WO2019237923A1

WO2019237923A1 - Solar power generation tile and base thereof, and preparation method therefor

Info

Publication number: WO2019237923A1
Application number: PCT/CN2019/089065
Authority: WO
Inventors: 朱伟; 张继凯; 程晓龙
Original assignee: 汉能移动能源控股集团有限公司
Priority date: 2018-06-11
Filing date: 2019-05-29
Publication date: 2019-12-19

Abstract

Disclosed are a base for a solar power generation tile, and a solar power generation tile. The base comprises: a substrate; and a color developing layer, the color developing layer covering at least one surface of two opposite surfaces of the substrate, and the color developing layer being light-transmittable. The solar power generation tile comprises: a solar cell chip; and backplates located at two opposite sides of the solar cell chip, and the base.

Description

Solar power generation tile, its substrate and preparation method thereof

This application is based on Chinese patent application with application number 201810597953.9, application date 2018/6/11, Chinese patent application with application number 201810885326.5, application date 2018/8/6, and claims the priority of the above two Chinese patent applications. The entire contents of the two Chinese patent applications are incorporated herein by reference.

Technical field

The present application relates to, but is not limited to, the field of photovoltaic power generation technology, and particularly relates to, but not limited to, a substrate for a solar power generation tile and a preparation method thereof, and a solar power generation tile and a preparation method thereof.

Background technique

Judging from the evolution of the energy pattern, it is the general trend that new clean energy replaces traditional energy. The trajectory and law of energy development are from unclean to clean. Vigorously developing clean energy can effectively protect the ecological environment and promote the sound and rapid development of society and economy. Under this premise, solar power generation tiles with both building decoration and power generation functions came into being.

Some solar power tiles are thin-film solar power components based on copper-indium-gallium-selenium technology. The front panel of some solar power tiles is a transparent substrate, and the appearance color is the color of the solar panel.

However, China is a vast country. Due to historical traditions or customs, the tiles on slope roofs tend to have different colors. This requires solar power tiles to have different colors for customers to choose.

Summary of invention

The following is an overview of the topics detailed in this article. This summary is not intended to limit the scope of protection of the claims.

An embodiment of the present application provides a substrate for a solar power generation tile, and the substrate includes:

Substrate; and

A color-developing layer covering at least one of two opposite surfaces of the substrate, and the color-developing layer is transparent.

An embodiment of the present application further provides a solar power generation tile, which includes: a solar cell chip; and a back plate located on opposite sides of the solar cell chip and the substrate for a solar power generation tile as described above.

An embodiment of the present application further provides a method for preparing a substrate for a solar power generation tile as described above, the method includes: preparing the substrate; and on at least one of two opposite surfaces of the substrate. Forming the color developing layer.

An embodiment of the present application further provides a method for preparing a solar power generation tile. The method includes:

On the substrate for a solar power generation tile as described above or the substrate for a solar power generation tile obtained by the preparation method described above, a solar cell chip and a back plate are sequentially laid, and packaging processing is performed to obtain the solar power generation tile.

Other features and advantages of the present application will be explained in the subsequent description, and partly become clearer from the description, or be understood by implementing the present application. The objects and other advantages of the present application can be achieved and obtained by the structures specifically pointed out in the description, the claims, and the drawings.

Overview of the drawings

In order to explain the technical solutions in the embodiments of the present application or the prior art more clearly, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings in the following description are merely These are some embodiments of the present application. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without paying creative work.

FIG. 1 is a schematic structural diagram of a substrate for a solar power generation tile according to an embodiment of the present application; FIG.

2 is a schematic structural diagram of another substrate for a solar power generation tile provided by an embodiment of the present application;

FIG. 3 is a structural diagram of another substrate for a solar power generation tile provided by an embodiment of the present application; FIG.

4 is a structural diagram of another substrate for a solar power generation tile provided by an embodiment of the present application;

5 is a structural diagram of another substrate for a solar power generation tile provided by an embodiment of the present application;

FIG. 6 is a schematic structural diagram of a solar power generation tile provided by an embodiment of the present application.

Reference signs:

1-substrate; 2-color rendering layer; 21-color rendering sublayer; 22-first color rendering sublayer; 23-second color rendering sublayer; 211-film layer; 2111-first film layer; 2112-th Two film layers; 2113-third film layer; 2114-fourth film layer; 212-composite film layer; 100-substrate; 300-solar cell chip; 500-back plate; 600-sealing film; 700-waterproof film ; 800-bus bar.

Elaborate

The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by a person of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

In the description of this application, it needs to be understood that the terms “center”, “up”, “down”, “front”, “rear”, “left”, “right”, “vertical”, “horizontal”, The orientations or positional relationships indicated by "top", "bottom", "inner", "outer" are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing this application and simplifying the description, and are not intended or implied The device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as a limitation on this application. In the description of the present application, unless otherwise stated, "a plurality" means two or more.

An embodiment of the present application provides a substrate 100 for a solar power generation tile. Referring to FIGS. 1 and 2, the substrate 100 includes: a substrate 1; and a color rendering layer 2, which covers two opposite sides of the substrate 1. On at least one of the surfaces, the color rendering layer 2 is transparent.

The substrate 1 is a transparent substrate 1 and can transmit light. The shape of the substrate 1 may be curved or planar.

Color is the visual perception of light produced by the eyes, the brain, and our life experience. The light we see with our eyes is generated by electromagnetic waves with a narrow wavelength range, and electromagnetic waves of different wavelengths show different colors.

When the substrate 1 is used as a front panel of a solar power tile, the substrate 1 includes a side facing the solar cell chip 300 and a side facing away from the solar cell chip 300. As shown in FIG. 1, the color rendering layer 2 may cover the substrate 1 The side of the substrate 1 facing the solar cell chip 300 may also be covered on the side of the substrate 1 facing away from the solar cell chip 300, as shown in FIG. 2, or may be covered on the side of the substrate 1 facing the solar cell chip 300. It is also covered on the side of the substrate 1 facing away from the solar cell chip 300. Since the color rendering layer 2 covering the side of the substrate 1 facing the solar cell chip 300 is encapsulated between the substrate 1 and the solar cell chip 300, it will not be exposed to the external environment, avoiding wind, sun and rain. Therefore, the service life is longer, and the service life of the color rendering layer 2 covering the side of the substrate 1 facing away from the solar cell chip 300 is relatively short.

In the embodiment of the present application, the substrate 100 for a solar power generation tile includes a substrate 1 and a color developing layer 2 covering at least one of two opposite surfaces of the substrate 1, and the color developing layer 2 may be Light transmission, therefore, when the light-transmitting solar power generation tile substrate 100 is used as a front plate provided on the light receiving surface of the solar power generation tile, on the one hand, it is possible to ensure that sunlight is irradiated onto the solar cell chip 300, so that the solar cell The chip 300 can absorb sunlight; on the other hand, the light receiving surface of the solar power tile can also be colored (for example, it can be any one of red, orange, yellow, green, blue, indigo, and purple), so that it can Meet customer needs and make the building more aesthetically pleasing when applied.

In an embodiment of the present application, referring to FIG. 3, the color rendering layer 2 may be configured to include: a color rendering sub-layer 21, and the color rendering sub-layer 21 may include two or more film layers 211. Alternatively, in another embodiment, as shown in FIG. 4, the color rendering layer 2 includes a first color rendering sub-layer 22 and a second color rendering sub-layer 23; wherein the first color rendering sub-layer 22 includes a first film. Layer 2111 and second film layer 2112; second color rendering sub-layer 23 includes a third film layer 2113 and a fourth film layer 2114. In addition, the refractive indexes of the first film layer 2111 and the second film layer 2112 are different; the refractive indexes of the third film layer 2113 and the fourth film layer 2114 are also different; the first and second

color rendering sublayers

22 and 2114 23 can be set to show the same hue, or it can also be set to show different hue according to the desired color of the color rendering layer 2. Relatively speaking, the former setting method can make the light transmittance of the color rendering layer 2 increase. Of course, the color rendering layer 2 may also include more color rendering sub-layers 21, and the color rendering sub-layer 21 may also include more film layers 211, which is not specifically limited herein.

Hue is determined by which wavelength dominates the light reflected by the object. Different wavelengths produce different colors. Hue is an important feature of color and it determines the fundamental characteristics of color. For example, the red hue refers to the color mainly represented by the spectrum of red light (wavelength: 620-780 nm) in the light reflected by the color rendering layer 2.

Exemplarily, when the color rendering layer 2 displays red, the red color may be red displayed by one color rendering sub-layer 21, or may be red displayed by superposing a plurality of color rendering sub-layers 21 displaying light red. Or, it may also be a red color displayed after a plurality of color-developing sub-layers 21 displaying other colors.

The specific structure of the color rendering sub-layer 21 is not limited, and each color rendering sub-layer 21 may be one film layer 211 or multiple film layers 211.

In the first implementation manner of the present application, one color rendering sub-layer 21 may include a plurality of film layers 211 arranged in a stack, each of the film layers 211 is composed of a single material, and at least two of the plurality of film layers 211 are The material of 211 is different. The single material described in the present application means one material except for impurities.

Exemplarily, the refractive indices of the plurality of film layers 211 in each of the color rendering sub-layers 21 are different, and at the same time, the stacking order of the film layers 211 in each color rendering sub-layer 21 is the same, and In layer 2, the refractive indices of the adjacent film layers 211 are different.

According to the desired color of the power generating tile, the film layer 211 closest to the substrate 1 may be a film layer 211 with a low refractive index or a film layer 211 with a high refractive index.

In an example, the color rendering layer 2 may include two color rendering sub-layers 21, and each color rendering sub-layer 21 includes two film layers 211: an A film layer and a B film layer. The A film layer and the B film layer in each color developing sub-layer 21 are sequentially stacked in one of the following two orders: A film layer—B film layer, B film layer—A film layer; in this example, In the above two sequences, the first film layer is the film layer closest to the surface of the substrate 1 among the two film layers, and the second film layer covers the side of the first film layer away from the surface of the substrate 1, that is, The film layer farthest from the surface of the substrate 1 among the two film layers.

In another example, the color rendering layer 2 may include three color rendering sub-layers 21, and each color rendering sub-layer 21 includes three film layers 211: an A film layer, a B film layer, and a C film layer. The three film layers in each color-developing sub-layer 21 are sequentially stacked in accordance with one of the following six sequences:

A film layer—B film layer—C film layer;

A film layer—C film layer—B film layer;

B film layer—A film layer—C film layer;

B film layer—C film layer—A film layer;

C film layer—A film layer—B film layer;

C film layer—B film layer—A film layer;

In this example, in the above six sequences, the first film layer is the film layer closest to the surface of the substrate 1 among the three film layers. The second film layer covers the side of the first film layer away from the surface of the substrate 1, and the third film layer covers the side of the second film layer away from the surface of the substrate 1. That is, the three film layers are away from the substrate. 1 the farthest layer on the surface. According to the different colors expected of the power generating tile, the first film layer may be the film layer with the lowest refractive index among the three film layers, or the film layer with the highest refractive index among the three film layers.

Exemplarily, the film layer 211 may be selected from a silicon dioxide layer, a titanium trioxide layer, a magnesium fluoride layer, a zinc sulfide layer, an aluminum oxide layer, a titanium dioxide layer, a titanium oxide layer, and a titanium oxide layer. Any one of a chromium layer, a zirconium dioxide layer, and a lanthanum sulfate layer.

Exemplarily, each of the color developing sub-layers 21 may include two film layers 211 disposed in a stack, and a refractive index of one of the film layers 211 is higher than a refractive index of the other of the film layers 211.

Theoretically, in order to make a single color-developing sub-layer 21 show a clear color, the larger the difference between the refractive indexes of two adjacent film layers 211 is, the better. Exemplarily, each of the color rendering sub-layers 21 may include two film layers 211 disposed in a stack, and a refractive index of one of the film layers 211 is at least 0.5 higher than a refractive index of the other film layer 211. Among the two film layers 211, the film layer 211 having a high refractive index is closest to the surface of the substrate 1, or the film layer 211 having a low refractive index is closest to the surface of the substrate 1.

Exemplarily, each of the color developing sub-layers 21 may include two film layers 211 disposed in a stack, and the two film layers 211 may be a titanium trioxide layer and a silicon dioxide layer, respectively.

Exemplarily, each of the color developing sub-layers 21 may include two film layers 211 arranged in a stack, and the two film layers 211 may be a magnesium fluoride layer (refractive index is about 1.38) and a zinc sulfide layer ( The refractive index is about 2.4).

Exemplarily, each of the color developing sub-layers 21 may include three film layers 211 arranged in a stack, and the three film layers 211 may be a titanium trioxide layer, a silicon dioxide layer, and a lanthanum sulfate layer, respectively.

Exemplarily, as shown in FIGS. 3 and 4, the color rendering layer 2 may include one color rendering sub-layer 21 (as shown in FIG. 3) or two color rendering sub-layers 21 (such as As shown in FIG. 4), each of the color developing sub-layers 21 may include two film layers 211 arranged in a stack, and the two film layers 211 may be a titanium trioxide layer and a silicon dioxide layer, respectively. In the color developing layer 2 of FIG. 4, the titanium trioxide layer and the silicon dioxide layer are alternately disposed.

In actual operation, the material of the film layer, the thickness of the film layer, and the stacking order of the film layers of different materials can be obtained by changing the film system design according to the desired color displayed by the single color-developing sublayer 21. And according to the color that is expected to be finally displayed by the color developing layer 2, the hue displayed by each of the plurality of color developing sub-layers 21 is designed.

In a second implementation manner of the present application, referring to FIG. 5, a composite film layer 212 forms a color rendering sub-layer 21, and the composite film layer 212 may be formed by mixing different materials in a predetermined ratio. Each of the different materials here can also be regarded as a single material. The single material in this implementation manner also means that a material other than impurities is one.

Of course, one color rendering sub-layer 21 may also include multiple composite film layers 212, and the color rendering layer 2 may also include multiple color rendering sub-layers 21, which is not specifically limited herein.

Exemplarily, the composite film layer 212 may be formed by mixing titanium trioxide and silicon dioxide in a predetermined ratio.

In practical applications, the color depth of the color developing layer 2 is related to the thickness of the color developing layer 2. When the color rendering layer 2 includes a color rendering sub-layer 21, the thickness of the color rendering sub-layer 21 is the thickness of the color rendering layer 2, and when the color rendering layer 2 includes a plurality of color rendering sub-layers 21 arranged in a stack, The thickness of a single color rendering sub-layer 21 and the number of color rendering sub-layers 21 jointly determine the thickness of the color rendering layer 2.

In order to improve the transmittance of light when displaying deeper colors, for example, the thickness of the film layer 211 may be between 80-230 nm. Each of the film layers 211 included in the color rendering layer 2 The number can be between 6-12, for example between 8-12. Light transmittance refers to the ability of light to pass through a medium, and is the percentage of the luminous flux passing through a transparent or translucent body and its incident luminous flux.

In yet another embodiment of the present application, the light transmittance of the substrate 100 for solar power generation tiles is between 50-91.5%, and the substrate 100 for solar power generation tiles can achieve high light transmittance while displaying colors.

The material of the substrate 1 is not limited, and the substrate 1 may be a glass material or a plastic material.

Exemplarily, the substrate 1 may be ultra-white glass, such as tempered ultra-white glass. Ultra-white glass is a kind of ultra-transparent low-iron glass. It also has all the processability of high-quality float glass. It has superior physical, mechanical and optical properties. It can be processed like various other high-quality float glass. The light rate can reach above 91.5%.

An embodiment of the present application further provides a solar power generation tile. Referring to FIG. 6, the power generation tile includes: a solar cell chip 300; and a back plate 500 on opposite sides of the solar cell chip 300 and the solar power generation as described above Tile with substrate 100.

The solar power generation tile provided in the embodiment of the present application uses the above-mentioned transparent solar power generation base substrate 100 as a front plate provided on the light receiving surface of the solar power generation tile. On the one hand, it can ensure that sunlight is irradiated onto the solar cell chip 300. The solar cell chip 300 can absorb sunlight; on the other hand, the light receiving surface of the solar power generation tile can also be colored (can be any one of red, orange, yellow, green, blue, indigo, and purple), so that It can meet the needs of customers and make the building more beautiful when applied.

The solar cell chip 300 and the back plate 500 and the substrate 100 for solar power generation tiles can be packaged by a packaging adhesive film 600. The encapsulating film 600 may be a hot-melt type encapsulating film and melts at a temperature of 160 ° C.

The encapsulant film 600 may be an ethylene-octene copolymer (PoE) copolymer film or an ethylene-vinyl acetate (EVA) film. Among them, the POE film or the EVA film realizes adhesion to the solar cell chip 300, the back plate 500, and the substrate 100 for solar power generation tiles during the lamination process.

A waterproof adhesive film 700 may be further provided between the substrate 100 for solar power generation tiles and the solar cell chip 300, and the waterproof adhesive film 700 may be formed of butyl rubber.

In order to realize the series connection of the sub solar cell chips 300, a bus bar 800 may be further disposed between the back plate 500 and the solar cell chip 300.

The embodiment of the present application further provides a method for preparing a substrate 100 for a solar power generation tile as described above, including: preparing the substrate 1; and forming the substrate 1 on at least one of two opposite surfaces of the substrate 1. Color rendering layer 2.

In the embodiment of the present application, the substrate 1 may have a curved shape or a planar shape, and a curved shape is taken as an example for description below.

The embodiment of the present application provides a method for preparing a substrate 100 for a solar power generation tile. The obtained substrate 100 for a solar power generation tile can make the light receiving surface of the solar power generation tile appear colored, so as to meet customer requirements, and make the building more useful during application. With beauty.

As the solar power generation tile is usually made of various shapes such as curved tile, tube tile, S-shaped tile, etc. by imitating the traditional sintered tile, clay tile, and glazed tile. Therefore, the color substrate 1 is usually prepared by coating on the flat substrate 1, and is mainly divided into two types: online coating and offline coating according to processing processes. On-line coating refers to the process of coating is performed in the float glass manufacturing process, and the film is sprayed by magnetron sputtering. The offline coating is performed after the flat substrate 1 is shipped from the factory. Compared with on-line coating, the firmness of the film obtained by off-line coating is bound to be affected.

Magnetron sputtering coating technology is a technology that uses charged particles to bombard the target surface in a vacuum, so that the bombarded particles are deposited on the substrate.

Because of the shape requirements of solar power tiles, they need to be bent and cooled (can be annealed or tempered, and hot-formed glass substrates can be tempered by rapid blow cooling). If the solar power tiles are plate-shaped obtained by online or offline coating For the coated substrate, during the process of hot bending, the heating furnace continuously heats the coated substrate to a molten state (when the coated substrate is glass, the heating temperature in the molten state is 690-730 ° C), and then enters the die extrusion molding to obtain a curved shape. Of the substrate.

No matter what kind of coated glass is, at this substrate melting temperature, the film will melt and cause mold release. Demolding refers to the phenomenon that the film on the substrate is cracked or melted due to various external forces, temperature, etc., and the substrate is detached or peeled off. If the temperature at the time of entering the mold is lower than the melting temperature of the film, molding will be difficult and the yield will be low. Even if the cost is increased to increase the melting temperature of the film, the film will crack due to the extrusion or stretching of the curvature of the substrate when it is bent in a mold. The same cannot be applied to the aesthetic requirements of solar power tiles.

In the embodiment of the present application, a film is formed by first preparing the substrate 1 into a curved shape, and then coating the curved surface on the curved substrate 1 (that is, the color rendering layer 2 in the embodiment of the present application), thereby avoiding first coating and then When the substrate 1 is formed into a curved shape, a demolding phenomenon occurs due to the curvature or extrusion of the substrate 1.

The curved substrate 1 can be prepared by various methods such as a hot bending method and a cold bending method, which is not limited herein.

In the embodiment of the present application, the step of preparing a curved substrate 1 may include: hot bending and cooling the flat substrate 1 (either an annealing process or a tempering process) to obtain the curved substrate. 1.

Hot bending refers to the process of heating and softening the flat substrate 1 and forming it in a mold to make a curved surface. After the hot bending, the steel sheet is cooled to complete the tempering. Among them, annealing refers to the transition of the glass from a typical liquid state to a brittle state when passing through the transition temperature region (Tf-Tg), and the glass molecules can still migrate within a considerable temperature range below the Tg point, which can eliminate the heat in the glass Inhomogeneity of stress and structural state, this temperature region is the annealing region of the glass, that is, the annealing region is related to the viscosity of the glass. Tempering refers to heating the glass below the softening temperature, and obtaining it by rapid and uniform cooling at 50-60 ° C above the Tg point, which can increase the hardness. In practical applications, the substrate 1 can be heated to a molten state, extruded into a designed shape through upper and lower dies, and then annealed or tempered to obtain the substrate 1.

Exemplarily, the substrate 1 may be a tempered substrate 1. The tempered substrate 1 has high hardness.

The specific method of forming the color developing layer 2 on at least one of the two opposite surfaces of the substrate 1 is not limited, as long as the color developing layer 2 can be formed on at least one of the two opposite surfaces of the substrate 1. On one surface. For example, the color-developing layer 2 may be formed on at least one of two opposite surfaces of the substrate 1 by an electron beam evaporation coating method, and the color-developing layer 2 may also be formed by a magnetron sputtering coating method.

In the embodiment of the present application, the step of forming the color developing layer 2 on at least one of two opposite surfaces of the curved substrate 1 includes: using an electron beam bombardment method to target (i.e., Evaporation material) is heated so that the target material is evaporated and deposited on at least one of the two opposite surfaces of the curved substrate 1 to form the color developing layer 2.

When the film is deposited using the magnetron sputtering method, the deposition speed of the film on the surface of the substrate 1 is fast. Since the solar power generation tile is generally curved, as the deposition progresses, the thickness difference between the curved peaks and troughs of the film varies with the coating time. The process is getting larger and larger, and the uniformity of the film is not easy to control. Therefore, the magnetron sputtering coating is more applied to the flat coating. The electron beam evaporation coating refers to a coating method in which a target material in a crucible is bombarded with an electron beam, so that the target material melts and evaporates and is deposited on the substrate 1. This method can more accurately achieve evaporation, and can be plated with high purity and high precision. Thin film. When the electron beam evaporation coating method is used for coating, the deposition rate of the film on the surface of the substrate 1 is slow. With the progress of the evaporation, there is no obvious difference in the thickness of the film deposited on the peak and trough, and the uniformity is well controlled, which is suitable for curved surface coating. Therefore, the thickness of the film can be better adjusted by using the electron beam evaporation coating in the embodiment of the present application.

The film formed by electron beam evaporation coating can withstand a high temperature of 300 ° C, which is much higher than the heating temperature (typically 160 ° C) during the packaging and lamination of solar power tiles, which can prevent the film from cracking and peeling during the lamination process. Film and other phenomena.

Exemplarily, during the electron beam evaporation coating process of the embodiment of the present application, the temperature at which the target is deposited on the curved substrate 1 may be 60-80 ° C. That is, the film formation temperature of the target (that is, the condensation temperature of the target on the substrate 1) can be 60-80 ° C, and this temperature can make the formed film denser.

Exemplarily, in the embodiment of the present application, the process of forming the color developing layer 2 by an electron beam evaporation coating method is performed in a reaction chamber in a vacuum state, wherein the vacuum degree of the reaction chamber may be ≤10 ^-2 Pa, For example, it may be 5 × 10 ^-3 -7 × 10 ^-3 Pa.

In another embodiment of the present application, after the color developing layer 2 is formed, the preparation method may further include: heating the color developing layer 2 and the curved substrate 1 to improve the color developing layer 2 and the substrate. 1 bonding strength.

After the color developing layer 2 is formed, the temperature for heating the color developing layer 2 and the curved substrate 1 can be set reasonably according to the materials of the color developing layer 2 and the substrate 1. Exemplarily, the heating temperature may be 200-400 ° C. For example, the heating temperature may be any one of 200 ° C, 250 ° C, 300 ° C, 350 ° C, and 400 ° C. The higher the heating temperature, the better the bonding strength between the color-developing layer 2 and the substrate 1, and the color-developing layer 2 will not melt at 400 ° C, so that no mold release phenomenon will occur.

In still another embodiment of the present application, the target is heated by using an electron beam bombardment method, so that the target is evaporated and deposited on at least one of two opposite surfaces of the curved substrate 1 to form the target. Before the color developing layer 2 step, the preparation method may further include: using an ion beam to bombard the surface of the curved substrate 1 to be coated (that is, the surface of the substrate 1 on which the color developing layer 2 is to be formed) to The surface of the curved substrate 1 to be coated is cleaned and roughened. This process can remove burrs and dirt on the surface of the curved substrate 1 to be coated, and can also improve the adhesion of the film to the substrate 1 through the roughening process. Ion beam bombarding the surface to be coated can form pits on the surface of the curved substrate 1 to be coated, thereby improving the roughness of the surface to be coated.

In an embodiment of the present application, the step of forming the color developing layer 2 on at least one of two opposite surfaces of the curved substrate 1 may include: forming the curved substrate 1. One or more color developing sub-layers 21 are formed on at least one of the two opposite surfaces.

Wherein, the formation of a color rendering sub-layer 21 on at least one of two opposite surfaces of the curved substrate 1 may be implemented in two ways.

In the first implementation manner, a plurality of different materials may be simultaneously evaporated according to a predetermined ratio to obtain one of the color developing sub-layers 21. For example, different materials can be placed in different crucibles according to a predetermined ratio, and the simultaneous evaporation of different materials can be achieved by controlling the temperature of each crucible and the boiling point of the placed materials.

Exemplarily, the color developing sub-layer 21 may be formed by mixing titanium trioxide and silicon dioxide in a predetermined ratio.

In a second implementation manner, a plurality of different materials may be sequentially evaporated in accordance with a predetermined ratio to obtain one of the color developing sub-layers 21. For example, after the first material is vapor-deposited on the substrate 1, the second material is vapor-deposited on the surface of the film formed by the first material, and so on, until a plurality of materials are vapor-deposited on the substrate 1. In the evaporation process of this embodiment, the electron beam evaporation coating method is adopted, which is better than the magnetron sputtering coating method, which is good for controlling the thickness of various materials in the color rendering sublayer 21 so that the same thickness The color developing layer 2 can be formed by stacking thinner material layers. In this way, the number of layers obtained by the electron beam evaporation coating method can be more, so that the range of color depth of the color developing layer 2 can also be changed. Wider, which makes the color fuller and more beautiful.

Exemplarily, one of the color rendering sub-layers 21 may include two film layers 211, and the two film layers 211 may be a titanium trioxide layer and a silicon dioxide layer, respectively. For example, when the color tone presented by the color rendering sub-layer 21 is blue, the thickness ratio of the two film layers 211 (titanium trioxide layer and silicon dioxide layer) may be 30: 100-95: 100, which is optional. The thickness ratio of the two film layers 211 (titanium pentoxide layer and silicon dioxide layer) may be 40: 70-50: 70. When the hue presented by the color rendering sub-layer 21 is yellow, the two The thickness ratio of the film layer 211 (the titanium trioxide layer and the silicon dioxide layer) may be 0.5-0.95. Optionally, the thickness ratio of two film layers 211 (the titanium titanium oxide layer and the silicon dioxide layer) is also It can be a: b, where the range of a can be 65-70, and the range of b can be 90-100. When the hue presented by the color rendering sub-layer 21 is red, two of the film layers 211 ( The thickness ratio of the titanium trioxide layer and the silicon dioxide layer can be 80: 130-95: 130.

Exemplarily, when the hue exhibited by the color rendering sub-layer 21 is blue, the thickness ratio of the titanium trioxide layer to the silicon dioxide layer can be any value in the range of 40: 70-50: 70, for example, It can be 40:70. For example, the titanium trioxide layer can be 40nm and the silicon dioxide layer can be 70nm. For example, it can be 42:60. For example, the titanium trioxide layer can be 42nm and the silicon dioxide layer can be It is 60 nm, for example, 45:70 or 50:70, which is the same as this example. The thickness unit of the titanium trioxide layer and the silicon dioxide layer may be nanometers. When the hue exhibited by the color developing sub-layer 21 is yellow, the ratio of the thickness of the titanium trioxide layer to the silicon dioxide layer can be any value within the range of 0.5-0.95. Optionally, the titanium trioxide layer and the The thickness ratio of the silicon dioxide layer can be any value in the range of 60: 100-70: 90, for example, 65:90. For example, the titanium trioxide layer can be 65nm, and the silicon dioxide layer can be 90nm. For example, the thickness ratio of the titanium trioxide layer to the silicon dioxide layer may be 0.7. For example, the titanium trioxide layer may be 92 nm, and the silicon dioxide layer may be 131 nm; for example, it may be 70: 100, 70: 90 or 70: 100, as in this example, the unit of thickness of the titanium trioxide layer and the silicon dioxide layer may be in the nanometer order. When the hue exhibited by the color rendering sub-layer 21 is red, the thickness ratio of the titanium trioxide layer to the silicon dioxide layer can be any value in the range of 80: 130-95: 130, for example, it can be 80: 130 For example, the titanium trioxide layer can be 80 nm, the silicon dioxide layer can be 130 nm, for example, 69: 100, and for example, the titanium trioxide layer can be 220 nm, and the silicon dioxide layer can be 321 nm. It can be 90: 130 or 95: 130, which is the same as this example. The thickness of the titanium trioxide layer and the silicon dioxide layer can be in nanometers.

Exemplarily, one of the color rendering sub-layers 21 may include two film layers 211, and the two film layers 211 may be a titanium trioxide layer and a silicon dioxide layer, respectively. For example, when the hue exhibited by the color developing sub-layer 21 is blue, the thickness of the silicon dioxide layer may be 40-50 nm, and the thickness of the titanium trioxide layer may be 70 nm; When it is yellow, the thickness of the silicon dioxide layer can be 60-70nm, and the thickness of the titanium trioxide layer can be 90-100nm. When the hue exhibited by the color developing layer 21 is red, the thickness of the silicon dioxide layer can be It is 80-95 nm, and the thickness of the titanium trioxide layer can be 130 nm.

Exemplarily, one of the color rendering sub-layers 21 may include two film layers 211, and the two film layers 211 may be a titanium trioxide layer and a silicon dioxide layer, respectively. For example, when the hue exhibited by the color developing layer 21 is blue, the thickness of the silicon dioxide layer may be 60nm-70nm, and the thickness of the titanium trioxide layer may be 15nm-25nm. The thickness of the silicon layer can be 45nm-55nm, the thickness of the titanium trioxide layer can be 40nm-50nm; for example, the thickness of the silicon dioxide layer can be 50nm-60nm, and the thickness of the titanium titanium oxide layer can be 45nm-55nm ; For example, the thickness of the silicon dioxide layer can be 55nm-65nm, the thickness of the titanium trioxide layer can be 35nm-45nm; for example, the thickness of the silicon dioxide layer can be 75nm-85nm, The thickness can be 40nm-50nm; for example, the thickness of the silicon dioxide layer can be 100nm-110nm, and the thickness of the titanium trioxide layer can be 45nm-55nm; for example, the thickness of the silicon dioxide layer can be 410nm-430nm, The thickness of the titanium trioxide layer can be 240 nm-260 nm. For example, when the hue exhibited by the color developing layer 21 is yellow, for example, the thickness of the silicon dioxide layer may be 125-135nm, and the thickness of the titanium trioxide layer may be 85-95nm. The thickness of the layer can be 120-130 nm, the thickness of the titanium trioxide layer can be 60-70 nm; for example, the thickness of the silicon dioxide layer can be 60-70 nm, and the thickness of the titanium trioxide layer can be 55-65 nm; For example, the thickness of the silicon dioxide layer may be 310-330 nm, and the thickness of the titanium trioxide layer may be 210-230 nm. For example, when the hue exhibited by the color rendering sub-layer 21 is red, the thickness of the silicon dioxide layer may be 145-155nm, and the thickness of the titanium trioxide layer may be 100-110nm. The thickness of the layer can be 135-145nm, the thickness of the titanium trioxide layer can be 70-80nm; for example, the thickness of the silicon dioxide layer can be 70-80nm, and the thickness of the titanium trioxide layer can be 65-75nm; For example, the thickness of the silicon dioxide layer may be 355-375 nm, and the thickness of the titanium trioxide layer may be 240-260 nm.

The light transmittance of the solar power generation tile substrate 100 prepared by the method provided in the embodiment of the present application may be between 50-91.5%, and the light transmittance of the blue-colored solar power generation tile substrate 100 is not less than 85. %; And the color consistency of the substrate 100 is good, and there is no local demolding phenomenon.

The embodiment of the present application further provides a method for preparing a solar power generating tile, which may include: preparing the substrate 100 for a solar power generating tile as described above or the substrate 100 for a solar power generating tile obtained by the manufacturing method described above. In the above, the solar cell chip 300 and the back plate 500 are laid in order, and the packaging process is performed to obtain the solar power generation tile.

The method for preparing a solar power generating tile provided in the embodiment of the present application can obtain a solar power generating tile with a colored appearance, thereby meeting customer needs and making the building more aesthetically pleasing when applied.

In the solar power generation tile, the solar cell chip 300 and the back plate 500 may be laid on any side of the substrate 100 for the solar power generation tile.

Exemplarily, the substrate 100 for a solar power generation tile may be provided with a color developing layer 2 on either side thereof, and the solar cell chip 300 and the back plate 500 may be sequentially laid on the side of the substrate 100 having the color developing layer 2.

This disclosure is an example of the principles of the embodiments of the present application, and does not limit the present application in any form or substance, or limit the present application to specific implementations. It is obvious to those skilled in the art that the elements, methods, and systems of the technical solutions of the embodiments of the present application can be changed, changed, modified, and evolved without departing from the embodiments and technical solutions of the present application as described above. The principle, spirit and scope are as defined in the claims. These altered, changed, modified, and evolved implementations are all included in the equivalent embodiments of the present application, and these equivalent embodiments are included in the scope defined by the claims of the present application. Although the embodiments of the present application may be embodied in many different forms, some embodiments of the present application are described in detail herein. In addition, the examples of this application include any possible combination of some or all of the various embodiments described herein, and are also included within the scope of this application as defined by the claims. All patents, patent applications, and other cited materials mentioned in this application or anywhere in any cited patent, cited patent application, or other cited material are hereby incorporated by reference in their entirety.

The above disclosure is intended to be illustrative, not exhaustive. For those skilled in the art, this description will suggest many variations and alternatives. All of these alternatives and variations are intended to be included within the scope of the claims, where the term "including" means "including, but not limited to."

This completes the description of the alternative embodiments of the present application. Those skilled in the art will recognize other equivalent transformations to the embodiments described herein, which equivalent transformations are also encompassed by the claims attached hereto.

Claims

A substrate (100) for a solar power generation tile, the substrate (100) comprising:

Substrate (1); and

A color-developing layer (2), the color-developing layer (2) covers at least one of two opposite surfaces of the substrate (1), and the color-developing layer (2) is transparent.
The substrate (100) for a solar power generation tile according to claim 1, wherein the color rendering layer (2) comprises: a color rendering sublayer (21), or a plurality of color rendering sublayers (21) arranged in a stack. .
The substrate (100) for a solar power generation tile according to claim 2, wherein each of the color rendering sub-layers (21) exhibits the same hue.
The substrate (100) for a solar power generation tile according to claim 2, wherein each of the color rendering sub-layers (21) includes a plurality of film layers (211), and the plurality of film layers (211) are stacked, Each of the film layers (211) is composed of a single material, and at least two of the plurality of film layers (211) have different materials.
The substrate (100) for a solar power generation tile according to claim 4, wherein the plurality of film layers (211) in each of the color rendering sublayers (21) have different refractive indices and are sequentially stacked in the same order. Settings.
The substrate (100) for a solar power generation tile according to claim 4, wherein each of the color rendering sublayers (21) includes two of the film layers (211), and one of the film layers (211) Has a refractive index that is at least 0.5 higher than that of the other said film layer (211).
The substrate (100) for a solar power generation tile according to claim 4, wherein the film layer (211) is selected from the group consisting of a silicon dioxide layer, a titanium trioxide layer, a magnesium fluoride layer, a zinc sulfide layer, and a dioxide An aluminum layer, a titanium dioxide layer, a titanium dioxide layer, a chromium trioxide layer, a zirconium dioxide layer, or a lanthanum sulfate layer.
The substrate (100) for a solar power generation tile according to claim 4, wherein each of the color rendering sublayers (21) includes two film layers (211), and the two film layers (211) are five Trititanium oxide and silicon dioxide layers; or

Each of the color rendering sub-layers (21) includes two film layers (211), and the two film layers (211) are a magnesium fluoride layer and a zinc sulfide layer, respectively; or

Each of the color rendering sub-layers (21) includes three film layers (211), and the three film layers (211) are a titanium trioxide layer, a silicon dioxide layer, and a lanthanum sulfate layer, respectively.
The substrate (100) for a solar power generation tile according to any one of claims 4 to 8, wherein the thickness of the film layer (211) is between 80-230 nm, and the color developing layer (2) The number of the film layers (211) included in the film layer is between 6-12.
The substrate (100) for a solar power generation tile according to claim 1, wherein the light transmittance of the substrate (100) for a solar power generation tile is between 50 and 91.5%.
A solar power generation tile includes:

Solar cell chip (300); and

A back plate (500) on opposite sides of the solar cell chip (300) and a substrate (100) for a solar power generation tile according to any one of claims 1-10.
A method for preparing a substrate (100) for a solar power generation tile according to any one of claims 1 to 10, the preparation method comprising:

Preparing the substrate (1); and

The color developing layer (2) is formed on at least one of two opposite surfaces of the substrate (1).
The method for preparing a substrate (100) for a solar power generation tile according to claim 12, wherein the step of preparing the substrate (1) comprises: thermally bending and cooling a flat substrate to obtain a curved substrate (1).
The method for preparing a substrate (100) for a solar power generation tile according to claim 12, wherein the color developing layer (2) is formed on at least one of two opposite surfaces of the substrate (1). The step comprises: heating the target material by an electron beam bombardment method, so that the target material is evaporated and deposited on at least one of two opposite surfaces of the substrate (1) to form the color developing layer (2 ).
The method for preparing a substrate (100) for a solar power generation tile according to claim 14, wherein the temperature at which the target is deposited on the substrate (1) is 60-80 ° C.
The method for preparing a substrate (100) for a solar power generation tile according to claim 14, wherein the vacuum degree of the reaction chamber during the formation of the color developing layer (2) is ≤10-2Pa.
The method for preparing a substrate (100) for a solar power generation tile according to claim 14, wherein after the color developing layer (2) is formed, the method further comprises: applying the color developing layer (2) and the The substrate (1) is heated.
The method for preparing a substrate (100) for a solar power generation tile according to claim 17, wherein the temperature for heating the color developing layer (2) and the substrate (1) is 200-400 ° C.
The method for preparing a substrate (100) for a solar power generation tile according to claim 14, wherein the target is heated by using an electron beam bombardment method, so that the target is evaporated and deposited on the substrate (1). On at least one of the two opposite surfaces, before the step of forming the color developing layer (2), the preparation method further includes: bombarding a surface of the substrate (1) to be coated with an ion beam to blast the substrate. (1) The surface to be coated is cleaned and roughened.
The method for producing a substrate (100) for a solar power generation tile according to any one of claims 12-19, wherein said forming said at least one of two opposite surfaces of said substrate (1) The color developing layer (2) step includes: forming a color developing sublayer (21) or a plurality of color developing sublayers (21) on at least one of two opposite surfaces of the substrate (1). ;

Wherein, the step of forming a color rendering sub-layer (21) on at least one of two opposite surfaces of the substrate (1) includes: simultaneously depositing a plurality of different materials according to a predetermined ratio to obtain One of the color developing sub-layers (21); or, a plurality of different materials are sequentially evaporated according to a predetermined ratio to obtain one of the color developing sub-layers (21).
A method for preparing a solar power generation tile, the preparation method includes:

The substrate (100) for a solar power generation tile according to any one of claims 1 to 10 or the substrate (100) for a solar power generation tile prepared by the preparation method according to any one of claims 12 to 20. , Sequentially laying a solar cell chip (300) and a back plate (500), and performing a packaging process to obtain the solar power generation tile.