CN108878498A - 彩膜基板及其制备方法、显示面板 - Google Patents

彩膜基板及其制备方法、显示面板 Download PDF

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CN108878498A
CN108878498A CN201810717907.8A CN201810717907A CN108878498A CN 108878498 A CN108878498 A CN 108878498A CN 201810717907 A CN201810717907 A CN 201810717907A CN 108878498 A CN108878498 A CN 108878498A
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宋振
王国英
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BOE Technology Group Co Ltd
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    • G02OPTICS
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Abstract

本发明提供一种彩膜基板及其制备方法、显示面板,属于显示技术领域。本发明的彩膜基板的制备方法,包括如下步骤:在基底上,通过构图工艺形成包括黑矩阵的图形;形成辅助电极;所述辅助电极在所述基底上的正投影至少覆盖所述黑矩阵在所述基底上的正投影;在形成有辅助电极的基底上,通过构图工艺形成包括位于黑矩阵之间的彩色滤光片的图形。

Description

彩膜基板及其制备方法、显示面板
技术领域
本发明属于显示技术领域,具体涉及一种彩膜基板及其制备方法、显示面板。
背景技术
如图1所示,现有的彩膜基板包括透明基底1、彩色滤光片3、介电层4、金属电极7;其中,彩色滤光片3包括设置在透明基底1上的多个彩色滤光片3,以及位于两相邻彩色滤光片3之间的黑矩阵2;介电层4设置在彩色滤光片3与金属电极7之间,用于将彩色滤光片3与金属电极7分隔开,以避免金属电极7划伤彩色滤光片3的情况的发生;但是,应当注意的是,通常情况下,介电层4具有较大的厚度,该种结构的介电层4会将发光层所发出的光线过滤一小部分后,才会将该光线传导至彩色滤光片3的表面,从而降低由包括该介电层4的彩膜基板所制成的显示面板的显示亮度。
而且,发明人还发现,由于介电层4是由有机材料制成的,故在彩色滤光片3的表面制备一整层介电层4时,该介电层4内部很容易产生一些较大的颗粒,这些颗粒极易将后续设置在其表面的金属电极7划伤,从而导致由该彩膜基板制成的显示面板发生短路,使得显示面板的部分区域出现黑点,也即该部分区域无法对外进行显示,降低显示面板的显示效果;同时,这些颗粒还会在受到高温作用时对外释放气体,这些气体会不断冲击显示面板的内部,以使显示面板发生断裂,从而降低显示面板的良率。
发明内容
本发明旨在至少解决现有技术中存在的技术问题之一,提供一种显示效果较佳的彩膜基板及其制备方法、显示面板。
解决本发明技术问题所采用的技术方案是一种彩膜基板的制备方法,包括如下步骤:
在基底上,通过构图工艺形成包括黑矩阵的图形;
形成辅助电极;所述辅助电极在所述基底上的正投影至少覆盖所述黑矩阵在所述基底上的正投影;
在形成有辅助电极的基底上,通过构图工艺形成包括位于黑矩阵之间的彩色滤光片的图形。
优选的是,在所述形成辅助电极的步骤之前,还包括:
在部分黑矩阵上方形成隔垫物的图形;所述辅助电极覆盖所述隔垫物。
优选的是,所述辅助电极在所述基底上的正投影仅覆盖黑矩阵在所述基底上的正投影。
优选的是,所述辅助电极的材料包括金属。
优选的是,所述彩色滤光片包括红、绿、蓝三种颜色的滤光片;其中,任意两相邻的所述彩色滤光片的颜色不同。
解决本发明技术问题所采用的技术方案是一种彩膜基板,包括:
基底;
依次设置在所述基底上的黑矩阵、辅助电极,以及位于黑矩阵之间的彩色滤光片;其中,所述辅助电极在所述基底上的正投影至少覆盖所述黑矩阵在所述基底上的正投影。
优选的是,彩膜基板还包括:设置在部分所述黑矩阵背离所述基底的一侧的隔垫物;其中,所述辅助电极覆盖所述隔垫物。
优选的是,所述辅助电极在所述基底上的正投影仅覆盖黑矩阵在所述基底上的正投影。
解决本发明技术问题所采用的技术方案是一种显示面板,包括上述的任意一种彩膜基板。
优选的是,所述显示面板为OLED面板,所述彩膜基板上的辅助电极与阵列基板上的OLED器件的阴极电连接。
附图说明
图1为现有的彩膜基板的结构示意图;
图2为本发明的实施例1的彩膜基板的制备方法的工艺流程图;
图3为本发明的实施例2的彩膜基板的结构示意图;
其中附图标记为:1、基底;2、黑矩阵;3、彩色滤光片;31、红色滤光片;32、绿色滤光片;33、蓝色滤光片;4、介电层;5、辅助电极;6、隔垫物;7、金属电极。
具体实施方式
为使本领域技术人员更好地理解本发明的技术方案,下面结合附图和具体实施方式对本发明作进一步详细描述。
实施例1:
如图2所示,本实施例提供了一种彩膜基板的制备方法,包括如下步骤:
S0、清洗基底1,以使基底1保持洁净。
S1、在基底1上,通过构图工艺形成包括黑矩阵2的图形。
具体的,首先,在完成步骤S0的基底1上涂覆一层黑矩阵2材料;然后,对该层黑矩阵2材料进行刻蚀处理,以形成图案化的黑矩阵2。当然,在完成步骤S0的基底1上形成图案化的黑矩阵2的工艺并不局限于上述的一种,在此不做限定。
优选的,在完成上述步骤后,还需在部分黑矩阵2上方形成隔垫物6的图形。具体的,首先,在完成步骤S1的基底1上涂覆一层隔垫物6;然后,对该层隔垫物6进行刻蚀处理,以使隔垫物6按照一定密度形成在部分黑矩阵2上。当然,在步骤S1所形成的部分黑矩阵2上,形成隔垫物6的工艺并不局限于上述的一种,在此不做限定。
其中,上述的一定密度是指彩膜基板中的彩色滤光片3的个数,也即隔垫物6分布在黑矩阵2上的密度是由彩色滤光片3的个数决定的;例如:每隔5个彩色滤光片3,黑矩阵2上会形成有一个隔垫物6。
S2、形成辅助电极5。
具体的,首先,在完成步骤S1的基底1上,通过溅射的方式涂覆一层辅助电极5,此时,辅助电极5在基底1上的正投影是至少覆盖黑矩阵2在基底1上的正投影的;进一步地,为避免在后续制备彩膜基板的彩色滤光片3的制备工艺中,所形成的辅助电极5划伤彩色滤光片3,优选的,还需对该层辅助电极5进行刻蚀处理,以使辅助电极5在基底1上的正投影仅覆盖黑矩阵2在基底1上的正投影。
需要说明的是,通过上述构图工艺所形成的辅助电极5是完全覆盖在隔垫物6表面的,其可直接与阵列基板上的OLED器件的阴极电连接,从而省去了现有技术中,为使制备所得的彩膜基板能够与阵列基板电连接,还需在隔垫物6表面形成金属电极7(例如:氧化铟硒)的制备工艺,进而节省了制备彩膜基板的制备时间,降低制备成本。
其中,辅助电极5的材料包括金属,例如:铜、银、锰、铝、铌化锰、铌化铝中的任意一种。当然,辅助电极5的材料并不局限于上述的几种材料,在此不再一一列举。
S3、在形成有辅助电极5的基底1上,通过构图工艺形成包括位于黑矩阵2之间的彩色滤光片3的图形。
其中,为便于理解本实施例的意图,本实施例以彩色滤光片3包括红、绿、蓝三种颜色的滤光片为例进行说明;其中,任意两相邻的彩色滤光片3的颜色不同。
具体的,在完成步骤S3的基底1上,通过溅射的方式依次形成包括位于黑矩阵2之间的红色滤光片31、绿色滤光片32、蓝色滤光片33。
至此完成彩膜基板的制备。
综上,由于本实施例所提供的彩膜基板的制备方法是先将辅助电极5制备完成后,最后才在基底1上形成彩色滤光片3,故在本实施例的制备方法中,无需设置一层介电层4以将彩色滤光片3与辅助电极5隔开,以避免制备过程中辅助电极5划伤彩色滤光片3的情况的发生,从而简化了彩膜基板的制备工艺,降低制备成本。
实施例2:
如图3所示,本实施例提供一种彩膜基板,其可采用实施例1所提供的制备方法进行制备。
具体的,本实施例提供一种彩膜基板,包括:基底1、依次设置在基底1上的黑矩阵2、辅助电极5,以及位于黑矩阵2之间的彩色滤光片3;其中,辅助电极5在基底1上的正投影至少覆盖黑矩阵2在基底1上的正投影。
进一步地,为避免金属材质的辅助电极5划伤彩色滤光片3,优选的,辅助电极5在基底1上的正投影仅覆盖黑矩阵2在基底1上的正投影,以减小辅助电极5与彩色滤光片3的接触面积。
其中,本实施例的彩膜基板还包括:设置在部分黑矩阵2背离基底1的一侧的隔垫物6;其中,辅助电极5覆盖在隔垫物6的表面,其可直接与阵列基板上的OLED器件的阴极电连接,从而省去了现有技术中,为使彩膜基板能够与阵列基板电连接,还需在隔垫物6表面形成金属电极7(例如:氧化铟硒)的制备工艺,进而节省了制备彩膜基板的制备时间,降低制备成本。
综上,由于本实施例所提供的彩膜基板中没有设置介电层4,故解决了现有技术中因介电层4具有较大的厚度,所导致的降低由包括该介电层4的彩膜基板所制成的显示面板的显示亮度的问题。
实施例3:
本实施例提供一种显示面板,包括实施例2中的彩膜基板。当本实施例中的显示面板为OLED面板时,彩膜基板上的辅助电极5将与阵列基板上的OLED器件的阴极电连接,从而省去了现有技术中,为使彩膜基板能够与阵列基板电连接,还需在隔垫物6表面形成金属电极7(例如:氧化铟硒)的制备工艺,进而节省了制备彩膜基板的制备时间,降低制备成本。
由于本实施例中显示面板包括上述的彩膜基板,故其显示效果较佳。
可以理解的是,以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式,然而本发明并不局限于此。对于本领域内的普通技术人员而言,在不脱离本发明的精神和实质的情况下,可以做出各种变型和改进,这些变型和改进也视为本发明的保护范围。

Claims (10)

1.一种彩膜基板的制备方法,其特征在于,包括如下步骤:
在基底上,通过构图工艺形成包括黑矩阵的图形;
形成辅助电极;所述辅助电极在所述基底上的正投影至少覆盖所述黑矩阵在所述基底上的正投影;
在形成有辅助电极的基底上,通过构图工艺形成包括位于黑矩阵之间的彩色滤光片的图形。
2.根据权利要求1所述的彩膜基板的制备方法,其特征在于,在所述形成辅助电极的步骤之前,还包括:
在部分黑矩阵上方形成隔垫物的图形;所述辅助电极覆盖所述隔垫物。
3.根据权利要求1所述的彩膜基板的制备方法,其特征在于,所述辅助电极在所述基底上的正投影仅覆盖黑矩阵在所述基底上的正投影。
4.根据权利要求3所述的彩膜基板的制备方法,其特征在于,所述辅助电极的材料包括金属。
5.根据权利要求1所述的彩膜基板的制备方法,其特征在于,所述彩色滤光片包括红、绿、蓝三种颜色的滤光片;其中,任意两相邻的所述彩色滤光片的颜色不同。
6.一种彩膜基板,其特征在于,包括:
基底;
依次设置在所述基底上的黑矩阵、辅助电极,以及位于黑矩阵之间的彩色滤光片;其中,所述辅助电极在所述基底上的正投影至少覆盖所述黑矩阵在所述基底上的正投影。
7.根据权利要求6所述的彩膜基板,其特征在于,还包括:设置在部分所述黑矩阵背离所述基底的一侧的隔垫物;其中,所述辅助电极覆盖所述隔垫物。
8.根据权利要求6所述的彩膜基板,其特征在于,所述辅助电极在所述基底上的正投影仅覆盖黑矩阵在所述基底上的正投影。
9.一种显示面板,其特征在于,包括权利要求6-8中任一所述的彩膜基板。
10.根据权利要求9所述的显示面板,所述显示面板为OLED面板,所述彩膜基板上的辅助电极与阵列基板上的OLED器件的阴极电连接。
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