CN108807119B - 紧凑型致偏磁体 - Google Patents

紧凑型致偏磁体 Download PDF

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Publication number
CN108807119B
CN108807119B CN201810319094.7A CN201810319094A CN108807119B CN 108807119 B CN108807119 B CN 108807119B CN 201810319094 A CN201810319094 A CN 201810319094A CN 108807119 B CN108807119 B CN 108807119B
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CN
China
Prior art keywords
coils
magnet
yoke
magnetic field
emitted electrons
Prior art date
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Expired - Fee Related
Application number
CN201810319094.7A
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English (en)
Chinese (zh)
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CN108807119A (zh
Inventor
R·E·兰德
V·滋金
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Imatrex Inc
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Imatrex Inc
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Publication of CN108807119A publication Critical patent/CN108807119A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/58—Arrangements for focusing or reflecting ray or beam
    • H01J29/64—Magnetic lenses
    • H01J29/66—Magnetic lenses using electromagnetic means only
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/02—Permanent magnets [PM]
    • H01F7/0273—Magnetic circuits with PM for magnetic field generation
    • H01F7/0278—Magnetic circuits with PM for magnetic field generation for generating uniform fields, focusing, deflecting electrically charged particles
    • H01F7/0284—Magnetic circuits with PM for magnetic field generation for generating uniform fields, focusing, deflecting electrically charged particles using a trimmable or adjustable magnetic circuit, e.g. for a symmetric dipole or quadrupole magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70—Arrangements for deflecting ray or beam
    • H01J29/72—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
    • H01J29/76—Deflecting by magnetic fields only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/04—Magnet systems, e.g. undulators, wigglers; Energisation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/152—Magnetic means
    • H01J2237/1526—For X-Y scanning
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2806—Secondary charged particle
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266—Measurement of magnetic or electric fields in the object; Lorentzmicroscopy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Particle Accelerators (AREA)
CN201810319094.7A 2017-04-27 2018-04-11 紧凑型致偏磁体 Expired - Fee Related CN108807119B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201762491122P 2017-04-27 2017-04-27
US62/491,122 2017-04-27
US15/625,921 2017-06-16
US15/625,921 US10290463B2 (en) 2017-04-27 2017-06-16 Compact deflecting magnet

Publications (2)

Publication Number Publication Date
CN108807119A CN108807119A (zh) 2018-11-13
CN108807119B true CN108807119B (zh) 2022-01-21

Family

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Family Applications (1)

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CN201810319094.7A Expired - Fee Related CN108807119B (zh) 2017-04-27 2018-04-11 紧凑型致偏磁体

Country Status (7)

Country Link
US (3) US10290463B2 (cg-RX-API-DMAC10.html)
EP (2) EP3396696A1 (cg-RX-API-DMAC10.html)
JP (2) JP2018190709A (cg-RX-API-DMAC10.html)
KR (2) KR20180120603A (cg-RX-API-DMAC10.html)
CN (1) CN108807119B (cg-RX-API-DMAC10.html)
RU (1) RU2693565C1 (cg-RX-API-DMAC10.html)
TW (1) TWI670745B (cg-RX-API-DMAC10.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10290463B2 (en) 2017-04-27 2019-05-14 Imatrex, Inc. Compact deflecting magnet
US10395887B1 (en) * 2018-02-20 2019-08-27 Technische Universiteit Delft Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column
US10504687B2 (en) * 2018-02-20 2019-12-10 Technische Universiteit Delft Signal separator for a multi-beam charged particle inspection apparatus
US11114270B2 (en) * 2018-08-21 2021-09-07 Axcelis Technologies, Inc. Scanning magnet design with enhanced efficiency
DE102019004124B4 (de) 2019-06-13 2024-03-21 Carl Zeiss Multisem Gmbh Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System
TWI771003B (zh) * 2020-06-17 2022-07-11 漢辰科技股份有限公司 混合磁鐵結構
US20250232944A1 (en) * 2021-12-07 2025-07-17 Hitachi High-Tech Corporation Multipole lens and charged particle beam device
KR102891279B1 (ko) * 2025-03-13 2025-11-25 박창하 코팅막 균일도를 향상시킨 자장여과아크장치

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3622679A (en) * 1970-09-29 1971-11-23 Air Reduction Heating system for electron beam furnace
JPS4927712A (cg-RX-API-DMAC10.html) * 1972-07-11 1974-03-12
US3814829A (en) * 1971-10-26 1974-06-04 B Movchan Device for electron-beam heating of materials mainly for their melting and evaporation
JPS5225562A (en) * 1975-08-21 1977-02-25 Hidetsugu Ikegami Multi-electrode unit
US4105890A (en) * 1976-05-03 1978-08-08 Movchan Boris Alexeevich Device for electron-beam heating of materials
US6292538B1 (en) * 1999-02-01 2001-09-18 Siemens Aktiengesellschaft X-ray tube with flying focus
WO2008044194A2 (en) * 2006-10-13 2008-04-17 Philips Intellectual Property & Standards Gmbh Electron optical apparatus, x-ray emitting device and method of producing an electron beam

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50117727U (cg-RX-API-DMAC10.html) 1974-03-09 1975-09-26
US4221937A (en) * 1978-08-10 1980-09-09 Fidelity-Research, Inc. Moving iron type cartridge
DE19631899A1 (de) * 1996-08-07 1998-02-12 Siemens Ag Röntgenröhre
DE19634456A1 (de) * 1996-08-26 1998-03-05 Rainer Dr Spehr Elektronenoptische Linsenanordnung mit spaltförmigem Öffnungsquerschnitt
JP3449198B2 (ja) * 1997-10-22 2003-09-22 日新電機株式会社 イオン注入装置
US6160869A (en) * 1998-10-01 2000-12-12 Imatron, Inc. Chicane magnet focusing system and deflection magnet for a scanning electron beam computed tomography system
UA42392C2 (uk) * 2001-02-13 2004-04-15 Александра Клавдія Мельник Багатоканальний лінійний індукційний прискорювач заряджених частинок
US6933507B2 (en) 2002-07-17 2005-08-23 Kenneth H. Purser Controlling the characteristics of implanter ion-beams
WO2008115339A1 (en) * 2007-03-15 2008-09-25 White Nicholas R Open-ended electromagnetic corrector assembly and method for deflecting, focusing, and controlling the uniformity of a traveling ion beam
JP5028485B2 (ja) * 2008-05-13 2012-09-19 ホシデン株式会社 電気音響変換器
DE102013104778A1 (de) * 2013-05-08 2014-11-13 Ruprecht-Karls-Universität Heidelberg Vorrichtung zur Erfassung und Regelung eines durch einen Elektromagneten erzeugten Magnetfelds
JP6227294B2 (ja) * 2013-06-20 2017-11-08 惠州市大亜湾永昶電子工業有限公司 手振れ抑制機能付きレンズ駆動装置
US9620327B2 (en) * 2014-12-26 2017-04-11 Axcelis Technologies, Inc. Combined multipole magnet and dipole scanning magnet
AT516871B1 (de) * 2015-03-05 2018-03-15 Bhm Tech Produktionsgesellschaft M B H Elektromagnetischer Signalwandler für einen Knochenleitungshörer
US9793087B2 (en) 2015-09-10 2017-10-17 Varian Semiconductor Equipment Associates, Inc. Techniques and apparatus for manipulating an ion beam
US10290463B2 (en) 2017-04-27 2019-05-14 Imatrex, Inc. Compact deflecting magnet

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3622679A (en) * 1970-09-29 1971-11-23 Air Reduction Heating system for electron beam furnace
US3814829A (en) * 1971-10-26 1974-06-04 B Movchan Device for electron-beam heating of materials mainly for their melting and evaporation
JPS4927712A (cg-RX-API-DMAC10.html) * 1972-07-11 1974-03-12
JPS5225562A (en) * 1975-08-21 1977-02-25 Hidetsugu Ikegami Multi-electrode unit
US4105890A (en) * 1976-05-03 1978-08-08 Movchan Boris Alexeevich Device for electron-beam heating of materials
US6292538B1 (en) * 1999-02-01 2001-09-18 Siemens Aktiengesellschaft X-ray tube with flying focus
WO2008044194A2 (en) * 2006-10-13 2008-04-17 Philips Intellectual Property & Standards Gmbh Electron optical apparatus, x-ray emitting device and method of producing an electron beam

Also Published As

Publication number Publication date
KR102088144B1 (ko) 2020-03-11
EP3537469A1 (en) 2019-09-11
US10290463B2 (en) 2019-05-14
CN108807119A (zh) 2018-11-13
KR20190129786A (ko) 2019-11-20
TWI670745B (zh) 2019-09-01
JP7022718B2 (ja) 2022-02-18
US10332718B1 (en) 2019-06-25
EP3396696A1 (en) 2018-10-31
US20190259565A1 (en) 2019-08-22
KR20180120603A (ko) 2018-11-06
RU2693565C1 (ru) 2019-07-03
US20190198286A1 (en) 2019-06-27
JP2019149387A (ja) 2019-09-05
TW201842523A (zh) 2018-12-01
JP2018190709A (ja) 2018-11-29
US20180315578A1 (en) 2018-11-01

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