CN108508648A - 液晶面板及其制作方法 - Google Patents

液晶面板及其制作方法 Download PDF

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CN108508648A
CN108508648A CN201810298173.4A CN201810298173A CN108508648A CN 108508648 A CN108508648 A CN 108508648A CN 201810298173 A CN201810298173 A CN 201810298173A CN 108508648 A CN108508648 A CN 108508648A
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liquid crystal
crystal display
display panel
antireflective film
glass substrate
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CN108508648B (zh
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莫超德
孙杰
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TCL Huaxing Photoelectric Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US16/077,416 priority patent/US20210080777A1/en
Priority to PCT/CN2018/084473 priority patent/WO2019192039A1/zh
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Abstract

本发明公开了一种液晶面板及其制作方法，液晶面板包括相对设置的玻璃基板和阵列基板以及设于所述玻璃基板和所述阵列基板之间的液晶、减反膜、彩色滤光片，所述减反膜设于所述玻璃基板内侧，所述彩色滤光片设于所述阵列基板内侧。本发明通过将彩色滤光片设置在阵列基板侧，并在阵列基板的对侧基板的内侧设置有减反膜，有利于降低液晶面板的光线反射率，改善视觉效果。

Description

液晶面板及其制作方法
技术领域
本发明涉及液晶显示技术领域，尤其涉及一种液晶面板及其制作方法。
背景技术
COA(Color Filter On Array，彩色滤光片集成在阵列基板上)技术是将彩色滤光层直接制作在阵列基板上的一种集成技术，它能够有效解决成盒工艺中因彩色滤光片色阻与像素电极之间的对位偏差造成的漏光问题，并能显著提升显示像素开口率及减少寄生电容，从而成为主流技术。
但是，这种显示屏由于没有彩色滤光层的过滤作用，白光可直接穿透玻璃、液晶直接射到阵列基板，从而在盖板玻璃、彩色滤光片基板(CF基板)侧的ITO(氧化铟锡)电极、液晶或阵列基板(Array基板)侧的ITO电极等各个表面形成反射面，反光效果加剧，在暗态时表现尤为明显，严重影响了视觉效果。为了降低反射率，目前的对策是在玻璃外表面粘贴一层反射率更低的偏光片，由于偏光片价格很高，导致制作成本增加。
发明内容
鉴于现有技术存在的不足，本发明提供了一种液晶面板及其制作方法，可以降低显示装置的反光效果，实现成本低且有助于改善视觉效果。
为了实现上述的目的，本发明采用了如下的技术方案：
一种液晶面板，包括相对设置的玻璃基板和阵列基板以及设于所述玻璃基板和所述阵列基板之间的液晶、减反膜、彩色滤光片，所述减反膜设于所述玻璃基板内侧，所述彩色滤光片设于所述阵列基板内侧。
作为其中一种实施方式，所述减反膜形成在所述玻璃基板内表面。
作为其中一种实施方式，所述的液晶面板还包括透明电极层和黑色矩阵，所述透明电极层设于所述减反膜背向所述玻璃基板的表面，所述黑色矩阵设于所述透明电极层背向所述玻璃基板的表面，并位于液晶面板的非显示区。
作为其中一种实施方式，所述的液晶面板还包括多根隔垫柱，所述隔垫柱一端设于所述黑色矩阵上，另一端用于抵接在所述阵列基板所在侧。
作为其中一种实施方式，所述减反膜的折射率n满足：n1＜n＜n2，其中，n1为所述玻璃基板的折射率，n2为所述透明电极层的折射率。
作为其中一种实施方式，所述减反膜的厚度e满足：其中，λ为460～660nm，k为自然数。
作为其中一种实施方式，所述减反膜的折射率n满足：
作为其中一种实施方式，λ＝550，和/或，所述减反膜为SiOxNy、Al2O3或树脂类。
本发明的另一目的在于提供一种液晶面板的制作方法，包括：
提供一玻璃基板，并在所述玻璃基板表面制作减反膜；
在所述减反膜表面沉积一层透明电极层；
在所述透明电极层表面用光刻工艺制作黑色矩阵，所述黑色矩阵位于液晶面板的非显示区；
在所述黑色矩阵表面光刻形成隔垫柱；
提供一阵列基板，将所述阵列基板与所述玻璃基板组立，并在所述阵列基板与所述玻璃基板之间填充液晶。
作为其中一种实施方式，所述减反膜的厚度e满足：其中，n为所述减反膜的折射率，λ为460～660nm，k为自然数。
本发明通过将彩色滤光片设置在阵列基板侧，并在阵列基板的对侧基板的内侧设置有减反膜，有利于降低液晶面板的光线反射率，改善视觉效果。
附图说明
图1为本发明实施例的液晶面板的结构示意图；
图2为本发明实施例的液晶面板的制作原理示意图；
图3为本发明实施例的液晶面板的制作方法示意图。
具体实施方式
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本发明进一步详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
参阅图1，本发明实施例的液晶面板包括相对设置的玻璃基板10和阵列基板20以及设于玻璃基板10和阵列基板20之间的液晶30、减反膜11、彩色滤光片21，其中，减反膜11设于玻璃基板10内侧，彩色滤光片21设于阵列基板20内侧。
通过将彩色滤光片21设置在阵列基板20内侧，使得彩色滤光片21与像素单元制作在同一块基板上，阵列基板20在与玻璃基板10对位的过程中不需要考虑彩色滤光片21的对位，因此，可以避免对位偏差造成的漏光问题。
可以理解的是，阵列基板20表面制作有阵列的TFT(Thin Film Transistor，即薄膜晶体管)200，彩色滤光片21位于液晶30与TFT200之间，彩色滤光片21表面还设有电极层22。另外，位于液晶30上下侧的配向膜在本实施例中并未示出。
作为其中一种实施方式，减反膜11形成在玻璃基板10内表面，其可以为SiOxNy、Al2O3或树脂类材料制成，实现成本低，可以有效减少液晶面板产生的反射光，从而改善视觉效果，提升观看体验。
在液晶面板的阵列基板20对侧还设置有透明电极层12和黑色矩阵13，其中，透明电极层12设于减反膜11背向玻璃基板10的表面，黑色矩阵13设于透明电极层12背向玻璃基板10的表面，并位于液晶面板的非显示区，与像素间的间隔正对。其中，透明电极层12一般选用氧化铟锡(ITO)，黑色矩阵13可以采用黑色光阻材料制成。
与此同时，液晶面板中多根用于支撑两侧基板以保持均一盒厚的隔垫柱14也可以形成在玻璃基板10侧，即隔垫柱14一端设于黑色矩阵13上，另一端延伸至抵接在阵列基板20所在侧，该隔垫柱14位于黑色矩阵13上，因此不会影响液晶面板的正常显示。
减反膜11的折射率n满足：n1＜n＜n2，其中，n1为玻璃基板10的折射率，n2为透明电极层12的折射率。作为其中一种较佳的实施方式，减反膜11的折射率n满足：减反膜11的厚度e满足：其中，λ为460～660nm，k为自然数。优选地，λ以对人视觉较为敏感的绿光的波长550为参考。减反膜11优选SiOxNy(折射率为1.46～1.92)、Al2O3(折射率为1.59～1.77)或树脂类材料制成，其可以为多层膜层叠而成。
通过这样的设置，光线自外界射入液晶面板，需要依次经过玻璃基板10、减反膜11、透明电极层12，光线从光疏介质进入光密介质形成半波损失，可以减少反射光能量，从而降低液晶面板的光线反射率，改善液晶面板的视觉效果。
如图2和图3所示，本发明还提供了一种液晶面板的制作方法，主要包括：
S01、提供一玻璃基板10，并在玻璃基板10表面利用CVD(化学气相沉积)或PVD(物理气相沉积)等方式制作减反膜11(如图2中的制程A)，减反膜11优选采用SiOxNy、Al2O3或树脂类材料制成，其折射率n满足：n1＜n＜n2，其中，n1为玻璃基板10的折射率，n2为透明电极层12的折射率，更优选地，减反膜11的折射率n满足：减反膜11的厚度e满足：其中，λ为460～660nm，k为自然数。优选地，λ以对人视觉较为敏感的绿光的波长550为参考；
S02、在减反膜11表面使用磁控溅射或气相沉积工艺沉积一层透明电极层12(如图2中的制程B)，这里，透明电极层12选用氧化铟锡(ITO)；
S03、在透明电极层12表面用光刻工艺制作黑色矩阵13，黑色矩阵13位于液晶面板的非显示区(如图2中的制程C)，黑色矩阵13优选采用黑色光阻材料制成；
S04、在黑色矩阵13表面光刻形成隔垫柱14(如图2中的制程D)，作为彩膜隔垫物；
S05、提供一阵列基板20，将阵列基板20与玻璃基板10组立，并在阵列基板20与玻璃基板10之间填充液晶30，其中，彩色滤光片21设置在阵列基板20内侧，使得彩色滤光片21与像素单元制作在同一块基板上，彩色滤光片21表面还制作有电极层22。
其中，黑色矩阵13与隔垫柱14可以采用相同的光阻材料制成，这样，步骤S03和步骤S04可以合并为一个制程，可以简化制作工艺，降低制作成本，并提升隔垫柱14的结合强度。
本发明通过在玻璃基板与透明电极层之间设置有减反膜，减反膜的折射率大于玻璃基板的折射率且小于透明电极层的折射率，通过利用光从光疏介质进入光密介质形成半波损失可以减少反射光能量，从而降低液晶显示装置中光线的反射率，以此实现改善视觉效果的目的。
以上所述仅是本申请的具体实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本申请原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本申请的保护范围。

Claims (10)

1.一种液晶面板，其特征在于，包括相对设置的玻璃基板(10)和阵列基板(20)以及设于所述玻璃基板(10)和所述阵列基板(20)之间的液晶(30)、减反膜(11)、彩色滤光片(21)，所述减反膜(11)设于所述玻璃基板(10)内侧，所述彩色滤光片(21)设于所述阵列基板(20)内侧。
2.根据权利要求1所述的液晶面板，其特征在于，所述减反膜(11)形成在所述玻璃基板(10)内表面。
3.根据权利要求2所述的液晶面板，其特征在于，还包括透明电极层(12)和黑色矩阵(13)，所述透明电极层(12)设于所述减反膜(11)背向所述玻璃基板(10)的表面，所述黑色矩阵(13)设于所述透明电极层(12)背向所述玻璃基板(10)的表面，并位于液晶面板的非显示区。
4.根据权利要求3所述的液晶面板，其特征在于，还包括多根隔垫柱(14)，所述隔垫柱(14)一端设于所述黑色矩阵(13)上，另一端用于抵接在所述阵列基板(20)所在侧。
5.根据权利要求3或4所述的液晶面板，其特征在于，所述减反膜(11)的折射率n满足：n1＜n＜n2，其中，n1为所述玻璃基板(10)的折射率，n2为所述透明电极层(12)的折射率。
6.根据权利要求5所述的液晶面板，其特征在于，所述减反膜(11)的厚度e满足：其中，λ为460～660nm，k为自然数。
7.根据权利要求6所述的液晶面板，其特征在于，所述减反膜(11)的折射率n满足：
8.根据权利要求6所述的液晶面板，其特征在于，λ＝550，和/或，所述减反膜(11)为SiOxNy、Al2O3或树脂类。
9.一种液晶面板的制作方法，其特征在于，包括：
提供一玻璃基板(10)，并在所述玻璃基板(10)表面制作减反膜(11)；
在所述减反膜(11)表面沉积一层透明电极层(12)；
在所述透明电极层(12)表面用光刻工艺制作黑色矩阵(13)，所述黑色矩阵(13)位于液晶面板的非显示区；
在所述黑色矩阵(13)表面光刻形成隔垫柱(14)；
提供一阵列基板(20)，将所述阵列基板(20)与所述玻璃基板(10)组立，并在所述阵列基板(20)与所述玻璃基板(10)之间填充液晶(30)。
10.根据权利要求9所述的液晶面板的制作方法，其特征在于，所述减反膜(11)的厚度e满足：其中，n为所述减反膜(11)的折射率，λ为460～660nm，k为自然数。
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