CN208182858U - A kind of high silicon substrate can temperable di-silver low-emissivity coated glass - Google Patents
A kind of high silicon substrate can temperable di-silver low-emissivity coated glass Download PDFInfo
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- CN208182858U CN208182858U CN201820515868.9U CN201820515868U CN208182858U CN 208182858 U CN208182858 U CN 208182858U CN 201820515868 U CN201820515868 U CN 201820515868U CN 208182858 U CN208182858 U CN 208182858U
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Abstract
The utility model discloses a kind of high silicon substrate can temperable di-silver low-emissivity coated glass, including substrate of glass, substrate of glass top surface is sequentially laminated with the first silicon nitride layer, the first nicr layer, the first silver layer, the first zinc oxide film, the second silicon nitride layer, the second nicr layer, the second silver layer, the second zinc oxide film and third silicon nitride layer from the bottom to top；First silicon nitride layer with a thickness of 35~45nm, the first nicr layer with a thickness of 1~2nm, the first silver layer with a thickness of 5~8nm, the first zinc oxide film with a thickness of 5~20nm, the second silicon nitride layer with a thickness of 65~90nm, the second nicr layer with a thickness of 0.5~1nm, the second silver layer with a thickness of 8~10nm, the second zinc oxide film with a thickness of 5~20nm, third silicon nitride layer with a thickness of 40~60nm；Reasonably combined each thicknesses of layers, each performance parameter in tempering front and back are stablized, and transmitance is high, and film layer structure is stablized；The utility model need to can only be prepared using conventional target using magnetron sputtering technique, at low cost, technical process is controllable, stability is high.
Description
Technical field
The utility model relates to functional glass technical field, specifically a kind of high silicon substrate can the double silver low-emissivity coateds of tempering
Glass.
Background technique
As the high speed of world economy issues additional exhibition, it is previous for building, the white glass in the fields such as automobile is gradually by plated film glass
Replaced glass.Low radiation coated glass has many advantages, such as compared with high visible transmission ratio, energy-saving, beautiful, do not influencing it is normal
While daylighting, energy consumption brought by indoor refrigeration, heating is considerably reduced, thus is widely used.
Double-silver low-emissivity coated glass in its film layer structure there are more than two layers of silver medal and film layer number etc. due to, lead to film
System is whole to be difficult to control, and majority shows as that product transmitance is relatively low, the problems such as color difference, product uniformity is poor easily occurs after steel,
Middle high product thoroughly is particularly evident.
Utility model content
The purpose of this utility model is to provide a kind of high silicon substrate can temperable di-silver low-emissivity coated glass, the glass-film
Architecture is reasonable, and each performance parameter is stablized before and after tempering, and transmitance is high, and film layer structure is stablized.
The technical scheme adopted by the utility model to solve the technical problem is as follows:
A kind of high silicon substrate can temperable di-silver low-emissivity coated glass, including substrate of glass, substrate of glass top surface by down toward
On be sequentially laminated with the first silicon nitride layer, the first nicr layer, the first silver layer, the first zinc oxide film, the second silicon nitride layer, the second nickel
Layers of chrome, the second silver layer, the second zinc oxide film and third silicon nitride layer；
First silicon nitride layer with a thickness of 35~45nm, the first nicr layer with a thickness of 1~2nm, the first silver layer
With a thickness of 5~8nm, the first zinc oxide film with a thickness of 5~20nm, the second silicon nitride layer with a thickness of 65~90nm, the second nickel
Layers of chrome with a thickness of 0.5~1nm, the second silver layer with a thickness of 8~10nm, the second zinc oxide film with a thickness of 5~20nm, third
Silicon nitride layer with a thickness of 40~60nm.
The utility model has the beneficial effects that using substrate of glass/have the first silicon nitride layer/first nicr layer/first silver medal
Layer/the first zinc oxide film/the second silicon nitride layer/the second nicr layer/the second silver layer/second zinc oxide film/third silicon nitride layer
Compound film system structure, the first silicon nitride layer, the second silicon nitride layer and third silicon nitride layer are as dielectric layer, the first nicr layer and
Two nicr layers are as protective layer, and reasonably combined each thicknesses of layers, and film structure is reasonable, and each performance parameter is stablized before and after tempering,
Transmitance is high, and film layer structure is stablized；The utility model need to can only be prepared using conventional target using magnetron sputtering technique, at
This is low, technical process is controllable, stability is high.
Detailed description of the invention
The present invention will be further described with reference to the accompanying drawings and examples:
Fig. 1 is the structural schematic diagram of the utility model.
Specific embodiment
Embodiment one
As shown in Figure 1, the utility model provide a kind of high silicon substrate can temperable di-silver low-emissivity coated glass, including glass
Substrate 11,11 top surface of substrate of glass are sequentially laminated with the first silicon nitride layer 21, the first nicr layer 22, the first silver layer from the bottom to top
23, the first zinc oxide film 24, the second silicon nitride layer 25, the second nicr layer 31, the second silver layer 32, the second zinc oxide film 33 and third
Silicon nitride layer 34；
The thickness with a thickness of 1nm, the first silver layer 23 with a thickness of 45nm, the first nicr layer 22 of first silicon nitride layer 21
Degree is the thickness with a thickness of 75nm, the second nicr layer 31 with a thickness of 5nm, the second silicon nitride layer 25 of 5nm, the first zinc oxide film 24
Degree be 1nm, the second silver layer 32 with a thickness of 10nm, the second zinc oxide film 33 with a thickness of 5nm, the thickness of third silicon nitride layer 34
For 40nm.
Magnetron sputtering technique can be used in each film layer, is passed through working gas and reaction gas successively sputter, more excellent in order to obtain
The product of matter, current form provide parameter when magnetron sputtering, are shown in Table 1.
Table 1
Optical detection is carried out to the product that the present embodiment obtains, the results are shown in Table 2.
Table 2
Embodiment two
As shown in Figure 1, the utility model provide a kind of high silicon substrate can temperable di-silver low-emissivity coated glass, including glass
Substrate 11,11 top surface of substrate of glass are sequentially laminated with the first silicon nitride layer 21, the first nicr layer 22, the first silver layer from the bottom to top
23, the first zinc oxide film 24, the second silicon nitride layer 25, the second nicr layer 31, the second silver layer 32, the second zinc oxide film 33 and third
Silicon nitride layer 34；
The thickness with a thickness of 1nm, the first silver layer 23 with a thickness of 35nm, the first nicr layer 22 of first silicon nitride layer 21
Degree is 8nm, the first zinc oxide film 24 with a thickness of 20nm, the second silicon nitride layer 25 with a thickness of 65nm, second nicr layer 31
With a thickness of 0.5nm, the second silver layer 32 with a thickness of 8nm, second zinc oxide film 33 with a thickness of 20nm, third silicon nitride layer 34
With a thickness of 60nm.
Magnetron sputtering technique can be used in each film layer, is passed through working gas and reaction gas successively sputter, more excellent in order to obtain
The product of matter, current form provide parameter when magnetron sputtering, are shown in Table 3.
Table 3
Optical detection is carried out to the product that the present embodiment obtains, the results are shown in Table 4.
Table 4
Embodiment three
As shown in Figure 1, the utility model provide a kind of high silicon substrate can temperable di-silver low-emissivity coated glass, including glass
Substrate 11,11 top surface of substrate of glass are sequentially laminated with the first silicon nitride layer 21, the first nicr layer 22, the first silver layer from the bottom to top
23, the first zinc oxide film 24, the second silicon nitride layer 25, the second nicr layer 31, the second silver layer 32, the second zinc oxide film 33 and third
Silicon nitride layer 34；
The thickness with a thickness of 2nm, the first silver layer 23 with a thickness of 40nm, the first nicr layer 22 of first silicon nitride layer 21
Degree is 6nm, the first zinc oxide film 24 with a thickness of 15nm, the second silicon nitride layer 25 with a thickness of 90nm, second nicr layer 31
With a thickness of 0.5nm, the second silver layer 32 with a thickness of 9nm, second zinc oxide film 33 with a thickness of 10nm, third silicon nitride layer 34
With a thickness of 50nm.
Magnetron sputtering technique can be used in each film layer, is passed through working gas and reaction gas successively sputter, more excellent in order to obtain
The product of matter, current form provide parameter when magnetron sputtering, are shown in Table 5.
Table 5
Optical detection is carried out to the product that the present embodiment obtains, the results are shown in Table 6.
Table 6
The above descriptions are merely preferred embodiments of the present invention, not makees in any form to the utility model
Limitation；Anyone skilled in the art, it is all available in the case where not departing from technical solutions of the utility model ambit
The methods and technical content of the disclosure above makes many possible changes and modifications to technical solutions of the utility model, or is revised as
The equivalent embodiment of equivalent variations.Therefore, all contents without departing from technical solutions of the utility model, according to the utility model
Technical spirit any simple modification, equivalent replacement, equivalence changes and modification made to the above embodiment are still fallen within practical
In the range of the protection of new technique scheme.
Claims (1)
1. a kind of high silicon substrate can temperable di-silver low-emissivity coated glass, which is characterized in that including substrate of glass, substrate of glass top
Face is sequentially laminated with the first silicon nitride layer, the first nicr layer, the first silver layer, the first zinc oxide film, the second silicon nitride from the bottom to top
Layer, the second nicr layer, the second silver layer, the second zinc oxide film and third silicon nitride layer；
First silicon nitride layer with a thickness of 35~45nm, the first nicr layer with a thickness of 1~2nm, the thickness of the first silver layer
For 5~8nm, the first zinc oxide film with a thickness of 5~20nm, the second silicon nitride layer with a thickness of 65~90nm, the second nicr layer
With a thickness of 0.5~1nm, the second silver layer with a thickness of 8~10nm, the second zinc oxide film with a thickness of 5~20nm, third nitrogenize
Silicon layer with a thickness of 40~60nm.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820515868.9U CN208182858U (en) | 2018-04-12 | 2018-04-12 | A kind of high silicon substrate can temperable di-silver low-emissivity coated glass |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201820515868.9U CN208182858U (en) | 2018-04-12 | 2018-04-12 | A kind of high silicon substrate can temperable di-silver low-emissivity coated glass |
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| CN208182858U true CN208182858U (en) | 2018-12-04 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111908804A (en) * | 2020-08-19 | 2020-11-10 | 中建材光电装备（太仓）有限公司 | High-transmittance tempered double-silver low-emissivity coated glass |
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2018
- 2018-04-12 CN CN201820515868.9U patent/CN208182858U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111908804A (en) * | 2020-08-19 | 2020-11-10 | 中建材光电装备（太仓）有限公司 | High-transmittance tempered double-silver low-emissivity coated glass |
| CN111908804B (en) * | 2020-08-19 | 2023-06-30 | 中建材光电装备（太仓）有限公司 | High-permeability steel double-silver low-emissivity coated glass |
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