CN108529880A - A method of improving low-temperature lead-free boron glaze surface texture - Google Patents

A method of improving low-temperature lead-free boron glaze surface texture Download PDF

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CN108529880A
CN108529880A CN201810742258.7A CN201810742258A CN108529880A CN 108529880 A CN108529880 A CN 108529880A CN 201810742258 A CN201810742258 A CN 201810742258A CN 108529880 A CN108529880 A CN 108529880A
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temperature
boron
glaze
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邢淑芹
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Jieshou City Wei Sheng Kiln Painted Pottery Development Co Ltd
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    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
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    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
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    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
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    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3206Magnesium oxides or oxide-forming salts thereof
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    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
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    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
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Abstract

The invention belongs to low-temperature lead-free boron glaze technical fields, and in particular to a method of improving low-temperature lead-free boron glaze surface texture, the average whiteness after the completion of the blank examination clear frit is fired is 38.4, and the glaze includes following components:Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, tungsten hexachloride, lithia, vanadium trioxide, surplus are silica.The present invention has the following advantages compared with prior art:Method passes through rational proportion glaze component in the present invention, sintering temperature can effectively be reduced, and its surface gloss and transparency are held at higher level, the mating reaction of nano silicon dioxide and tungsten hexachloride and vanadium trioxide, it can make glazing material under the conditions of melting temperature is lower, can also make to combine can improve with surface smoothness, surface no pin-hole defect, have preferable glossiness and whiteness in the temperature firing product less than 900 DEG C.

Description

A method of improving low-temperature lead-free boron glaze surface texture
Technical field
The invention belongs to low-temperature lead-free boron glaze technical fields, and in particular to a kind of to improve low-temperature lead-free boron glaze surface texture Method.
Background technology
Glaze be covered on ceramic body surface rich in the glassy thin layer of glossiness, function not only there is decoration to make With, and the physical property and chemical property of billet surface can be improved, it improves the hardness of product, increase its thermal stability, be based on Effect of the glaze on ceramic, glaze are constantly protruding and are enhancing in the importance of ceramic industry, directly affect ceramic Quality and cost;Traditional enamel frit makeing technology needs to be burnt under the high temperature conditions(-1350℃), firing period is longer(14-16 is small When), inlet pipe can make prepared glaze layer have stronger mechanical property and high glossiness, but technical conditions are harsh, energy consumption It is high, energy-saving and environment-friendly requirement is not met, the firing temperature and fabrication cycle of glaze layer how is reduced, is faced with chooses always War;In ceramic industry, lead oxide has been used in ceramic glaze for a long time, due to containing as a kind of main fluxing Lead glaze is producing and can all brought to people in certain health hazard, people to be seeking to the method for reducing lead dissolution, with People has higher understanding to itself living environment and health, and alkali borosilicate glaze is with its strong applicability, cost It is low that advance is showed in leadless glaze system, but be primarily now the research for concentrating on high temperature oil and intermediate glaze, to low-temperature lead-free The research and design of glaze is few, and the key technology of low-temperature lead-free glaze is the use using many oxide substitution lead oxide in glaze Amount, and the glossiness of glaze shape, whiteness and its appearance are our directions to be studied.
Invention content
The purpose of the present invention is for existing problem, provide a kind of side improving low-temperature lead-free boron glaze surface texture Method.
The present invention is achieved by the following technical solutions:A method of improving low-temperature lead-free boron glaze surface texture, institute The average whiteness stated after the completion of blank examination clear frit is fired is 38.4, and the glaze includes following components:Diboron trioxide, three oxygen Change two aluminium, magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, tungsten hexachloride, lithia, vanadium trioxide, surplus two Silica;
Wherein the content of diboron trioxide be more than sodium oxide molybdena, boron oxide, lithia, vanadium trioxide content and;
The content of the diboron trioxide is less than the half of dioxide-containing silica;The content of the tungsten hexachloride is less than three oxygen Change the half of two boron contents;
Grain size is that the silica of 60-80nm accounts for the 16-25% of its total weight in the silica material;The grain of tungsten hexachloride Diameter is 20-30nm.
As further improvement of these options, the chemical composition of the blank is:Silica 65.96wt%, three oxygen Change two aluminium 25.32wt%, calcium oxide 0.73wt%, magnesia 0.45wt%, sodium oxide molybdena 1.47wt%, potassium oxide 1.86wt%, three oxidations Two iron 4.13wt%, titanium dioxide 0.08wt%;The fineness of blank is 0.1-0.3% more than 10000-hole sieve.
As further improvement of these options, the chemical constituent of the glaze is:Diboron trioxide 12.24- 12.37wt%, alundum (Al2O3) 5.4-5.7wt%, magnesia 0.83-1.25wt%, sodium oxide molybdena 4.35-6.28wt%, boron oxide 2.2-2.6wt%, zinc oxide 2.28-2.65wt%, calcium oxide 6.75-7.45wt%, tungsten hexachloride 4.73-6.08wt%, lithia 3.14-3.28wt%, vanadium trioxide 0.02-0.06wt%, surplus are silica.
As further improvement of these options, the grain size is the silica of 60-80nm by Sol-Gel technology systems It takes.
As further improvement of these options, the impurity of oxychloride is less than 0.5wt% in the tungsten hexachloride.
As further improvement of these options, the preparation method of the glazing material is:To be 60-80nm's except grain size Silica, diboron trioxide outside silica, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, oxidation Calcium, lithia, vanadium trioxide mixing, it is 60-80nm's to be milled to grain size in the ball mill less than grain size after 0.1mm, is added Silica and tungsten hexachloride are warming up to 380-420 DEG C in crucible, keep the temperature 30-40 minutes, are continuously heating to 820- after the completion 880 DEG C, 40-60 minutes are kept the temperature, then proceedes to be heated to 1050-1150 DEG C, after keeping the temperature 20-30 minutes, with 30-40 DEG C of fast prompt drop To room temperature, ball mill ball milling is used after dry, crosses 325 mesh screen residue 0.02-0.08% after the completion.
As further improvement of these options, the firing temperature is 760-880 DEG C.
The present invention has the following advantages compared with prior art:Method, can by rational proportion glaze component in the present invention Sintering temperature is effectively reduced, and its surface gloss and transparency are held at higher level, nano silicon dioxide and chlordene Change tungsten and vanadium trioxide mating reaction, can make glazing material under the conditions of melting temperature is lower, moreover it is possible to make combine can and Surface smoothness improves, surface no pin-hole defect, has preferable glossiness and white in the temperature firing product less than 900 DEG C Degree.
Specific implementation mode
Embodiment 1
A method of improving low-temperature lead-free boron glaze surface texture, the average whiteness after the completion of the blank examination clear frit is fired is 38.4, the chemical constituent of the glaze is:Diboron trioxide 12.29wt%, alundum (Al2O3) 5.55wt%, magnesia 1wt%, oxygen Change sodium 5.26wt%, boron oxide 2.4wt%, zinc oxide 2.43wt%, calcium oxide 7.13wt%, tungsten hexachloride 5.26wt%, lithia 3.22wt%, vanadium trioxide 0.04wt%, surplus are silica;
Grain size is that the silica of 60-80nm accounts for the 21% of its total weight in the silica material;The grain size of tungsten hexachloride is 20-30nm。
Wherein, the chemical composition of the blank is:Silica 65.96wt%, alundum (Al2O3) 25.32wt%, calcium oxide 0.73wt%, magnesia 0.45wt%, sodium oxide molybdena 1.47wt%, potassium oxide 1.86wt%, di-iron trioxide 4.13wt%, titanium dioxide 0.08wt%;The fineness of blank is 0.1-0.3% more than 10000-hole sieve.
Wherein, the grain size is that the silica of 60-80nm is produced by Sol-Gel technologies;Chlorine oxygen in the tungsten hexachloride The impurity of compound is less than 0.5wt%.
Wherein, the preparation method of the glazing material is:By except grain size be 60-80nm silica in addition to silica, Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, lithia, vanadium trioxide are mixed It closes, is milled to grain size in the ball mill less than the silica and tungsten hexachloride that grain size is 60-80nm after 0.1mm, is added, in earthenware It is warming up to 400 DEG C in crucible, keeps the temperature 35 minutes, is continuously heating to 850 DEG C after the completion, keeps the temperature 50 minutes, then proceedes to be heated to 1100 DEG C, after keeping the temperature 25 minutes, it is quickly down to room temperature with 35 DEG C, ball mill ball milling is used after dry, crosses 325 mesh screen residues after the completion 0.02-0.08%。
Wherein, the firing temperature is 820 DEG C.
Embodiment 2
A method of improving low-temperature lead-free boron glaze surface texture, the average whiteness after the completion of the blank examination clear frit is fired is 38.4, the chemical constituent of the glaze is:Diboron trioxide 12.24wt%, alundum (Al2O3) 5.7wt%, magnesia 0.83wt%, Sodium oxide molybdena 6.28wt%, boron oxide 2.6wt%, zinc oxide 2.28wt%, calcium oxide 6.75wt%, tungsten hexachloride 6.08wt%, lithia 3.14wt%, vanadium trioxide 0.02wt%, surplus are silica;
Grain size is that the silica of 60-80nm accounts for the 16% of its total weight in the silica material;The grain size of tungsten hexachloride is 20-30nm。
Wherein, the chemical composition of the blank is:Silica 65.96wt%, alundum (Al2O3) 25.32wt%, calcium oxide 0.73wt%, magnesia 0.45wt%, sodium oxide molybdena 1.47wt%, potassium oxide 1.86wt%, di-iron trioxide 4.13wt%, titanium dioxide 0.08wt%;The fineness of blank is 0.1-0.3% more than 10000-hole sieve.
Wherein, the grain size is that the silica of 60-80nm is produced by Sol-Gel technologies;Chlorine oxygen in the tungsten hexachloride The impurity of compound is less than 0.5wt%.
Wherein, the preparation method of the glazing material is:By except grain size be 60-80nm silica in addition to silica, Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, lithia, vanadium trioxide are mixed It closes, is milled to grain size in the ball mill less than the silica and tungsten hexachloride that grain size is 60-80nm after 0.1mm, is added, in earthenware It is warming up to 380 DEG C in crucible, keeps the temperature 40 minutes, is continuously heating to 820 DEG C after the completion, keeps the temperature 60 minutes, then proceedes to be heated to 1050 DEG C, after keeping the temperature 30 minutes, it is quickly down to room temperature with 40 DEG C, ball mill ball milling is used after dry, crosses 325 mesh screen residues after the completion 0.02-0.08%。
Wherein, the firing temperature is 760 DEG C.
Embodiment 3
A method of improving low-temperature lead-free boron glaze surface texture, the average whiteness after the completion of the blank examination clear frit is fired is 38.4, the chemical constituent of the glaze is:Diboron trioxide 12.37wt%, alundum (Al2O3) 5.4wt%, magnesia 1.25wt%, Sodium oxide molybdena 4.35wt%, boron oxide 2.2wt%, zinc oxide 2.65wt%, calcium oxide 7.45wt%, tungsten hexachloride 4.73wt%, lithia 3.28wt%, vanadium trioxide 0.06wt%, surplus are silica;
Grain size is that the silica of 60-80nm accounts for the 25% of its total weight in the silica material;The grain size of tungsten hexachloride is 20-30nm。
Wherein, the chemical composition of the blank is:Silica 65.96wt%, alundum (Al2O3) 25.32wt%, calcium oxide 0.73wt%, magnesia 0.45wt%, sodium oxide molybdena 1.47wt%, potassium oxide 1.86wt%, di-iron trioxide 4.13wt%, titanium dioxide 0.08wt%;The fineness of blank is 0.1-0.3% more than 10000-hole sieve.
Wherein, the grain size is that the silica of 60-80nm is produced by Sol-Gel technologies;Chlorine oxygen in the tungsten hexachloride The impurity of compound is less than 0.5wt%.
Wherein, the preparation method of the glazing material is:By except grain size be 60-80nm silica in addition to silica, Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, lithia, vanadium trioxide are mixed It closes, is milled to grain size in the ball mill less than the silica and tungsten hexachloride that grain size is 60-80nm after 0.1mm, is added, in earthenware It is warming up to 420 DEG C in crucible, keeps the temperature 30 minutes, is continuously heating to 880 DEG C after the completion, keeps the temperature 40-60 minutes, then proceedes to be heated to 1150 DEG C, heat preservation is quickly down to room temperature after twenty minutes, with 30 DEG C, uses ball mill ball milling after dry, crosses 325 mesh screen residues after the completion 0.02-0.08%。
Wherein, the firing temperature is 880 DEG C.
Setting control group 1 removes tungsten hexachloride in embodiment 1, remaining content is constant;Control group 2 is set, by embodiment 1 Middle vanadium trioxide removes, remaining content is constant;Control group 3 is set, by the silica that grain size in embodiment 1 is 60-80nm Normal silica is replaced with, remaining content is constant;
The glossiness, whiteness and appearance of each group glaze are detected, following result is obtained:
Table 1
Group Glossiness Whiteness
Embodiment 1 98.4 82.3
Embodiment 2 98.7 82.5
Embodiment 3 98.5 82.3
Control group 1 89.2 70.8
Control group 2 82.7 42.7
Control group 3 86.4 48.5
By data in table 1 can be seen that in the present invention sintering temperature be less than 900 DEG C under the premise of, can ensure higher Glossiness and whiteness are suitable for promoting.

Claims (7)

1. a kind of method improving low-temperature lead-free boron glaze surface texture, which is characterized in that the blank examination clear frit, which is fired, to be completed Average whiteness afterwards is 38.4, and the glaze includes following components:Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena, Boron oxide, zinc oxide, calcium oxide, tungsten hexachloride, lithia, vanadium trioxide, surplus are silica;
Wherein the content of diboron trioxide be more than sodium oxide molybdena, boron oxide, lithia, vanadium trioxide content and;
The content of the diboron trioxide is less than the half of dioxide-containing silica;The content of the tungsten hexachloride is less than three oxygen Change the half of two boron contents;
Grain size is that the silica of 60-80nm accounts for the 16-25% of its total weight in the silica material;The grain of tungsten hexachloride Diameter is 20-30nm.
2. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the blank Chemical composition is:Silica 65.96wt%, alundum (Al2O3) 25.32wt%, calcium oxide 0.73wt%, magnesia 0.45wt%, oxygen Change sodium 1.47wt%, potassium oxide 1.86wt%, di-iron trioxide 4.13wt%, titanium dioxide 0.08wt%;The fineness of blank is ten thousand holes Tail over 0.1-0.3%.
3. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the glaze Chemical constituent is:Diboron trioxide 12.24-12.37wt%, alundum (Al2O3) 5.4-5.7wt%, magnesia 0.83-1.25wt%, Sodium oxide molybdena 4.35-6.28wt%, boron oxide 2.2-2.6wt%, zinc oxide 2.28-2.65wt%, calcium oxide 6.75-7.45wt%, six Tungsten chloride 4.73-6.08wt%, lithia 3.14-3.28wt%, vanadium trioxide 0.02-0.06wt%, surplus are silica.
4. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the grain size is The silica of 60-80nm is produced by Sol-Gel technologies.
5. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the chlordene The impurity of oxychloride is less than 0.5wt% in tungsten.
6. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the glazing material Preparation method be:By silica, diboron trioxide, alundum (Al2O3), the oxygen in addition to grain size is the silica of 60-80nm Change magnesium, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, lithia, vanadium trioxide mixing, it is small to be milled to grain size in the ball mill After 0.1mm, the silica and tungsten hexachloride that grain size is 60-80nm is added, 380-420 DEG C is warming up in crucible, heat preservation 30-40 minutes, it is continuously heating to 820-880 DEG C after the completion, keeps the temperature 40-60 minutes, then proceedes to be heated to 1050-1150 DEG C, After heat preservation 20-30 minutes, it is quickly down to room temperature with 30-40 DEG C, ball mill ball milling is used after dry, crosses 325 mesh screen residues after the completion 0.02-0.08%。
7. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the firing temperature Degree is 760-880 DEG C.
CN201810742258.7A 2018-07-09 2018-07-09 A method of improving low-temperature lead-free boron glaze surface texture Pending CN108529880A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1411578A (en) * 1972-07-18 1975-10-29 Nippon Steel Corp Glazes
EP0509792A2 (en) * 1991-04-17 1992-10-21 COOKSON GROUP plc Glaze compositions
WO1999005070A1 (en) * 1997-07-23 1999-02-04 British Ceramic Research Limited Lead-free glaze for ceramic articles
CN105712630A (en) * 2016-03-28 2016-06-29 福建省佳美集团公司 Furnace-transmutation crystallite rainbow color glaze and preparing method thereof
CN106977098A (en) * 2017-03-17 2017-07-25 界首市伟盛古窑彩陶制作发展有限公司 A kind of low-temperature lead-free colored glaze

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1411578A (en) * 1972-07-18 1975-10-29 Nippon Steel Corp Glazes
EP0509792A2 (en) * 1991-04-17 1992-10-21 COOKSON GROUP plc Glaze compositions
WO1999005070A1 (en) * 1997-07-23 1999-02-04 British Ceramic Research Limited Lead-free glaze for ceramic articles
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Application publication date: 20180914