CN109031659A - A kind of Computer Aided Assembly Process Planning method of coaxial optical system - Google Patents
A kind of Computer Aided Assembly Process Planning method of coaxial optical system Download PDFInfo
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Abstract
The invention discloses a kind of Computer Aided Assembly Process Planning methods of coaxial optical system, the following steps are included: S1: establishing the optical model of adjustable optical system to be installed and establish n optical subsystem respectively along optical path direction, n-th of optical subsystem includes 1~n of optical element；S2: choosing the image planes position of each optical subsystem and obtains ideal wave front aberration by simulation analysis；S3: position deviation is introduced to the optical element n in n-th of optical subsystem and measures simulation wave front aberration；S4: the corresponding sensitivity matrix of each optical subsystem is solved using sensitivity matrix formula respectively；S5: the physical location departure of optical element n in n-th of optical subsystem is solved using sensitivity matrix and actual wavefront aberration, and the optical element is adjusted, gradually to complete the adjustment of n optical subsystem；The present invention can avoid position of each optical element in adjustment process and mutually compensate problem, accelerate the convergence rate during adjustment, improve adjustment precision and adjustment efficiency.
Description
Technical field
The invention belongs to optical technical fields, coaxial more particularly, to a kind of high-precision based on sensitivity matrix method
The Computer Aided Assembly Process Planning method of optical system, the accurate adjustment and image quality that can be applied to optical system are promoted.
Background technique
Traditional optical system alignment relies primarily on the experience of adjustment personnel, completes, exists by simple resetting equipment
The disadvantages such as blindness is big, the adjustment period is long, precision is low are not suitable for heavy caliber or the adjustment close to diffraction limited optical system.With
Computer technology, optical design and optical detective technology continuous development so that Computer Aided Assembly Process Planning optical system becomes
It may.As high-precision optical system application demand increasingly increases, the performance of optical system is also to higher quality, higher property
The direction of energy is developed；The adjustment of complicated optical system becomes the hot topic of current optics advanced manufacturing field, is based on computer aided manufacturing
The relevant technologies such as the optical component surface shape of adjustment, the interferometry of light wave wavefront, computer optimization etc. are helped also to come into being.
Actual optical system is different from ideal optical subsystem, mainly has the error of following several respects: first is that optics
Systematic error brought by designing；Second is that residual error, including size, face shape etc. after optical element processing；Third is that adjustment misses
Difference；Wherein, optical design error and mismachining tolerance can not be eliminated after optical element forming as systematic error, in order to
The image quality for improving optical system can only minimize alignment error；Computer Aided Assembly Process Planning can be to each by optical system
The wave front aberration that a element relative position deviation generates is modified, at present the area of computer aided dress of overwhelming majority optical system
Tune method is all using sensitivity matrix method: the wave front aberration of optical system is mainly the position of optical element imbalance in system
It is caused, thus (Δ F=A Δ x, Δ F are the actual wavefront of system to available optical element misalignment rate characterization optical aberration
The difference of aberration and ideal wave front aberration, mostly uses the difference of Ze Nike Zenike coefficient to indicate；Δ x is each optics in system
The difference of the actual position and ideal position of element, that is, the misalignment rate for needing to solve, A is sensitivity matrix, using Zemax
Etc. optical design softwares, give the misalignment rate of each optical element respectively, asked according to the ratio of zernike coefficient and element misalignment rate
Out), position of optical element can be solved after acquiring optical system sensitivity matrix and measuring the aberration of optical system to lose
Tune amount；
But existing sensitivity matrix method has the disadvantage in that the movement for optical element in the axial direction, it is previous
It is identical, thus front and back two that the negative sense of the positive-displacement of element and next element, which is displaced characterized optical element interval,
The axial movement of a optical element in different directions can produce identical difference.Due to two or several different optics members
Part combination equally can produce identical difference, this allow for optical element when system adjustment generates in the axial direction approximation it is relevant
Phenomenon, and existing sensitivity matrix method is difficult to solve system adjustment caused by position of optical element mutually compensates and does not restrain, and leads
Cause the decline of area of computer aided efficiency and precision.
Summary of the invention
For at least one defect or Improvement requirement of the prior art, the present invention provides a kind of axis optical subsystems
Computer Aided Assembly Process Planning method, its object is to solve conventional Method of Adjustment, can not to solve position of optical element mutually complementary
The problem of system adjustment caused by repaying does not restrain, and leads to the reduction of adjustment precision, the decline of adjustment efficiency.
To achieve the above object, according to one aspect of the present invention, a kind of computer aided manufacturing of coaxial optical system is provided
Help Method of Adjustment, comprising the following steps:
S1: the optical model of adjustable optical system to be installed is established in optical design software and along optical path direction to optical mode
N optical element in type is sequentially numbered；Establish n optical subsystem, n-th of optics respectively according to number order
System includes 1~n of optical element, and the relative position of each optical element remains unchanged；Wherein, n is the natural number more than or equal to 1；
S2: the image planes position of n-th of optical subsystem is chosen, and n-th of optical subsystem is obtained by simulation analysis
Ideal wave front aberration F0n；
S3: the position deviation amount Δ for being not more than thick adjustment precision is introduced to the optical element n in n-th of optical subsystem
xns, using optical design software to introducing analog position departure Δ xnsOptical subsystem afterwards carries out simulation analysis, obtains
The simulation wave front aberration Fns of image planes in n-th of optical subsystem；
S4: according to analog position departure Δ xns, ideal wave front aberration F0n and simulation wave front aberration Fns, use is sensitive
Degree Matrix Formula solves the corresponding sensitivity matrix of n-th of optical subsystem respectively and extracts the sensitivity matrix of optical element n
An；
An=(Fns-F0n)/Δ xns；
S5: according to the number order of optical subsystem, using the sensitivity matrix An of optical element n to n-th of optics
System carries out TOLERANCE ANALYSIS, determination on the basis of the 1~n-1 of optical element good by the object plane of n-th optical subsystem and adjustment
The image planes position of n-th of optical subsystem, and according to TOLERANCE ANALYSIS result to the optical element n in n-th of optical subsystem into
The thick adjustment of row；
S6: the actual wavefront aberration of n-th of optical subsystem image planes after thick adjustment is obtained using Wavefront sensor measurement
Fn；
S7: obtain optical element n's by sensitivity matrix An, actual wavefront aberration Fn and the ideal anti-solution of wave front aberration F0n
Position deviation amount Δ xnAnd Deviation Type；
Δxn=(Fn-F0n)/An
S8: according to the position deviation amount Δ x for the optical element n being calculatednN-th of light of adjusting corresponding with Deviation Type
The position of optical element n in storage subsystem；
S9: it measures the actual wavefront aberration Fn of n-th of optical subsystem image planes again using Wavefront sensor, and judges
The deviation of the actual wavefront aberration Fn and ideal wave front aberration F0n whether within the allowable range, if so, optical element n adjustment
It completes；If it is not, then return step S6；
S10: by the method for step S5~S9, it is sequentially completed the adjustment to 1~n of optical element in optical subsystem n.
Preferably, above-mentioned Computer Aided Assembly Process Planning method, further comprising the steps of:
S11: after the adjustment for completing 1~n of optical element, judge whether optical subsystem n is full by Wavefront sensor detection
Sufficient image quality requirement, if so, completing entire optical system alignment；If it is not, the adjustment for the S5~S10 that then repeats the above steps
Process.
Preferably, above-mentioned Computer Aided Assembly Process Planning method, the type of position deviation amount include X-axis eccentric, X-axis inclination,
Y-axis is eccentric, Y-axis tilts, the spacing distance with previous optical element；For first optical subsystem, the spacing distance
The distance of object plane is arrived for optical element 1.
Preferably, above-mentioned Computer Aided Assembly Process Planning method, Wavefront sensor are realized using phase shifting interferometer.
Preferably, above-mentioned Computer Aided Assembly Process Planning method, the Zenike coefficient that sensitivity matrix uses is striped
Zenike coefficient or standard Zenike coefficient.
Preferably, above-mentioned Computer Aided Assembly Process Planning method, which is characterized in that the Zenike coefficient is 37.
In general, through the invention it is contemplated above technical scheme is compared with the prior art, can obtain down and show
Beneficial effect:
The Computer Aided Assembly Process Planning method of a kind of axis optical subsystem provided by the invention, for coaxial optical system
In multiple optical elements be numbered, n optical subsystem is established respectively according to number order, wherein n-th of optics subsystem
System includes 1~n of optical element；The sensitivity matrix for separately designing subsystems is corresponding sensitive according to each optical subsystem
Degree matrix is successively adjusted each optical element according to optical path sequence, its position deviation amount is made to fall into allowable range of error
Interior, the position of n-th of optical element adjusts on the basis of the 1~n-1 good optical element of adjustment, can be to avoid each
Position of the optical element in traditional sensitivity matrix method adjustment process mutually compensates problem, accelerates the convergence during adjustment
Speed improves adjustment precision and adjustment efficiency；Solve simultaneously each optical element there are when axial translation can not adjustment ask
Topic guarantees the coaxial precision of each optical element in optical system while guaranteeing that optical system has preferable image quality.
Detailed description of the invention
Fig. 1 is the optical model schematic diagram of adjustable optical system to be installed provided in an embodiment of the present invention；
Fig. 2 is the structural schematic diagram of three optical subsystems provided in an embodiment of the present invention；
In all the appended drawings, same appended drawing reference indicates identical technical characteristic, specifically: 1,2,3- lens, 4- phase
Move interferometer, 5,7- compensator, 6- standard flat reflecting mirror.
Specific embodiment
In order to make the objectives, technical solutions, and advantages of the present invention clearer, with reference to the accompanying drawings and embodiments,
The present invention will be described in further detail.It should be appreciated that specific embodiment described herein is only used to explain this hair
It is bright, it is not intended to limit the present invention.In addition, technology involved in the various embodiments of the present invention described below is special
Sign can be combined with each other as long as they do not conflict with each other.
A kind of Computer Aided Assembly Process Planning method of axis optical subsystem provided by the present invention, comprising the following steps:
S1: the optical model of adjustable optical system to be installed is established in optical design software and along optical path direction to optical mode
N optical element in type is sequentially numbered；Establish n 1~n of optical subsystem, n-th of light respectively according to number order
Storage subsystem includes that the relative position of 1~n of optical element and each optical element remains unchanged；Wherein, n is oneself more than or equal to 1
So number；
S2: the image planes position of n-th of optical subsystem is chosen, and n-th of optical subsystem pair is obtained by simulation analysis
The ideal wave front aberration F0n answered；
S3: the analog position deviation for being not more than thick adjustment precision is introduced to the optical element n in n-th of optical subsystem
Measure Δ xns, using optical design software to introducing analog position departure Δ xnsEach optical subsystem afterwards carries out emulation point
Analysis, obtains the simulation wave front aberration Fns of image planes in n-th of optical subsystem；
S4: according to analog position departure Δ xns, ideal wave front aberration F0n and simulation wave front aberration Fns, use is sensitive
Degree Matrix Formula solves the corresponding sensitivity matrix of n-th of optical subsystem respectively and extracts the sensitivity matrix of optical element n
An；
An=(Fns-F0n)/Δ xns；
Use Fj(j=1,2 ..., m) indicates that the wave front aberration of optical system, the position deviation amount parameter of each optical element are used
xi(i=1,2 ..., n) is indicated, wherein m represents the item number of Zenike coefficient；The wave front aberration and optical element of optical system
Positional relationship can be represented by the formula,
Wherein, Fj=fj(x1,…,xn) characterize the positional relationship of specific a certain wave front aberration and optical element；Using Thailand
It strangles formula formula (1) is unfolded, constant term and first order is taken to carry out approximate solution Fj=fj(x1,…,xn) accurate function:
F0jIt is the ideal wave front aberration after the completion of Optical System Design, x01,…,x0nIt is the ideal position of optical element,
FjFor the actual wavefront aberration of current system, x1,…,xnFor the physical location of each optical element, δ fj/δx1For the contraposition of a certain aberration
The differential representation of the first-order partial derivative of parameter is set, the sensitivity square of optical element n can be finally gone out according to above-mentioned solving equations
Battle array:
S5: according to the method for step S3~S4, respectively obtain the corresponding sensitivity matrix A1 of 1~n of optical subsystem~
An；
S6: according to the number order of optical subsystem, using the sensitivity matrix An of optical element n to n-th of optics
System carries out TOLERANCE ANALYSIS, determination on the basis of the 1~n-1 of optical element good by the object plane of n-th optical subsystem and adjustment
The image planes position of n-th of optical subsystem, and according to TOLERANCE ANALYSIS result to the optical element n in n-th of optical subsystem into
The thick adjustment of row；
S7: the actual wavefront aberration of n-th of optical subsystem image planes after thick adjustment is obtained using Wavefront sensor measurement
Fn；
S8: obtain optical element n's by sensitivity matrix An, actual wavefront aberration Fn and the ideal anti-solution of wave front aberration F0n
Position deviation amount Δ xnAnd Deviation Type；
Δxn=(Fn-F0n)/An
S9: according to the position deviation amount Δ x for the optical element n being calculatednN-th of light of adjusting corresponding with Deviation Type
The position of optical element n in storage subsystem；
S10: it measures the actual wavefront aberration Fn of n-th of optical subsystem image planes again using Wavefront sensor, and judges
The deviation of the actual wavefront aberration Fn and ideal wave front aberration F0n whether within the allowable range, if so, optical element n adjustment
It completes；If it is not, then return step S7；
S11: by the method for step S6~S10, be sequentially completed in optical subsystem n optical element 1,2 ..., n
Adjustment；
S11: after the adjustment for completing 1~n of optical element, the wave front aberration of optical subsystem n is detected by Wavefront sensor
And judge whether to meet image quality requirement, if so, completing entire optical system alignment；If it is not, the S5 that then repeats the above steps
The adjustment process of~S10.
In a preferred embodiment, the type of position deviation includes that X-axis is eccentric, X-axis tilts, Y-axis is eccentric, Y-axis is inclined
Tiltedly, with the spacing distance of previous optical element；For first optical subsystem, which is that optical element 1 arrives object
The distance in face；
In a preferred embodiment, optical design software uses Zemax software realization；
In a preferred embodiment, Wavefront sensor is realized using phase shifting interferometer；
In a preferred embodiment, the Zenike coefficient that sensitivity matrix uses for striped Zenike coefficient,
Number is 37；
Computer Aided Assembly Process Planning method provided by the invention is illustrated below by specific embodiment；
Computer Aided Assembly Process Planning method provided in this embodiment, comprising the following steps:
S1: the optical model of the laser far field colimated light system to adjustment, such as Fig. 1 are established in optical design software Zemax
Shown, which includes phase shifting interferometer 4, compensator 5,7, lens 1,2,3 and standard flat reflecting mirror 6；
Wherein, for making optical path backtracking, compensator 5 is for adjusting beam size for compensator 7 and plane mirror 6；Phase shift is dry
Interferometer 4 is used to measure the wave front aberration of optical system as Wavefront sensor；
As shown in Fig. 2, three lens are numbered according to optical path direction, it is denoted as lens 1, lens 2 and lens 3；According to
Number order establishes 3 optical subsystems M1, M2, M3 respectively, as shown in Fig. 2, the 1st optical subsystem M1 includes lens 1, the
2 optical subsystem M2 include lens 1 and lens 2, and the 3rd optical subsystem M3 includes lens 1, lens 2 and lens 3；Each light
The relative position of lens 1, lens 2 and lens 3 is constant in storage subsystem；
S2: according to the structure of optical subsystem M1, M2, M3 and imaging characteristics Rational choice image planes position, and pass through emulation
Respectively obtain ideal wave front aberration F01, F02, F03 of each optical subsystem；
S3: respectively in the lens 1 in optical subsystem M1, the lens 2 in optical subsystem M2, optical subsystem M3
Lens 3 introduce be not more than thick adjustment precision position deviation amount Δ x1s、Δx2s、 Δx3s, utilize optical design software Zemax
Simulation analysis is carried out to each optical subsystem after introducing analog position departure respectively, obtains image planes in each optical subsystem
Simulation wave front aberration F1s, F2s, F3s；
S4: according to analog position departure Δ x1s, ideal wave front aberration F01 and simulation wave front aberration F1s, use is sensitive
Spend the sensitivity matrix A1 for the lens 1 that Matrix Formula solves in optical subsystem M1；Find out optics respectively after the same method
The sensitivity matrix A3 of lens 3 in the sensitivity matrix A2 of lens 2 in subsystem M2, optical subsystem M3；
Wherein, the Zenike coefficient that solution sensitivity matrix preferably uses is 37, before Zenike coefficient can also be used
9 solve sensitivity matrix as primary aberration；The Zenike coefficient is striped Zenike coefficient (with 4 phase of phase shifting interferometer
Matching)；
Table 1 show the sensitivity matrix A1 of optical subsystem M1；Table 2 show the sensitivity square of optical subsystem M2
Battle array A2；Table 3 show the sensitivity matrix A3 of optical subsystem M3；
The sensitivity matrix A1 of 1 optical subsystem M1 of table
The sensitivity matrix A2 of 2 optical subsystem M2 of table
The sensitivity matrix A3 of 3 optical subsystem M3 of table
In above tables, DX represent optical element along the x axis on bias；DY represents optical element along the inclined of Y-direction
The heart；DZ represents interval (i.e. with the spacing distance of previous optical element) of the optical element along Z-direction；TX represents optical element
Around the inclination of X-axis；TY represents inclination of the optical element around Y-axis；
S5: TOLERANCE ANALYSIS is carried out to optical subsystem M1 using sensitivity matrix A1, the object plane with optical subsystem M1 is
Benchmark determines the image planes position of optical subsystem M1, and is carried out according to TOLERANCE ANALYSIS result to the lens 1 in optical subsystem M1
Thick adjustment；
S6: the actual wavefront aberration of the optical subsystem M1 image planes after obtaining thick adjustment is measured using phase shifting interferometer 4
F1；
S7: the position of lens 1 is obtained by sensitivity matrix A1, actual wavefront aberration Fn and the ideal anti-solution of wave front aberration F0n
Departure Δ x1And Deviation Type；
Δx1=(F1-F01)/A1
S8: according to the position deviation amount Δ x for the lens 1 being calculated1Adjusting optical subsystem M1 corresponding with Deviation Type
In lens 1 position；
S9: it measures the actual wavefront aberration F1 of optical subsystem M1 image planes again using Wavefront sensor, judges practical wave
The deviation of preceding aberration F1 and its original wavefront aberration F01 whether within the allowable range, if so, 1 adjustment of lens complete；If it is not,
Then return step S6；
The misalignment rate variation of lens 1 in 4 optical subsystem M1 of table
| The number of iterations | DX | DY | DZ | TX | TY |
| 1 | 0.1181 | -0.1684 | 0.1597 | 0.0898 | 0.1798 |
| 2 | 0.0019 | -0.0016 | -0.0097 | 0.0002 | 0.0002 |
| 3 | 1.6×10-5 | -0.8×10-5 | 0.16×10-6 | 0.18×10-5 | 0.36×10-5 |
Table 4 show the number of iterations and position deviation amount variation relation that the position of lens 1 is adjusted, as can be known from Table 4,
With adjust number increase, each position departure of lens 1 is gradually reduced, after feedback regulation three times, lens 1 it is each
A position deviation amount is down to 10-5The order of magnitude, position adjustment precision are high.
S10: using sensitivity matrix A2 to optical subsystem M2 carry out TOLERANCE ANALYSIS, with the object plane of optical subsystem M2,
The image planes position of optical subsystem M2 is determined on the basis of the good lens 1 of adjustment, and according to TOLERANCE ANALYSIS result to optics subsystem
Lens 2 in system M2 carry out thick adjustment；
S11: the actual wavefront aberration of the optical subsystem M2 image planes after obtaining thick adjustment is measured using phase shifting interferometer 4
F2；
S12: the position of lens 2 is obtained by sensitivity matrix A2, actual wavefront aberration F2 and the ideal anti-solution of wave front aberration F02
Set departure Δ x2And Deviation Type；
Δx2=(F2-F02)/A2
S13: according to the position deviation amount Δ x for the lens 2 being calculated2Adjusting optical subsystem corresponding with Deviation Type
The position of lens 2 in M2；
S14: it measures the actual wavefront aberration F2 of optical subsystem M2 image planes again using Wavefront sensor, judges reality
The deviation of wave front aberration F2 and its original wavefront aberration F02 whether within the allowable range, if so, 2 adjustment of lens complete；If
It is no, then return step S11；
Table 5 show lens 2 position adjust the number of iterations and misalignment rate variation relation, from table 5 it is found that with
The increase of number is adjusted, each position deviation amount of lens 2 is gradually reduced, after feedback regulation three times, the position of lens 2
Deviation D Y, TX is down to the 10-4 order of magnitude, and DZ is down to the 10-5 order of magnitude, and the departure of DX and TY are reduced to 0, illustrates the present embodiment
The adjustment precision of the Method of Adjustment of offer is high.
The misalignment rate variation of lens 2 in 5 optical subsystem M2 of table
| The number of iterations | DX | DY | DZ | TX | TY |
| 1 | 0.1395 | 0.1246 | 0.1585 | -0.1953 | -0.0995 |
| 2 | 0.0005 | -0.0046 | -0.0037 | -0.0048 | -0.0004 |
| 3 | 0 | 0.685×10-4 | -0.13×10-5 | 0.839×10-4 | 0 |
S15: by the method for step S10~S14, adjustment is carried out to the position of lens 3 in optical subsystem M3；
Table 6 show lens 3 position adjust the number of iterations and misalignment rate variation relation, from table 6 it is found that with
The increase of number is adjusted, each position deviation amount of lens 3 is gradually reduced, after feedback regulation twice, the position of lens 3
Deviation D Y, DX is down to 0, and after feedback regulation three times, position deviation DZ, TX and TY are also down to 0, illustrates the present embodiment
The adjustment precision of the Method of Adjustment of offer is high.
The misalignment rate variation of lens 3 in 6 optical subsystem M3 of table
| The number of iterations | DX | DY | DZ | TX | TY |
| 1 | 0.1700 | 0.0600 | 0.0452 | 0.1801 | -0.1504 |
| 2 | 0 | 0 | 0.1548 | -0.0001 | 0.0004 |
| 3 | 0 | 0 | 0.14 | 0 | 0 |
| 4 | 0 | 0 | 0 | 0 | 0 |
S16: after the adjustment for completing lens 3, judge whether optical subsystem M3 meets by the detection of phase shifting interferometer 4
As quality requirement, if so, completing entire optical system alignment；If it is not, the adjustment process for the S4~S15 that then repeats the above steps.
Using phase shifting interferometer 4 measure optical subsystem M3 (i.e. entire optical system) aberration, the result judged whether with
The optical aberration of ZEMAX optical design software design requires unanimously, unanimously then indicates to meet image quality requirement.
Compared to existing Computer Aided Assembly Process Planning method, a kind of calculating of axis optical subsystem provided by the invention
Machine assistant resetting method, is numbered for multiple optical elements in coaxial optical system, is established respectively according to number order
N optical subsystem, wherein n-th of optical subsystem includes 1~n of optical element；Separately design the sensitivity of subsystems
Matrix is successively adjusted each optical element according to optical path sequence according to the corresponding sensitivity matrix of each optical subsystem,
Fall into its position deviation amount in allowable range of error, the position of n-th of optical element adjusts the 1~n-1 good with adjustment
It, can be mutual to avoid position of each optical element in traditional sensitivity matrix method adjustment process on the basis of a optical element
Compensation problem accelerates the convergence rate during adjustment, improves adjustment precision and adjustment efficiency；Solves each optics member simultaneously
Part when there is axial translation can not adjustment, guarantee optical system while guaranteeing that optical system has preferable image quality
The coaxial precision of each optical element in system.
As it will be easily appreciated by one skilled in the art that the foregoing is merely illustrative of the preferred embodiments of the present invention, not to
The limitation present invention, any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should all wrap
Containing within protection scope of the present invention.
Claims (6)
1. a kind of Computer Aided Assembly Process Planning method of coaxial optical system, which comprises the following steps:
S1: establish the optical model of adjustable optical system to be installed and along optical path direction to n optical element in optical model sequentially
It is numbered；Establish n optical subsystem respectively according to number order, n-th of optical subsystem includes 1~n of optical element, respectively
The relative position of optical element remains unchanged；Wherein, n is the natural number more than or equal to 1；
S2: the image planes position of n-th of optical subsystem is chosen, and the ideal of n-th of optical subsystem is obtained by simulation analysis
Wave front aberration F0n；
S3: the position deviation amount Δ x for being not more than thick adjustment precision is introduced to the optical element n in n-th of optical subsystemns, benefit
With optical design software analog position departure Δ x described to introducingnsOptical subsystem afterwards carries out simulation analysis, obtains n-th
The simulation wave front aberration Fns of image planes in a optical subsystem；
S4: according to analog position departure Δ xns, ideal wave front aberration F0n and simulation wave front aberration Fns, using sensitivity matrix
Formula solves the corresponding sensitivity matrix of n-th of optical subsystem respectively and extracts the sensitivity matrix An of optical element n；
An=(Fns-F0n)/Δ xns；
S5: according to the number order of optical subsystem, using the sensitivity matrix An of optical element n to n-th of optical subsystem
TOLERANCE ANALYSIS is carried out, n-th of determination on the basis of the 1~n-1 of optical element good by the object plane of n-th optical subsystem and adjustment
The image planes position of optical subsystem, and the optical element n in n-th of optical subsystem is slightly filled according to TOLERANCE ANALYSIS result
It adjusts；
S6: the actual wavefront aberration Fn of n-th of optical subsystem image planes after thick adjustment is obtained using Wavefront sensor measurement；
S7: the position of optical element n is obtained by sensitivity matrix An, actual wavefront aberration Fn and the ideal anti-solution of wave front aberration F0n
Departure Δ xnAnd Deviation Type；
Δxn=(Fn-F0n)/An
S8: according to the position deviation amount Δ x for the optical element n being calculatednN-th of optics subsystem of adjusting corresponding with Deviation Type
The position of optical element n in system；
S9: it measures the actual wavefront aberration Fn of n-th of optical subsystem image planes again using Wavefront sensor, and judges the reality
The deviation of wave front aberration Fn and ideal wave front aberration F0n whether within the allowable range, if so, optical element n adjustment is completed；If
It is no, then return step S6；
S10: by the method for step S5~S9, it is sequentially completed the adjustment to 1~n of optical element in optical subsystem n.
2. Computer Aided Assembly Process Planning method as described in claim 1, which is characterized in that further comprising the steps of:
S11: after the adjustment for completing 1~n of optical element, judge whether optical subsystem n meets by Wavefront sensor detection
As quality requirement, if so, completing entire optical system alignment；If it is not, the adjustment process for the S5~S10 that then repeats the above steps.
3. Computer Aided Assembly Process Planning method as claimed in claim 1 or 2, which is characterized in that the type of the position deviation amount
, X-axis inclination eccentric including X-axis, Y-axis is eccentric, Y-axis tilts, the spacing distance with previous optical element；For first optics
Subsystem, the spacing distance are the distance that optical element 1 arrives object plane.
4. Computer Aided Assembly Process Planning method as described in claim 1, which is characterized in that the Wavefront sensor is dry using phase shift
Interferometer is realized.
5. Computer Aided Assembly Process Planning method as described in claim 1, which is characterized in that the sensitivity matrix used
Zenike coefficient is striped Zenike coefficient or standard Zenike coefficient.
6. Computer Aided Assembly Process Planning method as claimed in claim 5, which is characterized in that the Zenike coefficient is 37.
Priority Applications (1)
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| CN111488701A (en) * | 2020-06-28 | 2020-08-04 | 中国人民解放军国防科技大学 | Computer-aided debugging method, device and equipment based on point spread function |
| CN112033302A (en) * | 2020-08-25 | 2020-12-04 | 长春长光智欧科技有限公司 | Optical system installation and adjustment equipment capable of compensating in real time and installation and adjustment method thereof |
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| CN110031198A (en) * | 2019-04-25 | 2019-07-19 | 上海工程技术大学 | A kind of alternating load spectrum preparation method considering energy |
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| CN110634372A (en) * | 2019-09-29 | 2019-12-31 | 中国科学院长春光学精密机械与物理研究所 | Optical system installation and adjustment strategy verification system |
| CN111488701A (en) * | 2020-06-28 | 2020-08-04 | 中国人民解放军国防科技大学 | Computer-aided debugging method, device and equipment based on point spread function |
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| CN112558318A (en) * | 2020-11-30 | 2021-03-26 | 中国科学院长春光学精密机械与物理研究所 | Auxiliary adjusting method for large-caliber optical element |
| CN112905952A (en) * | 2021-02-09 | 2021-06-04 | 南京信息工程大学 | Wavefront gradient data reconstruction method for optical element with any aperture |
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