CN108425846A - A kind of device and method for improving area and melting vacuum pump utilization rate - Google Patents
A kind of device and method for improving area and melting vacuum pump utilization rate Download PDFInfo
- Publication number
- CN108425846A CN108425846A CN201810332647.2A CN201810332647A CN108425846A CN 108425846 A CN108425846 A CN 108425846A CN 201810332647 A CN201810332647 A CN 201810332647A CN 108425846 A CN108425846 A CN 108425846A
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- China
- Prior art keywords
- vacuum pump
- pipeline
- vacuum
- pump
- utilization rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000002844 melting Methods 0.000 title claims abstract description 15
- 230000008018 melting Effects 0.000 title claims abstract description 15
- 239000013078 crystal Substances 0.000 claims abstract description 17
- 238000001514 detection method Methods 0.000 claims description 5
- 239000004577 thatch Substances 0.000 claims description 3
- 230000008569 process Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 4
- 230000008901 benefit Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 239000000686 essence Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/126—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially from the rotor body extending elements, not necessarily co-operating with corresponding recesses in the other rotor, e.g. lobes, Roots type
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
The present invention provides the device and methods that vacuum pump utilization rate is melted in a kind of raising area, including at least three single crystal growing furnaces, every single crystal growing furnace outlet connecting pipe road, the pipeline parallel connection is converged to be connected to vacuum pump pipeline, the other end of the vacuum pump pipeline connects vacuum pump, it is connected by the first bellows between the pipeline and the single crystal growing furnace, each pipeline is equipped with butterfly valve, it is connected by the second bellows between the vacuum pump pipeline and the vacuum pump, vacuum pump discharges pipeline is additionally provided on the vacuum pump.A kind of device and method for improving area and melting vacuum pump utilization rate of the present invention, pass through vacuum pump and the one-to-many form of single crystal growing furnace, and corresponding control method, the utilization rate of vacuum pump can be improved, ensure preferable using effect, it is avoided the occurrence of simultaneously because evacuating " stream the is molten " accident occurred, stability is preferable, convenient and practical.
Description
Technical field
The invention belongs to areas to melt field of vacuum, and device and the side of vacuum pump utilization rate are melted more particularly, to a kind of raising area
Method.
Background technology
Now current equipment all be using per stove match a vacuum pump, vacuum pump most of time be for idle state,
Every stove causes the waste of cost with a vacuum pump, the present invention propose a kind of raising area melt vacuum pump utilization rate device and
Method can improve the utilization of vacuum pump by vacuum pump and the one-to-many form of single crystal growing furnace and corresponding control method
Rate ensures preferable using effect, while avoiding the occurrence of because evacuating " stream the is molten " accident occurred, and stability is preferable, convenient and practical.
Invention content
In view of this, the present invention is directed to propose a kind of device and method for improving area and melting vacuum pump utilization rate, passes through vacuum
Pump and the one-to-many form of single crystal growing furnace and corresponding control method, can improve the utilization rate of vacuum pump, and guarantee preferably makes
It with effect, while avoiding the occurrence of because evacuating " stream the is molten " accident occurred, stability is preferable, convenient and practical.
In order to achieve the above objectives, the technical proposal of the invention is realized in this way：
A kind of device and method for improving area and melting vacuum pump utilization rate, including at least three single crystal growing furnaces, every monocrystalline
Outlet of still connecting line, the pipeline parallel connection is converged to be connected to vacuum pump pipeline, the other end connection of the vacuum pump pipeline
Vacuum pump is connected between the pipeline and the single crystal growing furnace by the first bellows, and each pipeline is equipped with butterfly valve, described
It is connected by the second bellows between vacuum pump pipeline and the vacuum pump, vacuum pump discharges pipe is additionally provided on the vacuum pump
Road.
Further, the vacuum pump pipeline is equipped with pressure sensor, and being additionally provided with power failure on the vacuum pump pipeline lets out
Device of air.
Further, the vacuum pump discharges pipeline is equipped with muffler, is additionally provided on the vacuum pump discharges pipeline certainly
Dynamic vent valve.
Further, the vacuum pump includes Vacuum Roots pump and mechanical pump, is connected between the two by third bellows,
The vacuum pump pipeline is connect with the Vacuum Roots pump, and the vacuum pump discharges pipeline is connected on the mechanical pump.
Further, be respectively equipped with motor on the Vacuum Roots pump and the mechanical pump, the motor, the butterfly valve,
The power failure air releasing device, the automatic blow off valve valve air relief and the pressure sensor are electrically connected with control unit.
Further, vacuum-pump line is coupled with multiple lists by step 1 using the working method that vacuum pump is one-to-many
On brilliant stove, controllable butterfly valve is designed on the pipeline that furnace body stretches out, these butterfly valves can not be simultaneously by the mutual lock control of program
It opens；
One of butterfly valve is opened in step 2, control, other are in closed state, and vacuum pump is started to work, and pipe is passed through
Road evacuates monocrystalline furnace air, detects when reaching required preliminary vacuum degree, mechanical pump is stopped, by Vacuum Roots pump
Continue to vacuumize, until furnace body vacuum degree is less than the technological requirement of 0.02bar；
Step 3：After above-mentioned vacuum degree to be achieved, vacuum pump is stopped, and has detected whether that other butterfly valves are opened, if
Have, close respective line butterfly valve, if no, then detect whether vacuum-pump line is normal pressure by pressure sensor, if no, beat
Automatic blow off valve valve air relief is opened, is detected again, until reaching normal pressure state；
Step 4：Automatic blow off valve valve air relief is closed, vacuum pump is started to work, and the corresponding butterfly valve accordingly to be worked is opened, and is started
Work, can vacuum degree reach prescribed requirement before the deadline for detection, can close respective valves if, close vacuum
Pump terminates, and otherwise, is deflated to furnace pressure and arrives normal pressure, comes back to and detect the step of whether being normal pressure in vacuum-pump line, directly
To reaching prescribed requirement.
Compared with the existing technology, it is of the present invention it is a kind of improve area melt vacuum pump utilization rate device and method have with
Lower advantage：
(1) a kind of device and method for improving area and melting vacuum pump utilization rate of the present invention, passes through vacuum pump and monocrystalline
The one-to-many form of stove and corresponding control method, can improve the utilization rate of vacuum pump, ensure preferable using effect,
It is avoided the occurrence of simultaneously because evacuating " stream the is molten " accident occurred, stability is preferable, convenient and practical.
(2) a kind of device and method for improving area and melting vacuum pump utilization rate of the present invention, is connected by a vacuum pump
The structure type of more single crystal growing furnaces, and the variation and cooperation of corresponding structure are connect, can be cost-effective, improve the use of equipment
Rate improves the efficiency of work, and stability is stronger, and convenient for safeguarding, stability is more preferable.
Description of the drawings
The attached drawing for constituting the part of the present invention is used to provide further understanding of the present invention, schematic reality of the invention
Example and its explanation are applied for explaining the present invention, is not constituted improper limitations of the present invention.In the accompanying drawings：
Fig. 1 is a kind of device connection diagram of the molten vacuum pump utilization rate in raising area described in the embodiment of the present invention；
Fig. 2 is a kind of device and method technological process frame of the molten vacuum pump utilization rate in raising area described in the embodiment of the present invention
Figure.
Reference sign：
1- single crystal growing furnaces；2- butterfly valves；The first bellowss of 3-；4- pipelines；5- pressure sensors；6- power failure air releasing devices；7-
Two bellowss；8- vacuum pumps；9- vacuum pump discharges pipelines；10- vacuum pump pipelines.
Specific implementation mode
It should be noted that in the absence of conflict, the feature in embodiment and embodiment in the present invention can phase
Mutually combination.
In the description of the present invention, it is to be understood that, term "center", " longitudinal direction ", " transverse direction ", "upper", "lower",
The orientation or positional relationship of the instructions such as "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outside" is
It is based on the orientation or positional relationship shown in the drawings, is merely for convenience of description of the present invention and simplification of the description, rather than instruction or dark
Show that signified device or element must have a particular orientation, with specific azimuth configuration and operation, therefore should not be understood as pair
The limitation of the present invention.In addition, term " first ", " second " etc. are used for description purposes only, it is not understood to indicate or imply phase
To importance or implicitly indicate the quantity of indicated technical characteristic.The feature for defining " first ", " second " etc. as a result, can
To express or implicitly include one or more this feature.In the description of the present invention, unless otherwise indicated, " multiple "
It is meant that two or more.
In the description of the present invention, it should be noted that unless otherwise clearly defined and limited, term " installation ", " phase
Even ", " connection " shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or be integrally connected；It can
Can also be electrical connection to be mechanical connection；It can be directly connected, can also indirectly connected through an intermediary, Ke Yishi
Connection inside two elements.For the ordinary skill in the art, above-mentioned term can be understood by concrete condition
Concrete meaning in the present invention.
The present invention will be described in detail below with reference to the accompanying drawings and embodiments.
A kind of device and method for improving area and melting vacuum pump utilization rate as shown in Figure 1, including at least three single crystal growing furnaces 1, often
1 outlet connecting pipe road 4 of single crystal growing furnace described in platform, 4 parallel connection of the pipeline is converged to be connected to vacuum pump pipeline 10, the vacuum pump line
The other end on road 10 connects vacuum pump 8, is connected by the first bellows 3 between the pipeline 4 and the single crystal growing furnace 1, Mei Gesuo
It states pipeline 4 and is equipped with butterfly valve 2, connected by the second bellows 7 between the vacuum pump pipeline 10 and the vacuum pump 8, it is described
Vacuum pump discharges pipeline 9 is additionally provided on vacuum pump 8.
Wherein, the vacuum pump pipeline 10 is equipped with pressure sensor 5, and being additionally provided with power failure on the vacuum pump pipeline 10 lets out
Device of air 6.
Wherein, the vacuum pump discharges pipeline 9 is equipped with muffler, is additionally provided on the vacuum pump discharges pipeline and puts automatically
Air valve.
Wherein, the vacuum pump 8 includes Vacuum Roots pump and mechanical pump, is connected between the two by third bellows, institute
It states vacuum pump pipeline 10 to connect with the Vacuum Roots pump, the vacuum pump discharges pipeline 9 is connected on the mechanical pump.
Wherein, it is respectively equipped with motor on the Vacuum Roots pump and the mechanical pump, it is the motor, the butterfly valve, described
Power failure air releasing device, the automatic blow off valve valve air relief and the pressure sensor 5 are electrically connected with control unit.
Wherein, vacuum-pump line 10 is coupled with multiple lists by step 1 using the working method that vacuum pump 8 is one-to-many
On brilliant stove 1, controllable butterfly valve 2 is designed on the pipeline 4 that furnace body stretches out, these butterfly valves 2 can not by the mutual lock control of program
It opens simultaneously；
One of butterfly valve 2 is opened in step 2, control, other are in closed state, and vacuum pump 8 is started to work, passed through
Pipeline 4 evacuates air in single crystal growing furnace 1, detects when reaching required preliminary vacuum degree, mechanical pump is stopped, by vacuum sieve
Thatch pump continues to vacuumize, until furnace body vacuum degree is less than the technological requirement of 0.02bar；
Step 3：After above-mentioned vacuum degree to be achieved, vacuum pump 8 is stopped, and has detected whether that other butterfly valves 2 are opened, such as
Fruit has, and closes respective line butterfly valve 2, if no, then detects whether vacuum-pump line 10 is normal pressure by pressure sensor 5, no
If, automatic blow off valve valve air relief is opened, is detected again, until reaching normal pressure state；
Step 4：Automatic blow off valve valve air relief is closed, vacuum pump 8 is started to work, and the corresponding butterfly valve 2 accordingly to be worked is opened, and is opened
Beginning work, can vacuum degree reach prescribed requirement before the deadline for detection, can close respective valves if, close true
Sky pump 8, terminate, otherwise, be deflated to furnace pressure arrive normal pressure, come back to detect vacuum-pump line 10 in whether be normal pressure step
Suddenly, until reaching prescribed requirement.
It is wherein directed to when other tables keep isometrical state, absolute stable state is needed just to make full melting zone not
It will appear the generation of " stream molten " accident, the improvement of this method is all added properly straight in the junction of each furnace body of vacuum pump 8
Diameter " corrugated stainless steel tubing " utmostly reduces the influence for shaking and bringing with the method for " being flexible coupling " from mechanical aspects；
In detection control aspect, the sensing device of pressure sensor 5 and automatic blow off valve valve air relief is added, is that vacuum pump 8 is rigid
Just work terminates, and vacuum pump line 10 is also under negative pressure state, when being vacuumized again for other burner hearths, 8 valve of vacuum pump
The moment of door opens the vibrations that other tables can be driven by vacuum-pump line 10, both devices combine the benefit being added can avoid
Occur because evacuating " stream the is molten " accident occurred.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all essences in the present invention
With within principle, any modification, equivalent replacement, improvement and so on should all be included in the protection scope of the present invention god.
Claims (6)
1. a kind of device for improving area and melting vacuum pump utilization rate, it is characterised in that：Including at least three single crystal growing furnaces, every list
Brilliant outlet of still connecting line, the pipeline parallel connection is converged to be connected to vacuum pump pipeline, and the other end of the vacuum pump pipeline connects
Vacuum pump is connect, is connected by the first bellows between the pipeline and the single crystal growing furnace, each pipeline is equipped with butterfly valve, institute
It states and is connected by the second bellows between vacuum pump pipeline and the vacuum pump, vacuum pump discharges pipe is additionally provided on the vacuum pump
Road.
2. a kind of device for improving area and melting vacuum pump utilization rate according to claim 1, it is characterised in that：The vacuum pump
Pipeline is equipped with pressure sensor, and power failure air releasing device is additionally provided on the vacuum pump pipeline.
3. a kind of device for improving area and melting vacuum pump utilization rate according to claim 2, it is characterised in that：The vacuum pump
Discharge duct is equipped with muffler, and automatic blow off valve valve air relief is additionally provided on the vacuum pump discharges pipeline.
4. a kind of device for improving area and melting vacuum pump utilization rate according to claim 3, it is characterised in that：The vacuum pump
It including Vacuum Roots pump and mechanical pump, is connected between the two by third bellows, the vacuum pump pipeline and vacuum sieve
Thatch pump connection, the vacuum pump discharges pipeline are connected on the mechanical pump.
5. a kind of device for improving area and melting vacuum pump utilization rate according to claim 4, it is characterised in that：Vacuum sieve
Thatch pump and the mechanical pump on be respectively equipped with motor, the motor, the power failure air releasing device, described is put the butterfly valve automatically
Air valve and the pressure sensor are electrically connected with control unit.
6. a kind of method for improving area and melting vacuum pump utilization rate, the in order to control molten vacuum pump utilization in a kind of raising area of claim 5
The process of the device of rate, it is characterised in that：Include the following steps：
Vacuum-pump line is coupled on multiple single crystal growing furnaces, using the working method that vacuum pump is one-to-many in furnace body by step 1
Controllable butterfly valve is designed on the pipeline of stretching, these butterfly valves can not be opened simultaneously by the mutual lock control of program；
One of butterfly valve is opened in step 2, control, other are in closed state, and vacuum pump is started to work, taken out by pipeline
Empty monocrystalline furnace air is detected when reaching required preliminary vacuum degree, and mechanical pump is stopped, and is continued by Vacuum Roots pump
It vacuumizes, until furnace body vacuum degree is less than the technological requirement of 0.02bar；
Step 3：After above-mentioned vacuum degree to be achieved, vacuum pump is stopped, and has detected whether that other butterfly valves are opened, if so, closing
Respective line butterfly valve is closed, if no, then detects whether vacuum-pump line is normal pressure by pressure sensor, if no, opens certainly
Dynamic vent valve, is detected again, until reaching normal pressure state；
Step 4：Automatic blow off valve valve air relief is closed, vacuum pump is started to work, and the corresponding butterfly valve accordingly to be worked is opened, and is started to work,
Can vacuum degree reach prescribed requirement before the deadline for detection, can close respective valves if, close vacuum pump, knot
Otherwise beam is deflated to furnace pressure to normal pressure, the step of whether being normal pressure is come back in detection vacuum-pump line, until reaching
To prescribed requirement.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810332647.2A CN108425846B (en) | 2018-04-13 | 2018-04-13 | Device and method for improving utilization rate of zone-melting vacuum pump |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810332647.2A CN108425846B (en) | 2018-04-13 | 2018-04-13 | Device and method for improving utilization rate of zone-melting vacuum pump |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108425846A true CN108425846A (en) | 2018-08-21 |
| CN108425846B CN108425846B (en) | 2023-09-05 |
Family
ID=63160991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810332647.2A Active CN108425846B (en) | 2018-04-13 | 2018-04-13 | Device and method for improving utilization rate of zone-melting vacuum pump |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108425846B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023179648A1 (en) * | 2022-03-23 | 2023-09-28 | 高景太阳能股份有限公司 | Control system and method for energy-saving and continuous maintenance of vacuum pump |
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|---|---|---|---|---|
| JP2003278680A (en) * | 2002-03-26 | 2003-10-02 | Aisin Seiki Co Ltd | Multi-stage vacuum pump device |
| CN202195685U (en) * | 2011-08-25 | 2012-04-18 | 饶平县裕通永磁材料厂 | Rare earth permanent magnet vacuum sintering furnace |
| CN203958676U (en) * | 2014-06-20 | 2014-11-26 | 中磁科技股份有限公司 | A kind of pumped vacuum system of capper |
| CN206783817U (en) * | 2017-04-17 | 2017-12-22 | 西安创联新能源设备有限公司 | A kind of bleeding point pipe-line system of single crystal growing furnace four |
| CN208221094U (en) * | 2018-04-13 | 2018-12-11 | 天津中环领先材料技术有限公司 | A kind of device for improving area and melting vacuum pump utilization rate |
-
2018
- 2018-04-13 CN CN201810332647.2A patent/CN108425846B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003278680A (en) * | 2002-03-26 | 2003-10-02 | Aisin Seiki Co Ltd | Multi-stage vacuum pump device |
| CN202195685U (en) * | 2011-08-25 | 2012-04-18 | 饶平县裕通永磁材料厂 | Rare earth permanent magnet vacuum sintering furnace |
| CN203958676U (en) * | 2014-06-20 | 2014-11-26 | 中磁科技股份有限公司 | A kind of pumped vacuum system of capper |
| CN206783817U (en) * | 2017-04-17 | 2017-12-22 | 西安创联新能源设备有限公司 | A kind of bleeding point pipe-line system of single crystal growing furnace four |
| CN208221094U (en) * | 2018-04-13 | 2018-12-11 | 天津中环领先材料技术有限公司 | A kind of device for improving area and melting vacuum pump utilization rate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023179648A1 (en) * | 2022-03-23 | 2023-09-28 | 高景太阳能股份有限公司 | Control system and method for energy-saving and continuous maintenance of vacuum pump |
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| Publication number | Publication date |
|---|---|
| CN108425846B (en) | 2023-09-05 |
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Effective date of registration: 20240205 Address after: 300384 Tianjin Binhai New Area high tech Zone Huayuan Industrial Area (outside the ring) Hai Tai Road 12 inside. Patentee after: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Country or region after: China Patentee after: Zhonghuan Leading Semiconductor Technology Co.,Ltd. Address before: 300384 Tianjin Binhai New Area high tech Zone Huayuan Industrial Area (outside the ring) Hai Tai Road 12 inside. Patentee before: TIANJIN ZHONGHUAN ADVANCED MATERIAL TECHNOLOGY Co.,Ltd. Country or region before: China |
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