CN108572517A - A kind of glass production film exposure desk - Google Patents
A kind of glass production film exposure desk Download PDFInfo
- Publication number
- CN108572517A CN108572517A CN201810602448.9A CN201810602448A CN108572517A CN 108572517 A CN108572517 A CN 108572517A CN 201810602448 A CN201810602448 A CN 201810602448A CN 108572517 A CN108572517 A CN 108572517A
- Authority
- CN
- China
- Prior art keywords
- cover board
- exposure
- lamp box
- rack
- taper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000001816 cooling Methods 0.000 claims abstract description 15
- 238000007789 sealing Methods 0.000 claims abstract description 10
- 239000004744 fabric Substances 0.000 claims abstract description 7
- 238000012856 packing Methods 0.000 claims abstract description 7
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000003786 synthesis reaction Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 abstract description 5
- 230000008901 benefit Effects 0.000 abstract description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000003292 glue Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005842 biochemical reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
Landscapes
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a kind of glass production film exposure desks, including rack, taper lamp box, Exposing Lamp, exposure stage, cover board, vacuum pump, vacuum tracheae, cooler, cooling pipe and exhaust apparatus, taper lamp box is set in rack, it is provided with Exposing Lamp in taper lamp box, it is located in rack above taper lamp box and is provided with exposure stage, cover board is provided in exposure stage, exposure stage and cover board enclose the cavity for accommodating and being exposed object, covering is provided with packing cloth on cover board, cover board is provided with sealing strip inside edge, vacuum pump is additionally provided in rack, vacuum pump is formed by seal cavity and is connected with cover board and exposure strip by vacuum tracheae, cooler is additionally provided in rack, cooler is connected by cooling pipe with exhaust apparatus, two upper lateral parts are arranged in taper lamp box in exhaust apparatus；Total, the present invention has the advantages that uniform illumination, cooling is uniformly comprehensive, energy loss is small, exposure efficiency is high.
Description
Technical field
The present invention relates to a kind of exposure desks, and in particular to a kind of glass production film exposure desk.
Background technology
Exposure is irradiated using Exposing Lamp in the glass surface mask film covering version for coating photoresist；Make light part
Photoresist chemically react, change this part of glue solubility in developer solution, thus after developing, photoresist film shows
Go out the pattern consistent on mask plate, in the prior art mainly using the film as mask plate, is primarily present problems with：It is first
First, uneven illumination is even so that the light levels received on glue-coated glass are also inconsistent, and the photoresist of light part is made to send out
The degree of biochemical reaction is also inconsistent；Secondly, when Exposing Lamp works, the case where being converted into thermal energy there are electric energy so that exposure
Room and exposure table top temperature increase, and need cooling device to cool down exposure room and exposure table top, existing cooling device is fixed
It is motionless, uniform decrease in temperature can not be carried out in exposure room and each region of exposure table top, cause the original copy on exposure desk heated not
, the anamorphose on film is caused, it cannot be guaranteed that the yields of exposure process；So to solve the above problems, exploitation one
Kind glass production is necessary with film exposure desk.
Invention content
The purpose of the invention is to overcome the deficiencies in the prior art, and provide a kind of uniform illumination, it is cooling uniformly comprehensively,
The glass production film exposure desk that energy loss is small, exposure efficiency is high.
The object of the present invention is achieved like this：A kind of glass production film exposure desk, including rack, taper lamp box,
Exposing Lamp, exposure stage, cover board, vacuum pump, vacuum tracheae, cooler, cooling pipe and exhaust apparatus, wherein the rack
Upper setting taper lamp box is provided with the Exposing Lamp in the taper lamp box, setting above taper lamp box is located in the rack
There is exposure stage, cover board is provided in the exposure stage, the side of the cover board and the side of exposure stage are hinged,
The exposure stage and cover board enclose the cavity for accommodating and being exposed object, are covered on the cover board and are provided with packing cloth, the lid
It is provided with sealing strip at plate inside edge, vacuum pump is additionally provided in the rack, the vacuum pump passes through vacuum tracheae and lid
Plate, which is formed by with exposure strip in seal cavity, to be connected, and cooler is additionally provided in the rack, the cooler passes through cold
But pipeline is connected with exhaust apparatus, and two upper lateral parts are arranged in taper lamp box in the exhaust apparatus, are arranged in the taper lamp box
There are connecting plate, the exhaust apparatus to be provided at both ends with connecting shaft, the connecting shaft rotary movable connects the connecting plate, described
Electric rotating machine is additionally provided in connecting shaft.
The Exposing Lamp is three.
It is additionally provided with conventional lighting lamp in the taper lamp box.
It is provided with exhaust fan on the taper lamp box.
After the cover board covering setting packing cloth, after cover board is in contact by sealing strip and exposure stage, it is formed by
Cavity sealing is air tight.
The beneficial effects of the invention are as follows：By the setting of the lamp box of taper in the present invention, to Exposing Lamp light preferably into
Row reflection, keeps illumination more uniform, reduces the waste of light energy, improves exposure efficiency；Pass through cooling device and exhaust apparatus
Setting can preferably cool down simultaneously to exposure room and exposure table top, the rotatable adjusting setting of exhaust apparatus, can be to exposure
Room and each region of exposure table top carry out uniform decrease in temperature so that exposure efficiency higher；It is total, the present invention have uniform illumination,
Cooling advantage uniformly comprehensive, energy loss is small, exposure efficiency is high.
Description of the drawings
Fig. 1 is the main structure diagram of the present invention.
Fig. 2 is the side structure schematic view of the present invention.
In figure：1, rack 2, taper lamp box 3, Exposing Lamp 4, exposure table top 5, cover board 6, vacuum pump 7, true
Air hose 8, cooler 9, cooling pipe 10, exhaust apparatus 11, connecting plate 12, connecting shaft.
Specific implementation mode
Technical scheme of the present invention is described in further detail below in conjunction with the accompanying drawings.
As shown in Figure 1 and Figure 2, a kind of glass production film exposure desk, including rack 1, taper lamp box 2, Exposing Lamp 3, exposure
Optical platform 4, cover board 5, vacuum pump 6, vacuum tracheae 7, cooler 8, cooling pipe 9 and exhaust apparatus 10.
Wherein, taper lamp box 2 is set in rack 1, Exposing Lamp 3 is provided in taper lamp box 2, it is preferred that Exposing Lamp 3 is three
It is a, 2 top of taper lamp box is located in rack 1 and is provided with exposure stage 4, cover board 5, the side of cover board 5 are provided in exposure stage 4
Hinged with the side of exposure stage 4, exposure stage 4 and cover board 5 enclose the cavity for accommodating and being exposed object, on cover board 5
Covering is provided with packing cloth, sealing strip is provided at 5 inside edge of cover board, after packing cloth is arranged in the covering of cover board 5, cover board 5 passes through
After sealing strip and exposure stage 4 are in contact, it is air tight to be formed by cavity sealing.
Wherein, vacuum pump 6 is additionally provided in rack 1, vacuum pump 6 passes through vacuum tracheae 7 and cover board 5 and exposure strip institute shape
At seal cavity in be connected, cooler 8 is additionally provided in rack 1, cooler 8 passes through 10 phase of cooling pipe 9 and exhaust apparatus
Even, two upper lateral parts are arranged in taper lamp box 2 in exhaust apparatus 10, and connecting plate 11,10 liang of exhaust apparatus are provided in taper lamp box 2
End is provided with connecting shaft 12, and 12 rotary movable of connecting shaft connects connecting plate 11, electric rotating machine is additionally provided in connecting shaft 12.
Preferably, it is additionally provided with conventional lighting lamp in taper lamp box 2, exhaust fan is provided on taper lamp box 2.
The present invention is placed on when it is implemented, object will be exposed on exposure table top 4, is covered cover board 5, is started vacuum pump 6, leads to
Cross vacuum tracheae 7 and enclose exposure stage 4 and cover board 5 to accommodate and be exposed the cavity of object and vacuumize, start Exposing Lamp 3 into
Row exposure, it is rear to start cooler 8, exposure table top 4 and exposure room are cooled down by cooling pipe 9 and exhaust apparatus 10,
In, drive connecting shaft 12 to be rotated by electric rotating machine, to drive exhaust apparatus 10 to be rotated, to uniformly to exposing
Each region of light room and exposure table top 4 carries out uniform decrease in temperature so that exposure efficiency higher.
The foregoing is merely the better embodiments of the present invention, are not intended to limit the invention, all spirit in the present invention
Within principle, any modification, equivalent replacement, improvement and so on should all be included in the protection scope of the present invention.
Claims (5)
1. a kind of glass production film exposure desk, it is characterised in that：Including rack（1）, taper lamp box（2）, Exposing Lamp（3）、
Exposure stage（4）, cover board（5）, vacuum pump（6）, vacuum tracheae（7）, cooler（8）, cooling pipe（9）And exhaust apparatus
（10）, wherein the rack（1）Upper setting taper lamp box（2）, the taper lamp box（2）Inside it is provided with the Exposing Lamp（3）,
The rack（1）It is upper to be located at taper lamp box（2）Top is provided with exposure stage（4）, the exposure stage（4）On be provided with cover board
（5）, the cover board（5）Side and exposure stage（4）Side it is hinged, the exposure stage（4）And cover board（5）It encloses
Synthesis accommodates the cavity for being exposed object, the cover board（5）Upper covering is provided with packing cloth, the cover board（5）It is set inside edge
It is equipped with sealing strip, the rack（1）On be additionally provided with vacuum pump（6）, the vacuum pump（6）Pass through vacuum tracheae（7）With cover board
（5）It is formed by seal cavity and is connected with exposure strip, the rack（1）On be additionally provided with cooler（8）, the cooler
（8）Pass through cooling pipe（9）And exhaust apparatus（10）It is connected, the exhaust apparatus（10）It is arranged in taper lamp box（2）Interior both sides
Top, the taper lamp box（2）Inside it is provided with connecting plate（11）, the exhaust apparatus（10）It is provided at both ends with connecting shaft（12）,
The connecting shaft（12）Rotary movable connects the connecting plate（11）, the connecting shaft（12）On be additionally provided with electric rotating machine.
2. a kind of glass production film exposure desk according to claim 1, it is characterised in that：The Exposing Lamp（3）For
Three.
3. a kind of glass production film exposure desk according to claim 1, it is characterised in that：The taper lamp box（2）
Inside it is additionally provided with conventional lighting lamp.
4. a kind of glass production film exposure desk according to claim 1, it is characterised in that：The taper lamp box（2）
On be provided with exhaust fan.
5. a kind of glass production film exposure desk according to claim 1, it is characterised in that：The cover board（5）Covering
After packing cloth is set, cover board（5）Pass through sealing strip and exposure stage（4）After being in contact, it is air tight to be formed by cavity sealing.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810602448.9A CN108572517A (en) | 2018-06-12 | 2018-06-12 | A kind of glass production film exposure desk |
| PCT/CN2018/110174 WO2019237610A1 (en) | 2018-06-12 | 2018-10-15 | Film exposure stage for glass production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810602448.9A CN108572517A (en) | 2018-06-12 | 2018-06-12 | A kind of glass production film exposure desk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108572517A true CN108572517A (en) | 2018-09-25 |
Family
ID=63572056
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810602448.9A Pending CN108572517A (en) | 2018-06-12 | 2018-06-12 | A kind of glass production film exposure desk |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN108572517A (en) |
| WO (1) | WO2019237610A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019237610A1 (en) * | 2018-06-12 | 2019-12-19 | 许昌富华玻璃有限公司 | Film exposure stage for glass production |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101598902A (en) * | 2008-06-03 | 2009-12-09 | Asml荷兰有限公司 | Lithographic equipment and device making method |
| CN201408326Y (en) * | 2009-03-20 | 2010-02-17 | 北京大祥机械国际有限公司 | Double-side synchronous exposure machine of circuit board |
| CN202758166U (en) * | 2012-05-31 | 2013-02-27 | 模德模具(东莞)有限公司 | Exposure machine |
| CN204028556U (en) * | 2014-08-30 | 2014-12-17 | 中山市台明光电设备有限公司 | A kind of LED lamp source exposure machine |
| CN204203629U (en) * | 2014-11-26 | 2015-03-11 | 深圳市博宇佳瑞光电科技有限公司 | Directional light one side exposure device |
| CN205301808U (en) * | 2015-12-04 | 2016-06-08 | 衢州顺络电路板有限公司 | Exposure device of production HDI board |
| CN208421517U (en) * | 2018-06-12 | 2019-01-22 | 许昌富华玻璃有限公司 | A kind of glass production film exposure desk |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5674197B2 (en) * | 2010-01-14 | 2015-02-25 | Ｎｓｋテクノロジー株式会社 | Proximity exposure apparatus and proximity exposure method |
| CN205374984U (en) * | 2016-01-12 | 2016-07-06 | 河南彩虹光网络印刷股份有限公司 | Effectual printing -down machine exposes |
| CN206450968U (en) * | 2017-02-15 | 2017-08-29 | 江苏联坤电子科技有限公司 | The uniform acrylic glass exposure machine of one kind exposure |
| CN207148523U (en) * | 2017-08-29 | 2018-03-27 | 健鼎（湖北）电子有限公司 | A kind of PCB substrate LED parallel exposing machines |
| CN108572517A (en) * | 2018-06-12 | 2018-09-25 | 许昌富华玻璃有限公司 | A kind of glass production film exposure desk |
-
2018
- 2018-06-12 CN CN201810602448.9A patent/CN108572517A/en active Pending
- 2018-10-15 WO PCT/CN2018/110174 patent/WO2019237610A1/en active Application Filing
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101598902A (en) * | 2008-06-03 | 2009-12-09 | Asml荷兰有限公司 | Lithographic equipment and device making method |
| CN201408326Y (en) * | 2009-03-20 | 2010-02-17 | 北京大祥机械国际有限公司 | Double-side synchronous exposure machine of circuit board |
| CN202758166U (en) * | 2012-05-31 | 2013-02-27 | 模德模具(东莞)有限公司 | Exposure machine |
| CN204028556U (en) * | 2014-08-30 | 2014-12-17 | 中山市台明光电设备有限公司 | A kind of LED lamp source exposure machine |
| CN204203629U (en) * | 2014-11-26 | 2015-03-11 | 深圳市博宇佳瑞光电科技有限公司 | Directional light one side exposure device |
| CN205301808U (en) * | 2015-12-04 | 2016-06-08 | 衢州顺络电路板有限公司 | Exposure device of production HDI board |
| CN208421517U (en) * | 2018-06-12 | 2019-01-22 | 许昌富华玻璃有限公司 | A kind of glass production film exposure desk |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019237610A1 (en) * | 2018-06-12 | 2019-12-19 | 许昌富华玻璃有限公司 | Film exposure stage for glass production |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019237610A1 (en) | 2019-12-19 |
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