CN109022792B - Treatment method of target material to be treated - Google Patents

Treatment method of target material to be treated Download PDF

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CN109022792B
CN109022792B CN201710426729.9A CN201710426729A CN109022792B CN 109022792 B CN109022792 B CN 109022792B CN 201710426729 A CN201710426729 A CN 201710426729A CN 109022792 B CN109022792 B CN 109022792B
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target material
target
treated
acid solution
acid
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CN109022792A (en
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吴景晖
姚力军
钟翔
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Ningbo Chuangrun New Materials Co ltd
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Ningbo Chuangrun New Materials Co ltd
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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
    • C22B7/001—Dry processes
    • C22B7/003—Dry processes only remelting, e.g. of chips, borings, turnings; apparatus used therefor
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00—Obtaining refractory metals
    • C22B34/10—Obtaining titanium, zirconium or hafnium
    • C22B34/12—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08
    • C22B34/1295—Refining, melting, remelting, working up of titanium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C23G1/10—Other heavy metals
    • C23G1/106—Other heavy metals refractory metals
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling

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  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

The invention provides a treatment method of a target material to be treated, which comprises the following steps: providing a target material to be treated; carrying out first acid washing treatment on the target material to be treated through a first acid solution to form an initial target material, wherein the first acid solution and the target material to be treated generate a first chemical reaction to remove part of materials on the surface of the target material to be treated; and carrying out second acid washing treatment on the initial target through a second acid solution, wherein the second acid solution and the initial target generate a second chemical reaction, part of materials on the surface of the initial target are removed, and the rate of the second chemical reaction is smaller than that of the first chemical reaction. The treatment method can improve the recovery rate of the target material to be treated.

Description

Treatment method of target material to be treated
Technical Field
The invention relates to the field of manufacturing of semiconductor sputtering targets, in particular to a treatment method of a target to be treated.
Background
The target material is also called sputtering target material, and is a sputtering source which forms various functional films on a substrate by sputtering through magnetron sputtering, multi-arc ion plating or other types of coating systems under proper process conditions. In short, the target material is a target material bombarded by high-speed charged energy particles, and when the target material is used in a high-energy laser weapon, lasers with different power densities, different output waveforms and different wavelengths interact with different target materials, different killing and damaging effects can be generated. Different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets and the like) are replaced, and different film systems (such as superhard, wear-resistant and corrosion-resistant alloy films and the like) can be obtained. The sputtering target generally has higher requirements on materials, and the titanium sputtering target can be prepared by using high-purity titanium with the purity of more than 4N (99.99%) as a raw material.
After the target material is used as a sputtering source, only a small part of sputtering evaporation is carried out, most of materials are still on a target material substrate, the part of materials are waste physical target materials, and the raw materials in the waste target materials are titanium metal and are called waste titanium target materials.
Titanium and its alloy have the advantages of high specific gravity strength and strong corrosion resistance, and the products are widely applied in the fields of aviation and aerospace, shipbuilding and atomic energy industry. In the field of daily life and consumer goods, the use of titanium and titanium alloys has also attracted considerable interest; however, the titanium product has a limitation in its wide application due to its high cost. The recovery rate of the waste titanium target is improved, the cost of the titanium product can be effectively reduced, and the application of the titanium product is increased.
However, the recovery rate of the waste target material in the prior art is very low.
Disclosure of Invention
The invention aims to provide a treatment method of a target material to be treated, which can improve the recovery rate of the target material to be treated.
In order to solve the above problems, the present invention provides a method for processing a target material to be processed, comprising: providing a target material to be treated; performing first acid washing treatment on the target material to be treated through a first acid solution to form an initial target material, wherein the first acid solution and the surface material of the target material to be treated perform a first chemical reaction to remove part of the material on the surface of the target material to be treated; and carrying out second acid washing treatment on the initial target through a second acid solution to form a purified target, wherein the second acid solution and the surface material of the initial target generate a second chemical reaction to remove part of the material on the surface of the initial target, and the rate of the second chemical reaction is less than that of the first chemical reaction.
Optionally, the target material to be processed is titanium.
Optionally, the first acid solution comprises HF.
Optionally, the first acid solution further comprises HCl.
Optionally, the concentration of HCl in the first acid solution is 5% to 7%, and the mass ratio of HCl to HF in the first acid solution is 4.5 to 5.5.
The method for treating a target material to be treated according to claim 4, wherein the first acid washing treatment is carried out for 27 to 33 min.
Optionally, the second acid solution comprises HF.
Optionally, the second acid solution further comprises HNO3。
Optionally, HNO in the second acid solution3The concentration of (A) is 25 to 35 percent; the secondHNO in acid solution3The mass ratio of the hydrogen fluoride to the HF is 4.5-5.5.
Optionally, the second acid washing treatment time is 1.8-2.2 h; the temperature of the second acid solution is 45-50 ℃.
Optionally, before the first acid washing treatment, the method further comprises: and carrying out decontamination treatment on the target to be treated by using an acidic degreasing agent solution.
Optionally, the concentration of the acidic oil removing agent in the acidic oil removing agent solution is 10-20%.
Optionally, the volume ratio of the acidic degreasing agent solution to the target to be treated is 1.8-2.2.
Optionally, before the first acid washing treatment, the method further comprises: and brushing the surface of the target material to be treated.
Optionally, after the brushing treatment, a first cleaning treatment is performed on the target to be treated by using a first cleaning agent, where the first cleaning agent is water.
Optionally, the method further includes: and carrying out second cleaning treatment on the purified target material by using a second cleaning agent, wherein the second cleaning agent is water.
Optionally, after the second cleaning process, drying the purified target material is further performed.
Optionally, the purified target material is dried by a vacuum drying oven, and the parameters of the drying treatment include: the vacuum degree in the vacuum drying oven is more than 100Pa, the drying temperature is 120-150 ℃, and the drying time is 1-2 h.
Optionally, the method further includes: and smelting the purified target material.
Optionally, the purified target material is smelted by an electron beam cold bed vacuum smelting furnace.
Compared with the prior art, the technical scheme of the invention has the following advantages:
in the treatment method of the target material to be treated provided by the technical scheme of the invention, the target material to be treated is subjected to first acid washing treatment by using a first acid solution. The first acid solution and the target material to be processed generate a first chemical reaction, and the first chemical reaction can remove part of materials on the surface of the target material to be processed, so that impurity atoms adsorbed on the surface of the target material to be processed can be removed, and the purity of the target material to be processed is improved. And carrying out second acid washing treatment on the target material to be treated by using a second acid solution, wherein the second acid solution and the target material to be treated have a second chemical reaction. The second chemical reaction speed is lower than the first chemical reaction speed, the brightness of the surface of the purified target material can be improved, the roughness of the surface of the purified target material can be reduced, the adsorption quantity of the target material to be treated on impurity atoms can be reduced, and the recycling rate of the target material to be treated can be improved.
Further, the first acid solution includes HCl and HF. The HCl can improve the speed of the first acid washing treatment, so that the recovery efficiency of the target material to be treated is improved.
Further, the second acid solution comprises HF and HNO3，HNO3The surface of the target material to be treated can be passivated, the speed of second acid washing treatment is reduced, the surface of the target material to be treated is bright, and the adsorption capacity of the target material to be treated on impurity atoms is reduced. HNO3And the hydrogen absorption amount of the target material to be treated in the second acid washing treatment process can be reduced, and the recovery utilization rate of the target material to be treated is improved.
Further, the target material to be treated is decontaminated by the acid oil remover solution, so that impurities such as oil stains on the surface of the target material to be treated can be removed, and the purity of the target material to be treated is improved.
Further, after the second pickling treatment, the method further comprises: and smelting the target material to be treated. The smelting treatment can remove impurities in the target material to be treated and can reshape the target material to be treated.
Drawings
FIG. 1 is a flow chart illustrating steps of an embodiment of a method for processing waste titanium targets according to the present invention;
fig. 2 to 5 are schematic structural diagrams of steps of an embodiment of the method for processing a waste titanium target according to the present invention.
Detailed Description
The prior art has low recovery rate of the target material to be treated.
The reason that the recovery utilization rate of the target material to be treated is low is analyzed by combining the treatment method of the waste titanium target material:
the treatment modes of the waste titanium target material mainly comprise two types: one is sold as waste titanium material at low price; and the other method is to cut partial titanium plates or titanium particles from the waste titanium target material through mechanical processing.
The first treatment method does not reuse the titanium target material, resulting in waste of the titanium material. Although the second treatment method enables the waste titanium target material to be simply recycled, the surface of the titanium target material after sputtering is rough due to bombardment of high-energy ions, and the adsorption effect on impurities is strong. In addition, the waste titanium target material formed after the titanium target material is sputtered has high surface temperature and is easy to react with external impurities, so that the purity of the titanium target material is low. Therefore, the waste titanium target material contains less titanium materials which can meet the purity requirement. When the waste titanium target is mechanically processed, a large amount of titanium materials are cut off, so that the recovery rate of titanium is low.
In order to solve the technical problem, the invention provides a treatment method of a target material to be treated, which comprises the following steps: carrying out first acid washing treatment on the target material to be treated through a first acid solution; and after the first acid washing treatment, carrying out second acid washing treatment on the target to be treated by a second acid solution. The first acid washing treatment can remove impurities such as oxides in the target material to be treated, so that the purity of the target material to be treated is improved. The second acid washing treatment can form a compact protective layer on the surface of the target material to be treated, so that the adsorption capacity of the target material to be treated on impurity atoms is reduced, and the recycling rate of the target material to be treated can be improved.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below.
Fig. 1 is a flowchart illustrating steps of an embodiment of a method for processing a target to be processed according to the present invention.
Referring to fig. 1, the processing method of the target to be processed includes:
s1: providing a target material to be treated;
s2: performing decontamination treatment on the target to be treated by using an acidic degreasing agent solution;
s3: after decontamination treatment, brushing the surface of the target material to be treated;
s4, performing first acid washing treatment on the target material to be treated through a first acid solution to form an initial target material, and performing a first chemical reaction on the first acid solution and the surface material of the target material to be treated to remove part of the material on the surface of the target material to be treated;
s5, performing second acid washing treatment on the initial target through a second acid solution to form a purified target, wherein the second acid solution and the surface material of the initial target perform a second chemical reaction to remove part of the material on the surface of the initial target, and the rate of the second chemical reaction is smaller than that of the first chemical reaction;
and S6, smelting the purified target material.
Fig. 2 to 5 are schematic structural diagrams of steps of a target to be processed according to an embodiment of the target processing method of the present invention. The following detailed description is made with reference to the accompanying drawings.
Referring to fig. 2, step S1 is executed to provide a target material 100 to be processed.
The target material 100 to be processed is a residual target material after sputtering.
After the target material is sputtered, the surface of the target material becomes rough due to bombardment of high-energy ions, and pits are formed in the surface of the target material, so that the adsorption of impurities is strong, the target material to be treated can adsorb a large amount of impurity atoms such as carbon, hydrogen, oxygen and nitrogen, and the surface of the target material to be treated 100 also has a large amount of impurities such as oil stains and iron. In addition, the target material 100 to be processed formed after sputtering has a high surface temperature, and is prone to adsorb a large amount of impurity atoms, particularly to form an oxide layer on the surface. In addition, in the transporting and storing processes of the target material 100 to be processed, due to the collision, the surface of the target material to be processed has scratches, and impurities are easily accumulated in the scratches.
In this embodiment, the target material 100 to be processed is titanium. The target material 100 to be treated is a waste titanium target material.
With continued reference to fig. 2, step S2 is executed to perform a decontamination process on the target material 100 to be processed by the acidic degreasing solution 101.
The decontamination treatment is used for removing oil stains on the surface of the target material 100 to be treated.
If the content of the acid degreasing agent in the acid degreasing agent solution 101 is too low, the oil stain on the surface of the target material 100 to be treated is not favorably removed; if the content of the acid degreasing agent in the acid degreasing agent solution 101 is too high, the cost is easily increased. Specifically, in this embodiment, the concentration of the acidic degreasing agent in the acidic degreasing agent solution 101 is 10% to 20%.
If the volume ratio of the acidic degreasing agent solution 101 to the target material 100 to be treated is too small, the degreasing on the surface of the target material 100 to be treated is not facilitated; if the volume ratio of the acidic degreasing agent solution 101 to the target material 100 to be treated is too large, the waste of the acidic degreasing agent solution 101 is easily increased. Specifically, the volume ratio of the acidic oil removing agent solution 101 to the target material 100 to be processed is 1.8-2.2, and in this embodiment, the volume ratio of the acidic oil removing agent solution 101 to the target material 100 to be processed is 2.
Referring to fig. 3, step S3 is executed to perform a brushing process on the surface of the target 100 to be processed after cleaning.
The rinsing treatment is used for removing oil stains, scrap iron and other impurities in pits and scratches on the surface of the target material 100 to be treated.
The surface of the target material 100 to be processed is brushed by the brush 102.
During the brushing process, the operator needs to wear rubber acid-proof gloves to prevent the acidic degreasing solution 101 (shown in fig. 2) on the surface of the target material 100 to be processed from corroding the skin of the operator.
After the brushing treatment, the method further comprises the following steps: the target material 100 to be processed is subjected to a first cleaning process by a first cleaning agent.
The first cleaning process is used to remove the acidic degreasing agent solution 101 on the surface of the target 100 to be processed.
In this embodiment, the first cleaning agent is water.
Referring to fig. 4, step S4 is executed to perform a first acid washing process on the target 100 to be processed (as shown in fig. 3) through a first acid solution 103 to form an initial target 110, where the first acid solution 103 and the surface material of the target to be processed perform a first chemical reaction to remove a portion of the material on the surface of the target 100 to be processed.
The first chemical reaction can remove a part of the material on the surface of the target material 100 to be processed, so that the impurity atoms adsorbed on the surface of the target material 100 to be processed can be removed, and the purity of the target material 100 to be processed is improved.
In this embodiment, the first acid cleaning process may also be used to remove an oxide layer on the surface of the target material 100 to be processed.
In this embodiment, after the brushing process, a first acid cleaning process is performed on the target material 100 to be processed.
In this embodiment, the first acid solution 103 includes HCl and HF. In other embodiments, the first acid solution comprises only HF.
In the embodiment, the reaction between the first acid solution 103 and titanium can be increased by adding HCl into HF, so that the reaction rate of the first chemical reaction can be increased, and the production efficiency can be improved; however, HCl tends to increase the hydrogen absorption capacity of the target material 100 to be processed during the first acid cleaning process.
If the concentration of HCl in the first acid solution 103 is too high, the hydrogen absorption capacity of the target material 100 to be processed in the first acid washing process is easily increased, and the purity of the initial target material 110 after the first acid washing process is reduced; if the concentration of HCl in the first acid solution 103 is too low, the production efficiency is easily lowered. Specifically, the concentration of HCl in the first acid solution 103 is 5% to 7%.
Under the condition that the concentration of HCl in the first acid solution 103 is constant, if the mass ratio of HCl to HF in the first acid solution 103 is too small, the concentration of HF in the first acid solution 103 is large, and the loss of titanium is easily increased; if the mass ratio of HCl to HF in the first acid solution 103 is too large, the concentration of HF in the first acid solution 103 is low, which tends to reduce the production efficiency. Specifically, in this embodiment, the mass ratio of HCl to HF in the first acid solution 103 is 4.5 to 5.5, for example, 5.
If the time of the first acid washing treatment is too short, the impurity atoms adsorbed by the target material 100 to be treated are not favorably removed; if the first pickling treatment is performed for too long, the loss of titanium in the target material 100 to be treated tends to increase. Specifically, in this example, the time of the first acid washing treatment is 27 to 33 min.
Referring to fig. 5, a second acid solution 104 is used to perform a second acid washing process on the initial target 110 (as shown in fig. 4) to form a purified target 120, where the second acid solution 104 and the surface material of the initial target 110 perform a second chemical reaction to remove a portion of the material on the surface of the initial target 110, and a rate of the second chemical reaction is smaller than a rate of the first chemical reaction.
The second chemical reaction speed is lower than the first chemical reaction speed, so that the brightness of the surface of the purified target 110 can be improved, the roughness of the surface of the purified target 110 can be reduced, the adsorption amount of the target 110 to be processed on impurity atoms can be reduced, and the recycling rate of the target 100 to be processed can be improved.
In this embodiment, the second acid solution 104 includes HNO3And HF. HF can react with the initial target 110. Adding HNO into HF3The surface of the initial target 110 can be passivated, so that the surface of the purified target 120 is bright, the adsorption capacity of the purified target 120 on impurity atoms such as carbon, hydrogen, oxygen, nitrogen and the like can be reduced, and the purity of titanium in the purified target 120 can be improved. In addition, HNO is added into HF3The reaction rate of the second acid solution 104 with the original old target 110 can be reduced, so that the surface of the purified target 120 is bright, and the loss of titanium in the purified target 120 by HF can be reduced.
Adding HNO into HF3Also, the hydrogen absorption capacity of the target material 100 to be processed in the second acid washing treatment process can be reduced, and the hydrogen absorption capacity of the target material 100 can be improvedThe recycling rate of the target material to be treated is high. The reaction mechanism is as follows:
3Ti+4HNO3+12HF＝3TiF4+8H2O+4NO
if HNO in the second acid solution 1043Too low a concentration is not favorable for reducing the hydrogen absorption amount of the initial target 110 during the second acid washing treatment. Thus, the HNO in the second acid solution 1043Is not preferably too small, the second acid solution 104 contains HNO3Is greater than 20%. Specifically, in this embodiment, HNO is in the second acid solution 1043The concentration of (A) is 25 to 35 percent.
HNO in the second acid solution 1043If the second acid solution 104 contains HNO3The mass ratio of the target material to HF is too large, and the concentration of HF is too low, which is not favorable for removing impurity atoms adsorbed by the initial target material 110; if HNO in the second acid solution 1043The mass ratio of HF to HF is too small, the concentration of HF is too high, and material waste is easily caused. Specifically, in this embodiment, HNO is in the second acid solution 1043The mass ratio of the hydrogen fluoride to the HF is 4.5-5.5, such as 5.
If the temperature of the second acid solution 104 is too high, the second acid washing process is likely to be too fast, which is not favorable for brightening the surface of the target material 100 to be processed, and tends to increase the loss of HF to the titanium in the initial target material 110; if the temperature of the second acid solution 104 is too low, the rate of the second acid washing process tends to be too slow, thereby reducing production efficiency. Specifically, in this embodiment, the temperature of the second acid solution 104 is 45 ℃ to 50 ℃.
If the second pickling process is too long, the loss of HF to the titanium in the initial target 110 is easily increased; if the time of the second acid washing treatment is too short, it is not favorable for removing the impurity atoms adsorbed by the initial target 110 and for purifying the brightness of the surface of the target 120. Specifically, in this embodiment, the time of the second acid washing treatment is 1.8 to 2.2 hours.
After the second acid washing treatment, the method further comprises the following steps: the second cleaning process is performed on the purified target 120 by a second cleaning agent.
The second cleaning process is used to remove the first acid solution and the second acid solution on the surface of the purified target 120.
In this embodiment, the second cleaning agent is water.
After the second cleaning process, the drying process is further performed on the purified target 120.
The drying process is used to remove the second cleaning agent, thereby inhibiting oxygen in the air from oxidizing the purification target 120.
In this embodiment, the purified target 120 is dried by a vacuum drying oven.
If the degree of vacuum in the vacuum drying chamber is too small, the surface of the purification target 120 is easily oxidized. Therefore, in this embodiment, the vacuum degree in the vacuum drying oven is greater than 100 Pa.
If the drying temperature is too low, the drying treatment efficiency is easily reduced; if the drying temperature is too high, energy waste is easily increased. Specifically, the drying temperature is 120-150 ℃.
If the drying time is too short, it is not easy to sufficiently dry the purification target 120, and thus the purification target 120 is easily oxidized; if the drying time is too long, the production efficiency is easily reduced. Specifically, in this embodiment, the drying time is 1 to 2 hours.
After the drying treatment, the method further comprises the following steps: cooling the purified target material 120 to a taking-out temperature along with a vacuum drying oven; after cooling to the removal temperature, the purified target 120 is removed.
If the extraction temperature is too high, after the purification target 120 is extracted, the purification target 120 is likely to adsorb atoms such as carbon, hydrogen, oxygen, and nitrogen, thereby reducing the purity of the purification target 120, and therefore, the extraction temperature is less than 30 degrees, and the cooling time is 3h to 5 h.
Step S6 is executed, and after the second acid washing process, the purified target material 120 is subjected to a melting process.
The melting process can further remove impurities from the purified target material 120 and can reshape the purified target material 120.
In this embodiment, after the drying process, a melting process is performed on the purified target 120.
And smelting the purified target material 120 by an electron beam cold bed vacuum smelting furnace. The vacuum degree in the electron beam cold bed vacuum melting furnace is higher, and the adsorption of impurity atoms on the purified target material 120 can be reduced. Meanwhile, the electron beam cold bed vacuum melting furnace can remove impurities with the density higher than that of titanium and lower than that of titanium in the purified target material 120, so that the titanium is well purified.
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be effected therein by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.

Claims (11)

1. A method for processing a target material to be processed is characterized by comprising the following steps:
providing a target material to be treated; the target material to be treated is made of titanium;
performing first acid washing treatment on the target material to be treated through a first acid solution to form an initial target material, wherein the first acid solution and the surface material of the target material to be treated perform a first chemical reaction to remove part of the material on the surface of the target material to be treated; the first acid solution comprises HF and HCl, the concentration of the HCl in the first acid solution is 5% -7%, and the mass ratio of the HCl to the HF in the first acid solution is 4.5-5.5; the time of the first acid washing treatment is 27 min-33 min;
carrying out second acid washing treatment on the initial target through a second acid solution to form a purified target, wherein the second acid solution and the surface material of the initial target are subjected to a second chemical reaction to remove part of the material on the surface of the initial target, and the rate of the second chemical reaction is smaller than that of the first chemical reaction; the second acid solution comprises HF and further comprises HNO3HNO in the second acid solution3The concentration of (A) is 25 to 35 percent; HNO in the second acid solution3The mass ratio of the hydrogen fluoride to HF is 4.5-5.5; the second acidThe washing treatment time is 1.8-2.2 h; the temperature of the second acid solution is 45-50 ℃.
2. The method for treating a target material to be treated according to claim 1, wherein before the first pickling treatment, the method further comprises: and carrying out decontamination treatment on the target to be treated by using an acidic degreasing agent solution.
3. The method for treating a target to be treated according to claim 2, wherein the concentration of the acid degreasing agent in the acid degreasing agent solution is 10% to 20%.
4. The method for treating a target material to be treated according to claim 2, wherein a volume ratio of the acidic degreasing agent solution to the target material to be treated is 1.8 to 2.2.
5. The method for treating a target material to be treated according to claim 1, wherein before the first pickling treatment, the method further comprises: and brushing the surface of the target material to be treated.
6. The method for treating a target material to be treated according to claim 5, further comprising performing a first cleaning treatment on the target material to be treated by using a first cleaning agent after the brushing treatment, wherein the first cleaning agent is water.
7. The method for processing a target to be processed according to claim 1, further comprising: and carrying out second cleaning treatment on the purified target material by using a second cleaning agent, wherein the second cleaning agent is water.
8. The method according to claim 7, further comprising drying the purified target after the second cleaning.
9. The method according to claim 8, wherein the drying process is performed on the purified target material by a vacuum drying oven, and the drying process parameters include: the vacuum degree in the vacuum drying oven is more than 100Pa, the drying temperature is 120-150 ℃, and the drying time is 1-2 h.
10. The method for processing a target to be processed according to claim 1, further comprising: and smelting the purified target material.
11. The method according to claim 10, wherein the refined target material is melted by an electron beam cold bed vacuum melting furnace.
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