CN108529880A - A method of improving low-temperature lead-free boron glaze surface texture - Google Patents
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Abstract
The invention belongs to low-temperature lead-free boron glaze technical fields, and in particular to a method of improving low-temperature lead-free boron glaze surface texture, the average whiteness after the completion of the blank examination clear frit is fired is 38.4, and the glaze includes following components:Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, tungsten hexachloride, lithia, vanadium trioxide, surplus are silica.The present invention has the following advantages compared with prior art:Method passes through rational proportion glaze component in the present invention, sintering temperature can effectively be reduced, and its surface gloss and transparency are held at higher level, the mating reaction of nano silicon dioxide and tungsten hexachloride and vanadium trioxide, it can make glazing material under the conditions of melting temperature is lower, can also make to combine can improve with surface smoothness, surface no pin-hole defect, have preferable glossiness and whiteness in the temperature firing product less than 900 DEG C.
Description
Technical field
The invention belongs to low-temperature lead-free boron glaze technical fields, and in particular to a kind of to improve low-temperature lead-free boron glaze surface texture
Method.
Background technology
Glaze be covered on ceramic body surface rich in the glassy thin layer of glossiness, function not only there is decoration to make
With, and the physical property and chemical property of billet surface can be improved, it improves the hardness of product, increase its thermal stability, be based on
Effect of the glaze on ceramic, glaze are constantly protruding and are enhancing in the importance of ceramic industry, directly affect ceramic
Quality and cost;Traditional enamel frit makeing technology needs to be burnt under the high temperature conditions(-1350℃), firing period is longer(14-16 is small
When), inlet pipe can make prepared glaze layer have stronger mechanical property and high glossiness, but technical conditions are harsh, energy consumption
It is high, energy-saving and environment-friendly requirement is not met, the firing temperature and fabrication cycle of glaze layer how is reduced, is faced with chooses always
War;In ceramic industry, lead oxide has been used in ceramic glaze for a long time, due to containing as a kind of main fluxing
Lead glaze is producing and can all brought to people in certain health hazard, people to be seeking to the method for reducing lead dissolution, with
People has higher understanding to itself living environment and health, and alkali borosilicate glaze is with its strong applicability, cost
It is low that advance is showed in leadless glaze system, but be primarily now the research for concentrating on high temperature oil and intermediate glaze, to low-temperature lead-free
The research and design of glaze is few, and the key technology of low-temperature lead-free glaze is the use using many oxide substitution lead oxide in glaze
Amount, and the glossiness of glaze shape, whiteness and its appearance are our directions to be studied.
Invention content
The purpose of the present invention is for existing problem, provide a kind of side improving low-temperature lead-free boron glaze surface texture
Method.
The present invention is achieved by the following technical solutions:A method of improving low-temperature lead-free boron glaze surface texture, institute
The average whiteness stated after the completion of blank examination clear frit is fired is 38.4, and the glaze includes following components:Diboron trioxide, three oxygen
Change two aluminium, magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, tungsten hexachloride, lithia, vanadium trioxide, surplus two
Silica;
Wherein the content of diboron trioxide be more than sodium oxide molybdena, boron oxide, lithia, vanadium trioxide content and;
The content of the diboron trioxide is less than the half of dioxide-containing silica;The content of the tungsten hexachloride is less than three oxygen
Change the half of two boron contents;
Grain size is that the silica of 60-80nm accounts for the 16-25% of its total weight in the silica material;The grain of tungsten hexachloride
Diameter is 20-30nm.
As further improvement of these options, the chemical composition of the blank is:Silica 65.96wt%, three oxygen
Change two aluminium 25.32wt%, calcium oxide 0.73wt%, magnesia 0.45wt%, sodium oxide molybdena 1.47wt%, potassium oxide 1.86wt%, three oxidations
Two iron 4.13wt%, titanium dioxide 0.08wt%;The fineness of blank is 0.1-0.3% more than 10000-hole sieve.
As further improvement of these options, the chemical constituent of the glaze is:Diboron trioxide 12.24-
12.37wt%, alundum (Al2O3) 5.4-5.7wt%, magnesia 0.83-1.25wt%, sodium oxide molybdena 4.35-6.28wt%, boron oxide
2.2-2.6wt%, zinc oxide 2.28-2.65wt%, calcium oxide 6.75-7.45wt%, tungsten hexachloride 4.73-6.08wt%, lithia
3.14-3.28wt%, vanadium trioxide 0.02-0.06wt%, surplus are silica.
As further improvement of these options, the grain size is the silica of 60-80nm by Sol-Gel technology systems
It takes.
As further improvement of these options, the impurity of oxychloride is less than 0.5wt% in the tungsten hexachloride.
As further improvement of these options, the preparation method of the glazing material is:To be 60-80nm's except grain size
Silica, diboron trioxide outside silica, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, oxidation
Calcium, lithia, vanadium trioxide mixing, it is 60-80nm's to be milled to grain size in the ball mill less than grain size after 0.1mm, is added
Silica and tungsten hexachloride are warming up to 380-420 DEG C in crucible, keep the temperature 30-40 minutes, are continuously heating to 820- after the completion
880 DEG C, 40-60 minutes are kept the temperature, then proceedes to be heated to 1050-1150 DEG C, after keeping the temperature 20-30 minutes, with 30-40 DEG C of fast prompt drop
To room temperature, ball mill ball milling is used after dry, crosses 325 mesh screen residue 0.02-0.08% after the completion.
As further improvement of these options, the firing temperature is 760-880 DEG C.
The present invention has the following advantages compared with prior art:Method, can by rational proportion glaze component in the present invention
Sintering temperature is effectively reduced, and its surface gloss and transparency are held at higher level, nano silicon dioxide and chlordene
Change tungsten and vanadium trioxide mating reaction, can make glazing material under the conditions of melting temperature is lower, moreover it is possible to make combine can and
Surface smoothness improves, surface no pin-hole defect, has preferable glossiness and white in the temperature firing product less than 900 DEG C
Degree.
Specific implementation mode
Embodiment 1
A method of improving low-temperature lead-free boron glaze surface texture, the average whiteness after the completion of the blank examination clear frit is fired is
38.4, the chemical constituent of the glaze is:Diboron trioxide 12.29wt%, alundum (Al2O3) 5.55wt%, magnesia 1wt%, oxygen
Change sodium 5.26wt%, boron oxide 2.4wt%, zinc oxide 2.43wt%, calcium oxide 7.13wt%, tungsten hexachloride 5.26wt%, lithia
3.22wt%, vanadium trioxide 0.04wt%, surplus are silica;
Grain size is that the silica of 60-80nm accounts for the 21% of its total weight in the silica material;The grain size of tungsten hexachloride is
20-30nm。
Wherein, the chemical composition of the blank is:Silica 65.96wt%, alundum (Al2O3) 25.32wt%, calcium oxide
0.73wt%, magnesia 0.45wt%, sodium oxide molybdena 1.47wt%, potassium oxide 1.86wt%, di-iron trioxide 4.13wt%, titanium dioxide
0.08wt%;The fineness of blank is 0.1-0.3% more than 10000-hole sieve.
Wherein, the grain size is that the silica of 60-80nm is produced by Sol-Gel technologies;Chlorine oxygen in the tungsten hexachloride
The impurity of compound is less than 0.5wt%.
Wherein, the preparation method of the glazing material is:By except grain size be 60-80nm silica in addition to silica,
Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, lithia, vanadium trioxide are mixed
It closes, is milled to grain size in the ball mill less than the silica and tungsten hexachloride that grain size is 60-80nm after 0.1mm, is added, in earthenware
It is warming up to 400 DEG C in crucible, keeps the temperature 35 minutes, is continuously heating to 850 DEG C after the completion, keeps the temperature 50 minutes, then proceedes to be heated to
1100 DEG C, after keeping the temperature 25 minutes, it is quickly down to room temperature with 35 DEG C, ball mill ball milling is used after dry, crosses 325 mesh screen residues after the completion
0.02-0.08%。
Wherein, the firing temperature is 820 DEG C.
Embodiment 2
A method of improving low-temperature lead-free boron glaze surface texture, the average whiteness after the completion of the blank examination clear frit is fired is
38.4, the chemical constituent of the glaze is:Diboron trioxide 12.24wt%, alundum (Al2O3) 5.7wt%, magnesia 0.83wt%,
Sodium oxide molybdena 6.28wt%, boron oxide 2.6wt%, zinc oxide 2.28wt%, calcium oxide 6.75wt%, tungsten hexachloride 6.08wt%, lithia
3.14wt%, vanadium trioxide 0.02wt%, surplus are silica;
Grain size is that the silica of 60-80nm accounts for the 16% of its total weight in the silica material;The grain size of tungsten hexachloride is
20-30nm。
Wherein, the chemical composition of the blank is:Silica 65.96wt%, alundum (Al2O3) 25.32wt%, calcium oxide
0.73wt%, magnesia 0.45wt%, sodium oxide molybdena 1.47wt%, potassium oxide 1.86wt%, di-iron trioxide 4.13wt%, titanium dioxide
0.08wt%;The fineness of blank is 0.1-0.3% more than 10000-hole sieve.
Wherein, the grain size is that the silica of 60-80nm is produced by Sol-Gel technologies;Chlorine oxygen in the tungsten hexachloride
The impurity of compound is less than 0.5wt%.
Wherein, the preparation method of the glazing material is:By except grain size be 60-80nm silica in addition to silica,
Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, lithia, vanadium trioxide are mixed
It closes, is milled to grain size in the ball mill less than the silica and tungsten hexachloride that grain size is 60-80nm after 0.1mm, is added, in earthenware
It is warming up to 380 DEG C in crucible, keeps the temperature 40 minutes, is continuously heating to 820 DEG C after the completion, keeps the temperature 60 minutes, then proceedes to be heated to
1050 DEG C, after keeping the temperature 30 minutes, it is quickly down to room temperature with 40 DEG C, ball mill ball milling is used after dry, crosses 325 mesh screen residues after the completion
0.02-0.08%。
Wherein, the firing temperature is 760 DEG C.
Embodiment 3
A method of improving low-temperature lead-free boron glaze surface texture, the average whiteness after the completion of the blank examination clear frit is fired is
38.4, the chemical constituent of the glaze is:Diboron trioxide 12.37wt%, alundum (Al2O3) 5.4wt%, magnesia 1.25wt%,
Sodium oxide molybdena 4.35wt%, boron oxide 2.2wt%, zinc oxide 2.65wt%, calcium oxide 7.45wt%, tungsten hexachloride 4.73wt%, lithia
3.28wt%, vanadium trioxide 0.06wt%, surplus are silica;
Grain size is that the silica of 60-80nm accounts for the 25% of its total weight in the silica material;The grain size of tungsten hexachloride is
20-30nm。
Wherein, the chemical composition of the blank is:Silica 65.96wt%, alundum (Al2O3) 25.32wt%, calcium oxide
0.73wt%, magnesia 0.45wt%, sodium oxide molybdena 1.47wt%, potassium oxide 1.86wt%, di-iron trioxide 4.13wt%, titanium dioxide
0.08wt%;The fineness of blank is 0.1-0.3% more than 10000-hole sieve.
Wherein, the grain size is that the silica of 60-80nm is produced by Sol-Gel technologies;Chlorine oxygen in the tungsten hexachloride
The impurity of compound is less than 0.5wt%.
Wherein, the preparation method of the glazing material is:By except grain size be 60-80nm silica in addition to silica,
Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, lithia, vanadium trioxide are mixed
It closes, is milled to grain size in the ball mill less than the silica and tungsten hexachloride that grain size is 60-80nm after 0.1mm, is added, in earthenware
It is warming up to 420 DEG C in crucible, keeps the temperature 30 minutes, is continuously heating to 880 DEG C after the completion, keeps the temperature 40-60 minutes, then proceedes to be heated to
1150 DEG C, heat preservation is quickly down to room temperature after twenty minutes, with 30 DEG C, uses ball mill ball milling after dry, crosses 325 mesh screen residues after the completion
0.02-0.08%。
Wherein, the firing temperature is 880 DEG C.
Setting control group 1 removes tungsten hexachloride in embodiment 1, remaining content is constant;Control group 2 is set, by embodiment 1
Middle vanadium trioxide removes, remaining content is constant;Control group 3 is set, by the silica that grain size in embodiment 1 is 60-80nm
Normal silica is replaced with, remaining content is constant;
The glossiness, whiteness and appearance of each group glaze are detected, following result is obtained:
Table 1
Group | Glossiness | Whiteness |
Embodiment 1 | 98.4 | 82.3 |
Embodiment 2 | 98.7 | 82.5 |
Embodiment 3 | 98.5 | 82.3 |
Control group 1 | 89.2 | 70.8 |
Control group 2 | 82.7 | 42.7 |
Control group 3 | 86.4 | 48.5 |
By data in table 1 can be seen that in the present invention sintering temperature be less than 900 DEG C under the premise of, can ensure higher
Glossiness and whiteness are suitable for promoting.
Claims (7)
1. a kind of method improving low-temperature lead-free boron glaze surface texture, which is characterized in that the blank examination clear frit, which is fired, to be completed
Average whiteness afterwards is 38.4, and the glaze includes following components:Diboron trioxide, alundum (Al2O3), magnesia, sodium oxide molybdena,
Boron oxide, zinc oxide, calcium oxide, tungsten hexachloride, lithia, vanadium trioxide, surplus are silica;
Wherein the content of diboron trioxide be more than sodium oxide molybdena, boron oxide, lithia, vanadium trioxide content and;
The content of the diboron trioxide is less than the half of dioxide-containing silica;The content of the tungsten hexachloride is less than three oxygen
Change the half of two boron contents;
Grain size is that the silica of 60-80nm accounts for the 16-25% of its total weight in the silica material;The grain of tungsten hexachloride
Diameter is 20-30nm.
2. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the blank
Chemical composition is:Silica 65.96wt%, alundum (Al2O3) 25.32wt%, calcium oxide 0.73wt%, magnesia 0.45wt%, oxygen
Change sodium 1.47wt%, potassium oxide 1.86wt%, di-iron trioxide 4.13wt%, titanium dioxide 0.08wt%;The fineness of blank is ten thousand holes
Tail over 0.1-0.3%.
3. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the glaze
Chemical constituent is:Diboron trioxide 12.24-12.37wt%, alundum (Al2O3) 5.4-5.7wt%, magnesia 0.83-1.25wt%,
Sodium oxide molybdena 4.35-6.28wt%, boron oxide 2.2-2.6wt%, zinc oxide 2.28-2.65wt%, calcium oxide 6.75-7.45wt%, six
Tungsten chloride 4.73-6.08wt%, lithia 3.14-3.28wt%, vanadium trioxide 0.02-0.06wt%, surplus are silica.
4. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the grain size is
The silica of 60-80nm is produced by Sol-Gel technologies.
5. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the chlordene
The impurity of oxychloride is less than 0.5wt% in tungsten.
6. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the glazing material
Preparation method be:By silica, diboron trioxide, alundum (Al2O3), the oxygen in addition to grain size is the silica of 60-80nm
Change magnesium, sodium oxide molybdena, boron oxide, zinc oxide, calcium oxide, lithia, vanadium trioxide mixing, it is small to be milled to grain size in the ball mill
After 0.1mm, the silica and tungsten hexachloride that grain size is 60-80nm is added, 380-420 DEG C is warming up in crucible, heat preservation
30-40 minutes, it is continuously heating to 820-880 DEG C after the completion, keeps the temperature 40-60 minutes, then proceedes to be heated to 1050-1150 DEG C,
After heat preservation 20-30 minutes, it is quickly down to room temperature with 30-40 DEG C, ball mill ball milling is used after dry, crosses 325 mesh screen residues after the completion
0.02-0.08%。
7. a kind of method improving low-temperature lead-free boron glaze surface texture as described in claim 1, which is characterized in that the firing temperature
Degree is 760-880 DEG C.
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CN106977098A (en) * | 2017-03-17 | 2017-07-25 | 界首市伟盛古窑彩陶制作发展有限公司 | A kind of low-temperature lead-free colored glaze |
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GB1411578A (en) * | 1972-07-18 | 1975-10-29 | Nippon Steel Corp | Glazes |
EP0509792A2 (en) * | 1991-04-17 | 1992-10-21 | COOKSON GROUP plc | Glaze compositions |
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