CN108897198A - The replacing light source system and exposure machine of exposure machine - Google Patents
The replacing light source system and exposure machine of exposure machine Download PDFInfo
- Publication number
- CN108897198A CN108897198A CN201811012926.7A CN201811012926A CN108897198A CN 108897198 A CN108897198 A CN 108897198A CN 201811012926 A CN201811012926 A CN 201811012926A CN 108897198 A CN108897198 A CN 108897198A
- Authority
- CN
- China
- Prior art keywords
- light source
- chamber
- guide rail
- test
- replacing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Fastening Of Light Sources Or Lamp Holders (AREA)
Abstract
This application discloses the replacing light source systems and exposure machine of a kind of exposure machine.The replacing light source system, including chamber, chamber include the work chamber being disposed adjacent, test chamber and replacement chamber, are provided with first light source in work chamber, replace in chamber and be provided with second light source；And guide rail, guide rail are arranged in chamber；Wherein, first light source can be moved in replacement chamber along guide rail, and second light source can be moved in test chamber along guide rail, be moved in work chamber after second light source test passes through further along guide rail.The embodiment of the present application without shutting down and cooling down when replacing Exposing Lamp, therefore improves production efficiency by the way that guide rail is arranged in chamber.
Description
Technical field
This application involves field of display technology, and in particular to a kind of the replacing light source system and exposure machine of exposure machine.
Background technique
In existing exposure technology, exposure machine is used for the Exposing Lamp of exposure after a period of use, with its illumination
Decline, it is necessary to replace Exposing Lamp, and the use of Exposing Lamp also need to carry out illumination confirmation could carry out using, this for
The restriction of continuous production and production capacity all produces very big shadow.
When general Exposing Lamp closes on its service life, it just will affect the characteristic of product, at this moment need to carry out new exposure in advance
The replacement of light lamp, but replace Exposing Lamp and need to shut down and cool down, and it is also relatively cumbersome to replace formality, if there is behaviour in replacement process
Make the improper quality that will have a direct impact on exposure, makes to occur exposing non-uniform phenomenon on glass substrate, result in glass base in this way
The defect that all kinds of both macro and micros are generated on plate influences the yields of whole glass substrate.In addition, traditional exposure sources expose
Lamp substitute mode, which can also be related to Exposing Lamp, can just begin to use since lighting to illumination stabilization, it is therefore desirable to wait new lamp steady
It could be used after fixed, whole process wastes a large amount of time, reduces production efficiency.
Summary of the invention
The embodiment of the present application provides the replacing light source system and exposure machine of a kind of exposure machine, and production efficiency can be improved.
The embodiment of the present application provides a kind of replacing light source system of exposure machine, including：
Chamber, the chamber include the work chamber being disposed adjacent, test chamber and replacement chamber, the work chamber
It is inside provided with first light source, is provided with second light source in the replacement chamber；And
Guide rail, the guide rail are arranged in the chamber；Wherein,
The first light source can be moved in the replacement chamber along the guide rail, and the second light source can be along described
Guide rail is moved in the test chamber, is moved to the work further along the guide rail after second light source test passes through
In chamber.
In the replacing light source system of exposure machine described herein, the work chamber sets side by side with the test chamber
It sets, and replacement chamber setting is in the work chamber and test chamber.
In the replacing light source system of exposure machine described herein, the guide rail is ring-shaped guide rail.
In the replacing light source system of exposure machine described herein, first movement plate, are additionally provided in the chamber
Two movable plates and third movable plate；Wherein, the first movement plate is arranged between the work chamber and the replacement chamber,
Second movable plate is arranged between the test chamber and the replacement chamber, and the third movable plate is arranged in the work
Make between chamber and the test chamber.
In the replacing light source system of exposure machine described herein, the first movement plate include first movement portion and
First fixed part, second movable plate include the second moving portion and the second fixed part, and the third movable plate includes that third is moved
Dynamic portion and third fixed part；Wherein, the first via hole is provided on first fixed part, second fixed part is provided with second
Via hole, the third fixed part are provided with third via hole, and the guide rail is along first via hole, the second via hole and third mistake
Hole setting.
In the replacing light source system of exposure machine described herein, the first light source includes the first sliding part and sets
Set the first illumination region in first sliding part side, the second light source includes the second sliding part and setting described the
Second illumination region of two sliding part sides；
Wherein, first sliding part and the second sliding part are arranged on the guide rail, so that the first light source can
It is moved in the replacement chamber along the guide rail, the second light source can be moved to the test chamber along the guide rail
It is interior, it is moved in the work chamber after second light source test passes through further along the guide rail.
In the replacing light source system of exposure machine described herein, it is additionally provided with reflector in the work chamber, with
And the receiver outside the work chamber is set；Wherein, the light that the reflector is used to issue the first light source is anti-
It is incident upon on the receiver.
In the replacing light source system of exposure machine described herein, which is characterized in that also set up in the test chamber
There is a test cell；
The test cell is moved to the indoor second light source of the test chamber for testing, so that in the test chamber
The parameter of second light source reach parameter preset.
It is the shape of the first light source and second light source, big in the replacing light source system of exposure machine described herein
It is small consistent
Correspondingly, the embodiment of the present application also provides a kind of exposure machine, more including light source described in the application any embodiment
Change system.
Replacing light source system provided by the embodiments of the present application, including chamber, chamber include the work chamber being disposed adjacent, survey
Chamber and replacement chamber are tried, first light source is provided in work chamber, replaces in chamber and be provided with second light source；And it leads
Rail, guide rail are arranged in chamber；Wherein, first light source can be moved in replacement chamber along guide rail, and second light source can be along leading
Rail is moved in test chamber, is moved in work chamber after second light source test passes through further along guide rail.The application is implemented
Example without shutting down and cooling down when replacing Exposing Lamp, therefore improves production efficiency by the way that guide rail is arranged in chamber.
Detailed description of the invention
In order to more clearly explain the technical solutions in the embodiments of the present application, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, the drawings in the following description are only some examples of the present application, for
For those skilled in the art, without creative efforts, it can also be obtained according to these attached drawings other attached
Figure.
Fig. 1 is the structural schematic diagram one of replacing light source system provided by the embodiments of the present application.
Fig. 2 is the structural schematic diagram two of replacing light source system provided by the embodiments of the present application.
Fig. 3 is the structural schematic diagram three of replacing light source system provided by the embodiments of the present application.
Fig. 4 is the structural schematic diagram four of replacing light source system provided by the embodiments of the present application.
Specific embodiment
Below in conjunction with the attached drawing in the embodiment of the present application, technical solutions in the embodiments of the present application carries out clear, complete
Site preparation description.Obviously, described embodiments are only a part of embodiments of the present application, instead of all the embodiments.It is based on
Embodiment in the application, those skilled in the art's every other implementation obtained without creative efforts
Example, shall fall in the protection scope of this application.
In the description of the present application, it is to be understood that term " center ", " longitudinal direction ", " transverse direction ", " length ", " width ",
" thickness ", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside", " up time
The orientation or positional relationship of the instructions such as needle ", " counterclockwise " is to be based on the orientation or positional relationship shown in the drawings, and is merely for convenience of
It describes the application and simplifies description, rather than the device or element of indication or suggestion meaning must have a particular orientation, with spy
Fixed orientation construction and operation, therefore should not be understood as the limitation to the application.In addition, term " first ", " second " are only used for
Purpose is described, relative importance is not understood to indicate or imply or implicitly indicates the quantity of indicated technical characteristic.
" first " is defined as a result, the feature of " second " can explicitly or implicitly include one or more feature.?
In the description of the present application, the meaning of " plurality " is two or more, unless otherwise specifically defined.
In the description of the present application, it should be noted that unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or be integrally connected；It can
To be mechanical connection, it is also possible to be electrically connected or can mutually communicate；It can be directly connected, it can also be by between intermediary
It connects connected, can be the connection inside two elements or the interaction relationship of two elements.For the ordinary skill of this field
For personnel, the concrete meaning of above-mentioned term in this application can be understood as the case may be.
In this application unless specifically defined or limited otherwise, fisrt feature second feature "upper" or "lower"
It may include that the first and second features directly contact, also may include that the first and second features are not direct contacts but pass through it
Between other characterisation contact.Moreover, fisrt feature includes the first spy above the second feature " above ", " above " and " above "
Sign is right above second feature and oblique upper, or is merely representative of first feature horizontal height higher than second feature.Fisrt feature exists
Second feature " under ", " lower section " and " following " include that fisrt feature is directly below and diagonally below the second feature, or is merely representative of
First feature horizontal height is less than second feature.
Following disclosure provides many different embodiments or example is used to realize the different structure of the application.In order to
Simplify disclosure herein, hereinafter the component of specific examples and setting are described.Certainly, they are merely examples, and
And purpose does not lie in limitation the application.In addition, the application can in different examples repeat reference numerals and/or reference letter,
This repetition is for purposes of simplicity and clarity, itself not indicate between discussed various embodiments and/or setting
Relationship.In addition, this application provides various specific techniques and material example, but those of ordinary skill in the art can be with
Recognize the application of other techniques and/or the use of other materials.
Specifically, referring to Fig. 1, Fig. 1 is the structural schematic diagram of replacing light source system provided by the embodiments of the present application.The light
Source replacement system is used to replace the Exposing Lamp in exposure machine.
The application provides a kind of replacing light source system of exposure machine, including：
Chamber 100, chamber include the work chamber 101 being disposed adjacent, test chamber 102 and replacement chamber 103, work
It is provided with first light source 201 in chamber 101, replaces in chamber 103 and is provided with second light source 202；And
Guide rail 301, guide rail setting 301 is in chamber 100；Wherein,
First light source 201 can be moved in replacement chamber 103 along guide rail 301, and second light source 202 can be along guide rail 301
It is moved in test chamber 102, is moved in work chamber 101 after the test of second light source 202 passes through further along guide rail 301.
For example, the first light source 201 and the second light source 202 can be mercury vapor lamp, and first light source 201 and second light source 202
Shape, size are consistent.
For example, specifically, first light source 201 can lead to when 201 illumination of the first light source decline in work chamber 101
Guide rail 301 is crossed to enter in replacement chamber 103, meanwhile, the second light source 202 replaced in chamber 103 is entered by guide rail 301
It is tested in test chamber 102.After the completion of the second light source 202 test, i.e. the illumination of second light source 202 reaches default photograph
After degree, the second light source 202 is by the way that in 301 mobile working chamber 101 of guide rail, i.e. completion second light source 202 is to first light source 201
Replacement.
In the embodiment of the present application, the process for replacing the first light source 101 in work chamber 101 is not necessarily to manual intervention, because
Production efficiency can be improved in this.Also, due in replacement process, work chamber 101, test chamber 102 and replacement chamber
103 together form a closed space, therefore, the contaminated probability of second light source 202 are also reduced, to further mention
High production efficiency.
And then, referring to Fig. 2, in some embodiments, work chamber 101 and test chamber 102 are arranged side by side, and more
The setting of chamber 103 is changed in work chamber 101 and test chamber 102.Wherein, in the embodiment of the present application, which can be with
For ring-shaped guide rail.
First movement plate 50, the second movable plate 60 and third movable plate 70 are additionally provided in chamber 100；Wherein, it first moves
The setting of movable plate 50 is between work chamber 101 and replacement chamber 103, and the setting of the second movable plate 60 is in test chamber 102 and replacement
Between chamber 103, third movable plate 70 is arranged between work chamber 101 and test chamber 102.
First movement plate 50 includes first movement portion 501 and the first fixed part 502, and the second movable plate 60 includes the second shifting
Dynamic portion 601 and the second fixed part 602, third movable plate 70 include third moving portion 701 and third fixed part 702；Wherein, first
The first via hole 503 is provided on fixed part 502, the second fixed part 602 is provided with the second via hole 603, and third fixed part 702 is arranged
There is third via hole 703, guide rail is arranged along the first via hole 503, the second via hole 603 and third via hole 703.
For example, the first fixed part 502 and the second fixed part 602 can be bonded setting, third fixed part 702 is perpendicular to first
Fixed part 502 and the second fixed part 602, and the guide rail 301 can be ring-shaped guide rail, the first fixed part 502, the second fixed part
602 and third fixed part 702 inner circumferential side in guide rail 301 can be set.When it is implemented, first movement plate 50, second moves
Movable plate 60, third movable plate 70 and guide rail 301 separate work chamber 101, test chamber 102 and replacement chamber 103.
When needing replacing the first light source 201 being arranged in work chamber 101, can be moved by adjusting first movement plate 50, second
The position of movable plate 60 and third movable plate 70 come complete replacement first light source 201 process.
For example, specifically, referring to Fig. 3, move first movement portion 501 first when needing replacing first light source 201,
So that forming an opening that first light source 201 can be allowed to pass through between work chamber 101 and replacement chamber 103.That is, the first light
Source 201 can be entered in replacement chamber 103 along guide rail 301 by the opening.Meanwhile mobile third moving portion 701, so that
Work chamber 101 can be moved to along guide rail 301 by having detected the second light source 202 being located in detection chambers 102 finished
In.Also, mobile second moving portion 601 enters the second light source 202 in replacement chamber 103 in test chamber 102 and carries out
Detection.In this way, just completing the once replacement process to first light source 201.
In some embodiments, referring to Fig. 4, first light source 201 includes the first sliding part 2011 and is arranged first
First illumination region 2012 of 2011 side of sliding part, second light source 202 include that the second sliding part 2021 and setting are sliding second
Second illumination region 2022 of dynamic 2021 side of portion；
Wherein, the first sliding part 2011 and the second sliding part 2021 are arranged on guide rail 301, so that first light source 201
It can be moved to along guide rail 301 in replacement chamber 103, second light source 202 can be moved in test chamber 102 along guide rail 301,
It is moved to 101 in work chamber after the test of second light source 202 passes through further along guide rail 301.
In some embodiments, please continue to refer to Fig. 4,101 are additionally provided with reflector 80 in work chamber, and setting exists
Receiver 90 outside work chamber 101；Wherein, reflector 80 is used to reflexing to the light that first light source 201 issues into described connect
It receives on device 90.
For example, specifically, the light that first light source 201 issues is radiated at instead when work chamber 101 is in running order
In emitter 80, then reflector 80 reflexes to the light that first light source 201 issues on receiver 90.And then, receiver 90
The light that first light source 201 issues is radiated at again on the substrate for needing to expose, to complete exposure process.
In some embodiments, a test cell is additionally provided in test chamber 102；
Test cell 102 is moved to the indoor second light source of test chamber for testing, so that indoor second light of test chamber
The parameter in source reaches parameter preset.
Correspondingly, present invention also provides a kind of exposure machine, the replacing light source system including the offer of the application any embodiment
System.
Replacing light source system provided by the embodiments of the present application, including chamber 100, chamber 100 include the work being disposed adjacent
Chamber 101, test chamber 102 and replacement chamber 103, first light source 201 is provided in work chamber 101, replaces chamber 103
Inside it is provided with second light source 202；And guide rail 301, guide rail 301 are arranged in chamber 100；Wherein, first light source 201 can be along
Guide rail 301 is moved in replacement chamber 103, and second light source 202 can be moved in test chamber 102 along guide rail 301, to second
The test of light source 202 is moved in work chamber 101 after passing through further along guide rail 301.The embodiment of the present application passes through in chamber 100
Guide rail 301 is set, without shutting down and cooling down when replacing Exposing Lamp, therefore improves production efficiency.
In the above-described embodiments, it all emphasizes particularly on different fields to the description of each embodiment, there is no the portion being described in detail in some embodiment
Point, reference can be made to the related descriptions of other embodiments.
The replacing light source system to a kind of exposure machine provided by the embodiment of the present application and exposure machine have carried out in detail above
Thin to introduce, specific examples are used herein to illustrate the principle and implementation manner of the present application, and above embodiments are said
The bright technical solution and its core concept for being merely used to help understand the application；Those skilled in the art should understand that：
It is still possible to modify the technical solutions described in the foregoing embodiments, or part of technical characteristic is carried out etc.
With replacement；And these are modified or replaceed, the technical side of each embodiment of the application that it does not separate the essence of the corresponding technical solution
The range of case.
Claims (10)
1. a kind of replacing light source system of exposure machine, which is characterized in that including：
Chamber, the chamber include the work chamber being disposed adjacent, test chamber and replacement chamber, are set in the work chamber
It is equipped with first light source, is provided with second light source in the replacement chamber；And
Guide rail, the guide rail are arranged in the chamber；Wherein,
The first light source can be moved in the replacement chamber along the guide rail, and the second light source can be along the guide rail
It is moved in the test chamber, is moved to the work chamber further along the guide rail after second light source test passes through
It is interior.
2. replacing light source system according to claim 1, which is characterized in that the work chamber and the test chamber are simultaneously
Row's setting, and replacement chamber setting is in the work chamber and test chamber.
3. replacing light source system according to claim 2, which is characterized in that the guide rail is ring-shaped guide rail.
4. replacing light source system according to claim 3, which is characterized in that be additionally provided with first movement in the chamber
Plate, the second movable plate and third movable plate；Wherein, the first movement plate is arranged in the work chamber and the replacement chamber
Between, second movable plate is arranged between the test chamber and the replacement chamber, and the third movable plate setting exists
Between the work chamber and the test chamber.
5. replacing light source system according to claim 4, which is characterized in that the first movement plate includes first movement portion
And first fixed part, second movable plate include the second moving portion and the second fixed part, the third movable plate includes the
Three moving portions and third fixed part；Wherein, the first via hole is provided on first fixed part, second fixed part is provided with
Second via hole, the third fixed part are provided with third via hole, and the guide rail is along first via hole, the second via hole and
The setting of three via holes.
6. replacing light source system according to claim 1, which is characterized in that the first light source include the first sliding part with
And the first illumination region of first sliding part side is set, the second light source includes the second sliding part and is arranged in institute
State the second illumination region of the second sliding part side；
Wherein, first sliding part and the second sliding part are arranged on the guide rail, so that the first light source can be along
The guide rail is moved in the replacement chamber, and the second light source can be moved in the test chamber along the guide rail,
It is moved in the work chamber after second light source test passes through further along the guide rail.
7. replacing light source system according to claim 1, which is characterized in that be additionally provided with reflection in the work chamber
Device, and the receiver being arranged in outside the work chamber；Wherein, the reflector is used for the light for issuing the first light source
In line reflection to the receiver.
8. replacing light source system according to any one of claims 1 to 7, which is characterized in that also set in the test chamber
It is equipped with a test cell；
The test cell is moved to the indoor second light source of the test chamber for testing, so that the test chamber indoor the
The parameter of two light sources reaches parameter preset.
9. replacing light source system according to claim 1, which is characterized in that the shape of the first light source and second light source
Shape, size are consistent.
10. a kind of exposure machine, which is characterized in that including the described in any item light sources of claim 1 to 9 more new system.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811012926.7A CN108897198A (en) | 2018-08-31 | 2018-08-31 | The replacing light source system and exposure machine of exposure machine |
| PCT/CN2019/093703 WO2020042743A1 (en) | 2018-08-31 | 2019-06-28 | Light source changing system for exposure machine and exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811012926.7A CN108897198A (en) | 2018-08-31 | 2018-08-31 | The replacing light source system and exposure machine of exposure machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108897198A true CN108897198A (en) | 2018-11-27 |
Family
ID=64359669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811012926.7A Pending CN108897198A (en) | 2018-08-31 | 2018-08-31 | The replacing light source system and exposure machine of exposure machine |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN108897198A (en) |
| WO (1) | WO2020042743A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020042743A1 (en) * | 2018-08-31 | 2020-03-05 | 武汉华星光电技术有限公司 | Light source changing system for exposure machine and exposure machine |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000133005A (en) * | 1998-10-29 | 2000-05-12 | Wakomu Denso:Kk | Automatic replacing device for pseudo solar light irradiation lamp |
| JP2000139836A (en) * | 1998-11-10 | 2000-05-23 | Olympus Optical Co Ltd | Light source device |
| JP2001307988A (en) * | 2000-04-24 | 2001-11-02 | Canon Inc | Illumination device and illumination method, and aligner with the illumination device and device manufacturing method by means of them |
| JP2010251363A (en) * | 2009-04-10 | 2010-11-04 | Nikon Corp | Exposure method, exposure apparatus, and device manufacturing method |
| CN103492952A (en) * | 2011-04-21 | 2014-01-01 | Asml荷兰有限公司 | Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method |
| JP5813914B2 (en) * | 2009-04-27 | 2015-11-17 | 株式会社東芝 | Automatic analyzer |
| CN208737218U (en) * | 2018-08-31 | 2019-04-12 | 武汉华星光电技术有限公司 | The replacing light source system and exposure machine of exposure machine |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201438259U (en) * | 2009-06-30 | 2010-04-14 | 景兴精密机械有限公司 | Exposure machine |
| TWI771788B (en) * | 2014-03-28 | 2022-07-21 | 日商尼康股份有限公司 | light source device |
| CN107037693A (en) * | 2016-10-28 | 2017-08-11 | 张家港奇点光电科技有限公司 | A kind of new UVLED exposure light source uniformity real-time testing systems |
| CN108897198A (en) * | 2018-08-31 | 2018-11-27 | 武汉华星光电技术有限公司 | The replacing light source system and exposure machine of exposure machine |
-
2018
- 2018-08-31 CN CN201811012926.7A patent/CN108897198A/en active Pending
-
2019
- 2019-06-28 WO PCT/CN2019/093703 patent/WO2020042743A1/en active Application Filing
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000133005A (en) * | 1998-10-29 | 2000-05-12 | Wakomu Denso:Kk | Automatic replacing device for pseudo solar light irradiation lamp |
| JP2000139836A (en) * | 1998-11-10 | 2000-05-23 | Olympus Optical Co Ltd | Light source device |
| JP2001307988A (en) * | 2000-04-24 | 2001-11-02 | Canon Inc | Illumination device and illumination method, and aligner with the illumination device and device manufacturing method by means of them |
| JP2010251363A (en) * | 2009-04-10 | 2010-11-04 | Nikon Corp | Exposure method, exposure apparatus, and device manufacturing method |
| JP5813914B2 (en) * | 2009-04-27 | 2015-11-17 | 株式会社東芝 | Automatic analyzer |
| CN103492952A (en) * | 2011-04-21 | 2014-01-01 | Asml荷兰有限公司 | Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method |
| CN208737218U (en) * | 2018-08-31 | 2019-04-12 | 武汉华星光电技术有限公司 | The replacing light source system and exposure machine of exposure machine |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020042743A1 (en) * | 2018-08-31 | 2020-03-05 | 武汉华星光电技术有限公司 | Light source changing system for exposure machine and exposure machine |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020042743A1 (en) | 2020-03-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10829036B2 (en) | Road sign projector and vehicle lamp | |
| CN102881652B (en) | Segmentation mask framework components manufactured by AMOLED panel manufacturing | |
| CN102369484B (en) | Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate | |
| CN208737218U (en) | The replacing light source system and exposure machine of exposure machine | |
| CN1537225B (en) | Macro illumination device | |
| CN102052607B (en) | Backlight unit | |
| CN106773315A (en) | Backlight module and liquid crystal display | |
| CN101546132B (en) | Projection exposure device | |
| CN108897198A (en) | The replacing light source system and exposure machine of exposure machine | |
| CN102707552A (en) | Illumination unit, projection display unit, and direct view display unit | |
| CN101680630B (en) | Lighting device for display equipment, display equipment, and television receiver | |
| CN205508888U (en) | Encapsulation equipment, display panel and display device | |
| CN103364963A (en) | Optical system, exposure device and equipment making method | |
| CN209560120U (en) | A kind of diffuser plate, down straight aphototropism mode set and display equipment | |
| JP2016001258A (en) | Exposure method, exposure apparatus, and device manufacturing method | |
| CN106415396B (en) | Light supply apparatus, discharge lamp and its manufacturing method and exposure device | |
| CN108050429A (en) | A kind of multispectral light path light source illuminating apparatus altogether of LED | |
| CN101907831B (en) | Light irradiating apparatus for exposure apparatus, lighting control method thereof, exposure apparatus, and substrate | |
| EP3524967B1 (en) | Image inspection device and lighting device | |
| US6639352B2 (en) | Flat lamp for emitting lights to a surface area and liquid crystal using the same | |
| US8570506B2 (en) | System for inspecting defects of panel device | |
| KR20200036743A (en) | Curing device | |
| JP2011017770A (en) | Proximity exposure device, method for forming exposure light in the same, and method for manufacturing display panel substrate | |
| CN106406033B (en) | For the light source module unit of exposure and the exposure device including the light source module unit | |
| JP2006208150A (en) | System for visually inspecting liquid crystal substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |