CN108873608A - A kind of plate-making of screen process technique - Google Patents
A kind of plate-making of screen process technique Download PDFInfo
- Publication number
- CN108873608A CN108873608A CN201810690982.XA CN201810690982A CN108873608A CN 108873608 A CN108873608 A CN 108873608A CN 201810690982 A CN201810690982 A CN 201810690982A CN 108873608 A CN108873608 A CN 108873608A
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- CN
- China
- Prior art keywords
- image
- egative film
- screen
- silk screen
- edge
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
The present invention relates to a kind of plate-making of screen process techniques to expose emargintion if notch occurs in edge by carrying out the detection of neat in edge degree to the screen image after exposure development again, to guarantee the uniformity at screen image edge；When notch is repaired, abandon original comprehensive coating photoresists-exposure-development conventional procedures, due to having major part image on silk screen, egative film copy is directed at image, so that egative film copy is covered image-region, directly in the edge coating photoresists of egative film copy and exposes, development step is omitted, coated weight and the time for exposure of photoresists are greatly reduced simultaneously, and quickly notch is repaired to realize.
Description
Technical field
The present invention relates to printing technology, specially a kind of plate-making of screen process technique.
Background technique
Silk-screen printing, which refers to, uses silk screen as version base, and by photosensitive lithographic method, the screen printing forme with picture and text is made.
Silk-screen printing is made of top 5 factor, screen printing forme, scraper plate, ink, print station and stock.Utilize screen printing forme picture and text portion
Subnetting hole can pass through ink, and non-graphic part mesh cannot be printed through the basic principle of ink.In screen printing when printing
Ink is poured into one end of version, applies certain pressure to the ink position on screen printing forme with scraper plate, while another towards screen printing forme
End is at the uniform velocity moved, and ink is expressed on stock from the mesh of areas by scraper plate on the move.
Currently, jagged burr usually occurs in printer's ink film edge in silk-screen printing technique, it is typically due to photoresists point
It distinguishes that power is not high or the time for exposure is insufficient, causes screen printing forme image border not smooth neat enough.
Summary of the invention
The object of the present invention is to provide a kind of plate-making of screen process techniques, reduce screen printing forme image border burr phenomena.
To achieve the above object, it provides the following technical solutions：A kind of plate-making of screen process technique, includes the following steps：
S1, coating photoresists, photoresists are uniformly coated on silk screen and are parched；
Then S2, the printing surface that egative film is placed on to silk screen are placed on exposure in vacuum exposure machine；
S3, silk screen is removed from exposure machine, removes egative film, first moisten silk screen wire side with no pressure warm water, after moistening 30-60 seconds, then
It is rinsed with hydraulic giant, until image shows；
S4, silk screen be placed on bottom have on the workbench of light, the image acquisition device above silk screen to the image on silk screen into
Row acquires and by the image feedback of acquisition to host, and the host compares the image of acquisition with egative film, if screen image
Surrounding excessive moisture is then blotted with absorbent cloth, then silk screen is put into 30-40 DEG C of baking oven and is dried by neat in edge, if silk screen figure
As notch occurs in edge, then S5 is entered step；
S5, production egative film copy, in the printing surface of silk screen and are directed at image for egative film Replica placement, along the edge of egative film copy
One circle photoresists of coating, then expose again, obtain the complete screen image in image border.
Preferably, in the step S4, image acquisition device is the camera of default clarity.
Preferably, in the step S5, the appearance profile of the egative film copy is consistent with the appearance profile of the egative film.
The present invention provides a kind of having the beneficial effect that for plate-making of screen process technique：
1, by carrying out the detection of neat in edge degree to the screen image after exposure development, if notch occurs in edge, edge is lacked
Mouth is exposed again, to guarantee the uniformity at screen image edge；
2, notch repair when, abandon original comprehensive coating photoresists-exposure-development conventional procedures, due on silk screen
There is most of image, egative film copy is directed at image, egative film copy is made to cover image-region, is directly applied at the edge of egative film copy
It covers photoresists and exposes, development step is omitted, while greatly reducing coated weight and the time for exposure of photoresists, to realize
Quickly notch is repaired.
Detailed description of the invention
It to describe the technical solutions in the embodiments of the present invention more clearly, below will be to needed in the embodiment
Attached drawing is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for ability
For the those of ordinary skill of domain, without creative efforts, it can also be obtained according to these attached drawings other attached
Figure.
Fig. 1 is the flow diagram of plate-making of screen process technique in the present invention.
Specific embodiment
To keep the contents of the present invention more clear and easy to understand, the content of the present invention will be further explained below.This certain hair
Bright to be not limited to the specific embodiment, general replacement known to those skilled in the art is also covered by guarantor of the invention
It protects in range, beneficial effects of the present invention will the present invention is described in detail in conjunction with the embodiments.
As shown in Figure 1, the present invention provides a kind of plate-making of screen process technique, include the following steps：
S1, coating photoresists, photoresists are uniformly coated on silk screen and are parched；
Then S2, the printing surface that egative film is placed on to silk screen are placed on exposure in vacuum exposure machine；
S3, silk screen is removed from exposure machine, removes egative film, first moisten silk screen wire side with no pressure warm water, after moistening 30-60 seconds, then
It is rinsed with hydraulic giant, until image shows；
S4, silk screen be placed on bottom have on the workbench of light, the image acquisition device above silk screen to the image on silk screen into
Row acquires and by the image feedback of acquisition to host, and the host compares the image of acquisition with egative film, if screen image
Surrounding excessive moisture is then blotted with absorbent cloth, then silk screen is put into 30-40 DEG C of baking oven and is dried by neat in edge, if silk screen figure
As notch occurs in edge, then S5 is entered step；
In step S4, image acquisition device is the camera of default clarity, by carrying out side to the screen image after exposure development
The detection of edge uniformity, if notch occurs in edge, exposes emargintion, again to guarantee the neat of screen image edge
Degree.
S5, production egative film copy, in the printing surface of silk screen and are directed at image for egative film Replica placement, along egative film copy
Edge coating one encloses photoresists, then exposes again, obtains the complete screen image in image border.
In step S5, the appearance profile of the egative film copy is consistent with the appearance profile of the egative film.When notch is repaired,
Original comprehensive coating photoresists-exposure-development conventional procedures are abandoned, due to having major part image on silk screen, by egative film
Copy is directed at image, and egative film copy is made to cover image-region, directly in the edge coating photoresists of egative film copy and exposes, and omits
Development step, while greatly reducing coated weight and the time for exposure of photoresists, quickly notch is repaired to realize.
Although the present invention essentially describes above embodiments, example is intended only as to be described, and the present invention is simultaneously
It is without being limited thereto.Those of ordinary skill in the art can make the essential characteristics of a variety of modifications and application without departing from embodiment.For example,
Each component that embodiment is shown in detail can be modified and be run, be believed that and be included in the modification and the relevant difference of application
In protection scope of the present invention as defined in the appended claims.
Embodiment involved in this specification is meant that specially feature, structure or the spy described in conjunction with the embodiment
Property is included at least one embodiment of the present invention.These terms for coming across everywhere in specification are not necessarily directed to same
Embodiment.In addition, it is common all to think that it falls into this field when describing a particular feature, structure, or characteristic in conjunction with any embodiment
In the range of these a particular feature, structure, or characteristics that technical staff combines other embodiments that can realize.
Claims (3)
1. a kind of plate-making of screen process technique, which is characterized in that include the following steps：
S1, coating photoresists, photoresists are uniformly coated on silk screen and are parched；
Then S2, the printing surface that egative film is placed on to silk screen are placed on exposure in vacuum exposure machine；
S3, silk screen is removed from exposure machine, removes egative film, first moisten silk screen wire side with no pressure warm water, after moistening 30-60 seconds, then
It is rinsed with hydraulic giant, until image shows；
S4, silk screen be placed on bottom have on the workbench of light, the image acquisition device above silk screen to the image on silk screen into
Row acquires and by the image feedback of acquisition to host, and the host compares the image of acquisition with egative film, if screen image
Surrounding excessive moisture is then blotted with absorbent cloth, then silk screen is put into 30-40 DEG C of baking oven and is dried by neat in edge, if silk screen figure
As notch occurs in edge, then S5 is entered step；
S5, production egative film copy, in the printing surface of silk screen and are directed at image for egative film Replica placement, along the edge of egative film copy
One circle photoresists of coating, then expose again, obtain the complete screen image in image border.
2. plate-making of screen process technique according to claim 1, which is characterized in that in the step S4, image collection dress
It is set to the camera of default clarity.
3. plate-making of screen process technique according to claim 1, which is characterized in that in the step S5, the egative film pair
This appearance profile is consistent with the appearance profile of the egative film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810690982.XA CN108873608A (en) | 2018-06-28 | 2018-06-28 | A kind of plate-making of screen process technique |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810690982.XA CN108873608A (en) | 2018-06-28 | 2018-06-28 | A kind of plate-making of screen process technique |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108873608A true CN108873608A (en) | 2018-11-23 |
Family
ID=64296537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810690982.XA Withdrawn CN108873608A (en) | 2018-06-28 | 2018-06-28 | A kind of plate-making of screen process technique |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108873608A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113106451A (en) * | 2021-04-01 | 2021-07-13 | 江苏佰元鸿金属科技有限公司 | High-corrosion-resistance stainless steel etching processing technology |
-
2018
- 2018-06-28 CN CN201810690982.XA patent/CN108873608A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113106451A (en) * | 2021-04-01 | 2021-07-13 | 江苏佰元鸿金属科技有限公司 | High-corrosion-resistance stainless steel etching processing technology |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20181123 |
|
| WW01 | Invention patent application withdrawn after publication |