CN114185144B - Mounting and adjusting method for mounting and adjusting large-caliber optical system based on small-caliber plane mirror - Google Patents
Mounting and adjusting method for mounting and adjusting large-caliber optical system based on small-caliber plane mirror Download PDFInfo
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- CN114185144B CN114185144B CN202111489961.XA CN202111489961A CN114185144B CN 114185144 B CN114185144 B CN 114185144B CN 202111489961 A CN202111489961 A CN 202111489961A CN 114185144 B CN114185144 B CN 114185144B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0207—Details of measuring devices
Abstract
The invention discloses an adjusting method for adjusting a large-caliber optical system based on a small-caliber plane mirror. The invention comprises an optical system to be adjusted, a small-caliber plane reflecting mirror and an interferometer; after the optical system to be assembled is roughly positioned, a plane reflecting mirror is placed in front of the optical system to be assembled; the optical system, the small-caliber plane mirror and the interferometer form an interference light path; and (3) obtaining a system imaging wave aberration root mean square value and various Zernike polynomial coefficient values through an interferometer, and then reversely optimizing by using optical software to obtain the offset of an optical element, thereby carrying out system adjustment. Compared with the traditional interference adjustment method of the full-aperture plane mirror, the small-aperture plane mirror has low manufacturing cost, and the cost of adjustment equipment is greatly reduced; and the small-caliber plane mirror can better ensure the surface type precision under the special gesture, and is suitable for the installation and adjustment of an optical system with the special gesture.
Description
Technical Field
The invention belongs to the technical field of astronomical telescopes, relates to an optical system adjusting method and system, and particularly relates to an adjusting method for adjusting a large-caliber optical system based on a small-caliber plane mirror.
Background
In order to meet the requirement of higher imaging resolution, the effective light transmission aperture of the optical system is larger and larger, and meanwhile, higher requirements are also put on system adjustment. Interference adjustment based on plane mirrors is a typical optical system adjustment method, and is widely used in various types of optical system adjustment due to its high adjustment accuracy. The adjustment method generally uses a plane mirror with the same caliber as the optical system to be adjusted and the optical system to be adjusted to form an interference light path for system adjustment. The interferometer is arranged at the focal point of the optical system, emits a point light source, forms parallel light after passing through the optical system and is incident on the standard plane reflector, the parallel light enters the optical system after being reflected by the plane reflector, and the reflected parallel light is converged at the focal point of the system after passing through the optical system and forms interference with the point light source emitted by the interferometer. The light path is shown in figure 1. The plane mirror is a reference component in interference adjustment, and the plane type precision determines the highest adjustment precision of the optical system. In order to meet the requirement of high-precision system adjustment, the surface precision RMS value of the plane reflecting mirror is less than or equal to lambda/50 (lambda is the adjustment wavelength).
However, the manufacturing cost of the large-caliber standard plane mirror is high, and the development cost is obviously greatly increased when the large-caliber standard plane mirror is used as a detection element. In addition, for a large-caliber optical system in a special posture (tilting), the large-caliber plane mirror is difficult to ensure the plane type precision of the large-caliber plane mirror in the special posture (tilting) due to the self gravity and the supporting structure. Therefore, the large-caliber plane reflecting mirror is not suitable for the adjustment of a large-caliber optical system.
Disclosure of Invention
The invention aims to provide an adjusting method for adjusting a large-caliber optical system based on a small-caliber plane mirror. The method solves the technical problem that the large-caliber plane reflecting mirror is not suitable for interference adjustment of a large-caliber optical system. Compared with the large-caliber plane mirror, the small-caliber plane mirror has low manufacturing cost, reduces the cost of the adjusting equipment, has light weight and is easy to mechanically support, and can be used for maintaining the adjusting requirement of the surface precision under the inclined state. The invention provides an evaluation method for mounting and adjusting a large-caliber optical system based on a small-caliber plane mirror, which realizes the mounting and adjusting of the large-caliber optical system by using the small-caliber plane mirror.
The invention comprises an optical system to be adjusted, a small-caliber plane reflecting mirror and an interferometer. The planar mirror is placed in front of the optical system to be tuned. The optical system, the small-caliber plane mirror and the interferometer form an interference light path. And obtaining a Root Mean Square (RMS) value of system imaging wave aberration and a polynomial coefficient value of each Zernike (Zernike) through an interferometer, and then performing reverse optimization by using optical software to obtain the offset of an optical element, thereby performing system adjustment.
The working principle of the invention is as follows:
the wave aberration of the optical system at the focal plane of the system can be represented by a Zernike polynomial, the specific form of which is shown in formula (1):
wherein A is i Coefficients of the ith term of Zernike polynomials, Z i (ρ, θ) is the ith term of the Zernike polynomial, ρ is the normalized radial distance (0 ρ.ltoreq.1), θ is the azimuth angle (0 ρ.ltoreq.2ρ), and n is the term of the Zernike polynomial.
Within a unit circle, the terms of the Zernike polynomials are successively orthogonal. The orthogonality of the Zernike polynomials is utilized, and the Zernike polynomial coefficients of the small-caliber circular area at any position are taken independently from the full caliber, so that the Zernike polynomials of the small-caliber circular area can be used for representing the full caliber wave aberration and guiding the system to adjust.
The 1 st-4 th terms of the Zernike polynomial characterize position, tilt and defocus, the 5 th-11 th terms of the Zernike polynomial characterize astigmatism, coma, spherical aberration and trefoil astigmatism, the 12 th term of the Zernike polynomial and thereafter characterize higher order aberrations. In actual adjustment, the position error of the optical element has a large influence on the low-order aberrations of 5 to 11 items and a small influence on the high-order aberrations of 12 items and later, and it is considered that the high-order aberrations of 12 items and later are caused by the surface shape of the optical element, and cannot be eliminated by adjusting the position of the optical element. Therefore, in the adjustment process, 5-11 low-order aberration is used as an optimization target to calculate the position error of the optical element. The 5 th to 11 th terms of the Zernike polynomials are shown in equation (2).
The technical scheme of the invention is as follows:
an adjusting method for adjusting a large-caliber optical system based on a small-caliber plane mirror comprises the following steps:
1) Inputting measured parameter information of each optical element in an optical system to be adjusted into optical simulation software, and establishing an optical system model to obtain a wave aberration RMS value and a Zernike polynomial coefficient value of the optical system at a focus;
2) Intercepting a small-caliber circular area in the optical system model to obtain a wave aberration RMS value and a Zernike polynomial each coefficient value of an optical system focus in the small-caliber circular area;
3) After coarse positioning of each optical element in the optical system is completed, placing an interferometer at a focus of the optical system, and placing a small-caliber plane mirror in front of the optical system obtained by coarse adjustment, wherein the optical system, the small-caliber plane mirror and the interferometer form an interference light path; wherein the aperture and the alignment area of the small-aperture plane mirror are corresponding to the selected small-aperture circular area;
4) Measuring the wave aberration RMS value and the Zernike polynomial each coefficient value of the current focal point of the optical system in the small-caliber circular area by using an interferometer;
5) Inputting the low-order aberration measured in the step 4) into the optical system model as an optimization target value to perform reverse optimization to obtain the position offset of each optical element of the optical system;
6) After each optical element is assembled and adjusted in place according to the calculated position offset of each optical element in the step 5), obtaining the wave aberration RMS value and each coefficient value of a Zernike polynomial in the small-caliber circular area at the focus of the optical system after the assembly and adjustment are completed by using an interferometer, and checking the wave aberration RMS value and each coefficient value of the Zernike polynomial obtained in the step 2);
7) Step 6) after the consistency is checked, completing system adjustment; otherwise, returning to the step 4).
Further, the measured parameter information of the optical element includes: curvature, aspherical coefficient, and surface shape of the optical element; if the optical element is a refractive optical element, the parameter information further includes thickness, out-of-plane and tilt of the optical element.
Further, the low-order aberration is the 5 th-11 th term coefficient of Zernike polynomial, namely astigmatism, coma, spherical aberration and trefoil astigmatism.
Further, in the step 7), if the 5-11 terms of the Zernike polynomials in the small-caliber circular area are consistent with the theoretical values, the system debugging is completed according to the debugging requirements.
Further, the full aperture region is an effective aperture of the optical system.
The system for adjusting the large-caliber optical system based on the small-caliber plane mirror is characterized by comprising a small-caliber plane mirror, an interferometer and a data processing unit; wherein the method comprises the steps of
The data processing unit is used for establishing an optical system model according to the measured parameter information of each optical element in the optical system to be adjusted to obtain the wave aberration RMS value and the Zernike polynomial each coefficient value of the optical system at the focus; intercepting a small-caliber circular area in the optical system model to obtain a wave aberration RMS value and a Zernike polynomial each coefficient value of an optical system focus in the sub-aperture area; wherein the aperture and the alignment area of the small-aperture plane mirror are corresponding to the selected small-aperture circular area;
the small-caliber plane reflecting mirror is placed in front of an optical system obtained after coarse adjustment; the optical system, the small-caliber plane mirror and the interferometer form an interference light path;
the small-caliber plane reflecting mirror is used for scanning all caliber areas of the optical system in sequence to obtain wave front data of each sub-aperture area at the focus of the optical system and sending the wave front data to the data processing unit;
the interferometer is used for measuring the wave aberration RMS value and the Zernike polynomial each coefficient value of the current optical system focus in the small-caliber circular area and sending the values to the data processing unit;
and the data processing unit inputs the measured low-order aberration serving as an optimization target value into the optical system model to perform reverse optimization to obtain the position offset of each optical element of the optical system.
Compared with the prior art, the invention has the following positive effects:
compared with the traditional interference adjustment method for the large-caliber plane mirror, the small-caliber plane mirror has low manufacturing cost, the support structure is simpler, and the cost of adjustment equipment is greatly reduced. In addition, the small-caliber plane reflecting mirror can better ensure the surface type precision under the special gesture, and is suitable for the installation and adjustment of an optical system with the special gesture
Drawings
FIG. 1 is a schematic diagram of interference modulation of a planar mirror.
FIG. 2 is a schematic diagram of interference adjustment of a small-caliber planar mirror.
FIG. 3 is a schematic diagram of the aperture of a small aperture planar mirror.
Detailed Description
The invention is described in further detail below with reference to the accompanying drawings.
As shown in fig. 2, the specific adjustment scheme of the present invention is as follows:
step one: the curvature, the aspherical coefficient and the surface shape of each optical element in the optical system to be adjusted are measured (the refractive optical element also needs to measure the thickness, the surface eccentricity and the surface inclination of each element), the measured data are input into optical simulation software, an optical system model is built, and the wave aberration RMS value and the Zernike polynomial various coefficient values of the optical system at the system focus with actual processing errors and the surface shape are obtained.
Step two: and intercepting a small-caliber circular area required to be used in the optical model to obtain the wave aberration RMS value and the Zernike polynomial each coefficient value of the optical system focus in the small-caliber circular area. Sub-apertures of any size can be assembled and adjusted theoretically; under the condition that the surface type precision can be ensured, the small-caliber round area with the caliber as large as possible is selected for assembling and adjusting more conveniently.
Step three: after each optical element in the optical system is roughly adjusted, the interferometer is placed at the focus of the optical system, and the small-caliber plane mirror is placed in front of the optical system to be adjusted, so that the optical system to be adjusted, the small-caliber plane mirror and the interferometer form an interference light path. The aperture schematic diagram of the small-aperture plane mirror is shown in fig. 3, and the aperture and alignment area of the small-aperture plane mirror are corresponding to the selected small-aperture circular area.
Step four: the RMS value of the wave aberration and the Zernike polynomial coefficient values of the small-caliber circular region at the focal point of the optical system at this time are measured using an interferometer.
Step five: and 5-11 Zernike coefficients obtained by measurement in the step four are used as optimization target values to be input into the optical model established in the step one for reverse optimization, and the position offset of each element of the optical system is obtained.
Step six: and D, carrying out system adjustment according to the position offset of each element calculated in the step five, after each element is adjusted in place, obtaining the wave aberration RMS value of the sub-caliber at the focal point of the optical system after adjustment and each Zernike polynomial coefficient value by using an interferometer, and checking the wave aberration RMS value and each Zernike polynomial coefficient value with the theoretical wave aberration RMS value and each Zernike polynomial coefficient value in the step two.
Step seven: and step six, after the consistency is checked, the system adjustment is completed.
The foregoing description of the preferred embodiments of the invention is not intended to be limiting, but rather is intended to cover all modifications, equivalents, and alternatives falling within the spirit and principles of the invention.
Claims (9)
1. An adjusting method for adjusting a large-caliber optical system based on a small-caliber plane mirror comprises the following steps:
1) Inputting measured parameter information of each optical element in an optical system to be adjusted into optical simulation software, and establishing an optical system model to obtain a wave aberration RMS value and a Zernike polynomial coefficient value of the optical system at a focus;
2) Intercepting a small-caliber circular area in a full-caliber area of the optical system model to obtain a wave aberration RMS value and a Zernike polynomial each coefficient value of an optical system focus in the small-caliber circular area;
3) After coarse positioning of each optical element in the optical system is completed, placing an interferometer at a focus of the optical system, and placing a small-caliber plane mirror in front of the optical system obtained by coarse adjustment, wherein the optical system, the small-caliber plane mirror and the interferometer form an interference light path; wherein the aperture and the alignment area of the small-aperture plane mirror are corresponding to the selected small-aperture circular area;
4) Measuring the wave aberration RMS value and the Zernike polynomial each coefficient value of the current focal point of the optical system in the small-caliber circular area by using an interferometer;
5) Inputting the low-order aberration measured in the step 4) into the optical system model as an optimization target value to perform reverse optimization to obtain the position offset of each optical element of the optical system;
6) After each optical element is assembled and adjusted in place according to the calculated position offset of each optical element in the step 5), obtaining the wave aberration RMS value and each coefficient value of a Zernike polynomial in the small-caliber circular area at the focus of the optical system after the assembly and adjustment are completed by using an interferometer, and checking the wave aberration RMS value and each coefficient value of the Zernike polynomial obtained in the step 2);
7) Step 6) after the consistency is checked, completing system adjustment; otherwise, returning to the step 4).
2. The tuning method of claim 1, wherein the parameter information of the optical element comprises: curvature, aspherical coefficient, and surface shape of the optical element; if the optical element is a refractive optical element, the parameter information further includes thickness, out-of-plane and tilt of the optical element.
3. The tuning method of claim 1, wherein the low order aberrations are coefficients of the 5 th-11 th term of the Zernike polynomial, i.e., astigmatism, coma, spherical aberration, and trefoil astigmatism.
4. The tuning method as claimed in claim 1, wherein in step 7), if 5-11 terms of the Zernike polynomials in the small-caliber circular region are consistent with theoretical values, it is determined that the tuning requirements are met, and the system tuning is completed.
5. The tuning method of claim 1, wherein the full aperture region is an effective aperture of the optical system.
6. The system for adjusting the large-caliber optical system based on the small-caliber plane mirror is characterized by comprising a small-caliber plane mirror, an interferometer and a data processing unit; wherein the method comprises the steps of
The data processing unit is used for establishing an optical system model according to the measured parameter information of each optical element in the optical system to be adjusted to obtain the wave aberration RMS value and the Zernike polynomial each coefficient value of the optical system at the focus; a small-caliber circular area is intercepted in a full-caliber area of the optical system model, and a wave aberration RMS value and a Zernike polynomial each coefficient value of an optical system focus in the circular area are obtained; the aperture and the alignment area of the small-aperture plane mirror are corresponding to the selected small-aperture circular area;
the small-caliber plane reflecting mirror is placed in front of an optical system obtained after coarse adjustment; the optical system, the small-caliber plane mirror and the interferometer form an interference light path;
the interferometer is used for measuring the wave aberration RMS value and the Zernike polynomial each coefficient value of the current optical system focus in the small-caliber circular area and sending the values to the data processing unit;
and the data processing unit inputs the measured low-order aberration serving as an optimization target value into the optical system model to perform reverse optimization to obtain the position offset of each optical element of the optical system.
7. The tuning system of claim 6, wherein the parameter information of the optical element comprises: curvature, aspherical coefficient, and surface shape of the optical element; if the optical element is a refractive optical element, the parameter information further includes thickness, out-of-plane and tilt of the optical element.
8. The system of claim 6 wherein the low order aberrations are coefficients of the 5 th-11 th term of the Zernike polynomial, i.e., astigmatism, coma, spherical aberration, and trefoil astigmatism.
9. The tuning system of claim 6, wherein the full aperture region is an effective aperture of the optical system.
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| WO2003025537A1 (en) * | 2001-09-18 | 2003-03-27 | Mitsubishi Denki Kabushiki Kaisha | Optical system misalignment estimating device, optical system misalignment adjusting device, optical system misalignment estimating method, and optical system misalignment correcting method |
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| CN111912607A (en) * | 2020-07-22 | 2020-11-10 | 中国科学院西安光学精密机械研究所 | Large-aperture optical system MTF measuring device and method |
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