CN108872151A - It is a kind of based on T shape to and nano wire pair optical sensor - Google Patents

It is a kind of based on T shape to and nano wire pair optical sensor Download PDF

Info

Publication number
CN108872151A
CN108872151A CN201710907474.8A CN201710907474A CN108872151A CN 108872151 A CN108872151 A CN 108872151A CN 201710907474 A CN201710907474 A CN 201710907474A CN 108872151 A CN108872151 A CN 108872151A
Authority
CN
China
Prior art keywords
line
metal nanometer
nanometer line
nano
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201710907474.8A
Other languages
Chinese (zh)
Other versions
CN108872151B (en
Inventor
王俊俏
高念
张佳
袁栋栋
吴亚南
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zhengzhou University
Original Assignee
Zhengzhou University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhengzhou University filed Critical Zhengzhou University
Priority to CN201710907474.8A priority Critical patent/CN108872151B/en
Publication of CN108872151A publication Critical patent/CN108872151A/en
Application granted granted Critical
Publication of CN108872151B publication Critical patent/CN108872151B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41Refractivity; Phase-affecting properties, e.g. optical path length
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y15/00Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Molecular Biology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

The present invention relates to it is a kind of based on T shape to and nano wire pair optical sensor, including dielectric layer, metal Nano structure and substrate, metal Nano structure is dimeric structure, metal Nano structure includes the line style metal nano that is set in substrate to and positioned at T-type metal nano pair between line style metal nano pair, the distance between two respective longitudinal edges of T-type metal nanometer line of the distance between the both ends of the horizontal edge of each T-type metal nanometer line and corresponding line style metal nanometer line are equal, the equal length of the horizontal edge of the length and T-type metal nanometer line of the line style metal nanometer line, the width of the width of the longitudinal edge of T-type metal nanometer line and the width of horizontal edge and line style metal nanometer line is equal, the height of T-type metal nanometer line is equal with the height of line style metal nanometer line.The structure is simple, and preparation process requires difficulty to substantially reduce, and has sensing effect well, and the optical sensor of the structure can be easy to improve the sensitivity of sensor.

Description

It is a kind of based on T shape to and nano wire pair optical sensor
Technical field
The present invention relates to sensor fields, and in particular to it is a kind of based on T shape to and nano wire pair optical sensor.
Background technique
Sensor micromation, automation, selectivity, stability, sensitivity, the response time and in terms of It is required that higher and higher, the development and application of novel sensing material are increasingly taken seriously.Using new material production novel sensor One of important directions as research, it is especially noticeable with the research that nano wire makees sensor sensing material.This is essentially consisted in Monodimension nanometer material has huge specific surface area and very high surface-active, so particularly sensitive to ambient enviroment.
Verellen N in 2011 et al. exists《Plasmon Line Shaping Using Nanocrosses for High Sensitivity Localized Surface Plasmon Resonance Sensing》In propose one kind and be based on The Meta Materials sensor that X-type and nano wire combine is X-type on the left of the sensor, and right side is nano wire, their material is all It is composed of gold, the three-decker formed by being followed successively by medium, gold, substrate from top to bottom, substrate is glass material.In the structure X-type structure has the characteristics that angle control, but above structure is relatively difficult during the preparation process, and preparation process is more demanding, And the influence of the structure, the sensitivity of the sensor is not high, is unable to satisfy the requirement of client's needs sometimes.
Summary of the invention
The object of the present invention is to provide a kind of structures it is simple, easy to process and greatly improve sensitivity based on T shape pair With the optical sensor of nano wire pair.
To achieve the above object, it is of the invention it is a kind of based on T shape to and the optical sensor of nano wire pair use following skill Art scheme:It is a kind of based on T shape to and nano wire pair optical sensor, including dielectric layer, the gold from top to bottom set gradually Belong to nanostructure and substrate, metal Nano structure are dimeric structure, metal Nano structure includes the upper surface for being set to substrate On line style metal nano pair, line style metal nano to include parallel interval setting the line style metal nano extended longitudinally Line, metal Nano structure further include that the T-type metal on the upper surface for being relatively arranged on substrate between line style metal nanometer line is received Rice is right, and T-type metal nano is to including the setting of longitudinal edge relative spacing, horizontal edge T-type metal nanometer line disposed in parallel, each T-type The distance between the both ends of the horizontal edge of metal nanometer line and corresponding line style metal nanometer line and two T-type metal nanometer lines are respectively Equal, the equal length of the horizontal edge of the length and T-type metal nanometer line of the line style metal nanometer line of the distance between longitudinal edge, The width of the width of the longitudinal edge of T-type metal nanometer line and the width of horizontal edge and line style metal nanometer line is equal, T-type metal nano The height of line is equal with the height of line style metal nanometer line.
The both ends of the horizontal edge are 10-60nm at a distance from corresponding line style metal nanometer line.
The both ends of the horizontal edge are 40nm at a distance from corresponding line style metal nanometer line.
The length of the line style metal nanometer line is 80-150nm.
The length of the line style metal nanometer line is 100nm.
The length of the longitudinal edge of the T-type metal nanometer line is 30nm-90nm.
The width of the line style metal nanometer line is 10-50nm.
The width of the line style metal nanometer line is 20nm.
The height of the T-type metal nanometer line is 20-50nm.
The height of the T-type metal nanometer line is 30nm.
Beneficial effects of the present invention:Metal Nano structure is dimeric structure, including line style metal nano to be located at line T-type metal nano pair between type metal nano pair, the both ends of the horizontal edge of each T-type metal nanometer line are golden with corresponding line style The distance between two respective longitudinal edges of T-type metal nanometer line of the distance between category nano wire are equal, and the line style metal is received The equal length of the horizontal edge of the length and T-type metal nanometer line of rice noodles, the width of the longitudinal edge of T-type metal nanometer line and the width of horizontal edge The width of degree and line style metal nanometer line is equal, and the height of T-type metal nanometer line is equal with the height of line style metal nanometer line. The structure is simple, and preparation process requires difficulty to substantially reduce, and has sensing effect well, and the optical sensor of the structure can To be easy to improve the sensitivity of sensor.Light can be along any direction incidence, and there is no bring sensitivity because of incident angle Difference.This optical sensor is only more sensitive to the refractive index of object, unrelated with the intensity of light, and no matter light is from which direction Incidence detects and is showed with the variation of wavelength as long as being irradiated in this structure.
Detailed description of the invention
Fig. 1 be it is of the invention it is a kind of based on T shape to and a kind of structure of embodiment of optical sensor of nano wire pair show It is intended to;
Fig. 2 is the top view of Fig. 1;
Fig. 3 be T-type metal nano to and line style metal nano pair positional structure schematic diagram;
Fig. 4 is the Spectral Extinction curve graph of the obtained optical sensor of theoretical calculation in the present embodiment;
Fig. 5 is the incident wavelength of the obtained optical sensor of theoretical calculation and index of refraction relationship figure in the present embodiment;
Fig. 6 is the relational graph of the quality factor of the obtained optical sensor of theoretical calculation in the present embodiment, wherein P1It is shortwave Variation of the wavelength with refractive index, P2It is variation of the long wavelength with refractive index, their relationship is FOM=m (nm RIU-1)/ The variation of wavelength when FWHM (nm), m are refraction index changings in a unit, FWHM are that half-wave is wide.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on Embodiment in the present invention, those of ordinary skill in the art's every other embodiment obtained belong to what the present invention protected Range.
It is of the invention it is a kind of based on T shape to and nano wire pair optical sensor embodiment:As shown in figs 1 to 6, it wraps The dielectric layer 1, metal Nano structure and substrate 2 from top to bottom set gradually is included, substrate 2 is quartz plate, metal Nano structure For dimeric structure and it is embedded in substrate 2.Metal Nano structure includes being set on the upper surface of substrate 2 to have parallel interval To 3, the length of line style metal nanometer line 5 extends longitudinally the line style metal nano of the line style metal nanometer line 5 of setting.Metal is received Rice structure further includes in the T-type metal nano being oppositely arranged between line style metal nanometer line 5 on the upper surface of substrate 2 to 4, T-type Metal nano includes the setting of 8 relative spacing of longitudinal edge, the T-type metal nanometer line 6 disposed in parallel of horizontal edge 7 to 4.Wherein, each T-type metal D and two T-type metal nanometer line 6 of the distance between the both ends of the horizontal edge 7 of nano wire 6 and corresponding line style metal nanometer line 5 is each From the distance between longitudinal edge 8 D it is equal, the length L of the horizontal edge 7 of the length L and T-type metal nanometer line 6 of line style metal nanometer line 5 It is equal, the width W phase of the width W of the longitudinal edge 8 of T-type metal nanometer line 6 and the width W of horizontal edge 7 and line style metal nanometer line 5 Deng the height H of T-type metal nanometer line 6 and the height H of line style metal nanometer line 5 are equal.Light can be along any direction incidence, no In the presence of the difference for bringing sensitivity because of incident angle.This optical sensor is only more sensitive to the refractive index of object, with The intensity of light is unrelated, and no matter light is incident from which direction, detects and as long as being irradiated in this structure with wavelength Variation shows.Line style metal nano is all made of metallic silver at dielectric layer 1 is air to 4 to 3 and T-type metal nano.
The both ends of the horizontal edge 7 of each T-type metal nanometer line 6 are 40nm with corresponding 5 distance D of line style metal nanometer line.Line The length of type metal nanometer line 5 is 100nm.The length S of the longitudinal edge 8 of T-type metal nanometer line 6 is 40nm.T-type metal nanometer line 6 Longitudinal edge 8 width be 20nm.The height H of T-type metal nanometer line 6 is 30nm.
Metal Nano structure is dimeric structure, and above structure is simple, and preparation process requires difficulty to substantially reduce, and is had very well Sensing effect, and the optical sensor of the structure can be easy improve sensor sensitivity.The machine of the optical sensor Reason is promoted between each metal nanometer line by the parameter of the parameter and line style metal nano pair that adjust T shape metal nano pair Plasma interaction occur generate different spectral response, realize sensing effect.
It is above-mentioned based on T shape to and nano wire the preparation process of the optical sensor of structure is included the following steps:
Step 1. cleans the substrate that material is quartz:First substrate is surface-treated, then carries out prebake conditions removal due to table Surface treatment and bring vapor, chemicals.
Step 2. spin coating:Spraying gluing method is selected, spin coating will be by drop glue, low speed rotation, the several steps of high speed rotation Suddenly.
Step 4. exposure:Photoresist is exposed under the action of mask plate, preparation T shape is to, nano wire pair.
Step 5. electron beam evaporation plating:Using electron beam evaporation system, by metal evaporation to T shape to the hole of, nano wire pair In.
Step 6. development:Corrosion development is carried out with developer solution to the photoresist after exposure.
Step 7. cleaning:Washing away photoresist can be obtained by corresponding structure.As shown in Figure 3.
Belt sensor is simulated using the wave optics module of finite element electromagnetic simulation software Comsol Multiphysics Sensing characteristics.A structural model should be constructed in software first and then periodic boundary condition is set again, it is anti-for boundary Penetrating situation can be eliminated the effects of the act by building perfect domination set, and last total is simulated.Calculate obtained sensing The Spectral Extinction curve graph of device, as shown in Figure 4.The incident wavelength and index of refraction relationship figure for calculating obtained sensor, such as Fig. 5 institute Show.The relational graph for calculating the quality factor of obtained sensor is as shown in Figure 6.
In other embodiments of the invention, the length of line style metal nanometer line is 80nm;The length of line style metal nanometer line Degree is 150nm;The length of the longitudinal edge of T-type metal nanometer line is 30nm;The length of the longitudinal edge of T-type metal nanometer line is 90nm;T-type The width of the longitudinal edge of metal nanometer line is 10nm;The width of the longitudinal edge of T-type metal nanometer line is 50nm;T-type metal nanometer line Height is 20nm;The height of T-type metal nanometer line is 50nm;The both ends of horizontal edge are at a distance from corresponding line style metal nanometer line 10nm;The both ends of horizontal edge are 60nm at a distance from corresponding line style metal nanometer line.

Claims (10)

1. it is a kind of based on T shape to and nano wire pair optical sensor, including dielectric layer, the metal from top to bottom set gradually Nanostructure and substrate, it is characterised in that:Metal Nano structure is dimeric structure, and metal Nano structure includes being set to substrate Upper surface on line style metal nano pair, line style metal nano to include parallel interval setting extend longitudinally line style gold Belong to nano wire, metal Nano structure further includes the T-type on the upper surface for being relatively arranged on substrate between line style metal nanometer line Metal nano pair, T-type metal nano is to including the setting of longitudinal edge relative spacing, horizontal edge T-type metal nanometer line disposed in parallel, each institute State the distance between the both ends of the horizontal edge of T-type metal nanometer line and corresponding line style metal nanometer line and two T-type metal nanos The distance between the respective longitudinal edge of line is equal, the length of the horizontal edge of the length and T-type metal nanometer line of the line style metal nanometer line Spend equal, the width of the width of the longitudinal edge of T-type metal nanometer line and the width of horizontal edge and line style metal nanometer line is equal, T-type The height of metal nanometer line is equal with the height of line style metal nanometer line.
2. it is according to claim 1 based on T shape to and nano wire pair optical sensor, it is characterised in that:The horizontal edge Both ends at a distance from corresponding line style metal nanometer line be 10-60nm.
3. it is according to claim 1 based on T shape to and nano wire pair optical sensor, it is characterised in that:The horizontal edge Both ends at a distance from corresponding line style metal nanometer line be 40nm.
4. it is according to claim 1 based on T shape to and nano wire pair optical sensor, it is characterised in that:The line style The length of metal nanometer line is 80-150nm.
5. it is according to claim 4 based on T shape to and nano wire pair optical sensor, it is characterised in that:The line style The length of metal nanometer line is 100nm.
6. it is according to claim 1 based on T shape to and nano wire pair optical sensor, it is characterised in that:The T-type gold The length for belonging to the longitudinal edge of nano wire is 30nm-90nm.
7. it is according to claim 1 based on T shape to and nano wire pair optical sensor, it is characterised in that:The line style The width of metal nanometer line is 10-50nm.
8. it is according to claim 7 based on T shape to and nano wire pair optical sensor, it is characterised in that:The line style The width of metal nanometer line is 20nm.
9. it is according to claim 1 based on T shape to and nano wire pair optical sensor, it is characterised in that:The T-type gold The height for belonging to nano wire is 20-50nm.
10. it is according to claim 9 based on T shape to and nano wire pair optical sensor, it is characterised in that:The T-type The height of metal nanometer line is 30nm.
CN201710907474.8A 2017-09-29 2017-09-29 Optical sensor based on T-shaped pair and nanowire pair Active CN108872151B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710907474.8A CN108872151B (en) 2017-09-29 2017-09-29 Optical sensor based on T-shaped pair and nanowire pair

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710907474.8A CN108872151B (en) 2017-09-29 2017-09-29 Optical sensor based on T-shaped pair and nanowire pair

Publications (2)

Publication Number Publication Date
CN108872151A true CN108872151A (en) 2018-11-23
CN108872151B CN108872151B (en) 2023-06-16

Family

ID=64325771

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710907474.8A Active CN108872151B (en) 2017-09-29 2017-09-29 Optical sensor based on T-shaped pair and nanowire pair

Country Status (1)

Country Link
CN (1) CN108872151B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111007036A (en) * 2019-12-30 2020-04-14 郑州大学 Refractive index sensor based on flat plate symmetrical structure
CN118258789A (en) * 2024-03-21 2024-06-28 南京航空航天大学 Terahertz metamaterial sensor with multiple resonance peak high Q values

Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100822992B1 (en) * 2007-03-19 2008-04-16 광주과학기술원 Nanowire field-effect transistor and manufacturing method of the same
US20080102319A1 (en) * 2006-10-13 2008-05-01 Alexandre Bratkovski Composite material with conductive nanowires
EP2133688A1 (en) * 2008-06-11 2009-12-16 Koninklijke Philips Electronics N.V. Nanoantenna and uses thereof
US20100129261A1 (en) * 2007-06-29 2010-05-27 Korea Advanced Institute Of Science And Technology Spectral sensor for surface-enhanced raman scattering
CN102156110A (en) * 2011-05-16 2011-08-17 浙江工商职业技术学院 Sensing method based on local surface plasma resonance
CN102244002A (en) * 2011-07-14 2011-11-16 合肥工业大学 Preparation method of heterojunction with metal/semiconductor nanometer wire crossing structure
US20110309237A1 (en) * 2010-06-22 2011-12-22 President And Fellows Of Harvard College Light absorption and filtering properties of vertically oriented semiconductor nano wires
CN102565929A (en) * 2012-01-16 2012-07-11 北京航空航天大学 Surface plasmon polaritons optical waveguide of nanowire arrays
CN202898010U (en) * 2012-11-08 2013-04-24 浙江工商职业技术学院 Novel surface plasma sensing nanometer material structure
US20140034907A1 (en) * 2011-04-14 2014-02-06 Jeong Soo Lee Nanowire sensor having nanowire of network structure
US20140370326A1 (en) * 2013-06-18 2014-12-18 International Business Machines Corporation Nanoporous structures by reactive ion etching
CN104374745A (en) * 2014-11-17 2015-02-25 中国人民解放军国防科学技术大学 Sensor based on Fano resonance characteristics of dielectric nanostructure
US20150118124A1 (en) * 2012-05-12 2015-04-30 Mohammadreza Khorasaninejad Structural colorimetric sensor
CN104634437A (en) * 2015-01-27 2015-05-20 天津理工大学 Dual-Fano resonant feature array for symmetrical nano-rod tripolymer and sensing application thereof
US20150139856A1 (en) * 2012-04-27 2015-05-21 Seiko Epson Corporation Optical device and detection device
CN105870315A (en) * 2016-04-05 2016-08-17 南京大学 Polarization-sensitive efficient superconducting nanowire single photon detector and design method therefor
CN105947972A (en) * 2016-04-25 2016-09-21 郑州大学 Multiple nano-rod dimer array structure, manufacture method thereof, method for exciting Fano resonance of multiple nano-rod dimer array structure, and optical sensor comprising multiple nano-rod dimer array structure
CN207181293U (en) * 2017-09-29 2018-04-03 郑州大学 Optical sensor based on T-shaped pair and nano wire pair

Patent Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080102319A1 (en) * 2006-10-13 2008-05-01 Alexandre Bratkovski Composite material with conductive nanowires
KR100822992B1 (en) * 2007-03-19 2008-04-16 광주과학기술원 Nanowire field-effect transistor and manufacturing method of the same
US20100129261A1 (en) * 2007-06-29 2010-05-27 Korea Advanced Institute Of Science And Technology Spectral sensor for surface-enhanced raman scattering
EP2133688A1 (en) * 2008-06-11 2009-12-16 Koninklijke Philips Electronics N.V. Nanoantenna and uses thereof
US20110309237A1 (en) * 2010-06-22 2011-12-22 President And Fellows Of Harvard College Light absorption and filtering properties of vertically oriented semiconductor nano wires
US20140034907A1 (en) * 2011-04-14 2014-02-06 Jeong Soo Lee Nanowire sensor having nanowire of network structure
CN102156110A (en) * 2011-05-16 2011-08-17 浙江工商职业技术学院 Sensing method based on local surface plasma resonance
CN102244002A (en) * 2011-07-14 2011-11-16 合肥工业大学 Preparation method of heterojunction with metal/semiconductor nanometer wire crossing structure
CN102565929A (en) * 2012-01-16 2012-07-11 北京航空航天大学 Surface plasmon polaritons optical waveguide of nanowire arrays
US20150139856A1 (en) * 2012-04-27 2015-05-21 Seiko Epson Corporation Optical device and detection device
US20150118124A1 (en) * 2012-05-12 2015-04-30 Mohammadreza Khorasaninejad Structural colorimetric sensor
CN202898010U (en) * 2012-11-08 2013-04-24 浙江工商职业技术学院 Novel surface plasma sensing nanometer material structure
US20140370326A1 (en) * 2013-06-18 2014-12-18 International Business Machines Corporation Nanoporous structures by reactive ion etching
CN104374745A (en) * 2014-11-17 2015-02-25 中国人民解放军国防科学技术大学 Sensor based on Fano resonance characteristics of dielectric nanostructure
CN104634437A (en) * 2015-01-27 2015-05-20 天津理工大学 Dual-Fano resonant feature array for symmetrical nano-rod tripolymer and sensing application thereof
CN105870315A (en) * 2016-04-05 2016-08-17 南京大学 Polarization-sensitive efficient superconducting nanowire single photon detector and design method therefor
CN105947972A (en) * 2016-04-25 2016-09-21 郑州大学 Multiple nano-rod dimer array structure, manufacture method thereof, method for exciting Fano resonance of multiple nano-rod dimer array structure, and optical sensor comprising multiple nano-rod dimer array structure
CN207181293U (en) * 2017-09-29 2018-04-03 郑州大学 Optical sensor based on T-shaped pair and nano wire pair

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
ANASTASIONS H.PANARETOS ET AL.: "Tuning the optical response of a dimer nanoantenna using plasmonic nanoring loads", SCIENTIFIC REPORTS *
LUCHAN LIN ET AL.: "In situ nanojoining of Y-and T-shaped silver nanowires structures using femtosecond laser radiation", NANOTECHNOLOGY, no. 27 *
YUN BINFENT ET AL.: "Fano resonances induced by strong interactions between dipole and multipole plasmons in T-shaped nanorod dimer", PLASMONICS, no. 9 *
庞绍芳;屈世显;张永元;解忧;郝丽梅;: "有限长金属纳米线调控纳米线波导的传输特性研究", 陕西师范大学学报(自然科学版), no. 05 *
李健;白静;: "金纳米交叉结构的光学性质及传感特性研究", 半导体光电, no. 03 *
马文英;罗吉;许诚昕;凌味未;汪为民;: "金属纳米结构对光谱响应及折射率灵敏度的影响", 光学学报, no. 12 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111007036A (en) * 2019-12-30 2020-04-14 郑州大学 Refractive index sensor based on flat plate symmetrical structure
CN111007036B (en) * 2019-12-30 2022-03-25 郑州大学 Refractive index sensor based on flat plate symmetrical structure
CN118258789A (en) * 2024-03-21 2024-06-28 南京航空航天大学 Terahertz metamaterial sensor with multiple resonance peak high Q values

Also Published As

Publication number Publication date
CN108872151B (en) 2023-06-16

Similar Documents

Publication Publication Date Title
CN104376898B (en) Patterned conductive film, manufacturing method thereof and touch panel
US8427639B2 (en) Surfaced enhanced Raman spectroscopy substrates
CN103197368B (en) A kind of sandwich structure wire grid broadband polarizer and preparation method thereof
CN108872151A (en) It is a kind of based on T shape to and nano wire pair optical sensor
CN207181293U (en) Optical sensor based on T-shaped pair and nano wire pair
CN104495742A (en) Process for processing surface plasmon polariton coupled nano array based on scallop effect
US20160154508A1 (en) Optical structures having integrated component layers
CN104658906B (en) A kind of preparation method of semiconductor planarization layer
TW201409314A (en) Sensing layer and method for producing the same
CN105320328B (en) Touch-control display panel
WO2018000925A1 (en) Substrate, display apparatus and a method for manufacturing the substrate
WO2015085772A1 (en) Fabrication method of substrate
TW201403687A (en) Touch panel fabricating method
CN107193184A (en) A kind of method for preparing high-precision chromium plate mask plate circuitous pattern
TWI380326B (en)
CN104777930B (en) OGS touch screen and its manufacture method, OGS touching devices
TW201314855A (en) Method for producing conductive circuits and touch screen
TWI464838B (en) Method of manufacturing a touch panel
WO2015100934A1 (en) Liquid crystal lens, manufacturing method therefor and display device
KR20170112310A (en) Transparent electrode structure and method for manufacturing thereof
US20140092027A1 (en) Touch panel and method for producing same
Razaulla et al. Multiple linear regression modeling of nanosphere self-assembly via spin coating
CN105892123A (en) Base color homogenizing method of flexible liquid crystal display
TW201620026A (en) Cutting method for forming cutting channel protection on base plate and surface plate structure of base plate
CN109597250A (en) The production method of the production method and its stereo electrod of blue-phase liquid crystal panel

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant