CN108302007A - Low-temperature ion pumps - Google Patents
Low-temperature ion pumps Download PDFInfo
- Publication number
- CN108302007A CN108302007A CN201711418076.6A CN201711418076A CN108302007A CN 108302007 A CN108302007 A CN 108302007A CN 201711418076 A CN201711418076 A CN 201711418076A CN 108302007 A CN108302007 A CN 108302007A
- Authority
- CN
- China
- Prior art keywords
- low
- shell
- cathode plate
- plate
- temperature ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/02—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by absorption or adsorption
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
The invention discloses a kind of low-temperature ion pumps, which is characterized in that including：Shell, top are equipped with the opening of sucking gas；Magnet is installed on surface at left and right sides of the shell；G M refrigeration machines comprising the expanding machine and compressor of fission connection, the housing bottom are installed on the expanding machine；Cooling bench connects the expanding machine, and the through-hole being equipped with by the housing bottom stretches into the shell；Heat transfer plate, thermal connection are installed on the cooling bench upper surface；Cathode plate, thermal connection are installed on the heat transfer plate；And anode canister, it is insulated in any way to be installed in the shell, and between the cathode plate.Low-temperature ion pump provided by the invention can reliably freeze to cathode plate, significantly increase the exhaust capacity to hydrogen and part rare gas.
Description
Technical field
The invention belongs to low-temperature refrigeration technology fields, and in particular to a kind of low-temperature ion pump.
Background technology
Sputter ion pump is also known as penning pump, is to carry out degasification using Penning discharge.Sputter ion pump is relatively good at present
Vaccum-pumping equipment, basic principle be using cathodic discharge generate gas molecule ion, ionic bombardment cathode and by cathode
Capture, while also generating sputtering effect, have complete oil-free, operating pressure range wide, unmanned operating, work it is quiet, it is energy saving with
And installation direction it is free the advantages that.Ionic pump is made of strong magnet, cellular anode, titanium (Ti) cathode.
As shown in Figure 1, in the existing ionic pump electric discharge course of work, ionized gas molecule is finally splashed after electric field acceleration
It penetrates the freezing Tifilm reaction of generation or buries and removed.However, when excluding a large amount of hydrogen (H2) when, it is easy to occur high
Warm H2The saturated phenomenon of initiation is precipitated again.Correlative study the result shows that, Ti cathode and sputtering generate freezing Tifilm be such as in
Low-temperature condition will significantly increase the exhaust capacity to hydrogen and part rare gas.
Invention content
Problem makes improvements the present invention in view of the prior art, i.e., the technical problems to be solved by the invention are to provide a kind of low
Warm ionic pump has the refrigerating function to ionic pump cathode.
Technical solution provided by the invention is：A kind of low-temperature ion pump, which is characterized in that including：Shell, top are equipped with
Suck the opening of gas；Magnet is installed on surface at left and right sides of the shell；G-M refrigeration machines comprising the expansion of fission connection
Machine and compressor, the housing bottom are installed on the expanding machine；Cooling bench connects the expanding machine, passes through the shell
The through-hole that bottom is equipped with stretches into the shell；Heat transfer plate, thermal connection are installed on the cooling bench upper surface；
Cathode plate, thermal connection are installed on the heat transfer plate；And anode canister, in any way it is insulated be installed on it is described
In shell, and between the cathode plate.
Further, the cathode plate is a surface plate being opposed on the heat transfer plate.
Further, the insulated lower section for being lifted on the case top of the anode canister.
Further, the anode canister is insulated is installed on the heat transfer plate.
Further, the cathode plate temperature substantially 200K under working condition.
Further, cathode plate earthing under working condition, applies the high pressure of thousands of volts between anode canister and cathode plate.
Under low-temperature ion pump work state using the above structure, pass through the tight of heat transfer plate and cooling bench structure and cathode plate
Close connection, the refrigerating capacity provided using G-M refrigeration machines maintains the low temperature of 200K or so when cathode plate is worked, to maintain
The ability of the exclusion hydrogen of stability and high efficiency.
Description of the drawings
Fig. 1 is low-temperature ion pump schematic diagram.
Fig. 2 is the schematic diagram of low-temperature ion pump provided by the invention.
Specific implementation mode
It is described below for disclosing the present invention so that those skilled in the art can realize the present invention.It is excellent in being described below
Embodiment is selected to be only used as illustrating, it may occur to persons skilled in the art that other obvious modifications.
In order to describe conveniently, so-called direction term is consistent with the direction of attached drawing itself in text.The direction term used is
For illustrating, not it is used for limiting this creation.For example, this low-temperature ion pump can also be installed on and be evacuated opening downly
On cavity.
As shown in Fig. 2, low-temperature ion pump provided by the invention comprising shell 1, a pair of magnets 2, cathode plate 3, G-M are mono-
Grade refrigeration machine, heat transfer plate 4 and anode canister 6.
1 top of shell is equipped with the opening for sucking gas.Shell is equipped with magnet 2, cathode plate 3 on 1 or so opposite flanks
It is respectively positioned in shell 1 with anode canister 6.Cathode plate 3 generally selects titanium or titanium alloy material, 6 multiselect stainless steel of anode canister and
It is stacked between cathode plate 3 cellular.The slab construction that cathode plate 3 is left and right settings, is mutually parallel.Magnet 2, cathode plate 3 and sun
The location arrangements relationship of pole 6 threes of cylinder, belongs to techniques well known, I will not elaborate.
G-M single stages include the helium compressor (not shown) being provided separately, expanding machine 7, cooling bench 5.It is swollen
Swollen machine 7 passes through its helium interface 7a connection helium compressors.1 bottom of shell is installed in 7 rack of expanding machine, and 1 bottom of shell is set
There is the through-hole stretched into for the cooling bench 5.Expanding machine 7 be equipped with it is upward, stretch into it is shell 1 inside, have it is cooling warm
The cooling bench 5 of degree.Heat transfer plate 4 is installed on 5 uper side surface of cooling bench, and is thermally connected with cooling bench 5.Cathode plate 3 is installed on heat transfer
On plate 4, and it is thermally connected with heat transfer plate 4.In addition, between anode canister 6 can be installed on cathode plate 3 with all multimodes, hung Ru insulated
Loaded on being supported on heat-insulating shield 4 on shell or by insulating support.By the cold quantity transmission of G-MG refrigeration machines, cooling bench 5
Cold passes sequentially through heat transfer plate 4 and reaches on cathode plate 3 so that it maintains the low temperature of 200K or so.
When the low-temperature ion pump work of above structure, under low air pressure condition, added when between cathode plate 3 and anode canister 6
When high pressure, cause field emission.Electronics is for the helical movement under electric field, magnetic fields.Electronics generates just with gas molecule collision
Ion and secondary electron, cause avalanche effect.Positive ion bombardment Ti cathode, splatter go out titanium atom and fall on anode canister, are formed new
Fresh titanium film, also some fall in cloudy plate external zones.Active gases reacts to form compound with freezing Tifilm, is chemisorbed on anode canister
Inner wall；Inert gas is ionized, and ion is discharged under electric field action during bombarding cathode.For hydrogen, since its quality is small,
The sputtering yield that hydrogen ion bombards titanium plate is very low, hydrogen ion H2+ or H+ get in titanium plate with electronics is compound becomes H atom, then
It diffuses into the lattice of titanium, forms TiH solid solution and be discharged.H in this solid solution under room temperature2A concentration of 0.05%, work as temperature
When degree is higher than 250 DEG C or more, just start to decompose to give off hydrogen again.Pass through the close of heat transfer plate 4 and 5 structure of cooling bench and cathode plate 3
Connection, the refrigerating capacity provided using G-M single stages maintains the low temperature of 200K or so when cathode plate is worked, to tie up
It keeps steady and efficiently excludes the ability of hydrogen surely.
The technology contents of the not detailed description of the present invention are known technology.
The basic principles, main features and advantages of the present invention have been shown and described above.The technology of the industry
Personnel are it should be appreciated that the present invention is not limited to the above embodiments, and what is described in the above embodiment and the description is only the present invention
Principle, various changes and improvements may be made to the invention without departing from the spirit and scope of the present invention, these variation and
Improvement is both fallen in the range of claimed invention.Protection scope of the present invention is by appended claims and its is equal
Object defines.
Claims (6)
1. a kind of low-temperature ion pump, which is characterized in that including：
Shell, top are equipped with the opening of sucking gas；
Magnet is installed on surface at left and right sides of the shell；
G-M refrigeration machines comprising the expanding machine and compressor of fission connection, the housing bottom are installed on the expanding machine；
Cooling bench connects the expanding machine, and the through-hole being equipped with by the housing bottom stretches into the shell；
Heat transfer plate, thermal connection are installed on the cooling bench upper surface；
Cathode plate, thermal connection are installed on the heat transfer plate；And
Anode canister, it is insulated in any way to be installed in the shell, and between the cathode plate.
2. low-temperature ion pump according to claim 1, which is characterized in that the cathode plate is opposed to the heat transfer plate for one
On surface plate.
3. being pumped according to any one of claim 1 to 2 low-temperature ion, which is characterized in that the insulated lifting of anode canister
In the lower section of the case top.
4. being pumped according to any one of claim 1 to 2 low-temperature ion, which is characterized in that the insulated installation of anode canister
In on the heat transfer plate.
5. being pumped according to any one of claim 1 to 2 low-temperature ion, which is characterized in that the cathode plate under working condition
Temperature substantially 200K.
6. being pumped according to any one of claim 1 to 2 low-temperature ion, which is characterized in that cathode plate earthing under working condition,
Apply the high pressure of thousands of volts between anode canister and cathode plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711418076.6A CN108302007A (en) | 2017-12-24 | 2017-12-24 | Low-temperature ion pumps |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711418076.6A CN108302007A (en) | 2017-12-24 | 2017-12-24 | Low-temperature ion pumps |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108302007A true CN108302007A (en) | 2018-07-20 |
Family
ID=62871029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711418076.6A Pending CN108302007A (en) | 2017-12-24 | 2017-12-24 | Low-temperature ion pumps |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108302007A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109860011A (en) * | 2018-12-06 | 2019-06-07 | 姚智伟 | The X-ray tube of integrated ionic pump |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5221190A (en) * | 1991-04-02 | 1993-06-22 | Leybold Aktiengesellschaft | Ion sputtering pump with getter module |
| CN1153832A (en) * | 1996-01-05 | 1997-07-09 | 日本真空技术株式会社 | Sputter-ion pump |
| US20070286738A1 (en) * | 2006-06-12 | 2007-12-13 | Varian, Inc. | Vacuum ion-getter pump with cryogenically cooled cathode |
| CN106766322A (en) * | 2016-12-16 | 2017-05-31 | 浙江大学 | The G M refrigeration machines and method of a kind of cool end heat exchanger motion |
-
2017
- 2017-12-24 CN CN201711418076.6A patent/CN108302007A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5221190A (en) * | 1991-04-02 | 1993-06-22 | Leybold Aktiengesellschaft | Ion sputtering pump with getter module |
| CN1153832A (en) * | 1996-01-05 | 1997-07-09 | 日本真空技术株式会社 | Sputter-ion pump |
| US20070286738A1 (en) * | 2006-06-12 | 2007-12-13 | Varian, Inc. | Vacuum ion-getter pump with cryogenically cooled cathode |
| CN106766322A (en) * | 2016-12-16 | 2017-05-31 | 浙江大学 | The G M refrigeration machines and method of a kind of cool end heat exchanger motion |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109860011A (en) * | 2018-12-06 | 2019-06-07 | 姚智伟 | The X-ray tube of integrated ionic pump |
| CN109860011B (en) * | 2018-12-06 | 2020-11-06 | 姚智伟 | X-ray tube integrated with ion pump |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103742386B (en) | A kind of method for exhausting obtaining XHV | |
| Ishimaru | Ultimate pressure of the order of 10− 13 Torr in an aluminum alloy vacuum chamber | |
| GB1170824A (en) | Rapid pump-down vacuum chambers incorporating cryopumps | |
| US20070286738A1 (en) | Vacuum ion-getter pump with cryogenically cooled cathode | |
| CN108302007A (en) | Low-temperature ion pumps | |
| CN101936278A (en) | Electric arc titanium pump and vacuum air pump group comprising same | |
| CN103623673A (en) | Deacidification matter system | |
| CN102933018A (en) | Neutron tube with drive-in target | |
| CN201891569U (en) | Vacuum electric arc titanium pump | |
| US3428241A (en) | High vacuum pump | |
| CN207558737U (en) | A kind of lanthanum hexaboride cold-cathode Penning ion source device | |
| CN201106064Y (en) | Triode sputtering ion pump structure | |
| CN103317135B (en) | High-temperature sintering process for neodymium iron boron | |
| CN102946686B (en) | Plasma window windowless seal-based liquid-state metal spallation neutron target device | |
| JP2011214567A (en) | Extremely high vacuum hydrogen pump and thermionic control device | |
| US3310226A (en) | Vacuum device | |
| CN107577138A (en) | A kind of vacuum design method for sealing cesium beam tube | |
| KR100860274B1 (en) | Compact uhv sputter ion pump bakable at low temperature and manufacturing method at the same | |
| CN104952685A (en) | Light-weight high-pumping-speed ion pump | |
| Benvenuti et al. | A linear pump for conductance limited vacuum systems | |
| KR100857926B1 (en) | Brown's Gas Generator by forcibly circulating cooling system | |
| CN218175091U (en) | Plasma alloying device | |
| Benvenuti et al. | Cold bore experiments at CERN ISR | |
| CN218884378U (en) | Refrigerating and freezing device | |
| US2049364A (en) | Refrigerating system and method of charging the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180720 |
|
| WD01 | Invention patent application deemed withdrawn after publication |