CN109031659B - Computer-aided installation and adjustment method of coaxial optical system - Google Patents
Computer-aided installation and adjustment method of coaxial optical system Download PDFInfo
- Publication number
- CN109031659B CN109031659B CN201810637401.6A CN201810637401A CN109031659B CN 109031659 B CN109031659 B CN 109031659B CN 201810637401 A CN201810637401 A CN 201810637401A CN 109031659 B CN109031659 B CN 109031659B
- Authority
- CN
- China
- Prior art keywords
- optical
- subsystem
- optical element
- optical subsystem
- wavefront aberration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 302
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000009434 installation Methods 0.000 title claims abstract description 35
- 230000035945 sensitivity Effects 0.000 claims abstract description 52
- 239000011159 matrix material Substances 0.000 claims abstract description 44
- 230000004075 alteration Effects 0.000 claims abstract description 38
- 238000004458 analytical method Methods 0.000 claims abstract description 25
- 230000008569 process Effects 0.000 claims abstract description 10
- 238000004088 simulation Methods 0.000 claims abstract description 9
- 238000003384 imaging method Methods 0.000 claims description 10
- 238000005259 measurement Methods 0.000 claims description 10
- 238000000926 separation method Methods 0.000 claims description 6
- 238000000605 extraction Methods 0.000 claims description 3
- 230000004044 response Effects 0.000 claims description 3
- 230000007423 decrease Effects 0.000 description 9
- 230000010363 phase shift Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 201000004569 Blindness Diseases 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/62—Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/20—Design optimisation, verification or simulation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Theoretical Computer Science (AREA)
- Computer Hardware Design (AREA)
- Evolutionary Computation (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
The invention discloses a computer-aided installation and adjustment method of a coaxial optical system, which comprises the following steps: s1: establishing an optical model of the optical system to be adjusted and respectively establishing optical subsystems M along the light path directioniOptical subsystem MiIncluding optical elements 1 to i; i is 1 to n; n represents the number of optical elements; s2: selecting an optical subsystem MiObtaining ideal wavefront aberration through simulation analysis; s3: for optical subsystem MiThe optical element i introduces a position deviation amount to obtain a simulated wavefront aberration; s4: respectively solving each optical subsystem M by adopting sensitivity matrix formulaiA corresponding sensitivity matrix; s5: solving an optical subsystem M using a sensitivity matrix and actual wavefront aberrationsiAdjusting the actual position deviation amount of the optical element i to successively complete the installation and adjustment of each optical subsystem; the invention can avoid the problem of mutual compensation of the positions of the optical elements in the adjusting process, accelerate the convergence speed in the adjusting process and improve the adjusting precision and the adjusting efficiency.
Description
Technical Field
The invention belongs to the technical field of optics, and particularly relates to a computer-aided assembling and adjusting method of a high-precision coaxial optical system based on a sensitivity matrix method, which can be applied to precision assembling and adjusting and imaging quality improvement of the optical system.
Background
The traditional optical system is mainly installed and adjusted by means of experience of installation and adjustment personnel and simple installation and adjustment equipment, has the defects of large blindness, long installation and adjustment period, low precision and the like, and is not suitable for installing and adjusting large-aperture or diffraction limit-approaching optical systems. With the continuous development of computer technology, optical design and optical detection technology, computer-aided installation and adjustment of optical systems are made possible. With the increasing application requirements of high-precision optical systems, the performance of the optical systems is developing towards higher quality and higher performance; the installation and adjustment of complex optical systems are becoming popular in the field of advanced optical manufacturing, and computer-aided installation and adjustment based on relevant technologies such as optical element surface shape, optical wave front interferometry, computer optimization and the like are also generated.
The actual optical system is different from an ideal optical subsystem, and mainly has errors in the following aspects, namely, system errors caused by optical design; residual errors after the optical element is processed, including size, surface shape and the like; thirdly, adjusting errors; optical design errors and processing errors which are taken as system errors cannot be eliminated after the optical element is formed, and only installation and adjustment errors can be reduced as much as possible in order to improve the imaging quality of an optical system; computer-aided adjustment can correct wavefront aberration generated by relative position deviation of each element of an optical system, and most of the current computer-aided adjustment methods of the optical system adopt a sensitivity matrix method: the wavefront aberration of an optical system is mainly caused by the position misalignment of optical elements in the system, so that the aberration (delta) of the optical system can be represented by the misalignment of the optical elementsF=AΔx, ΔFThe difference value of the actual wave-front aberration and the ideal wave-front aberration of the system is expressed by the difference value of Zenike coefficients; deltaxThe difference between the actual position and the ideal position of each optical element in the system, i.e. the amount of detuning to be solved,Afor the sensitivity matrix, optical design software such as Zemax can be used for respectively giving the detuning amount of each optical element, and the detuning amount can be calculated according to the ratio of the Zernike coefficient to the element detuning amount), and after the sensitivity matrix of the optical system and the aberration of the optical system are calculated, the position detuning amount of the optical element can be calculated;
however, the existing sensitivity matrix method has the following disadvantages: for the movement of the optical elements in the axial direction, the interval of the optical elements represented by the positive displacement of the previous element and the negative displacement of the next element is the same, so that the axial movement of the two optical elements in different directions can produce the same phase difference. Because two or several different optical elements can generate the same phase difference, the optical elements generate approximate correlation phenomena in the axial direction when the system is adjusted, and the existing sensitivity matrix method is difficult to solve the problem of non-convergence of the system adjustment caused by mutual compensation of the positions of the optical elements, thereby reducing the computer-aided efficiency and precision.
Disclosure of Invention
The invention provides a computer-aided installation and adjustment method of a coaxial optical subsystem, aiming at solving the problems of reduced installation and adjustment precision and reduced installation and adjustment efficiency caused by non-convergence of system installation and adjustment caused by mutual compensation of optical element positions in the conventional installation and adjustment method.
To achieve the above object, according to one aspect of the present invention, there is provided a computer-aided tuning method of a coaxial optical system, comprising the steps of:
s1: establishing an optical model of the optical system to be adjusted and aligning the optical model along the optical pathnThe optical elements are numbered in sequence; respectively establishing a plurality of optical subsystems according to the numbering sequenceM i Optical subsystemM i Including an optical element 1iDifferent optical subsystemsM i The relative positions of the optical elements included in (a) remain unchanged; wherein,nis a natural number greater than 1;i=1~n；
s2: selecting optical subsystems separatelyM i And obtaining the optical subsystem through simulation analysisM i Ideal wavefront aberration ofF0i；
S3: for optical subsystemM i Optical element ofiIntroducing analog position deviation delta not greater than coarse adjustment precisionx is Using optical design software to introduce the analog position deviation amount deltax is Rear optical subsystemM i Carrying out simulation analysis to obtain the optical subsystemM i Simulated wavefront aberration at intermediate image planeFis；
S4: according to the magnitude of analog position deviation Deltax is Ideal wavefront aberrationF0iAnd simulating wavefront aberrationsFisRespectively solving the optical subsystems by adopting a sensitivity matrix formulaM i Corresponding sensitivity matrix and extraction of optical elementsiOf the sensitivity matrixAi；
Ai=（Fis-F0i）/Δx is ；
S5: when in useiIn case of =1, an optical element is usediOf the sensitivity matrixAiFor optical subsystemM i Performing tolerance analysis to the optical subsystemM i Object plane of the optical subsystem as a referenceM i And according to the result of tolerance analysis, to the optical subsystemM i Optical element ofiPerforming rough assembly and adjustment;
when in usei> 1, using optical elementsiOf the sensitivity matrixAiFor optical subsystemM i Performing tolerance analysis to the optical subsystemM i Object plane and a mounted and adjusted optical elementi-1 determining an optical subsystem as a referenceM i And according to the result of tolerance analysis, to the optical subsystemM i Optical element ofiPerforming rough assembly and adjustment;
s6: optical subsystem obtained after rough installation and adjustment by utilizing measurement of wavefront sensorM i Actual wavefront aberration of the image planeFi；
S7: from a sensitivity matrixAiActual wavefront aberrationFiAnd ideal wavefront aberrationF0iObtaining the optical element by inverse solutioniAmount of positional deviation Δx i And a type of deviation;
Δx i =（Fi -F0i）/ Ai
s8: based on the calculated optical elementiAmount of positional deviation Δx i Adjusting the optical subsystem in response to the type of aberrationM i Optical element ofiThe position of (a);
s9: re-measurement of optical subsystems with wavefront sensorsM i Actual wavefront aberration of the image planeFi，And determining the actual wavefront aberrationFiWith ideal wavefront aberrationF0iIf the deviation is within the allowable range, the optical element is turned oniCompleting the installation and adjustment; if not, returning to the step S6;
s10: completing the optical subsystems in sequence according to the method of steps S5-S9M i Optical element ofiAnd (4) debugging.
Preferably, the computer-aided installation and adjustment method further includes the following steps:
s11: completing the optical elementiAfter being adjusted, the optical subsystem is detected and judged through the wavefront sensorM i If the imaging quality requirement is met, the whole optical system is adjusted; if not, the adjusting process of the steps S5 to S10 is repeated.
Preferably, the computer-aided installation and adjustment method includes the types of the position deviation amount including X-axis eccentricity, X-axis inclination, Y-axis eccentricity, Y-axis inclination, and a distance from the previous optical element; for the first optical subsystem, the separation distance is the distance from the optical element 1 to the object plane.
Preferably, in the computer-aided installation and tuning method, the wavefront sensor is implemented by a phase-shifting interferometer.
Preferably, in the computer-aided tuning method, the Zenike coefficients used in the sensitivity matrix are stripe Zenike coefficients or standard Zenike coefficients.
Preferably, in the computer-aided tuning method, the Zenike coefficient is 37 terms.
In general, compared with the prior art, the above technical solution contemplated by the present invention can achieve the following beneficial effects:
the invention provides a computer-aided installation and adjustment method of a coaxial optical subsystem, which is used for numbering a plurality of optical elements in the coaxial optical subsystem and respectively establishing the optical subsystem according to the numbering sequenceM i Wherein the optical subsystemM i Comprising an optical element 1i(ii) a Respectively designing sensitivity matrixes of all subsystems, sequentially adjusting each optical element according to the sensitivity matrixes corresponding to all optical subsystems according to the light path sequence to enable the position deviation amount to fall within an error allowable rangeiAdjusting the position of the optical element to the adjusted 1 st to 1 stiThe 1 optical element is used as a reference, so that the problem of mutual position compensation of the optical elements in the adjusting process of the traditional sensitivity matrix method can be avoided, the convergence speed in the adjusting process is increased, and the adjusting precision and the adjusting efficiency are improved; meanwhile, the problem that the optical elements cannot be installed and adjusted when axially translating is solved, and the coaxial precision of the optical elements in the optical system is ensured while the optical system has better imaging quality.
Drawings
FIG. 1 is a schematic diagram of an optical model of an optical system to be adjusted according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of three optical subsystems provided by an embodiment of the present invention;
in all the figures, the same reference numerals denote the same features, in particular: 1. 2, 3-lens, 4-phase shift interferometer, 5, 7-compensator, 6-standard plane mirror.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
The invention provides a computer-aided installation and adjustment method of a coaxial optical subsystem, which comprises the following steps:
s1: establishing an optical model of an optical system to be adjusted in optical design software and aligning the optical model in the optical model along the optical path directionnThe optical elements are numbered in sequence; respectively establishing optical subsystems according to the numbering sequenceM i Optical subsystemM i Including an optical element1~iAnd the relative position of each optical element remains unchanged; wherein,nis a natural number greater than 1;i=1~n；
s2: selecting optical subsystemsM i Image plane position ofAnd obtaining the optical subsystem through simulation analysisM i Corresponding ideal wavefront aberrationF0i；
S3: for optical subsystemM i Optical element ofiIntroducing analog position deviation delta not greater than coarse adjustment precisionx is Using optical design software to introduce the analog position deviation deltax is The last optical subsystemM i Carrying out simulation analysis to obtain the optical subsystemM i Simulated wavefront aberration at intermediate image planeFis；
S4: according to the magnitude of analog position deviation Deltax is Ideal wavefront aberrationF0iAnd simulating wavefront aberrationsFisRespectively solving the optical subsystems by adopting a sensitivity matrix formulaM i Corresponding sensitivity matrix and extraction of optical elementsiOf the sensitivity matrixAi；
Ai=（Fis-F0i）/Δx is ；
By usingF j (j=1,2,…,m) Representing wavefront aberration of optical system, and positional deviation amount parameter of each optical elementx i (i=1, 2,…, n ) It is shown that, among others,mthe number of terms representing the Zenike coefficients; the positional relationship of the wavefront aberration of the optical system and the optical element can be expressed by the following formula,
wherein,F j =f j (x 1,…, x n ) Characterizing a positional relationship between a particular wavefront aberration and the optical element; expanding the formula (1) by using Taylor formula, and taking constant term and first order term to approximately solveF j =f j (x 1,…, x n ) The exact function of (c):
F 0jis ideal wavefront aberration after the optical system is designed,x 01 ,…,x n0is an ideal position for the optical element or elements,F j is the actual wavefront aberration of the current system,x 1 ,…,x n is the actual position of each optical element,
for the differential representation of the first partial derivative of a certain aberration to position parameter, the optical element can be solved according to the above equation systemnSensitivity matrix of (2):
s5: obtaining the optical subsystems according to the methods of the steps S3-S4M i Corresponding sensitivity matrixAi；
S6: when in useiIn case of =1, an optical element is usediOf the sensitivity matrixAiFor optical subsystemM i Performing tolerance analysis to the optical subsystemM i Object plane of the optical subsystem as a referenceM i And according to the result of tolerance analysis, to the optical subsystemM i Optical element ofiPerforming rough assembly and adjustment;
when in useiWhen > 1, using optical elementsiOf the sensitivity matrixAiFor optical subsystemM i Performing tolerance analysis to the optical subsystemM i Object plane of (1) and optical element (1) mounted and adjustedi-1 determining an optical subsystem as a referenceM i And according to the result of tolerance analysis, to the optical subsystemM i Optical element ofiPerforming rough assembly and adjustment;
s7: optical subsystem obtained after rough installation and adjustment by utilizing measurement of wavefront sensorM i Actual wavefront aberration of the image planeFi；
S8: from a sensitivity matrixAiActual wavefront aberrationFiAnd ideal wavefront aberrationF0iObtaining the optical element by inverse solutioniAmount of positional deviation Δx i And a type of deviation;
Δx i =（Fi -F0i）/ Ai
s9: based on the calculated optical elementiAmount of positional deviation Δx i Adjusting the optical subsystem in response to the type of aberrationM i Optical element ofiThe position of (a);
s10: re-measurement of optical subsystems with wavefront sensorsM i Actual wavefront aberration of the image planeFi，And determining the actual wavefront aberrationFiWith ideal wavefront aberrationF0iIf the deviation is within the allowable range, the optical element is turned oniCompleting the installation and adjustment; if not, returning to the step S7;
s11: completing the optical subsystems in sequence according to the method of steps S6-S10M i Optical element ofiDebugging;
s12: completing the optical elementiAfter being adjusted, the optical subsystem is detected by the wavefront sensorM i Judging whether the wave front aberration meets the imaging quality requirement, if so, finishing the adjustment of the whole optical system; if not, the adjusting process of the steps S5 to S10 is repeated.
In a preferred embodiment, the types of positional deviation include X-axis decentration, X-axis tilt, Y-axis decentration, Y-axis tilt, separation distance from the previous optical element; for the first optical subsystem, the separation distance is the distance from the optical element 1 to the object plane;
in a preferred embodiment, the optical design software is implemented using Zemax software;
in a preferred embodiment, the wavefront sensor is implemented using a phase-shifting interferometer;
in a preferred embodiment, the Zenike coefficients adopted by the sensitivity matrix are stripe Zenike coefficients, and the number of terms of the stripe Zenike coefficients is 37;
the computer-aided installation and debugging method provided by the invention is explained by a specific embodiment;
the computer-aided debugging method provided by the embodiment comprises the following steps of:
s1: establishing an optical model of a laser far-field collimation system to be adjusted in optical design software Zemax, wherein the laser far-field collimation system comprises a phase-shifting interferometer 4, compensators 5 and 7, lenses 1, 2 and 3 and a standard plane mirror 6 as shown in figures 1 and 2; the compensator 7 and the plane reflector 6 are used for returning the light path, and the compensator 5 is used for adjusting the aperture of the light beam; the phase shift interferometer 4 serves as a wavefront sensor for measuring wavefront aberration of the optical system;
numbering the three lenses according to the light path direction, and recording as a lens 1, a lens 2 and a lens 3; respectively establishing 3 optical subsystems according to the numbering sequenceM1、M2、M3As shown in FIG. 2, the 1 st optical subsystemM1Including lens 1, 2 nd optical subsystemM2Including lens 1 and lens 2, 3 rd optical subsystemM3Comprises a lens 1, a lens 2 and a lens 3; the relative positions of the lens 1, the lens 2 and the lens 3 in each optical subsystem are unchanged;
s2: according to the optical subsystemM1、M2、M3Reasonably selecting image surface positions according to the structure and imaging characteristics of the optical system, and respectively obtaining ideal wavefront aberration of each optical subsystem through simulation analysisF01、F02、F03；
S3: respectively to the optical subsystemsM1Lens 1 in (1), optical subsystemM2Lens 2 in (1), optical subsystemM3The lens 3 in (1) introduces a position deviation amount delta not greater than the coarse-setting precisionx 1s 、Δx 2s 、Δx 3s Respectively carrying out simulation analysis on each optical subsystem after introducing the analog position deviation value by using optical design software Zemax to obtain the analog wavefront aberration of the image surface in each optical subsystemF1s、F2s、F3s；
S4：According to the magnitude of analog position deviation Deltax 1s Ideal wavefront aberrationF01And simulating wavefront aberrationsF1sSolving the optical subsystem by using a sensitivity matrix formulaM1Of lens 1A1(ii) a The optical subsystems are determined in the same mannerM2Of the lens 2A2Optical subsystemM3Of the lenses 3A3；
The Zenike coefficients preferably adopted for solving the sensitivity matrix are 37 terms, and the first 9 terms of the Zenike coefficients can also be adopted as primary aberration to solve the sensitivity matrix; the Zenike coefficients are fringe Zenike coefficients (matched to the phase-shifting interferometer 4);
table 1 shows the optical subsystemsM1Of the sensitivity matrixA1(ii) a Table 2 shows the optical subsystemsM2Of the sensitivity matrixA2(ii) a Table 3 shows the optical subsystemsM3Of the sensitivity matrixA3；
TABLE 1 optical subsystemM1Of the sensitivity matrixA1
| Amount of detuning | DX | DY | | TX | TY | |
| 1 | 0 | 0 | -0.24521 | 0 | 0 | |
| 2 | 0.038744 | 0 | 0 | 0 | -0.18134 | |
| 3 | 0 | 0.038743 | 0 | 0.181342 | 0 | |
| 4 | 0 | 0 | -0.24624 | 0 | 0 | |
| 5 | 0 | 0 | 0 | 0 | 0 | |
| 6 | 0 | 0 | 0 | 0 | 0 | |
| 7 | 0.01935 | 0 | 0 | 0 | -0.0888 | |
| 8 | 0 | 0.01935 | 0 | 0.088798 | 0 | |
| 9 | 0 | 0 | 0.00103 | 0 | 0 | |
| 10 | -3.5E-07 | 0 | 0 | 0 | -8.1E-07 | |
| 11 | 0 | 3.5E-07 | 0 | -8.1E-07 | 0 | |
| 12 | 0 | 0 | 0 | 0 | 0 | |
| 13 | 0 | 0 | 0 | 0 | 0 | |
| 14 | -1.5E-05 | 0 | 0 | 0 | 0.001254 | |
| 15 | 0 | -1.5E-05 | 0 | -0.00125 | 0 | |
| 16 | 0 | 0 | 3.42E-06 | 0 | 0 | |
| 17 | 0 | 0 | 0 | 0 | 0 | |
| 18 | 0 | 0 | 0 | 0 | 0 | |
| 19 | 0 | 0 | 0 | 0 | 0 | |
| 20 | 0 | 0 | 0 | 0 | 0 | |
| 21 | 0 | 0 | 0 | 0 | 0 | |
| 22 | 0 | 0 | 0 | 0 | 0 | |
| 23 | 0 | 0 | 0 | 0 | 3.7E-06 | |
| 24 | 0 | 0 | 0 | -3.7E-06 | 0 | |
| 25 | 0 | 0 | 0 | 0 | 0 | |
| 26 | 0 | 0 | 0 | 0 | 0 | |
| 27 | 0 | 0 | 0 | 0 | 0 | |
| 28 | 0 | 0 | 0 | 0 | 0 | |
| 29 | 0 | 0 | 0 | 0 | 0 | |
| 30 | 0 | 0 | 0 | 0 | 0 | |
| 31 | 0 | 0 | 0 | 0 | 0 | |
| 32 | 0 | 0 | 0 | 0 | 0 | |
| 33 | 0 | 0 | 0 | 0 | 0 | |
| 34 | 0 | 0 | 0 | 0 | 0 | |
| 35 | 0 | 0 | 0 | 0 | 0 | |
| 36 | 0 | 0 | 0 | 0 | 0 | |
| 37 | 0 | 0 | 0 | 0 | 0 |
TABLE 2 optical subsystemsM2Of the sensitivity matrixA2
| Amount of detuning | DX | DY | DZ | TX | TY |
| 1 | 0 | 0 | 0.361088 | 0 | 0 |
| 2 | -0.05296 | 0 | 0 | 0 | -0.04304 |
| 3 | 0 | -0.05296 | 0 | 0.043043 | 0 |
| 4 | 0 | 0 | 0.361768 | 0 | 0 |
| 5 | 0 | 0 | 0 | 0 | 0 |
| 6 | 0 | 0 | 0 | 0 | 0 |
| 7 | -0.02667 | 0 | 0 | 0 | -0.02176 |
| 8 | 0 | -0.02667 | 0 | 0.021758 | 0 |
| 9 | 0 | 0 | 0.000677 | 0 | 0 |
| 10 | 0 | 0 | 0 | 0 | -4.2E-07 |
| 11 | 0 | 0 | 0 | -4.2E-07 | 0 |
| 12 | 0 | 0 | 0 | 0 | 0 |
| 13 | 0 | 0 | 0 | 0 | 0 |
| 14 | -0.00012 | 0 | 0 | 0 | -0.00014 |
| 15 | 0 | -0.00012 | 0 | 0.000145 | 0 |
| 16 | 0 | 0 | -3E-06 | 0 | 0 |
| 17 | 0 | 0 | 0 | 0 | 0 |
| 18 | 0 | 0 | 0 | 0 | 0 |
| 19 | 0 | 0 | 0 | 0 | 0 |
| 20 | 0 | 0 | 0 | 0 | 0 |
| 21 | 0 | 0 | 0 | 0 | 0 |
| 22 | 0 | 0 | 0 | 0 | 0 |
| 23 | 5.92E-06 | 0 | 0 | 0 | 9.83E-06 |
| 24 | 0 | 5.92E-06 | 0 | -9.8E-06 | 0 |
| 25 | 0 | 0 | 0 | 0 | 0 |
| 26 | 0 | 0 | 0 | 0 | 0 |
| 27 | 0 | 0 | 0 | 0 | 0 |
| 28 | 0 | 0 | 0 | 0 | 0 |
| 29 | 0 | 0 | 0 | 0 | 0 |
| 30 | 0 | 0 | 0 | 0 | 0 |
| 31 | 0 | 0 | 0 | 0 | 0 |
| 32 | 0 | 0 | 0 | 0 | 0 |
| 33 | 0 | 0 | 0 | 0 | 0 |
| 34 | 0 | 0 | 0 | 0 | 9.41E-08 |
| 35 | 0 | 0 | 0 | -9.4E-08 | 0 |
| 36 | 0 | 0 | 0 | 0 | 0 |
| 37 | 0 | 0 | 0 | 0 | 0 |
TABLE 3 optical subsystemM3Of the sensitivity matrixA3
| Amount of detuning | DX | DY | | TX | TY | |
| 1 | 0 | 0 | 0.028916 | 0 | 0 | |
| 2 | 0.213123 | 0 | 0 | 0 | -0.08788 | |
| 3 | 0 | 0.21315 | 0 | 0.087879 | 0 | |
| 4 | 0 | 0 | 0.02886 | 0 | 0 | |
| 5 | 0 | 0 | 0 | 0 | 0 | |
| 6 | 0 | 0 | 0 | 0 | 0 | |
| 7 | 0.1235 | 0 | 0 | 0 | -0.04172 | |
| 8 | 0 | 0.123507 | 0 | 0.041716 | 0 | |
| 9 | 0 | 0 | -4.2E-05 | 0 | 0 | |
| 10 | -1.7E-05 | 0 | 0 | 0 | 0 | |
| 11 | 0 | 1.67E-05 | 0 | 0 | 0 | |
| 12 | 0 | 0 | 0 | 0 | 0 | |
| 13 | 0 | 0 | 0 | 0 | 0 | |
| 14 | 0.009487 | 0 | 0 | 0 | 0.001106 | |
| 15 | 0 | 0.009483 | 0 | -0.00111 | 0 | |
| 16 | 0 | 0 | 1.41E-05 | 0 | 0 | |
| 17 | 0 | 0 | 0 | 0 | 0 | |
| 18 | 0 | 0 | 0 | 0 | 0 | |
| 19 | 3.33E-06 | 0 | 0 | 0 | 0 | |
| 20 | 0 | -3.3E-06 | 0 | 0 | 0 | |
| 21 | 0 | 0 | 0 | 0 | 0 | |
| 22 | 0 | 0 | 0 | 0 | 0 | |
| 23 | -0.00136 | 0 | 0 | 0 | -0.00027 | |
| 24 | 0 | -0.00136 | 0 | 0.000272 | 0 | |
| 25 | 0 | 0 | -5.8E-07 | 0 | 0 | |
| 26 | 0 | 0 | 0 | 0 | 0 | |
| 27 | 0 | 0 | 0 | 0 | 0 | |
| 28 | 0 | 0 | 0 | 0 | 0 | |
| 29 | 0 | 0 | 0 | 0 | 0 | |
| 30 | 0 | 0 | 0 | 0 | 0 | |
| 31 | 0 | 0 | 0 | 0 | 0 | |
| 32 | 0 | 0 | 0 | 0 | 0 | |
| 33 | 0 | 0 | 0 | 0 | 0 | |
| 34 | 0 | 0 | 0 | 0 | 9.41E-08 | |
| 35 | 0 | 0 | 0 | -9.4E-08 | 0 | |
| 36 | 0 | 0 | 0 | 0 | 0 | |
| 37 | 0 | 0 | 0 | 0 | 0 |
In the above tables, DX represents the eccentricity of the optical element in the X-axis direction; DY represents eccentricity of the optical element in the Y direction; DZ represents the spacing of the optical elements in the Z direction (i.e., the separation distance from the previous optical element); TX represents the tilt of the optical element about the X-axis; TY represents the tilt of the optical element about the Y axis;
s5: using sensitivity matricesA1For optical subsystemM1Performing tolerance analysis to the optical subsystemM1Object plane of the optical subsystem as a referenceM1And according to the result of tolerance analysis, to the optical subsystemM1The lens 1 in (1) is roughly installed and adjusted;
s6: optical subsystem after coarse adjustment by phase-shift interferometer 4 measurementM1Actual wavefront aberration of the image planeF1；
S7: from a sensitivity matrixA1Actual wavefront aberrationFnAnd ideal wavefront aberrationF0nThe inverse solution yields the amount of positional deviation Δ of the lens 1x 1 And a type of deviation;
Δx 1 =（F1 -F01）/ A1
s8: based on the calculated positional deviation amount Δ of the lens 1x 1 Adjusting the position of lens 1 in optical subsystem M1 corresponding to the type of aberration;
s9: re-measurement of optical subsystems with wavefront sensorsM1Actual wavefront aberration of the image planeF1，Determining actual wavefront aberrationsF1Aberration of its original wavefrontF01If the deviation is within the allowable range, the lens 1 is adjusted; if not, returning to the step S6;
TABLE 4 variation in the amount of detuning of lens 1 in optical subsystem M1
| Number of iterations | DX | DY | | TX | TY | |
| 1 | 0.1181 | -0.1684 | 0.1597 | 0.0898 | 0.1798 | |
| 2 | 0.0019 | -0.0016 | -0.0097 | 0.0002 | 0.0002 | |
| 3 | 1.6×10-5 | -0.8×10-5 | 0.16×10-6 | 0.18×10-5 | 0.36×10-5 |
Table 4 shows the relationship between the number of iterations of the position adjustment of the lens 1 and the amount of positional deviation, and it can be seen from table 4 that as the number of times of adjustment increases, the amount of positional deviation of the lens 1 gradually decreases, and after three feedback adjustments, the amount of positional deviation of the lens 1 decreases to 10-5And the position adjusting precision is high.
S10: using sensitivity matricesA2For optical subsystemM2Performing tolerance analysis to the optical subsystemM2The object plane of the lens 1 is adjusted toReference determination optical subsystemM2And according to the result of tolerance analysis, to the optical subsystemM2The lens 2 in the middle is roughly installed and adjusted;
s11: optical subsystem after coarse adjustment by phase-shift interferometer 4 measurementM2Actual wavefront aberration of the image planeF2；
S12: from a sensitivity matrixA2Actual wavefront aberrationF2And ideal wavefront aberrationF02The inverse solution yields the amount of positional deviation Δ of the lens 2x 2 And a type of deviation;
Δx 2 =（F2 -F02）/ A2
s13: based on the calculated positional deviation amount Δ of the lens 2x 2 Adjusting the position of lens 2 in optical subsystem M2 corresponding to the type of aberration;
s14: re-measurement of optical subsystems with wavefront sensorsM2Actual wavefront aberration of the image planeF2，Determining actual wavefront aberrationsF2Aberration of its original wavefrontF02If the deviation is within the allowable range, the lens 2 is adjusted; if not, returning to the step S11;
table 5 shows a relationship between the iteration number of the position adjustment of the lens 2 and a variation of the misalignment amount, and it can be known from table 5 that as the adjustment number increases, each position deviation amount of the lens 2 gradually decreases, after three times of feedback adjustment, the position deviations DY and TX of the lens 2 both decrease to an order of 10 "4, DZ decreases to an order of 10" 5, and the deviation amounts of DX and TY decrease to 0, which indicates that the adjustment method provided in this embodiment has high adjustment accuracy.
TABLE 5 optical subsystemsM2Variation in the amount of misadjustment of the middle lens 2
| Number of iterations | DX | DY | | TX | TY | |
| 1 | 0.1395 | 0.1246 | 0.1585 | -0.1953 | -0.0995 | |
| 2 | 0.0005 | -0.0046 | -0.0037 | -0.0048 | -0.0004 | |
| 3 | 0 | 0.685×10-4 | -0.13×10-5 | 0.839×10-4 | 0 |
S15: according to the method of steps S10-S14, the optical subsystem is calibratedM3Adjusting the position of the middle lens 3;
table 6 shows a relationship between the iteration number of the position adjustment of the lens 3 and a variation of the misalignment amount, and it can be seen from table 6 that as the adjustment number increases, the amount of positional deviation of the lens 3 gradually decreases, after two feedback adjustments, the positional deviations DY and DX of the lens 3 both decrease to 0, and after three feedback adjustments, the positional deviations DZ, TX and TY also decrease to 0, which indicates that the adjustment method provided in this embodiment has high adjustment accuracy.
TABLE 6 optical subsystemsM3Variation in the amount of misadjustment of the middle lens 3
| Number of iterations | DX | DY | | TX | TY | |
| 1 | 0.1700 | 0.0600 | 0.0452 | 0.1801 | -0.1504 | |
| 2 | 0 | 0 | 0.1548 | -0.0001 | 0.0004 | |
| 3 | 0 | 0 | 0.14 | 0 | 0 | |
| 4 | 0 | 0 | 0 | 0 | 0 |
S16: after the lens 3 is adjusted, the optical subsystem is detected and judged by the phase-shift interferometer 4M3If the imaging quality requirement is met, the whole optical system is adjusted; if not, the adjusting process of the steps S4 to S15 is repeated. Measuring optical subsystems with phase-shifting interferometer 4M3And (namely the whole optical system) aberration, judging whether the obtained result is consistent with the aberration requirement of the optical system designed by ZEMAX optical design software, and if so, indicating that the imaging quality requirement is met.
Compared with the conventional computer-aided installation and adjustment method, the computer-aided installation and adjustment method of the coaxial optical subsystem, provided by the invention, is used for numbering a plurality of optical elements in the coaxial optical system and respectively establishing the optical subsystems according to the numbering sequenceM i Wherein the optical subsystemM i Including an optical element 1i(ii) a Respectively designing sensitivity matrixes of the subsystems, sequentially adjusting each optical element according to the sensitivity matrixes corresponding to the optical subsystems according to the light path sequence to enable the position deviation amount to fall within an error allowable range, and when the position deviation amount falls within the error allowable range, respectively designing the sensitivity matrixes of the subsystems according to the sensitivity matrixes corresponding to the optical subsystemsiWhen > 1, the optical elementiThe position of (1) is adjusted to the adjusted positioniThe 1 optical element is used as a reference, so that the problem of mutual position compensation of the optical elements in the adjusting process of the traditional sensitivity matrix method can be avoided, the convergence speed in the adjusting process is increased, and the adjusting precision and the adjusting efficiency are improved; at the same time solve the existence of each optical elementThe problem that the optical system cannot be adjusted during axial translation ensures that the optical system has better imaging quality and simultaneously ensures the coaxial precision of each optical element in the optical system.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (6)
1. A computer-aided installation and adjustment method of a coaxial optical system is characterized by comprising the following steps:
s1: establishing an optical model of the optical system to be adjusted and aligning the optical model along the optical pathnThe optical elements are numbered in sequence; respectively establishing a plurality of optical subsystems according to the numbering sequenceM i Optical subsystemM i Including an optical element 1iDifferent optical subsystemsM i The relative positions of the optical elements included in (a) remain unchanged; wherein,nis a natural number greater than 1;i=1~n；
s2: selecting optical subsystems separatelyM i And obtaining the optical subsystem through simulation analysisM i Ideal wavefront aberration ofF0i；
S3: for optical subsystemM i Optical element ofiIntroducing an analog position deviation amount not greater than the coarse adjustment precisionΔx is Using optical design software to introduce the said analog position deviationΔx is Rear optical subsystemM i Carrying out simulation analysis to obtain the optical subsystemM i Simulated wavefront aberration at intermediate image planeFis；
S4: according to the magnitude of the analog position deviationΔx is Ideal wavefront aberrationF0iAnd simulating wavefront aberrationsFisRespectively solving the optical subsystems by adopting a sensitivity matrix formulaM i Corresponding sensitivity momentArray-and-extraction optical elementiOf the sensitivity matrixAi；
Ai=（Fis-F0i）/Δx
is
；
S5: when in useiIn case of =1, an optical element is usediOf the sensitivity matrixAiFor optical subsystemM i Performing tolerance analysis to the optical subsystemM i Object plane of the optical subsystem as a referenceM i And according to the result of tolerance analysis, to the optical subsystemM i Optical element ofiPerforming rough assembly and adjustment;
when in useiWhen > 1, using optical elementsiOf the sensitivity matrixAiFor optical subsystemM i Performing tolerance analysis to the optical subsystemM i Object plane and a mounted and adjusted optical elementi-1 determining an optical subsystem as a referenceM i And according to the result of tolerance analysis, to the optical subsystemM i Optical element ofiPerforming rough assembly and adjustment;
s6: optical subsystem obtained after rough installation and adjustment by utilizing measurement of wavefront sensorM i Actual wavefront aberration of the image planeFi；
S7: from a sensitivity matrixAiActual wavefront aberrationFiAnd ideal wavefront aberrationF0iObtaining the optical element by inverse solutioniAmount of positional deviation ofΔx i And a type of deviation;
Δx i =（Fi -F0i）/ Ai
s8: based on the calculated optical elementiAmount of positional deviation ofΔx i Adjusting the optical subsystem in response to the type of aberrationM i Optical element ofiThe position of (a);
s9: re-measurement of optical subsystems with wavefront sensorsM i Actual wavefront aberration of the image planeFi，And judgeThe actual wavefront aberrationFiWith ideal wavefront aberrationF0iIf the deviation is within the allowable range, the optical element is turned oniCompleting the installation and adjustment; if not, returning to the step S6;
s10: completing the optical subsystems in sequence according to the method of steps S5-S9M i Optical element ofiAnd (4) debugging.
2. The computer-aided installation method of claim 1, further comprising the steps of:
s11: completing the optical elementiAfter being adjusted, the optical subsystem is detected and judged through the wavefront sensorM i If the imaging quality requirement is met, the whole optical system is adjusted; if not, the adjusting process of the steps S5 to S10 is repeated.
3. The computer-aided installation method of claim 1 or 2, wherein the type of the positional deviation amount includes X-axis decentration, X-axis tilt, Y-axis decentration, Y-axis tilt, a separation distance from a previous optical element; for the first optical subsystem, the separation distance is the distance from the first optical element to the object plane.
4. The computer-assisted installation method of claim 1, wherein the wavefront sensor is implemented using a phase-shifting interferometer.
5. The computer-aided tuning method of claim 1, wherein the sensitivity matrix employs Zenike coefficients that are striped Zenike coefficients or standard Zenike coefficients.
6. The computer-assisted installation method of claim 5, wherein the Zenike coefficients are 37 terms.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810637401.6A CN109031659B (en) | 2018-06-20 | 2018-06-20 | Computer-aided installation and adjustment method of coaxial optical system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810637401.6A CN109031659B (en) | 2018-06-20 | 2018-06-20 | Computer-aided installation and adjustment method of coaxial optical system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109031659A CN109031659A (en) | 2018-12-18 |
| CN109031659B true CN109031659B (en) | 2020-11-24 |
Family
ID=64610185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810637401.6A Active CN109031659B (en) | 2018-06-20 | 2018-06-20 | Computer-aided installation and adjustment method of coaxial optical system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109031659B (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109799065B (en) * | 2019-01-14 | 2020-08-04 | 哈尔滨工业大学 | Method for generating continuous focusing wave based on second-order wave generation theory |
| CN110031198B (en) * | 2019-04-25 | 2020-11-10 | 上海工程技术大学 | Energy-considered strain load spectrum compiling method |
| CN110596910B (en) * | 2019-09-18 | 2021-05-18 | 西安应用光学研究所 | Method for assembling and adjusting common-aperture optical system with secondary mirror focusing mechanism |
| CN110634372B (en) * | 2019-09-29 | 2021-12-07 | 中国科学院长春光学精密机械与物理研究所 | Optical system installation and adjustment strategy verification system |
| CN111488701B (en) * | 2020-06-28 | 2020-10-16 | 中国人民解放军国防科技大学 | Computer-aided debugging method, device and equipment based on point spread function |
| CN112033302B (en) * | 2020-08-25 | 2021-11-23 | 长春长光智欧科技有限公司 | Optical system installation and adjustment equipment capable of compensating in real time and installation and adjustment method thereof |
| CN112558318B (en) * | 2020-11-30 | 2021-09-28 | 中国科学院长春光学精密机械与物理研究所 | Auxiliary adjusting method for large-caliber optical element |
| CN112905952A (en) * | 2021-02-09 | 2021-06-04 | 南京信息工程大学 | Wavefront gradient data reconstruction method for optical element with any aperture |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101566373B1 (en) * | 2014-05-02 | 2015-11-13 | 한국표준과학연구원 | Alignment Method For Optical System With Large Aberration To Distinguish Aberrations Of Optical Design And Misalignments |
| CN107271150A (en) * | 2017-06-27 | 2017-10-20 | 南京理工大学 | A kind of Computer Aided Assembly Process Planning method based on interferometry and sensitivity matrix |
| CN108121049A (en) * | 2017-12-19 | 2018-06-05 | 北京空间机电研究所 | A kind of adjustment test method of multispectral section of multichannel remote sensing camera camera lens |
-
2018
- 2018-06-20 CN CN201810637401.6A patent/CN109031659B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101566373B1 (en) * | 2014-05-02 | 2015-11-13 | 한국표준과학연구원 | Alignment Method For Optical System With Large Aberration To Distinguish Aberrations Of Optical Design And Misalignments |
| CN107271150A (en) * | 2017-06-27 | 2017-10-20 | 南京理工大学 | A kind of Computer Aided Assembly Process Planning method based on interferometry and sensitivity matrix |
| CN108121049A (en) * | 2017-12-19 | 2018-06-05 | 北京空间机电研究所 | A kind of adjustment test method of multispectral section of multichannel remote sensing camera camera lens |
Non-Patent Citations (2)
| Title |
|---|
| "Reverse-optimization Alignment Algorithm using Zernike Sensitivity";Eugene D. Kim, et al;《Journal of the Optical Society of Korea》;20050630;第2卷(第9期);正文全文 * |
| "空间遥感相机共轴三反光学系统装调技术研究";韩娟;《中国优秀硕士学位论文全文数据库 工程科技II辑》;20170315;正文全文 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109031659A (en) | 2018-12-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109031659B (en) | Computer-aided installation and adjustment method of coaxial optical system | |
| CN110567393B (en) | Large-curvature-radius free-form surface mirror surface shape interference measurement device and method | |
| US7283204B2 (en) | Method of producing an optical imaging system | |
| CN110188321B (en) | Primary and secondary mirror calibration method based on neural network algorithm | |
| CN107505684B (en) | Method for assembling and adjusting lens group | |
| KR20130123423A (en) | Method of operating a projection exposure tool | |
| US20120296591A1 (en) | Wavefront optical measuring apparatus | |
| CN110470398B (en) | Method for assembling and adjusting focusing-free interference spectrometer | |
| CN111650747B (en) | Method and device for real-time correction of defocusing aberration of collimator | |
| CN102207378A (en) | High-precision adjustment error correction method based on wavefront difference in spherical interference detection | |
| CN108519671B (en) | Closed-loop correction control method for phase translation error of splicing telescope system | |
| CN110986823A (en) | Large-caliber correcting mirror surface shape measuring system and method | |
| CN110966954A (en) | Large-caliber optical element surface shape splicing detection method and device | |
| CN111694016A (en) | Non-interference synthetic aperture super-resolution imaging reconstruction method | |
| CN112525071B (en) | Method for inhibiting non-uniformity influence of optical material in large-aperture interferometer | |
| CN113917686A (en) | Image-based splicing diffraction telescope splicing error parallel correction method | |
| CN115682991A (en) | Method for detecting non-uniformity of curvature radius of each sub-mirror of spliced telescope in orbit | |
| CN102589472A (en) | Method for highly precisely eliminating adjustment error in spherical surface shape interference detection | |
| CN114185144B (en) | Mounting and adjusting method for mounting and adjusting large-caliber optical system based on small-caliber plane mirror | |
| CN112985453A (en) | Simulation method for error term of active optical system of optical remote sensing camera | |
| CN114034470A (en) | Telescope wavefront rotation angle calculation method and device and telescope | |
| Dmitriev et al. | Technology for developing a high-aperture four-mirror lens with aspherical mirrors | |
| CN115358132B (en) | Interferometer thermal stability optimization method based on optical-mechanical thermal integration analysis | |
| CN114964523B (en) | Wavefront sensor adjustment method for active optical correction system | |
| CN117130172B (en) | Global adjustment method, device, equipment and medium for spliced space telescope |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |