CN108698918A - The manufacturing method of laminated body, the glass with antireflection film and solar cell module - Google Patents
The manufacturing method of laminated body, the glass with antireflection film and solar cell module Download PDFInfo
- Publication number
- CN108698918A CN108698918A CN201780013405.0A CN201780013405A CN108698918A CN 108698918 A CN108698918 A CN 108698918A CN 201780013405 A CN201780013405 A CN 201780013405A CN 108698918 A CN108698918 A CN 108698918A
- Authority
- CN
- China
- Prior art keywords
- film
- particle
- glass
- metal oxide
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 90
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 42
- 239000002245 particle Substances 0.000 claims abstract description 80
- 239000008199 coating composition Substances 0.000 claims abstract description 75
- 238000000576 coating method Methods 0.000 claims abstract description 72
- 239000011248 coating agent Substances 0.000 claims abstract description 69
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 58
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 58
- 238000000034 method Methods 0.000 claims abstract description 54
- 230000008569 process Effects 0.000 claims abstract description 44
- 239000007787 solid Substances 0.000 claims abstract description 34
- 239000002243 precursor Substances 0.000 claims abstract description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 194
- 239000000377 silicon dioxide Substances 0.000 claims description 98
- 235000012239 silicon dioxide Nutrition 0.000 claims description 72
- 239000008187 granular material Substances 0.000 claims description 62
- 238000009835 boiling Methods 0.000 claims description 29
- 238000001354 calcination Methods 0.000 claims description 23
- 239000011164 primary particle Substances 0.000 claims description 23
- 239000003960 organic solvent Substances 0.000 claims description 19
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical group [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 18
- 239000004094 surface-active agent Substances 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 14
- 239000004744 fabric Substances 0.000 claims description 5
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 5
- 238000010422 painting Methods 0.000 claims description 4
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 description 212
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 32
- 239000012530 fluid Substances 0.000 description 29
- 239000002585 base Substances 0.000 description 26
- 239000000463 material Substances 0.000 description 24
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 23
- 238000001035 drying Methods 0.000 description 21
- 239000011856 silicon-based particle Substances 0.000 description 18
- 239000000470 constituent Substances 0.000 description 17
- 239000006185 dispersion Substances 0.000 description 14
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 12
- 239000002562 thickening agent Substances 0.000 description 12
- 229910052783 alkali metal Inorganic materials 0.000 description 11
- 239000004615 ingredient Substances 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- 150000001340 alkali metals Chemical class 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 239000011734 sodium Substances 0.000 description 8
- 239000012798 spherical particle Substances 0.000 description 8
- 239000003021 water soluble solvent Substances 0.000 description 8
- 239000004215 Carbon black (E152) Substances 0.000 description 7
- 235000014443 Pyrus communis Nutrition 0.000 description 7
- 239000004115 Sodium Silicate Substances 0.000 description 7
- 229930195733 hydrocarbon Natural products 0.000 description 7
- 150000002430 hydrocarbons Chemical class 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 239000002736 nonionic surfactant Substances 0.000 description 7
- 235000019795 sodium metasilicate Nutrition 0.000 description 7
- 229910052911 sodium silicate Inorganic materials 0.000 description 7
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical group [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 239000004372 Polyvinyl alcohol Substances 0.000 description 6
- 239000012080 ambient air Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 6
- 229910052912 lithium silicate Inorganic materials 0.000 description 6
- 229920002451 polyvinyl alcohol Polymers 0.000 description 6
- 230000002441 reversible effect Effects 0.000 description 6
- -1 silicon alkoxide Chemical class 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000004408 titanium dioxide Substances 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 229910052681 coesite Inorganic materials 0.000 description 5
- 229910052906 cristobalite Inorganic materials 0.000 description 5
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 229910052744 lithium Inorganic materials 0.000 description 5
- 229910052700 potassium Inorganic materials 0.000 description 5
- 235000019353 potassium silicate Nutrition 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 229910052682 stishovite Inorganic materials 0.000 description 5
- 229910052905 tridymite Inorganic materials 0.000 description 5
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 4
- 229920002125 Sokalan® Polymers 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- VDGJOQCBCPGFFD-UHFFFAOYSA-N oxygen(2-) silicon(4+) titanium(4+) Chemical compound [Si+4].[O-2].[O-2].[Ti+4] VDGJOQCBCPGFFD-UHFFFAOYSA-N 0.000 description 4
- 239000004584 polyacrylic acid Substances 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- 125000005372 silanol group Chemical group 0.000 description 4
- 208000037656 Respiratory Sounds Diseases 0.000 description 3
- 229910003978 SiClx Inorganic materials 0.000 description 3
- 239000004480 active ingredient Substances 0.000 description 3
- 239000003570 air Substances 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 235000013399 edible fruits Nutrition 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000007591 painting process Methods 0.000 description 3
- 230000036961 partial effect Effects 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 241000790917 Dioxys <bee> Species 0.000 description 2
- 241000196324 Embryophyta Species 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- ZZHNUBIHHLQNHX-UHFFFAOYSA-N butoxysilane Chemical class CCCCO[SiH3] ZZHNUBIHHLQNHX-UHFFFAOYSA-N 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 229940117927 ethylene oxide Drugs 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000003678 scratch resistant effect Effects 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000002689 soil Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- QYGBYAQGBVHMDD-XQRVVYSFSA-N (z)-2-cyano-3-thiophen-2-ylprop-2-enoic acid Chemical compound OC(=O)C(\C#N)=C/C1=CC=CS1 QYGBYAQGBVHMDD-XQRVVYSFSA-N 0.000 description 1
- KILURZWTCGSYRE-LNTINUHCSA-K (z)-4-bis[[(z)-4-oxopent-2-en-2-yl]oxy]alumanyloxypent-3-en-2-one Chemical compound CC(=O)\C=C(\C)O[Al](O\C(C)=C/C(C)=O)O\C(C)=C/C(C)=O KILURZWTCGSYRE-LNTINUHCSA-K 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 244000050510 Cunninghamia lanceolata Species 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 206010017062 Formication Diseases 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- MXOXXSJXKHYQIL-UHFFFAOYSA-N O[Si](O)(O)O.N.N.N.N Chemical compound O[Si](O)(O)O.N.N.N.N MXOXXSJXKHYQIL-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- TUVYSBJZBYRDHP-UHFFFAOYSA-N acetic acid;methoxymethane Chemical class COC.CC(O)=O TUVYSBJZBYRDHP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001399 aluminium compounds Chemical class 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- KNOXYHBCQYPISX-UHFFFAOYSA-N butoxysilicon Chemical compound CCCCO[Si] KNOXYHBCQYPISX-UHFFFAOYSA-N 0.000 description 1
- RPPBZEBXAAZZJH-UHFFFAOYSA-N cadmium telluride Chemical compound [Te]=[Cd] RPPBZEBXAAZZJH-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- UIPVMGDJUWUZEI-UHFFFAOYSA-N copper;selanylideneindium Chemical compound [Cu].[In]=[Se] UIPVMGDJUWUZEI-UHFFFAOYSA-N 0.000 description 1
- 230000009193 crawling Effects 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- KUCGHDUQOVVQED-UHFFFAOYSA-N ethyl(tripropoxy)silane Chemical compound CCCO[Si](CC)(OCCC)OCCC KUCGHDUQOVVQED-UHFFFAOYSA-N 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 150000004676 glycans Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- RJMRIDVWCWSWFR-UHFFFAOYSA-N methyl(tripropoxy)silane Chemical compound CCCO[Si](C)(OCCC)OCCC RJMRIDVWCWSWFR-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001282 polysaccharide Polymers 0.000 description 1
- 239000005017 polysaccharide Substances 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 230000010148 water-pollination Effects 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Life Sciences & Earth Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Photovoltaic Devices (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The present invention provides a kind of manufacturing method of laminated body, glass and solar cell module with antireflection film, and the manufacturing method of the laminated body is with the following process:By aqueous coating compositions that at least one of precursor of the particle containing metal oxide and metal oxide and solid component concentration are 10 mass % or more with 1.8mL/m2Coating weight below is applied to the process for forming coated film on the face with concaveconvex structure of the glass baseplate with concaveconvex structure at least one side;And the process to form antireflection film will be dried by being coated with the coated film formed.
Description
Technical field
This disclosure relates to a kind of manufacturing method of laminated body, glass and solar cell module with antireflection film.
Background technology
Aqueous coating fluid uses the solvent containing water, and the surface energy for being formed by film is high, and the transparency is excellent, therefore makes
For various uses.As specific purposes, for example, can enumerate antireflection film, optical lens, optical filter, various displays it is thin
Film field-effect transistor (TFT) planarization film, anti-condensation film, anti-soil film, surface protection film etc..
Wherein, antireflection film can be applied to such as solar cell module, monitor camera, lighting apparatus, mark
Protective film, therefore be useful.
As the aqueous coating fluid that can be used in the purposes such as antireflection film, propose have containing titanium dioxide silicon grain in recent years
The various coating fluids of son.For example, in solar cell module, in the glass (institute that the most surface layer of the side of sunlight incidence configures
The windshield of meaning) in influence of the reflection characteristic to generating efficiency it is big, therefore from the viewpoint of improving generating efficiency, propose
There is the anti-reflection coating of various glass.
Also, it is used sometimes in glass from the viewpoint of assigning anti-glare as the windshield of solar cell module
Glass surface has the processing glass (so-called figured glass (figured glass)) of the concaveconvex structure of pear skin apperance.With
On the glass surface of concaveconvex structure, it is difficult to form the antireflection film of the film thickness with high uniformity by being coated with.
As the example of aqueous coating fluid, such as disclosed viscosity in Japanese Unexamined Patent Publication 2015-108061 bulletins
The coating composition for including metal oxide of specified range is adjusted to surface tension.In Japanese Unexamined Patent Publication 2015-108061
In the coating composition of bulletin, viscosity is improved by adding thickener, to have the recessed of the base material of concaveconvex structure on surface
Also film thickness unevenness can be reduced when being coated on nonreentrant surface.
Also, such as in International Publication No. 2013/051620, as the article with low-reflection film on base material
Manufacturing method discloses the coating composition that will be 1.0~10.0mPas comprising the particle and viscosity disperseed in dispersant
When being coated to form low-reflection film by reverse roll coater, roller rotary speed is set as to the technology of rated condition.
Invention content
The invention technical task to be solved
In general, the antireflection about antireflection film, the refractive index and film thickness of film becomes important factor.Refractive index is
1.23 or so are suitable for antireflection, and film thickness is that 135nm~150nm or so is suitable for antireflection.However, as described, if being intended to
The convex-concave surface of the processing glass (figured glass) of concaveconvex structure with pear skin apperance forms a film, then coating fluid itself is opposite
It is had an impact in the characters such as the wetability of base material or flattening effect, therefore can not actually obtain the film of uniform film thickness.
Therefore, as described above, proposing there are various technologies all the time, but especially in the antireflection of the interference effect using light
Higher thickness and precision is required in film, therefore it is required that further improving the thickness evenness of the film formed on convex-concave surface.Mirror
In such case, in the coating composition described in Japanese Unexamined Patent Publication 2015-108061 bulletins, set by adding thickener
For high viscosity, so as to the improvement of the estimated uneven thickness relative to convex-concave surface, but it is still insufficient, and sometimes
Mist degree can be made to deteriorate because adding thickener, fail to improve antireflection.
Also, in the coating technique described in International Publication No. 2013/051620, it is coated with by adjusting reverse roll
The roller rotary speed of machine can be coated with uniform thickness on convex-concave surface, but think the planarization by coating fluid
Effect, finally will produce uneven thickness.
One embodiment of the present invention is completed in view of above-mentioned, and providing one kind can obtain with concaveconvex structure
Substrate surface on the laminated body with the high film of film thickness uniformity laminated body manufacturing method, antireflection it is excellent with anti-
The excellent solar cell module of the glass and generating efficiency of reflectance coating.
Means for solving technical task
Include following manner in the present invention.
A kind of manufacturing methods of laminated body of 1 > of <, it is with the following process:By particle and gold containing metal oxide
At least one of precursor of category oxide and the aqueous coating compositions that solid component concentration is 10 mass % or more, with
1.8mL/m2Coating weight below be applied on at least one side glass baseplate with concaveconvex structure with concaveconvex structure
Face on come the process that forms coated film;And the coated film formed by coating is dried to form the work of antireflection film
Sequence.
The manufacturing method of laminated bodies of 2 > of < according to 1 > of <, wherein the particle of metal oxide is silica
The precursor of particle, metal oxide is silicate.
The manufacturing method of laminated bodies of 3 > of < according to 2 > of <, wherein silicon dioxide granule is spherical silicon dioxide.
The manufacturing method of laminated bodies of 4 > of < according to any one of 1 > of <~<, 3 >, wherein metal oxide
The average primary particle diameter of particle is 1nm~10nm.
The manufacturing method of laminated bodies of 5 > of < according to any one of 1 > of <~<, 4 >, wherein aqueous coating compositions
Viscosity in 25 DEG C of object is 1mPas~3mPas.
The manufacturing method of laminated bodies of 6 > of < according to any one of 1 > of <~<, 5 >, wherein aqueous coating compositions
Object includes surfactant, and the content of surfactant is 0.1 mass %~0.5 relative to the gross mass of aqueous coating compositions
Quality %.
The manufacturing method of laminated bodies of 7 > of < according to any one of 1 > of <~<, 6 >, wherein aqueous coating compositions
Object includes the water-miscible organic solvent that boiling point is 120 DEG C or more, and the content of water-miscible organic solvent is relative to aqueous coating compositions
The gross mass of object is 0.1 mass of mass %~1.5 %.
The manufacturing method of laminated bodies of 8 > of < according to any one of 1 > of <~<, 7 >, wherein aqueous coating compositions
Object includes the silicate of the particle of metal oxide and the precursor as metal oxide, the content phase of the particle of metal oxide
The ratio between content for silicate is 20/1~4/1 by quality ratio.
The manufacturing method of laminated bodies of 9 > of < according to any one of 1 > of <~<, 8 >, the manufacture of the laminated body
The process that method also has calcining antireflection film.
A kind of glass with antireflection film of 10 > of <, has:The glass with concaveconvex structure at least one side
Base material;And it is configured at the face with concaveconvex structure of glass baseplate, average film thickness is 120nm~180nm, and standard deviation is
20nm antireflection films below.
Glass with antireflection film of 11 > of < according to 10 > of <, wherein antireflection film contains metal oxide
Particle.
Glass with antireflection film of 12 > of < according to 11 > of <, wherein the particle of metal oxide is dioxy
SiClx particle.
A kind of solar cell modules of 13 > of < have and carry antireflection described in any one of 10 > of <~<, 12 >
The glass of film.
Invention effect
According to an embodiment of the present invention, a kind of can obtain on the substrate surface with concaveconvex structure with film is provided
The manufacturing method of the laminated body of the laminated body of the film of thick high uniformity.
According to an embodiment of the present invention, provide a kind of antireflection the excellent glass with antireflection film.
According to an embodiment of the present invention, a kind of solar cell module that generating efficiency is excellent is provided.
Description of the drawings
Fig. 1 is the stacking of the shape for illustrating to be formed with followed base material surface and the appearance of the film with film thickness uniformity
The schematic sectional view of body.
Fig. 2 is the stacking for illustrating that the shape of substrate surface is made to planarize and be formed with the appearance of the film of membrane thickness unevenness
The schematic sectional view of body.
Specific implementation mode
Hereinafter, the manufacturing method to the laminated body of the disclosure, the glass with antireflection film and solar cell module
It is described in detail.
In the present specification, the numberical range expression that "~" indicates is used to make the front and back numerical value for being recorded in "~" respectively
The range being included for minimum value and maximum value.
Also, in the present specification, the amount about each ingredient in composition, when there is a variety of be equivalent in the composition
When the substance of each ingredient, as long as no special explanation, then it represents that the total amount of existing many kinds of substance in the composition.
In the present specification, " process " this term not only indicates independent process, when can not be with the clear area of other processes
Timesharing is then contained in this term as long as the expected purpose of its process can be realized.
" aqueous " in aqueous coating compositions refers to containing water as solvent in coating composition, and in coating compositions
The ratio of shared water is most in total solvent in object, and the water phase preferably in coating composition is 50 for the ratio of total solvent
The situation of quality % or more.
The manufacturing method > of < laminated bodies
The manufacturing method of the laminated body of the disclosure is with the following process:By particle and metal oxygen containing metal oxide
At least one of precursor of compound and solid component concentration are the aqueous coating compositions of 10 mass % or more with 1.8mL/m2
It is (following that coating weight below is applied to the face with concaveconvex structure of the glass baseplate with concaveconvex structure at least one side
Also referred to as " convex-concave surface ".) on come formed coated film process (below also referred to as " film formation process ".);And painting will be passed through
The process that the coated film that cloth is formed is dried to form antireflection film is (below also referred to as " drying process ".).
In the manufacturing method of the laminated body of the disclosure, as needed, there can be calcination process, there can also be scavenger
The other processes such as sequence, surface treatment procedure, cooling process.
Conventionally, there is known the technology of antireflection film is formed using the aqueous coating fluid containing silicon dioxide granule, but
It has not yet been reached to establish and can form uniform film thickness when forming antireflection film on the face with concaveconvex structure of glass baseplate
Antireflection film and the technology for showing high antireflection.I.e. when base material has concaveconvex structure, by the coating for making surface planarisation
The film thickness of the flowing of liquid, recess portion thickens, and the film thickness of protrusion is thinning, and it is uneven to generate film thickness.In antireflection film, film thickness is to determine to prevent
Reflexive key factor, this film thickness unevenness reduce antireflection.In order to inhibit the stream for the coating fluid for making surface planarisation
It is dynamic, it is contemplated that the viscosity of coating fluid, surface tension, the thickness of coated film, coated film rate of drying etc. influence, the present inventor
Find that the effect of the thickness of coated film is big under study for action, so as to complete the disclosure.
I.e. in the disclosure, it finds when forming antireflection film on the convex-concave surface in glass baseplate come when manufacturing laminated body,
If by solid component concentration be 10 mass % or more high aqueous coating compositions with 1.8mL/m2Less coating weight below
It is coated to form a film, then can form the high film of film thickness uniformity according to the concaveconvex shape of base material, antireflection can be obtained
The excellent antireflection film of property.
(painting process)
In painting process, by least one of precursor of the particle containing metal oxide and metal oxide and admittedly
Body constituent concentration is the aqueous coating compositions of 10 mass % or more with 1.8mL/m2Coating weight below is applied at least one
On side on the face with concaveconvex structure of the glass baseplate with concaveconvex structure.I.e. by the high aqueous coating of solid component concentration
Composition is coated into film.
Thus, such as Fig. 1, the counnter attack of the film thickness of high uniformity can be formed according to the concaveconvex shape on the surface of base material 2
Penetrate film 4.As a result, it is possible to obtain the excellent antireflection film of antireflection on the glass baseplate with concaveconvex structure.In previous skill
In art, if the concaveconvex shape of Fig. 2, the surface of base material 2 are planarized by coating fluid, become the antireflection film 6 of membrane thickness unevenness.
The coating weight of aqueous coating compositions is 1.8mL/m2Below.
By the way that coating weight is set as above range, be combined with each other with aftermentioned solid component concentration, can obtain relative to
The trackability of concaveconvex shape can obtain the excellent film of antireflection.From reason same as described above, coating weight is preferably
1.6mL/m2Hereinafter, further preferably 1.4mL/m2Below.Also, from the viewpoint of coating accuracy is better, coating weight is excellent
It is selected as 0.1mL/m2More than, more preferably 0.5mL/m2More than, further preferably 1mL/m2More than.
Solid component concentration in aqueous coating compositions is 10 mass % or more.
It by the way that solid component concentration is set as above range, be combined with each other, can be obtained relative to recessed with above-mentioned coating weight
The trackability of convex form can obtain the excellent film of antireflection.Also, solid component concentration is preferably 15 mass % or less.
Solid component concentration in aqueous coating compositions can be adjusted by the content of solvent especially water.
There is no particular limitation for the method for coating aqueous coating compositions on base material.It, can be appropriate as coating method
Select coating method well known to spray coating method, spread coating, rolling method (including inverse rolling method), stick coating method, dip coating etc..Wherein, inverse
Roller coating is preferred from the viewpoint of the uniformity and productivity of coated film.
Coating can be carried out only on a face of glass baseplate, can also be carried out on two faces of glass baseplate.
(drying process)
In drying process, the coated film formed in painting process is dried to form antireflection film.
It is to be agglomerated by silicon dioxide granule and form film at least to implement dry film (antireflection film).Think silica
In the condensed film of particle, the refractive index of film is reduced because of the gap between silicon dioxide granule, and antireflection is excellent.
When using spherical silicon dioxide granule when, in the drying process, spherical silicon dioxide particle closely configure and
Form careful film.Think to become careful by film, hardness is got higher, and scratch resistance is also excellent.And, it is believed that become thin by film
It causes, film surface is smoothened, and to which dirt is difficult to adhere to, soil resistance is also excellent.
The drying of coated film can carry out under room temperature (25 DEG C), can also be carried out using heating device.
As heating device, there is no particular limitation as long as it can be heated to be target temperature, can use arbitrary public
The heating device known.As heating device, other than baking oven, electric furnace etc., additionally it is possible to use what is independently made according to production line
Heating device.
The drying of coated film for example can be right in 40 DEG C~200 DEG C of ambient air temperature by using above-mentioned heating device
Coated film is heated to carry out.When by heating that coated film is dried, such as it can will be set as heating time 1 minute
~30 minutes or so.
As the drying condition of coated film, preferably coated film is heated 1 minute in 40 DEG C~200 DEG C of ambient air temperature
~10 minutes drying conditions more preferably heat 1 minute~5 minutes dried strips in 50 DEG C~150 DEG C of ambient air temperature
Part.
The film thickness of coated film after drying can be set as being calculated as the range of 120nm~200nm with average film thickness (Av).Counnter attack
The refractive index and film thickness of film is important factor in penetrating property, if average film thickness is 120nm or more, the antireflection for becoming film is excellent
Different film.And similarly, when average film thickness is 200nm or less, antireflection is more excellent.
Also, the standard deviation (σ) of the film thickness of the coated film after drying is preferably 20nm or less.Standard deviation be 20nm with
It is lower to indicate that the variation of film thickness is few, it can be by being realized via above-mentioned film formation process and drying process.
There to be the glass baseplate for the film (antireflection film) that is at least dried that treated along the side orthogonal with substrate surface
To parallelly cutting, cut surface observes 10 positions using scanning electron microscope (SEM), according to 10 SEM
Film thickness as measuring each observation position, is averaged to 10 variables (film thickness) obtained, thus finds out average film thickness
(Av)。
Also, standard deviation is calculated using 10 variables (film thickness) measured as described above and average film thickness gauge
Value.
(calcination process)
The manufacturing method of the laminated body of the disclosure further have preferably after the drying process described to dry and
The process (being also referred to as calcination process below) that the antireflection film of formation is calcined.By calcining, metal oxide can get
The antireflection film that particle links more securely.
Calcination process is preferably calcined under 300 DEG C~800 DEG C of ambient air temperature.By by the counnter attack after drying
Film is penetrated to be calcined under 300 DEG C~800 DEG C of ambient air temperature, the hardness of the careful film formed in drying process into
One step improves, and can further increase scratch resistance.Also, via calcining, organic principle disappears, therefore porosity increases, and prevents
Reflectivity further increases.
The calcining of coated film can be carried out using heating device.As heating device, as long as target temperature can be heated to be
Then there is no particular limitation for degree, can use arbitrary well known heating device.As heating device, other than electric furnace etc.,
The calciner plant independently made according to production line can also be used.
The calcination temperature (ambient air temperature) of coated film is more preferably 500 DEG C or more and 800 DEG C hereinafter, further preferably
For 600 DEG C or more and 750 DEG C hereinafter, especially preferably 650 DEG C or more and 700 DEG C or less.Calcination time is preferably 1 minute~10
Minute, more preferably 1 minute~5 minutes.It is also preferred that quenching is carried out to the glass surface blows air of high temperature after firing, into
The cold reinforcing of sector-style.
The film thickness of film after calcining is preferably the range of 120nm~180nm in terms of average film thickness (Av), more preferably
The range of 130nm~160nm.Antireflection is more excellent if film thickness is 120nm~180nm.Also, the film of the film after calcining
Thick standard deviation (σ) is preferably 20nm or less.
(other processes)
The manufacturing method of the laminated body of the disclosure can include as needed in the range of not damaging the effect of the disclosure
Other processes in addition to above-mentioned each process.
As other processes, cleaning process, surface treatment procedure, cooling process etc. can be enumerated.
Then, the ingredient etc. used in the process of the manufacturing method of laminated body is illustrated.
Glass baseplate-
As the base material for constituting laminated body, the glass baseplate with concaveconvex structure at least one side is used." have recessed
Male structure " refer to for example by being dispersed with small hole on the surface of the glass with such as pear skin apperance shape surface be in convex-concave shape
State.Specifically, it is preferable that arithmetic mean surface roughness Ra be 0.1 μm~5 μm, r.m.s. roughness Rq (rms) be 0.1 μm~
5 μm, and the glass baseplate that the maximum valley depth (Pv) of section curve is 1 μm~20 μm.
The maximum valley depth (Pv) of arithmetic mean surface roughness Ra, r.m.s. roughness Rq (rms) and section curve is
Utilize value non-planar contact surfaces shape measuring instrument (Zygo Corporation systems) and found out in accordance with JIS B0601 (2001).
By assigning concaveconvex structure to glass baseplate, anti-glare can be assigned to glass baseplate.
For example, the pattern sample portrayed on roller to be transferred to the figured glass manufactured on glass surface as tool as described above
Have the glass baseplate for disperseing porose concaveconvex structure and it is preferred that.Such as it can use Saint-Gobain K.K.'s
The height of Albarino, the Solyte of Asahi Glass Co., Ltd., Nippon Sheet Glass Company, Ltd
Transmit figured glass etc..
If also, use glass baseplate as base material, the condensation of silanol group not only such as silicon dioxide granule with
And it is generated between the silanol group of silica precursor, the also silanol in such as silicon dioxide granule and silica precursor
It is generated between base and the silanol group of glass surface.Thereby, it is possible to form the excellent counnter attack of the adhesiveness between glass baseplate
Penetrate film.
As the thickness of glass baseplate, there is no particular limitation, can be set as the range of 0.5mm~5mm.
Aqueous coating compositions-
Aqueous coating compositions in the disclosure contain in the particle of metal oxide and the precursor of metal oxide
At least one, and solid component concentration is 10 mass % or more.It, can by the way that solid component concentration is set as 10 mass % or more
Inhibit planarization, the high coated film of film thickness uniformity can formed on convex-concave surface when coating forms a film.As a result, via
Drying later and as needed and the antireflection of the calcining carried out and the film obtained becomes excellent.
(particle of metal oxide)
Aqueous coating compositions contain at least one of particle of metal oxide.Pass through the grain comprising metal oxide
Son is formed using the gap between the particle of cohesion, can reduce the refractive index of film, assigns antireflection.
As the particle of metal oxide, such as the oxidations such as silicon, aluminium, titanium, zirconium, zinc, tin, indium, gallium, germanium, antimony, molybdenum can be enumerated
The particle of object.There is no particular limitation for the shape of the particle of metal oxide, and may be, for example, aspect ratio, (long axis length is relative to short
The ratio between shaft length) less than 3 spherical particle and aspect ratio be 3 or more non-spherical particle (preferably aspect ratio is 3~25
Any one of particle) etc..
Among the particle of metal oxide, from the viewpoint of hydrophily and durability, preferably silica (SiO2)
Particle (below be also referred to as silicon dioxide granule.), aluminium oxide (Al2O3) particle, titanium oxide (TiO2) particle etc., from folding
It penetrates from the viewpoint of rate, more preferable silicon dioxide granule.
The type of silicon dioxide granule contained in aqueous coating compositions is not particularly limited.
As silicon dioxide granule, such as hollow silica particle, porous silica particle, non-porous two can be enumerated
Silicon oxide particle etc..There is no particular limitation for the shape of silicon dioxide granule, may be, for example, in spherical, ellipticity, chain etc.
Any shape, from the viewpoint of it can obtain the high film of scratch resistance, more preferable spherical (i.e. spherical silicon dioxide).
Spherical refers to the spherical shape that aspect ratio is less than 3, also includes oval spherical other than spherical shape.
Also, silicon dioxide granule can be the silicon dioxide granule that surface is handled with aluminium compound etc..
As silicon dioxide granule contained in aqueous coating compositions, among above-mentioned, preferred nonporous silica silicon grain
Son.
" nonporous silica silicon particle " indicates the silicon dioxide granule for not having gap in the inside of particle, with hollow dioxy
SiClx particle, porous silica particle etc. have the silicon dioxide granule in gap different in the inside of particle.In addition,
In " nonporous silica silicon particle ", the inside for being not included in particle has the cores such as polymer, and the shell (shell) of core is by titanium dioxide
The titanium dioxide for the nucleocapsid that the precursor (such as the raw material of silica are changing by calcining) of silicon or silica is constituted
Silicon particle.
Before and after calcination process, it is present in coated film when calcination process is arranged about nonporous silica silicon particle
The state of particle change.Specifically, in coated film before calcination, as the solidifying of each nonporous silica silicon particle
Aggressiveness exists, and in coated film after firing, at least part in multiple nonporous silica silicon particles is interconnected and conduct
Particle union body exists.
If silicon dioxide granule contained in aqueous coating compositions is nonporous silica silicon particle, multiple non-porous dioxies
SiClx particle links and forms particle union body, therefore the hardness of film is got higher, and scratch resistance more improves.
About the average primary particle diameter of the particle linked by calcining, using by not considering linking part (such as neck
Part) and diameter when 1 in the particle of connection to be only assumed to ball carries out arithmetic average and the value that obtains.
Aqueous coating compositions can include the different silicon dioxide granule of a variety of primary particle sizes.Also, aqueous coating group
It can includes nonporous silica silicon particle and a kind or more of the silicon dioxide granule in addition to nonporous silica silicon particle to close object.
Silicon dioxide granule can use commercially available product.As the example of commercially available product, NALCO (registered trademark) 8699 can be enumerated
(water dispersion, the average primary particle diameter of nonporous silica silicon particle (spherical particle):3nm, solid constituent:15 mass %,
NALCO COMPANY systems), NALCO (registered trademark) 1130 it is (water dispersion of nonporous silica silicon particle (spherical particle), flat
Equal primary particle size:8nm, solid constituent:30 mass %, NALCO COMPANY systems), NALCO (registered trademark) 1030 (non-porous two
Water dispersion, the average primary particle diameter of silicon oxide particle (spherical particle):13nm, solid constituent:30 mass %, NALCO
COMPANY systems), NALCO (registered trademark) 1050 it is (water dispersion of nonporous silica silicon particle (spherical particle), average primary
Grain size:20nm, solid constituent:50 mass %, NALCO COMPANY systems), 1060 (non-porous silicas of NALCO (registered trademark)
Water dispersion, the average primary particle diameter of particle (spherical particle):60nm, solid constituent:50 mass %, NALCO COMPANY
System), SNOWTEX (registered trademark) XS (water dispersion, average primary particle diameters of nonporous silica silicon particle (spherical particle):
5nm, solid constituent:20 mass %, Nissan Chemical Industries, LTD. systems), SNOWTEX (registered trademark) UP
(water dispersion, the average primary particle diameter of nonporous silica silicon particle (chain particle):40nm~100nm, solid constituent:20 matter
Measure %, Nissan Chemical Industries, LTD. system) etc..
The range of the preferred 1nm~10nm of average primary particle diameter of the particle (preferably silicon dioxide granule) of metal oxide.
If the particle size of silicon dioxide granule is small, silicon dioxide granule agglomerates and forms offspring, and then offspring agglomerates,
Become larger to the porosity of film, antireflection improves.In addition, particle (preferably silicon dioxide granule) about metal oxide
The lower limit of average primary particle diameter, it is contemplated that actual manufacture adaptability, preferably 1nm or more.
The average primary particle diameter of the particle (preferably silicon dioxide granule) of metal oxide is from above-mentioned reason, more preferably
For 8nm hereinafter, further preferably 6nm is hereinafter, especially preferably 4nm or less.Also, the average primary grain of silicon dioxide granule
Diameter is more preferably 2nm or more.
The average primary particle diameter of particle (preferably silicon dioxide granule) about metal oxide, can be according to transmission-type
Electron microscope finds out come the image of the photo of the particle for the dispersion observed and shot.Specifically, according to the image of photo come
The projected area for measuring particle, finds out equivalent circle diameter, and to calculated equivalent circle diameter by measured projected area
Value carries out arithmetic average, the average primary particle diameter by thus obtained value as particle.Average one of particle in this specification
Secondary grain size be by measuring projected area respectively to 300 particles, equivalent circle diameter being found out respectively by the projected area measured,
And the value that the value of calculated equivalent circle diameter progress arithmetic average is obtained.
Content in the aqueous coating compositions of the particle (preferably silicon dioxide granule) of metal oxide is relative to aqueous
The gross mass of coating composition is preferably the 8 mass % of mass %~15, more preferably 8 mass of mass %~12 %.If titanium dioxide
The content of silicon particle is 8 mass % or more, then antireflection becomes more excellent, and scratch resistance is also excellent.If titanium dioxide silicon grain
The content of son is 15 mass % hereinafter, then advantageously forming the good film of planar.
Also, when both precursors of particle and metal oxide containing metal oxide in aqueous coating compositions,
Precursor (preferably silicate) of the particle (preferably silicon dioxide granule) relative to metal oxide as aftermentioned metal oxide
Containing than (the ratio between particle/precursor), preferably 200/1~3/1 range by quality ratio.If ratio is in above range,
Scratch resistance and antireflection can be taken into account.
(precursor of metal oxide)
Aqueous coating compositions can be the particle (preferably silicon dioxide granule) comprising above-mentioned metal oxide, and contain gold
Belong to the form of at least one of precursor of oxide, or particle (the preferably titanium dioxide not comprising above-mentioned metal oxide
Silicon particle) and the form of precursor containing metal oxide.When the precursor containing metal oxide, by implementing calcining come shape
At silicon dioxide granule, or play the effect for keeping the silicon dioxide granule in film bonded to each other.
From the viewpoint of the antireflection for improving the film after at least implementing to be dried, metal oxide is preferably comprised
The form of particle (preferably silicon dioxide granule) and at least one of precursor containing metal oxide.At this point, metal aoxidizes
The precursor of object will be moderately crosslinked between the particle of metal oxide (preferably silicon dioxide granule), resistance to so as to improve
Scratch resistant.At this point, it is preferred that the ratio between particle/precursor is set as above range.
As the precursor of metal oxide, such as silicate, metal alkoxide and/or its partial hydrolysis can be preferably by
Oligomer.
As silicate, the metal salt or silicic acid ammonium salt of preferably aftermentioned silicic acid.
As metal alkoxide, silicon alkoxide, aluminium-alcohol salt, Titanium alkoxides etc. can be enumerated, as concrete example, tetramethoxy-silicane can be enumerated
Alkane, tetraethoxysilane, four butoxy silanes, aluminum isopropylate, aluminium acetylacetonate, tetraisopropoxy titanium etc..In addition to this, also
Methyltrimethoxysilane base, methyltriethoxysilane base, methyl tripropoxy silane, three butoxy silicon of methyl can be used
Alkane, ethyl trimethoxy silane, ethyl triethoxysilane, ethyl tripropoxy silane, three butoxy silane of ethyl, 3- amino
The silane coupling agents such as propyl triethoxy monosilane, 3- (2- aminoethylaminos) propyl trimethoxy silicane.
As the partial hydrolysis oligomer of metal alkoxide, such as tetramethoxy-silicane or tetraethoxysilane can be used
Partial hydrolysis oligomer etc..
When comprising silicate, by including the titanium dioxide for coming from silicate to be formed after the drying via calcining
Silicon (SiO2) film.
As silicate, the preferably metal salt or ammonium salt of silicic acid, the alkali metal salt of more preferable silicic acid.The alkali metal salt of silicic acid
It is the compound referred to as alkali silicate, the compound indicated by following formula 1 can be enumerated.
M2O·nSiO2... formula 1
In formula 1, M indicates alkali metal.
As alkali metal, lithium (Li), sodium (Na), potassium (K), caesium (Cs) etc. can be enumerated.
As the alkali metal indicated by M, preferably Li or K.
Li or K is selected by being used as alkali metal, compared with Na, scratch resistance further increases.
The excellent sequence of the water resistance of known alkali silicate is Li > K > Na.Think the water-fast of alkali silicate
Property it is higher, then the silanol group of alkali silicate reactivity it is higher, be inferred as be due to adhesiveness improve.
The alkali metal that the alkali silicate indicated by above-mentioned formula 1 is preferably indicated by M is Li and n is 5.0 belowization
Close object.
If thinking, the molar ratio n of the alkali silicate indicated by formula 1 is value appropriate, becomes easy crosslinking.Therefore,
As M=Li, the compound of n≤5.0 is met by selection, alkali silicate is easy to be crosslinked with silicon dioxide granule, scratch-resistant
Wound property further increases.When the alkali metal indicated by M is Li, preferably n is 3.0 or more.
Also, in formula 1, the alkali metal further preferably indicated by M is K and n is 2.5 alkali silicates below.
When m=k, the compound of n≤2.5 is met by selection, alkali silicate becomes easy and titanium dioxide silicon grain
Son crosslinking, scratch resistance further increase.When the alkali metal indicated by M is K, preferably n is 2.0 or more.
N in formula 1 indicates molar ratio, specifically, indicating each M2O1 moles of SiO2Molal quantity.
N in formula 1 can be selected from 2.0~8.0 range.
For example, when for potassium silicate (M=K), molar ratio is by " (SiO2Quality/K2The mass ratio of O) × 1.568 " (=
(SiO2Quality/K2The mass ratio of O) × (K2Formula weight/SiO of O2Formula weight)) indicate.Also, it is sodium metasilicate (M=Na) to work as
When, molar ratio is by " (SiO2Quality/Na2The mass ratio of O) × 1.032 " (=(SiO2Quality/Na2The mass ratio of O)
×(Na2Formula weight/SiO of O2Formula weight)) indicate.
As the alkali silicate indicated by formula 1, such as Li can be enumerated2O·3.5SiO2,Li2O·4.5SiO2,
Li2O·7.5SiO2,K2O·2SiO2,K2O·3.6SiO2,Na2O·3.2SiO2,Na2O·3.7SiO2Deng.
Also, alkali silicate can use the commercially available product listed, such as can enumerate Nissan Chemical
LSS series (such as LSS-35 (the Li of Industries, LTD.2O·3.5SiO2), LSS-45, LSS-75 etc.), Fuji
1K potassium silicates (the K of Kagaku CORP.2O·2SiO2), 2K potassium silicates (K2O·3.6SiO2), No. 3 sodium metasilicate (Na2O·
3.2SiO2), No. 5 sodium metasilicate (Na2O·3.7SiO2) etc., the silicon of NIPPON CHEMICAL INDUSTRIAL CO., LTD.
Sour lithium 35, lithium metasilicate 40, lithium metasilicate 45, lithium metasilicate 75, sodium metasilicate 1, sodium metasilicate 2, sodium metasilicate 3, sodium metasilicate 4, A silicon
Sour potassium, B potassium silicates, C potassium silicates etc..
When alkali silicate (silicate) of the particle comprising metal oxide and the precursor as metal oxide,
Content of the preferred as alkali silicate in aqueous coating compositions aftermentioned aqueous coating compositions solid component concentration (>=
10 mass %) in be the 1.3 mass % of mass %~2.5, more preferably 1.5 mass of mass %~2.1 %.If alkali silicate
Content be 1.3 mass % or more, then be easy with silicon dioxide granule formed be crosslinked, scratch resistance improve.If also, alkali metal
The content of silicate is 2.5 mass % hereinafter, can then fully ensure the gap between silicon dioxide granule, can form folding
The low film of rate is penetrated, therefore antireflection is high.
Also, when the precursor as metal oxide for example containing alkali silicate (silicate) when, as titanium dioxide
Silicon particle contains relative to alkali silicate than (the ratio between silicon dioxide granule/alkali silicate), excellent by quality ratio
Select 200/1~3/1 range.In the range of if the ratio between silicon dioxide granule/alkali silicate is 200/1~3/1, make
Between silicon dioxide granule while immobilization, inhibition reduces inter-particle voids due to there are excessive alkali silicate, simultaneous
Care for scratch resistance and antireflection.
Specifically, by the way that the ratio between silicon dioxide granule/alkali silicate is set as 200/1 hereinafter, alkali metal silicate
The adhesive effect of salt functions, and scratch resistance improves.Also, by the way that the ratio between silicon dioxide granule/alkali silicate is set
It is 3/1 or more, the refractive index of film is reduced by the gap between silicon dioxide granule, antireflection improves.
As the ratio between particle/precursor, from reason same as described above, by quality ratio more preferable 20/1~4/1
Range, further preferred 10/1~4/1 range, particularly preferred 7/1~4/1 range.If the content of silicate is above-mentioned model
In enclosing, then scratch resistance and antireflection can be taken into account.
(surfactant)
Aqueous coating compositions preferably comprise surfactant.If containing surfactant, for improving relative to base
The wetability of material, the flatness of coated film are effective.
Can be anionic surfactant, cationic surfactant, double property surface-actives as surfactant
Any one of agent, nonionic surfactant, more preferable nonionic surfactant.Also, surfactant can be
Any one of hydrocarbon system surfactant, fluorine system surfactant, silicon-based surfactant, more preferable hydrocarbon system surfactant.
In the disclosure, hydrocarbon system nonionic surfactant (such as polyoxyethylene alkyl ether class, aliphatic acid can be used
The epoxy of Arlacels, alkyl polyglucoside class, fatty diglycollic amide class, alkyl monoglyceride ethers, acetylenic glycols
The block copolymer etc. of ethane additive product, ethylene oxide and propylene oxide).Among those, from relative to base material wetability,
From the viewpoint of the flatness of coated film, the ethyleneoxide addition as the preferred acetylenic glycols of hydrocarbon system nonionic surfactant
Object.Also, as commercially available product, can it is preferable to use the OLFIN of Nissin Chemical Co., Ltd.s series (such as
OLFIN E1010, OLFIN EXP.4200, OLFIN EXP.4123 etc.).
The content of surfactant preferably in the range of the surface tension of aqueous coating compositions meets aftermentioned range into
Row is adjusted.Specifically, the content as surfactant, 0.1 is set as preferably with respect to the gross mass of aqueous coating compositions
The range of the mass of quality %~0.5 %.
If the content of surfactant is 0.1 mass % or more, the profit relative to the glass baseplate with convex-concave surface
It is moist to become good, the crawlings such as recess can be reduced.Also, if the content of surfactant be 0.5 mass % hereinafter, if
Antireflection becomes more excellent.
(water-miscible organic solvent)
Aqueous coating compositions can contain water-miscible organic solvent.As water-miscible organic solvent, such as can contain
Boiling point is 100 DEG C or more of water-miscible organic solvent, is preferably able to the water-miscible organic solvent containing 120 DEG C of boiling point or more.Water
The boiling point of solubleness organic solvent is preferably 300 DEG C hereinafter, more preferably 250 DEG C or less.Wherein, aqueous coating compositions are more preferable
The water-miscible organic solvent for being 140 DEG C~220 DEG C containing boiling point (is also referred to as higher boiling water-soluble solvent below.).
By containing higher boiling water-soluble solvent in aqueous coating compositions, even if can if when film is quickly dried
Enough improve the scratch resistance of film.This is because the shrinkage stress of film when rapid draing is suppressed, the defects of film crackle, subtracts for presumption
Few, result becomes the excellent film of scratch resistance.
If the boiling point of higher boiling water-soluble solvent is 140 DEG C or more, suppression the defects of film crackle in the drying process
Effect processed is big, becomes the excellent film of scratch resistance.If higher boiling water-soluble solvent boiling point be 220 DEG C hereinafter, if can prevent
Underdry.
As the boiling point of higher boiling water-soluble solvent, from reason same as described above, preferably 160 DEG C~200 DEG C, more
It is preferred that 170 DEG C~190 DEG C.
It is 140 DEG C~220 DEG C of water-miscible organic solvent (higher boiling water-soluble solvent) as boiling point, such as third can be enumerated
Glycol (188 DEG C of boiling point), ethylene glycol monobutyl ether (171 DEG C of boiling point), diethylene glycol monomethyl ether (194 DEG C of boiling point), propylene glycol list second
Ether (170 DEG C of boiling point), ethylene acetate (196 DEG C of boiling point), ethylene glycol single methyl ether acetic acid esters (145 DEG C of boiling point), three second
Glycol dimethylether (216 DEG C of boiling point), diethylene glycol ethyl methyl ether (176 DEG C of boiling point), cyclohexanone (156 DEG C of boiling point), lactic acid
Ethyl ester (155 DEG C of boiling point) etc..
As content of the water-miscible organic solvent in aqueous coating compositions, preferably with respect to aqueous coating compositions
Gross mass is the 0.1 mass % of mass %~3, the more preferably 0.1 mass % of mass %~1.5, further preferably 0.1 mass %
~1.0 mass %.
If the content of water-miscible organic solvent is 0.1 mass % or more, the film crackle etc. in drying process can be inhibited
Defect.Also, if the content of water-miscible organic solvent be 3 mass % hereinafter, if in terms of the stability of aqueous coating compositions
From the point of view of it is advantageous.Moreover, the content if water-miscible organic solvent be 1.5 mass % hereinafter, if become the excellent film of antireflection.
Also, the ratio as higher boiling water-soluble solvent relative to the volatile ingredient totality in aqueous coating compositions,
It can be set as the range by quality ratio for 0.1%~1.8%, wherein preferably it is 0.2%~1.5% by quality ratio, it is more excellent
It is selected as 0.5%~1.0%.
In addition, " volatile ingredient " is primarily referred to as water and water-miscible organic solvent contained in aqueous coating compositions.
The quality of volatile ingredient totality can be by subtracting from the quality of aqueous coating compositions by aqueous coating compositions
The quality of remaining solid constituent after sixty minutes is heated at 105 DEG C to find out.
Also, the quality of higher boiling water-soluble solvent contained in aqueous coating compositions can pass through gas-chromatography point
It analyses to be quantified.
(water)
Aqueous coating compositions contain water.By the way that the ingredient of the solvent of aqueous coating compositions is largely set as water, with
The coating fluid of organic solvent system is compared, and carrying capacity of environment can be substantially mitigated.
Water for aqueous coating compositions preferably do not contain impurity or for reduce impurity content deionized water.
The content of water in aqueous coating compositions relative to solvent composition total amount be 50 mass % or more, preferably 80
Quality % or more, more preferably 90 mass % or more.
Also, the content of the water in aqueous coating compositions is preferably 50 matter relative to the gross mass of aqueous coating compositions
Measure the mass % of %~90, more preferably 80 mass of mass %~90 %.
(other compositions)
Aqueous coating compositions can include to remove silica as needed in the range of not damaging the effect of the disclosure
Other compositions other than particle, alkali silicate and water.
As other compositions, thickener, water soluble polymer, latex water-dispersed, preservative, pH adjusting agent etc. can be enumerated.
Aqueous coating compositions can contain thickener in the range of not damaging the effect of the disclosure.Aqueous coating compositions
Object can adjust viscosity by containing thickener.
As thickener, for example, can enumerate polyethers, urethane-modified polyethers, polyacrylic acid, polyacrylic acid sulfonate,
Polyvinyl alcohol, polysaccharide etc..Wherein, as thickener, preferably polyester, modified polyacrylic acid system sulfonate or polyvinyl alcohol.Make
For thickener, the commercially available product listed can be used, as commercially available product, such as the SN of SAN NOPCO LIMITED can be enumerated
Thickener 601 (polyethers), SN Thickener 615 (modified polyacrylic acid system sulfonate), Wako Pure Chemical
Polyvinyl alcohol (the degree of polymerization of Industries, Ltd.:About 1000~2000) etc..
The content of thickener is preferably 0.01 mass of mass %~5.0 % left relative to the gross mass of aqueous coating compositions
It is right.
Hereinafter, the character to aqueous coating compositions illustrates.
(viscosity)
The viscosity of aqueous coating compositions is preferably 1mPas~8mPas in the state of being adjusted to 25 DEG C, more preferably
For 2mPas~5mPas, further preferably 2mPas~3mPas.
If viscosity be 1mPas or more, be suitble to rolling method, when being coated on convex-concave surface, though with
1.8mL/m2When less coating weight below is coated, liquid film is also followed readily along concaveconvex shape.If also, viscosity is
For 8mPas hereinafter, being then easy to control coating weight, result is easy to control film thickness.
The viscosity of aqueous coating compositions is that aqueous coating compositions are being adjusted to 25 DEG C using E types rotational viscometer
The value measured in the state of temperature and holding.
(surface tension)
The surface tension of aqueous coating compositions can be set as 20mN/m~60mN/m, more preferable 20mN/m~30mN/m.
If surface tension is set as 60mN/m hereinafter, more preferably be set as 30mN/m hereinafter, if can reduce recess etc. coating defects, counnter attack
Penetrating property improves.
Surface tension is to utilize Automatic Surface Tensiometer CBVP-Z (Kyowa Interface
Science Co., Ltd. system) and the value measured under conditions of 25 DEG C by spray-on process.
(pH)
The pH of aqueous coating compositions is preferably 8~12, and more preferably 9~11.5.If the pH of aqueous coating compositions is 8
More than, then by the electrostatic repulsion of the negative electrical charge based on silica particle surface, the cohesion of silicon dioxide granule can be inhibited.
Also, if the pH of aqueous coating compositions be 12 hereinafter, if can inhibit the dissolving of silicon dioxide granule.
The pH of aqueous coating compositions is to utilize pH instrument (models:HM-31, DKK-TOA CORPORATION systems) at 25 DEG C
Under the value measured.
< carries the glass > of antireflection film
The glass with antireflection film of the disclosure with concaveconvex structure at least one side glass baseplate, with
And be configured at the face with concaveconvex structure of glass baseplate and average film thickness be 120nm~180nm and standard deviation be 20nm with
Under antireflection film.
About the detailed content of glass baseplate and antireflection film as described.
The glass with antireflection film of the disclosure is made by the manufacturing method of the laminated body of the disclosure described.
According to the manufacturing method of the laminated body described, it can be formed and be followed on the convex-concave surface of the glass baseplate with concaveconvex structure
The high film of the film thickness uniformity of concaveconvex shape, can obtain the excellent glass with antireflection film of antireflection.
The average film thickness of antireflection film is the range of 120nm~180nm.In antireflection, the refractive index and film thickness of film is
Key factor, antireflection is excellent in the range of average film thickness 120nm~180nm.From the viewpoint for more improving antireflection
From the point of view of, average film thickness is more preferably the range of 130nm~160nm.
There to be the glass baseplate for the film (antireflection film) that is at least dried that treated along the side orthogonal with substrate surface
To parallelly cutting, cut surface observes 10 positions using scanning electron microscope (SEM), according to 10 SEM
Film thickness as measuring each observation position, is averaged to 10 variables (film thickness) obtained, thus finds out average film thickness
(Av)。
Also, standard deviation is calculated using 10 variables (film thickness) measured as described above and average film thickness gauge
Value.
Antireflection film preferably comprises the particle of metal oxide, contains titanium dioxide more preferably as the particle of metal oxide
Silicon particle.About the particle of metal oxide and the detailed content of silicon dioxide granule as described.
< solar cell modules >
The solar cell module of the disclosure has the glass with antireflection film of the disclosure described.Due to this public affairs
The solar cell module opened has the glass with antireflection film described, therefore antireflection is excellent, and generating efficiency is excellent
It is different.
Solar cell module may be configured as in the laminated body of the disclosure of the incident side of sunlight and with polyester
The luminous energy of sunlight is converted into the solar cell device of electric energy by film configuration between the backboard used for solar batteries of representative.This
Such as by with vinyl-vinyl acetate copolymer between the backboard used for solar batteries such as disclosed laminated body and polyester film
Resin is that the sealing material of representative is sealed.
About the component other than laminated body and backboard in solar cell module, such as it is recorded in detail
" photovoltaic power generation system constituent material " (China fir this Rong Yi chief editors, Kogyo Chosakai Publishing Co., Ltd.s, 2008
Year distribution).Solar cell module preferably has the form of the laminated body described, the disclosure in the incident side of sunlight
The structure in addition to laminated body do not limit.
In the conduct stacking that the base material of the incident side configuration of the sunlight of solar cell module has preferably described
The form of the base material of body, as base material, such as can enumerate glass, resin, metal, ceramics or will be selected from glass, resin, metal with
And the base materials such as composite material of at least one of ceramics Composite.Preferred base material is glass baseplate.
As the solar cell device used in solar cell module, there is no particular limitation.In solar cell
In module, the silicon systems such as monocrystalline silicon, polysilicon, non-crystalline silicon solar cell device, copper-indium-gallium-selenium, copper-indium-selenium, cadmium-tellurium,
The various well known solar cell devices such as the iii-vs such as gallium-arsenic or II-VI group group compound semiconductor system solar cell device
It can be applicable in.
Embodiment
Hereinafter, the disclosure is carried out more specific description by embodiment, but the disclosure is without departing from its purport, then
It is not limited to following embodiment.In addition, being limited as long as no special, then " part " is quality criteria.
(preparation of aqueous coating fluid S-1)
By by the water dispersion (trade name of silicon dioxide granule:NALCO (registered trademark) 8699, non-porous silicas
Particle, the average primary particle diameter of silicon dioxide granule:3nm, solid constituent:15 mass %, NALCO COMPANY systems) 56.7 matter
Measure part, lithium metasilicate (LSS-35 (compositions:Li2O·3.5SiO2), solid constituent:23 mass %, Nissan Chemical
Industries, LTD. system) 6.5 mass parts, OLFIN EXP.4123 (hydrocarbon system nonionic surfactant, active ingredient amount:
40 mass %, Nissin Chemical Co., Ltd.s systems) 0.5 mass parts, propylene glycol (Wako Pure Chemical
Industries, Ltd. system) 0.5 mass parts, 35.8 mass parts of water mix and are stirred, it is prepared for aqueous coating fluid S-1 (water
Property coating composition).
Then, the viscosity of aqueous coating fluid S-1 (25 DEG C) is measured using E type rotational viscometers, by aqueous coating
The surface tension of liquid S-1 utilizes Automatic Surface Tensiometer CBVP-Z (Kyowa Interface
Science Co., Ltd. system) it is measured under conditions of 25 DEG C by spray-on process.Also, by aqueous coating fluid S-1's
(25 DEG C) of pH is measured using pH instrument (HM-31, DKK-TOA CORPORATION systems).Measurement result is shown in following table 1.
(preparation of aqueous coating fluid S-2~S-4, R-1~R-3)
In the preparation of aqueous coating fluid S-1, will composition such as following table 1 change, in addition to this with aqueous coating
Aqueous coating fluid R-1~the R-3 for preparing identical mode and being prepared for aqueous coating fluid S-2~S-4 and comparing of liquid S-1.
In addition, the aqueous coating fluid R-2 compared is carried out using 5 mass % aqueous solutions of polyvinyl alcohol according to composition shown in following table 1
It prepares.
Also, viscosity, surface tension and pH are measured by method identical with aqueous coating fluid S-1.It is tied measuring
Fruit is shown in following table 1.
[Table 1]
(unit:Quality %)
| The concentration (quality %) of silicon dioxide granule | 8.5 | 9.3 | 10.2 | 11.9 | 5.1 | 4.1 | 6.8 |
| The concentration (quality %) of silicate | 1.5 | 1.7 | 1.8 | 2.1 | 0.9 | 0.7 | 1.2 |
| The ratio between silicon dioxide granule/silicate | 5.7/1 | 5.7/1 | 5.7/1 | 5.7/1 | 5.7/1 | 5.7/1 | 5.7/1 |
| Solid component concentration (quality %) | 10 | 11 | 12 | 14 | 6 | 6 | 8 |
| (25 DEG C of viscosity;mPa·s) | 2.0 | 2.1 | 2.3 | 2.8 | 1.4 | 10.8 | 1.7 |
| (25 DEG C of surface tension;mPa·s) | 29 | 29 | 29 | 30 | 28 | 29 | 28 |
| pH(25℃) | 11.0 | 11.0 | 11.0 | 11.1 | 11.0 | 10.9 | 11.0 |
By the detailed content of ingredient shown in table 1 described below.
NALCO (registered trademark) 8699:Water dispersion (spherical, the average primary particle diameter of silicon dioxide granule:2nm~
4nm, solid constituent:15 mass %), NALCO COMPANY systems
·LSS-35:Lithium silicate aqueous solution (solid constituent:23 mass %, Li2O·3.5SiO2), Nissan Chemical
Industries, LTD. system
5 mass % aqueous solutions of polyvinyl alcohol:By the polyvinyl alcohol (degree of polymerization about 2000, Wako Pure Chemical
Industries, Ltd. system) it is dissolved in the water to prepare.
·OLFIN EXP.4123:Hydrocarbon system nonionic surfactant (active ingredient amount:40 mass %), Nissin
Chemical Co., Ltd. systems
(preparation of aqueous coating fluid S-5~S-11)
In the preparation of aqueous coating fluid S-1, will composition such as following table 2 change, in addition to this with aqueous coating
The identical mode for preparing of liquid S-1 is prepared for aqueous coating fluid S-5~S-11.
Also, viscosity, surface tension and pH are measured by method identical with aqueous coating fluid S-1.It is tied measuring
Fruit is shown in following table 2.
[Table 2]
(unit:Quality %)
| The concentration (quality %) of silicon dioxide granule | 10.2 | 10.2 | 10.2 | 10.2 | 10.2 | 10.2 | 10.2 |
| The concentration (quality %) of silicate | 1.8 | 1.8 | 1.8 | 1.8 | 1.8 | 1.8 | 1.8 |
| Solid component concentration (quality %) | 12.0 | 12.0 | 12.0 | 12.0 | 12.0 | 12.0 | 12.0 |
| (25 DEG C of viscosity;mPa·s) | 2.2 | 2.0 | 7.8 | 2.3 | 2.5 | 2.3 | 2.4 |
| (25 DEG C of surface tension;mPa·s) | 29 | 29 | 28 | 54 | 26 | 29 | 29 |
| pH(25℃) | 10.6 | 10.1 | 10.4 | 11.0 | 11.0 | 11.0 | 11.0 |
By the detailed content of ingredient shown in table 2 described below.
NALCO (registered trademark) 8699:Water dispersion (spherical, the average primary particle diameter of silicon dioxide granule:3nm, Gu
Body ingredient:15 mass %), NALCO COMPANY systems
NALCO (registered trademark) 1130:Water dispersion (spherical, the average primary particle diameter of silicon dioxide granule:8nm, Gu
Body ingredient:30 mass %), NALCO COMPANY systems
NALCO (registered trademark) 1050:Water dispersion (spherical, the average primary particle diameter of silicon dioxide granule:20nm,
Solid constituent:50 mass %), NALCO COMPANY systems
SNOWTEX (registered trademark) UP:Water dispersion (chain, the average primary particle diameter of silicon dioxide granule:40nm~
100nm, solid constituent:20 mass %), Nissan Chemical Industries, LTD. systems
·LSS-35:Lithium silicate aqueous solution (solid constituent:23 mass %, Li2O·3.5SiO2), Nissan Chemical
Industries, LTD. system
·OLFIN EXP.4123:Hydrocarbon system nonionic surfactant (active ingredient amount:40 mass %), Nissin
Chemical Co., Ltd. systems
(Examples 1 to 8, comparative example 1~9)
Aqueous coating fluid S-1~the S-4 and R-1~R-3 prepared as described above is prepared and as figured glass
(base material) and on surface (front side) with pear skin apperance and overleaf implement it is cellular embossing processing 10cm
The blank glass (Nippon Sheet Glass Company, Ltd system) of square.
In addition, blank glass (Nippon Sheet Glass Company, Ltd system) is surveyed using non-planar contact surfaces shape
Instrument (Zygo Corporation systems) is measured in object lens:2.5 times, observation visual angle:It measures and obtains under conditions of 7.14mm × 5.35mm
Surface texture parameter be arithmetic mean surface roughness (Ra):1.41 μm, r.m.s. roughness Rq (rms):1.82 μm, section
The maximum valley depth (Pv) of curve:14.1μm.
Reverse roll coater (Miyako Roller are utilized on the surface (face with pear skin apperance) of figured glass
Industrial Company, Ltd. system) it is coated with according to coating weight painting fabric aqueous shown in following Table 3 under following application conditions
Liquid forms coated film (film formation process).At this point, any in selection aqueous coating fluid S-1~S-4 and R-1~R-3
It plants to be used to be coated with.Later, the figured glass for being formed with coated film is put into 100 DEG C of oven, coated film is made to dry 2 points
Clock forms antireflection film (drying process).
In addition, having adjusted coating weight, film thickness by the rotating speed of the applicator roll of change reverse roll coater in coating.
< application conditions >
The conveying speed of base material:5m/ minutes
The rotating speed of applicator roll:0.5m/ minutes~10m/ minutes
The rotating speed of metering roll:5m/ minutes
The gap of applicator roll and backing roll:3.0mm
The indentation thickness of metering roll:0.2mm
Then, the figured glass for being formed with coated film has been calcined at 650 DEG C~700 DEG C to (calcining in 2 minutes in an atmosphere
Process).Later, it has carried out that glass surface blows air is come quickly to carry out cooling air-cooled intensive treatment.
17 kinds of laminated bodies (figured glass with antireflection film) have been made as described above.
(evaluation)
Following measurements and evaluation have been carried out to 17 kinds of made laminated bodies.It will measure and the result of evaluation be shown in down
State table 3.
Film thickness-
The laminated body that antireflection film is formed on figured glass is parallelly cut along the direction orthogonal with substrate surface,
Cut surface observes 10 positions using scanning electron microscope (SEM), has been measured according to 10 SEM pictures each
Observe the film thickness of position.It is averaged to 10 variables (film thickness) obtained, has thus found out average film thickness (Av).
Also, standard deviation is calculated using 10 variables (film thickness) measured and average film thickness gauge.
Antireflection (AR) property-
Utilize UV, visible light IR spectrophotometer (model:UV3100PC, SHIMADZU CORPORATION systems) it surveys
The transmitted spectrum of the wavelength 400nm~1100nm for the laminated body that antireflection film is formed on figured glass is measured.
The average transmittance of wavelength 400nm~1100nm of obtained transmitted spectrum is calculated according to following formula (a)
(Tav) and be not formed antireflection film figured glass average transmittance (T0Av difference (Δ T);=Tav-T0av).Separately
Outside, the numerical value of Δ T the high, indicates that antireflection (AR) property is more excellent.
Δ T=Tav-T0Av formulas (a)
[Table 3]
As shown in table 3, solid component concentration is being set as to 10 mass % or more and coating weight is set as 1.8mL/m2Below
Embodiment in, obtain the good antireflection film of antireflection.
In contrast, finding when for solid component concentration few (10 mass % of <) example, especially such as 2,7 institute of comparative example
Show, fails to obtain desirable film thickness, antireflection is poor.Also, ought be (the > 1.8mL/m more than coating weight2) example when, especially
As shown in comparative example 8,9, antireflection is decreased obviously.
(embodiment 9~15)
Prepared the aqueous coating fluid S-5~S-11 prepared as described above and as figured glass (base material) and
There is pear skin apperance on surface and overleaf implement the blank glass (Nippon of the 10cm square of cellular embossing processing
Sheet Glass Company, Ltd system).
Reverse roll coater (Miyako Roller are utilized on the surface (face with pear skin apperance) of figured glass
Industrial Company, Ltd. system) it is coated with according to coating weight painting fabric aqueous shown in following table 4 under following application conditions
Liquid forms coated film (film formation process).At this point, selecting any one of aqueous coating fluid S-5~S-11 to be used to apply
Cloth.Later, the figured glass for being formed with coated film is put into 100 DEG C of oven, coated film is made to dry 2 minutes to form
Antireflection film (drying process).
In addition, having adjusted coating weight, film thickness by the rotating speed of the applicator roll of change reverse roll coater in coating.
< application conditions >
The conveying speed of base material:5m/ minutes
The rotating speed of applicator roll:0.5m/ minutes~10m/ minutes
The rotating speed of metering roll:5m/ minutes
The gap of applicator roll and backing roll:3.0mm
The indentation thickness of metering roll:0.2mm
Then, the figured glass for being formed with coated film has been calcined at 650 DEG C~700 DEG C to (calcining in 2 minutes in an atmosphere
Process).Later, it has carried out that glass surface blows air is come quickly to carry out cooling air-cooled intensive treatment.
7 kinds of laminated bodies (figured glass with antireflection film) have been made as described above.
Further 7 kinds of laminated bodies have been carried out with measurement and evaluation same as Example 1.The knot that will be measured and evaluate
Fruit is shown in following table 4.
[Table 4]
As shown in table 4, by with solid component concentration is set as in the same manner as above-described embodiment 1~8 10 mass % or more and
Coating weight is set as 1.8mL/m2Hereinafter, obtaining the good antireflection film of antireflection.
Wherein, if such as embodiment 6,9 and embodiment 10 are compared it is found that using average primary particle diameter be 10nm with
Under silicon dioxide granule then compared with when it is more than the silicon dioxide granule of 10nm to use average primary particle diameter, antireflection is more
It improves.Also, use the embodiment 9 of spherical silicon dioxide compared with the embodiment 11 for the silica for having used non-spherical,
Antireflection is more excellent.
Also, embodiment 12,13 is compared with embodiment 6, the content of surfactant is 0.1 mass %~0.5
For embodiment 6 in the range of quality % compared with the embodiment 12~13 outside above range, antireflection is more excellent.
Then, embodiment 14,15 is compared with embodiment 6, the water-miscible organic solvent (propylene glycol) that 188 DEG C of boiling point
Content be 0.1 mass of mass %~1.5 % in the range of embodiment 6 compared with the embodiment 14,15 outside above range,
Antireflection is more excellent.
Industrial availability
The manufacturing method of the laminated body of the disclosure is suitable for the technical field relative to incident light requirement high-transmission rate, such as
It is preferable to use in the light incident side for being set to optical lens, optical filter, monitor camera, mark or solar cell module etc.
Component (windshield, lens etc.), lighting apparatus light irradiation side component (diffusing glass etc.) protective film or antireflection
Thin film field effect transistor (TFT) planarization film etc. of film, various displays.
Entire content disclosed in 2 months 2016 Japanese patent applications filed in 29 days 2016-038287 by reference to and
It introduces in this manual.
About whole documents, patent application and the technical standard described in this specification, with it is specific and record respectively
The case where each document, patent application and technical specification identical degree, introduced in this manual in a manner of citation.
Claims (13)
1. a kind of manufacturing method of laminated body, with the following process:
The process for forming coated film, in the process, by aqueous coating compositions with 1.8mL/m2Coating weight below is applied to extremely
Coated film is formed on the face with the concaveconvex structure of the glass baseplate with concaveconvex structure on few one side, the aqueous painting
At least one of precursor of particle and metal oxide that cloth composition contains metal oxide and solid component concentration is
10 mass % or more;And
In the process, counnter attack is formed by being dried by being coated with the coated film that is formed for the process for forming antireflection film
The process for penetrating film.
2. manufacturing method layered product according to the claim 1, wherein
The particle of the metal oxide is silicon dioxide granule, and the precursor of the metal oxide is silicate.
3. the manufacturing method of laminated body according to claim 2, wherein
The silicon dioxide granule is spherical silicon dioxide.
4. the manufacturing method of laminated body according to any one of claim 1 to 3, wherein
The average primary particle diameter of the particle of the metal oxide is 1nm~10nm.
5. the manufacturing method of laminated body according to any one of claim 1 to 4, wherein
Viscosity of the aqueous coating compositions at 25 DEG C is 1mPas~3mPas.
6. the manufacturing method of laminated body according to any one of claim 1 to 5, wherein
The aqueous coating compositions include surfactant, and the content of the surfactant is relative to the aqueous coating group
The gross mass for closing object is 0.1 mass of mass %~0.5 %.
7. the manufacturing method of laminated body according to any one of claim 1 to 6, wherein
The aqueous coating compositions include the water-miscible organic solvent that boiling point is 120 DEG C or more, the water-miscible organic solvent
Content relative to the aqueous coating compositions gross mass be 0.1 mass of mass %~1.5 %.
8. the manufacturing method of laminated body according to any one of claim 1 to 7, wherein
The aqueous coating compositions include:The silicic acid of the particle of metal oxide and precursor as the metal oxide
Salt,
The ratio between the content of the content of the particle of metal oxide relative to silicate is 20/1~4/1 by quality ratio.
9. the manufacturing method of laminated body according to any one of claim 1 to 8,
The manufacturing method of the laminated body also has the process for calcining the antireflection film.
10. a kind of glass with antireflection film, has:
The glass baseplate with concaveconvex structure at least one side;And
Antireflection film, the antireflection film are configured at the face with concaveconvex structure of the glass baseplate, average film thickness be 120nm~
180nm, and standard deviation is 20nm or less.
11. the glass according to claim 10 with antireflection film, wherein
The antireflection film contains the particle of metal oxide.
12. the glass according to claim 11 with antireflection film, wherein
The particle of the metal oxide is silicon dioxide granule.
13. a kind of solar cell module has the glass with antireflection film described in any one of claim 10~12
Glass.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016038287 | 2016-02-29 | ||
| JP2016-038287 | 2016-02-29 | ||
| PCT/JP2017/004830 WO2017150132A1 (en) | 2016-02-29 | 2017-02-09 | Manufacturing method for laminate, glass with anti-reflection film and solar cell module |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108698918A true CN108698918A (en) | 2018-10-23 |
Family
ID=59744004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780013405.0A Pending CN108698918A (en) | 2016-02-29 | 2017-02-09 | The manufacturing method of laminated body, the glass with antireflection film and solar cell module |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2017150132A1 (en) |
| CN (1) | CN108698918A (en) |
| WO (1) | WO2017150132A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117940043A (en) * | 2022-03-10 | 2024-04-26 | 索马龙株式会社 | Sundries for appreciation and the like |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018221739A1 (en) * | 2017-06-02 | 2018-12-06 | 富士フイルム株式会社 | Coating composition and method for producing laminated body |
| JP2019110219A (en) * | 2017-12-19 | 2019-07-04 | 株式会社 シリコンプラス | Coating material for solar cell panel |
| KR20200099786A (en) * | 2019-02-15 | 2020-08-25 | 엘지전자 주식회사 | Solar cell panel |
| KR102073880B1 (en) * | 2019-07-05 | 2020-02-05 | (주)대은 | Coating composition for solar cell module and Solar cell module coated by using the same |
| JP7366244B2 (en) * | 2020-04-08 | 2023-10-20 | 三菱電機株式会社 | Coating composition, coating film, article, optical equipment, lighting equipment, air conditioner, and method for producing coating film |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005157037A (en) * | 2003-11-27 | 2005-06-16 | Konica Minolta Opto Inc | Antireflection film, polarizing plate and image display apparatus |
| CN1794016A (en) * | 2004-12-22 | 2006-06-28 | 日东电工株式会社 | Hard-coated antiglare film and method of manufacturing the same |
| JP5049542B2 (en) * | 2005-09-26 | 2012-10-17 | 富士フイルム株式会社 | Antireflection film, polarizing plate, and image display device using the same |
| CN103515457A (en) * | 2012-06-26 | 2014-01-15 | 日挥触媒化成株式会社 | Method for manufacturing substrate with anti-reflection film and photovoltaic cell |
| TW201501924A (en) * | 2013-05-13 | 2015-01-16 | Fujifilm Corp | Anti-reflection film, polarizer, cover glass, image display apparatus, method for manufacturing anti-reflection film, cloth for cleaning anti-reflection film, kit having anti-reflection film and cloth for cleaning anti-reflection film |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002214413A (en) * | 1998-02-17 | 2002-07-31 | Dainippon Printing Co Ltd | Non-glare film, polarizing element and display device |
| JP2005266051A (en) * | 2004-03-17 | 2005-09-29 | Konica Minolta Opto Inc | Antireflection film, polarizing plate, and image display device |
| JP2006053538A (en) * | 2004-07-12 | 2006-02-23 | Fuji Photo Film Co Ltd | Antireflection film, polarizing plate and image display device using the same |
| KR20140088862A (en) * | 2011-10-03 | 2014-07-11 | 아사히 가라스 가부시키가이샤 | Method of manufacturing object with low reflection film |
-
2017
- 2017-02-09 WO PCT/JP2017/004830 patent/WO2017150132A1/en active Application Filing
- 2017-02-09 JP JP2018502993A patent/JPWO2017150132A1/en not_active Ceased
- 2017-02-09 CN CN201780013405.0A patent/CN108698918A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005157037A (en) * | 2003-11-27 | 2005-06-16 | Konica Minolta Opto Inc | Antireflection film, polarizing plate and image display apparatus |
| CN1794016A (en) * | 2004-12-22 | 2006-06-28 | 日东电工株式会社 | Hard-coated antiglare film and method of manufacturing the same |
| JP5049542B2 (en) * | 2005-09-26 | 2012-10-17 | 富士フイルム株式会社 | Antireflection film, polarizing plate, and image display device using the same |
| CN103515457A (en) * | 2012-06-26 | 2014-01-15 | 日挥触媒化成株式会社 | Method for manufacturing substrate with anti-reflection film and photovoltaic cell |
| TW201501924A (en) * | 2013-05-13 | 2015-01-16 | Fujifilm Corp | Anti-reflection film, polarizer, cover glass, image display apparatus, method for manufacturing anti-reflection film, cloth for cleaning anti-reflection film, kit having anti-reflection film and cloth for cleaning anti-reflection film |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117940043A (en) * | 2022-03-10 | 2024-04-26 | 索马龙株式会社 | Sundries for appreciation and the like |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017150132A1 (en) | 2017-09-08 |
| JPWO2017150132A1 (en) | 2018-09-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108698918A (en) | The manufacturing method of laminated body, the glass with antireflection film and solar cell module | |
| JP6603916B2 (en) | Inorganic oxide coating | |
| TWI713631B (en) | Film-attached curved substrate, manufacturing method thereof, and image display device | |
| US8974066B2 (en) | Optical coatings with plate-shaped particles and methods for forming the same | |
| CN102617045B (en) | SiO2 antireflection thin film and preparation method thereof | |
| TWI753154B (en) | Coating and coating formulation | |
| US20170160435A1 (en) | Stain resistant particles | |
| CN101631745B (en) | Silica porous body, laminate and composition for optical use, and method for producing silica porous body | |
| CN105754381B (en) | A kind of nanometer anti-reflection coating liquid and its preparation method and application | |
| TW201219507A (en) | Coating composition and method of making and using the same | |
| US20200399170A1 (en) | Coated glass sheet and method for producing same | |
| ES2910156T3 (en) | Method for producing a textured glass substrate coated with a sol-gel type anti-reflective coating | |
| TW201423142A (en) | Antifouling antireflection film, article and method for manufacturing same | |
| TW201532994A (en) | Glass plate with anti-glare function for solar cells | |
| CN104745052B (en) | A kind of preparation method of the Nano self-cleaning coating material of high adhesion force | |
| US20140182670A1 (en) | Light trapping and antireflective coatings | |
| CN105439465B (en) | A kind of photovoltaic tempered glass and preparation method thereof | |
| JP5471825B2 (en) | Heat ray reflective laminate and heat ray reflective layer forming coating solution | |
| CN106277839B (en) | Composite film with super-amphiphobic self-cleaning, anti-reflection and permeability-increasing performances and preparation method thereof | |
| JP6348276B2 (en) | Coating liquid for forming antireflection film, substrate with antireflection film, production method thereof, and use thereof | |
| US20240302571A1 (en) | Method of producing single layer omnidirectional broadband antireflective and super hydrophilic (antifogging) coatings for solar and other applications | |
| WO2017150393A1 (en) | Aqueous coating composition, anti-reflection film, laminate, method for producing laminate, and solar cell module | |
| JP2017096990A (en) | Method for producing light reflection film | |
| CN107138372A (en) | It is a kind of to improve the method for silica optical characteristics by surface crystallization | |
| Belleville et al. | Sol-gel antireflective spin-coating process for large-size shielding windows |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20181023 |