CN108303860A - A kind of distributed exposure method for maskless lithography scanning - Google Patents
A kind of distributed exposure method for maskless lithography scanning Download PDFInfo
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- CN108303860A CN108303860A CN201810253685.9A CN201810253685A CN108303860A CN 108303860 A CN108303860 A CN 108303860A CN 201810253685 A CN201810253685 A CN 201810253685A CN 108303860 A CN108303860 A CN 108303860A
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- dmd
- exposure
- picture
- bmp
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
A kind of distributed exposure method for maskless lithography scanning, the exposure-processed speed for effectively improving substrate in wiring board photoetching.Specifically include following steps：1, BMP bitmaps are read at the ends PC, and the picture read is sent to digital micro-mirror DMD control devices；2, according to DMD number of digital micro-mirror and distribution situation, BMP bitmaps are carried out to fill up processing；3, the key point Picture Coordinate information that each DMD exposures pause is calculated, and is stored to container；4, the data information after calculating is sent to DMD control terminals；5, digital micro-mirror DMD movements are controlled according to exposure pause point position and realizes large area exposure.The present invention can increase substantially the exposure rate of large-area graphs exposure using " stamping-type " distribution exposure, carry out picture transfer using HDMI, reduce the requirement to projection device memory, save cost, while exposure time is easier to control.
Description
Technical field
The invention belongs to printed wiring board (PCB) industry maskless photoetching technology fields, and in particular to one kind is covered for nothing
The distributed exposure method of mould photoetching scanning.
Background technology
Maskless lithography technology need not make mask, be next-generation flat so can reduce cost and shorten the time for exposure
The main direction of development of row light exposure sources will have the tendency that gradually replacing mask exposure.But current main problem be how
In terms of improving exposure efficiency and image procossing.
Traditional maskless lithography uses DLP4500 or the higher hardware device of performance, therefore itself onboard memory
Be sufficiently used for storing picture to be exposed, since DLP costs itself are higher, although memory on board for exposure provide it is feasible
Property, but extra cost is excessively high.And HDMI interface is used to carry out image transmitting, by by separate hardware control terminal, realizing more
DMD distributions are exposed, and can be very good to get around indispensable memory storage, while increasing substantially exposure efficiency.
By the hardware device of auxiliary, the DMD of distribution can be made to have autonomous control ability, in the string for receiving the ends PC
After mouth instruction, according to specified exposure key point coordinates, the entire exposure process of orderly completion, to the completion of high efficiency, low cost
A series of exposure actions.
Invention content
The purpose of the present invention is to propose to a kind of distributed exposure methods for maskless lithography scanning, are covered to improve nothing
The efficiency of film photoetching scanning carries out pretreatment filling processing according to picture to be exposed, and then is distributed to each DMD and is distributed
Formula exposure-processed, to increase substantially the exposure efficiency of wiring board photolithographic substrate.
To achieve the goals above, the technical solution adopted by the present invention is：
A kind of distributed exposure method for maskless lithography scanning includes the following steps：
Step 1 reads BMP bitmaps, and is sent to DMD control devices by picture to be exposed is read；The BMP bitmaps
It refer to the bitmap of BMP formats that the Gerber files of the description circuit information in being made a plate by PCB are converted into；
Step 2 is grouped number and distribution situation according to DMD, carries out filling up pretreatment to BMP bitmaps, picture pretreatment is
Refer to according to exposed feature, using image processing techniques by the integral multiple that picture to be exposed pretreatment is projected image, fills up region
It is filled using the black for not influencing exposure effect, processing mode is as follows：
1) it determines that DMD is distributed as m*n groups, then BMP bitmaps is carried out to fill up pretreatment, it is assumed that projection image size width is
W, the wide W of high h, BMP bitmap size, high H then need to ensure the integral multiple that treated W/w, H/h is respectively m, n；
2) picture is filled up processing and need to be filled up using black, and black region is without exposure, to ensure not influence entirety
Exposure effect；
Step 3, according to treated in step 2 dimension of picture, calculate the key point Picture Coordinate that each DMD exposures pause
Information, and store into m × n container and be used as data information to be sent, with the movement locus for controlling each DMD later；
Step 4, by the data information after being calculated in step 3, be sent to each DMD control devices by 485 buses, it is convenient
The control of reading to exposure image specific region and the tracks DMD below；
DMD control devices receive data information and control instruction in step 5, analyzing step 4, are paused according to exposure crucial
Dot position information and DMD projected area sizes to determine the current region for needing to read BMP bitmaps, and pass through HDMI interface
The picture is sent to DMD, to realize large area exposure.
The key point is codetermined by the group number and Exposure mode of DMD, and every group of DMD includes a DMD, DMD distributions
The mode for determining DMD exposures, to determine each DMD by the starting coordinate position of exposure image.
Every group of DMD is controlled by independent equipment end, is read respectively by multiple and different DMD and is respectively specified region
Picture, and DMD is sent to realize distributed exposure.
The control device may be used common Intelligent hardware board, band HDMI interface, such as Raspberry Pi, mainly
It is responsible for completing the reading of picture region to be exposed and transmission and the mobile control of digital micro-mirror DMD.
The beneficial effects of the invention are as follows：
The present invention realizes wiring board exposure-processed using DMD digital micro-mirrors, by controlling DMD by separate hardware,
Realize distributed exposure-processed.It is pre-processed before exposure by treating exposure image so that treated, and picture is thrown for DMD
The integral multiple of shadow size, then the exposure coordinates key point in container is read by auxiliary hardware devices reading order, it is sequentially completed
The exposure of entire PCB line maps, the exposure of large area picture is completed eventually by multiple DMD.Independent hardware device control, can
So that the control of exposure time is more convenient, while distribution DMD exposures can effectively improve the exposure efficiency of picture, adopt
The transmission that picture is realized with HDMI interface, reduces requirement of the system to hardware memory.
Description of the drawings
Fig. 1 is the flow chart of the present invention.
Fig. 2 is the connection diagram of host computer of the present invention and ancillary equipment and DMD.
Fig. 3 is that BMP bitmaps of the present invention pre-process schematic diagram.
Fig. 4 is that " stamping-type " of the multigroup DMD of the present invention exposes track schematic diagram.
Specific implementation mode
The present invention is further discussed below below in conjunction with attached drawing.
As shown in Fig. 2, host computer 1 is connect with DMD control devices 4 and DMD 5, BMP bitmaps are read, and will read and wait for
The picture of exposure is sent to DMD control devices.Wherein position 2 is effective substrate to be exposed, and position 3 is current exposure part.
As shown in figure 3, according to DMD groups number and distribution situation, BMP bitmaps are carried out to fill up pretreatment, position 6 is original
BMP bitmaps, position 7,8 dash areas are the region filled up after pre-processing.Assuming that original graph size is 15084*14204px, throw
Shadow area is 1920*1080px, in order to which ensure that treated W/w, H/h is respectively the integral multiple of m, n.Therefore it needs in picture X
Axis direction fills up 276 px, and Y direction fills up 916 px.
BMP bitmaps W is 15360px, H 14204px after having handled, therefore each DMD will handle 7*4 exposure area.
Exposure track (illustrates that conveniently, each regions to be exposed DMD are illustrated using 3*3) to draw herein as shown in Figure 4,4 regions point
Not Dui Ying 4 DMD, by taking the DMD of the upper left corner as an example, each pause point coordinates that exposes according to each DMD projected areas, can calculate for
(0,0), (1080,0), (2160,0), (3240,0), (3240,1920) ... are interior successively to push away, respectively by the key of every group of DMD
In point coordinates storage to container and it is sent to each DMD control devices.
DMD control devices end is connected to DMD by HDMI, is exposed successively according to the coordinate and related command that are resolved to
Light.Dotted rectangle is each exposed portion, and a region 1920*1080 for reading BMP bitmaps every time is transferred to by HDMI
DMD is exposed.The fixed time for exposure every time after the completion of exposure, closes DMD, wait for DMD camera lenses be moved to next region again into
Row exposure.
The method according to the invention is exposed according to m*n DMD, and BMP bitmaps complete entire exposure base exposure effect
Rate can at least improve m*n-1 times compared to single DMD, and exposure time shorten to 1/ (m*n) of single DMD exposures.Additionally due to institute
There is picture transfer to be all made of HMDI interfaces, compare conventional method, will successively be exposed after the picture storage to memory to be exposed per frame, this
Invention is almost not necessarily to picture be pre-stored early period, to more reduce the demand to Installed System Memory.
Claims (4)
1. a kind of distributed exposure method for maskless lithography scanning, which is characterized in that include the following steps：
Step 1 reads BMP bitmaps, and is sent to DMD control devices by picture to be exposed is read；The BMP bitmaps refer to
The bitmap for the BMP formats that the Gerber files of description circuit information in being made a plate by PCB are converted into；
Step 2 is grouped number and distribution situation according to DMD, carries out filling up pretreatment to BMP bitmaps, picture pretreatment refers to root
According to exposed feature region use is filled up using image processing techniques by the integral multiple that picture to be exposed pretreatment is projected image
The black for not influencing exposure effect is filled, and processing mode is as follows：
1) it determines that DMD is distributed as m*n groups, then BMP bitmaps is carried out to fill up pretreatment, it is assumed that projection image size width is w, height
The wide W of h, BMP bitmap size, high H then need to ensure the integral multiple that treated W/w, H/h is respectively m, n；
2) picture is filled up processing and need to be filled up using black, and black region is without exposure, to ensure not influence overall exposing
Effect；
Step 3, according to treated in step 2 dimension of picture, calculate the key point Picture Coordinate letter that each DMD exposures pause
Breath, and store into m × n container and be used as data information to be sent, with the movement locus for controlling each DMD later；
Step 4, by step 3 calculate after data information, be sent to each DMD control devices by 485 buses, facilitate below
The control of reading and the tracks DMD to exposure image specific region；
DMD control devices receive data information and control instruction in step 5, analyzing step 4, according to exposure pause key point
Confidence ceases and DMD projected area sizes, to determine the current region for needing to read BMP bitmaps, and should by HDMI interface
Picture is sent to DMD, to realize large area exposure.
2. a kind of large area exposure method scanning photoetching for no mask according to claim 1, which is characterized in that institute
Stating key point is codetermined by the group number and Exposure mode of DMD, and every group of DMD includes a DMD, and DMD distributions determine DMD exposures
Mode, to determine each DMD by the starting coordinate position of exposure image.
3. a kind of distributed exposure method for maskless lithography scanning according to claim 1, which is characterized in that institute
It states every group of DMD to be controlled by independent equipment end, reads the picture in respectively specified region respectively by multiple and different DMD, concurrently
It send to DMD to realize distributed exposure.
4. a kind of distributed exposure method for maskless lithography scanning according to claim 1, which is characterized in that institute
Common Intelligent hardware board may be used in the control device stated, and band HDMI interface is mainly responsible for completion and waits for such as Raspberry Pi
The reading and transmission in exposure image region and the mobile control of digital micro-mirror DMD.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810253685.9A CN108303860B (en) | 2018-03-26 | 2018-03-26 | A kind of distributed exposure method for maskless lithography scanning |
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| CN201810253685.9A CN108303860B (en) | 2018-03-26 | 2018-03-26 | A kind of distributed exposure method for maskless lithography scanning |
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| CN108303860A true CN108303860A (en) | 2018-07-20 |
| CN108303860B CN108303860B (en) | 2019-11-08 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113064330A (en) * | 2021-03-31 | 2021-07-02 | 赫智科技(苏州)有限公司 | Digital mask process based on maskless photoetching machine |
| CN113809509A (en) * | 2020-06-11 | 2021-12-17 | 华为技术有限公司 | Antenna forming method, cover plate assembly and terminal equipment |
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| CN106023069A (en) * | 2016-05-31 | 2016-10-12 | 西安嵌牛电子科技有限公司 | Multi-DMD exposure method based on video streams |
| CN106647189A (en) * | 2017-02-24 | 2017-05-10 | 西安电子科技大学 | Large-area exposure method for maskless scanning photoetching |
| WO2017152090A2 (en) * | 2016-03-04 | 2017-09-08 | Shire Human Genetic Therapies, Inc. | Recombinant follistatin-fc fusion proteins and use in treating duchenne muscular dystrophy |
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| AU2007241621A1 (en) * | 2006-04-20 | 2007-11-01 | Academisch Ziekenhuis Leiden | Therapeutic intervention in a genetic disease in an individual by modifying expression of an aberrantly or abnormally expressed gene |
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| CN113809509A (en) * | 2020-06-11 | 2021-12-17 | 华为技术有限公司 | Antenna forming method, cover plate assembly and terminal equipment |
| CN113064330A (en) * | 2021-03-31 | 2021-07-02 | 赫智科技(苏州)有限公司 | Digital mask process based on maskless photoetching machine |
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| CN108303860B (en) | 2019-11-08 |
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