CN109072418A - 在溅射设备多层涂层系统中产生梯度层界定性质装置及方法 - Google Patents

在溅射设备多层涂层系统中产生梯度层界定性质装置及方法 Download PDF

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CN109072418A
CN109072418A CN201780024388.0A CN201780024388A CN109072418A CN 109072418 A CN109072418 A CN 109072418A CN 201780024388 A CN201780024388 A CN 201780024388A CN 109072418 A CN109072418 A CN 109072418A
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耶尔格·弗科斯基
哥德·克莱伊特
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Grenzebach Maschinenbau GmbH
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Abstract

用于在溅射设备中的多层涂层系统中产生梯度层的界定性质的装置及方法，具有以下特征：a)阴极对，被布置在公共处理室中、且由第一阴极体以及第二阴极体组成，所述阴极对通过公共电源被供应直流电，其中，在进入所述处理室之前，所述直流电被转换为一系列脉冲，所述一系列脉冲具有交替的正脉冲及负脉冲、以及其间的脉冲间歇期，b)用于控制各个脉冲的长度以及相应的脉冲间歇期的持续时间的装置。

Description

在溅射设备多层涂层系统中产生梯度层界定性质装置及方法
技术领域
本发明涉及一种用于在溅射设备中的多层涂层系统中产生梯度层的界定性质的装置及方法。
背景技术
磁场辅助阴极溅射(磁控溅射)已经渗透到许多现代表面技术领域。从微电子应用开始，磁控溅射目前被建立为用于建筑玻璃、平面屏幕显示器、眼镜镜片、带材料、工具、装饰品以及功能组件的工业涂布方法。在这种情况下，功能组件通常被提供有腐蚀防护、或是以单层或多层技术而由氮化物(例如TiN、TaN、VN、ZrN)或碳氮化物(例如TiCN)制成的硬质材料层。应用基于具有高达50GPa硬度值的纳米多层的超硬层也日益增加。减少摩擦及减少磨损的金属碳层已被证明其在汽车工业中非常有益。
最大的真空镀膜设备，以及，因而同样地，具有最高功耗的设备是用于建筑玻璃涂层的典型水平在线设备。
从DE 103 56 357 B4的现有技术中知晓可热处理的防晒及防热层系统、及其制造方法。此文献是基于描述通过真空涂层而可适用于玻璃的防晒系统、及其制造方法的目的，该防晒系统是可变地热处理的，并且在这种情况下不具有可见的色移，同时维持化学及机械阻力。
在此案中，权利要求1涉及一种通过真空涂层而可适用于玻璃的可热处理的防晒及防热系统，所述真空涂层具有至少一个金属层布置、并且在每种情况下具有位于所述至少一个金属层布置下方的邻接的下介电层布置以及位于所述至少一个金属层布置上方的上介电层布置。此系统的特征在于，至少一个金属层布置(4)、以及至少一个上介电层布置(2)及至少一个下介电层布置(3)都被体现为多层布置，其中由至少一个单层组成的金属层(8)通过由所述金属层(8)的亚化学计量氮化或氧化金属制成的下中间层(7)以及上中间层(9)而被嵌入所述金属层布置(4)内，且其中所述下介电层布置(3)以及所述上介电层布置(2)两者都具有金属氧化物或半导体氧化物或金属氮化物或半导体氮化物的化学计量层(5,11)、或者硅的氮化物、氧化物或氧氮化物的化学计量层(5,11)，其中所述层位于所述介电层布置(2,3)内，使得与相邻层相比，具有较少的氧或氮的金属氧化物或半导体氧化物、较少的氧或氮的金属氮化物或半导体氮化物、或较少的氧或氮的硅的氮化物、氧化物或氧氮化物的层总是位于面向所述金属层(8)的一侧。
从WO 2013/083238 A1中知晓反应溅射工艺。根据说明书，在权利要求1中，其涉及一种反应溅射方法，其中材料是通过离子轰击而从第一标靶的表面被驱出并进入气相，其中负电压是以脉冲而被施加至所述标靶，使得在标靶表面上出现具有大于0.5A/cm2的电流密度的电流，且因此进入所述气相的材料至少部分地被电离，且其中反应气体流形成，并且反应气体与标靶表面的材料反应，其特征在于，电压脉冲的持续时间被选择，使得在所述电压脉冲期间，在电流流动时间最长的一点或多点处，所述标靶表面至少部分地以由反应气体以及标靶材料制成的化合物覆盖，并且，相较于所述电压脉冲的开始处，此覆盖于所述电压脉冲结束时较小，因此标靶表面在所述电压脉冲结束时处于第二中间状态。
在这种已知方法中，功率密度非常高，这相对强烈地提高了对冷却的需求。此外，可能的保护层的梯度的可变性非常受限制。
发明内容
本发明是基于提供一种装置及方法的目的，使用所述装置及方法可以用容易且节能的方式在溅射设备中建立多层涂层系统，其中保护层的梯度的可变性是以简单的方式实现。
此目的是通过根据权利要求1所述的装置实现，
一种用于在溅射设备中的多层涂层系统中产生梯度层的界定性质的装置，包括以下特征：
a)阴极对，被布置在公共处理室中、且由第一阴极体以及第二阴极体组成，所述阴极对通过公共电源被供应直流电，其中所述直流电在进入所述处理室之前被转换为脉冲序列，所述脉冲序列具有交替的正脉冲及负脉冲、以及插入的脉冲暂停，
b)用于控制各个脉冲的长度以及相应的脉冲暂停的持续时间的装置，
c)用于以在待涂布的衬底上产生公共沉积区域的方式调节所述两个阴极的装置，
d)公共工艺气体系统，其供应工艺气体的基本供应，其中单独的对称布置的分段工艺气体系统与每一个阴极体相关联。
此外，主张
所述第一阴极体被配备有与所述第二阴极体不同的靶材。
主张
如果管形式的阴极体被使用，则各个管状阴极的磁场取向可以被控制。
且主张
至少一个或多个涡轮分子泵在各情况下被布置在所述阴极对上方。
且主张
所述阴极布置由多个平面阴极以及多个管状阴极组成。或者，所述目的分别通过根据权利要求6所述的方法实现。
一种用于在溅射设备中的多层涂层系统中产生梯度层的界定性质的方法，具有以下方法特征：
a)在用于相应涂布方法的设备中，直流电或平均频率发生器(10)由双极脉冲发生器(21)取代，其中节省高达30％的工艺能量，
b)供应正脉冲的输出被连接到对应于相应涂布作业的两个阴极中的一个阴极，
c)供应负脉冲的输出被连接到对应于所述相应涂布作业的两个阴极中的另一个阴极，
d)根据相关的涂布作业执行相应脉冲的持续时间的控制。
此外，主张
各个脉冲之间的断开中断了溅射工艺。并且，一种具有程序代码的计算器程序，用于当在计算器中执行所述程序时执行方法步骤。并且，一种机器可读载体，具有计算器程序的程序代码，用于当在计算器中执行所述程序时，执行根据权利要求6及7中任一项所述的方法。
附图说明
下面将更详细地描述根据本发明的装置。
在具体图式中：
图1：显示层堆栈的示意结构。
图2：显示传统涂布站的图示。
图3：显示根据本发明的涂布站的图示。
图4：显示根据本发明使用的脉冲发生器的典型信号曲线。
图5：显示关于传统设备的可能替代的几个示例。
具体实施方式
图1显示了衬底的低能量涂层的层堆栈的示意性结构，例如，玻璃表面作为单一银层(单一低-E)以用于窗中的改善的热绝缘。这些涂层典型上不仅应用于玻璃衬底，而且还应用于薄膜。除了仅包含一个反射单层(银层，通常由Ag制成)的典型层堆栈之外，还有包含两个、三个或更多个反射单层(银层，Ag)的高质量多层系统(所谓的双低-E或三低-E)。这些涂层及其可以回火的涂层同时已配备有渐变的不对称金属保护层(所谓的阻挡器)。
在这些层堆栈中，介电层的数量接着根据所述保护层的数量而增加。介电基层5接在实际衬底(例如待涂布的玻璃表面6)之后。此基层5可以由多种介电材料构成。下阻挡层4被施加到此基层。将例如由银、金或铜制成的金属功能层3施加到此阻挡层4，在所述阻挡层4上接着是上阻挡层2。介电外层1通常形成末端。此外层1可以由多种介电材料构成。最终保护层(外涂层)可选地被施加到所述介电外层1。
为了实现及/或确保所述金属功能层3的期望性质，所述阻挡层2及4必须基本上是金属的、并且具有与所述功能层3接触的小反应性。这是通过添加氧及/或氮来实现。
通常，在这种情况下使用银作为所述金属。各个涂布站对称地被构建。层堆栈总是包含金属层，该金属层必须被保护而不受紧接的反应沉积工艺以及随后的回火工艺的影响。所述阻挡层2及4另外增强了层堆栈的机械及化学稳定性(粘附及腐蚀)。已经证明，梯度保护层对于此目的是有利的。这意味着相应保护层的结构(化学计量)或多或少地随保护层的厚度而变化。
图2显示出隔室结构中传统涂布站的结构图。
于此使用容器17作为基底，容器17被提供有容器盖11，且其中相应的衬底12在输送辊13上被输送。在第一腔室以及最后腔室中，所述衬底12在由隧道盖7覆盖的缩小空间中滑动。在中间腔室中，左阴极18以及右阴极16(于此被体现为管状阴极)各被附接到在容器盖(阴极盖)11上的轴承座8。此外，左气体入口通道19及右气体入口通道15、以及左喷涂筛20(溅射筛)及右喷涂筛14(溅射筛)作为此腔室中的溅射工艺区域屏蔽(掩模)是可见的。两个阴极(双阴极)由直流电源9供应能量。在这种情况下，典型的MF发生器10供应具有的频率在10kHz到大约100kHz范围中的正弦交流电。
图3显示出根据本发明的溅射过程的涂布站的结构图。
根据图3的设备在单独的机械设备中对应于图2中描述的设备。因此，于此仅左气体入口通道19、右气体入口信道15、以及左阴极18以及右阴极16(管状阴极)被识出。
所述直流电源9对于许多溅射工艺也是典型的、并且例如用于在单独的阴极上IR反射功能层(Ag)的沉积。
与图2所示的传统溅射过程的不同之处在于由直流电源9供应的直流电是由脉冲发生器21转换为所谓的双极脉冲，如图4所示。
图4显示出根据本发明使用的双极脉冲发生器的典型信号曲线。
这种脉冲发生器21能够在一个脉冲周期中产生两个不同的脉冲电压曲线、并且在每种情况下将它们发送到所述两个阴极中的一个阴极。在这种情况下，脉冲宽度可以在宽度上彼此独立地变化。这意味着：使用根据本发明的方法，在一个脉冲周期期间的涂层能量可以根据需要而被分布到所述两个阴极18及16。因此，由所述直流电源9供应的能量可以在5％到95％之间的范围中被分布在两个阴极上。
在图4中，作为示例，左(正)脉冲与所述左阴极18相关联，且右(负)脉冲与所述右阴极16相关联，其中各自的脉冲宽度基本上对应于被供应给两个阴极的脉冲周期的总能量的各自的能量比例。
脉冲周期由图4中的23标识，其中在此还显而易见的是，在脉冲暂停中，不向所述两个阴极中的任一个供应能量。这种脉冲暂停通过空闲22(时间关闭)于图4中标识出。
由所述直流电源9供应的电压24可以高达1000V或更高，因此每个脉冲的电压电平导致U＝-1000V与U＝+1000V之间的范围。
使用所描述的装置，不仅可能以几乎任意的分度产生梯度层，而且还可以在不改变其一般结构中的涂层设备下产生强结构层结构。
虽然在传统设备中对于产生梯度层必须使两个气体入口19及15不对称地被操作，即两个气体入口都用不同的气体馈送而被操作，这损害了涂层的质量和可控性，但是根据本发明，通过脉冲发生器控制了组合的、合并的(梯度的)涂层的区域的类型及厚度。
在传统的涂层设备中，需要多个涂布站以用于产生梯度层。此外，梯度的可变性受到极大限制，并且设定的改变通常需要重新配置整个设备。根据本发明的双极脉冲控制不仅使所有这些都变得多余，而且还扩展了整个涂布技术的可能性。
用于梯度层的脉冲控制的应用还使得能够利用上阻挡层的梯度来执行敏感的功率范围(功能层上的低能量引入)。
因此可以避免由过高的能量引入损害功能层的性质。这意味着所述设备可节省高达30％的工艺能量。所述设备在结构上也被也简化，且因此节省了生产及能源成本。能源效率降低了二氧化碳排放。
图5显示出有关传统设备的可能用途的数个例子。
因此，用于具有中等频率的涂层的传统设备由图5a中的具有双极脉冲控制的涂布设备取代。具有磁棒25的双旋转阴极(双磁控管)对应于一般应用中的传统形状。在图5b中，通过两个直流电源操作的传统设备由具有双极脉冲控制的涂层设备取代。
在图5c中的各个情况中用具有单独的双极脉冲控制器的涂布设备取代通过两个单独的直流电源操作的传统设备。
图5d显示出平面阴极26以及管状阴极16的组合。图5a、图5b以及图5c的图示因此也可以被配备有平面阴极26及/或图5c所示变体中的组合。根据工艺，涡轮分子泵也可以被布置在所述阴极上方以提高效率(为了可理解的原因，于此未更详细地示出)。
附图标记说明
1 介电外层
2 外阻挡层
3 银层(金或铜)
4 下阻挡层
5 介电基层(内层)
6 衬底，例如玻璃
7 隧道盖
8 阴极轴承座
9 直流电源
10 MF发生器(MF＝中频)
11 容器盖
12 衬底
13 输送辊
14 右喷涂板、溅镀区域屏蔽
15 右气体入口
16 右阴极
17 容器、槽
18 左阴极
19 左气体入口
20 左喷涂筛
21 脉冲发生器
22 空闲(时间关闭)
23 一个周期、两个频率
24 电压(1000V)
25 磁棒

Claims (9)

1.一种用于在溅射设备中的多层涂层系统中产生梯度层的界定性质的装置，包括以下特征：
a)阴极对，被布置在公共处理室中、且由第一阴极体以及第二阴极体组成，所述阴极对通过公共电源被供应直流电，其中所述直流电在进入所述处理室之前被转换为脉冲序列，所述脉冲序列具有交替的正脉冲及负脉冲、以及插入的脉冲暂停，
b)用于控制各个脉冲的长度以及相应的脉冲暂停的持续时间的装置，
c)用于以在待涂布的衬底上产生公共沉积区域的方式调节所述两个阴极的装置，
d)公共工艺气体系统，其供应工艺气体的基本供应，其中单独的对称布置的分段工艺气体系统与每一个阴极体相关联。
2.根据权利要求1所述的装置，其特征在于：所述第一阴极体被配备有与所述第二阴极体不同的靶材。
3.根据权利要求1或2所述的装置，其特征在于：如果管形式的阴极体被使用，则各个管状阴极的磁场取向可以被控制。
4.根据前述权利要求中任一项所述的装置，其特征在于：至少一个或多个涡轮分子泵在各情况下被布置在所述阴极对上方。
5.根据前述权利要求中任一项所述的装置，其特征在于：所述阴极布置由多个平面阴极以及多个管状阴极组成。
6.一种用于在溅射设备中的多层涂层系统中产生梯度层的界定性质的方法，具有以下方法特征：
a)在用于相应涂层方法的设备中，直流电或平均频率发生器(10)由双极脉冲发生器(21)取代，其中节省高达30％的工艺能量，
b)供应正脉冲的输出被连接到对应于相应涂布作业的两个阴极中的一个阴极，
c)供应负脉冲的输出被连接到对应于所述相应涂布作业的所述两个阴极中的另一个阴极，
d)根据相关的涂布作业执行相应脉冲的持续时间的控制。
7.根据权利要求6所述的方法，其特征在于：各个脉冲之间的断开中断了溅射工艺。
8.一种具有程序代码的计算器程序，用于当在计算器中执行所述程序时，执行根据权利要求6及7中任一项所述的方法步骤。
9.一种机器可读载体，具有计算器程序的程序代码，用于当在计算器中执行所述程序时，执行根据权利要求6及7中任一项所述的方法。
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