Drawings
Fig. 1 is a cross-sectional view of a substrate provided by an embodiment of the present invention.
Fig. 2 is a flow chart of a method for fabricating a substrate according to an embodiment of the invention.
FIG. 3 is a flow chart of another method for fabricating a substrate according to an embodiment of the present invention.
Fig. 4 is a bottom view of the substrate of fig. 1 after conductive traces are formed on the conductive layer.
Fig. 5 is a top view of the conductive layer of the substrate of fig. 1 after forming a conductive line pattern.
Fig. 6 is a cross-sectional view taken along line a-a in fig. 4 after a conductive layer of the substrate of fig. 1 is patterned to form a conductive line pattern.
Fig. 7 is a cross-sectional view taken along line B-B in fig. 4 after conductive layers of the substrate of fig. 1 are patterned to form conductive traces.
Fig. 8 is a cross-sectional view of the conductive passivation layer formed on the surface of the electrical contact pad of fig. 7.
Fig. 9 is a cross-sectional view of the electromagnetic shield case formed by the circuit substrate hot pressing process of fig. 8.
Description of the main elements
Substrate 100
Substrate layer 11
First conductive layer 120
Second conductive layer 130
Accommodation area 101
Auxiliary area 102
Conductive via 14
First metal film layer 121
Second metal film layer 131
First plating layer 122
Second plating layer 132
Pore wall metal film layer 142
In-hole plating layer 143
First conductive line pattern 12
Second conductive line pattern 13
First electromagnetic shielding mesh 123
Electrical connection pads 124
Second electromagnetic shielding mesh 133
Electrical contact pads 134
First shield line 1231
Second shield wiring 1331
Conductive protective layer 135
Circuit board 200
Electromagnetic shield 300
Accommodating space 301
The following detailed description will further illustrate the invention in conjunction with the above-described figures.
Detailed Description
A first embodiment of the present invention provides a method for manufacturing an electromagnetic shielding case, including the following steps:
first, referring to fig. 1, a substrate 100 is manufactured, where the substrate includes a substrate layer 11, and a first conductive layer 120 and a second conductive layer 130 respectively formed on two opposite side surfaces of the substrate layer.
The substrate layer 11 is made of a transparent material, and the material of the substrate layer is preferably polyethylene terephthalate (PET) resin or polyethylene naphthalate (PEN) resin. In this embodiment, the material of the substrate layer 11 is PET.
The substrate 100 is artificially divided into a receiving area 101 and an auxiliary area 102 connected to the receiving area 101. The accommodating area 101 is used for forming an accommodating space in the subsequent steps. In this embodiment, the accommodating area 101 is located near the middle of the substrate 100, and the auxiliary area 102 is disposed around the accommodating area 101.
A plurality of conductive vias 14 are formed in the substrate 100, and each of the conductive vias 14 is electrically connected to the first conductive layer 120 and the second conductive layer 130. The plurality of conductive vias 14 are all located in the auxiliary area 102. In this embodiment, the plurality of conductive holes 14 are arranged in a single row, uniformly spaced, and surrounding the accommodating area 101.
As shown in fig. 2, the substrate 100 may be manufactured by the following steps:
firstly, providing the substrate layer 11; then, metallizing two opposite side surfaces of the substrate layer 11, thereby forming a first metal film layer 121 and a second metal film layer 131 on the two opposite side surfaces of the substrate layer 11 respectively; then, a through hole 141 is formed by drilling to sequentially penetrate the first metal film layer 121, the base material layer 11, and the second metal film layer 131; then, the through hole 141 is processed by blackening, shading or chemical plating, and then is electroplated, so that the first electroplated layer 122 and the second electroplated layer 132 are respectively formed on the two opposite side surfaces of the metalized substrate layer 11, and the electroplated layer is also formed in the through hole 141, so that the through hole is made into a conductive hole 14; wherein the first conductive layer 120 includes the first plating layer 122 and the first metal film layer 121; the second conductive layer 130 includes the second plating layer 132 and a second metal film layer 131.
As shown in fig. 3, the substrate 100 may also be manufactured by the following steps:
firstly, providing the substrate layer 11; then, drilling a hole in the substrate layer 11 to form a through hole 141 penetrating the substrate layer 11; then, metallizing the surfaces of the two opposite sides of the substrate layer 11 and the walls of the through holes 141, so as to form a first metal film layer 121 and a second metal film layer 131 on the two opposite sides of the substrate layer 11, respectively, and form a wall metal film layer 142 on the walls of the through holes 141; then, electroplating is carried out, so that the first electroplating layer 122 and the second conductive layer 132 are respectively formed on the two opposite side surfaces of the metalized substrate layer 11, and an in-hole electroplating layer 143 is also formed in the metalized through hole 141, so that a conductive hole 14 is formed in the through hole 141; the first conductive layer 120 includes the first plating layer 122 and the first metal film 121, and the second conductive layer 130 includes the second plating layer 132 and the second metal film 131.
In this embodiment, the metallization method may be:
firstly, performing surface treatment on the substrate layer 11, in this embodiment, immersing the substrate layer 11 in a mixed solution containing Polyethyleneimine (PEI) resin, epichlorohydrin, ethanol, and dimethyl formamide, and immersing for 6 hours, thereby forming a PEI film layer on each of the two opposite side surfaces of the substrate layer 11; then, the first metal film layer 121 and the second metal film layer 131 are formed on the PEI film layers on the two side surfaces of the substrate layer 11 by electroless copper plating, respectively (in the method of fig. 3, the hole wall metal film layer 142 is further formed on the hole wall of the through hole 141). Preferably, a substrate layer 11 made of PET is selected for this step.
In this embodiment, the metal film layers and the electroplated layer are made of copper; therefore, the boundary between the plating layer and the metal film layer is not shown in fig. 1.
In other embodiments, the substrate 100 may also be a single panel, i.e. only including one conductive layer.
Referring to fig. 4-7, a first conductive trace pattern 12 is formed on the first conductive layer 120, and a second conductive trace pattern 13 is formed on the second conductive layer 130, so as to obtain a circuit substrate 200.
In this embodiment, the first conductive line pattern 12 and the second conductive line pattern 13 are formed by an image transfer and etching process.
The first conductive trace pattern 12 includes a first electromagnetic shielding mesh 123 and a plurality of electrical connection pads 124 electrically connected to the first electromagnetic shielding mesh 123, the first electromagnetic shielding mesh 123 is formed in the accommodating area 101, and the plurality of electrical connection pads 124 are formed in the auxiliary area 102; the second conductive trace pattern 13 includes a second electromagnetic shielding mesh 133 and a plurality of electrical contact pads 134 electrically connected to the second electromagnetic shielding mesh 133, the second electromagnetic shielding mesh 133 is formed in the accommodating area 101, and the plurality of electrical contact pads 134 are formed in the auxiliary area 102; each of the electrical connection pads 124 correspondingly covers one of the conductive vias 14 and is electrically connected to the corresponding conductive via 14, and each of the electrical connection pads 134 correspondingly covers one of the conductive vias 14 and is electrically connected to the corresponding conductive via 14, so that each of the electrical connection pads 124 is electrically connected to one of the electrical connection pads 134 through one of the conductive vias 14.
Referring to fig. 4 to 5 again, the first electromagnetic shielding mesh 123 is a repeated grid pattern formed by crossing a plurality of first shielding lines 1231, and the second electromagnetic shielding mesh 133 is a repeated grid pattern formed by crossing a plurality of second shielding lines 1331.
The base material layer 11 of the electromagnetic shielding cover is transparent, and the opaque base material layer is a conductive circuit layer, so that the thinner the shielding circuit is, the larger the distance between the adjacent shielding circuits is, and the better the visual transparency effect of the electromagnetic shielding cover is.
Preferably, the line width of each first shielding line 1231 is smaller than the distance between each adjacent first shielding lines 1231, and the line width of each second shielding line 1331 is smaller than the distance between each adjacent second shielding lines 1331.
More preferably, the line width of each of the first shielding lines 1231 and the second shielding lines 1331 is 50 micrometers or less, and the distance between each adjacent first shielding lines 1231 and the distance between each adjacent second shielding lines 1331 are 100 micrometers or more.
More preferably, the line width of each of the first shielding lines 1231 and the second shielding lines 1331 ranges from 1 micrometer to 25 micrometers, and the distance between each adjacent first shielding line 1231 and the distance between each adjacent second shielding line 1331 ranges from 200 micrometers to 1000 micrometers.
Third, referring to fig. 8, the plurality of electrical contact pads 134 are surface-treated, so that a conductive passivation layer 135 is formed on the surface of each electrical contact pad 134.
The surface treatment may be performed by gold plating, tin spraying, silver plating, or forming a conductive polymer film to prevent the surfaces of the pads 124 and 134 from being oxidized; if the methods of gold plating, tin spraying, silver plating, etc. are used, the electrical conductivity of the electrical pads 124 and 134 can be increased.
In other embodiments, this step may not be performed and the next step may be performed directly.
Fourthly, referring to fig. 9, the circuit substrate 200 is processed by hot extrusion, so that the circuit substrate 200 is extruded and bulged at a position corresponding to the accommodating area 101, and an electromagnetic shielding case 300 is obtained; the cross section of the bulging portion of the electromagnetic shielding cover 300 is substantially "U" shaped, and the bulging portion of the electromagnetic shielding cover 300 encloses an accommodating space 301.
When the electromagnetic shielding case 300 is attached to a circuit board, the accommodating space 301 is used for shielding and accommodating electronic components on the circuit board.
Referring to fig. 4-9 again, a second embodiment of the present invention provides an electromagnetic shielding case 300, where the electromagnetic shielding case 300 is used for electrically connecting a circuit board with electronic components and providing electromagnetic shielding for the electronic components of the circuit board. The electromagnetic shielding cover 300 includes a substrate layer 11 made of a transparent material, and a first conductive circuit pattern 12 and a second conductive circuit pattern 13 formed on two opposite side surfaces of the substrate layer 11.
The electromagnetic shielding case 300 is provided with a receiving area 101 and an auxiliary area 102. The electromagnetic shielding cover 300 bulges relative to the auxiliary area 102 at a position corresponding to the accommodating area 101, and the section of the bulged part of the electromagnetic shielding cover 300 is approximately in a 'U' shape, and the bulged part encloses an accommodating space 301. When the electromagnetic shielding case 300 is attached to a circuit board, the accommodating space 301 is used for shielding and accommodating electronic components on the circuit board. In this embodiment, the accommodating area 101 is located near the middle of the substrate 100, and the auxiliary area 102 is disposed around the accommodating area 101.
The first conductive trace pattern 12 includes a first electromagnetic shielding mesh 123 and a plurality of electrical connection pads 124 electrically connected to the first electromagnetic shielding mesh 123, the first electromagnetic shielding mesh 123 is formed in the accommodating area 101, and the plurality of electrical connection pads 124 are formed in the auxiliary area 102; the second conductive trace pattern 13 includes a second electromagnetic shielding mesh 133 and a plurality of electrical contact pads 134 electrically connected to the second electromagnetic shielding mesh 133, the second electromagnetic shielding mesh 133 is formed in the receiving area 101, and the plurality of electrical contact pads 134 are formed in the auxiliary area 102.
The plurality of electrical connection pads 124 may be electrically connected to the circuit board by anisotropic conductive adhesive, hot-press solder-melting, and the like; the plurality of electrical contact pads 134 may be grounded through conductive paste, conductive foam, or the like.
The first electromagnetic shielding mesh 123 is a repeated grid pattern formed by crossing a plurality of first shielding lines 1231, and the second electromagnetic shielding mesh 133 is a repeated grid pattern formed by crossing a plurality of second shielding lines 1331.
Preferably, the line width of each first shielding line 1231 is smaller than the distance between each adjacent and parallel first shielding lines 1231, and the line width of each second shielding line 1331 is smaller than the distance between each adjacent and parallel second shielding lines 1331, so that the electromagnetic shielding case 300 has better transparency.
More preferably, the line width of each of the first shielding lines 1231 and the second shielding lines 1331 is 50 micrometers or less, and the distance between each adjacent first shielding lines 1231 and the distance between each adjacent second shielding lines 1331 are both 100 micrometers or more, so that the electromagnetic shielding case 300 has better transparency.
More preferably, the line width range of each of the first shielding lines 1231 and the second shielding lines 1331 is 1 micrometer to 25 micrometers, the distance range between each adjacent first shielding line 1231 and the distance range between each adjacent second shielding line 1331 are 200 micrometers to 1000 micrometers, and the line width and line distance design can make the electromagnetic shielding case 300 have stronger transparency.
The electromagnetic shield 300 further has a plurality of conductive holes 14 formed thereon, and the plurality of conductive holes 14 are all located in the auxiliary area 102. Each of the electrical connection pads 124 correspondingly covers one of the conductive vias 14 and is electrically connected to the corresponding conductive via 14, and each of the electrical connection pads 134 correspondingly covers one of the conductive vias 14 and is electrically connected to the corresponding conductive via 14, so that each of the electrical connection pads 124 is electrically connected to one of the electrical connection pads 134 through one of the conductive vias 14. In this embodiment, the plurality of conductive holes 14 are arranged in a single row, uniformly spaced, and surrounding the accommodating area 101.
In this embodiment, a first conductive passivation layer 125 is formed on the surface of each of the pads 124, and a conductive passivation layer 135 is formed on the surface of each of the pads 124.
In one embodiment, the first conductive trace pattern 12 may be made of two layers of conductive materials, for example, may include a first metal film layer and a first plating layer formed on a surface of the first metal film layer by electroplating, and the second conductive trace pattern 13 may also be made of two layers of conductive materials, for example, may include a second metal film layer and a second plating layer formed on a surface of the second metal film layer by electroplating.
Preferably, the material of the substrate layer 11 is transparent PET or PEN; more preferably, transparent PET; in an embodiment, the two opposite surfaces of the substrate layer 11 made of PET may further include a PEI film layer respectively.
According to the electromagnetic shielding cover and the manufacturing method thereof, the electromagnetic shielding cover in the containing area bulges to form a containing space, so that components on a circuit board connected with the electromagnetic shielding cover can be contained and protected, and the electromagnetic shielding cover can be well matched with the circuit board; the double-sided conductive circuit design is adopted, and the two conductive circuits are electrically connected through the conductive holes, so that the shielding effect of the electromagnetic shielding cover is better and stronger, and the design of the conductive holes is also beneficial to heat dissipation; the transparency of the electromagnetic shielding grid in the technical scheme can reach 80-95%.
It is understood that various other changes and modifications may be made by those skilled in the art based on the technical idea of the present invention, and all such changes and modifications should fall within the protective scope of the claims of the present invention.