CN108569061A - Organosilicon blanket - Google Patents

Organosilicon blanket Download PDF

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Publication number
CN108569061A
CN108569061A CN201810185122.0A CN201810185122A CN108569061A CN 108569061 A CN108569061 A CN 108569061A CN 201810185122 A CN201810185122 A CN 201810185122A CN 108569061 A CN108569061 A CN 108569061A
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CN
China
Prior art keywords
blanket
organosilicon
silicon rubber
electron beam
ink
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201810185122.0A
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Chinese (zh)
Inventor
近藤直子
栋田明博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUJIKURA RUBBER INDUSTRY Co Ltd
Fujikura Composites Inc
Original Assignee
FUJIKURA RUBBER INDUSTRY Co Ltd
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Publication of CN108569061A publication Critical patent/CN108569061A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N10/00Blankets or like coverings; Coverings for wipers for intaglio printing
    • B41N10/02Blanket structure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N10/00Blankets or like coverings; Coverings for wipers for intaglio printing
    • B41N10/02Blanket structure
    • B41N10/04Blanket structure multi-layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/02Engraving; Heads therefor
    • B41C1/04Engraving; Heads therefor using heads controlled by an electric information signal
    • B41C1/05Heat-generating engraving heads, e.g. laser beam, electron beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N2210/00Location or type of the layers in multi-layer blankets or like coverings
    • B41N2210/06Backcoats; Back layers; Bottom layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N2210/00Location or type of the layers in multi-layer blankets or like coverings
    • B41N2210/14Location or type of the layers in multi-layer blankets or like coverings characterised by macromolecular organic compounds

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

The present invention provides organosilicon blanket (1), has the silicon rubber (3) for the processing for implementing irradiating electron beam in superficial layer.By the processing of irradiating electron beam, absorbed dose of radiation is 30kGy or more and 2000kGy hereinafter, the absorbed dose of radiation is the dosage of electron beam absorbed by silicon rubber (3) or the dosage of electron beam is 30kGy or more and 1000kGy or less.

Description

Organosilicon blanket
Technical field
The present invention relates to organosilicon blankets.
Background technology
Hectographic printing is one kind of printing technology.Hectographic printing is that the ink being attached in version is temporarily transferred to blanket On, then the ink being transferred on blanket is transferred to the printing technology of stock.
Hectographic printing can largely be printed in a short time, therefore be used for the printing of business paper delivery medium.
In addition, hectographic printing makes it possible high-precision printing.Therefore, in printed form electronic device field, graph Brush is used to form circuit etc..
Wish that blanket used in above-mentioned hectographic printing has excellent ink release property.Therefore, sometimes in blanket Superficial layer use the excellent silicon rubber of ink release property.Such blanket is referred to as organosilicon blanket.
However, silicon rubber has prodigious adhesiveness.Therefore, silicon rubber sometimes results in and rolls printing in printing process The unfavorable condition of object.Such stock is rolled in order to prevent, needs the adhesiveness for reducing silicon rubber.
Here, the technology as the adhesiveness for reducing silicon rubber, disclose in patent document 1 using scratch hardness be B with The technology of upper and 3H silicones cladding silicon rubber below.
On the other hand, it forms ink of superfine wire etc. and is easy drying on the surface of silicon rubber.Therefore, by silastic surface Ink when being transferred to stock, can not obtain the ink filament of line width and uniform film thickness on the surface of stock sometimes.In order to Such drying is prevented, for example, it is desired to which the solvent for reducing ink is absorbed by silicon rubber.
Here, it as the technology for obtaining ink thread pattern on the surface of stock, discloses in patent document 2 using logical Cross the technology for mixing the ink prepared by specific Multiple components.
Existing technical literature
Patent document
Patent document 1:Japanese Unexamined Patent Publication 2009-184268 bulletins
Patent document 2:Japanese Unexamined Patent Publication 2010-264599 bulletins
Invention content
The subject that the invention solves
For opening the technology shown in patent document 1, in the case where the superficial layer of blanket has used silicones, In the printing process for having used intaglio plate, the ink of injection intaglio plate slot is difficult to be transferred to silicones.Moreover, silicones is rolled up sometimes Play stock.
In addition, it is necessary to make the silicones with given scratch hardness and utilize the work of silicones cladding silicon rubber Sequence, it is desirable that simplify manufacturing process.
In addition, technology disclosed in Patent Document 2 is simply possible to use in anhydrous printing.
The present invention has been made in view of the above-described circumstances, and an object thereof is to provide a kind of easy to manufacture, can prevent from rolling The organosilicon blanket of stock.
In addition, the present invention also aims to provide a kind of to form line width and uniform film thickness on the surface of stock The organosilicon blanket of ink filament.
The method used for solving the problem
The organosilicon blanket of the first viewpoint of the present invention has the silicon for the processing for implementing irradiating electron beam in superficial layer Rubber, wherein by the processing of the irradiating electron beam, absorbed dose of radiation is 30kGy or more and 2000kGy is hereinafter, the absorption Dosage is the dosage of the electron beam absorbed by the silicon rubber.
For example, the absorbed dose of radiation can be 30kGy or more and 1000kGy or less.
For example, the Young's modulus of the superficial layer can be 190N/mm2Above and 260N/mm2Below.
For example, the accelerating potential of the electronics accelerate (beamacceleration) is allow to be 70kV or more and 150kV or less.
The organosilicon blanket of the second viewpoint of the present invention has silicon rubber in superficial layer, wherein the superficial layer glues Resultant force value is 152gf or less.
For example, the Young's modulus of the superficial layer can be 190N/mm2Above and 350N/mm2Below.
The manufacturing method of the organosilicon blanket of the third viewpoint of the present invention has following process:
In the process of the surface filming silicon rubber of base material, and
To the process of the silicon rubber irradiating electron beam, wherein
The dosage for the electron beam that the silicon rubber is absorbed is 30kGy or more and 2000kGy or less.The effect of invention
According to the present invention it is possible to than more easily prevent from rolling stock in the past.
Moreover, the ink filament of line width and uniform film thickness can be formed on the surface of stock.
Description of the drawings
Figure 1A is the side view of the organosilicon blanket of embodiments of the present invention.
Figure 1B is the stereovision that will show the state of the organosilicon blanket of embodiment on blanket cylinder Figure.
Fig. 2A is the figure illustrated to hectographic printing, is the figure for showing that ink is made to be attached to the state in version.
Fig. 2 B are the figures illustrated to hectographic printing, are the shapes for showing to transfer the ink to organosilicon blanket from version The figure of state.
Fig. 2 C are the figures illustrated to hectographic printing, show to transfer the ink to stock from organosilicon blanket The figure of state.
Symbol description
1 organosilicon blanket
2 base materials
3 silicon rubber
4 blanket cylinders
10 axis
20 editions
30 stocks
I ink
Specific implementation mode
In the following, refer to the attached drawing illustrates the organosilicon blanket of embodiments of the present invention.
Organosilicon blanket 1 can be used as middle transfer body in hectographic printing, as shown in Figure 1A, have base material 2 and reality The silicon rubber 3 of the processing of irradiating electron beam is applied.Base material 2 and silicon rubber 3 form laminated body.
Base material 2 is the component for the physical strength for improving organosilicon blanket 1.Base material 2 is formed by film.The material of film is for example Polyethylene terephthalate (PET), polyphenylene sulfide (PPS) and polyethylene naphthalate (PEN) etc..
Silicon rubber 3 carries out the reception and transfer of ink in printing process.
As shown in Figure 1B, organosilicon blanket 1 is winding and installed in the surface of blanket cylinder 4.Specifically, with from rubber The mode of 4 side of cloth roller lamination successively installs base material 2 and silicon rubber 3.Silicon rubber 3 forms the periphery of organosilicon blanket 1 as a result, Part.Hereinafter, the outer peripheral portion is known as superficial layer.It should be noted that axis 10 is rotary shaft.
Here, the printing process of the hectographic printing to organosilicon blanket 1 is utilized illustrates.
First, as shown in Figure 2 A, ink I is made to be attached to version 20 with given pattern.Then, as shown in Figure 2 B, make installation There is 4 moving in rotation of blanket cylinder of organosilicon blanket 1, and it is made to be pressed together in version 20, the ink I in version 20 is made to transfer To the superficial layer of organosilicon blanket 1.Then, as shown in Figure 2 C, make 4 moving in rotation of blanket cylinder, and make organosilicon Blanket 1 is pressed together on stock 30.The ink I for being attached to the superficial layer of organosilicon blanket 1 is set to be transferred to stock as a result, 30, the pattern of desired ink I is formed on stock 30.The printing process of hectographic printing is completed as a result,.In addition to this, have Machine silicon blanket 1 can be used for conventionally known hectographic printing.
In such printing process, the ink filament rolled stock 30 in order to prevent, obtain line width and uniform film thickness, Irradiating electron beam, illuminated portion are passed through to silicon rubber 3 obtained from the surface irradiating electron beam as the silicon rubber 3 of superficial layer The physical property divided is modified.
As the condition to 3 irradiating electron beam of silicon rubber, by the absorbed dose of radiation of electron beam that silicon rubber 3 absorbs and make electronics The accelerating potential of accelerate (beamacceleration) is as described below.
First, the absorbed dose of radiation that silicon rubber 3 rolls the electron beam absorbed required for stock 30 in order to prevent be 30kGy with Upper and 2000kGy or less.
When making silicon rubber 3 absorb the electron-beam dose of the range, the crosslink density for absorbing the part of electron beam increases. Therefore, the Young's modulus for absorbing the part of electron beam increases.Therefore, the adhesiveness of the part reduces, can in printing process To prevent the print object 30 caused by silicon rubber volume 3 from rolling.
Stock 30 is rolled in order to prevent, and the adhesion values (adhesiveness) of silicon rubber 3 are 152gf or less.In silicon rubber 3 When adhesion values are within the scope of this, in printing process, silicon rubber 3 will not roll stock 30.
In addition, the adhesion values of silicon rubber 3 can be such as 151gf or less, 140gf or less, 100gf or less, 90gf with Under, 80gf or less, 75gf or less, 70gf or less, 69gf or less, 68gf or less, 67gf or less or 66.8 or less.In addition, silicon rubber The adhesion values of glue 3 can be more than 0gf, 1gf or more, 3gf or more, 5.0gf or more or 5.3gf or more.
It is chatted later it should be noted that these adhesion values are the TACKINESS TESTER manufactured by RHESCA companies The value measured under the conditions of stating.
Next, the ink filament of line width and uniform film thickness in order to obtain, the absorbent of the electron beam absorbed by silicon rubber 3 Amount is 30kGy or more and 1000kGy or less.
When making the dosage of electron beam of the absorption of silicon rubber 3 range, the crosslink density for absorbing the part of electron beam increases Add.Therefore, the Young's modulus for absorbing the part of electron beam increases.Therefore, it reduces, subtracts in the absorbability of the part printing ink solvent The drying of the ink on the surface of light silicon rubber 3.It, can be with as a result, when making the ink on the surface of silicon rubber 3 be transferred to stock 30 The ink filament of line width and uniform film thickness is obtained on the surface of stock 30.
Accelerating potential can be adjusted arbitrarily, when for 70kV or more and 150kV or less, electron beam can be made from silicon rubber 3 Surface penetrate to desired depth, therefore preferably.Here, it is desirable to depth refer to roll in order to prevent stock 30, reduce The absorbability of printing ink solvent and mitigate ink on 3 surface of silicon rubber drying preferred electron beam depth of shine.In addition, The value of accelerating potential can change as needed, for example, can be 80kV or more, 90kV or more, 100kV or more, 110kV or more Or 120kV or more, can be 140kV or less, 130kV or less or 125kV or less.It should be noted that accelerating potential can be 125kV。
It is believed that the electron beam that the reduction of the absorbability of such adhesiveness, printing ink solvent is absorbed by silicon rubber 3 Depth that dosage and electron beam are penetrated from the surface of silicon rubber 3 determines.
In addition, being increased by the crosslink density to 3 irradiating electron beam of silicon rubber, the part for absorbing electron beam of silicon rubber 3 Add, the hardness of the part increases.As a result, in printing process, by the pressing of organosilicon blanket 1 when in version 20, silicon rubber 3 is not It is easy to cause excessive deformation because of version 20.Thus, for example, even if in the case where version 20 is intaglio plate, it is so-called to be also possible to prevent Bottom contact (bottom work as り).
Here, the electron beam treatment with irradiation for having used electron beam illuminating device is illustrated.
Electron beam illuminating device can be to the silicon rubber irradiating electron beam conveyed with just given conveying speed V.The electronics Beam obtains kinetic energy by being applied in voltage (accelerating potential) in electron beam illuminating device, to accelerate.Therefore, acceleration electricity Pressure is higher, and electron beam gets over the deep that can reach silicon rubber.I.e., it is possible to by adjusting the value of accelerating potential, the place of silicon rubber is adjusted Manage depth.
In addition, electric current (beam current) I that the flowing of the electron beam generates is bigger, the suction of the electron beam absorbed by silicon rubber It is more to receive dosage D.The physical property of silicon rubber is determined by absorbed dose of radiation D.That is, it is considered that even if accelerating potential is different, as long as inhaling Receipts dosage D is identical, and physical property is also identical.
In addition, as described above, repeatedly into exercise silicon rubber absorb doses electron beam processing in the case of, quilt The dosage that single treatment is absorbed that adds up to for the absorbed dose of radiation D that silicon rubber absorbs is multiplied by number of processes (number of pass times) and obtains Value.
It should be noted that absorbed dose of radiation D can be calculated by formula D=KI/V.Here, K is electron beam illuminating device Intrinsic constant.
Next, being illustrated to the processing method of silicon rubber 3.
(processing of silicon rubber)
Silicon rubber 3 can be for example, by mixing the host agent and curing agent of silicon rubber, and under these conditions to the mixture Surface irradiating electron beam and obtain.It should be noted that silicon rubber 3 can also be by under these conditions to commercially available silicon rubber The surface irradiating electron beam of glue and obtain.
(manufacturing method of organosilicon blanket)
With reference to figure 1A, the manufacturing method of organosilicon blanket 1 is shown.
Organosilicon blanket 1 has the laminated construction made of 2 superimposed layer of base material silicon rubber 3.By such structure structure At organosilicon blanket 1 can for example manufacture as follows.
First, in the surface filming silicon rubber of base material 2, the base material 2 is in PET film, PPS films and pen film etc. Resin film.Then, by carrying out above-mentioned electron beam treatment with irradiation to silicon rubber, organosilicon blanket 1 can be obtained.
For the organosilicon blanket 1 obtained by above manufacturing method, by under prescribed conditions to silicon rubber The crosslink density of the irradiation part is adjusted in irradiating electron beam, reduces adhesiveness, can prevent from rolling stock 30.Therefore, no It needs as technology disclosed in Patent Document 1, manufactures the silicones with given scratch hardness, and silicones is made to be coated on Process on silicon rubber.
In addition, for organosilicon blanket 1, by the way that silicon rubber irradiating electron beam, the irradiation part is adjusted Crosslink density makes ink be not easy drying, can obtain the ink filament of line width and uniform film thickness on the surface of stock 30.
Hereinafter, more specifically being illustrated to the present invention by embodiment.
Embodiment
(embodiment 1)
First, prepare host agent and curing agent, the host agent are blocked by two ends by dimethylvinyl siloxy straight Dimethyl polysiloxane (Shin-Etsu Chemial Co., Ltd manufacture, trade name of the chain containing vinyl:KE-1935-A it) constitutes, The curing agent is by methylhydrogenpolysi,oxane (Shin-Etsu Chemial Co., Ltd's manufacture, trade name with branched structure:KE- 1934-B) constitute.Then, phase is become with the molal quantity of the vinyl in the host agent and the molal quantity of the SiH bases in the curing agent Deng ratio mix above-mentioned host agent and curing agent.
Then, platinum group metal class catalyst is added into obtained mixed liquor, is dissolved in toluene, is prepared for addition-crosslinked type Silicone rubber compound.
Then, obtained silicone rubber compound is formed a film in the PET that thickness is 125 μm, surface roughness (Ra) is 0.5 μm The surface of film.
Then, silicone rubber compound is heated 3 minutes at 140 DEG C, keeps its addition-crosslinked.It has been obtained as a result, by upper State formd on resin film made of PET (base material 2) it is addition-crosslinked after silicone rubber compound (superficial layers that 350 μm of thickness) Organosilicon blanket.
Then, using electron beam illuminating device (manufacture of Yan Qi Electric Co., Ltd, model:) pair CB250/30/180L plus At the surface irradiating electron beam of the silicone rubber compound after crosslinking.
Here, the condition of electron beam treatment with irradiation is as follows:To the silicone rubber compound of the conveying speed conveying with 5m/ point Surface portion is radiated at the electron beam generated under the accelerating potential of 125kV and the beam current of 10.6mA.Passing through in the processing Number is 1 time, and the absorbed dose of radiation that silicone rubber compound is absorbed is 200kGy.By the processing, the organic of embodiment 1 has been obtained Silicon blanket.
(embodiment 2)
Number of pass times is set as 3 times, and the absorbed dose of radiation that silicone rubber compound is absorbed is set as 600kGy, except this with Outside, the condition for setting electron beam treatment with irradiation similarly to Example 1, has made the organosilicon blanket of embodiment 2.
(embodiment 3)
Number of pass times is set as 5 times, and the absorbed dose of radiation that silicone rubber compound is absorbed is set as 1000kGy, except this with Outside, the condition for setting electron beam treatment with irradiation similarly to Example 1, has made the organosilicon blanket of embodiment 3.
(embodiment 4)
Number of pass times is set as 10 times, and the absorbed dose of radiation that silicone rubber compound is absorbed is set as 2000kGy, except this with Outside, the condition for setting electron beam treatment with irradiation similarly to Example 1, has made the organosilicon blanket of embodiment 4.
(embodiment 5)
Accelerating potential is set as 80kV, and beam current is set as 13.3mA, in addition to this, is set similarly to Example 1 The condition for determining electron beam treatment with irradiation has made the organosilicon blanket of embodiment 5.
(embodiment 6)
Accelerating potential is set as 100kV, and beam current is set as 7.4mA, in addition to this, is set similarly to Example 1 The condition for determining electron beam treatment with irradiation has made the organosilicon blanket of embodiment 6.
(embodiment 7)
Accelerating potential is set as 80kV, beam current is set as 6.7mA, and the absorbed dose of radiation that silicon rubber is absorbed is set as 100kGy sets the condition of electron beam treatment with irradiation, has made the organosilicon of embodiment 7 similarly to Example 1 in addition to this Blanket.
(embodiment 8)
Accelerating potential is set as 100kV, beam current is set as 3.7mA, and the absorbed dose of radiation that silicon rubber is absorbed is set In addition to this condition of electron beam treatment with irradiation is set similarly to Example 1, has made the organic of embodiment 8 for 100kGy Silicon blanket.
(Comparative Examples 1 and 2)
By not in embodiment 1 substrate surface film forming it is addition-crosslinked after silicone rubber compound carry out electron beam irradiation Organosilicon blanket of the organosilicon blanket of processing as comparative example 1.
In addition, in embodiment 1 substrate surface film forming it is addition-crosslinked after silicone rubber compound, to 5m/ point The surface portion of silicone rubber compound of conveying speed conveying be radiated under the accelerating potential of 80kV and the beam current of 1.6mA The electron beam of generation.Number of pass times in the processing is 1 time, and the absorbed dose of radiation that silicone rubber compound is absorbed is 20kGy.It will lead to Cross the organosilicon blanket of organosilicon blanket that the processing obtains as comparative example 2.
Then, for the silicone rubber compound (experiment of the organosilicon blanket made in Examples 1 to 8, Comparative Examples 1 and 2 Piece), it has been carried out and the adhesion values of its surface portion (adhesiveness), surface Young's modulus, printing ink solvent by the following method Absorption appropriateness and the relevant experiment of printing.Here, printing refer to can be on the surface of stock by printing process On obtain line width and film thickness (ink is thick) uniform ink filament.
[adhesion values (adhesiveness)]
TACKINESS TESTER that adhesion values are manufactured using RHESCA companies are measured.Experimental condition is as follows:Apply The initial load of 100gf makes probe be contacted with the surface portion of test film, then finds out required from test film stripping probe Power, as adhesion values.
[surface Young's modulus]
ENT-1100b that Young's modulus is manufactured using ELIONIX companies is measured.Experimental condition is as follows:Measurement is being tested The surface portion of piece applies Young's modulus when press pressure (load) of 100 μ N.
[the absorption appropriateness (solvent absorption appropriateness) of printing ink solvent]
The absorption appropriateness of printing ink solvent measures in the following manner:Make the butyl carbitol second used as printing ink solvent Acid esters (BCA) and the 3.14cm on the test film of diameter 40mm2Region (surface portion) contact 2 minutes, pass through electronic balance Determine the weight before and after contact liq.Then, as expected by the uptake of the printing ink solvent caused by test film And the case where being suitble to use, as good (zero), the uptake of printing ink solvent is insufficient, unsuitable the case where using, is as slightly Bad (△), using taken in excess printing ink solvent, unsuitable the case where using as bad (×).Here, the absorption of printing ink solvent Amount refers to that in printing process, test film is so that the ink on the surface of test film is transferred to stock as expected The mode for the ink filament that can obtain line width and uniform film thickness on the surface of stock 30 when 30 absorbs printing ink solvent.In addition, The uptake of printing ink solvent is insufficient and taken in excess printing ink solvent refers to, in printing process, test film is not so that test film Ink on surface can obtain line width and uniform film thickness on the surface of stock 30 ink when being transferred on stock 30 is thin The mode of line absorbs printing ink solvent.
[printing (fine printing)]
Manufactured printing machine VECTOR HD-50, which are made, using Hong Yang societies of Co., Ltd. uses rattan as ink material Storehouse is melted into the silver paste XA-3609 of Co., Ltd.'s manufacture, and version uses version (10 μ of line width that Think Laboratory companies manufacture M, 300 μm of spacing, 5 μm of depth), using test film as blanket, hectographic printing is carried out, printing is determined.Then, it will wish The case where ink logo of prestige is transferred to stock is used as good (zero), it would be desirable to ink logo it is non-transfer to stock Situation is as bad (×).Here, it is desirable to ink logo refer to, with light microscope to transferred the stock of ink into Row is when visually observing, the line width of ink, film thickness (ink is thick) uniformly, and the shape that the filament (including superfine wire) of ink does not lack State.
Obtained result is summarized into shown in table 1 and table 2.
[table 1]
[table 2]
For the organosilicon blanket made in Examples 1 to 8, Comparative Examples 1 and 2 silicone rubber compound (test film) and Speech, adhesion values are as shown in table 1,2.
In addition, when having used the organosilicon blanket of Examples 1 to 8 in printing process, silicone rubber compound will not be rolled up Play stock 30.On the other hand, when having used the organosilicon blanket of comparative example 1 and comparative example 2 in printing process, silicon rubber Composition has rolled stock 30.
It can be seen from the above result that for the irradiation condition of the electron beam irradiated to silicone rubber compound, accelerating electricity When pressure is 70kV or more and 150kV or less, absorbed dose of radiation are 100kGy or more and 2000kGy or less, can provide will not roll The organosilicon blanket of stock 30.In addition, being 70kV or more and 150kV or less, absorbed dose of radiation 100kGy in accelerating potential Above and when 1000kGy or less, the organosilicon blanket that will not roll stock 30 can also be provided.It should be noted that root According to this experimental result judge, it is believed that even if absorbed dose of radiation be 30kGy less than 100kGy in the range of Can provide will not roll the organosilicon blanket of stock 30.
In addition, when the adhesion values of silicone rubber compound are 152gf or less, silicone rubber compound will not roll stock 30.Therefore, if adjusting absorbed dose of radiation by the irradiation condition for changing electron beam, the adhesion values of silicone rubber compound are made to be 152gf is hereinafter, then silicone rubber compound will not roll stock 30.
For the organosilicon blanket made in Examples 1 to 8, Comparative Examples 1 and 2 silicone rubber compound (test film) and Speech, solvent absorption appropriateness and printing are as described in table 1,2.
Specifically, when having used the organosilicon blanket made in Examples 1 to 3,5~8 in printing process, silicon rubber Glue composition absorbs the desired printing ink solvent measured, and ink is not in the dry tack free of silicone rubber compound.Therefore, make silicon rubber When ink on the surface of composition is transferred to stock 30, line width and uniform film thickness can be obtained on the surface of stock 30 Ink filament.
In addition, when having used the organosilicon blanket made in Comparative Examples 1 and 2 in printing process, silicone rubber compound institute The uptake of caused printing ink solvent is excessive, and ink is dry on the surface of silicone rubber compound.Therefore, make rubber composition When ink on the surface of object is transferred to stock 30, the oil of line width and uniform film thickness is not obtained on the surface of stock 30 Black filament.As a result, if the uptake of the printing ink solvent caused by silicone rubber compound is excessive, the surface of silicone rubber compound On ink become easy drying, therefore printing reduces.
It should be noted that when having used the organosilicon blanket made in embodiment 4 in printing process, silicon rubber group The uptake for closing the printing ink solvent caused by object is insufficient.Therefore, the ink on making the surface of silicone rubber compound, which is transferred to, holds When printing object 30, ink disconnects, and ink is attached to stock 30 and organosilicon blanket.Therefore, it is impossible on the surface of stock 30 Obtain the ink filament of line width and uniform film thickness.
It can be seen from the above result that for the irradiation condition of the electron beam irradiated to silicone rubber compound, accelerating electricity When pressure is 70kV or more and 150kV or less, absorbed dose of radiation are 100kGy or more and 1000kGy, the solvent of silicone rubber compound is inhaled The property received is good, and can provide printing good organosilicon blanket.That is, by irradiating electronics under the irradiation condition The absorbability of beam, the printing ink solvent caused by silicone rubber compound reduces, and ink is on the surface of silicone rubber compound It is dry to mitigate.Therefore, the ink filament of line width and uniform film thickness can be obtained on the surface of stock.It should be noted that root According to this experiment, it is believed that, can be in stock when absorbed dose of radiation is ranges of the 30kGy less than 100kGy The ink filament of line width and uniform film thickness is obtained on surface.
For the silicone rubber compound (test film) to form a film in Examples 1 to 4, Comparative Examples 1 and 2, surface Young's modulus As shown in table 1,2.Its result is observed that absorbed dose of radiation is more, the bigger tendency of the value of Young's modulus.
In addition, as shown in table 1, being judged as that the silicon rubber of the Examples 1 to 4 of stock 30 will not be rolled according to experimental result The surface Young's modulus of composition is 190N/mm2Above and 350N/mm2Below.
In addition, as shown in table 1, being judged as solvent absorbing and the good Examples 1 to 3 of printing according to experimental result The surface Young's modulus of silicone rubber compound is 190N/mm2Above and 260N/mm2Below.
It should be noted that the present invention is not limited to the above embodiment certainly.

Claims (7)

1. a kind of organosilicon blanket, superficial layer has the silicon rubber for the processing for implementing irradiating electron beam, wherein
By the processing of the irradiating electron beam, absorbed dose of radiation is 30kGy or more and 2000kGy is hereinafter, the absorbed dose of radiation is The dosage of the electron beam absorbed by the silicon rubber.
2. organosilicon blanket as described in claim 1, wherein the absorbed dose of radiation be 30kGy or more and 1000kGy with Under.
3. organosilicon blanket as claimed in claim 2, wherein the Young's modulus of the superficial layer is 190N/mm2Above and 260N/mm2Below.
4. organosilicon blanket according to any one of claims 1 to 3, wherein make the acceleration electricity of the electronics accelerate (beamacceleration) Pressure is 70kV or more and 150kV or less.
5. a kind of organosilicon blanket has silicon rubber in superficial layer, wherein
The adhesion values of the superficial layer are 152gf or less.
6. organosilicon blanket as claimed in claim 5, wherein the Young's modulus of the superficial layer is 190N/mm2Above and 350N/mm2Below.
7. a kind of manufacturing method of organosilicon blanket, this method have following process:
In the process of the surface filming silicon rubber of base material, and
To the process of the silicon rubber irradiating electron beam, wherein
The dosage for the electron beam that the silicon rubber is absorbed is 30kGy or more and 2000kGy or less.
CN201810185122.0A 2017-03-08 2018-03-07 Organosilicon blanket Pending CN108569061A (en)

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JP2009083104A (en) * 2007-09-27 2009-04-23 Ehc:Kk Offset printing blanket and its manufacturing method
JP2013240907A (en) * 2012-05-18 2013-12-05 Fujikura Rubber Ltd Blanket for offset printing, method of processing blanket and method of manufacturing blanket
CN104175735A (en) * 2013-05-24 2014-12-03 索尼公司 blanket, printing technology, and manufacturing methods of display unit electronic device

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JP2008073919A (en) * 2006-09-20 2008-04-03 Kureha Elastomer Co Ltd Printing blanket and manufacturing method thereof
JP2009184268A (en) 2008-02-07 2009-08-20 Sumitomo Rubber Ind Ltd Porous silicone rubber sheet and silicone blanket using it
JP2010264599A (en) 2009-05-12 2010-11-25 Dic Corp Pattern forming method
JP2016144878A (en) * 2015-02-06 2016-08-12 国立研究開発法人産業技術総合研究所 Device and method for forming pattern film into three-dimensional convex shape

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Publication number Priority date Publication date Assignee Title
CN1468729A (en) * 2002-06-12 2004-01-21 住友橡胶工业株式会社 Lithographic printing method and printing ink with the same method
JP2009083104A (en) * 2007-09-27 2009-04-23 Ehc:Kk Offset printing blanket and its manufacturing method
JP2013240907A (en) * 2012-05-18 2013-12-05 Fujikura Rubber Ltd Blanket for offset printing, method of processing blanket and method of manufacturing blanket
CN104175735A (en) * 2013-05-24 2014-12-03 索尼公司 blanket, printing technology, and manufacturing methods of display unit electronic device

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