CN108962730A - A kind of preparation method of infrared optical window - Google Patents
A kind of preparation method of infrared optical window Download PDFInfo
- Publication number
- CN108962730A CN108962730A CN201810759014.XA CN201810759014A CN108962730A CN 108962730 A CN108962730 A CN 108962730A CN 201810759014 A CN201810759014 A CN 201810759014A CN 108962730 A CN108962730 A CN 108962730A
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- optical
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- infrared
- coated
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- 230000003287 optical effect Effects 0.000 title claims abstract description 43
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- 239000010408 film Substances 0.000 claims abstract description 60
- 239000012788 optical film Substances 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000002184 metal Substances 0.000 claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 18
- 239000011248 coating agent Substances 0.000 claims abstract description 17
- 238000000576 coating method Methods 0.000 claims abstract description 17
- 230000000873 masking effect Effects 0.000 claims abstract description 5
- 238000004140 cleaning Methods 0.000 claims abstract description 3
- 239000000463 material Substances 0.000 claims description 12
- 230000001681 protective effect Effects 0.000 claims description 8
- 230000007547 defect Effects 0.000 claims description 7
- 229910052737 gold Inorganic materials 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910009520 YbF3 Inorganic materials 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 238000003331 infrared imaging Methods 0.000 abstract description 4
- 239000010931 gold Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000012528 membrane Substances 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- -1 raindrop Substances 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Electromagnetism (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The present invention provides a kind of preparation methods of infrared optical window, belong to infrared imagery technique field.The preparation method of the infrared optical window includes: cleaning substrate and dries；Optical film is plated in the bottom of substrate by optical coating system；In bottom, the surface of optical film is coated with layer protecting film；Coating film area is made in the substrate using hard masking method, plates optical film；The annular region for being coated with metal film is made using optical graving, is coated with metal film.While the infrared optical window that this method is prepared transmitance needed for meeting infrared imaging, the antiwear property and tolerance in the presence of a harsh environment of the window are improved.
Description
Technical field
The present invention relates to infrared imagery technique field, in particular to a kind of preparation method of infrared optical window.
Background technique
Infrared optical window is indispensable component in non-refrigerated infrared focal plane probe system, is mainly used in heat
Imaging field, it is required that certain stray lights are filtered while being infrared transmittivity, it is clear to reach imaging effect.
It is higher and higher in requirement of certain application fields for infrared imaging；And because the most of the time is in field work
Make, therefore the particles such as raindrop, sand grains in environment can generate bigger impact to window surface film layer, surface needs to be coated with
Protective film is to improve its anti-weathering, the ability of sand cutting.
Summary of the invention
The purpose of the present invention is to provide a kind of preparation methods of infrared optical window, are improving the same of infrared imaging quality
When, solve the problems, such as the antiwear property deficiency of existing window and poor resistance in the presence of a harsh environment.
In order to solve the above technical problems, the present invention provides a kind of preparation method of infrared optical window, include the following steps:
Step 1, cleaning substrate simultaneously dry；
Step 2 plates optical film in the bottom of substrate by optical coating system；
Step 3 is coated with layer protecting film on the surface of bottom optical film；
Step 4 makes coating film area in the substrate using hard masking method, plates optical film；
Step 5 makes the annular region for being coated with metal film using optical graving, is coated with metal film.
Optionally, protective film is coated with using PECVD method in the step 3.
Optionally, the substrate is twin polishing substrate, and material includes germanium, silicon, zinc selenide or quartz glass.
Optionally, the material of the optical film is one or more of Ge, ZnS, CaF, YbF3, SiO.
Optionally, the metal film is one or more of Ti, Ni, Pt, Cr, Au.
Optionally, the protective film is DLC film, with a thickness of 10 ~ 500nm.
Optionally, the defect spot diameter of the optical film of the substrate, the optical film of substrate bottom and protective film is small
In 10 μm.
Optionally, the method for controlling defect point includes: to improve the purity of Coating Materials, control rate of film build and pass through membrane system
Design reduces optical film thickness.
Optionally, totally 1 ~ 100 layer of the optical film of the substrate bottom, with a thickness of 0.1 ~ 50 μm；The light of the substrate
Totally 1 ~ 100 layer of film is learned, with a thickness of 0.1 ~ 50 μm.
The present invention also provides a kind of infrared optical window that the preparation method according to above-mentioned infrared optical window is prepared,
The infrared optical window includes substrate, and the top and bottom of the substrate plate and are formed with optical film, the surrounding of top optical film
It is coated with metal film, is coated with layer protecting film on the bottom optical film.
A kind of preparation method of infrared optical window is provided in the present invention, cleans substrate and is dried；Pass through optics plating
Film machine plates optical film in the bottom of substrate；In bottom, the surface of optical film is coated with layer protecting film；Existed using hard masking method
The substrate makes coating film area, plates optical film；The annular region for being coated with metal film is made using optical graving, is coated with gold
Belong to film.The infrared optical window that this method is prepared, coating defects diameter have very high resolution ratio and imaging less than 10 μm
Quality；On the optical film of bottom plus coating diamond-like film, the antiwear property and in the presence of a harsh environment of the window is improved
Tolerance.
Detailed description of the invention
Fig. 1 is the flow diagram for the infrared optical window preparation method that the embodiment of the present invention one provides；
Fig. 2 is the infrared optical window structural schematic diagram that the embodiment of the present invention one provides.
Specific embodiment
Below in conjunction with the drawings and specific embodiments to a kind of preparation method of infrared optical window proposed by the present invention make into
One step is described in detail.According to following explanation and claims, advantages and features of the invention will be become apparent from.It should be noted that
Attached drawing is all made of very simplified form and using non-accurate ratio, only to convenient, lucidly aid illustration is of the invention
The purpose of embodiment.
Embodiment one
The present invention provides a kind of preparation method of infrared optical window, flow diagram is as shown in Figure 1, the infrared optics window
The preparation method of mouth includes the following steps:
Step S11, it cleans substrate and dries；
Step S12, optical film is plated in the bottom of substrate by optical coating system；
Step S13, layer protecting film is coated on the surface of bottom optical film；
Step S14, coating film area is made in the substrate using hard masking method, plates optical film；
Step S15, the annular region for being coated with metal film is made using optical graving, is coated with metal film.
Specifically, handling first 1 surface of substrate: the substrate 1 is twin polishing substrate, uses ultrasonic cleaning
Machine cleans the substrate 1, is dried later with dryer, it is ensured that surface is without dirty and dust；Then according to designed
Membrane system is coated with using optical coating system, plates optical film 2b in the lower surface of the substrate 1, the material of the optical film 2b is
One or more of Ge, ZnS, CaF, YbF3, SiO are coated with altogether 1 ~ 100 layer, 0.1 ~ 50 μm of final thickness；Then it uses
PECVD method is coated with layer protecting film 4, specially DLC film on the surface of the optical film 2b, with a thickness of 10 ~
500nm；It carries out optical film to the top of the substrate 1 again to be coated with, since the surrounding of the optical film 2a at 1 top of substrate needs
It is coated with metal film 3, therefore coating film area need to be made using hard exposure mask, then plates optical film 2a, the material of the optical film 2a is
One or more of Ge, ZnS, CaF, YbF3, SiO are coated with altogether 1 ~ 100 layer, 0.1 ~ 50 μm of final thickness；Finally use light
Carving method produces the annular region for being coated with metal film 3, is then coated with metal film 3, wherein the material of the metal film 3 be Ti,
One or more of Ni, Pt, Cr, Au.The optical film 2b of optical film 2a, substrate bottom at the top of the substrate and protection
The defect spot diameter of film 4 is respectively less than 10 μm, well below current 100 μm of test stone, the optical window is made to can be used for high score
In resolution and the demanding non-refrigerated infrared focal plane probe of image quality.Specifically, the method for control defect point is mainly wrapped
It includes: improving the purity of Coating Materials, controls rate of film build and optical film thickness is reduced by Film Design.
The infrared optical window that the above method is prepared is used for non-refrigerated infrared focal plane probe, specific structure such as Fig. 2
It is shown.The infrared optical window includes substrate 1, and the material of the substrate 1 is germanium, silicon, zinc selenide or quartz glass.The base
The top of piece 1 is coated with optical film 2a, bottom be coated with optical film 2b, top optical film 2a and bottom optical film 2b material be Ge,
One or more of ZnS, CaF, YbF3, SiO.The surrounding of top optical film 2a is coated with metal film 3, the metal film 3 be Ti,
One or more of Ni, Pt, Cr, Au.Layer protecting film 4 is coated on the bottom optical film 2b, the protective film 4 is eka-gold
Hard rock film, with a thickness of 10 ~ 500nm.The form and dimension of the DLC film can according to detector chip size and shape
It adjusts.While infrared optical window transmitance needed for meeting infrared imaging that the present embodiment one provides, in bottom optical film
Upper plus coating diamond-like film improves the antiwear property and tolerance in the presence of a harsh environment of the window.
Foregoing description is only the description to present pre-ferred embodiments, not to any restriction of the scope of the invention, this hair
Any change, the modification that the those of ordinary skill in bright field does according to the disclosure above content, belong to the protection of claims
Range.
Claims (10)
1. a kind of preparation method of infrared optical window, which comprises the steps of:
Step 1, cleaning substrate simultaneously dry；
Step 2 plates optical film in the bottom of substrate by optical coating system；
Step 3 is coated with layer protecting film on the surface of bottom optical film；
Step 4 makes coating film area in the substrate using hard masking method, plates optical film；
Step 5 makes the annular region for being coated with metal film using optical graving, is coated with metal film.
2. the preparation method of infrared optical window as described in claim 1, which is characterized in that use PECVD in the step 3
Method is coated with protective film.
3. the preparation method of infrared optical window as described in claim 1, which is characterized in that the substrate is twin polishing base
Piece, material include germanium, silicon, zinc selenide or quartz glass.
4. infrared optical window as described in claim 1, which is characterized in that the material of the optical film be Ge, ZnS, CaF,
One or more of YbF3, SiO.
5. infrared optical window as described in claim 1, which is characterized in that the metal film is in Ti, Ni, Pt, Cr, Au
It is one or more of.
6. infrared optical window as described in claim 1, which is characterized in that the protective film is DLC film, thickness
For 10 ~ 500nm.
7. the preparation method of infrared optical window as described in claim 1, which is characterized in that the optics of the substrate
The defect spot diameter of film, the optical film of substrate bottom and protective film is respectively less than 10 μm.
8. the preparation method of infrared optical window as claimed in claim 7, which is characterized in that control the method packet of defect point
It includes: improving the purity of Coating Materials, controls rate of film build and optical film thickness is reduced by Film Design.
9. the preparation method of infrared optical window as claimed in claim 7, which is characterized in that the optical film of the substrate bottom
Totally 1 ~ 100 layer, with a thickness of 0.1 ~ 50 μm；Totally 1 ~ 100 layer of the optical film of the substrate, with a thickness of 0.1 ~ 50 μm.
10. a kind of infrared optics window that the preparation method of -9 any infrared optical windows according to claim 1 is prepared
Mouthful, which is characterized in that the infrared optical window includes substrate, and the top and bottom of the substrate plate and are formed with optical film, top
The surrounding of portion's optical film is coated with metal film, is coated with layer protecting film on the bottom optical film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810759014.XA CN108962730A (en) | 2018-07-11 | 2018-07-11 | A kind of preparation method of infrared optical window |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810759014.XA CN108962730A (en) | 2018-07-11 | 2018-07-11 | A kind of preparation method of infrared optical window |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108962730A true CN108962730A (en) | 2018-12-07 |
Family
ID=64483925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810759014.XA Pending CN108962730A (en) | 2018-07-11 | 2018-07-11 | A kind of preparation method of infrared optical window |
Country Status (1)
| Country | Link |
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| CN (1) | CN108962730A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114879283A (en) * | 2022-05-20 | 2022-08-09 | 无锡泓瑞航天科技有限公司 | Infrared metalized all-through type germanium window piece and preparation method thereof |
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Application publication date: 20181207 |