CN108246706A - A kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer - Google Patents
A kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer Download PDFInfo
- Publication number
- CN108246706A CN108246706A CN201810034468.0A CN201810034468A CN108246706A CN 108246706 A CN108246706 A CN 108246706A CN 201810034468 A CN201810034468 A CN 201810034468A CN 108246706 A CN108246706 A CN 108246706A
- Authority
- CN
- China
- Prior art keywords
- gas
- liquid
- pedestal
- quartz wafer
- cover board
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a kind of rotationally isolated cleaning devices of gas-liquid integral quartz wafer, it includes the gas-liquid washer being located on turntable；Gas-liquid washer is immersed in interior service sink；Annular service sink is provided with outside interior service sink；Filtering wall is provided between interior service sink and annular service sink；Gas-liquid washer includes cover board and pedestal；Cover board and chassis interior are equipped with gas main；Gas main is connected by connection flexible pipe；Air induction hose connects high pressure nitrogen supply system；Air admission hole and inlet opening are provided on cover board and base inner wall；Air admission hole connects gas main；Cover board and base outer wall are equipped with drain blade；Base inner wall, which is equipped with, places groove；It places recess sidewall and is equipped with tap, tap connects total discharge pipe, and total discharge pipe is provided with separating pipe；Separating pipe outlet is arranged in annular service sink.It, which can be realized, once carries out multiple quartz wafers uniform gas-liquid cleaning, and greasiness removal rate is high, and cleaning speed is fast, and enables the quartz wafer surface rapid draing after cleaning.
Description
Technical field
The invention belongs to electronic technology field, specially a kind of rotationally isolated cleaning dress of gas-liquid integral quartz wafer
It puts.
Background technology
Quartz-crystal resonator is manufactured resonant element using the quartz wafer with piezoelectric effect.Due to quartz-crystal
Body resonator has a series of excellent characteristics such as small, light-weight, reliability is high, frequency stability is excellent, is widely used
In the industries such as communication, medical treatment, aerospace, weaponry and field.In the manufacturing process of quartz-crystal resonator, usually
It needs to carry out precision cleaning to quartz wafer surface, to ensure exposed quartz wafer clean surface, so as to plating after ensureing
Metal electrode on quartz wafer surface has preferable adhesive force.Traditional quartz wafer cleaning method will be generally by that will be equipped with
The Lou shape carrier of quartz wafer, which is immersed in chemical solvent, carries out vibration washing.This simple solution cleaning method is unable to reach
Spot completely on removal quartz wafer, while after having cleaned, solution is sticked on quartz wafer can not dry removal for a long time, sternly
The cleaning speed of quartz wafer and the cleaning degree of quartz wafer are reduced again, and subsequent quartz-crystal resonator is caused to produce
Quality reduces, and defect rate improves, and for the quartz wafer of small size, since the size of its length, width and thickness limits,
It will typically be cleaned in the loading basket of the quartz wafer of batch confusion, since multiple quartz wafers are stacked, easily
Lead to the problem of that cleaning is uneven and cleaning rear surface residual be not easy it is dry.
Invention content
The purpose of the present invention is in view of the above problems, providing a kind of gas-liquid integral quartz wafer rotationally isolated cleaning dress
It puts, it, which can be realized, once carries out multiple quartz wafers uniform gas-liquid cleaning, and greasiness removal rate is high, and cleaning speed is fast, and makes
Quartz wafer surface after cleaning can rapid draing.
In order to achieve the above object, the technical solution adopted by the present invention is：A kind of gas-liquid integral quartz wafer rotation isolation
Formula cleaning device, it includes uniformly being arranged on the gas-liquid washer of disk edge in a ring；In the gas-liquid washer is immersed in
In service sink；The interior service sink periphery is provided with annular service sink；It is provided between the interior service sink and annular service sink
Filter wall；The center of turntable is provided with rotary shaft；The rotation axis connection motor；The rotary shaft is arranged in mounting base；
The mounting base connects lifting cylinder；The gas-liquid washer includes the cover board and pedestal that cooperate；The cover board and pedestal
Inside is both provided with gas main；Gas main one end sealing, the other end are connected with each other by connection flexible pipe；On the pedestal
Gas main is also communicated with air induction hose；The air induction hose connects high pressure nitrogen supply system；On the cover board and base inner wall
It is evenly arranged with mutual corresponding air admission hole；The air admission hole connects gas main；It is provided through around the air admission hole inside and outside
The inlet opening of wall；Drain blade is provided on the cover board and base outer wall；The drain blade is located at inlet opening side；It is described
Placement groove is evenly arranged on base inner wall；Air admission hole and inlet opening on the pedestal are arranged at placement groove floor
On；Air admission hole and inlet opening on the cover board, which are located at, to be placed above groove；The placement groove two side is provided with tap,
The tap connects total discharge pipe, total discharge pipe one end sealing, and the other end is provided with separating pipe；The separating pipe outlet
It is arranged in annular service sink.
Further, the turntable is hollow shell；The turntable bottom surface is provided with corresponding with each gas-liquid washer
Connecting hole；The connecting hole connects air induction hose；The rotary shaft is hollow shaft；The rotary shaft connects turntable；The rotation
Axis upper end connects high pressure nitrogen supply system by rotary joint.
Further, the pedestal tail end is hinged on turntable；The pedestal tail end is provided with fixing bolt；The turntable
On be hinged with the link that can tangle fixing bolt；The turntable side wall is provided with the threaded hole coordinated with fixing bolt.
Further, it is both provided with check valve in the inlet opening.
Further, total discharge pipe is arranged on chassis interior both sides.
Further, there are four the inlet opening settings placed in groove floor；The inlet opening be evenly distributed on into
Stomata both sides；The tap is arranged on two inlet opening centre positions；The drain blade is provided with two rows.
Further, the U-shaped setting of the separating pipe.
Further, it is provided with ring packing frame on the cover board inner wall；It is provided on the pedestal and ring packing frame
The annular groove of corresponding matching.
Further, the cover board and pedestal tail end are hinged and connected, and front end is inter-connected via a bolt joint fixation.
Further, the gas-liquid washer two side is circular shape.
Beneficial effects of the present invention：
The present invention, which realizes, once carries out multiple quartz wafers uniform gas-liquid cleaning, and greasiness removal rate is high, and cleaning speed is fast,
And enable the quartz wafer surface rapid draing after cleaning.
While the present invention cleans quartz wafer using chemical solvent by using the gas-liquid washer of rotation, adopt
Gas bleed is carried out to quartz wafer two sides with nitrogen, by the way that liquid ensure that quartz-crystal in a manner that purge of gas is combined
Piece gets cleaning express developed, simultaneously as liquid rinse can be separated with purge of gas, after liquid rinse, utilizes
High speed nitrogen quickly disposes the residual liquid on quartz wafer surface, can realize the low temperature rapid draing of quartz wafer.
The cleaning solution of chemical solvent will not be used in mixed way in the present invention, but utilize gas-liquid washer in clean chemical solution
After being rinsed in agent, the chemical solvent after flushing is discharged in annular service sink automatically, the filtering wall in annular service sink
After the spot particle in chemical solvent is filtered, chemical solvent clean after filtering is returned to sharp again in interior service sink
With avoiding the cross contamination of spot, improve the cleaning efficiency and cleaning degree of quartz wafer, while improve cleaning again
The utilization rate of liquid.
Description of the drawings
Fig. 1 is the overall structure diagram of the present invention.
Fig. 2 is the gas-liquid washer internal structure schematic diagram in the present invention.
Fig. 3 is base plate interior schematic cross-sectional view.
Fig. 4 is cover board interior wall construction figure.
Fig. 5 is gas-liquid washer end face sectional structure chart.
Fig. 6 is the attachment structure schematic diagram of turntable and rotary shaft.
In figure：1st, gas-liquid washer；2nd, separating pipe；3rd, turntable；4th, rotary shaft；5th, annular service sink；6th, interior service sink；7、
Filter wall；8th, drain blade；9th, inlet opening；10th, gas main；11st, cover board；12nd, pedestal；13rd, groove is placed；14th, tap；
15th, air admission hole；16th, total discharge pipe；17th, sealing frame；18th, threaded hole；20th, link；21st, fixing bolt；22nd, connection flexible pipe；23、
Air induction hose；31st, connecting hole；41st, mounting base；42nd, motor；43rd, rotary joint；44th, lifting cylinder.
Specific embodiment
In order to which those skilled in the art is made to more fully understand technical scheme of the present invention, below in conjunction with the accompanying drawings to the present invention into
Row detailed description, the description of this part is only exemplary and explanatory, should not there is any limitation to protection scope of the present invention
Effect.
As shown in figs 1 to 6, concrete structure of the invention is：A kind of rotationally isolated cleaning of gas-liquid integral quartz wafer
Device, it includes uniformly being arranged on the gas-liquid washer 1 at 3 edge of turntable in a ring；The gas-liquid washer 1 is immersed in interior cleaning
In pond 6；6 periphery of interior service sink is provided with annular service sink 5；It is provided between the interior service sink 6 and annular service sink 5
Filter wall 7；The turntable 3 is provided centrally with rotary shaft 4；The rotary shaft 4 connects motor 42；The rotary shaft 4 is arranged on peace
It fills on seat 41；The mounting base 41 connects lifting cylinder 44；The gas-liquid washer 1 includes the cover board 11 and pedestal that cooperate
12；Gas main 10 is both provided with inside the cover board 11 and pedestal 12；10 one end of gas main sealing, the other end pass through connection
Hose 22 is connected with each other；Gas main 10 on the pedestal 12 is also communicated with air induction hose 23；The air induction hose 23 connects height
Press nitrogen supply (NS) system；Mutual corresponding air admission hole 15 is evenly arranged on 12 inner wall of the cover board 11 and pedestal；The air inlet
Hole 15 connects gas main 10；The inlet opening 9 of inside and outside wall is provided through around the air admission hole 15；The cover board 11 and pedestal 12
Drain blade 8 is provided on outer wall；The drain blade 8 is located at 9 side of inlet opening；It is evenly arranged on 12 inner wall of pedestal
Place groove 13；Air admission hole 15 and inlet opening 9 on the pedestal 12, which are arranged at, to be placed on 13 bottom surface of groove；The cover board 11
On air admission hole 15 and inlet opening 9 be located at and place the top of groove 13；13 two side of the placement groove is provided with tap 14, institute
It states tap 14 and connects total discharge pipe 16, total 16 one end of discharge pipe sealing, the other end is provided with separating pipe 2；The separation
The outlet of pipe 2 is arranged in annular service sink 5.
Preferably, the turntable 3 is hollow shell；3 bottom surface of turntable is provided with corresponding with each gas-liquid washer 1
Connecting hole 31；The connecting hole 31 connects air induction hose 23；The rotary shaft 4 is hollow shaft；The rotary shaft 4 connects turntable 3；
4 upper end of rotary shaft connects high pressure nitrogen supply system by rotary joint 43.
Preferably, 12 tail end of pedestal is hinged on turntable 3；12 tail end of pedestal is provided with fixing bolt 21；Institute
It states and the link 20 that can tangle fixing bolt 21 is hinged on turntable 3；3 side wall of turntable is provided with what is coordinated with fixing bolt 21
Threaded hole 18.
Preferably, it is both provided with check valve in the inlet opening 9.
Preferably, total discharge pipe 16 is arranged on 12 inside both sides of pedestal.
Preferably, there are four the settings of inlet opening 9 placed on 13 bottom surface of groove；The inlet opening 9 is evenly distributed on
15 both sides of air admission hole；The tap 14 is arranged on two inlet openings, 9 centre position；The drain blade 8 is provided with two rows.
Preferably, the 2 U-shaped setting of separating pipe.
Preferably, it is provided with ring packing frame 17 on 11 inner wall of cover board；It is provided on the pedestal 12 close with annular
Seal the annular groove of 17 corresponding matching of frame.
Preferably, the cover board 11 and 12 tail end of pedestal are hinged and connected, and front end is inter-connected via a bolt joint fixation.
Preferably, 1 two side of gas-liquid washer is circular shape.
The specifically used principle of the present invention：
Lifting cylinder 44 is shunk, and gas-liquid washer 1 is extracted from interior service sink 6, while separating pipe 2 is from annular service sink
It is extracted in 5.
Rotary fixing screw bolt 21 so that fixing bolt 21 is detached from threaded hole 18, then holds gas-liquid washer 1 toward turning over
Turn, fixing bolt 21 is tangled with link 20, promote gas-liquid washer 1 that horizontality is kept to fix.
Cover board 11 and pedestal 12 are opened, quartz wafer level is put into and is placed in groove 13；Then cover board 11 is covered,
Cover board 11 and pedestal 12 are sealed by fixation by bolt.
Unclamp link 20 so that vertical state is translated under gas-liquid washer 1, then rotary fixing screw bolt 21 is screwed into screw thread
In hole 18 so that gas-liquid washer 1 is in vertical stationary state.
Control lifting cylinder 44 declines, and gas-liquid washer 1 is dropped into interior service sink 6, while U-shaped separating pipe 2 exports
It drops into annular service sink 5.
Start motor 42, rotary shaft 4, turntable 3 is driven to rotate, so as to drive multigroup gas-liquid washer 1 in interior service sink 6
Rotation, tells in rotary course, and cleaning solution is imported by the drain blade 8 of arc from inlet opening 9 to be placed in groove 13, cleaning solution
It pours into, quartz wafer is cleaned, while start high pressure nitrogen supply system from the bottom surface and top surface for placing groove 13,
High speed nitrogen is entered from rotary joint 43 in rotary shaft 4, is entered back into hollow turntable 3, then is entered from each connecting hole 31
Into air induction hose 23, then enter in the gas main 10 on pedestal 12 from air induction hose 23, entered from connection flexible pipe 22
In gas main 10 in cover board 11, then come out respectively from the air admission hole 15 for placing 13 bottom surface of groove and top surface again, to quartz-crystal
The tow sides of piece carry out purge of gas, therefore, the dual mixing of cleaning solution and nitrogen are formd, to quartz wafer tow sides
It is carried out at the same time cleaning；Cleaning solution and nitrogen after cleaning are ejected along the tap 14 for placing 13 both sides of groove, are entered total
It in discharge pipe 16, enters back into separating pipe 2, is finally discharged in annular service sink 5；Promote the cleaning solution before cleaning and cleaning
Cleaning solution afterwards is detached in different service sinks, is isolated and is come, therefore will not be mixed use, before ensure that cleaning
The cleaning of cleaning solution.
After cleaning, gas-liquid washer 1 from service sink is extracted by lifting cylinder 44, continues nitrogen
Gas flushing, high speed nitrogen wash out the spot on quartz wafer surface and cleaning solution, do not need to, using high temperature evaporation, pass through nitrogen
The dried and clean that quartz wafer surface can be realized is rinsed at a high speed.
It should be noted that herein, term " comprising ", "comprising" or its any other variant are intended to non-row
His property includes, so that process, method, article or equipment including a series of elements not only include those elements, and
And it further includes other elements that are not explicitly listed or further includes intrinsic for this process, method, article or equipment institute
Element.
Specific case used herein is expounded the principle of the present invention and embodiment, the explanation of above example
It is merely used to help understand the method and its core concept of the present invention.The above is only the preferred embodiment of the present invention, should
When pointing out, due to the finiteness of literal expression, and objectively there are unlimited concrete structure, for the common skill of the art
For art personnel, without departing from the principle of the present invention, several improvement, retouching or variation can also be made, can also incited somebody to action
Above-mentioned technical characteristic is combined in the right way；These improve retouching, variation or combination or the not improved structure by invention
Think and technical solution directly applies to other occasions, be regarded as protection scope of the present invention.
Claims (10)
1. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer, which is characterized in that it includes uniformly setting in a ring
It puts in turntable（3）The gas-liquid washer at edge（1）；The gas-liquid washer（1）It is immersed in interior service sink（6）In；It is described interior clear
Wash pool（6）Periphery is provided with annular service sink（5）；The interior service sink（6）With annular service sink（5）Between be provided with filtering wall
（7）；The turntable（3）It is provided centrally with rotary shaft（4）；The rotary shaft（4）Connect motor（42）；The rotary shaft（4）If
It puts in mounting base（41）On；The mounting base（41）Connect lifting cylinder（44）；The gas-liquid washer（1）Including cooperating
Cover board（11）And pedestal（12）；The cover board（11）And pedestal（12）Inside is both provided with gas main（10）；The gas main
（10）One end seals, and the other end passes through connection flexible pipe（22）It is connected with each other；The pedestal（12）On gas main（10）Also connect
There is air induction hose（23）；The air induction hose（23）Connect high pressure nitrogen supply system；The cover board（11）And pedestal（12）It is interior
Mutual corresponding air admission hole is evenly arranged on wall（15）；The air admission hole（15）Connect gas main（10）；The air admission hole
（15）Surrounding is provided through the inlet opening of inside and outside wall（9）；The cover board（11）And pedestal（12）Drain leaf is provided on outer wall
Piece（8）；The drain blade（8）Positioned at inlet opening（9）Side；The pedestal（12）Placement groove is evenly arranged on inner wall
（13）；The pedestal（12）On air admission hole（15）And inlet opening（9）It is arranged at placement groove（13）On bottom surface；The cover board
（11）On air admission hole（15）And inlet opening（9）Positioned at placement groove（13）Top；The placement groove（13）Two side is set
There is tap（14）, the tap（14）Connect total discharge pipe（16）, total discharge pipe（16）One end seals, and the other end is set
It is equipped with separating pipe（2）；The separating pipe（2）Outlet is arranged on annular service sink（5）It is interior.
2. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer according to claim 1, which is characterized in that
The turntable（3）For hollow shell；The turntable（3）Bottom surface is provided with and each gas-liquid washer（1）Corresponding connecting hole
（31）；The connecting hole（31）Connect air induction hose（23）；The rotary shaft（4）For hollow shaft；The rotary shaft（4）Connection turns
Disk（3）；The rotary shaft（4）Upper end passes through rotary joint（43）Connect high pressure nitrogen supply system.
3. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer according to claim 1, which is characterized in that
The pedestal（12）Tail end is hinged on turntable（3）On；The pedestal（12）Tail end is provided with fixing bolt（21）；The turntable
（3）On be hinged with and can tangle fixing bolt（21）Link（20）；The turntable（3）Side wall is provided with and fixing bolt（21）Match
The threaded hole of conjunction（18）.
4. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer according to claim 1, which is characterized in that
The inlet opening（9）Inside it is both provided with check valve.
5. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer according to claim 1, which is characterized in that
Total discharge pipe（16）It is arranged on pedestal（12）Internal both sides.
6. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer according to claim 1, which is characterized in that
The placement groove（13）Inlet opening on bottom surface（9）There are four settings；The inlet opening（9）It is evenly distributed on air admission hole（15）
Both sides；The tap（14）It is arranged on two inlet openings（9）Centre position；The drain blade（8）It is provided with two rows.
7. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer according to claim 1, which is characterized in that
The separating pipe（2）U-shaped setting.
8. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer according to claim 1, which is characterized in that
The cover board（11）Ring packing frame is provided on inner wall（17）；The pedestal（12）On be provided with and ring packing frame（17）It is right
The annular groove that should coordinate.
9. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer according to claim 1, which is characterized in that
The cover board（11）And pedestal（12）Tail end is hinged and connected, and front end is inter-connected via a bolt joint fixation.
10. a kind of rotationally isolated cleaning device of gas-liquid integral quartz wafer according to claim 1, feature exist
In the gas-liquid washer（1）Two side is circular shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810034468.0A CN108246706B (en) | 2018-01-15 | 2018-01-15 | Gas-liquid integrated quartz wafer rotary isolation type cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810034468.0A CN108246706B (en) | 2018-01-15 | 2018-01-15 | Gas-liquid integrated quartz wafer rotary isolation type cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108246706A true CN108246706A (en) | 2018-07-06 |
| CN108246706B CN108246706B (en) | 2020-02-07 |
Family
ID=62726578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810034468.0A Active CN108246706B (en) | 2018-01-15 | 2018-01-15 | Gas-liquid integrated quartz wafer rotary isolation type cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108246706B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110416150A (en) * | 2019-07-18 | 2019-11-05 | 西安奕斯伟硅片技术有限公司 | A kind of silicon chip clamping device |
| CN113441472A (en) * | 2021-07-01 | 2021-09-28 | 深圳市科源信科技有限公司 | Gas-liquid cleaning device for quartz crystal oscillator high-frequency wafer |
| CN114999960A (en) * | 2022-06-02 | 2022-09-02 | 智程半导体设备科技(昆山)有限公司 | Single wafer cleaning equipment |
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| SU844451A1 (en) * | 1977-12-08 | 1981-07-07 | Предприятие П/Я А-1158 | Self-propelled carriage for travel inside pipeline |
| US20130220377A1 (en) * | 2003-08-29 | 2013-08-29 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method of cleaning a film-forming apparatus |
| CN206316055U (en) * | 2016-12-10 | 2017-07-11 | 万安县水晶厂 | A kind of high-efficiency quartz crystal cleaning equipment |
| CN206794265U (en) * | 2017-05-08 | 2017-12-26 | 济源石晶光电频率技术有限公司 | A kind of cleaning device for cleaning large scale quartz wafer |
-
2018
- 2018-01-15 CN CN201810034468.0A patent/CN108246706B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU844451A1 (en) * | 1977-12-08 | 1981-07-07 | Предприятие П/Я А-1158 | Self-propelled carriage for travel inside pipeline |
| US20130220377A1 (en) * | 2003-08-29 | 2013-08-29 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method of cleaning a film-forming apparatus |
| CN206316055U (en) * | 2016-12-10 | 2017-07-11 | 万安县水晶厂 | A kind of high-efficiency quartz crystal cleaning equipment |
| CN206794265U (en) * | 2017-05-08 | 2017-12-26 | 济源石晶光电频率技术有限公司 | A kind of cleaning device for cleaning large scale quartz wafer |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110416150A (en) * | 2019-07-18 | 2019-11-05 | 西安奕斯伟硅片技术有限公司 | A kind of silicon chip clamping device |
| CN110416150B (en) * | 2019-07-18 | 2021-10-22 | 西安奕斯伟硅片技术有限公司 | Silicon wafer clamping device |
| CN113441472A (en) * | 2021-07-01 | 2021-09-28 | 深圳市科源信科技有限公司 | Gas-liquid cleaning device for quartz crystal oscillator high-frequency wafer |
| CN114999960A (en) * | 2022-06-02 | 2022-09-02 | 智程半导体设备科技(昆山)有限公司 | Single wafer cleaning equipment |
| CN114999960B (en) * | 2022-06-02 | 2023-03-28 | 智程半导体设备科技(昆山)有限公司 | Single wafer cleaning equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108246706B (en) | 2020-02-07 |
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