CN109004040A - Solar power generation tile and substrate thereof and preparation methods of solar power generation tile and substrate - Google Patents
Solar power generation tile and substrate thereof and preparation methods of solar power generation tile and substrate Download PDFInfo
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- CN109004040A CN109004040A CN201810885326.5A CN201810885326A CN109004040A CN 109004040 A CN109004040 A CN 109004040A CN 201810885326 A CN201810885326 A CN 201810885326A CN 109004040 A CN109004040 A CN 109004040A
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- substrate
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- power generation
- solar power
- film
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- 239000000758 substrate Substances 0.000 title claims abstract description 185
- 238000010248 power generation Methods 0.000 title claims abstract description 103
- 238000002360 preparation method Methods 0.000 title claims description 38
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 61
- 239000000463 material Substances 0.000 claims description 34
- 239000000377 silicon dioxide Substances 0.000 claims description 30
- AZCUJQOIQYJWQJ-UHFFFAOYSA-N oxygen(2-) titanium(4+) trihydrate Chemical compound [O-2].[O-2].[Ti+4].O.O.O AZCUJQOIQYJWQJ-UHFFFAOYSA-N 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 27
- 235000012239 silicon dioxide Nutrition 0.000 claims description 27
- 238000000151 deposition Methods 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 10
- 238000013003 hot bending Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000005083 Zinc sulfide Substances 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 6
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 6
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 238000005538 encapsulation Methods 0.000 claims description 4
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- SHPBBNULESVQRH-UHFFFAOYSA-N [O-2].[O-2].[Ti+4].[Zr+4] Chemical compound [O-2].[O-2].[Ti+4].[Zr+4] SHPBBNULESVQRH-UHFFFAOYSA-N 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 3
- VQEHIYWBGOJJDM-UHFFFAOYSA-H lanthanum(3+);trisulfate Chemical compound [La+3].[La+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O VQEHIYWBGOJJDM-UHFFFAOYSA-H 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 239000013077 target material Substances 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- GQUJEMVIKWQAEH-UHFFFAOYSA-N titanium(III) oxide Chemical compound O=[Ti]O[Ti]=O GQUJEMVIKWQAEH-UHFFFAOYSA-N 0.000 claims description 3
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 241000790917 Dioxys <bee> Species 0.000 claims 1
- 229910003978 SiClx Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 159
- 239000011521 glass Substances 0.000 description 14
- 238000005566 electron beam evaporation Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 8
- 238000005496 tempering Methods 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 239000003292 glue Substances 0.000 description 6
- 238000000137 annealing Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 239000003086 colorant Substances 0.000 description 4
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000005038 ethylene vinyl acetate Substances 0.000 description 3
- 229940097275 indigo Drugs 0.000 description 3
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 238000000844 transformation Methods 0.000 description 2
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- -1 Polyethylene Vinylacetate Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 210000004556 brain Anatomy 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009770 conventional sintering Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920006124 polyolefin elastomer Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
-
- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04D—ROOF COVERINGS; SKY-LIGHTS; GUTTERS; ROOF-WORKING TOOLS
- E04D13/00—Special arrangements or devices in connection with roof coverings; Protection against birds; Roof drainage ; Sky-lights
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/049—Protective back sheets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B10/00—Integration of renewable energy sources in buildings
- Y02B10/10—Photovoltaic [PV]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Civil Engineering (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Architecture (AREA)
- Sustainable Energy (AREA)
- Laminated Bodies (AREA)
Abstract
A substrate for solar power tiles comprising: a substrate, the substrate being curved; and the color development layer covers at least one of two opposite surfaces of the substrate and is permeable to light. The substrate for the solar power generation tile can be used for manufacturing the colorful solar power generation tile, and the light receiving surface of the solar power generation tile can be colorful, so that the requirement of a customer can be met, and the building is more attractive in appearance when the substrate is applied.
Description
Technical field
This application involves but be not limited to technical field of photovoltaic power generation, be particularly, but not limited to a kind of solar power generation watt with
Substrate and preparation method thereof and solar power generation watt and preparation method thereof.
Background technique
From the point of view of the differentiation of energy pattern, novel clean energy resource replaces traditional energy to be trend of the times, and the one of energy development
A track and rule are to move towards cleaning from unclean.Society can be promoted with effective protection ecological environment by greatly developing clean energy resource
Good and steady economic growth.In this context, the solar power generation watt for having both building decoration and generating function comes into being.
Solar power generation watt is the thin film solar electrification component based on copper indium gallium selenide technology.In general, solar power generation watt
Front panel be transparent substrate, appearance color present be solar panel color.
However, China has a vast territory, various regions are due to historical tradition or folkways and customs etc., watt can incline on pitched roof
To in different colors, this requires solar power generations watt to have different colors for client's selection.
Summary of the invention
It is the general introduction to the theme being described in detail herein below.This general introduction is not the protection model in order to limit claim
It encloses.
The application provides a kind of solar power generation watt substrate and preparation method thereof and solar power generation watt and its preparation side
Method, it is colored that the solar power generation watt substrate can be such that the light-receiving surface of solar power generation watt presents, so as to meet client's need
It asks, makes building have more aesthetic feeling in application.
The embodiment of the present application provides a kind of solar power generation watt substrate, and the substrate includes:
Substrate, the substrate are curved；And
Color layer, the color layer is covered at least one surface in opposite two surfaces of the substrate, described
Color layer light-permeable.
Illustratively, the color layer may include: a colour developing sublayer or multiple be stacked and present mutually homochromy
The colour developing sublayer of tune.
Illustratively, each colour developing sublayer may include multiple first film layers, and the multiple first film layer stacking is set
It sets, each first film layer is made of homogenous material, and the material of multiple first film layers is different.
Illustratively, the refractive index of the multiple first film layer in each colour developing sublayer is different and presses same sequence
It is cascading.
Illustratively, each colour developing sublayer may include two the first film layers, and one of them described first film
The refractive index of layer is higher than the refractive index of the first film layer described in another by least 0.5, and in described two first film layers, refractive index is high
First film layer is nearest from the substrate surface or first film layer that refractive index is low most from the substrate surface
Closely.
Illustratively, first film layer can be selected from silicon dioxide layer, titanium pentoxide layer, magnesium fluoride layer, zinc sulphide
Layer, aluminum oxide layer, titanium dioxide layer, titanium sesquioxide layer, chrome green layer, titanium dioxide zirconium layer.
Illustratively, each colour developing sublayer may include two the first film layers, and described two first film layers can divide
It Wei not titanium pentoxide layer and silicon dioxide layer.
Illustratively, each colour developing sublayer may include two the first film layers, and described two first film layers can divide
It Wei not magnesium fluoride layer and zinc sulfide layer.
Illustratively, each colour developing sublayer may include three the first film layers, and three first film layers can divide
It Wei not titanium pentoxide layer, silicon dioxide layer and lanthanum sulfate layer.
Illustratively, a colour developing sublayer may include: second film layer, and second film layer is by a variety of differences
Material mixed according to predetermined ratio.
Illustratively, the thickness of first film layer can include between 80-230nm, and in the color layer
The number of first film layer can be between 6-12, for example, between 8-12.
Illustratively, the light transmittance of the solar power generation watt substrate can be between 50-91.5%.
Illustratively, the substrate can be tempering ultra-clear glasses.
The embodiment of the present application also provides a kind of solar power generation watt, the power generation tile includes: solar panel；And
Backboard and solar power generation watt substrate as described above positioned at the solar panel opposite sides.
The embodiment of the present application also provides a kind of preparation method of solar power generation watt substrate as described above, the systems
Preparation Method includes: to prepare curved substrate；And the shape at least one surface in opposite two surfaces of the substrate
At the color layer.
Illustratively, it is described prepare curved substrate may include: by flat-shaped substrate carry out hot bending, cooling, obtain
The curved substrate.
It illustratively, can be using electron beam evaporation deposition method at least one of opposite two surfaces of the substrate
The color layer is formed on surface.
Illustratively, the color layer is formed on described at least one surface in opposite two surfaces of the substrate
It may include: to be heated using beam bombardment to target, so that the target evaporates and is deposited on the opposite of the substrate
On at least one surface in two surfaces, the color layer is formed.
Illustratively, the temperature on the target material deposition to the substrate can be 60-80 DEG C.
Illustratively, vacuum degree when electron beam evaporation deposition method being used to form the color layer can be with≤10-2Pa, example
It such as, can be 5 × 10-3-7×10-3Pa。
Illustratively, the preparation method can also include: to be formed after the color layer, to the color layer and described
Substrate is heated, for improving the bond strength of the color layer and the substrate.
Illustratively, it is formed after the color layer, the temperature heated to the color layer and the substrate can be with
It is 200-400 DEG C.
Illustratively, the preparation method can also include: to be heated using beam bombardment to target, so that described
Before target is evaporated and is deposited at least one surface in opposite two surfaces of the substrate, waited for using ion beam bombardment
Coated surface, for carrying out cleaning and roughening treatment to the film surface to be plated.
Illustratively, the color layer is formed on described at least one surface in opposite two surfaces of the substrate
May include: formed at least one surface in opposite two surfaces of the substrate one or more be stacked and
The colour developing sublayer of same hue is presented.
Illustratively, formation one is described aobvious on described at least one surface in opposite two surfaces of the substrate
Dice layer may include:
A variety of different materials are carried out while being deposited according to predetermined ratio, to obtain the colour developing sublayer；Alternatively,
A variety of different materials are successively deposited according to predetermined ratio, to obtain the colour developing sublayer.
Illustratively, the colour developing sublayer may include second film layer, and second film layer can be by five oxidations three
Titanium and silica are mixed with predetermined ratio.
Illustratively, the colour developing sublayer may include two first film layers, and two first film layers can divide
It Wei not titanium pentoxide layer and silicon dioxide layer.
The embodiment of the present application also provides a kind of preparation method of solar power generation watt, the preparation method includes:
In the solar energy that solar power generation watt as described above substrate or preparation method as described above prepare
Power generation tile carries out encapsulation process with successively laying solar panel and backboard in substrate, obtains the solar power generation watt.
The embodiment of the present application provide a kind of solar power generation watt substrate and preparation method thereof and solar power generation watt and
Preparation method since the solar power generation watt substrate includes curved substrate, and is covered on the opposite of the substrate
The color layer at least one surface in two surfaces, and the color layer light-permeable, therefore, by the solar power generation watt with
When foreboard of the substrate as the light-receiving surface that solar power generation watt is arranged in, on the one hand, can guarantee there is solar irradiation to be mapped to the sun
On energy solar panel, illumination is provided for solar panel；On the other hand, additionally it is possible to the light-receiving surface of solar power generation watt be presented color
Color (can be any one color in red, orange, yellow, green, blue, indigo and purple), so as to meet customer need, in application
So that building has more aesthetic feeling.
Other features and advantage will illustrate in the following description, also, partly become from specification
Must be clearer, or understood and implementing the application.The purpose of the application and other advantages can be by specifications, right
Specifically noted structure is achieved and obtained in claim and attached drawing.
Detailed description of the invention
In order to illustrate the technical solutions in the embodiments of the present application or in the prior art more clearly, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of application for those of ordinary skill in the art without creative efforts, can be with
It obtains other drawings based on these drawings.
Fig. 1 is a kind of structural schematic diagram of solar power generation watt substrate provided by the embodiments of the present application；
Fig. 2 is the structural schematic diagram of another solar power generation watt substrate provided by the embodiments of the present application；
Fig. 3 is the structure chart of another solar power generation watt substrate provided by the embodiments of the present application；
Fig. 4 is the structure chart of another solar power generation watt substrate provided by the embodiments of the present application；
Fig. 5 is the structure chart of another solar power generation watt substrate provided by the embodiments of the present application；
Fig. 6 is a kind of structural schematic diagram of solar power generation watt provided by the embodiments of the present application.
Specific embodiment
Below in conjunction with the attached drawing in the embodiment of the present application, technical solutions in the embodiments of the present application carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of embodiments of the present application, instead of all the embodiments.It is based on
Embodiment in the application, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall in the protection scope of this application.
In the description of the present application, it is to be understood that term " center ", "upper", "lower", "front", "rear", " left side ",
The orientation or positional relationship of the instructions such as " right side ", "vertical", "horizontal", "top", "bottom", "inner", "outside" is based on the figure
Orientation or positional relationship, be merely for convenience of description the application and simplify description, rather than the device of indication or suggestion meaning or
Element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as the limitation to the application.?
In the description of the present application, unless otherwise indicated, the meaning of " plurality " is two or more.
The embodiment of the present application provides a kind of solar power generation watt substrate, and referring to Fig. 1 and Fig. 2, the substrate includes: base
Plate 1, the substrate 1 are curved；And color layer 2, the color layer 2 are covered in opposite two surfaces of the substrate 1 at least
On one surface, 2 light-permeable of color layer.
Wherein, which is transparent substrate, for penetrating light.
Color is by the way that, to the visual experience of light, we arrive finding of naked eye caused by eye, brain and our experience of life
Light, be to be generated by the electromagnetic wave of narrow wavelength range, the electromagnetic wave of different wave length shows as different colors.
When front panel of the substrate 1 as solar power generation watt, the substrate 1 include towards solar panel one side and
Backwards to the one side of solar panel, as shown in Figure 1, the color layer 2 can be covered on the substrate 1 towards solar panel
One side on, can also be covered on the substrate 1 backwards to solar panel one side on, as shown in Fig. 2, can also both cover
In the one side towards solar panel of the substrate 1, it is also covered on the one side backwards to solar panel of the substrate 1
On.The color layer 2 being covered in the one side towards solar panel of substrate 1 is due to being encapsulated in substrate 1 and solar-electricity
It between the plate of pond, is not exposed in external environment, avoids wind, solarization and drenches with rain, therefore the service life is longer, is covered on base
The service life of the color layer 2 in the one side of solar panel of plate 1 is then relatively short.In the embodiment of the present application,
Since the solar power generation watt substrate includes curved substrate 1, and it is covered in opposite two surface of the substrate 1
At least one surface on color layer 2, and 2 light-permeable of color layer, therefore, by the solar power generation watt base of the light transmission
When foreboard of the bottom as the light-receiving surface that solar power generation watt is arranged in, on the one hand, can guarantee there is solar irradiation to be mapped to solar energy
On solar panel, solar panel is enable to absorb sunlight；On the other hand, additionally it is possible to which the light-receiving surface for making solar power generation watt is in
Existing colored (for example, can be any one color in red, orange, yellow, green, blue, indigo and purple), so as to meet client's need
It asks, makes building have more aesthetic feeling in application.
In the embodiment of the application, referring to Fig. 3, which may include: a colour developing sublayer 21.Alternatively, as schemed
Shown in 4, which can also include multiple colour developing sublayers 21 for being stacked and same hue being presented.
Tone is to be determined in the light by object reflection with which kind of wavelength dominance, and different wave length generates different colours
Feeling, tone is the important feature of color, it determines the basic feature of color essence.As red tone refers to color layer 2
The color presented based on feux rouges (wavelength is by 620-780nm) spectrum in the light of reflection.
Illustratively, when the color layer 2 is displayed in red, which can be red shown by a colour developing sublayer 21
Color, or shown red out after the colour developing sublayer 21 of multiple display light reds is superimposed.
To it is described colour developing sublayer 21 specific structure without limitation, the colour developing sublayer 21 can be a film layer, can also
Think multiple film layers.In the possible implementation of the first of the application, a colour developing sublayer 21 may include that multiple stackings are set
The first film layer 211 set, each first film layer 211 is made of homogenous material, and the material of multiple first film layers 211 is not
Together.Homogenous material refers to that the material removed other than impurity is one kind.
Illustratively, the refractive index of multiple first film layers in each colour developing sublayer is different and presses same sequence
It is cascading, so that in entire color layer, low first film layer of refractive index and high first film of refractive index
Layer is in be arranged alternately.According to the difference for the color that desired power generation tile is presented, first film layer nearest from the substrate can be folding
Low first film layer of rate is penetrated, high first film layer of refractive index is also possible to.
In one example, the color layer may include 2 colour developing sublayers, and each colour developing sublayer includes 2 the first film layers:
A film layer and B film layer.2 first film layers in each colour developing sublayer are stacked gradually according to one of following two sequence
Setting: A film layer-B film layer, B film layer-A film layer；In the example, in both the above sequence, first the first film layer is this 2
First film layer nearest from substrate surface in first film layer.Second the first film layer is covered on the separate base of first the first film layer
The side of plate surface is the first film layer farthest from substrate surface in 2 first film layers.
In one example, the color layer may include 3 colour developing sublayers, and each colour developing sublayer includes 3 the first film layers:
A film layer, B film layer and C film layer.3 first film layers in each colour developing sublayer according to one of following 6 kinds of sequences successively
It is stacked:
A film layer-B film layer-C film layer；
A film layer-C film layer-B film layer；
B film layer-A film layer-C film layer；
B film layer-C film layer-A film layer；
C film layer-A film layer-B film layer；
C film layer-B film layer-A film layer；
In the example, in above 6 kinds of sequences, first the first film layer is nearest from substrate surface in 3 first film layers
The first film layer.Second the first film layer is covered on first side of first film layer far from substrate surface, the first film of third
Layer is covered on second side of first film layer far from substrate surface, is farthest from substrate surface in 3 first film layers
First film layer.According to the difference for the color that desired power generation tile is presented, first the first film layer can be rolls in 3 first film layers
The first minimum film layer of rate is penetrated, highest first film layer of refractive index in 3 first film layers is also possible to.
Illustratively, first film layer can be selected from silicon dioxide layer, titanium pentoxide layer, magnesium fluoride layer, zinc sulphide
Any one in layer, aluminum oxide layer, titanium dioxide layer, titanium sesquioxide layer, chrome green layer, titanium dioxide zirconium layer.
Illustratively, each colour developing sublayer may include two the first film layers being stacked, and one of them
The refractive index of first film layer is higher than the refractive index of another first film layer.
Theoretically, the refractive index of the first adjacent film layer is the bigger the better.Illustratively, each colour developing sublayer can
To include two the first film layers being stacked, and the refractive index of one of them first film layer is than described in another first
The refractive index height at least 0.5 of film layer, in described two first film layers, high first film layer of refractive index is from the substrate table
First film layer that face is nearest or refractive index is low is nearest from the substrate surface.
Illustratively, each colour developing sublayer may include two the first film layers being stacked, and described two first
Film layer can be respectively titanium pentoxide layer and silicon dioxide layer.
Illustratively, each colour developing sublayer may include two the first film layers being stacked, and described two first
Film layer can be respectively magnesium fluoride layer (refractive index is about 1.38) and zinc sulfide layer (refractive index is about 2.4).
Illustratively, each colour developing sublayer may include three the first film layers being stacked, and described three first
Film layer can be respectively titanium pentoxide layer, silicon dioxide layer and lanthanum sulfate layer.
Illustratively, as shown in Figure 3 and Figure 4, color layer 2 may include a colour developing sublayer 21 (as shown in Figure 3) or packet
Two colour developing sublayers 21 (as shown in Figure 4) for being stacked and presenting same hue are included, colour developing sublayer 21 may include two layers
First film layer 211 of folded setting, two first film layers 211 can be respectively titanium pentoxide layer and silicon dioxide layer.In Fig. 4
Color layer 2 in, titanium pentoxide layer and silicon dioxide layer are in being arranged alternately.
In the possible implementation of second of the application, referring to Fig. 5, a colour developing sublayer 21 includes: one
Two film layers 212, second film layer 212 can be mixed by a variety of different materials according to predetermined ratio.Here different
Each material of material kind is also considered as homogenous material, and it is one that homogenous material, which also refers to the material removed other than impurity,
It is a.
Illustratively, which can be mixed by titanium pentoxide and silica with predetermined ratio.
In practical applications, the shade of color layer 2 is determined by the thickness of the color layer 2.When color layer 2 includes one
When the sublayer 21 that develops the color, the thickness of the colour developing sublayer 21 is the thickness of the color layer 2, and when color layer includes multiple is stacked
And when the colour developing sublayer 21 of same hue is presented, the thickness and number of the colour developing sublayer 21 codetermine the thickness of the color layer 2.
In order to preferably improve the transmitance of light when showing deeper color, illustratively, first film layer
Thickness can between 80-230nm, the number of the first film layer for including in the color layer can between 6-12, such as
Between between 8-12.Light transmittance is the ability for indicating light and penetrating medium, be through transparent or semitransparent body light it is logical
The percentage of amount and its incident flux.
In the another embodiment of the application, the light transmittance of the solar power generation watt substrate is between 50-91.5%.It should
Solar power generation watt can reach higher light transmittance with substrate while display color.
Wherein, without limitation to the material of the substrate 1, which can be glass material, or plastic material.
Illustratively, which can be ultra-clear glasses, for example, tempering ultra-clear glasses.Ultra-clear glasses are a kind of super
Bright low iron glass is provided simultaneously with all processability possessed by high-quality float glass, has superior physics, machinery and light
Performance is learned, various deep processings can be carried out as other high-quality float glasses, light transmittance is up to 91.5% or more.
The embodiment of the present application also provides a kind of solar power generations watt, and referring to Fig. 6, the power generation tile includes: solar-electricity
Pond plate 01；Backboard 02 and solar power generation watt substrate as described above positioned at 01 opposite sides of solar panel
03。
Solar power generation watt provided by the embodiments of the present application, using the solar power generation watt of above-mentioned light transmission use substrate 03 as
The foreboard of the light-receiving surface of solar power generation watt is set, on the one hand, can guarantee have solar irradiation to be mapped to solar panel 01
On, so that solar panel 01 is absorbed sunlight；On the other hand, additionally it is possible to the light-receiving surface of solar power generation watt be presented color
Color (can be any one color in red, orange, yellow, green, blue, indigo and purple), so as to meet customer need, in application
So that building has more aesthetic feeling.
The solar panel 01 and the backboard 02 and solar power generation watt are with can pass through packaging adhesive film between substrate 03
04 realizes encapsulation.
The packaging adhesive film 04 can for ethylene-octene copolymer (Polyolefin Elastomer, POE) glue film or
Ethylene-vinyl acetate copolymer (Polyethylene Vinylacetate, EVA) glue film.Wherein, POE glue film or EVA glue
Film realizes the bonding to solar panel 01, backboard 02 and solar power generation watt substrate 03 in lamination process.
The solar power generation watt is with being also provided with waterproof glue film 05 between substrate 03 and solar panel 01.
The waterproof glue film 05 can be formed by butyl rubber.
In order to realize the series connection of sub- solar panel, remittance can also be set between the backboard 02 and solar panel 01
Flow item 06.
The embodiment of the present application also provides a kind of preparation methods of solar power generation watt substrate as described above, comprising:
Prepare curved substrate；And color layer is formed at least one surface in opposite two surfaces of the substrate.
The embodiment of the present application provides a kind of preparation method of solar power generation watt substrate, prepares solar energy hair obtained
It is colored that electricity watt substrate can be such that the light-receiving surface of solar power generation watt presents, and so as to meet customer need, makes in application
More aesthetic feeling must be built.
It is such as bent since solar power generation watt usually makes various moulding by imitative conventional sintering watt, roof clay tile, glazed tiles
Face watt, semicircular tile, S type watt etc..Therefore, plated film is carried out usually in flat-shaped substrate to prepare colored substrate, according to processing technology
It is broadly divided into on-line coating and two kinds off-line coated, on-line coating refers to that the technical process of plated film is in float glass processes
Middle progress, sprays film layer by magnetron sputtering.Off-line coated is then to carry out plated film processing after flat-shaped substrate factory.Compared with
The firmness of on-line coating, off-line coated obtained film layer will necessarily be affected.
Magnetron sputtering plating is exactly so that the particle deposition pounded is existed using lotus energy particle bombardment target surface in a vacuum
Technology on substrate.
Solar power generation watt needs to carry out hot bending, cooling (can be annealing or tempering), if the sun because of modeling requirement
Energy power generation tile uses on-line coating or off-line coated tabular coated basal plate obtained, and in the process of hot bending, heating furnace will
To molten condition, (when the coated basal plate is glass, the heating temperature of molten condition is 690~730 to coated basal plate continuous heating
DEG C), curved substrate is obtained subsequently into mold extrusion forming.
Regardless of coated glass, under this substrate melting temperature, film layer can melt and cause to demould.Demoulding refers to
What caused by the film layer on substrate is cracked, melted due to various external force, temperature etc. etc. and substrate was detached from, peels off etc. shows
As.If temperature when being lowered into mold to film layer melt temperature hereinafter, if bad molding, yields is low.Even increase
Cost is to improve the melt temperature of film layer, in a mold when brake forming, film layer still can due to the curvature of substrate extruding or
Person stretches and cracks.Equally it is not applied for the beautiful requirement of solar power generation watt.
And in the embodiment of the present application, by the way that substrate is first prepared into curved, then on curved substrate plated film side
Method formed film layer (color layer i.e. in the embodiment of the present application), avoid first plated film, after by substrate manufacture at substrate when curved
Curvature extruding or stretching and occur demould phenomenon.
Wherein it is possible to prepare curved substrate by various methods such as hot bending method, clod wash methods, it is not limited here.
In embodiments herein, preparing curved substrate may include: that flat-shaped substrate is carried out hot bending, cooling
(can be annealing process, or steel process) obtains the curved substrate.
Hot bending, which refers to, to be heated and softened flat-shaped substrate and forms in a mold, the technique that curved surface is made, cooling after hot bending
Complete tempering.Wherein, annealing refers to that glass is transformed into brittleness by typical liquid when by transition temperature region (Tf-Tg)
State, and glass molecule still is able to migrate within the scope of Tg point suitable temperature below, the heat that can be eliminated in glass is answered
The inhomogeneities of power and configuration state, this section of temperature region are the annealing region of glass, i.e. annealing region has with glass viscosity
It closes.Tempering then refer to glass is heated to softening temperature hereinafter, carry out above 50-60 DEG C of Tg point quickly, it is uniformly cooling obtain,
Hardness can be increased.In practical applications, substrate can be heated to molten condition, design is squeezed by upper and lower mold
Shape, then annealed or tempering and obtain substrate.
Illustratively, substrate can be tempering substrate.Tempering substrate hardness is higher.
The specific method that color layer is formed at least one surface in opposite two surfaces of the substrate is not limited
It is fixed, as long as at least one surface that color layer can be formed in opposite two surfaces of the substrate.For example, can be with
Color layer is formed at least one surface in opposite two surfaces of substrate using electron beam evaporation deposition method.
In the another embodiment of the application, target can be heated using beam bombardment, so that target evaporates
And be deposited at least one surface in opposite two surfaces of the substrate, form color layer.
When passing through magnetic control sputtering plating embrane method depositional coating, the speed that film layer deposits on the surface of the substrate is fast, due to solar energy
Power generation tile is usually curved surface, and with the progress of deposition, the thickness difference of the film layer of the Wave crest and wave trough of curved surface is pushed away with plated film time
Move increasing, the bad control of the uniformity of film layer, therefore, magnetron sputtering plating is more applied to facet coatings.And electronics
Beam evaporation plated film refers to using target in beam bombardment crucible, evaporates so that target melts and is deposited on the plated film on substrate
Method, this method can realize vapor deposition more accurately, can plate out the high-precision film of high-purity.Using electron beam evaporation plating
When embrane method carries out plated film, film layer is slow in the speed that substrate surface deposits, and with the progress of vapor deposition, is deposited on the film layer of Wave crest and wave trough
Thickness difference is unobvious, and uniformity controls well, is suitable for curved surface plated film.It therefore, can be preferably by electron beam evaporation deposition
The thickness of film layer is adjusted.
Film layer is formed by using electron beam evaporation deposition and is resistant to 300 DEG C of high temperature, much higher than the envelope to solar power generation watt
The heating temperature (usually 160 DEG C) in lamination process is filled, can prevent film layer from cracking, demoulding etc. occurring in lamination process existing
As.
Illustratively, the temperature on the target material deposition to substrate can be 60-80 DEG C.That is, target film-forming temperature (
It is exactly adiabatic condensation temperature of the target on substrate) it can be 60-80 DEG C.
Illustratively, vacuum degree when electron beam evaporation deposition method being used to form color layer can be with≤10-2Pa, for example, can
Think 5 × 10-3-7×10-3Pa。
In the another embodiment of the application, which can also include: to be formed after color layer, to the color layer
It is heated with substrate, for improving the bond strength of color layer and substrate.
Formed after color layer, the temperature that the color layer and the substrate are heated can according to the color layer and
The material of the substrate is rationally arranged.Illustratively, the temperature of the heating can be 200-400 DEG C.For example, the temperature of heating
It can be any one temperature in 200 DEG C, 250 DEG C, 300 DEG C, 350 DEG C and 400 DEG C.The temperature of the heating is higher, color layer
It is better with the bond strength of substrate, and color layer will not melt at 400 DEG C, therefore will not occur to demould phenomenon.
In the another embodiment of the application, the preparation method can also include: using beam bombardment to target into
Row heating, so that before target is evaporated and is deposited at least one surface in opposite two surfaces of substrate, using ion
Beam bombards film surface (surface of the color layer to be formed of the i.e. described substrate) to be plated, carries out cleaning and coarse to treat coated surface
Change processing.The processing can treat coated surface burr, it is dirty be removed, film layer can also be improved by roughening treatment
Adhesive force on substrate.Ion beam bombardment film surface to be plated can make film surface to be plated form recess or protrusion, improve to
The roughness of coated surface.
In the embodiment of the application, color layer is formed at least one surface in opposite two surfaces of substrate
It may include: to form one or more at least one surface in opposite two surfaces of substrate to be stacked and present
The colour developing sublayer of same hue.
Formed at least one surface in opposite two surfaces of substrate a colour developing sublayer can use two kinds can
The implementation of energy.
In the first possible implementation, a variety of different materials can be carried out while is steamed according to predetermined ratio
Plating, to obtain colour developing sublayer.For example, different materials can be respectively placed in different crucibles according to predetermined ratio, lead to
Cross the boiling point for controlling the temperature of each crucible to placed material, vapor deposition while realizing different materials.
Illustratively, which can be mixed by titanium pentoxide and silica with predetermined ratio.
In the second possible implementation, a variety of different materials can successively be steamed according to predetermined ratio
Plating, to obtain colour developing sublayer.For example, the first material can be deposited on substrate and then by second of material be deposited to
On the film surface that the first material is formed, and so on, until being deposited multiple material to substrate.Using electron beam evaporation
Coating method is conducive to carry out well the thickness of a variety of different materials in colour developing sublayer compared with magnetron sputtering embrane method
Control, is formed by stacking the color layer of same thickness by relatively thin material layer, so, using electron beam evaporation plating
The number of plies of embrane method film layer obtained can be more, to keep the depth variation range of the color of color layer also wider, and then make
It is fuller, gorgeous to obtain color.
Illustratively, a colour developing sublayer may include two the first film layers, and two the first film layers can be respectively
Titanium pentoxide layer and silicon dioxide layer.For example, when the tone that colour developing sublayer is presented is blue, two first film layers
The thickness ratio of (titanium pentoxide layer and silicon dioxide layer) can be 40:70-50:70, when the tone that colour developing sublayer is presented is
When yellow, the thickness ratio of two first film layers (titanium pentoxide layer and silicon dioxide layer) can be a:b, wherein the value of a
It may range from 65-70, the value range of b can be 90-100, and when the tone that colour developing sublayer is presented is red, two should
The thickness ratio of first film layer (titanium pentoxide layer and silicon dioxide layer) can be 80:130-95:130.
Illustratively, when the tone that colour developing sublayer is presented is blue, the thickness of titanium pentoxide layer and silicon dioxide layer
The arbitrary value that the ratio between degree can be 40:70-50:70 within the scope of this, such as can be 40:70, exemplary, titanium pentoxide layer
It can be 40nm, silicon dioxide layer can be 70nm, such as can also be 45:70 or 50:70, it is all the same with the example, five
The thickness unit for aoxidizing three titanium layers and silicon dioxide layer can be nanoscale.When the tone that colour developing sublayer is presented is yellow,
The arbitrary value that the ratio between titanium pentoxide layer and the thickness of silicon dioxide layer can be 60:100-70:90 within the scope of this, such as can
Think 65:90, exemplary, titanium pentoxide layer can be 65nm, and silicon dioxide layer can be 90nm, such as can also be 70:
100,70:90 or 70:100, all the same with the example, the thickness unit of titanium pentoxide layer and silicon dioxide layer, which can be, to be received
Meter level.When the tone that colour developing sublayer is presented is red, the ratio between thickness of titanium pentoxide layer and silicon dioxide layer can be
Arbitrary value of the 80:130-95:130 within the scope of this, such as can be 80:130, exemplary, titanium pentoxide layer can be
80nm, silicon dioxide layer can be 130nm, such as can also be 90:130 or 95:130, five oxidations all the same with the example
The thickness unit of three titanium layers and silicon dioxide layer can be nanoscale.
Illustratively, a colour developing sublayer may include two the first film layers, and two the first film layers can be respectively
Titanium pentoxide layer and silicon dioxide layer.For example, when the tone that colour developing sublayer is presented is blue, the thickness of silicon dioxide layer
It can be 40-50nm, the thickness of titanium pentoxide layer can be 70nm；When the tone that colour developing sublayer is presented is yellow, two
The thickness of silicon oxide layer can be 60-70nm, and the thickness of titanium pentoxide layer can be 90-100nm；When colour developing sublayer is presented
Tone when being red, the thickness of silicon dioxide layer can be 80-95nm, and the thickness of titanium pentoxide layer can be 130nm.
The light transmittance of the solar power generation watt being prepared using method provided by the embodiments of the present application substrate is between 50-
Between 91.5%, the light transmittance of the solar power generation watt substrate for the blue that develops the color is not less than 85%；And the solid colour of substrate
Property it is good, without part demoulding phenomenon.
The embodiment of the present application also provides a kind of preparation method of solar power generation watt, the preparation method may include:
The solar power generation watt that solar power generation watt as described above substrate or preparation method as described above prepare with
Solar panel and backboard are successively laid in substrate, and carries out encapsulation process, obtain the solar power generation watt.
The preparation method of solar power generation watt provided by the embodiments of the present application, can obtain appearance is colored solar energy hair
Electricity watt makes building have more aesthetic feeling so as to meet customer need in application.
In solar power generation watt, the solar panel and backboard can be laid in the solar power generation watt in substrate
Any one color layer side.
Illustratively, which can be provided with a color layer, the solar-electricity in side in substrate
Pond plate and backboard can successively be laid in the side with color layer.
Present disclosure is the example of the principle of the embodiment of the present application, is not made to the application in any form or substantive
On restriction, or the application is limited to specific embodiment.It will be apparent to those skilled in the art that the application is real
Element, the method and system etc. for applying the technical solution of example, can be changed, are changed, changed, be developed, without departing from institute as above
The embodiments herein stated, technical solution, as defined in the claims principle, spirit and scope.These change, change
The embodiment for becoming, changing, developing is included in the equivalent integers of the application, these equivalent integers are included in this Shen
In the range of being defined by the claims please.Although the embodiment of the present application can be made to embody in many different forms, herein
What is be described in detail is some embodiments of the application.In addition, embodiments herein includes various embodiment party described herein
Some or all of any possible combination of case is also included in the range of being defined by the claims of the application.In this Shen
Please in or in the patent, the patent application of reference or the data of other references of any one reference it is Anywhere mentioned all
Patent, patent application and other citations are integrally incorporated accordingly by reference with it.
Above disclosure is defined as illustrative rather than exhaustive.To those skilled in the art, this theory
The bright gathering of calligraphers implies many variations and optional scheme.All these optional schemes and variation are intended to be included in present claims
In the range of, wherein term " includes " means " including, but are not limited to ".
The description to the selectable embodiment of the application is completed herein.One skilled in the art will recognize that this place
The other equivalent transformations for the embodiment stated, these equivalent transformations are also as investing included by the claims herein.
Claims (20)
1. a kind of solar power generation watt substrate, the substrate include:
Substrate, the substrate are curved；And
Color layer, the color layer are covered at least one surface in opposite two surfaces of the substrate, the colour developing
Layer light-permeable.
2. solar power generation watt substrate according to claim 1, wherein the color layer includes: a colour developing sublayer,
Or multiple colour developing sublayers for being stacked and same hue being presented.
3. solar power generation watt substrate according to claim 2, wherein each colour developing sublayer includes multiple first
Film layer, the multiple first film layer are stacked, and each first film layer is made of homogenous material, and multiple first films
The material of layer is different.
4. solar power generation watt substrate according to claim 3, wherein the multiple in each colour developing sublayer
The refractive index of first film layer is different and is cascading by same sequence.
5. solar power generation watt substrate according to claim 3, wherein each colour developing sublayer includes two first
Film layer, and the refractive index of one of them first film layer is higher than the refractive index of the first film layer described in another by least 0.5,
In described two first film layers, high first film layer of refractive index is nearest from the substrate surface or refractive index is low institute
It is nearest from the substrate surface to state the first film layer.
6. solar power generation watt substrate according to claim 4, wherein first film layer be selected from silicon dioxide layer,
Titanium pentoxide layer, magnesium fluoride layer, zinc sulfide layer, aluminum oxide layer, titanium dioxide layer, titanium sesquioxide layer, three oxidations two
Layers of chrome, titanium dioxide zirconium layer.
7. solar power generation watt substrate according to claim 4, wherein each colour developing sublayer includes two first
Film layer, described two first film layers are respectively titanium pentoxide layer and silicon dioxide layer；Or
Each colour developing sublayer includes two the first film layers, and described two first film layers are respectively magnesium fluoride layer and zinc sulphide
Layer；Or
Each colour developing sublayer includes three the first film layers, and three first film layers are respectively titanium pentoxide layer, dioxy
SiClx layer and lanthanum sulfate layer.
8. the solar power generation watt substrate according to any one of claim 3-7, wherein the thickness of first film layer
Between 80-230nm, and the number for first film layer for including in the color layer is between 6-12.
9. solar power generation watt substrate according to claim 1, wherein the light transmission of the solar power generation watt substrate
Rate is between 50-91.5%.
10. a kind of solar power generation watt, the power generation tile include:
Solar panel；And
Positioned at the backboard and solar power generation as claimed in any one of claims 1-9 wherein of the solar panel opposite sides
Watt with substrate.
11. a kind of preparation method of solar power generation watt substrate as claimed in any one of claims 1-9 wherein, the preparation side
Method includes:
Prepare curved substrate；And
The color layer is formed at least one surface in opposite two surfaces of the substrate.
12. the preparation method of solar power generation watt substrate according to claim 11, wherein it is described prepare it is curved
Substrate includes: that flat-shaped substrate is carried out hot bending, cooling, obtains the curved substrate.
13. the preparation method of solar power generation watt substrate according to claim 11, wherein described in the substrate
Forming the color layer at least one surface in opposite two surfaces includes: to be added using beam bombardment to target
Heat, so that the target is evaporated and is deposited at least one surface in opposite two surfaces of the substrate, described in formation
Color layer.
14. the preparation method of solar power generation watt substrate according to claim 13, wherein the target material deposition to institute
Stating the temperature on substrate is 60-80 DEG C.
15. the preparation method of solar power generation watt substrate according to claim 13, wherein when forming the color layer
Vacuum degree be 5 × 10-3-7×10-3Pa。
16. the preparation method of solar power generation watt substrate according to claim 13, the preparation method further include: shape
After the color layer, the color layer and the substrate are heated, for improving the color layer and the substrate
Bond strength.
17. the preparation method of solar power generation watt substrate according to claim 16, wherein formed the color layer it
Afterwards, the temperature heated to the color layer and the substrate is 200-400 DEG C.
18. the preparation method of solar power generation watt substrate according to claim 13, the preparation method further include: adopt
Target is heated with beam bombardment, so that the target is evaporated and is deposited in opposite two surfaces of the substrate
Before at least one surface, using ion beam bombardment film surface to be plated, to carry out cleaning and coarse to the film surface to be plated
Change processing.
19. the preparation method of solar power generation watt substrate described in any one of 1-18 according to claim 1, wherein described
Forming the color layer at least one surface in opposite two surfaces of the substrate includes: in the opposite of the substrate
One or more colour developing for being stacked and same hue being presented is formed at least one surface in two surfaces
Layer；
Forming a colour developing sublayer at least one surface in opposite two surfaces of the substrate includes:
A variety of different materials are carried out while being deposited according to predetermined ratio, to obtain the colour developing sublayer；Alternatively,
A variety of different materials are successively deposited according to predetermined ratio, to obtain the colour developing sublayer.
20. a kind of preparation method of solar power generation watt, the preparation method include:
It is any in solar power generation watt as claimed in any one of claims 1-9 wherein substrate or such as claim 11-19
The solar power generation watt that preparation method described in prepares is gone forward side by side with solar panel and backboard is successively laid in substrate
Row encapsulation process obtains the solar power generation watt.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2019/089065 WO2019237923A1 (en) | 2018-06-11 | 2019-05-29 | Solar power generation tile and base thereof, and preparation method therefor |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2018105979539 | 2018-06-11 | ||
| CN201810597953 | 2018-06-11 | ||
| CN201820903989 | 2018-06-11 | ||
| CN2018209039890 | 2018-06-11 |
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| CN201821257800.1U Active CN208753333U (en) | 2018-06-11 | 2018-08-06 | A kind of solar power generation watt substrate and solar power generation watt |
| CN201810885326.5A Pending CN109004040A (en) | 2018-06-11 | 2018-08-06 | Solar power generation tile and substrate thereof and preparation methods of solar power generation tile and substrate |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019237923A1 (en) * | 2018-06-11 | 2019-12-19 | 汉能移动能源控股集团有限公司 | Solar power generation tile and base thereof, and preparation method therefor |
| CN112151479A (en) * | 2020-11-24 | 2020-12-29 | 度亘激光技术（苏州）有限公司 | Heat sink for device, semiconductor device and preparation method of heat sink for device |
| CN115458613A (en) * | 2022-11-09 | 2022-12-09 | 浙江爱旭太阳能科技有限公司 | Color solar cell, color cell module and photovoltaic system |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN208753333U (en) * | 2018-06-11 | 2019-04-16 | 汉能移动能源控股集团有限公司 | A kind of solar power generation watt substrate and solar power generation watt |
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| CN208753333U (en) * | 2018-06-11 | 2019-04-16 | 汉能移动能源控股集团有限公司 | A kind of solar power generation watt substrate and solar power generation watt |
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- 2018-08-06 CN CN201810885326.5A patent/CN109004040A/en active Pending
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| CN102194918A (en) * | 2010-03-05 | 2011-09-21 | 赵枫 | Manufacturing method of colored solar batteries |
| US20120024362A1 (en) * | 2011-05-31 | 2012-02-02 | Primestar Solar, Inc. | Refractive index matching of thin film layers for photovoltaic devices and methods of their manufacture |
| CN207269209U (en) * | 2017-06-22 | 2018-04-24 | 江苏汉嘉薄膜太阳能科技有限公司 | Wavy curved surface photovoltaic tile |
| CN108642447A (en) * | 2018-05-08 | 2018-10-12 | 北京汉能光伏投资有限公司 | A kind of curved surface film-coated plate and preparation method thereof and include its solar components |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2019237923A1 (en) * | 2018-06-11 | 2019-12-19 | 汉能移动能源控股集团有限公司 | Solar power generation tile and base thereof, and preparation method therefor |
| CN112151479A (en) * | 2020-11-24 | 2020-12-29 | 度亘激光技术（苏州）有限公司 | Heat sink for device, semiconductor device and preparation method of heat sink for device |
| CN112151479B (en) * | 2020-11-24 | 2021-02-12 | 度亘激光技术（苏州）有限公司 | Heat sink for device, semiconductor device and preparation method of heat sink for device |
| CN115458613A (en) * | 2022-11-09 | 2022-12-09 | 浙江爱旭太阳能科技有限公司 | Color solar cell, color cell module and photovoltaic system |
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| Publication number | Publication date |
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| CN208753333U (en) | 2019-04-16 |
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