CN108983329A - Prepare the process of infrared optical window - Google Patents
Prepare the process of infrared optical window Download PDFInfo
- Publication number
- CN108983329A CN108983329A CN201810759011.6A CN201810759011A CN108983329A CN 108983329 A CN108983329 A CN 108983329A CN 201810759011 A CN201810759011 A CN 201810759011A CN 108983329 A CN108983329 A CN 108983329A
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- Prior art keywords
- film
- substrate
- optical
- optical window
- preparing
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
Abstract
The present invention provides a kind of processes for preparing infrared optical window, belong to infrared imagery technique field.The process for preparing infrared optical window includes: cleaning substrate and dries；Optical film is plated in the bottom of substrate by optical coating system；Coating film area is made in the substrate using hard masking method, plates optical film；Defect point control is carried out to optical film；The annular region for being coated with metal film is made using optical graving, is coated with metal film.The infrared optical window that this method is prepared, coating defects diameter have very high resolution ratio and image quality less than 10 μm.
Description
Technical field
The present invention relates to infrared imagery technique field, in particular to a kind of process for preparing infrared optical window.
Background technique
Infrared optical window is indispensable component in non-refrigerated infrared focal plane probe system, is mainly used in heat
Imaging field, it is required that certain stray lights are filtered while being infrared transmittivity, it is clear to reach imaging effect.It is answered certain
It is higher and higher for the requirement of infrared imaging at present with field, it is desirable to provide a kind of new preparation method, the infrared light prepared
Learning window has high-resolution, is much higher than industry test stone.
Summary of the invention
The purpose of the present invention is to provide a kind of processes for preparing infrared optical window, solve existing optical window
Image quality is unable to the problem of meet demand.
In order to solve the above technical problems, the present invention provides a kind of process for preparing infrared optical window, including as follows
Step:
Step 1, cleaning substrate simultaneously dry；
Step 2 plates optical film in the bottom of substrate by optical coating system；
Step 3 makes coating film area in the substrate using hard masking method, plates optical film；
Step 4 carries out defect point control to the optical film in step 2 and step 3；
Step 5 makes the annular region for being coated with metal film using optical graving, is coated with metal film.
Optionally, the method for carrying out defect point control to optical film in the step 4 includes: the pure of raising Coating Materials
Degree controls rate of film build and reduces optical film thickness by Film Design.
Optionally, the substrate is twin polishing substrate.
Optionally, the material of the substrate includes germanium, silicon, zinc selenide or quartz glass.
Optionally, the material of the optical film is one or more of Ge, ZnS, CaF, YbF3, SiO.
Optionally, the metal film is one or more of Ti, Ni, Pt, Cr, Au.
Optionally, the defect spot diameter of the optical film of the optical film and substrate bottom of the substrate is respectively less than 10 μm.
Optionally, totally 1 ~ 100 layer of the optical film of the substrate bottom, with a thickness of 0.1 ~ 50 μm.
Optionally, totally 1 ~ 100 layer of the optical film of the substrate, with a thickness of 0.1 ~ 50 μm.
A kind of process for preparing infrared optical window is provided in the present invention, cleans substrate first and is dried；It is logical
It crosses optical coating system and plates optical film in the bottom of substrate；Coating film area is made in the substrate using hard masking method,
Plate optical film；Defect point control is carried out to optical film；The annular region for being coated with metal film is made using optical graving, is coated with metal
Film.The infrared optical window that this method is prepared, coating defects diameter have very high resolution ratio and at image quality less than 10 μm
Amount.
Detailed description of the invention
Fig. 1 is the flow diagram for the infrared optical window preparation method that the embodiment of the present invention one provides.
Specific embodiment
Below in conjunction with the drawings and specific embodiments to a kind of process for preparing infrared optical window proposed by the present invention
It is described in further detail.According to following explanation and claims, advantages and features of the invention will be become apparent from.It should be noted
It is that attached drawing is all made of very simplified form and using non-accurate ratio, only to facilitate, lucidly aid in illustrating this hair
The purpose of bright embodiment.
Embodiment one
The present invention provides a kind of process for preparing infrared optical window, flow diagram as shown in Figure 1, it is described prepare it is red
The process of outer optical window includes the following steps:
Step S11, it cleans substrate and dries；
Step S12, optical film is plated in the bottom of substrate by optical coating system；
Step S13, coating film area is made in the substrate using hard masking method, plates optical film；
Step S14, defect point control is carried out to the optical film in step S12 and step S13；
Step S15, the annular region for being coated with metal film is made using optical graving, is coated with metal film.
Specifically, handling first 1 surface of substrate: the substrate 1 is twin polishing substrate, uses ultrasonic cleaning
Machine cleans the substrate 1, is dried later with dryer, it is ensured that surface is without dirty and dust；Then according to designed
Membrane system is coated with using optical coating system, plates optical film 2b in the lower surface of the substrate 1, the material of the optical film 2b is
One or more of Ge, ZnS, CaF, YbF3, SiO are coated with altogether 1 ~ 100 layer, 0.1 ~ 50 μm of final thickness；Again to the base
The top of piece 1 carries out optical film and is coated with, and since the surrounding of the optical film 2a at 1 top of substrate needs to be coated with metal film 3, therefore needs
Coating film area is made using hard exposure mask, then plates optical film 2a, the material of the optical film 2a is Ge, ZnS, CaF, YbF3,
One or more of SiO is coated with altogether 1 ~ 100 layer, 0.1 ~ 50 μm of final thickness；It is finally produced and is coated with using photolithography method
Then the annular region of metal film 3 is coated with metal film 3, wherein the material of the metal film 3 is one in Ti, Ni, Pt, Cr, Au
Kind is several.The defect spot diameter of the optical film 2b of optical film 2a, substrate bottom at the top of the substrate are respectively less than 10 μm,
Well below current 100 μm of test stone, the optical window is made to can be used for high-resolution and the demanding non-system of image quality
In cold infrared focal plane detector.Wherein, the method for carrying out defect point control to optical film preferably uses: improving Coating Materials
Purity controls rate of film build and reduces optical film thickness by Film Design.
The infrared optical window that the above method is prepared is used for non-refrigerated infrared focal plane probe, the infrared optics
Infrared transmittivity > 90% of the window within the scope of 8 ~ 20 mu m wavebands；Infrared transmittivity < 1% within the scope of 0 ~ 7 mu m waveband.Institute
State the optical film 2a at the top of substrate, the defect spot diameter of optical film 2b of substrate bottom is respectively less than 10 μm, well below mesh
Preceding 100 μm of test stone makes the optical window can be used for high-resolution and the demanding uncooled ir coke of image quality flat
In surface detector.
Foregoing description is only the description to present pre-ferred embodiments, not to any restriction of the scope of the invention, this hair
Any change, the modification that the those of ordinary skill in bright field does according to the disclosure above content, belong to the protection of claims
Range.
Claims (9)
1. a kind of process for preparing infrared optical window, which comprises the steps of:
Step 1, cleaning substrate simultaneously dry；
Step 2 plates optical film in the bottom of substrate by optical coating system；
Step 3 makes coating film area in the substrate using hard masking method, plates optical film；
Step 4 carries out defect point control to the optical film in step 2 and step 3；
Step 5 makes the annular region for being coated with metal film using optical graving, is coated with metal film.
2. preparing the process of infrared optical window as described in claim 1, which is characterized in that light in the step 4
Learning the method that film carries out defect point control includes: to improve the purity of Coating Materials, control rate of film build and subtracted by Film Design
Few optical film thickness.
3. preparing the process of infrared optical window as described in claim 1, which is characterized in that the substrate is two-sided throwing
Light substrate.
4. preparing the process of infrared optical window as claimed in claim 3, which is characterized in that the material packet of the substrate
Include germanium, silicon, zinc selenide or quartz glass.
5. infrared optical window as described in claim 1, which is characterized in that the material of the optical film be Ge, ZnS, CaF,
One or more of YbF3, SiO.
6. infrared optical window as described in claim 1, which is characterized in that the metal film is in Ti, Ni, Pt, Cr, Au
It is one or more of.
7. preparing the process of infrared optical window as described in claim 1, which is characterized in that the light of the substrate
The defect spot diameter for learning the optical film of film and substrate bottom is respectively less than 10 μm.
8. preparing the process of infrared optical window as claimed in claim 7, which is characterized in that the light of the substrate bottom
Totally 1 ~ 100 layer of film is learned, with a thickness of 0.1 ~ 50 μm.
9. preparing the process of infrared optical window as claimed in claim 7, which is characterized in that the light of the substrate
Totally 1 ~ 100 layer of film is learned, with a thickness of 0.1 ~ 50 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810759011.6A CN108983329A (en) | 2018-07-11 | 2018-07-11 | Prepare the process of infrared optical window |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810759011.6A CN108983329A (en) | 2018-07-11 | 2018-07-11 | Prepare the process of infrared optical window |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108983329A true CN108983329A (en) | 2018-12-11 |
Family
ID=64536887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810759011.6A Pending CN108983329A (en) | 2018-07-11 | 2018-07-11 | Prepare the process of infrared optical window |
Country Status (1)
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| CN (1) | CN108983329A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115595546A (en) * | 2022-10-25 | 2023-01-13 | 中物院成都科学技术发展中心（Cn） | Film coating device and method for sapphire sheet film coating |
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| CN101231352A (en) * | 2007-06-11 | 2008-07-30 | 北京有色金属研究总院 | HfON/BP antireflecting protective film for infrared optical window and manufacture method thereof |
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| CN107881467A (en) * | 2017-11-14 | 2018-04-06 | 北京富兴凯永兴光电技术有限公司 | A kind of low-refraction infrared optics Coating Materials and preparation method |
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|---|---|---|---|---|
| CN115595546A (en) * | 2022-10-25 | 2023-01-13 | 中物院成都科学技术发展中心（Cn） | Film coating device and method for sapphire sheet film coating |
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Application publication date: 20181211 |
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