CN108682982A - A kind of isomery copper bar and the method for improving Rack whole machine cabinet electrical stabilities - Google Patents
A kind of isomery copper bar and the method for improving Rack whole machine cabinet electrical stabilities Download PDFInfo
- Publication number
- CN108682982A CN108682982A CN201810290193.7A CN201810290193A CN108682982A CN 108682982 A CN108682982 A CN 108682982A CN 201810290193 A CN201810290193 A CN 201810290193A CN 108682982 A CN108682982 A CN 108682982A
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- China
- Prior art keywords
- copper bar
- capacitive region
- cathode
- positive
- isomery
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
- G06F1/26—Power supply means, e.g. regulation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/02—Single bars, rods, wires, or strips
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/66—Structural association with built-in electrical component
- H01R13/6608—Structural association with built-in electrical component with built-in single component
- H01R13/6625—Structural association with built-in electrical component with built-in single component with capacitive component
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R43/00—Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R2201/00—Connectors or connections adapted for particular applications
- H01R2201/06—Connectors or connections adapted for particular applications for computer periphery
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- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
The present invention provides a kind of isomery copper bar, belong to Rack server power supply technique fields, its structure includes the positive copper bar and cathode copper bar of parallel and symmetrical arrangement, the top of positive copper bar and cathode copper bar is respectively contact zone one, bending forms the capacitive region one of U-shaped shape respectively for middle and upper part, middle and lower part is respectively positive contact zone two, and the capacitive region two that bending forms L-type shape is distinguished in lower part;To the left, the U-shaped opening of cathode copper bar capacitive region one is to the right for the U-shaped opening of positive copper bar capacitive region one;The L-type opening of positive copper bar capacitive region two is open towards left obliquely downward, the L-type of cathode copper bar capacitive region two towards right obliquely downward;Positive copper bar and cathode copper bar are located in approximately the same plane, and the U-shaped bottom of positive copper bar capacitive region one and cathode copper bar capacitive region one is face to face and there are gaps one, to balance the parasitic inductance on copper bar;The L-type side of positive copper bar capacitive region two and cathode copper bar capacitive region two is face to face and there are gaps two;Gap one and gap two are equal.
Description
Technical field
The present invention relates to Rack server power supply technique fields, specifically a kind of isomery copper bar and raising Rack complete machines
The method of cabinet electrical stability.
Background technology
Rack whole machine cabinet servers, such as domestic scorpio framework, foreign countries' OCP frameworks, power supply all use parallel copper bar for machine
Single node is powered in cabinet.But due in whole machine cabinet copper bar it is generally longer, itself parasitic inductance is larger.When being saved in cabinet
When point transient current is excessive, since the effect of parasitic inductance can cause node input voltage larger fluctuation, to influence to take
The normal work of business device node, results even in server delay machine.
The problem of for current parallel copper bar parasitic inductance, current solution be increase on server node it is more
Capacitance stablize input voltage.This method the problem is that:1) the more difficult determination of capacitor's capacity needs gradually to go to test by experiment
The suitable value of card one;2) capacitor's capacity is generally large, and surge current is excessively high on node, therefore hot plug circuit difficult design.
Invention content
The technical assignment of the present invention is to solve the deficiencies in the prior art, for the parallel power supply copper bar of Rack whole machine cabinet servers
Since the effect of parasitic inductance can cause node input voltage larger fluctuation to influence server node normal work
Disadvantage provides a kind of isomery copper bar.
The technical scheme is that realize in the following manner:
A kind of isomery copper bar, structure include the positive copper bar and cathode copper bar of parallel and symmetrical arrangement, positive copper bar
Top is positive contact zone one, and the middle and upper part bending of positive copper bar forms the positive capacitive region one of U-shaped shape, in positive copper bar
Lower part is positive contact zone two, and the bottom fold of positive copper bar forms the positive capacitive region two of L-type shape, positive capacitive region one
To the left, the L-type of positive capacitive region two is open towards left obliquely downward U-shaped opening;The top of cathode copper bar is cathode contact area one, cathode
The middle and upper part bending of copper bar forms the cathode capacitive region one of U-shaped shape, and the middle and lower part of cathode copper bar is cathode contact area two, cathode
The bottom fold of copper bar forms the cathode capacitive region two of L-type shape, the U-shaped opening of cathode capacitive region one to the right, cathode capacitive region
Two L-type is open towards right obliquely downward;Positive copper bar and cathode copper bar are located in approximately the same plane;The positive capacitive region of positive copper bar
One is reversed with the U-shaped opening of the cathode capacitive region one of cathode copper bar, the positive capacitive region one of positive copper bar and bearing for cathode copper bar
The U-shaped bottom in electrode capacitance area one is face to face and there are gaps one;The positive capacitive region two of positive copper bar is negative with cathode copper bar
The L-type opening in electrode capacitance area two is reversed, the L-type side of the positive capacitive region two of positive copper bar and the cathode capacitive region two of cathode copper bar
Portion is face to face and there are gaps two;Gap one and gap two are equal.This isomery copper bar is identical as the application of existing copper bar, only not
Crossing is, the positive capacitive region one of this isomery copper bar and being oppositely arranged so as to form a parallel plate capacitor for cathode capacitive region one
Device, this is equivalent to both increase a capacitance in each node input sections of Rack, for balancing the parasitic inductance on copper bar.
Based on above-mentioned isomery copper bar, the present invention also provides a kind of method improving Rack whole machine cabinet electrical stabilities, the party
The realization step of method includes:
1) above-mentioned isomery copper bar is made, the positive capacitive region one of the isomery copper bar and the formation one of cathode capacitive region one are parallel
Plate capacitor;
2) size of isomery copper bar capacitive region one, the gap d of positive capacitive region one and cathode capacitive region one are determined, thus really
Determine the capacitance of institute's formation plane-parallel capacitor;
3) it is emulated using the electrical equivalent model of made isomery copper bar in simulation model extraction 1), in simulation process
In, the medium or gap d of isomery copper bar capacitive region one are added by change, carries out the matching of capacitance C and inductance L, is managed
By the noninductive copper bar of calculating;
4) suitable media is chosen according to simulation result, and the medium is added to the capacitive region one of actual fabrication isomery copper bar,
It is set to be substantially equal to simulation result;
5) the isomery copper bar that medium is added is tested, finely tunes capacitivity, the fine tuning isomery copper bar capacitive region one of medium
Gap, adapt to actual application environment.
In step 2), one size of capacitive region of the isomery copper bar includes:Positive capacitive region one and cathode capacitive region one
Facing area A, or positive capacitive region one and one right opposite of cathode capacitive region lateral length a, vertical extension b.
During the realization of this method, foundation:
C=ε A/d=ε ab/d (1)
There is (1) (2) two formula that can obtain
It is calculated by (1) (3)
Wherein, L indicates that the parasitic inductance of copper bar, C indicate that the parasitic capacitance of copper bar, ε indicate the capacitivity of medium, f statements
The frequency of copper bar curent change;
The relationship between ε, d, L three can be obtained by (4), and then makes the noninductive copper bar under theoretical case.
A kind of isomery copper bar of the present invention and improve the methods of Rack whole machine cabinet electrical stabilities institute compared with prior art
The advantageous effect of generation is:
The isomery copper bar of the present invention solves the problems, such as parasitic inductance existing for existing parallel copper bar, improves it and is used for Rack
The stability of whole machine cabinet power supply;On the other hand, the present invention also provides a kind of application, the isomery copper bar improves the confession of Rack whole machine cabinets
The method of electrical stability, the electrical equivalent model that this method extracts isomery copper bar using simulation model are emulated, and change is passed through
Medium or the gap of isomery copper bar capacitive region one is added, carries out the matching of capacitance C and inductance L, obtains the noninductive of theoretical calculation
Influence of the parasitic inductance to electrical stability is eliminated or reduced to copper bar.
Description of the drawings
Attached drawing 1 is the structural schematic diagram of isomery copper bar of the present invention;
Attached drawing 2 is the structure right view of positive copper bar in Fig. 1.
Label in attached drawing indicates respectively:
1, positive copper bar, 2, cathode copper bar, 3, positive contact zone one,
4, positive capacitive region one, 5, positive contact zone two, 6, positive capacitive region two,
7, cathode contact area one, 8, cathode capacitive region one, 9, cathode contact area two,
10, cathode capacitive region two.
Specific implementation mode
The exemplary embodiment of the disclosure is described in more detail below with reference to Figure of description.Although Figure of description is aobvious
The exemplary embodiment of the disclosure is shown, it being understood, however, that may be realized in various forms the disclosure without that should be explained here
The embodiment stated is limited.On the contrary, these embodiments are provided to facilitate a more thoroughly understanding of the present invention, and can be by this
Scope of disclosure is completely communicated to those skilled in the art.
Embodiment one:
As shown in attached drawing 1,2, a kind of isomery copper bar of the invention, structure includes the positive copper bar of parallel and symmetrical arrangement
1 and cathode copper bar 2, the top of positive copper bar 1 is positive contact zone 1, and the middle and upper part bending of positive copper bar 1 forms U-shaped shape
Positive capacitive region 1, the middle and lower part of positive copper bar 1 is positive contact zone 25, and the bottom fold of positive copper bar 1 forms L-type shape
The positive capacitive region 26 of shape, to the left, the L-type of positive capacitive region 26 is open towards a left side obliquely downward the U-shaped opening of positive capacitive region 1
Side;The top of cathode copper bar 2 is cathode contact area 1, and the middle and upper part bending of cathode copper bar 2 forms the cathode capacitance of U-shaped shape
The middle and lower part in area 1, cathode copper bar 2 is cathode contact area 29, and the bottom fold of cathode copper bar 2 forms the negative electricity of L-type shape
Hold area 2 10, to the right, the L-type of cathode capacitive region 2 10 is open towards right obliquely downward the U-shaped opening of cathode capacitive region 1;Positive copper
Row 1 and the cathode copper bar 2 are located in approximately the same plane;The positive capacitive region 1 of positive copper bar 1 and the cathode copper bar 2
The U-shaped opening of cathode capacitive region 1 is reversed, the positive capacitive region 1 of positive copper bar 1 and the cathode capacitive region 1 of cathode copper bar 2
U-shaped bottom face to face and there are gap ds;The positive capacitive region 26 of positive copper bar 1 and the cathode capacitive region of cathode copper bar 2
2 10 L-type opening is reversed, the L-type side of the positive capacitive region 26 of positive copper bar 1 and the cathode capacitive region 2 10 of cathode copper bar 2
Portion is face to face and there are gap ds.This isomery copper bar is identical as the application of existing copper bar, and only, this isomery copper bar is just
Electrode capacitance area 1 is oppositely arranged with cathode capacitive region 1 so as to form a plane-parallel capacitor, this is equivalent to
The each node input sections of Rack both increase a capacitance, for balancing the parasitic inductance on copper bar.
Embodiment two:
Based on above-mentioned isomery copper bar, the present invention also provides a kind of method improving Rack whole machine cabinet electrical stabilities, the party
The realization step of method includes:
1) the isomery copper bar described in embodiment one, positive capacitive region 1 and the cathode capacitive region 1 of the isomery copper bar are made
Form a plane-parallel capacitor;
2) the facing area A of isomery copper bar anode capacitive region 1 and cathode capacitive region 1, or positive capacitive region are determined
1 with lateral length a, the vertical extension b of one 8 right opposite of cathode capacitive region, determine anode capacitive region 1 and cathode capacitive region one
8 gap d thereby determines that the capacitance of formed plane-parallel capacitor;
3) it is emulated using the electrical equivalent model of made isomery copper bar in simulation model extraction 1), in simulation process
In, medium or gap d between isomery copper bar anode capacitive region 1 and cathode capacitive region 1 are added by change, carry out electricity
The matching for holding C and inductance L, obtains the noninductive copper bar of theoretical calculation;
4) suitable media is chosen according to simulation result, and the medium is added to the positive capacitive region of actual fabrication isomery copper bar
Between one 4 and cathode capacitive region 1, it is made to be substantially equal to simulation result;
5) the isomery copper bar that medium is added is tested, finely tunes capacitivity, the fine tuning isomery copper bar capacitive region one of medium
Gap, adapt to actual application environment.
In step 2), one size of capacitive region of the isomery copper bar includes:
During the realization of this method, foundation:
C=ε A/d=ε ab/d (1)
There is (1) (Z) two formula that can obtain
It is calculated by (1) (3)
Wherein, L indicates that the parasitic inductance of copper bar, C indicate that the parasitic capacitance of copper bar, ε indicate the capacitivity of medium, f statements
The frequency of copper bar curent change;
The relationship between ε, d, L three can be obtained by (4), and then makes the noninductive copper bar under theoretical case.
The present embodiment two protects isomery copper bar described in a kind of Application Example one to improve Rack whole machine cabinet electrical stabilities
Method, this method using simulation model extract isomery copper bar electrical equivalent model emulated, pass through change be added isomery
The medium of copper bar capacitive region one or gap carry out the matching of capacitance C and inductance L, obtain the noninductive copper bar of theoretical calculation, eliminate
Or reduce influence of the parasitic inductance to electrical stability.
In conclusion present disclosure is not limited in the above embodiments, those skilled in the art can be at this
Other embodiments are proposed within the guiding theory of invention, but these embodiments are included within the scope of the present invention.
Additionally, it should be noted that the language used in this specification primarily to readable and introduction purpose and select
, rather than selected to explain or limit subject of the present invention.Therefore, in the model without departing from the appended claims
In the case of enclosing and being spiritual, for those skilled in the art, many modifications and changes are all apparent
's.For the scope of the present invention, the disclosure that the present invention is done is illustrative and be not restrictive, and the scope of the present invention is by appended
Claims limited.
Claims (4)
1. a kind of isomery copper bar, structure includes the positive copper bar and cathode copper bar of parallel and symmetrical arrangement, which is characterized in that institute
The top for stating positive copper bar is positive contact zone one, and the middle and upper part bending of positive copper bar forms the positive capacitive region one of U-shaped shape,
The middle and lower part of positive copper bar is positive contact zone two, and the bottom fold of positive copper bar forms the positive capacitive region two of L-type shape, institute
State the U-shaped opening of positive capacitive region one to the left, the L-type opening of the anode capacitive region two is towards left obliquely downward;
The top of the cathode copper bar is cathode contact area one, and the middle and upper part bending of cathode copper bar forms the negative electricity of U-shaped shape
Hold area one, the middle and lower part of cathode copper bar is cathode contact area two, and the bottom fold of cathode copper bar forms the cathode capacitance of L-type shape
Area two, to the right, the L-type of the cathode capacitive region two is open towards right obliquely downward the U-shaped opening of the cathode capacitive region one;
The anode copper bar and the cathode copper bar are located in approximately the same plane;The positive capacitive region one of the anode copper bar and institute
The U-shaped opening for stating the cathode capacitive region one of cathode copper bar is reversed, the cathode of the positive capacitive region one and cathode copper bar of positive copper bar
The U-shaped bottom of capacitive region one is face to face and there are gaps one;The positive capacitive region two of the anode copper bar and the cathode copper
The L-type opening of the cathode capacitive region two of row is reversed, the positive capacitive region two of positive copper bar and the cathode capacitive region two of cathode copper bar
L-type side face to face and there are gaps two;The gap one and the gap two are equal.
2. a kind of method improving Rack whole machine cabinet electrical stabilities based on isomery copper bar described in claim 1, which is characterized in that
The realization step of this method includes:
1) isomery copper bar described in claim 1 is made, then the positive capacitive region one Yu cathode capacitive region one of isomery copper bar are formed
One plane-parallel capacitor;
2) size of isomery copper bar capacitive region one, the gap d of positive capacitive region one and cathode capacitive region one are determined, thereby determines that institute
Form the capacitance of plane-parallel capacitor;
3) it is emulated using the electrical equivalent model of made isomery copper bar in simulation model extraction 1), in simulation process,
The medium or gap d of isomery copper bar capacitive region one are added by change, carries out the matching of capacitance C and inductance L, obtains theoretical meter
The noninductive copper bar calculated;
4) suitable media is chosen according to simulation result, and the medium is added to the capacitive region one of actual fabrication isomery copper bar, make it
It is substantially equal to simulation result;
5) the isomery copper bar that medium is added is tested, finely tunes the capacitivity of medium, the gap of fine tuning isomery copper bar capacitive region,
Adapt to actual application environment.
3. a kind of method improving Rack whole machine cabinet electrical stabilities according to claim 2, which is characterized in that in step
2) in, one size of capacitive region of the isomery copper bar includes:The facing area A of positive capacitive region one and cathode capacitive region one, or
Lateral length a, the vertical extension b of person's anode capacitive region one and one right opposite of cathode capacitive region.
4. a kind of method improving Rack whole machine cabinet electrical stabilities according to claim 2, which is characterized in that in the party
During the realization of method, foundation:
C=ε A/d=ε ab/d (1)
There is (1) (Z) two formula that can obtain
It is calculated by (1) (3)
Wherein, L indicates that the parasitic inductance of copper bar, C indicate that the parasitic capacitance of copper bar, ε indicate that the capacitivity of medium, f state copper bar
The frequency of curent change;
The relationship between ε, d, L three can be obtained by (4), and then makes the noninductive copper bar under theoretical case.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810290193.7A CN108682982A (en) | 2018-04-03 | 2018-04-03 | A kind of isomery copper bar and the method for improving Rack whole machine cabinet electrical stabilities |
PCT/CN2018/091778 WO2019192077A1 (en) | 2018-04-03 | 2018-06-19 | Heterogeneous copper bar and method for improving power supply stability of rack integrated cabinet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201810290193.7A CN108682982A (en) | 2018-04-03 | 2018-04-03 | A kind of isomery copper bar and the method for improving Rack whole machine cabinet electrical stabilities |
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CN108682982A true CN108682982A (en) | 2018-10-19 |
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CN201810290193.7A Pending CN108682982A (en) | 2018-04-03 | 2018-04-03 | A kind of isomery copper bar and the method for improving Rack whole machine cabinet electrical stabilities |
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CN (1) | CN108682982A (en) |
WO (1) | WO2019192077A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111372396A (en) * | 2020-02-22 | 2020-07-03 | 苏州浪潮智能科技有限公司 | Server node splicing electricity taking protection circuit, server cabinet and server node |
CN111983352A (en) * | 2020-08-17 | 2020-11-24 | 江苏昂内斯电力科技股份有限公司 | Wisdom is gathered detector with electric networking |
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CN204130523U (en) * | 2014-07-08 | 2015-01-28 | 南京银茂微电子制造有限公司 | A kind of power model lead terminal |
CN104617414A (en) * | 2015-01-19 | 2015-05-13 | 株洲南车时代电气股份有限公司 | Laminated power terminal |
CN104617071A (en) * | 2015-01-19 | 2015-05-13 | 株洲南车时代电气股份有限公司 | Power terminal group and power electronic module |
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2018
- 2018-04-03 CN CN201810290193.7A patent/CN108682982A/en active Pending
- 2018-06-19 WO PCT/CN2018/091778 patent/WO2019192077A1/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN204130523U (en) * | 2014-07-08 | 2015-01-28 | 南京银茂微电子制造有限公司 | A kind of power model lead terminal |
CN104617414A (en) * | 2015-01-19 | 2015-05-13 | 株洲南车时代电气股份有限公司 | Laminated power terminal |
CN104617071A (en) * | 2015-01-19 | 2015-05-13 | 株洲南车时代电气股份有限公司 | Power terminal group and power electronic module |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111372396A (en) * | 2020-02-22 | 2020-07-03 | 苏州浪潮智能科技有限公司 | Server node splicing electricity taking protection circuit, server cabinet and server node |
CN111372396B (en) * | 2020-02-22 | 2021-06-15 | 苏州浪潮智能科技有限公司 | Server node splicing electricity taking protection circuit, server cabinet and server node |
CN111983352A (en) * | 2020-08-17 | 2020-11-24 | 江苏昂内斯电力科技股份有限公司 | Wisdom is gathered detector with electric networking |
Also Published As
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WO2019192077A1 (en) | 2019-10-10 |
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