CN108693581A - Toroid holographic grating making process - Google Patents
Toroid holographic grating making process Download PDFInfo
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- CN108693581A CN108693581A CN201710226818.9A CN201710226818A CN108693581A CN 108693581 A CN108693581 A CN 108693581A CN 201710226818 A CN201710226818 A CN 201710226818A CN 108693581 A CN108693581 A CN 108693581A
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- grating
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- exposure
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Toroid holographic grating making process proposed by the present invention, it is related to a kind of holographic grating making process, including base treatment, gluing, front baking, holographic exposure, development, rear baking, ion beam etching, plated film, since holographic lithography is very strict to making required precision, in toroid holographic grating technique the error of any one step all may the spectrum property final to toroid grating cause tremendous influence, so to the manufacturing technology of toroid holographic grating carry out research be very it is necessary to.The holographic grating making process of the present invention, simple for process, be easy to control, success rate is high.
Description
Technical field
The present invention relates to a kind of holographic grating making process, especially toroid holographic grating making process.
Background technology
Toroid holographic grating had both simultaneously as light-splitting device dispersion, focal imaging, aberration correction, without ghost line, low miscellaneous
The characteristics such as astigmatism play in the fields such as extreme ultraviolet and Soft X-Ray Region high resolution spectrometer always important since the invention
Effect.The face type feature and the cutting regularity of distribution of toroid holographic grating make it have outstanding anaberration ability, but same
Make it develop difficulty to increase.
Invention content
Toroid holographic grating making process provided by the invention reduces processing step, reduces equipment investment.
The present invention specifically adopts the following technical scheme that realization:
A kind of toroid holographic grating making process, includes the following steps:
Step 1, base treatment, include the following steps:
Step 11, cleaning, toroid grating substrate is put into the sodium hydroxide solution that a certain concentration is 10% and is impregnated, is gone
Except residual organic matter, then rinsed using a large amount of deionized waters, drying;
Step 12, spraying delustring paint spray black matting paint at the back side of grating and side, reduce in interference exposure process
Stray light;
Step 13 removes organic residue, after the delustring paint of toroid holographic grating substrate spontaneously dries, repeats above-mentioned clear
After washing step, the optical surface of grating substrate is wiped using acetone, grating substrate optics table can be effectively removed in this way
Delustring paint on face and other organic residues;
Step 14, drying, dry 30min in 120 DEG C of baking oven, so as to evaporative light grid base bottom surface deionized water and
Acetone soln just completes the base treatment link of toroid holographic grating after grating substrate cooling;
Step 2, gluing carry out gluing, the grating that will be handled well using spin coating method to toroid holographic grating substrate
Substrate is placed on vacuum suction on the gluing pallet of glue spreader and fixes, and appropriate photoresist is then added dropwise on grating substrate surface,
It is needed to set gluing program according to toroid Design of Holographic Grating, carries out three-stage or five-part form gluing;
Step 3, front baking, be in 85 DEG C~95 DEG C in temperature, the time in 30min to carrying out drying and processing between 120min;
Step 4, holographic exposure, the grating substrate of photoresist film layer qualification can in the interference exposure field put up into
Row exposes, when the grating substrate after gluing exposes in good interference exposure field, the photoetching of substrate surface different spatial
Glue is reacted to form sub-image grating in interference field by the interference light generation of rule distribution, and it is real that exposure may be used in this process
When monitoring technology the light exposure of grating is monitored;
Grating substrate immersion after exposure is carried out chemical etching, according to the light used by step 5, development in developer solution
Photoresist type is different, and developing process will etch the photoresist of different piece:If the photoresist used is positive photoresist, through overexposure
The corrosion resistance of light part improves, and developer solution will etch away the photoresist not being exposed;Opposite, if the photoresist used is
Negtive photoresist, then developer solution will etch away the photoresist of exposure;
Step 6, rear baking-hot melt are dried 10 minutes using the temperature higher than deionized water boiling point;After the completion of rear baking,
Photoresist can be changed into molten condition under high temperature, when photoresist starts to change to molten condition, the outermost layer of photoresist cutting
It can melt first and soften, the tiny burr that photoresist can voluntarily eliminate embossment scored surface under the action of surface tension makes photoetching
Glue scored surface tends to be smooth;
Step 7, ion beam etching perform etching photoresist grating as reflection gas using inert gas, by photoetching
The cutting of glue grating is transferred on grating substrate;
Grating is put into deionized water and carries out ultrasonic vibration by step 8, cleaning treatment, again to the grating after supersound process
The dust clast generated in ion beam etching of Fresnel can be effectively removed by carrying out drying;
Step 9, plated film plate one layer of aluminium film on holographic grating surface using the method for distillation, can also be plated again on aluminium is touched
One layer of SiO2Film protects aluminium film, prevents its oxidation.
Toroid holographic grating making process provided by the invention, advantage are:It is simple for process, be easy to control,
Success rate is high.
Description of the drawings
Fig. 1 is toroid holographic grating making process flow chart of the present invention.
Specific implementation mode
To further illustrate that each embodiment, the present invention are provided with attached drawing.These attached drawings are that the invention discloses one of content
Point, mainly to illustrate embodiment, and the associated description of specification can be coordinated to explain the operation principles of embodiment.Cooperation ginseng
These contents are examined, those of ordinary skill in the art will be understood that other possible embodiments and advantages of the present invention.In figure
Component be not necessarily to scale, and similar component symbol is conventionally used to indicate similar component.
In conjunction with the drawings and specific embodiments, the present invention is further described.
As shown in Figure 1, toroid holographic grating making process provided in this embodiment, include mainly base treatment, gluing,
The processes such as front baking, holographic exposure, development, rear baking, ion beam etching, plated film.Since holographic lithography is to making required precision
Spectrum very strict, that the error of any one step all may be final to toroid grating in toroid holographic grating technique
Can cause tremendous influence, thus to the manufacturing technology of toroid holographic grating carry out research be very it is necessary to.The present embodiment
Specific make step it is as follows:
Step 1, base treatment, are the first steps of toroid holographic grating making, and clean grating substrate is holographic grating
The basic demand in overall process is produced, cleaning has run through the overall process of holographic grating production, directly affected final grating
Surface quality.The grating blank made is required to cannot be directly used to toroid holographic grating according to toroid Design of Holographic Grating
It makes, first has to clean it, toroid grating substrate is put into the sodium hydroxide solution that a certain concentration is 10% and is soaked
Bubble removes residual organic matter, is then rinsed using a large amount of deionized waters, drying.It will be to toroid grating after completion cleaning step
Substrate sprays delustring paint, spuious in the back side of grating and side spraying black matting paint can reduce interference exposure process
Light.After the delustring paint of toroid holographic grating substrate spontaneously dries, after repeating above-mentioned cleaning step, using acetone to grating base
The optical surface at bottom is wiped, and the delustring paint that can be effectively removed in this way on grating substrate optical surface is organic residual with other
It is remaining.The solution of the deionized water and acetone of the grating substrate optical surface meeting residual minim wiped through over cleaning and acetone, if
Subsequent spin processes may be influenced by not handling it.Therefore it needs to dry the grating substrate after being cleaned,
General selection dries 30min in 120 DEG C of baking oven, so as to the deionized water and acetone soln of evaporative light grid base bottom surface,
The base treatment link that toroid holographic grating is just completed after grating substrate cooling, can carry out the spin coating work of grating substrate
Skill.
Step 2, gluing carry out gluing, the grating that will be handled well using spin coating method to toroid holographic grating substrate
Substrate is placed on vacuum suction on the gluing pallet of glue spreader and fixes, and appropriate photoresist is then added dropwise on grating substrate surface,
It is needed to set gluing program according to toroid Design of Holographic Grating, carries out three-stage or five-part form gluing.Coating technique is photoetching
The quality of the important step of technology, grating substrate photoresist film directly affects the spectrum property of holographic grating, therefore entire spin coating
Technique needs to keep very high cleanliness factor and stability.
Step 3, front baking, the photoresist of still remaining a part of high volatile is organic molten in the photoresist film layer of grating substrate
Agent, remaining photoresist diluent can reduce the firmness of photoresist film layer, and degumming phenomenon may occur in developing process, and
And the remaining diluent in photoresist film layer can influence the uniformity of photoresist film layer, it is therefore necessary to the grating substrate after spin coating
It is dried.The temperature selection of front baking is most important, and excessively high temperature can make photoresist film generate heat cross-linking and skin effect, no
But the chemosensitivity for hampering the evaporation of photoresist diluent inside photoresist film layer, and affecting photoresist itself;It crosses
Low pre-bake temperature makes the photoresist diluent in photoresist film layer be difficult to complete evaporation.Under normal circumstances according to the specific of grating
Design requirement pre-bake temperature is selected in 85 DEG C~95 DEG C, the front baking time is selected in 30min between 120min.
Step 4, holographic exposure, the grating substrate of photoresist film layer qualification can in the interference exposure field put up into
Row exposure, the emphasis of exposure technology is the stability of entire exposure system and the quality of interference field.Grating substrate after gluing exists
When being exposed in good interference exposure field, the photoresist of substrate surface different spatial and doing by rule distribution in interference field
Relate to light and generate reaction and form sub-image grating, may be used in this process exposure real time monitoring to the light exposure of grating into
Row monitoring, to search out the optimum exposure corresponding time for exposure.The distribution situation of exposure field internal interference striped, interference system
Vibrations, the airflow stability that makes space the quality of sub-image grating cutting is influenced huge, need to keep highly stable exposure
Luminous environment.
Grating substrate immersion after exposure is carried out chemical etching, according to the light used by step 5, development in developer solution
Photoresist type is different, and developing process will etch the photoresist of different piece:If the photoresist used is positive photoresist, through overexposure
The corrosion resistance of light part improves, and developer solution will etch away the photoresist not being exposed;Opposite, if the photoresist used is
Negtive photoresist, then developer solution will etch away the photoresist of exposure.It is formd by rule by the photoresist film layer at post-develop grid base bottom
The relief shape that rule height rises and falls needs to rinse grating base with a large amount of deionized waters after development here it is the cutting of holographic grating
Bottom remains in the developer solution on grating substrate surface to remove.Developing process requires strictly cleanliness factor, the developing time of developer solution,
Developer solution cleanliness factor not enough can form flaw, serious or even can cause degumming on photoresist grating surface;And developing time mistake
Length can cause grating substrate development excessive, and photoresist cutting disappears, and developing time can not enough cause photoresist sub-image grating to react
Not exclusively, cutting does not reach sub-image grating bottom, increases difficulty to subsequent ion beam etching technics.
Step 6, rear baking-hot melt can remain some moisture on the grating substrate after development, and remaining deionized water can shadow
The firmness between photoresist and grating substrate is rung, needs to dry it, this drying course dries after being generally referred to as.Afterwards
It dries generally using temperature drying a period of time higher than deionized water boiling point.In grating exposure process, by building light path institute
The reasons meetings such as the defect of the optical device used itself, the error of interference field debugging, the vibrations in exposure process and air flowing
Cause photoresist embossment scored surface existing defects, and follow-up ion beam etch process also can will be in these photoresist embossment cuttings
Defect etch on grating substrate.Technique can be dried by after slightly to adjust, it is smooth with the surface for improving photoresist embossment cutting
Degree.After the completion of rear baking, improves drying temperature and grating substrate is continued to toast, since photoresist belongs to noncrystalline material
Matter, at high temperature photoresist can be changed into molten condition, when photoresist starts to change to molten condition, photoresist cutting is most
Outer layer can melt softening first, and the tiny burr that photoresist can voluntarily eliminate embossment scored surface under the action of surface tension makes
Photoresist scored surface tends to be smooth.
Step 7, ion beam etching perform etching photoresist grating as reflection gas using inert gas, by photoetching
The cutting of glue grating is transferred on grating substrate, according to the design needs, the shape of cutting is controlled during pattern transfer, is carried
High-diffraction efficiency.
Step 8, cleaning treatment, grating surface will necessarily have some fine debris during ion beam etching, need
It is cleared up.Cleaning treatment after ion beam etching is that grating is put into deionized water to carry out ultrasonic vibration, at ultrasound
Grating after reason carries out drying again can effectively remove the dust clast generated in ion beam etching of Fresnel.
Step 9, in order to ensure grating diffration efficiency, general holography ion beam grating will also carry out coating process, generally
Situation plates one layer of aluminium film using the method for distillation on holographic grating surface, can also plate one layer of SiO again on aluminium is touched2Film protects aluminium
Film prevents its oxidation.
Whole manufacture crafts of toroid holographic grating are had been completed by the grating of plated film.
Although specifically showing and describing the present invention in conjunction with preferred embodiment, those skilled in the art should be bright
In vain, it is not departing from the spirit and scope of the present invention defined by the appended claims, it in the form and details can be right
The present invention makes a variety of changes, and is protection scope of the present invention.
Claims (1)
1. a kind of toroid holographic grating making process, which is characterized in that include the following steps:
Step 1, base treatment, include the following steps:
Step 11, cleaning, toroid grating substrate is put into the sodium hydroxide solution that a certain concentration is 10% and is impregnated, and removal is residual
Organic matter is stayed, is then rinsed using a large amount of deionized waters, drying;
Step 12, spraying delustring paint spray black matting paint at the back side of grating and side, reduce miscellaneous in interference exposure process
Astigmatism;
Step 13 removes organic residue, after the delustring paint of toroid holographic grating substrate spontaneously dries, repeats above-mentioned cleaning step
After rapid, the optical surface of grating substrate is wiped using acetone, can be effectively removed on grating substrate optical surface in this way
Delustring paint and other organic residues;
Step 14, drying, dry 30min, so as to the deionized water and acetone of evaporative light grid base bottom surface in 120 DEG C of baking oven
Solution just completes the base treatment link of toroid holographic grating after grating substrate cooling;
Step 2, gluing carry out gluing, the grating substrate that will be handled well using spin coating method to toroid holographic grating substrate
It is placed on vacuum suction on the gluing pallet of glue spreader to fix, appropriate photoresist is then added dropwise on grating substrate surface, according to
Toroid Design of Holographic Grating needs to set gluing program, carries out three-stage or five-part form gluing;
Step 3, front baking, be in 85 DEG C~95 DEG C in temperature, the time in 30min to carrying out drying and processing between 120min;
The grating substrate of step 4, holographic exposure, photoresist film layer qualification can be exposed in the interference exposure field put up
Light, when the grating substrate after gluing exposes in good interference exposure field, the photoresist of substrate surface different spatial with
Reaction being generated by the interference light of rule distribution in interference field and forming sub-image grating, exposure prison in real time may be used in this process
Survey technology is monitored the light exposure of grating;
Grating substrate immersion after exposure is carried out chemical etching, according to the photoresist used by step 5, development in developer solution
Type is different, and developing process will etch the photoresist of different piece:If the photoresist used is positive photoresist, pass through exposure portion
The corrosion resistance divided improves, and developer solution will etch away the photoresist not being exposed;Opposite, if the photoresist used is negative
Glue, then developer solution will etch away the photoresist of exposure;
Step 6, rear baking-hot melt are dried 10 minutes using the temperature higher than deionized water boiling point;After the completion of rear baking, in high temperature
Lower photoresist can be changed into molten condition, and when photoresist starts to change to molten condition, the outermost layer of photoresist cutting can be first
First melt and soften, the tiny burr that photoresist can voluntarily eliminate embossment scored surface under the action of surface tension makes photoresist carve
Rooved face tends to be smooth;
Step 7, ion beam etching perform etching photoresist grating as reflection gas using inert gas, by photoresist light
The cutting of grid is transferred on grating substrate;
Grating is put into deionized water and carries out ultrasonic vibration by step 8, cleaning treatment, is carried out again to the grating after supersound process
Drying can effectively remove the dust clast generated in ion beam etching of Fresnel;
Step 9, plated film plate one layer of aluminium film on holographic grating surface using the method for distillation, can also plate one layer again on aluminium is touched
SiO2Film protects aluminium film, prevents its oxidation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710226818.9A CN108693581A (en) | 2017-04-10 | 2017-04-10 | Toroid holographic grating making process |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710226818.9A CN108693581A (en) | 2017-04-10 | 2017-04-10 | Toroid holographic grating making process |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110346857A (en) * | 2019-07-15 | 2019-10-18 | 英诺激光科技股份有限公司 | Utilize the method for multi beam ultrafast laser production diffraction optical device |
| CN117219495A (en) * | 2023-11-07 | 2023-12-12 | 北京晨晶电子有限公司 | Method for solving optical proximity effect |
-
2017
- 2017-04-10 CN CN201710226818.9A patent/CN108693581A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110346857A (en) * | 2019-07-15 | 2019-10-18 | 英诺激光科技股份有限公司 | Utilize the method for multi beam ultrafast laser production diffraction optical device |
| CN117219495A (en) * | 2023-11-07 | 2023-12-12 | 北京晨晶电子有限公司 | Method for solving optical proximity effect |
| CN117219495B (en) * | 2023-11-07 | 2024-02-23 | 北京晨晶电子有限公司 | Method for solving optical proximity effect |
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| PB01 | Publication | ||
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| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20181023 |