placed on to backing pad
It when on surface, is located and is aligned, so that at least one protrusion enters at least one corresponding recess portion.Therefore, it is described extremely
A few protrusion and recess portion provide polishing pad relative to the accurate positioning of the bottom surface of backing pad and it is also possible to alignment.
Particularly, at least one recess portion on the top surface of polishing pad is corresponding at least one in the bottom surface of backing pad prominent
The cooperation risen allows accurate and quick positioning and attachment of the polishing pad relative to backing pad.Can along translation direction (for example,
Simple centering of the polishing pad relative to the bottom surface of backing pad is provided) and along desired rotation (angle) direction (for example,
Air suction opening and the corresponding opening in polishing pad in backing pad is provided to be easy to be aligned) it is positioned.
Exist in scope of the invention for realizing at least one protrusion and throwing in the bottom surface of plate backing pad
A possibility that many differences of at least one corresponding recess portion on the top surface of light pad.
According to a preferred embodiment of the invention it is suggested that at least one recess portion in polishing pad includes annular groove, the annular
Groove is extended in the top surface of polishing pad relative to the rotation axis of polishing pad in equidistant mode.Therefore, the plate
At least one described protrusion of backing pad includes the bottom surface protrusion from the backing pad and the rotation relative to the backing pad
The annular lining ring that shaft axis extends in equidistant fashion.The rotation axis of backing pad is preferably consistent with the rotation axis of polishing pad.One
The annular groove of aspect and the annular lining ring of another aspect are preferably identical relative to the distance of these axis.Therefore, as general
When polishing pad is attached to backing pad, lining ring is entered in groove and is received by groove.This allows polishing pad in the bottom of backing pad
Accurate positioning in the extension plane on surface.However, polishing pad can relative to backing pad rotation axis with any desired rotation
Turn alignment and is attached to backing pad.In order to allow polishing pad to be only attached in one or more discrete rotation positions, backing pad
It can be equipped at least one the other protrusion being eccentrically located in the bottom surface of backing pad, and polishing pad can be equipped with for connecing
Receive the corresponding other recess portion of one or more of at least one protrusion.For example, annular lining ring can be equipped with the rotation towards backing pad
The single other protrusion that shaft axis extends radially inwardly, and annular groove can be equipped with the rotation axis radial direction towards polishing pad
The one or more grooves to extend internally.Polishing pad can be attached under one or more discrete rotation positions relative to axis
Backing pad, wherein other protrusion is received by one of them other recess portion.
Instead of the groove in polishing pad top surface, it is recessed that outer annular can also be set on the top surface of polishing pad
Portion.The annular projection of backing pad can enter in the annular recess.In this case, it is opened from the exterior circumference of polishing pad
Begin, polishing pad has the annular section of relatively small thickness, and has the circle of larger thickness towards rotation axis more closely polishing pad
Shape part.Annular projection enters annular section and surrounds circular portion, so that polishing pad to be located in the bottom surface of backing pad
On.For this purpose, it is proposed that at least one described recess portion includes annular recess, rotary shaft of the annular recess relative to polishing pad
Line is in equidistant mode along the circumferential registration of the top surface of polishing pad.
Further it is proposed that at least one described recess portion includes multiple isolated recess portions, the multiple isolated recess portion relative to
The rotation axis of polishing pad is located in the top surface of polishing pad in equidistant mode.Similarly, at least one described protrusion packet
Multiple isolated protrusions are included, the bottom surface of each isolated protrusion from backing pad is prominent and there relative to backing pad
Rotation axis is positioned in equidistant mode.The position of isolated recess portion in the top surface of polishing pad corresponds to the bottom of backing pad
The position of isolated protrusion on portion surface, to allow protrusion to enter corresponding recess portion when polishing pad is attached to polishing pad
It is interior.This allows accurate positioning and polishing pad of the polishing pad in the extension plane of the bottom surface of backing pad relative to backing pad
Rotation axis backing pad is attached in a manner of accurate rotary alignment.
Optionally, it is proposed that at least one recess portion includes multiple isolated recess portions in the top surface of polishing pad,
Rotation axis relative to polishing pad has different distances.Similarly, at least one described protrusion includes the prominent of multiple separation
It rises, the prominent and rotation axis relative to the liner of the bottom surface of each isolated protrusion from the backing pad is with difference
Distance positioning.Equally, the position of the separation recess portion in the top surface of polishing pad corresponds in the bottom surface of backing pad
The position of protrusion is separated, to allow protrusion to enter in corresponding recess portion when polishing pad is attached to backing pad.
Alternatively, or in addition, it is proposed that isolated recess portion is to be located at polishing pad relative to each other with different circumferential distances
In top surface.Similarly, isolated protrusion is located in the bottom surface of liner relative to each other with different circumferential distances.
Polishing pad can be made of open-cell foam materials.They have different rigidity, and the heterogeneous expectations that can be used for padding are used
On the way.The different rigidity of foamed material is the different materials (such as polyamide (PA), polyester, polyurethane etc.) due to using, different
Pore structure (closed pore or open-celled structure) and various sizes of hole caused by.
In addition, polishing pad can have the bottom working surface comprising wool or micro fibre material.Wool or microfibre are usual
It is fixed on the support surface of pad, which is releasably attached to the bottom surface of plate backing pad.Support surface can
To be made of rigid plastics or foam-like material.For the heterogeneous expectations purposes of pad, wool or microfibre pad have different rigid
Property.The rigidity of wool or micro fibre material can by the wool or microfibre strand or line of different densities, pass through various wools
Microfibre strand or line different-diameter or changed by using different materials.
Detailed description of the invention
Hereinafter with reference to the attached drawing other feature that the present invention will be described in more detail and advantage.Attached drawing is shown:
Fig. 1 is the hand-hold power tool according to the present invention including backing pad and polishing pad；
Fig. 2 shows the details of polishing pad according to the preferred embodiment of the invention with sectional view；
Fig. 3 goes out plate backing pad and the according to fig. 2 combination of the polishing pad of embodiment with cross sectional view；
Fig. 4 illustrates the combination of plate backing pad and the polishing pad according to Fig. 3 embodiment to have an X-rayed；
Fig. 5 shows the details of the polishing pad of another preferred embodiment according to the present invention with sectional view；
Fig. 6 illustrates the combination of plate backing pad and the polishing pad according to Fig. 5 embodiment to have an X-rayed；
Fig. 7 shows the details of the polishing pad of another preferred embodiment according to the present invention with sectional view；
Fig. 8 goes out the combination of plate backing pad and the polishing pad according to Fig. 7 embodiment with cross sectional view；
Fig. 9 illustrates the combination of plate backing pad and the polishing pad according to Fig. 8 embodiment to have an X-rayed；
Figure 10 shows the details of the polishing pad of another preferred embodiment according to the present invention with sectional view；
Figure 11 illustrates the combination of plate backing pad and the polishing pad according to Figure 10 embodiment to have an X-rayed；
Figure 12 illustrates plate backing pad and the combination of polishing pad of another preferred embodiment according to the present invention to have an X-rayed；
Figure 13 illustrates plate backing pad and the combination of polishing pad of another preferred embodiment according to the present invention to have an X-rayed；With
And
Figure 14 is shown adhered to the combination of the plate backing pad on the polishing pad according to the embodiment of Fig. 3 with perspective view.
Specific embodiment
Referring now to attached drawing, Fig. 1 shows hand-hold power tool 1 according to the present invention, be suitable for it is according to the present invention
Backing pad is used together with the polishing pad for the bottom surface for being attached to backing pad.It is shown in Figure 1 for random orbit polishing tool
The hand-hold power tool 1 of (or polisher) 1 form.Polishing machine 1 has substantially shell 2 made of plastic material.Polishing
Machine 1 has the handle 3 of end setting behind and in the grasping part 4 of its front end setting.There is electric mortiser in its distal end
The power supply line 5 of head leaves at the rear end of handle 3 from shell 2, so as to for be respectively positioned on electric motor inside shell 2 with
Electronic control unit provides electric energy.The electric motor for starting and deactivating power tool 1 is provided at the bottom side of handle 3
Switch 6.Switch 6 can continuously remain in it by button 7 and start under position.Power tool 1 can be equipped with for adjusting tool
The rotation adjustment device (not shown) of the rotation speed of motor.Shell 2 may be provided with cooling opening 8, for allowing from electronics
The heat of control unit and/or electric motor is dispersed into environment.
Power tool 1 shown in Fig. 1 has electric motor.Certainly, machine tools according to the present invention can also be equipped with
Have air motor, this in explosive atmosphere its be particularly advantageous, wherein the spark from electric motor can cause to be included in
The explosion of explosive mixture (such as oxygen and very tiny dust) in environment.In addition, replacing passing through cable 5 for machine
Tool 1 is connected to main power source, and machine tools 1 are alternatively equipped with the rechargeable battery (not shown) being located inside shell 2.
In this case, for driving the electric energy of electric motor that will be provided by battery.Nevertheless, can provide cable 5 so as to for
Battery recharges.
Power tool 1 has plate backing pad 9, can rotate around rotation axis 10 and have the rotation along backing pad
The connecting element (not shown) that shaft axis 10 extends.The backing pad that connecting element is suitable for for backing pad 9 being connected to power tool 1 is protected
Holder (not shown).The bottom surface 9a of backing pad 9 is provided with the device for being attached polishing pad 11 according to the present invention.Attachment
Device may include first layer shackle (hook-and-loop) fastener (or), the wherein top surface of polishing pad 11
11a is provided with second layer loop fasteners.Two layers loop fasteners interact with each other so as to by polishing pad 11 releasedly but
It is safely secured to the bottom surface 9a of backing pad 9.
For stability reasons, plate backing pad 9 is made of semi-rigid material, can preferably have metal insert 17
The plastic material of (referring to Fig. 3 and Fig. 8) is made.Metal insert 17 may include tool internal thread central hollow bushing, be used for
Backing pad 9 is attached to the motor drive shaft of power tool 1.During manufacture backing pad 9, for example, metal is embedding during injection moulding process
Entering part 17, shape cooperates or is snugly assembled in plastic material respectively.Certainly, with Fig. 3 and difference shown in fig. 8.Out
In stability reasons, a part of metal insert 17 is also extended to realize the bottom surface 9a of backing pad 9 and is set
In at least part for the board plastic material radially extended set.Plastic material for example can be the glass fibers with up to 30%
Tie up the PA66 (polyamide) of enhancing.Any other plastic material can be used, be rigidly enough on the one hand in power tool 1
It carries and supports polishing pad 11 between intended performance, and substantially downward and be parallel to the rotation axis 10 of backing pad
To 11 applied force of polishing pad on direction, and on the other hand its sufficiently flexible is carried out operation by polishing pad 11 to avoid treating
Surface damages or scrapes.It is even possible that entire backing pad is made of metal such as aluminium.
Polishing pad 11 is used in particular for the form to hull or any other part for vehicle or vehicle body or ships and light boats or ships
Workpiece polished.Workpiece is preferably by timber, metal, plastics or composite material (such as (GFR) or carbon of glass fiber reinforcement
Fibre-reinforced (CFR) material) it is made, and certain priming coat, prime paint, coating and/or clear can be provided with or without
Paint.Certain antiscuffing paste or polishing fluid can be applied on operation surface, to enhance the throwing of polishing pad 11 between its intended performance
Light effect.For example, polishing pad can be made of spongy or foam-like material, especially by the poly- ammonia such as with open-celled structure
The plastic material of ester is made.In addition, polishing pad may include support construction, which is such as had closed pore knot by plastic material
Fuel plate made of the polyurethane of structure is constituted, and wherein microfibre is attached to the bottom surface of support construction.Microfibre is by polyester
And/or polyamide is made.Finally, polishing pad may include support construction, which such as has open-celled structure by plastic material
Polyurethane made of sponge element constitute, wherein natural or synthetic wool is attached to the bottom surface of support construction.With
In lower embodiment, polishing pad 11 is made of spongy material, but certainly, it can also be with for other types of polishing pad 11
The present invention is realized well.
Polishing pad 11 includes bottom working surface 11b, can be polished to workpiece surface by it.Polishing pad 11 preferably by
Plastic foam material (such as polyamide (PA), polyester, polyurethane etc.) with open-celled structure is made.Polishing pad 11 is for polishing
The heterogeneous expectations purposes (such as stronger cutting and polishing movement or softr finishing polishing action of workpiece) of pad 11 can
With different rigidity.The different rigidity of foamed material is the different-thickness, different due to the different materials, pad 11 that use
Caused by pore structure (closed pore or open-celled structure) and various sizes of hole.Bottom working surface 11b is preferably by the bubble of pad 11
Foam plastic material is made.Optionally, polishing pad 11 can include wool or micro fibre material on its bottom surface 11b.In addition,
Polishing pad 11 preferably with the form of frustum of a cone, has more smaller than bottom working surface 11b so as to cause top surface 11a
Diameter, and lead to the angled circumferential side wall 11c between top surface 11a and bottom surface 11b.Certainly, polishing pad 11
It can have the form of top and bottom the surface 11a, 11b of same diameter and the cylindrical body of upright circumferential side wall 11c, the circle
All side wall 11c are extended vertically relative to top and bottom surface 11a, 11b.If necessary, the bottom work of polishing pad 11
Surface 11b may include any kind of three-dimensional structure, such as the Waffle with the recess and Gao Po that are displaced relative to each other
Structure (not shown).
The present invention proposes a kind of polishing pad 11 and a kind of plate backing pad 9, they are suitable for the bottom surface in backing pad 9
And it may be also relative under the predetermined rotational positions of the rotation axis 10 of backing pad 9 under predetermined position in the extension plane of 9a
The rapidly and effectively attachment that polishing pad 11 arrives backing pad 9 is provided.Particularly, through the invention, polishing pad 11 can be easily
9 centerings are padded relative to backing, if polishing pad 11 is correctly attached to backing pad 9,14 phase of rotation axis of polishing pad 11
The rotation axis 10 of backing pad 9 is consistently extended.
According to fig. 2 to the first embodiment of the present invention shown in Fig. 4, the top surface 11a of polishing pad 11 includes at least one
A recess portion 12a, recess portion 12a, which are suitable for receiving, is located at the bottom surface 9a of plate backing pad 9 and outstanding at least from bottom surface 9a
One corresponding protrusion 13a.In this embodiment, protrusion 13a includes annular lining ring, and the annular lining ring is relative to backing pad 9
Rotation axis 10 is extended in equidistant mode along the entire exterior circumference of the bottom surface 9a of backing pad 9.It is of course also possible to deposit
Extend in multiple protrusion 13a, each protrusion 13a all along the specific part of the exterior circumference of the bottom surface 9a of backing pad 9.Phase
Ying Di, in the embodiment of Fig. 2 to Fig. 4, at least one recess portion 12a includes annular groove, and the groove is relative to polishing pad 11
Rotation axis 14 is extended in equidistant mode along the whole circumference in the top surface 11a of polishing pad 11.It is of course also possible to
There are multiple recess portion 12a, each recess portion 12a extends all along the specific part of the circumference of the top surface 11a of polishing pad 11.It should
The advantages of embodiment is that backing pad 9 easily for example can pass through injection molding with the PA66 of glass fiber reinforcement by a kind of plastic material
Technique is made.
The top surface 11a of polishing pad 11 and the bottom surface 9a of backing pad 9 are at least partly provided with attachment device, excellent
It is selected as the loop fasteners for polishing pad 11 to be attached to backing pad 9 in the case where being directed at positionIn the embodiment
In, preferably only the central part 15 of the top surface 11a of the polishing pad 11 in annular recess 12a is provided with attachment device.Cause
This, the outer annular portions 16 for extending to the top surface 11a of the polishing pad 11 outside annular recess 12a do not have attachment dress
It sets.It that case, the entire bottom surface 9a of the backing pad 9 in annular lining ring 13a will be equipped with corresponding attachment device.
On at least one recess portion 12a and bottom surface 9a of backing pad 9 on the top surface 11a of polishing pad 11 at least
The cooperation of one corresponding protrusion 13a allows that precisely and rapidly polishing pad 11 is positioned and is attached relative to backing pad 9.It can be with
On the direction translation (translational) (for example, provide polishing pad 11 relative to backing pad 9 bottom surface 9a it is simple
Centering) and in the desired manner rotate (angle) direction (such as provide backing pad 9 in air suction opening and the phase in polishing pad 11
What should be open is easy to align with) realize positioning.
The embodiment described allows to throw under the predetermined translation position in the extension plane of the bottom surface 9a of backing pad 9
Light pad 11 is accurately positioned relative to backing pad 9.This may be enough in many cases.However, it is noted that only passing through
Annular groove 12a and annular lining ring 13a, polishing pad 11 can (0 ° extremely in any Angle Position relative to rotation axis 10,14
360 °) under be attached to the bottom surface 9a of backing pad 9.In this embodiment, polishing pad 11 is relative to backing pad 9 not desired
It is possible for rotating alignment under (angle) position.In order to realize the purpose, can respectively on the bottom surface 9a of backing pad 9 or
One or more other protrusions and corresponding recess portion are realized in the top surface 11a of polishing pad 11, are neither circumferential
Ground (for example, at least partly relative to rotation axis 10,14 in the radial direction) extends.It is shown in FIG. 12 and is suitable in this way
Embodiment example, wherein additional protrusion is indicated with appended drawing reference 13b, and additional corresponding recess portion appended drawing reference
12b is indicated.Additional protrusions 13b is designed to have generally radially extending flat condition element.Additional well 12b is designed to
With generally radially extending correspondence linear grooves.Certainly, polishing pad 11 can be provided only with additional well 12b, without
Annular groove 12a.Correspondingly, backing pad 9 can be provided only with additional protrusions 13b, without annular lining ring 13a.In addition, additional prominent
Quantity, form, translation and the angle position for playing 13b and corresponding additional well 12b can be different from shown in Figure 12.
Another embodiment in figure 13 illustrates allows quickly and precisely centering of the polishing pad 11 relative to backing pad 9
And polishing pad 11 is fixed relative to the angle fast and accurately of backing pad 9 under the required rotation position around axis 10,14
Position.Here, additional protrusion is indicated by appended drawing reference 13c, and additional corresponding recess portion is indicated by appended drawing reference 12c.One
A or multiple additional protrusions 13c and corresponding additional well 12c also do not circumferentially extend, but are located around axis 10,14 not
At continuous rotation position.Additional protrusions 13c has the form of cylindrical body, but can certainly have any other form.In addition
The distance between protrusion 13c and rotation axis 10 can be identical or different.Similarly, corresponding other recess portion 12c and rotation
The distance between shaft axis 14 can be identical or different.Certainly, backing pad 9 can be provided only with additional protrusions 13c, without ring
Shape lining ring 13a.It that case, polishing pad 11 can be provided only with additional well 12c, without annular groove 12a.This
Outside, quantity, form, translation and the angle position of additional protrusions 13c and corresponding additional well 12c can with shown in Figure 13
It is different.
Another embodiment of the invention is shown in fig. 5 and fig..With Fig. 2 to embodiment shown in Fig. 4 on the contrary, at this
In another embodiment, annular lining ring 13d is not arranged in the outer edge of backing pad 9, but be arranged with outer edge at a distance of certain
At distance, the slot milling 18 between the outer edge of polishing pad 11 and the outer edge of backing pad 9.In power according to this embodiment
Between tool 1 and backing pad 9 and the intended performance of polishing pad 11, the outer edge part of polishing pad 11 can be forced upward into space
In 18.The outer edge part limitation of the outer edge part of polishing pad 11 moved up by backing pad 9, is the outside of polishing pad 11
Edge point provides certain retainer.In this embodiment, at least one recess portion 12d packet in the top surface 11a of polishing pad 11
It includes space 18 and extends directly to the outer edge of polishing pad 11.
The top surface 11a of polishing pad 11 and the bottom surface 9a of backing pad 9 are at least partly provided with attachment device, excellent
It is selected as the loop fasteners for polishing pad 11 to be attached to backing pad 9 in the case where being directed at positionIn the embodiment
In, preferably only the central part 15 of the top surface 11a of the polishing pad 11 in annular recess 12d is provided with attachment device.Cause
This, the outer annular portion 16 (bottom surface for forming recess portion 12d) of polishing pad 11 is not provided with attachment device.Similarly, excellent
The central part 19 of the only bottom surface 9a of the backing pad 9 in annular projection 13d is selected to be provided with attachment device.Therefore, backing
The outer annular portion 20 of pad 9 does not have attachment device in the outside of annular lining ring 13d.
In this embodiment, protrusion 13d includes annular lining ring, rotation axis 10 of the annular lining ring relative to backing pad 9
And prolonged in equidistant mode along the whole circumference of the bottom surface 9a of backing pad 9 relative to the outer circumferential edges of backing pad 9
It stretches.It is of course also possible to be there are multiple protrusion 13d, each protrusion 13d along the bottom surface 9a of backing pad 9 outer circle
The specific part in week extends.It is also possible that there are multiple recess portion 12d, top surface 11a of each recess portion along polishing pad 11
The specific part of the circumference of outer edge part extends.
In addition, it is also possible that there are additional protrusion in the embodiment of Fig. 5 and Fig. 6, if Figure 12 and 13 is from polishing
The bottom surface 9a of pad 9 protrusion 13b and 13c outstanding.Correspondingly, the top surface 11a of polishing pad 11 also can be set attached
Add recess portion, such as the recess portion 12b, 12c of Figure 12 and Figure 13.
Another embodiment is shown into Fig. 9 in Fig. 7.In this embodiment, the annular, peripheral protrusion 13a of Fig. 2 to Fig. 4 with
The annular, peripheral recess portion 12d of Fig. 5 to Fig. 6 is combined.
The top surface 11a of polishing pad 11 and the bottom surface 9a of backing pad 9 are at least partly provided with attachment device, excellent
It is selected as the loop fasteners for polishing pad 11 to be attached to backing pad 9 in the case where being directed at positionIn the embodiment
In, preferably only the central part 15 of the top surface 11a of the polishing pad 11 in annular recess 12d is provided with attachment device.Cause
This, the outer annular portion 16 (bottom surface for forming recess portion 12d) of polishing pad 11 does not have attachment device.In that situation
Under, the entire bottom surface 9a of the backing pad 9 in annular lining ring 13a will be provided with corresponding attachment device.
In this embodiment, protrusion 13a includes annular lining ring, rotation axis 10 of the annular lining ring relative to backing pad 9
Extended in equidistant mode along the entire excircle of the bottom surface 9a of backing pad 9.It is of course also possible to be that there are multiple prominent
13a is played, each protrusion extends all along the specific part of the excircle of the bottom surface 9a of backing pad 9.It is also possible to exist more
A recess portion 12d, each recess portion 12d prolong along the specific part of the circumference of the outer edge part of the top surface 11a of polishing pad 11
It stretches.
In addition, it is also possible that there are additional protrusion in the embodiment of Fig. 7 to Fig. 9, as in Figure 12 and Figure 13 from
The bottom surface 9a of polishing pad 9 protrusion 13b and 13c outstanding.Correspondingly, the top surface 11a of polishing pad 11 also can be set
There is additional well, such as the recess portion 12b, 12c of Figure 12 and Figure 13.
Another embodiment is shown in Figure 10 and Figure 11.In this embodiment, the annular projection 13d of Fig. 5 and Fig. 6 and figure
2 to Fig. 4 ring shaped axial groove 12a is combined.
The top surface 11a of polishing pad 11 and the bottom surface 9a of backing pad 9 are at least partly provided with attachment device, excellent
It is selected as the loop fasteners for polishing pad 11 to be attached to backing pad 9 in the case where being directed at positionIn the embodiment
In, the entire bottom surface 9a (including part of the surface 19 and 20) of backing pad 9 and the entire top surface 11a (packet of polishing pad 11
It includes part of the surface 15 and 16) is provided with corresponding attachment device.
In this embodiment, protrusion 13d includes relative to the outer circumferential edges of rotation axis 10 and backing pad 9 with equidistant
The annular lining ring that mode extends along the whole circumference of the bottom surface 9a of backing pad 9.It is of course also possible to be that there are multiple
Protrusion 13d, each protrusion 13d extend along the specific part of the circumference of the bottom surface 9a of backing pad 9.There may also be multiple
Groove 12a, each groove 12a extend in top surface 11a along the specific part of the circumference of polishing pad 11.
In addition, it is also possible that there are additional protrusion in the embodiment of Figure 10 and Figure 11, as Figure 12 and Figure 13 from
The bottom surface 9a of backing pad 9 protrusion 13b and 13c outstanding.Correspondingly, the top surface 11a of polishing pad 11 also can be set
There is additional well, such as the recess portion 12b, 12c of Figure 12 and Figure 13.
Finally, Figure 14 is shown according to fig. 2 to the polishing pad 11 for being releasably attached to backing pad 9 of the embodiment of Fig. 4
Perspective view.Annular projection 13a on the bottom surface 9a of backing pad 9 is inserted into the annular on the top surface 11a of polishing pad 11
In groove 12a, therefore the two all be can't see in Figure 14.
One aspect of the present invention is mentioned between the top surface 11a of polishing pad 11 and the bottom surface 9a of backing pad 9
For the releasable connection of plug type type.For this purpose, at least one protrusion 13a；13b；13b；13d and for receiving protrusion
13a；13b；13b；The corresponding recess portion 12a of at least one of 13d；12b；12b；12d is separately positioned on the bottom surface of backing pad 9
In the upper top surface 11a with polishing pad 11 of 9a.It is preferred that but not necessarily protrusion 13a；13b；13b；13d and recess portion 12a；
12b；12c；The quantity of 12d is identical.Polishing pad 11 is quickly attached to backing pad 9 under desired translation position by this permission, from
And polishing pad 11 is allowed to be easy centering relative to backing pad 9.In addition, correspondingly, by positioning and designing at least one protrusion
13a；13b；13c；13d recess portion 12a corresponding at least one；12b；12c；12d, polishing pad 11 even can be relative to backings
Pad 9 is located under desired rotation (or angle) position (around rotation axis 10,14), thus allows to be arranged in backing pad 9
Suction hole be aligned with the corresponding opening in polishing pad 11.
Claims (16)
1. polishing pad (11) comprising for polishing pad (11) to be releasably attached to the plate of hand-hold power tool (1)
The top surface (11a) of the bottom surface (9a) of backing pad (9) and the bottom surface suitable for being polished to workpiece surface
(11b), by the electric or pneumatic actuating backing pad (9) of hand-hold power tool (1), so as to make backing pad (9) with it is attached
The polishing pad (11) for being connected to it executes pure rotary operation movement, random orbit Working motion or rotation-track operation together
Movement；It is characterized by: the top surface (11a) of polishing pad (11) includes at least one recess portion (12a；12b；12c；12d), when
When polishing pad (11) is attached to backing pad (9), at least one recess portion (12a；12b；12c；12d) it is suitable for receiving being located at plate
At the bottom surface (9a) of backing pad (9) and from its at least one corresponding protrusion (13a outstanding；13b；13c；13d).
2. polishing pad (11) according to claim 1, which is characterized in that at least one described recess portion includes annular groove
(12a), the annular groove (12a) relative to the polishing pad (11) rotation axis (14) in equidistant mode in the throwing
Extend in the top surface (11a) of light pad (11).
3. polishing pad (11) according to claim 1, wherein at least one described recess portion includes annular recess (12d), institute
State annular recess (12d) relative to the polishing pad (11) rotation axis (14) in equidistant mode along the polishing pad
(11) the top surface (11a) excircle positioning.
4. polishing pad (11) according to claim 1, which is characterized in that at least one described recess portion includes multiple separation
Recess portion (12a；12b；12c；12d), multiple isolated recess portion (12a；12b；12c；12d) the rotation relative to the polishing pad (11)
Shaft axis (14) is located in the top surface (11a) of the polishing pad (11) in equidistant mode.
5. polishing pad (11) according to claim 1, which is characterized in that at least one described recess portion includes multiple separation
Recess portion (12a；12b；12c；12d), multiple isolated recess portion (12a；12b；12c；12d) the rotary shaft relative to polishing pad (11)
Line (14) is located in the top surface (11a) of the polishing pad (11) with different distances.
6. polishing pad (11) according to claim 4 or 5, which is characterized in that the isolated recess portion (12a；12b；12c；
12d) it is located in the top surface (11a) of the polishing pad (11) with different circumferential distances relative to each other.
7. a kind of plate backing pad (9) of hand-hold power tool (1), backing pad (9) includes being suitable for releasedly attachment polishing
The bottom surface (9a) of the top surface (11a) of (11) is padded, backing pad (9) is electric and pneumatic by hand-hold power tool (1)
It is motor actuated, so that backing pad (9) carries out pure rotary operation movement, random rail with the polishing pad (11) for being attached to it together
Road Working motion or rotation-track operation movement, it is characterised in that: the bottom surface (9a) of the plate backing pad (9) includes
At least one protrusion (13a；13b；13c；13d), the protrusion (13a；13b；13c；13d) from the bottom of the backing pad (9)
Surface (9a) is prominent, and is suitable for being entered when polishing pad (11) is attached to backing pad (9) positioned at polishing pad (11) upper top table
Respective recess (12a in face (8a)；12b 12c 12d) in.
8. backing pad (9) according to claim 7, which is characterized in that at least one described protrusion includes from the backing
The ring that the bottom surface (9a) of pad (9) is protruded and extended relative to the rotation axis of backing pad (9) (10) in equidistant mode
Shape lining ring (13a；13d).
9. backing pad (9) according to claim 8, which is characterized in that the annular lining ring (13a；13d) along the back
The excircle for padding (9) extends.
10. backing pad (9) according to claim 8, which is characterized in that the annular lining ring (13a；13d) relative to institute
The excircle for stating backing pad (9) is extended in equidistant mode.
11. backing pad (9) according to any one of claims 7 to 10, which is characterized in that at least one described protrusion packet
Include multiple isolated protrusion (13a；13b；13c；13d), each isolated protrusion (13a；13b；13c；13d) from the backing pad
(9) the bottom surface (9a) it is prominent and there the rotation axis (10) relative to backing pad (9) in equal mode
Positioning.
12. backing pad (9) according to any one of claims 7 to 10, which is characterized in that at least one described protrusion
It (14) include multiple isolated protrusion (13a；13b；13c；13d), each isolated protrusion (13a；13b；13c；13d) from backing
The bottom surface (9a) for padding (9) protrudes and relative to the rotation axis of backing pad (9) (10) with different Distance positionings.
13. backing pad (9) according to claim 11 or 12, which is characterized in that the isolated protrusion (13a；13b；
13c；13d) it is located in the bottom surface (9a) of the backing pad (9) with different circumferential distances relative to each other.
14. a kind of hand-hold power tool (1) comprising plate backing pad (9) with bottom surface (9a) and there is top
The polishing pad (11) on surface (11a), bottom surface (9a) and top surface (11a) are suitable for for polishing pad (11) being releasedly attached
To backing pad (9), hand-hold power tool (1) further include it is electric or pneumatic, be suitable for driving backing pad (9), so that back
Liner (9) executes pure rotary operation movement, random orbit Working motion or rotation with the polishing pad (11) for being attached to it together
Turn-track operation movement；It is characterized by: the bottom surface (9a) of the plate backing pad (9) includes from the bottom of backing pad (9)
Portion surface (9a) at least one protrusion (13a outstanding；13b；13c；13d) and the top surface (11a) of polishing pad (11) wraps
Include at least one corresponding recess portion (12a；12b；12c；12d), wherein when polishing pad (11) is attached to plate backing pad (9),
At least one protrusion (13a；13b；13c；13d) by least one recess portion (12a；12b；12c；12d) receive.
15. power tool (1) according to claim 14, which is characterized in that the plate backing pad (9) is wanted according to right
One in 7 to 13 is asked to be designed.
16. power tool (1) according to claim 14 or 15, which is characterized in that the polishing pad (11) is according to right
It is required that one in 2 to 6 is designed.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EPEP171788391 | 2017-06-29 | ||
| EP17088391 | 2017-06-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109202637A true CN109202637A (en) | 2019-01-15 |
Family
ID=64989514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810691132.1A Pending CN109202637A (en) | 2017-06-29 | 2018-06-28 | Polishing pad, backing pad and hand-hold power tool |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109202637A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110434716A (en) * | 2019-08-16 | 2019-11-12 | 天津大学 | A kind of power/adaptive grinding and polishing apparatus of position controllable face type and method |
| CN113146437A (en) * | 2020-01-23 | 2021-07-23 | 盖多·瓦伦蒂尼 | Protective cover for a power tool of the manual type and power tool of the manual type |
| CN115106898A (en) * | 2021-03-23 | 2022-09-27 | 安德里亚·瓦伦蒂尼 | Plate-shaped backing plate suitable for detachable attachment to a hand-held polishing or sanding power tool |
| CN110434716B (en) * | 2019-08-16 | 2024-04-26 | 天津大学 | Force/position controllable surface type self-adaptive polishing device and method |
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| CN110434716B (en) * | 2019-08-16 | 2024-04-26 | 天津大学 | Force/position controllable surface type self-adaptive polishing device and method |
| CN113146437A (en) * | 2020-01-23 | 2021-07-23 | 盖多·瓦伦蒂尼 | Protective cover for a power tool of the manual type and power tool of the manual type |
| CN115106898A (en) * | 2021-03-23 | 2022-09-27 | 安德里亚·瓦伦蒂尼 | Plate-shaped backing plate suitable for detachable attachment to a hand-held polishing or sanding power tool |
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