US20190001459A1 - Polishing pad for a releasable attachment to a bottom surface of a plate-like backing pad of a power tool, backing pad and hand-held power tool - Google Patents
Polishing pad for a releasable attachment to a bottom surface of a plate-like backing pad of a power tool, backing pad and hand-held power tool Download PDFInfo
- Publication number
- US20190001459A1 US20190001459A1 US16/009,469 US201816009469A US2019001459A1 US 20190001459 A1 US20190001459 A1 US 20190001459A1 US 201816009469 A US201816009469 A US 201816009469A US 2019001459 A1 US2019001459 A1 US 2019001459A1
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- US
- United States
- Prior art keywords
- pad
- polishing pad
- backing
- backing pad
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B23/00—Portable grinding machines, e.g. hand-guided; Accessories therefor
- B24B23/02—Portable grinding machines, e.g. hand-guided; Accessories therefor with rotating grinding tools; Accessories therefor
- B24B23/022—Spindle-locking devices, e.g. for mounting or removing the tool
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B23/00—Portable grinding machines, e.g. hand-guided; Accessories therefor
- B24B23/02—Portable grinding machines, e.g. hand-guided; Accessories therefor with rotating grinding tools; Accessories therefor
- B24B23/028—Angle tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B23/00—Portable grinding machines, e.g. hand-guided; Accessories therefor
- B24B23/04—Portable grinding machines, e.g. hand-guided; Accessories therefor with oscillating grinding tools; Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
- B24D13/147—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face comprising assemblies of felted or spongy material; comprising pads surrounded by a flexible material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/20—Mountings for the wheels
Definitions
- the present invention refers to a polishing pad (or polishing pad) comprising a top surface for releasable attachment of the polishing pad to a bottom surface of a plate-like backing pad of a hand-held power tool and a bottom surface directed towards a surface of a workpiece to be polished during an intended use of the hand-held power tool.
- the backing pad (or backing pad) is actuated by an electric or pneumatic motor of the hand-held power tool, in order to make the backing pad together with the polishing pad attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement.
- the invention also refers to a plate-like backing pad of a hand-held power tool, the backing pad comprising a bottom surface to which a polishing pad is releasably attachable with its top surface.
- the backing pad is actuated by an electric or pneumatic motor of the hand-held power tool, in order to make the backing pad together with the polishing pad attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement.
- the invention refers to a hand-held power tool comprising a plate-like backing pad with a bottom surface and a polishing pad with a top surface for releasable attachment of the polishing pad to the bottom surface of the backing pad.
- the power tool further comprises an electric or pneumatic motor adapted for actuating the backing pad, in order to make the backing pad together with the polishing pad attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement.
- polishing pad wears off during the polishing process. Therefore, the polishing pad has to be replaced by a new one from time to time. Furthermore, there are different types of polishing action (different degrees of intensity of the polishing process). For example, foam pads having a large rigidity are adapted for effecting a more intense cutting polishing action of a workpiece to be polished, in order to remove a larger amount of material from a working surface of the workpiece to be polished and to eliminate larger scratches and other defects in the working surface.
- foam pads having a smaller rigidity are adapted for effecting a soft finishing polishing action of the working surface to be polished, in order to delete any swirls or other fine marks which may result from the previous cutting polishing action and to obtain a very even and smooth polished surface.
- the different rigidities of the foam material are a result either of different materials used (e.g. Polyamide (PA), Polyester, etc.), different cell structures (closed-cell or open-cell structure), different sizes of the cells and different thicknesses of the polishing pads. Therefore, polishing pads will also have to be replaced by other types of polishing pads for conducting another type of polishing action.
- the bottom surface of conventional backing pads is flat or even.
- the top surface of conventional polishing pads is flat or even.
- Conventional polishing pads are usually attached to the bottom surface of a backing pad by means of releasable attachment means, for example a hook-and-loop fastener (e.g. Velcro®), comprising hooks on one of the corresponding surfaces (e.g. bottom surface of the backing pad) and loops on the other one of the corresponding surfaces (e.g. top surface of the polishing pad).
- the hooks and loops interact with one another in order to provide for a releasable attachment of the polishing pad to the backing pad.
- the attachment means may also comprises an appropriate adhesive on at least one of the corresponding surfaces.
- Conventional polishing pads can be attached to conventional backing pads in almost any (translational and rotational) position and alignment.
- the backing pad and the polishing pad may be provided with corresponding through holes for realizing an air flow running from the working surface through the through holes and at least part of the power tool to a filter or a suction device, such as a vacuum cleaner.
- the air flow serves for removing dust, particles of abrasive paste and other pulverulent particles from the working surface of the work piece. It is a precondition for a proper functioning of the dust suction device that the through holes in the backing pad on the one hand and in the polishing pad on the other hand are properly positioned in respect to one another, in particular aligned in respect to each other.
- the top surface of the polishing pad comprises at least one recess adapted for receiving at least one corresponding protrusion located at and protruding from the bottom surface of the plate-like backing pad.
- the polishing pad When placing the polishing pad on the bottom surface of the backing pad, it is positioned and aligned such that the at least one protrusion enters into the at least one corresponding recess. Therefore, the at least one protrusion and recess provide for a precise positioning and possibly also alignment of the polishing pad in respect to the bottom surface of the backing pad.
- the co-operation of the at least one recess on the top surface of the polishing pad with the at least one corresponding protrusion on the bottom surface of the backing pad allows an exact and fast positioning and attachment of the polishing pad in respect to the backing pad.
- the positioning can be effected in a translational direction (e.g. providing for an easy centering of the polishing pad in respect to the bottom surface of the backing pad) as well as in a desired rotational (angular) direction (e.g. providing for an easy alignment of dust suction holes in the backing pad with respective openings in the polishing pad).
- the at least one recess in the polishing pad comprises an annular groove extending in the top surface of the polishing pad in an equidistant manner in respect to a rotational axis of the polishing pad.
- the at least one protrusion of the plate-like backing pad comprises an annular collar protruding from the bottom surface of the backing pad and extending in an equidistant manner in respect to a rotational axis of the backing pad.
- the rotational axis of the backing pad is preferably congruent with the rotational axis of the polishing pad.
- the distances of the annular groove on the one hand and of the annular collar on the other hand in respect to these axes are preferably identical.
- the collar when attaching the polishing pad to the backing pad the collar enters into and is received by the groove.
- the polishing pad can be attached to the backing pad in any desired rotational alignment in respect to the rotational axis of the backing pad.
- the backing pad could be provided with at least one further protrusion located eccentrically on the bottom surface of the backing pad and the polishing pad could be provided with one or more corresponding further recesses for receiving the at least one protrusion.
- the annular collar could be provided with a single further protrusion extending radially inwards towards the rotational axis of the backing pad and the annular groove could be provided with one or more grooves extending radially inwards towards the rotational axis of the polishing pad.
- the polishing pad can be attached to the backing pad in one or more discrete rotational positions in respect to the axes, in which the further protrusion is received by one of the further recesses.
- the polishing pad instead of a groove in the top surface of the polishing pad, it is also possible to provide an outer annular recess on the top surface of the polishing pad.
- the annular protrusion of the backing pad can enter into this annular recess.
- the polishing pad has an annular section with a smaller thickness and, going further towards the rotational axis, the polishing pad has a circular section with a larger thickness.
- the annular protrusion enters into the annular section and encompasses the circular section, thereby positioning the polishing pad on the bottom surface of the backing pad.
- the at least one recess comprises an annular recess located along a circumference of the top surface of the polishing pad in an equidistant manner in respect to a rotational axis of the polishing pad.
- the at least one recess comprises a plurality of separate recesses located in the top surface of the polishing pad in an equidistant manner in respect to a rotational axis of the polishing pad.
- the at least one protrusion comprises a plurality of separate protrusions each protruding from the bottom surface of the backing pad and located there in an equidistant manner in respect to a rotational axis of the backing pad.
- the positions of the separate recesses in the top surface of the polishing pad correspond to the positions of the separate protrusions on the bottom surface of the backing pad, in order to allow the protrusions to enter into the corresponding recesses when attaching the polishing pad to the backing pad. This allows a precise positioning of the polishing pad in the plane of extension of the bottom surface of the backing pad as well as an attachment of the polishing pad to the backing pad in a precise rotational alignment in respect to the rotational axis of the backing pad.
- the at least one recess comprises a plurality of separate recesses located in the top surface of the polishing pad with different distances in respect to a rotational axis of the polishing pad.
- the at least one protrusion comprises a plurality of separate protrusions each protruding from the bottom surface of the backing pad and located there with different distances in respect to a rotational axis of the backing pad.
- the positions of the separate recesses in the top surface of the polishing pad correspond to the positions of the separate protrusions on the bottom surface of the backing pad, in order to allow the protrusions to enter into the corresponding recesses when attaching the polishing pad to the backing pad.
- the separate recesses are located in the top surface of the polishing pad with different circumferential distances in respect to one another.
- the separate protrusions are located on the bottom surface of the backing pad with different circumferential distances in respect to one another.
- the polishing pads can be made of an open-cell foamed material. They are available in different rigidities for different intended uses of the pad. The different rigidities of the foam material are a result either of different materials used (e.g. Polyamide (PA), Polyester, Polyurethane, etc.), different cell structures (closed-cell or open-cell structure) and different sizes of the cells.
- materials used e.g. Polyamide (PA), Polyester, Polyurethane, etc.
- cell structures closed-cell or open-cell structure
- different sizes of the cells e.g. Polyamide (PA), Polyester, Polyurethane, etc.
- the polishing pads may have a bottom working surface comprising wool or a microfiber material.
- the wool or microfibers are usually fixed to a supporting surface of the pad, which is releasably attached to the bottom surface of the plate-like backing pad.
- the supporting surface can be made of rigid plastic or a foam-like material. Wool or microfiber pads are available in different rigidities for different intended uses of the pad.
- the rigidities of the wool or microfiber material can be varied by different densities of the wool or microfiber strands or threads, by different diameters of each of the wool or microfiber strands or threads, or by using different materials.
- FIG. 1 a hand-held power tool comprising a backing pad and a polishing pad according to the present invention
- FIG. 2 a detail of a polishing pad according to a preferred embodiment of the invention in a sectional view
- FIG. 3 a combination of a plate-like backing pad and a polishing pad according to the embodiment of FIG. 2 in a sectional view;
- FIG. 4 the combination of the plate-like backing pad and the polishing pad according to the embodiment of FIG. 3 in a perspective view;
- FIG. 5 a detail of a polishing pad according to another preferred embodiment of the invention in a sectional view
- FIG. 6 a combination of a plate-like backing pad and a polishing pad according to the embodiment of FIG. 5 in a perspective view;
- FIG. 7 a detail of a polishing pad according to another preferred embodiment of the invention in a sectional view
- FIG. 8 a combination of a plate-like backing pad and a polishing pad according to the embodiment of FIG. 7 in a sectional view;
- FIG. 9 the combination of the plate-like backing pad and the polishing pad according to the embodiment of FIG. 8 in a perspective view
- FIG. 10 a detail of a polishing pad according to another preferred embodiment of the invention in a sectional view
- FIG. 11 a combination of a plate-like backing pad and a polishing pad according to the embodiment of FIG. 10 in a perspective view;
- FIG. 12 a combination of a plate-like backing pad and a polishing pad according to another preferred embodiment of the invention in a perspective view;
- FIG. 13 a combination of a plate-like backing pad and a polishing pad according to another preferred embodiment of the invention in a perspective view
- FIG. 14 the combination of the plate-like backing pad attached the polishing pad according to the embodiment of FIG. 3 in a perspective view.
- FIG. 1 shows a hand-held power tool 1 according to the present invention adapted to be used with a backing pad and a polishing pad attached to a bottom surface of the backing pad according to the present invention.
- a hand-held power tool 1 in the form of a random orbital polishing tool (or polisher) 1 is shown.
- the polisher 1 has a housing 2 , essentially made of a plastic material.
- the polisher 1 is provided with a handle 3 at its rear end and a grip 4 at its front end.
- An electric power supply line 5 with an electric plug at its distal end exits the housing 2 at the rear end of the handle 3 , in order to provide an electric motor and an electronic control unit both located inside the housing 2 with electric energy.
- a switch 6 is provided for activating and deactivating the electric motor of the power tool 1 .
- the switch 6 can be continuously held in its activated position by means of a push button 7 .
- the power tool 1 can be provided with a rotary adjustment means (not shown) for adjusting the rotational speed of the tool's motor.
- the housing 2 can be provided with cooling openings 8 for allowing heat from the electronic control unit and/or the electric motor to dissipate into the environment.
- the power tool 1 shown in FIG. 1 has an electric motor.
- the machine tool according to the present invention could also be equipped with a pneumatic motor, which is especially advantageous in explosive environments, where sparks from an electric motor could provoke an explosion of an explosive mixture (e.g. oxygen and very fine dust) contained in the environment.
- an explosive mixture e.g. oxygen and very fine dust
- the machine tool 1 could alternatively be equipped with a rechargeable battery (not shown) located inside the housing 2 . In that case the electric energy for driving the electric motor would be provided by the battery. Nonetheless, an electric cable 5 could be provided in order to recharge the battery.
- the power tool 1 has a plate-like backing pad 9 rotatable about a rotational axis 10 and having a connection element (not shown) extending along the backing pad's rotational axis 10 .
- the connection element is adapted for connecting the backing pad 9 to a backing pad holder (not shown) of the power tool 1 .
- a bottom surface 9 a of the backing pad 9 is provided with means for releasably attaching a polishing pad 11 according to the present invention.
- the attachment means can comprise a first layer of a hook-and-loop fastener (or Velcro®), wherein the top surface 11 a of the polishing pad 11 is provided with the second layer of the hook-and-loop fastener.
- the two layers of the hook-and-loop fastener interact with one another in order to releasably but safely fix the polishing pad 11 to the bottom surface 9 a of the backing pad 9 .
- the plate-like backing pad 9 is made of a semi-rigid material, preferably a plastic material possibly with a metal insert 17 (see FIGS. 3 and 8 ) for stability reasons.
- the metal insert 17 may comprise a central hollow bushing with an internal thread for connection of the backing pad 9 to a motor shaft of a power tool 1 .
- the metal insert 17 is form-fit or positive-fit, respectively, into the plastics material during manufacturing of the backing pad 9 , e.g. during an injection molding process.
- part of the metal insert 17 could also extend into at least part of the radially extending plate-like plastics material provided for realizing the bottom surface 9 a of the backing pad 9 .
- the plastic material may be, for example, PA66 (polyamide) reinforced with up to 30% of glass fiber. Any other plastics material can be used, which on the one hand is rigid enough to carry and support the polishing pad 11 during the intended use of the power tool 1 and to apply a force to the polishing pad 11 in a direction essentially downwards and parallel to the backing pad's rotational axis 10 and which on the other hand is flexible enough to avoid damage or scratching of the surface to be worked by the polishing pad 11 . It is even possible that the entire backing pad is made of metal, for example aluminum.
- the polishing pad 11 is in particular used for polishing a workpiece in the form of a vehicle or car body or the hull or any other part of a boat or ship.
- the workpiece is preferably made of wood, metal, plastic or a composite material (e.g. glass fiber reinforced, GFR, or carbon fiber reinforced, CFR, material) and may be provided with or without some kind of base coat, primer, paint and/or varnish.
- Some kind of polishing paste or polishing liquid may be applied to the working surface in order to enhance the polishing effect of the polishing pad 11 during its intended use.
- the polishing pad can be made of a sponge- or foam-like material, in particular a plastics material like polyurethane with an open-cell structure.
- the polishing pad can comprise a support structure consisting of a plate-like element made of a plastics material, like polyurethane with a closed-cell structure, with microfibers attached to the bottom surface of the support structure.
- the microfibers are made of polyester and/or polyamide.
- the polishing pad can comprise a support structure consisting of a sponge-like element made of a plastics material, like polyurethane with an open-cell structure, with natural or synthetic wool attached to the bottom surface of the support structure.
- the polishing pad 11 is made of sponge-like material but of course, the invention could be perfectly well also realized for other types of polishing pads 11 .
- the polishing pad 11 comprises a bottom working surface 11 b with which the surface of the workpiece can be polished.
- the polishing pad 11 is preferably made of foamed plastics material having an open-cell structure (e.g. Polyamide (PA), Polyester, Polyurethane, etc.).
- the polishing pads 11 are available in different rigidities for different intended uses of the pad 11 (e.g. a more intense cutting polishing action of a workpiece or a softer finishing polishing action).
- the different rigidities of the foamed material are a result either of different materials used, different thicknesses of the pad 11 , different cell structures (closed-cell or open-cell structure) and different sizes of the cells.
- the bottom working surface 11 b is preferably made of the foamed plastic material of the pad 11 .
- polishing pad 11 may comprise wool or microfiber material on its bottom surface 11 b .
- the polishing pad 11 preferably has the form of a truncated cone resulting in the top surface 11 a having a smaller diameter than the bottom working surface 11 b and in a slanting circumferential side wall 11 c between the top surface 11 a and the bottom surface 11 b .
- the polishing pad 11 may also have the form of a cylinder with top and bottom surfaces 11 a , 11 b of the same diameter and an upright circumferential side wall 11 c , running perpendicular in respect to the top and bottom surfaces 11 a , 11 b .
- the bottom working surface 11 b of the polishing pad 11 may comprise any type of three-dimensional structure, if desired, for example a waffle structure having depressions and hills located displaced in respect to one another (not shown).
- the present invention suggests a polishing pad 11 and a plate-like backing pad 9 , which are both adapted for providing for a fast and efficient attachment of the polishing pad 11 to the backing pad 9 in a predefined position in the plane of extension of the bottom surface 9 a of the backing pad 9 and possibly also in a predefined rotational position in respect to a rotational axis 10 of the backing pad 9 .
- the polishing pad 11 can be easily centered in respect to the backing pad 9 . If the polishing pad 11 is properly attached to the backing pad 9 a rotational axis 14 of the polishing pad 11 runs congruent in respect to the rotational axis 10 of the backing pad 9 .
- top surface 11 a of the polishing pad 11 comprises at least one recess 12 a adapted for receiving at least one corresponding protrusion 13 a located at and protruding from the bottom surface 9 a of the plate-like backing pad 9 .
- the protrusion 13 a comprises an annular collar extending along the entire outer circumference of the bottom surface 9 a of the backing pad 9 in an equidistant manner in respect to the rotational axis 10 of the backing pad 9 .
- the at least one recess 12 a comprises an annular groove extending along the entire circumference in the top surface 11 a of the polishing pad 11 in an equidistant manner in respect to the rotational axis 14 of the polishing pad 11 .
- the advantage of this embodiment is that the backing pad 9 can be easily made out of a plastics material, for example PA66 reinforced with glass fibers, by means of an injection molding process.
- the top surface 11 a of the polishing pad 11 and the bottom surface 9 a of the backing pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
- attachment means preferably a hook-and-loop fastener (Velcro®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
- Velcro® hook-and-loop fastener
- the co-operation of the at least one recess 12 a on the top surface 11 a of the polishing pad 11 with the at least one corresponding protrusion 13 a on the bottom surface 9 a of the backing pad 9 allows an exact and fast positioning and attachment of the polishing pad 11 in respect to the backing pad 9 .
- the positioning can be effected in a translational direction (e.g. providing for an easy centering of the polishing pad 11 in respect to the bottom surface 9 a of the backing pad 9 ) as well as in a desired rotational (angular) direction (e.g. providing for an easy alignment of dust suction holes in the backing pad 9 with respective openings in the polishing pad 11 ).
- the described embodiment allows exact positioning of the polishing pad 11 in respect to the backing pad 9 in a predefined translational position within the plane of extension of the bottom surface 9 a of the backing pad 9 . This may be sufficient in many cases. However, it is noted that with the annular groove 12 a and the annular collar 13 a only, the polishing pad 11 can be attached to the bottom surface 9 a of the backing pad 9 in any angular position (0° . . . 360°) in respect to the rotational axes 10 , 14 . In this embodiment no alignment of the polishing pad 11 in respect to the backing pad 9 in a desired rotational (angular) position is possible.
- one or more further protrusions and corresponding recesses may be realized on the bottom surface 9 a of the backing pad 9 or in the top surface 11 a of the polishing pad 11 , respectively, both not extending circumferentially (e.g. at least partly in a radial direction in respect to the rotational axes 10 , 14 ).
- An example for such an embodiment is shown in FIG. 12 , where the additional protrusions are indicated with reference sign 13 b and the additional corresponding recesses are indicated with reference sign 12 b .
- the additional protrusions 13 b are designed as even plain-like elements having an essentially radial extension.
- the additional recesses 12 b are designed as corresponding linear grooves having an essentially radial extension.
- the polishing pad 11 could be provided with the additional recesses 12 b only, without the annular groove 12 a .
- the backing pad 9 could be provided with the additional protrusions 13 b only, without the annular collar 13 a .
- the number, form, translational and angular position of the additional protrusions 13 b and the corresponding additional recesses 12 b could vary from what is shown in FIG. 12 .
- FIG. 13 Another embodiment, which allows a fast and precise centering of the polishing pad 11 in respect to the backing pad 9 as well as a fast and precise angular positioning of the polishing pad 11 in respect to the backing pad 9 in a desired rotational position about the axes 10 , 14 , is shown in FIG. 13 .
- the additional protrusions are indicated with reference sign 13 c and the additional corresponding recesses are indicated with reference sign 12 c .
- the one or more additional protrusions 13 c and the corresponding additional recesses 12 c do also not extend circumferentially but are rather located at discrete rotational positions about the axes 10 , 14 .
- the additional protrusions 13 c have the form of cylinders but of course may have any other form, too.
- the distances between the further protrusions 13 c and the rotational axis 10 may be identical or different.
- the distances between the corresponding further recesses 12 c and the rotational axis 14 may be identical or different.
- the backing pad 9 could be provided with the additional protrusions 13 c only, without the annular collar 13 a .
- the polishing pad 11 could be provided with the additional recesses 12 c only, without the annular groove 12 a .
- the number, form, translational and angular position of the additional protrusions 13 c and the corresponding additional recesses 12 c could vary from what is shown in FIG. 13 .
- FIGS. 5 and 6 A further embodiment of the present invention is shown in FIGS. 5 and 6 .
- an annular collar 13 d is not provided at the outer edge of the backing pad 9 but rather in a distance to the outer edge leaving a space 18 between the outer edge of the polishing pad 11 and the outer edge of the backing pad 9 .
- the outer edge portion of the polishing pad 11 may be pressed upwards into the space 18 .
- the upward movement of the outer edge portion of the polishing pad 11 is limited by the outer edge portion of the backing pad 9 providing for some kind of stopper for the outer edge portion of the polishing pad 11 .
- the at least one recess 12 d in the top surface 11 a of the polishing pad 11 comprises the space 18 and extends right to the outer edge of the polishing pad 11 .
- the top surface 11 a of the polishing pad 11 and the bottom surface 9 a of the backing pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
- attachment means preferably a hook-and-loop fastener (Velcro®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
- Velcro® hook-and-loop fastener
- the protrusion 13 d comprises an annular collar extending along the entire circumference of the bottom surface 9 a of the backing pad 9 in an equidistant manner in respect to the rotational axis 10 of the backing pad 9 and in respect to the outer circumferential edge of the backing pad 9 .
- there is a plurality of recesses 12 d each of which extending along a certain section of the circumference of the outer edge portion of the top surface 11 a of the polishing pad 11 .
- FIGS. 5 and 6 it is also possible in the embodiment of FIGS. 5 and 6 that there are additional protrusions, like the protrusions 13 b and 13 c of FIGS. 12 and 13 , protruding from the bottom surface 9 a of the backing pad 9 .
- the top surface 11 a of the polishing pad 11 may also be provided with additional recesses, like the recesses 12 b , 12 c of FIGS. 12 and 13 .
- FIGS. 7 to 9 Yet another embodiment is shown in FIGS. 7 to 9 .
- the annular circumferential protrusion 13 a of FIGS. 2 to 4 is combined with the annular circumferential recess 12 d of FIGS. 5 and 6 .
- the top surface 11 a of the polishing pad 11 and the bottom surface 9 a of the backing pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
- attachment means preferably a hook-and-loop fastener (Velcro®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
- Velcro® hook-and-loop fastener
- the protrusion 13 a comprises an annular collar extending along the entire outer circumference of the bottom surface 9 a of the backing pad 9 in an equidistant manner in respect to the rotational axis 10 of the backing pad 9 .
- FIGS. 7 to 9 it is also possible in the embodiment of FIGS. 7 to 9 that there are additional protrusions, like the protrusions 13 b and 13 c of FIGS. 12 and 13 , protruding from the bottom surface 9 a of the backing pad 9 .
- the top surface 11 a of the polishing pad 11 may also be provided with additional recesses, like the recesses 12 b , 12 c of FIGS. 12 and 13 .
- FIGS. 10 and 11 Yet another embodiment is shown in FIGS. 10 and 11 .
- the annular protrusion 13 d of FIGS. 5 and 6 is combined with the annular circumferential groove 12 a of FIGS. 2 to 4 .
- the top surface 11 a of the polishing pad 11 and the bottom surface 9 a of the backing pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
- attachment means preferably a hook-and-loop fastener (Velcro®) for attaching the polishing pad 11 to the backing pad 9 in the aligned position.
- Velcro® hook-and-loop fastener
- the protrusion 13 d comprises an annular collar extending along the entire circumference of the bottom surface 9 a of the backing pad 9 in an equidistant manner in respect to the rotational axis 10 and to the outer circumferential edge of the backing pad 9 .
- FIGS. 10 and 11 it is also possible in the embodiment of FIGS. 10 and 11 that there are additional protrusions, like the protrusions 13 b and 13 c of FIGS. 12 and 13 , protruding from the bottom surface 9 a of the backing pad 9 .
- the top surface 11 a of the polishing pad 11 may also be provided with additional recesses, like the recesses 12 b , 12 c of FIGS. 12 and 13 .
- FIG. 14 shows a perspective view of the polishing pad 11 releasably attached to the backing pad 9 according to the embodiment of FIGS. 2 to 4 .
- the annular protrusion 13 a on the bottom surface 9 a of the backing pad 9 is inserted into the annular groove 12 a on the top surface 11 a of the polishing pad 11 , and therefore both are not visible in FIG. 14 .
- at least one protrusion 13 a ; 13 b ; 13 c ; 13 d and at least one corresponding recess 12 a ; 12 b ; 12 c ; 12 d for receiving the protrusions 13 a ; 13 b ; 13 c ; 13 d are provided on the bottom surface 9 a of the backing pad 9 and in the top surface 11 a of the polishing pad 11 , respectively.
- the number of protrusions 13 a ; 13 b ; 13 c ; 13 d and recesses 12 a ; 12 b ; 12 c ; 12 d is the same. This allows a fast attachment of a polishing pad 11 to a backing pad 9 in a desired translational position thereby permitting an easy centering of the polishing pad 11 in respect to the backing pad 9 .
- the polishing pad 11 can even be positioned in a desired rotational (or angular) position (about the rotational axes 10 , 14 ) in respect to the backing pad 9 thereby permitting alignment of suction holes provided in the backing pad 9 with corresponding openings in the polishing pad 11 .
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- Polishing Bodies And Polishing Tools (AREA)
Abstract
The invention refers to a hand-held power tool (1) comprising a plate-like backing pad (9) with a bottom surface (9a) and a polishing pad (11) with a top surface (11a) for releasable attachment of the polishing pad (11) to the bottom surface (9a) of the backing pad (9). The power tool (1) further comprises an electric or pneumatic motor adapted for actuating the backing pad (9), in order to make the backing pad (9) together with the polishing pad (11) attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement. In order to provide for an easy and fast positioning of the polishing pad (11) in respect to the backing pad (9) it is suggested that the bottom surface (9a) of the plate-like backing pad (9) comprises at least one protrusion (13a; 13b; 13c; 13d) protruding from the bottom surface (9a) of the backing pad (9) and the top surface (11a) of the polishing pad (11) comprises at least one corresponding recess (12a; 12b; 12c; 12d), wherein the at least one protrusion (13a; 13b; 13c; 13d) is received by the at least one recess (12a; 12b; 12c; 12d) when the polishing pad (11) is attached to the backing pad (9).
Description
- The present invention refers to a polishing pad (or polishing pad) comprising a top surface for releasable attachment of the polishing pad to a bottom surface of a plate-like backing pad of a hand-held power tool and a bottom surface directed towards a surface of a workpiece to be polished during an intended use of the hand-held power tool. The backing pad (or backing pad) is actuated by an electric or pneumatic motor of the hand-held power tool, in order to make the backing pad together with the polishing pad attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement.
- The invention also refers to a plate-like backing pad of a hand-held power tool, the backing pad comprising a bottom surface to which a polishing pad is releasably attachable with its top surface. The backing pad is actuated by an electric or pneumatic motor of the hand-held power tool, in order to make the backing pad together with the polishing pad attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement.
- Finally, the invention refers to a hand-held power tool comprising a plate-like backing pad with a bottom surface and a polishing pad with a top surface for releasable attachment of the polishing pad to the bottom surface of the backing pad. The power tool further comprises an electric or pneumatic motor adapted for actuating the backing pad, in order to make the backing pad together with the polishing pad attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement.
- Power tools of the above mentioned kind for polishing a surface of a workpiece, for example a vehicle body or a boat hull, are well known in the art. The polishing pad wears off during the polishing process. Therefore, the polishing pad has to be replaced by a new one from time to time. Furthermore, there are different types of polishing action (different degrees of intensity of the polishing process). For example, foam pads having a large rigidity are adapted for effecting a more intense cutting polishing action of a workpiece to be polished, in order to remove a larger amount of material from a working surface of the workpiece to be polished and to eliminate larger scratches and other defects in the working surface. In contrast thereto, foam pads having a smaller rigidity are adapted for effecting a soft finishing polishing action of the working surface to be polished, in order to delete any swirls or other fine marks which may result from the previous cutting polishing action and to obtain a very even and smooth polished surface. The different rigidities of the foam material are a result either of different materials used (e.g. Polyamide (PA), Polyester, etc.), different cell structures (closed-cell or open-cell structure), different sizes of the cells and different thicknesses of the polishing pads. Therefore, polishing pads will also have to be replaced by other types of polishing pads for conducting another type of polishing action.
- The bottom surface of conventional backing pads is flat or even. Similarly, the top surface of conventional polishing pads is flat or even. Conventional polishing pads are usually attached to the bottom surface of a backing pad by means of releasable attachment means, for example a hook-and-loop fastener (e.g. Velcro®), comprising hooks on one of the corresponding surfaces (e.g. bottom surface of the backing pad) and loops on the other one of the corresponding surfaces (e.g. top surface of the polishing pad). The hooks and loops interact with one another in order to provide for a releasable attachment of the polishing pad to the backing pad. Alternatively, the attachment means may also comprises an appropriate adhesive on at least one of the corresponding surfaces. Conventional polishing pads can be attached to conventional backing pads in almost any (translational and rotational) position and alignment.
- One problem of the known power tools is the positioning of the polishing pads on the bottom surface of the backing pad. If the polishing pad is attached not exactly concentrically to the backing pad or its rotational axis, respectively, the entire power tool will be subject to rather strong vibrations which are detrimental to a proper long term use of the power tool and can make working with the power tool even impossible. Furthermore, the backing pad and the polishing pad may be provided with corresponding through holes for realizing an air flow running from the working surface through the through holes and at least part of the power tool to a filter or a suction device, such as a vacuum cleaner. The air flow serves for removing dust, particles of abrasive paste and other pulverulent particles from the working surface of the work piece. It is a precondition for a proper functioning of the dust suction device that the through holes in the backing pad on the one hand and in the polishing pad on the other hand are properly positioned in respect to one another, in particular aligned in respect to each other.
- It is an object of the present invention to provide for an easy and efficient way of properly positioning and aligning the polishing pad in respect to the backing pad during attachment of the polishing pad to the backing pad radially in respect to the rotational axis of the backing pad as well as in a proper rotational (angular) position in respect to the rotational axis of the backing pad.
- This object is solved by a polishing pad with the features of
claim 1, by a backing pad with the features ofclaim 7 and by a hand-held power tool with the features ofclaim 14. - In particular, it is suggested that the top surface of the polishing pad comprises at least one recess adapted for receiving at least one corresponding protrusion located at and protruding from the bottom surface of the plate-like backing pad. When placing the polishing pad on the bottom surface of the backing pad, it is positioned and aligned such that the at least one protrusion enters into the at least one corresponding recess. Therefore, the at least one protrusion and recess provide for a precise positioning and possibly also alignment of the polishing pad in respect to the bottom surface of the backing pad. In particular the co-operation of the at least one recess on the top surface of the polishing pad with the at least one corresponding protrusion on the bottom surface of the backing pad allows an exact and fast positioning and attachment of the polishing pad in respect to the backing pad. The positioning can be effected in a translational direction (e.g. providing for an easy centering of the polishing pad in respect to the bottom surface of the backing pad) as well as in a desired rotational (angular) direction (e.g. providing for an easy alignment of dust suction holes in the backing pad with respective openings in the polishing pad).
- There are many different possibilities for realizing the at least one protrusion on the bottom surface of the plate-like backing pad and the corresponding at least one recess on the top surface of the polishing pad within the realm of the present invention.
- According to a preferred embodiment of the present invention it is suggested that the at least one recess in the polishing pad comprises an annular groove extending in the top surface of the polishing pad in an equidistant manner in respect to a rotational axis of the polishing pad. Accordingly, the at least one protrusion of the plate-like backing pad comprises an annular collar protruding from the bottom surface of the backing pad and extending in an equidistant manner in respect to a rotational axis of the backing pad. The rotational axis of the backing pad is preferably congruent with the rotational axis of the polishing pad. The distances of the annular groove on the one hand and of the annular collar on the other hand in respect to these axes are preferably identical. Hence, when attaching the polishing pad to the backing pad the collar enters into and is received by the groove. This allows a precise positioning of the polishing pad in the plane of extension of the bottom surface of the backing pad. However, the polishing pad can be attached to the backing pad in any desired rotational alignment in respect to the rotational axis of the backing pad. In order to allow attachment of the polishing pad in only one or more discrete rotational positions, the backing pad could be provided with at least one further protrusion located eccentrically on the bottom surface of the backing pad and the polishing pad could be provided with one or more corresponding further recesses for receiving the at least one protrusion. For example, the annular collar could be provided with a single further protrusion extending radially inwards towards the rotational axis of the backing pad and the annular groove could be provided with one or more grooves extending radially inwards towards the rotational axis of the polishing pad. The polishing pad can be attached to the backing pad in one or more discrete rotational positions in respect to the axes, in which the further protrusion is received by one of the further recesses.
- Instead of a groove in the top surface of the polishing pad, it is also possible to provide an outer annular recess on the top surface of the polishing pad. The annular protrusion of the backing pad can enter into this annular recess. In this case, starting from the outer circumference of the polishing pad, the polishing pad has an annular section with a smaller thickness and, going further towards the rotational axis, the polishing pad has a circular section with a larger thickness. The annular protrusion enters into the annular section and encompasses the circular section, thereby positioning the polishing pad on the bottom surface of the backing pad. To this end it is suggested that the at least one recess comprises an annular recess located along a circumference of the top surface of the polishing pad in an equidistant manner in respect to a rotational axis of the polishing pad.
- Furthermore, it is suggested that the at least one recess comprises a plurality of separate recesses located in the top surface of the polishing pad in an equidistant manner in respect to a rotational axis of the polishing pad. Similarly, the at least one protrusion comprises a plurality of separate protrusions each protruding from the bottom surface of the backing pad and located there in an equidistant manner in respect to a rotational axis of the backing pad. The positions of the separate recesses in the top surface of the polishing pad correspond to the positions of the separate protrusions on the bottom surface of the backing pad, in order to allow the protrusions to enter into the corresponding recesses when attaching the polishing pad to the backing pad. This allows a precise positioning of the polishing pad in the plane of extension of the bottom surface of the backing pad as well as an attachment of the polishing pad to the backing pad in a precise rotational alignment in respect to the rotational axis of the backing pad.
- Alternatively, it is suggested that the at least one recess comprises a plurality of separate recesses located in the top surface of the polishing pad with different distances in respect to a rotational axis of the polishing pad. Similarly, the at least one protrusion comprises a plurality of separate protrusions each protruding from the bottom surface of the backing pad and located there with different distances in respect to a rotational axis of the backing pad. Again, the positions of the separate recesses in the top surface of the polishing pad correspond to the positions of the separate protrusions on the bottom surface of the backing pad, in order to allow the protrusions to enter into the corresponding recesses when attaching the polishing pad to the backing pad. Alternatively or additionally it is suggested that the separate recesses are located in the top surface of the polishing pad with different circumferential distances in respect to one another. Similarly, the separate protrusions are located on the bottom surface of the backing pad with different circumferential distances in respect to one another.
- The polishing pads can be made of an open-cell foamed material. They are available in different rigidities for different intended uses of the pad. The different rigidities of the foam material are a result either of different materials used (e.g. Polyamide (PA), Polyester, Polyurethane, etc.), different cell structures (closed-cell or open-cell structure) and different sizes of the cells.
- Furthermore, the polishing pads may have a bottom working surface comprising wool or a microfiber material. The wool or microfibers are usually fixed to a supporting surface of the pad, which is releasably attached to the bottom surface of the plate-like backing pad. The supporting surface can be made of rigid plastic or a foam-like material. Wool or microfiber pads are available in different rigidities for different intended uses of the pad. The rigidities of the wool or microfiber material can be varied by different densities of the wool or microfiber strands or threads, by different diameters of each of the wool or microfiber strands or threads, or by using different materials.
- Further characteristics and advantages of the present invention will be described hereinafter in more detail making reference to the accompanying figures. The figures show:
-
FIG. 1 a hand-held power tool comprising a backing pad and a polishing pad according to the present invention; -
FIG. 2 a detail of a polishing pad according to a preferred embodiment of the invention in a sectional view; -
FIG. 3 a combination of a plate-like backing pad and a polishing pad according to the embodiment ofFIG. 2 in a sectional view; -
FIG. 4 the combination of the plate-like backing pad and the polishing pad according to the embodiment ofFIG. 3 in a perspective view; -
FIG. 5 a detail of a polishing pad according to another preferred embodiment of the invention in a sectional view; -
FIG. 6 a combination of a plate-like backing pad and a polishing pad according to the embodiment ofFIG. 5 in a perspective view; -
FIG. 7 a detail of a polishing pad according to another preferred embodiment of the invention in a sectional view; -
FIG. 8 a combination of a plate-like backing pad and a polishing pad according to the embodiment ofFIG. 7 in a sectional view; -
FIG. 9 the combination of the plate-like backing pad and the polishing pad according to the embodiment ofFIG. 8 in a perspective view; -
FIG. 10 a detail of a polishing pad according to another preferred embodiment of the invention in a sectional view; -
FIG. 11 a combination of a plate-like backing pad and a polishing pad according to the embodiment ofFIG. 10 in a perspective view; -
FIG. 12 a combination of a plate-like backing pad and a polishing pad according to another preferred embodiment of the invention in a perspective view; -
FIG. 13 a combination of a plate-like backing pad and a polishing pad according to another preferred embodiment of the invention in a perspective view; and -
FIG. 14 the combination of the plate-like backing pad attached the polishing pad according to the embodiment ofFIG. 3 in a perspective view. - With reference now to the drawings,
FIG. 1 shows a hand-heldpower tool 1 according to the present invention adapted to be used with a backing pad and a polishing pad attached to a bottom surface of the backing pad according to the present invention. InFIG. 1 a hand-heldpower tool 1 in the form of a random orbital polishing tool (or polisher) 1 is shown. Thepolisher 1 has ahousing 2, essentially made of a plastic material. Thepolisher 1 is provided with ahandle 3 at its rear end and agrip 4 at its front end. An electricpower supply line 5 with an electric plug at its distal end exits thehousing 2 at the rear end of thehandle 3, in order to provide an electric motor and an electronic control unit both located inside thehousing 2 with electric energy. At the bottom side of the handle 3 aswitch 6 is provided for activating and deactivating the electric motor of thepower tool 1. Theswitch 6 can be continuously held in its activated position by means of apush button 7. Thepower tool 1 can be provided with a rotary adjustment means (not shown) for adjusting the rotational speed of the tool's motor. Thehousing 2 can be provided withcooling openings 8 for allowing heat from the electronic control unit and/or the electric motor to dissipate into the environment. - The
power tool 1 shown inFIG. 1 has an electric motor. Of course, the machine tool according to the present invention could also be equipped with a pneumatic motor, which is especially advantageous in explosive environments, where sparks from an electric motor could provoke an explosion of an explosive mixture (e.g. oxygen and very fine dust) contained in the environment. Furthermore, instead of the connection of themachine tool 1 to a mains power supply by means of theelectric cable 5, themachine tool 1 could alternatively be equipped with a rechargeable battery (not shown) located inside thehousing 2. In that case the electric energy for driving the electric motor would be provided by the battery. Nonetheless, anelectric cable 5 could be provided in order to recharge the battery. - The
power tool 1 has a plate-like backing pad 9 rotatable about arotational axis 10 and having a connection element (not shown) extending along the backing pad'srotational axis 10. The connection element is adapted for connecting thebacking pad 9 to a backing pad holder (not shown) of thepower tool 1. Abottom surface 9 a of thebacking pad 9 is provided with means for releasably attaching apolishing pad 11 according to the present invention. The attachment means can comprise a first layer of a hook-and-loop fastener (or Velcro®), wherein thetop surface 11 a of thepolishing pad 11 is provided with the second layer of the hook-and-loop fastener. The two layers of the hook-and-loop fastener interact with one another in order to releasably but safely fix thepolishing pad 11 to thebottom surface 9 a of thebacking pad 9. - The plate-
like backing pad 9 is made of a semi-rigid material, preferably a plastic material possibly with a metal insert 17 (seeFIGS. 3 and 8 ) for stability reasons. Themetal insert 17 may comprise a central hollow bushing with an internal thread for connection of thebacking pad 9 to a motor shaft of apower tool 1. Themetal insert 17 is form-fit or positive-fit, respectively, into the plastics material during manufacturing of thebacking pad 9, e.g. during an injection molding process. Of course, differently to what is shown inFIGS. 3 and 8 , for stability reasons part of themetal insert 17 could also extend into at least part of the radially extending plate-like plastics material provided for realizing thebottom surface 9 a of thebacking pad 9. The plastic material may be, for example, PA66 (polyamide) reinforced with up to 30% of glass fiber. Any other plastics material can be used, which on the one hand is rigid enough to carry and support thepolishing pad 11 during the intended use of thepower tool 1 and to apply a force to thepolishing pad 11 in a direction essentially downwards and parallel to the backing pad'srotational axis 10 and which on the other hand is flexible enough to avoid damage or scratching of the surface to be worked by thepolishing pad 11. It is even possible that the entire backing pad is made of metal, for example aluminum. - The
polishing pad 11 is in particular used for polishing a workpiece in the form of a vehicle or car body or the hull or any other part of a boat or ship. The workpiece is preferably made of wood, metal, plastic or a composite material (e.g. glass fiber reinforced, GFR, or carbon fiber reinforced, CFR, material) and may be provided with or without some kind of base coat, primer, paint and/or varnish. Some kind of polishing paste or polishing liquid may be applied to the working surface in order to enhance the polishing effect of thepolishing pad 11 during its intended use. For example, the polishing pad can be made of a sponge- or foam-like material, in particular a plastics material like polyurethane with an open-cell structure. Furthermore, the polishing pad can comprise a support structure consisting of a plate-like element made of a plastics material, like polyurethane with a closed-cell structure, with microfibers attached to the bottom surface of the support structure. The microfibers are made of polyester and/or polyamide. Finally, the polishing pad can comprise a support structure consisting of a sponge-like element made of a plastics material, like polyurethane with an open-cell structure, with natural or synthetic wool attached to the bottom surface of the support structure. In the following embodiments thepolishing pad 11 is made of sponge-like material but of course, the invention could be perfectly well also realized for other types of polishingpads 11. - The
polishing pad 11 comprises abottom working surface 11 b with which the surface of the workpiece can be polished. Thepolishing pad 11 is preferably made of foamed plastics material having an open-cell structure (e.g. Polyamide (PA), Polyester, Polyurethane, etc.). Thepolishing pads 11 are available in different rigidities for different intended uses of the pad 11 (e.g. a more intense cutting polishing action of a workpiece or a softer finishing polishing action). The different rigidities of the foamed material are a result either of different materials used, different thicknesses of thepad 11, different cell structures (closed-cell or open-cell structure) and different sizes of the cells. Thebottom working surface 11 b is preferably made of the foamed plastic material of thepad 11. Alternatively, polishingpad 11 may comprise wool or microfiber material on itsbottom surface 11 b. Further, thepolishing pad 11 preferably has the form of a truncated cone resulting in thetop surface 11 a having a smaller diameter than thebottom working surface 11 b and in a slanting circumferential side wall 11 c between thetop surface 11 a and thebottom surface 11 b. Of course, thepolishing pad 11 may also have the form of a cylinder with top andbottom surfaces bottom surfaces bottom working surface 11 b of thepolishing pad 11 may comprise any type of three-dimensional structure, if desired, for example a waffle structure having depressions and hills located displaced in respect to one another (not shown). - The present invention suggests a
polishing pad 11 and a plate-like backing pad 9, which are both adapted for providing for a fast and efficient attachment of thepolishing pad 11 to thebacking pad 9 in a predefined position in the plane of extension of thebottom surface 9 a of thebacking pad 9 and possibly also in a predefined rotational position in respect to arotational axis 10 of thebacking pad 9. In particular, by means of the present invention thepolishing pad 11 can be easily centered in respect to thebacking pad 9. If thepolishing pad 11 is properly attached to thebacking pad 9 arotational axis 14 of thepolishing pad 11 runs congruent in respect to therotational axis 10 of thebacking pad 9. - According to a first embodiment of the invention shown in
FIGS. 2 to 4 atop surface 11 a of thepolishing pad 11 comprises at least onerecess 12 a adapted for receiving at least one correspondingprotrusion 13 a located at and protruding from thebottom surface 9 a of the plate-like backing pad 9. In this embodiment theprotrusion 13 a comprises an annular collar extending along the entire outer circumference of thebottom surface 9 a of thebacking pad 9 in an equidistant manner in respect to therotational axis 10 of thebacking pad 9. Of course, it would also be possible that there is a plurality ofprotrusions 13 a each of which extending along a certain section of the outer circumference of thebottom surface 9 a of thebacking pad 9. Correspondingly, in the embodiment ofFIGS. 2 to 4 the at least onerecess 12 a comprises an annular groove extending along the entire circumference in thetop surface 11 a of thepolishing pad 11 in an equidistant manner in respect to therotational axis 14 of thepolishing pad 11. Of course, it would also be possible that there is a plurality ofrecesses 12 a each of which extending along a certain section of the circumference of thetop surface 11 a of thepolishing pad 11. The advantage of this embodiment is that thebacking pad 9 can be easily made out of a plastics material, for example PA66 reinforced with glass fibers, by means of an injection molding process. - The
top surface 11 a of thepolishing pad 11 and thebottom surface 9 a of thebacking pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro®) for attaching thepolishing pad 11 to thebacking pad 9 in the aligned position. In this embodiment, preferably only centerpart 15 of thetop surface 11 a of thepolishing pad 11 within theannular groove 12 a is provided with the attachment means. Hence, the outerannular part 16 of thetop surface 11 a of thepolishing pad 11 extending outside of theannular groove 12 a has no attachment means. In that case the entirebottom surface 9 a of thebacking pad 9 inside theannular collar 13 a would be provided with corresponding attachment means. - The co-operation of the at least one
recess 12 a on thetop surface 11 a of thepolishing pad 11 with the at least one correspondingprotrusion 13 a on thebottom surface 9 a of thebacking pad 9 allows an exact and fast positioning and attachment of thepolishing pad 11 in respect to thebacking pad 9. The positioning can be effected in a translational direction (e.g. providing for an easy centering of thepolishing pad 11 in respect to thebottom surface 9 a of the backing pad 9) as well as in a desired rotational (angular) direction (e.g. providing for an easy alignment of dust suction holes in thebacking pad 9 with respective openings in the polishing pad 11). - The described embodiment allows exact positioning of the
polishing pad 11 in respect to thebacking pad 9 in a predefined translational position within the plane of extension of thebottom surface 9 a of thebacking pad 9. This may be sufficient in many cases. However, it is noted that with theannular groove 12 a and theannular collar 13 a only, thepolishing pad 11 can be attached to thebottom surface 9 a of thebacking pad 9 in any angular position (0° . . . 360°) in respect to therotational axes polishing pad 11 in respect to thebacking pad 9 in a desired rotational (angular) position is possible. In order to achieve this object one or more further protrusions and corresponding recesses may be realized on thebottom surface 9 a of thebacking pad 9 or in thetop surface 11 a of thepolishing pad 11, respectively, both not extending circumferentially (e.g. at least partly in a radial direction in respect to therotational axes 10, 14). An example for such an embodiment is shown inFIG. 12 , where the additional protrusions are indicated withreference sign 13 b and the additional corresponding recesses are indicated withreference sign 12 b. Theadditional protrusions 13 b are designed as even plain-like elements having an essentially radial extension. Theadditional recesses 12 b are designed as corresponding linear grooves having an essentially radial extension. Of course, thepolishing pad 11 could be provided with theadditional recesses 12 b only, without theannular groove 12 a. Correspondingly, thebacking pad 9 could be provided with theadditional protrusions 13 b only, without theannular collar 13 a. Furthermore, the number, form, translational and angular position of theadditional protrusions 13 b and the correspondingadditional recesses 12 b could vary from what is shown inFIG. 12 . - Another embodiment, which allows a fast and precise centering of the
polishing pad 11 in respect to thebacking pad 9 as well as a fast and precise angular positioning of thepolishing pad 11 in respect to thebacking pad 9 in a desired rotational position about theaxes FIG. 13 . There, the additional protrusions are indicated withreference sign 13 c and the additional corresponding recesses are indicated withreference sign 12 c. The one or moreadditional protrusions 13 c and the correspondingadditional recesses 12 c do also not extend circumferentially but are rather located at discrete rotational positions about theaxes additional protrusions 13 c have the form of cylinders but of course may have any other form, too. The distances between thefurther protrusions 13 c and therotational axis 10 may be identical or different. Similarly, the distances between the corresponding further recesses 12 c and therotational axis 14 may be identical or different. Of course, thebacking pad 9 could be provided with theadditional protrusions 13 c only, without theannular collar 13 a. In that case thepolishing pad 11 could be provided with theadditional recesses 12 c only, without theannular groove 12 a. Furthermore, the number, form, translational and angular position of theadditional protrusions 13 c and the correspondingadditional recesses 12 c could vary from what is shown inFIG. 13 . - A further embodiment of the present invention is shown in
FIGS. 5 and 6 . In contrast to the embodiment ofFIGS. 2 to 4 , in this further embodiment anannular collar 13 d is not provided at the outer edge of thebacking pad 9 but rather in a distance to the outer edge leaving aspace 18 between the outer edge of thepolishing pad 11 and the outer edge of thebacking pad 9. During intended use of thepower tool 1 and the backing andpolishing pads polishing pad 11 may be pressed upwards into thespace 18. The upward movement of the outer edge portion of thepolishing pad 11 is limited by the outer edge portion of thebacking pad 9 providing for some kind of stopper for the outer edge portion of thepolishing pad 11. In this embodiment, the at least onerecess 12 d in thetop surface 11 a of thepolishing pad 11 comprises thespace 18 and extends right to the outer edge of thepolishing pad 11. - The
top surface 11 a of thepolishing pad 11 and thebottom surface 9 a of thebacking pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro®) for attaching thepolishing pad 11 to thebacking pad 9 in the aligned position. In this embodiment, preferably only centerpart 15 of thetop surface 11 a of thepolishing pad 11 within theannular recess 12 d is provided with the attachment means. Hence, the outer annular part 16 (forming the bottom surface of therecess 12 d) of thepolishing pad 11 has no attachment means. Similarly, preferably only thecenter part 19 of thebottom surface 9 a of thebacking pad 9 within theannular protrusion 13 d is provided with the attachment means. Hence, an outerannular part 20 of thebacking pad 9 outside of theannular collar 13 d has no attachment means. - In this embodiment the
protrusion 13 d comprises an annular collar extending along the entire circumference of thebottom surface 9 a of thebacking pad 9 in an equidistant manner in respect to therotational axis 10 of thebacking pad 9 and in respect to the outer circumferential edge of thebacking pad 9. Of course, it would also be possible that there is a plurality ofprotrusions 13 d each of which extending along a certain section of the outer circumference of thebottom surface 9 a of thebacking pad 9. It would also be possible that there is a plurality ofrecesses 12 d each of which extending along a certain section of the circumference of the outer edge portion of thetop surface 11 a of thepolishing pad 11. - Furthermore, it is also possible in the embodiment of
FIGS. 5 and 6 that there are additional protrusions, like theprotrusions FIGS. 12 and 13 , protruding from thebottom surface 9 a of thebacking pad 9. Correspondingly, thetop surface 11 a of thepolishing pad 11 may also be provided with additional recesses, like therecesses FIGS. 12 and 13 . - Yet another embodiment is shown in
FIGS. 7 to 9 . In that embodiment, the annularcircumferential protrusion 13 a ofFIGS. 2 to 4 is combined with the annularcircumferential recess 12 d ofFIGS. 5 and 6 . - The
top surface 11 a of thepolishing pad 11 and thebottom surface 9 a of thebacking pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro®) for attaching thepolishing pad 11 to thebacking pad 9 in the aligned position. In this embodiment, preferably only centerpart 15 of thetop surface 11 a of thepolishing pad 11 within theannular recess 12 d is provided with the attachment means. Hence, the outer annular part 16 (forming the bottom surface of therecess 12 d) of thepolishing pad 11 has no attachment means. In that case the entirebottom surface 9 a of thebacking pad 9 inside theannular collar 13 a would be provided with corresponding attachment means. - In this embodiment the
protrusion 13 a comprises an annular collar extending along the entire outer circumference of thebottom surface 9 a of thebacking pad 9 in an equidistant manner in respect to therotational axis 10 of thebacking pad 9. Of course, it would also be possible that there is a plurality ofprotrusions 13 a each of which extending along a certain section of the outer circumference of thebottom surface 9 a of thebacking pad 9. It would also be possible that there is a plurality ofrecesses 12 d each of which extending along a certain section of the circumference of the outer edge portion of thetop surface 11 a of thepolishing pad 11. - Furthermore, it is also possible in the embodiment of
FIGS. 7 to 9 that there are additional protrusions, like theprotrusions FIGS. 12 and 13 , protruding from thebottom surface 9 a of thebacking pad 9. Correspondingly, thetop surface 11 a of thepolishing pad 11 may also be provided with additional recesses, like therecesses FIGS. 12 and 13 . - Yet another embodiment is shown in
FIGS. 10 and 11 . In that embodiment, theannular protrusion 13 d ofFIGS. 5 and 6 is combined with the annularcircumferential groove 12 a ofFIGS. 2 to 4 . - The
top surface 11 a of thepolishing pad 11 and thebottom surface 9 a of thebacking pad 9 are at least partly provided with attachment means, preferably a hook-and-loop fastener (Velcro®) for attaching thepolishing pad 11 to thebacking pad 9 in the aligned position. In this embodiment, to provide the entirebottom surface 9 a (comprisingpartial surfaces 19 and 20) of thebacking pad 9 and the entiretop surface 11 a (comprisingpartial surfaces 15 and 16) of thepolishing pad 11 with corresponding attachment means. - In this embodiment the
protrusion 13 d comprises an annular collar extending along the entire circumference of thebottom surface 9 a of thebacking pad 9 in an equidistant manner in respect to therotational axis 10 and to the outer circumferential edge of thebacking pad 9. Of course, it would also be possible that there is a plurality ofprotrusions 13 d each of which extending along a certain section of the circumference of thebottom surface 9 a of thebacking pad 9. It would also be possible that there is a plurality ofgrooves 12 a each of which extending in thetop surface 11 a along a certain section of the circumference of thepolishing pad 11. - Furthermore, it is also possible in the embodiment of
FIGS. 10 and 11 that there are additional protrusions, like theprotrusions FIGS. 12 and 13 , protruding from thebottom surface 9 a of thebacking pad 9. Correspondingly, thetop surface 11 a of thepolishing pad 11 may also be provided with additional recesses, like therecesses FIGS. 12 and 13 . - Finally,
FIG. 14 shows a perspective view of thepolishing pad 11 releasably attached to thebacking pad 9 according to the embodiment ofFIGS. 2 to 4 . Theannular protrusion 13 a on thebottom surface 9 a of thebacking pad 9 is inserted into theannular groove 12 a on thetop surface 11 a of thepolishing pad 11, and therefore both are not visible inFIG. 14 . - It is an aspect of the present invention to provide for a plug-and-socket-type of releasable connection between the
top surface 11 a of apolishing pad 11 and thebottom surface 9 a of abacking pad 9. To this end at least oneprotrusion 13 a; 13 b; 13 c; 13 d and at least onecorresponding recess 12 a; 12 b; 12 c; 12 d for receiving theprotrusions 13 a; 13 b; 13 c; 13 d are provided on thebottom surface 9 a of thebacking pad 9 and in thetop surface 11 a of thepolishing pad 11, respectively. Preferably but not necessarily the number ofprotrusions 13 a; 13 b; 13 c; 13 d and recesses 12 a; 12 b; 12 c; 12 d is the same. This allows a fast attachment of apolishing pad 11 to abacking pad 9 in a desired translational position thereby permitting an easy centering of thepolishing pad 11 in respect to thebacking pad 9. Furthermore, by positioning and designing the at least oneprotrusion 13 a; 13 b; 13 c; 13 d and the at least onecorresponding recess 12 a; 12 b; 12 c; 12 d accordingly, thepolishing pad 11 can even be positioned in a desired rotational (or angular) position (about therotational axes 10, 14) in respect to thebacking pad 9 thereby permitting alignment of suction holes provided in thebacking pad 9 with corresponding openings in thepolishing pad 11.
Claims (16)
1. Polishing pad (11) comprising a top surface (11 a) adapted for releasable attachment of the polishing pad (11) to a bottom surface (9 a) of a plate-like backing pad (9) of a hand-held power tool (1) and a bottom surface (11 b) adapted for polishing a surface of a workpiece, the backing pad (9) being actuated by an electric or pneumatic motor of the hand-held power tool (1) in order to make the backing pad (9) together with the polishing pad (11) attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement, characterized in that the top surface (11 a) of the polishing pad (11) comprises at least one recess (12 a; 12 b; 12 c; 12 d) adapted for receiving at least one corresponding protrusion (13 a; 13 b; 13 c; 13 d) located at and protruding from the bottom surface (9 a) of the plate-like backing pad (9) when the polishing pad (11) is attached to the backing pad (9).
2. Polishing pad (11) according to claim 1 , wherein the at least one recess comprises an annular groove (12 a) extending in the top surface (11 a) of the polishing pad (11) in an equidistant manner in respect to a rotational axis (14) of the polishing pad (11).
3. Polishing pad (11) according to claim 1 , wherein the at least one recess comprises an annular recess (12 d) located along an outer circumference of the top surface (11 a) of the polishing pad (11) in an equidistant manner in respect to a rotational axis (14) of the polishing pad (11).
4. Polishing pad (11) according to claim 1 , wherein the at least one recess comprises a plurality of separate recesses (12 a; 12 b; 12 c; 12 d) located in the top surface (11 a) of the polishing pad (11) in an equidistant manner to a rotational axis (14) of the polishing pad (11).
5. Polishing pad (11) according to claim 1 , wherein the at least one recess comprises a plurality of separate recesses (12 a; 12 b; 12 c; 12 d) located in the top surface (11 a) of the polishing pad (11) with different distances to a rotational axis (14) of the polishing pad (11).
6. Polishing pad (11) according to claim 4 , wherein the separate recesses (12 a; 12 b; 12 c; 12 d) are located in the top surface (11 a) of the polishing pad (11) with different circumferential distances in respect to one another.
7. Plate-like backing pad (9) of a hand-held power tool (1), the backing pad (9) comprising a bottom surface (9 a) adapted for releasably attaching a top surface (11 a) of a polishing pad (11), the backing pad (9) being actuated by an electric or pneumatic motor of the hand-held power tool (1) in order to make the backing pad (9) together with the polishing pad (11) attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement, characterized in that the bottom surface (9 a) of the plate-like backing pad (9) comprises at least one protrusion (13 a; 13 b; 13 c; 13 d) protruding from the bottom surface (9 a) of the backing pad (9) and adapted for entering into a corresponding recess (12 a; 12 b; 12 c; 12 d) located in the top surface (8 a) of the polishing pad (11) when the polishing pad (11) is attached to the backing pad (9).
8. Backing pad (9) according to claim 7 , wherein the at least one protrusion comprises an annular collar (13 a; 13 d) protruding from the bottom surface (9 a) of the backing pad (9) and extending in an equidistant manner in respect to a rotational axis (10) of the backing pad (9).
9. Backing pad (9) according to claim 8 , wherein the annular collar (13 a; 13 d) extends along the outer circumference of the backing pad (9).
10. Backing pad (9) according to claim 8 , wherein the annular collar (13 a; 13 d) extends in an equidistant manner in respect to the outer circumference of the backing pad (9).
11. Backing pad (9) according to claim 7 , wherein the at least one protrusion comprises a plurality of separate protrusions (13 a; 13 b; 13 c; 13 d) each protruding from the bottom surface (9 a) of the backing pad (9) and located there in an equidistant manner to a rotational axis (10) of the backing pad (9).
12. Backing pad (9) according to claim 7 , wherein the at least one protrusion (14) comprises a plurality of separate protrusions (13 a; 13 b; 13 c; 13 d) each protruding from the bottom surface (9 a) of the backing pad (9) and located there with different distances to a rotational axis (10) of the backing pad (9).
13. Backing pad (9) according to claim 11 , wherein the separate protrusions (13 a; 13 b; 13 c; 13 d) are located on the bottom surface (7 a) of the backing pad (7) with different circumferential distances in respect to one another.
14. Hand-held power tool (1) comprising a plate-like backing pad (9) with a bottom surface (9 a) and a polishing pad (11) with a top surface (11 a), the bottom surface (9 a) and the top surface (11 a) adapted for releasable attachment of the polishing pad (11) to the backing pad (9), and further comprising an electric or pneumatic motor adapted for actuating the backing pad (9), in order to make the backing pad (9) together with the polishing pad (11) attached thereto perform a purely rotating, a random orbital or a roto-orbital working movement, characterized in that the bottom surface (9 a) of the plate-like backing pad (9) comprises at least one protrusion (13 a; 13 b; 13 c; 13 d) protruding from the bottom surface (9 a) of the backing pad (9) and the top surface (11 a) of the polishing pad (11) comprises at least one corresponding recess (12 a; 12 b; 12 c; 12 d), wherein the at least one protrusion (13 a; 13 b; 13 c; 13 d) is received by the at least one recess (12 a; 12 b; 12 c; 12 d) when the polishing pad (11) is attached to the plate-like backing pad (9).
15. Power tool (1) according to claim 14 , wherein the plate-like backing pad (9) is designed according to one of the claims 7 to 13 .
16. Power tool (1) according to claim 14 or 15 , wherein the polishing pad (11) is designed according to one of the claims 2 to 6 .
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP17178839.1A EP3421179A1 (en) | 2017-06-29 | 2017-06-29 | Polishing pad for releasable attachment to a bottom surface of a plate-like backing pad of a power tool, backing pad and hand-held power tool |
EP17178839.1 | 2017-06-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
US20190001459A1 true US20190001459A1 (en) | 2019-01-03 |
Family
ID=59258131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US16/009,469 Abandoned US20190001459A1 (en) | 2017-06-29 | 2018-06-15 | Polishing pad for a releasable attachment to a bottom surface of a plate-like backing pad of a power tool, backing pad and hand-held power tool |
Country Status (2)
Country | Link |
---|---|
US (1) | US20190001459A1 (en) |
EP (1) | EP3421179A1 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD863013S1 (en) * | 2018-04-20 | 2019-10-15 | Makita Corporation | Electric polisher |
USD924028S1 (en) * | 2019-11-04 | 2021-07-06 | B&B Blending, Llc | Polisher |
USD931073S1 (en) * | 2019-09-09 | 2021-09-21 | Makita Corporation | Portable electric cutter |
USD951733S1 (en) * | 2020-09-04 | 2022-05-17 | 3M Innovative Properties Company | Random orbital polishing tool |
USD957224S1 (en) * | 2019-10-02 | 2022-07-12 | Griot's Garage, Inc. | Polisher |
USD957768S1 (en) | 2019-06-18 | 2022-07-12 | Griot's Garage, Inc. | Polisher |
USD986018S1 (en) * | 2020-12-23 | 2023-05-16 | Fairway Electronic Co., Ltd. | Polisher host |
USD986019S1 (en) * | 2020-12-23 | 2023-05-16 | Fairway Electronic Co., Ltd. | Polisher set |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6105197A (en) * | 1998-04-14 | 2000-08-22 | Umbrell; Richard T. | Centering system for buffing pad |
CN102049739B (en) * | 2010-10-11 | 2012-07-25 | 南京航空航天大学 | Frozen consolidated abrasive polishing pad bearing device and polishing pad thereof |
CN102756340B (en) * | 2011-04-29 | 2015-04-22 | 中芯国际集成电路制造(上海)有限公司 | Chemical mechanical polishing machine and polishing pad part thereof |
-
2017
- 2017-06-29 EP EP17178839.1A patent/EP3421179A1/en not_active Withdrawn
-
2018
- 2018-06-15 US US16/009,469 patent/US20190001459A1/en not_active Abandoned
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD863013S1 (en) * | 2018-04-20 | 2019-10-15 | Makita Corporation | Electric polisher |
USD957768S1 (en) | 2019-06-18 | 2022-07-12 | Griot's Garage, Inc. | Polisher |
USD931073S1 (en) * | 2019-09-09 | 2021-09-21 | Makita Corporation | Portable electric cutter |
USD957224S1 (en) * | 2019-10-02 | 2022-07-12 | Griot's Garage, Inc. | Polisher |
USD924028S1 (en) * | 2019-11-04 | 2021-07-06 | B&B Blending, Llc | Polisher |
USD951733S1 (en) * | 2020-09-04 | 2022-05-17 | 3M Innovative Properties Company | Random orbital polishing tool |
USD986018S1 (en) * | 2020-12-23 | 2023-05-16 | Fairway Electronic Co., Ltd. | Polisher host |
USD986019S1 (en) * | 2020-12-23 | 2023-05-16 | Fairway Electronic Co., Ltd. | Polisher set |
Also Published As
Publication number | Publication date |
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EP3421179A1 (en) | 2019-01-02 |
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