CN108642452A - 一种电容器金属化薄膜加工真空镀膜机 - Google Patents
一种电容器金属化薄膜加工真空镀膜机 Download PDFInfo
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- CN108642452A CN108642452A CN201810587447.1A CN201810587447A CN108642452A CN 108642452 A CN108642452 A CN 108642452A CN 201810587447 A CN201810587447 A CN 201810587447A CN 108642452 A CN108642452 A CN 108642452A
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- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 27
- 239000003990 capacitor Substances 0.000 title claims abstract description 15
- 239000012528 membrane Substances 0.000 claims abstract description 34
- 238000007738 vacuum evaporation Methods 0.000 claims abstract description 27
- 238000000429 assembly Methods 0.000 claims abstract description 18
- 230000000712 assembly Effects 0.000 claims abstract description 18
- 230000005540 biological transmission Effects 0.000 claims abstract description 16
- 238000007789 sealing Methods 0.000 claims description 38
- 238000005086 pumping Methods 0.000 claims description 8
- 238000007747 plating Methods 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 230000007306 turnover Effects 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 24
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201810587447.1A CN108642452B (zh) | 2018-06-08 | 2018-06-08 | 一种电容器金属化薄膜加工真空镀膜机 |
Applications Claiming Priority (1)
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CN201810587447.1A CN108642452B (zh) | 2018-06-08 | 2018-06-08 | 一种电容器金属化薄膜加工真空镀膜机 |
Publications (2)
Publication Number | Publication Date |
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CN108642452A true CN108642452A (zh) | 2018-10-12 |
CN108642452B CN108642452B (zh) | 2020-07-03 |
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Family Applications (1)
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CN201810587447.1A Active CN108642452B (zh) | 2018-06-08 | 2018-06-08 | 一种电容器金属化薄膜加工真空镀膜机 |
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CN (1) | CN108642452B (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110629164A (zh) * | 2019-10-11 | 2019-12-31 | 张学迪 | 一种汽车大灯反光板镀膜装置 |
CN111254405A (zh) * | 2020-02-18 | 2020-06-09 | 胡均松 | 一种低温真空镀膜装置 |
CN112208829A (zh) * | 2019-10-23 | 2021-01-12 | 四川迈科隆真空新材料有限公司 | 一种便于快速更换内胆的真空封口装置 |
CN113981377A (zh) * | 2021-10-15 | 2022-01-28 | 马雪盈 | 一种光学镜片镀膜方法 |
CN115116928A (zh) * | 2022-08-29 | 2022-09-27 | 山东芯恒光科技有限公司 | 一种半导体加工用固定装置 |
CN115133046A (zh) * | 2022-07-11 | 2022-09-30 | 浙江海盐力源环保科技股份有限公司 | 一种燃料电池双极板涂层装置 |
Citations (8)
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---|---|---|---|---|
JPH11140630A (ja) * | 1997-08-30 | 1999-05-25 | United Technol Corp <Utc> | カソードアーク気相堆積装置 |
KR20080030062A (ko) * | 2008-01-28 | 2008-04-03 | 어플라이드 머티어리얼즈 게엠베하 운트 컴퍼니 카게 | 증착 보트를 클램핑 및 위치 이동시키기 위한 장치 |
KR20080099550A (ko) * | 2007-05-09 | 2008-11-13 | 삼성전자주식회사 | 스퍼터링장치 |
CN105648427A (zh) * | 2014-12-02 | 2016-06-08 | 鸿富锦精密工业(深圳)有限公司 | 镀膜装置及镀膜系统 |
CN205662595U (zh) * | 2016-05-03 | 2016-10-26 | 哈尔滨理工大学 | 一种可夹持蒸镀盘自动旋转翻转的夹具装置 |
CN107513688A (zh) * | 2017-09-25 | 2017-12-26 | 江门市新合盛涂料实业有限公司 | 一种真空镀膜机 |
CN206970714U (zh) * | 2017-07-10 | 2018-02-06 | 深圳丰盛装备股份有限公司 | 一种硅片上下料的缓存机构 |
CN107851603A (zh) * | 2016-06-24 | 2018-03-27 | 佳能特机株式会社 | 基板载置方法、成膜方法、电子设备的制造方法 |
-
2018
- 2018-06-08 CN CN201810587447.1A patent/CN108642452B/zh active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11140630A (ja) * | 1997-08-30 | 1999-05-25 | United Technol Corp <Utc> | カソードアーク気相堆積装置 |
KR20080099550A (ko) * | 2007-05-09 | 2008-11-13 | 삼성전자주식회사 | 스퍼터링장치 |
KR20080030062A (ko) * | 2008-01-28 | 2008-04-03 | 어플라이드 머티어리얼즈 게엠베하 운트 컴퍼니 카게 | 증착 보트를 클램핑 및 위치 이동시키기 위한 장치 |
CN105648427A (zh) * | 2014-12-02 | 2016-06-08 | 鸿富锦精密工业(深圳)有限公司 | 镀膜装置及镀膜系统 |
CN205662595U (zh) * | 2016-05-03 | 2016-10-26 | 哈尔滨理工大学 | 一种可夹持蒸镀盘自动旋转翻转的夹具装置 |
CN107851603A (zh) * | 2016-06-24 | 2018-03-27 | 佳能特机株式会社 | 基板载置方法、成膜方法、电子设备的制造方法 |
CN206970714U (zh) * | 2017-07-10 | 2018-02-06 | 深圳丰盛装备股份有限公司 | 一种硅片上下料的缓存机构 |
CN107513688A (zh) * | 2017-09-25 | 2017-12-26 | 江门市新合盛涂料实业有限公司 | 一种真空镀膜机 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110629164A (zh) * | 2019-10-11 | 2019-12-31 | 张学迪 | 一种汽车大灯反光板镀膜装置 |
CN110629164B (zh) * | 2019-10-11 | 2021-11-05 | 泗阳盛大车用灯具有限公司 | 一种汽车大灯反光板镀膜装置 |
CN112208829A (zh) * | 2019-10-23 | 2021-01-12 | 四川迈科隆真空新材料有限公司 | 一种便于快速更换内胆的真空封口装置 |
CN111254405A (zh) * | 2020-02-18 | 2020-06-09 | 胡均松 | 一种低温真空镀膜装置 |
CN113981377A (zh) * | 2021-10-15 | 2022-01-28 | 马雪盈 | 一种光学镜片镀膜方法 |
CN113981377B (zh) * | 2021-10-15 | 2024-04-16 | 信阳市图丽光电有限公司 | 一种光学镜片镀膜方法 |
CN115133046A (zh) * | 2022-07-11 | 2022-09-30 | 浙江海盐力源环保科技股份有限公司 | 一种燃料电池双极板涂层装置 |
CN115133046B (zh) * | 2022-07-11 | 2023-05-23 | 浙江海盐力源环保科技股份有限公司 | 一种燃料电池双极板涂层装置 |
CN115116928A (zh) * | 2022-08-29 | 2022-09-27 | 山东芯恒光科技有限公司 | 一种半导体加工用固定装置 |
CN115116928B (zh) * | 2022-08-29 | 2022-11-15 | 山东芯恒光科技有限公司 | 一种半导体加工用固定装置 |
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CN108642452B (zh) | 2020-07-03 |
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TR01 | Transfer of patent right |
Effective date of registration: 20220907 Address after: 244000 No. 016, Xinqiao village, Xinqiao Office, Yi'an District, Tongling City, Anhui Province Patentee after: Tongling Andun Electronic Technology Co.,Ltd. Address before: 241000 Nanling County Economic Development Zone, Wuhu, Anhui Patentee before: WUHU YILUN ELECTRONICS Co.,Ltd. |
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Effective date of registration: 20240513 Address after: 523000 No. 17, shebei Mingzhu Second Road, Huangjiang Town, Dongguan City, Guangdong Province Patentee after: Dongguan Minghong vacuum coating Co.,Ltd. Country or region after: China Address before: 244000 No. 016, Xinqiao village, Xinqiao Office, Yi'an District, Tongling City, Anhui Province Patentee before: Tongling Andun Electronic Technology Co.,Ltd. Country or region before: China |