CN108407406B

CN108407406B - Green low-emissivity coated glass capable of being processed later

Info

Publication number: CN108407406B
Application number: CN201810457205.0A
Authority: CN
Inventors: 黄成龙; 邓云军; 李建根; 邓军; 李勇
Original assignee: Sichuan Sg Energy Saving Glass Co ltd; CSG Holding Co Ltd
Current assignee: Sichuan Sg Energy Saving Glass Co ltd; CSG Holding Co Ltd
Priority date: 2018-05-14
Filing date: 2018-05-14
Publication date: 2023-07-25
Anticipated expiration: 2038-05-14
Also published as: CN108407406A

Abstract

The invention discloses a green low-emissivity coated glass capable of being processed later, which comprises the following layers in sequence: the glass substrate, the first layer of priming layer silicon nitride layer, the second layer of barrier layer nichrome layer, the third layer of dielectric layer silicon nitride layer, the fourth layer of adhesion layer zinc oxide layer, the fifth layer of functional layer silver layer, the sixth layer of protective layer nichrome layer and the seventh layer of protective layer silicon nitride layer; the thickness of the fifth functional layer silver layer is 8-12nm; the thickness of the sixth protective layer nichrome layer is 1-4nm; the thickness of the seventh protective layer silicon nitride layer is 45-55nm. The coated glass has the advantages that the appearance is green through setting the thickness of the film layer material and the film layer, the permeation color is closer to the neutral color, the coated glass can be used for processing treatment such as post-tempering, the color change before and after tempering is small, the production is stable and easy to control, the production requirements of different processing factories and different processing equipment can be met, and the commercial application prospect is wide.

Description

Green low-emissivity coated glass capable of being processed later

Technical Field

The invention belongs to the field of environment-friendly energy-saving building materials, and particularly relates to green low-emissivity coated glass capable of being processed later.

Background

The low-emissivity coated glass is prepared by depositing multiple layers of dielectric materials and metal materials on a glass substrate by a physical method or a chemical method so as to achieve the purposes of changing the color appearance of the glass and improving the energy-saving effect of the glass. The excellent energy-saving effect and the diversified decorative effect are widely used in the architectural glass industry.

Among them, green building glass having green appearance effect and more capable of embodying the concept of "green building" is deeply favored by users. In the prior market, the commonly sold green building glass mainly comprises an F green glass raw sheet, an F green glass coated glass and a green-like glass coated glass. The F green glass raw sheet is directly used for the building outer wall, can ensure green decorative effect, but has weak capability of blocking solar heat radiation and poor energy-saving effect; the F green glass coated glass is composite glass obtained by adding a coating process to the F green glass, and the penetration color of the glass is difficult to control, so that the outdoor environment presents a green defect when being reflected to indoor users; the coated glass of the white glass imitating the green glass has been gradually used for the outer wall of the building glass instead of the F green glass original sheet due to the low price, stable process and obvious energy-saving effect, such as the green low-radiation coated glass disclosed in the patents CN201310121759.0 and CN 200920043815.2.

In order to improve the rigidity of the energy-saving low-radiation glass, the energy-saving low-radiation glass is toughened by adopting the following two off-line low-radiation energy-saving glass processing modes at present: firstly cutting and edging a float sheet, and then tempering and coating to prepare the hollow glass. One is to directly coat a film on a float original sheet, and then to process the film by adopting modes of cutting, edging, tempering and the like according to requirements. However, in the existing green coated glass imitated by white glass, most of the green coated glass imitated by white glass cannot realize the first coating and then the later high-temperature tempering treatment due to the structural characteristics of the glass substrate and the coating film layer, and the processing mode of firstly cutting and tempering the glass substrate and then coating the film has the defects of large processing limitation and low processing efficiency; the other green coated glass which can be directly toughened and treated and is prevented from being coated with white glass has the problems that the color of the toughened coated glass is greatly different in color due to the influence of high-temperature treatment and the color change of the processed glass is uncontrollable.

Disclosure of Invention

The invention aims to overcome the defects that the existing green coated glass cannot be subjected to post-tempering treatment and the color difference of the coated glass after tempering is large, and provides the green low-emissivity coated glass which can be subjected to post-tempering treatment, has small color change amplitude before and after tempering, is stable and easy to control in production, can meet the production requirements of different processing factories and different processing equipment, and has a transmission color closer to neutral color.

In order to achieve the above object, the present invention provides the following technical solutions:

the green low-emissivity coated glass capable of being processed sequentially comprises the following glass film layers:

the glass substrate, the first layer of priming layer silicon nitride layer, the second layer of barrier layer nichrome layer, the third layer of dielectric layer silicon nitride layer, the fourth layer of adhesion layer zinc oxide layer, the fifth layer of functional layer silver layer, the sixth layer of protective layer nichrome layer and the seventh layer of protective layer silicon nitride layer;

the thickness of the fifth functional layer silver layer is 8-12nm;

the thickness of the sixth protective layer nichrome layer is 1-4nm;

and the thickness of the seventh protective layer silicon nitride layer is 45-55nm.

In the film layer of the green low-emissivity coated glass which can be processed later, the silicon nitride layer is used as a first layer priming layer, so that the effect of preventing sodium element in the glass body from diffusing and migrating into the film layer and damaging the structure of the functional layer is achieved. The second barrier layer nichrome layer is plated on the surface of the first base layer to further block and resist. The third dielectric layer silicon nitride layer is used as a protective layer of nichrome to protect the nichrome layer from oxidative denaturation in the subsequent sputtering process and high-temperature tempering processing process. And the fourth adhesive layer zinc oxide layer is used for enhancing the adhesive force of the Ag functional layer, so that the Ag functional layer and the dielectric layer are tightly adhered, and the stability of the film layer is enhanced. And the fifth layer of functional layer, the Ag layer can reflect most of heat radiation in solar energy, and the low-radiation energy-saving effect is achieved. The sixth protective layer nickel-chromium alloy layer plays a role in protecting the functional layer silver layer, and meanwhile, the thickness of the glass can be changed, so that the color of the film surface of the coated glass is adjusted to be green, and the transmission color of the coated glass is more approximate to the neutral color. The seventh protective layer silicon nitride layer is used as a surface protective layer, plays a role in isolating oxygen and other substances, protecting the inner film layer from corrosion, improving the chemical corrosion resistance and mechanical friction performance of the film system, and simultaneously playing a role in adjusting the color. The combination of the silver layer thickness of the fifth functional layer of 8-12nm, the nickel-chromium alloy layer thickness of the sixth protective layer of 1-4nm and the silicon nitride layer thickness of the seventh protective layer of 45-55nm has great practical influence on the mechanical stability and optical stability of the whole coated glass, and if the thicknesses of the silicon nitride protective layer and the nickel-chromium alloy protective layer exceed the limit range, the mechanical property of the whole coated glass is weakened, and the requirement of post-processing cannot be met. And the low-radiation energy-saving function of the coated glass can be ensured only by matching with the thickness of the functional layer corresponding to the silver layer of 8-12nm, and the characteristic of small color difference change before and after the processing of the coated glass can be realized by further matching with other film layers.

Further, the green low-emissivity coated glass is prepared by adopting a high-vacuum magnetron sputtering technology.

Further, the glass substrate is a common float glass substrate, preferably a high-quality float glass substrate;

further, the first underlying silicon nitride layer has a thickness between 10nm and 15nm, more preferably 12nm;

further, the thickness of the second barrier nichrome layer is preferably between 7nm and 10nm, more preferably 8nm;

further, the thickness of the third dielectric layer silicon nitride layer is between 8nm and 9nm, and more preferably 9nm;

further, the thickness of the fourth adhesion layer zinc oxide layer is between 4nm and 9nm, more preferably 6nm;

further, the thickness of the fifth functional layer silver layer is preferably between 9nm and 10nm, more preferably 10nm;

further, the thickness of the sixth protective layer nichrome layer is preferably between 2nm and 3nm, more preferably 2nm;

further, the thickness of the seventh protective layer silicon nitride layer is preferably between 50nm and 52nm, more preferably 50nm.

In view of the above technical characteristics, the invention combines the thickness adjustment of the film layers by selecting the low-emissivity glass with specific materials and specific sequence film layers, thereby changing the transmission, absorption and reflection proportions of visible light between the film layers, and enabling the film surface of the coated glass to be green through light effects such as light reflection, diffraction and the like after the visible light is transmitted through the coated glass, and the transmitted color is close to neutral color. And through specific optimization of the material, thickness and sequence of the film layers of the coated glass, the film layer structure of the coated glass is stable, the method can be suitable for processing steps such as post-stage integral tempering and the like, ensures that the coated glass has small color change and stable optical characteristics before and after the processing steps such as post-stage tempering and the like, is flexibly suitable for different processing and production requirements, obviously improves the color consistency of the coated glass before and after processing, and provides more selection space for customers.

Compared with the prior art, the invention has the following advantages:

1. the green low-emissivity coated glass with the specific film structure provided by the invention has the advantages that the appearance of the glass presents green high-texture color, the transmission color of the glass is close to neutral color (a is t= -2.5 and b is t=4.8), and more real visual feeling is provided for users.

2. The green low-emissivity coated glass has high structural stability of a film layer, can be suitable for processing such as later-stage integral tempering and the like, can keep the color change amplitude of the coated glass before and after tempering processing small (delta L is less than or equal to 4; delta a is less than or equal to 0.5; delta b is less than or equal to 1), and has stable optical characteristics;

3. based on the stability of the specific film structure of the green low-emissivity coated glass, the coated glass can meet the production requirements of different processing factories and different processing equipment, the flexibility of the processing preparation process and the processing efficiency of the existing green low-emissivity coated glass are obviously improved, more selection spaces are provided for customers, and the commercial application prospect is wide.

Description of the drawings:

FIG. 1 is a schematic structural view of a green coated glass that can be post-processed.

The marks in the figure: 1-float white glass substrate, 2-first layer priming silicon nitride layer, 3-second barrier layer nichrome layer, 4-third dielectric layer silicon nitride layer, 5-fourth adhesive layer zinc oxide layer, 6-fifth functional layer silver layer, 7-sixth protective layer nichrome layer, 8-seventh protective layer silicon nitride layer.

Detailed Description

The present invention will be described in further detail with reference to test examples and specific embodiments. It should not be construed that the scope of the above subject matter of the present invention is limited to the following embodiments, and all techniques realized based on the present invention are within the scope of the present invention.

Example 1

And (3) plating a silicon nitride film layer with the thickness of 10nm, a nichrome film layer with the thickness of 7nm, a silicon nitride film layer with the thickness of 5nm, a zinc oxide film layer with the thickness of 4nm, a silver film layer with the thickness of 8nm, a nichrome film layer with the thickness of 1nm and a silicon nitride film layer with the thickness of 45nm on a common float glass substrate with the thickness of 5mm from inside to outside by using vacuum off-line magnetron sputtering coating equipment.

Example 2

And (3) plating a silicon nitride film layer with the thickness of 13nm, a nichrome film layer with the thickness of 8.5nm, a silicon nitride film layer with the thickness of 7nm, a zinc oxide film layer with the thickness of 6nm, a silver film layer with the thickness of 10nm, a nichrome film layer with the thickness of 3nm and a silicon nitride film layer with the thickness of 48nm on a common float glass substrate with the thickness of 5mm from inside to outside by utilizing vacuum off-line magnetron sputtering coating equipment.

Example 3

And (3) plating a silicon nitride film layer with the thickness of 12.8nm, a nichrome film layer with the thickness of 9.2nm, a silicon nitride film layer with the thickness of 8nm, a zinc oxide film layer with the thickness of 7.3nm, a silver film layer with the thickness of 11.5nm, a nichrome film layer with the thickness of 2.8nm and a silicon nitride film layer with the thickness of 50nm on a common float glass substrate with the thickness of 5mm from inside to outside by using vacuum off-line magnetron sputtering coating equipment.

Example 4

And (3) plating a silicon nitride film layer with the thickness of 14nm, a nichrome film layer with the thickness of 9nm, a silicon nitride film layer with the thickness of 9.2nm, a zinc oxide film layer with the thickness of 8nm, a silver film layer with the thickness of 12nm, a nichrome film layer with the thickness of 4nm and a silicon nitride film layer with the thickness of 52nm on a common float glass substrate with the thickness of 5mm from inside to outside by using vacuum off-line magnetron sputtering coating equipment.

Example 5

And (3) plating a silicon nitride film layer with the thickness of 15nm, a nichrome film layer with the thickness of 10nm, a silicon nitride film layer with the thickness of 10nm, a zinc oxide film layer with the thickness of 9nm, a silver film layer with the thickness of 12nm, a nichrome film layer with the thickness of 4nm and a silicon nitride film layer with the thickness of 55nm on a common float glass substrate with the thickness of 5mm from inside to outside by using vacuum off-line magnetron sputtering coating equipment.

Comparative example 1

This comparative example is set with respect to example 1, and differs from example 1 in that: and changing the thickness of the film of the third dielectric layer silicon nitride layer into 12nm and changing the thickness of the film of the sixth protective layer nichrome layer into 8nm by utilizing vacuum off-line magnetron sputtering coating equipment. The rest preparation steps are unchanged, so that a single-piece coated glass product is obtained.

Comparative example 2

This comparative example was set up with reference to example 1, which differs from example 1 in that: the nickel-chromium alloy film layer of the sixth protective layer is omitted, and the other characteristics are unchanged, so that a single-piece coated glass product with a composite structure of only six layers of film layers is obtained.

Comparative example 3

This comparative example was set up with reference to example 1, which differs from example 1 in that: changing the first underlying silicon nitride layer into a titanium oxide layer; and the silicon nitride layer of the third dielectric layer is omitted, and the other characteristics are unchanged, so that a single-piece coated glass product with a six-layer film composite structure is obtained.

Comparative example 4

This comparative example was set up with reference to example 1, which differs from example 1 in that: changing the thickness relation between the film layers: the method comprises the following steps: and plating a silicon nitride film layer with the thickness of 20nm, a nichrome film layer with the thickness of 6nm, a silicon nitride film layer with the thickness of 12nm, a zinc oxide film layer with the thickness of 12nm, a silver film layer with the thickness of 12nm, a nichrome film layer with the thickness of 6nm and a silicon nitride film layer with the thickness of 40nm on a common float glass substrate with the thickness of 5mm from inside to outside in sequence, so as to obtain a single-piece coated glass product.

Performance testing

Test example 1:

the single green low emissivity coated glass prepared in the above examples and the single coated glass prepared in comparative examples 1-4 were measured according to GB/T18915.2-2013 for changes in optical performance parameters before and after tempering treatment, and the results are shown in Table 1. Wherein L represents brightness, a represents red-green degree, and b represents yellow-blue degree.

TABLE 1 variation of optical parameters before and after tempering treatment

Test example 2:

the transmission color of the glass product obtained by measuring the single green Low-emissivity coated glass prepared in the embodiment and tempering according to GB/T18915.2-2013 is compared with that of a commercially available 6mm F green glass and a Low-E product plated on the F green glass, and the result is shown in Table 2. In the table, a represents the degree of transmission through red and green, and b represents the degree of transmission through yellow and blue.

TABLE 2 comparison of transmitted color

	T*	a*T	b*T
				Example 1	46.0	-2.5	4.8
Example 2	44	-2.3	4
				Example 3	40	-1.7	5
Example 4	39	-1	5
				Example 5	40	-1.5	5.5
F green glass plating Low-E	40.0	-5.9	3.3
				F green glass	74.7	-8.5	1.3

According to the test results in tables 1 and 2, the green low-emissivity coated glass prepared in the embodiments 1 to 5 of the invention has a stable film structure, can be directly subjected to post-tempering processing, has small difference in color change before and after tempering processing, is stable and easy to control in production, can be flexibly applicable to different processing and different processing equipment production requirements, obviously improves the flexibility of the existing green low-emissivity coated glass processing preparation process and processing efficiency, keeps green appearance color, and meanwhile, has a transmission color closer to neutral color and better visual experience and reality.

Claims

1. The green low-emissivity coated glass capable of being processed later is characterized in that the glass film layer structure is as follows:

the thickness of the first underlying silicon nitride layer is between 10nm and 15 nm;

the thickness of the second barrier layer nichrome layer is 7nm to 10nm;

the thickness of the third dielectric layer silicon nitride layer is between 5nm and 10nm;

the thickness of the fourth adhesion layer zinc oxide layer is between 4nm and 9nm;

the thickness of the fifth functional layer silver layer is 8-12nm;

the thickness of the sixth protective layer nichrome layer is 1-4nm;

2. The green low emissivity coated glass of claim 1, wherein said green low emissivity coated glass is produced by a high vacuum magnetron sputtering technique.

3. The post-processing green low emissivity coated glass of claim 1, wherein said glass substrate is a float white glass substrate.

4. The green, low emissivity coated glass of claim 1, wherein said second barrier nichrome layer has a thickness of 8nm.

5. The green low emissivity coated glass of claim 1, wherein said third dielectric layer has a silicon nitride layer thickness of 9nm.

6. The green, low emissivity coated glass of claim 1, wherein said fourth adhesion layer has a zinc oxide layer thickness of 6nm.

7. The green, low emissivity coated glass of claim 1, wherein said fifth functional layer silver layer has a thickness of between 9nm and 10 nm.

8. The green, low emissivity coated glass of claim 1, wherein said sixth protective layer nichrome layer has a thickness between 2nm and 3 nm.

9. The green, low emissivity coated glass of claim 1, wherein said seventh protective layer silicon nitride layer has a thickness of between 50nm and 52 nm.