CN108170004A - Photoresist real-time detection apparatus, photoresist real-time detection method and light blockage coating equipment - Google Patents
Photoresist real-time detection apparatus, photoresist real-time detection method and light blockage coating equipment Download PDFInfo
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- CN108170004A CN108170004A CN201711445985.9A CN201711445985A CN108170004A CN 108170004 A CN108170004 A CN 108170004A CN 201711445985 A CN201711445985 A CN 201711445985A CN 108170004 A CN108170004 A CN 108170004A
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- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 136
- 238000011897 real-time detection Methods 0.000 title claims abstract description 41
- 239000011248 coating agent Substances 0.000 title claims abstract description 23
- 238000000576 coating method Methods 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000001514 detection method Methods 0.000 claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 47
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 41
- 239000010931 gold Substances 0.000 claims abstract description 41
- 229910052737 gold Inorganic materials 0.000 claims abstract description 41
- 230000003287 optical effect Effects 0.000 claims description 92
- 238000012545 processing Methods 0.000 claims description 14
- 230000008054 signal transmission Effects 0.000 claims description 8
- 230000007547 defect Effects 0.000 claims description 7
- 230000005540 biological transmission Effects 0.000 claims description 3
- 230000001360 synchronised effect Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 238000005070 sampling Methods 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 13
- 239000012528 membrane Substances 0.000 description 8
- 230000002159 abnormal effect Effects 0.000 description 4
- 230000002950 deficient Effects 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000007689 inspection Methods 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 208000010086 Hypertelorism Diseases 0.000 description 1
- 206010020771 Hypertelorism of orbit Diseases 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Length Measuring Devices By Optical Means (AREA)
Abstract
The present invention provides a kind of photoresist real-time detection apparatus, including work platform, the substrate being set on work platform, mouth gold, mouth gold are additionally provided with detection optics and the control piece being electrically connected with detection optics for being coated with photoresist on substrate on work platform, mouthful gold substrate along the first direction on be coated with photoresist when, detection optics are detected photoresist, and feed back detection signal to control piece, and control piece will detect signal and be compared with standard signal and determine whether photoresist is up to standard.A kind of photoresist real-time detection apparatus provided by the invention, by setting detection optics, and photoresist is detected when mouth gold is coated with photoresist, detection optics feed back to control piece by signal is detected, control piece is compared signal is detected with standard signal, has been achieved the purpose that detect photoresist in real time, has been relieved the missed detection risk present in sampling observation mode, the yield of product is improved, the influence to production capacity is small.The present invention also provides a kind of photoresist real-time detection method and a kind of light blockage coating equipment.
Description
Technical field
The invention belongs to light blockage coating technical fields more particularly to a kind of photoresist real-time detection apparatus, photoresist to detect in real time
Method and light blockage coating equipment.
Background technology
At present, in the light blockage coating processing procedure of liquid crystal display panel industry, light blockage coating is mostly carried out to substrate using coating machine.To protect
Volume production yield is demonstrate,proved, needs to carry out light blockage coating processing procedure following three aspects detection monitoring：
1st, it in practical volume production, finishes and to answer a pager's call when each coating machine carries out maintaining, be required to first be coated on substrate
Photoresist, then the photoresist thickness with film thickness machine measurement base plate coating, and then confirm photoresist thickness entirety homogeneity whether in specification；
2nd, it in producing, is found in time for rupture of membranes phenomenon after ensureing light blockage coating, 1 AOI need to be equipped with after coating machine
(Automated Optical Inspection, automatic optics inspection) detection machine, inspects situation after base plate coating by random samples；
3rd, it to ensure that film thickness abnormal phenomenon (film thickness is whole partially thin or partially thick) is found in time, can be measured when maintaining the moon
Monitoring confirms.
But surveillance and control measure is detected above, following problem can be caused：
1st, confirm that the time of answering a pager's call is longer (general no less than one hour) after maintaining, influence production capacity；
2nd, carrying out AOI sampling observations influences production capacity, and sampling observation frequency can not be too high, and missed detection risk is caused to exist；
3rd, accidental film thickness abnormal phenomenon, confirms when being maintained by the moon, can not monitor in real time and avoid, and there are product rejection wind
Danger.
Invention content
The object of the present invention is to provide a kind of photoresist real-time detection apparatus, are influenced with solving the detection present in the prior art
Production capacity, there are missed detection risks for sampling observation, it is impossible to the problem of monitoring in real time.
Purpose to realize the present invention, the present invention provides following technical solutions：
In a first aspect, the present invention provides a kind of photoresist real-time detection apparatus, including work platform, the base being set on the work platform
Plate, mouth gold, the mouth gold for being coated with photoresist on the substrate, be additionally provided on the work platform detection optics and with it is described
The control piece of detection optics electrical connection, the mouth gold the substrate along the first direction on be coated with photoresist when, optics inspection
Survey part to be detected the photoresist, and feed back detection signal to the control piece, the control piece by the detection signal with
Standard signal is compared and determines whether the photoresist is up to standard.
In the first possible realization method of first aspect, the control piece includes memory module and signal processing mould
Block, the memory module is for storing the standard signal of zero defect photoresist that the detection optics are fed back, at the signal
Reason module is used to compare the detection signal with the standard signal.
In second of possible realization method of first aspect, the detection optics are included in substrate both sides phase
To the optical transmitting set and optical receiver of setting, the optical transmitting set emits beam, and the light penetrates the photoresist by the light
Receiver receives, and the optical transmitting set and the optical receiver follow the mouth gold in the first direction synchronizing moving.
With reference to first aspect and second of possible realization method of first aspect, the third in first aspect are possible
In realization method, the light received can be converted to electric signal, and by the electric signal transmission extremely by the optical receiver
The control piece.
With reference to first aspect and second of possible realization method of first aspect, the 4th kind in first aspect are possible
In realization method, the light received can be converted to electric signal, and by the electric signal transmission extremely by the optical receiver
The control piece.
Second aspect, the present invention also provides a kind of photoresist real-time detection methods, include the following steps：
An optical transmitting set and optical receiver are provided, the optical transmitting set and the optical receiver are set to the substrate on work platform
Opposite both sides；
While mouth gold is coated with photoresist on the substrate along the first direction, the optical transmitting set and the optical receiver
Follow the mouth gold synchronizing moving；
The optical transmitting set emits beam, and the light penetrates the photoresist and received by the optical receiver；
The light received is converted to electric signal, and the electric signal transmission is extremely controlled by the optical receiver
Part；
The control piece compares the electric signal with standard signal, so that it is determined that whether the photoresist is up to standard.
In the first possible realization method of second aspect, the control piece includes memory module and signal processing mould
Block, the memory module store the standard signal of the zero defect photoresist of the optical receiver transmission, and the signal processing module will
The electric signal is compared with the standard signal.
In second of possible realization method of second aspect, guide rail is set on the work platform, by the guide rail edge
The first direction setting, the optical transmitting set and the optical receiver are set on the guide rail.
With reference to second of possible realization method of second aspect and second aspect, the third in second aspect is possible
In realization method, position of the guide rail on the work platform can adjust.
The third aspect, the present invention also provides a kind of light blockage coating equipment, including the light as described in any in first aspect
Hinder real-time detection apparatus.
Beneficial effects of the present invention：
A kind of photoresist real-time detection apparatus provided by the invention is coated with photoresist by setting detection optics, and in mouth gold
When photoresist is detected, detection optics feed back to control piece by signal is detected, and control piece will detect signal and standard signal
It is compared, photoresist is detected in coating photoresist every time, has achieved the purpose that detect photoresist in real time, has relieved pumping
Missed detection risk present in procuratorial organ's formula improves the yield of product, and the influence to production capacity is small.
Description of the drawings
It, below will be to embodiment in order to illustrate more clearly of embodiment of the present invention or technical solution of the prior art
Or attached drawing needed to be used in the description of the prior art is briefly described, it should be apparent that, the accompanying drawings in the following description is only
It is some embodiments of the present invention, for those of ordinary skill in the art, without creative efforts,
It can also be obtained according to these attached drawings other attached drawings.
Fig. 1 is the overlooking the structure diagram of the photoresist real-time detection apparatus of one embodiment of the present invention；
Fig. 2 is the positive structure diagram of the photoresist real-time detection apparatus of one embodiment of the present invention；
Fig. 3 is the control structure schematic diagram of the photoresist real-time detection apparatus of one embodiment of the present invention；
Fig. 4 is the cross-sectional view of the E-F along Fig. 2；
Fig. 5 is a kind of guide rail structure schematic diagram of the photoresist real-time detection apparatus of embodiment；
Fig. 6 is the guide rail structure schematic diagram of the photoresist real-time detection apparatus of another embodiment；
Fig. 7 is the guide rail structure schematic diagram of the photoresist real-time detection apparatus of another embodiment；
Fig. 8 is the schematic diagram that the control piece of the photoresist real-time detection apparatus of the present invention compares detection signal.
Specific embodiment
Below in conjunction with the attached drawing in embodiment of the present invention, the technical solution in embodiment of the present invention is carried out clear
Chu is fully described by, it is clear that described embodiment is only the reality of a part of embodiment of the present invention rather than whole
Apply mode.Based on the embodiment in the present invention, those of ordinary skill in the art institute without making creative work
The every other embodiment obtained, shall fall within the protection scope of the present invention.
The present invention provides a kind of light blockage coating equipment, can be when being coated with photoresist to light including photoresist real-time detection apparatus
The situation up to standard of resistance detects in real time, saves working hour, does not influence production capacity.
It please refers to Fig.1 to Fig.3, Fig. 1 is that the plan structure of the photoresist real-time detection apparatus of one embodiment of the present invention is shown
It is intended to, Fig. 2 is the positive structure diagram of the photoresist real-time detection apparatus of one embodiment of the present invention, and Fig. 3 is the present invention one
The control structure schematic diagram of the photoresist real-time detection apparatus of kind embodiment.It is real that one embodiment of the present invention provides a kind of photoresist
When detection device, including work platform 100, the substrate 200 being set on the work platform 100, mouth gold 30, mouth gold 30 is used in institute
State on substrate 300 coating photoresist 300, be additionally provided on the work platform 100 detection optics (non-label in figure) and with the light
The control piece 90 of detection piece electrical connection is learned, the mouth gold 30 is when being coated with photoresist 300 on the substrate 200 along the first direction X, institute
It states detection optics to be detected the photoresist 300, and feeds back detection signal to the control piece 90, the control piece 90 will
The detection signal is compared with standard signal and determines whether the photoresist 300 is up to standard.
By setting detection optics, and photoresist 300 is detected when mouth gold 30 is coated with photoresist 300, optical detection
Part will detect signal and feed back to control piece 90, and control piece 90 is compared with standard signal by signal is detected, reached to photoresist
300 purposes detected in real time, relieve the missed detection risk present in sampling observation mode, improve the yield of product, to the shadow of production capacity
Sound is small.
Work platform 100 is used to support substrate 200, and work platform 100 includes a plane, and substrate 200 is set in the plane, substrate
200 when being set on work platform 100, can set the position that jig (not shown) limits substrate 200, on work platform 100 with substrate 200
Corresponding position is also provided with thimble structure (not shown), for jacking up substrate 100 in order to replacing next piece of substrate
100。
Substrate 200 is the carrier of photoresist 300, and the material of substrate 200 can be glass.Substrate 200 includes long side and short side,
Duration edge first direction X settings are set on work platform 100, and Y is set short side in a second direction, first direction X and second direction Y
With one be, for example, 90 ° of angle, first direction X and second direction Y shape into plane and substrate 200 it is coplanar, mouth gold 30 is in base
When photoresist 300 is coated on plate, X is moved mouth gold 30 along the first direction.
Photoresist 300 is widely used in liquid crystal display panel, and generally water white transparency or white shape, the photoresist 300 of coating is covered with
The film being layered on substrate 200 is formed during substrate 200, film thickness answers uniformity, and do not have when photoresist 300 is coated under normal circumstances
The defects of occurring rupture of membranes.But in practical volume production, it often will appear that membrane thickness unevenness is consistent, and the abnormal phenomenon for having rupture of membranes is sent out
Raw, the present invention is precisely in order to above-mentioned exception can be detected in real time.
The preferably slit-type mouths gold of mouth gold 30, that is to say, that mouth gold 30 includes the spout 31 in a gap-like, photoresist
It uniformly sprays and is coated on substrate 200 from spout 31, development length of the spout 31 on second direction Y and substrate 200 are short
The length on side is approximately equivalent so that when mouth gold 30 is moved on X in a first direction, the photoresist that spout 31 sprays can be covered disposably
The short side of substrate 200.Mouth gold 30 further includes cavity volume 32, and cavity volume 32 is connect with spout 31, is equipped in cavity volume 32 and is connect with spout 31
Pipeline or cavity, be also associated with interference structure 50 for spout 31 to be given to convey photoresist, on cavity volume 32, interference structure 50 is set
Moving direction when mouth gold 30 is coated with photoresist, i.e. first direction X sides, collide other objects for anti-seam allowance gold 30 and cause
Damage, specifically, interference structure 50 includes the first interference piece 51 and the second interference piece 52, the first interference piece 51 connects with cavity volume 32
It connects, and opposite cavity volume 32 is higher by a distance, the second interference piece 52 is connect with the first interference piece 51, and is prolonged to 31 direction of spout
Extend to height about identical with 31 tip of spout.Mouth gold 30 can be by across the support construction in the both sides of 200 long side of substrate
(not shown) supports, and can also suspend support in midair by the hanging structure (not shown) that light blockage coating equipment is stretched out.
It please refers to Fig.3, the control piece 90 includes memory module 91 and signal processing module 92, and the memory module 91 is used
In the standard signal of zero defect photoresist that the storage detection optics are fed back, the signal processing module 92 is used for by described in
Detection signal is compared with the standard signal.
In a kind of embodiment, incorporated by reference to Fig. 4, Fig. 4 is the photoresist real-time detection apparatus edge of one embodiment of the present invention
The cross-sectional view of E-F in Fig. 2.The detection optics are included in the light emitting that 200 both sides of substrate are oppositely arranged
Device 60 and optical receiver 80, the optical transmitting set 60 emit beam 70, and the light 70 penetrates the photoresist 300 and connect by the light
It receives device 80 to receive, the optical transmitting set 60 and the optical receiver 80 follow the mouth gold 30 in the synchronouss shiftings of the first direction X
It is dynamic.
Specifically, optical transmitting set 60 and optical receiver 80 are relatively arranged on second direction Y, in mouth gold 30 in substrate
When photoresist 300 is coated on 200, optical transmitting set 60 and optical receiver 80 are set to mouth gold 30 in a first direction after X and with blurting out
Gold 300 moves so that when mouth gold 300 has just been coated with one section of photoresist 300, optical transmitting set 60 and the work of optical receiver 80 are so as to firm
The photoresist 300 of coating is detected, and realizes the purpose detected in real time.
The light 70 that optical transmitting set 60 the emits line light parallel to each other for multi beam, Y is projected light 70 in a second direction, is worn
The light 70 received can be converted to telecommunications by light transmission resistance 300, the incident optical receiver 80 of light 70, the optical receiver 80
Number, and by the electric signal transmission to the control piece 90.Light 70 is walked in photoresist 300, due to the blocking of photoresist 300,
And refraction, the scattering of light in photoresist 300 etc., the reduction of light quantity can be caused so that the light 70 that optical receiver 80 receives
The parameters such as light intensity, luminous flux can be declined, the Parameter Switch of light 70 received is electric signal by optical receiver 80,
And by the electric signal transmission to control piece 90, the figure of the electric signal is obtained by calculation in control piece 90, and control piece 90 passes through survey
The test pattern that flawless photoresist 300 obtains the electric signal of standard is tried, the figure of the electric signal and test pattern are carried out pair
Than can determine whether photoresist 300 is up to standard.In present embodiment, detection signal is electric signal, in other embodiments, detection
Signal can also be other signals.
It is larger that light 70 should be 300 uptake of photoresist, in order to penetrate the light of photoresist 300, meanwhile, it should not also influence photoresist
300 properties, preferred light 70 are infrared light.
In a kind of embodiment, the spout 31 of the optical transmitting set 60 and the optical receiver 80 and the mouth gold 30
Distance be 1~5cm.Specifically, the direction that optical transmitting set 60 and optical receiver 80 are set is second direction Y, and spout 30
Extending direction be also second direction Y, that is to say, that prolong with spout 31 in the direction that optical transmitting set 60 and optical receiver 80 are set
Stretch that direction is identical, the optical transmitting set 60 and the distance of the optical receiver 80 and the spout 31 of the mouth gold 30 are the
Distance on one direction X.Preferably, which is 2~4cm, it is further preferred that the distance is 2~3cm.By setting
State optical transmitting set 60 and the optical receiver 80 and the OK range of the distance of the spout 31 of the mouth gold 30 so that spout
31 coating photoresists 300 and the photoresist 300 that optical transmitting set 60 and optical receiver 80 detect are spaced apart, ensure coated
Photoresist has been molded completely, and the result of detection is effective.If the optical transmitting set 60 and the optical receiver 80 and mouth gold
The distance of 30 spout 31 it is excessively near, then photoresist 300 is also unformed complete, belongs to semi-finished product, detects the knot of photoresist at this time
Fruit is without reference to meaning, if the hypertelorism, and delayed working hour, it is unfavorable for improving efficiency, it is impossible to reach what is detected in real time
Purpose.
Further, please continue to refer to Fig. 4, the light 70 that the optical transmitting set 60 is sent out is perpendicular to the substrate 200
Width on the direction of plane is 5~20um.Specifically, optical transmitting set 60 includes emission port 61, optical receiver 80 includes receiving
Mouth 81, for emitting light 70, receiving port 81 is used to receive light 70 emission port 61.Emission port 61 and receiving port 81 are in second party
Be oppositely arranged in Y-direction, due to 200 place plane of substrate for first direction X and second direction Y shape into plane, enable third
Direction Z perpendicular to first direction X and second direction Y shape into plane so that first direction X, second direction Y and third direction Z
A coordinate system is formed, emission port 61 includes the first height extended along third direction Z, and receiving port 81 is also included along third direction Z
Second height of extension, preferred first height are identical with the size of the second height.The lower edge of emission port 61 and receiving port 81 can
With concordant with 200 upper surface of substrate, the first height is not less than thickness of the photoresist 300 in third direction Z, that is to say, that emission port
The light 70 of 61 transmittings covers all positions between the upper and lower surface of photoresist 300 on third direction Z, ensures to photoresist 300
Carry out whole complete detection.Width of the light 70 on third direction Z can be adjusted according to the thickness of different photoresists 300
It is whole, it is preferred that light 70 is 10~15um in the width on the direction of the base plan, that is, third direction Z, into one
Step is preferred, and light 70 is 10um in the width on the direction of the base plan, that is, third direction Z.
In a kind of embodiment, Fig. 5 to Fig. 7 is please referred to, Fig. 5 is a kind of leading for the photoresist real-time detection apparatus of embodiment
Rail structure diagram, Fig. 6 are the guide rail structure schematic diagrames of the photoresist real-time detection apparatus of another embodiment, and Fig. 7 is another
The guide rail structure schematic diagram of the photoresist real-time detection apparatus of kind embodiment.The optical transmitting set 60 and the optical receiver 80 are set
It is placed on guide rail 110, the guide rail 110 is set on the work platform 100 and extends along the first direction X.
Guide rail 110 includes two and the both sides being relatively arranged on work platform 100, and guide rail 110 can be by work platform 100
Processing is formed, can also be by individually processing and being fixed on work platform.Fig. 5 is please referred to, in a kind of embodiment, in work platform 100
A trench structure is dug out on upper two opposite sides, which forms guide rail 110；Fig. 6 is please referred to, another kind is implemented
In mode, the structure of a platform-like is dug out on opposite both sides in the plane of work platform 100, and is dug in the structure of the platform-like
Go out a groove structure, which forms guide rail 110；Fig. 7 is please referred to, in another embodiment, in the plane of work platform 100
Two guide rails 110 being oppositely arranged of upper installation.It should be appreciated that above example provides only the example of a limited number of kind of guide rail,
It can also include other patterns in other embodiment.
Further, the position of the relatively described work platform 100 of the guide rail 110 can adjust.Set 110 position of guide rail adjustable
It is whole, it is adjusted convenient for the substrate 200 according to different size and photoresist 300, can flexibly arrange this photoresist real-time detection apparatus.
Further, the relatively described work platform 100 of the guide rail 110 is can on the direction of 200 plane of substrate
Mobile displacement is 0~2mm.According to the thickness of substrate 200 and photoresist 300 difference, perpendicular to 200 planes of substrate, that is, third
In plane Z-direction, the displacement adjustable range of guide rail 110 is set so that this photoresist real-time detection apparatus can be adapted to different bases
Plate 200 and photoresist 300.
It please refers to Fig.1 to Fig. 4, one embodiment of the present invention also provides a kind of photoresist real-time detection method, including following
Step：
An optical transmitting set 60 and optical receiver 80 are provided, the optical transmitting set 60 and the optical receiver 80 are set to work platform
The opposite both sides of substrate 200 on 100；
In mouth gold 30, X is while photoresist 300 are coated with along the first direction on the substrate 200,60 He of optical transmitting set
The optical receiver 80 follows golden 30 synchronizing movings of the mouth；
The optical transmitting set 60 emits beam 70, and the light 70 penetrates the photoresist 300 and connect by the optical receiver 80
It receives；
The light 70 received is converted to electric signal, and the electric signal transmission is extremely controlled by the optical receiver 80
Product 90；
The control piece 90 compares the electric signal with standard signal, so that it is determined that whether the photoresist 300 reaches
Mark.
Further, the control piece 90 includes memory module 91 and signal processing module 92, and the memory module 91 is deposited
Store up the standard signal for the zero defect photoresist that the optical receiver 80 transmits, the signal processing module 92 is by the electric signal and institute
Standard signal is stated to be compared.
Further, guide rail 110 on the work platform 100 is set, the guide rail 110 is set along the first direction X,
The optical transmitting set 60 and the optical receiver 80 are set on the guide rail 110.
Further, position of the guide rail 110 on the work platform 100 can adjust.
Fig. 8 is please referred to, Fig. 8 is that the control piece 90 of the photoresist real-time detection apparatus of the present invention compares detection signal
Schematic diagram, abscissa is the distance of initial position that is coated on substrate 200 of positional distance of the photoresist 300 of detection in figure, single
Position is millimeter (mm), and ordinate is the voltage for the electric signal that optical receiver 80 is fed back, and unit is millivolt (mV), and test pattern is light
Resistance 300 does not have defective figure, as shown by the solid line in the drawings, compared with test pattern, in same distance, voltage it is higher be
The partially thin figure of 300 film thickness of photoresist, as shown in dotted line long in figure, low voltage is the partially thick figure of 300 film thickness of photoresist, is such as schemed
Shown in chain lines, such as there is the phenomenon that voltage is higher in 300 initiating terminal of photoresist, illustrate that initiating terminal is defective, such as rupture of membranes
The phenomenon that.Voltage is higher or the relatively low light 70 received with optical receiver 80 number and light intensity have relationship, it is however generally that, it is electric
The higher light more than 70 for illustrating optical receiver 80 and receiving is pressed, light intensity is big, further relates to compared with not having defective photoresist 300,
Photoresist 300 by light it is more, then the film thickness of photoresist 300 is partially thin, and low voltage illustrates the light that optical receiver 80 receives
70 is few, light intensity is weak, further relates to compared with not having defective photoresist 300, photoresist 300 by light it is less, then photoresist 300
Film thickness is partially thick, rupture of membranes phenomenon, can generate the phenomenon that film thickness is partially thin in the position for rupture of membranes occur, then the position light of the photoresist 300
70 light and light intensity is significantly more than other positions, can generate the phenomenon that voltage increases in the position, therefore, pass through control piece
The comparison of the figure of 90 pairs of detection signals can obtain the situation up to standard of photoresist 300.
When further, when the detection of control piece 90 obtains (film thickness is partially thick, film thickness is partially thin or rupture of membranes when) not up to standard the phenomenon that,
Alarm can be sent out, operating personnel is reminded to handle abnormal, so as to note abnormalities in real time, yield can be significantly improved.
Above disclosed be only a kind of better embodiment of the present invention, cannot limit the present invention's with this certainly
Interest field, one of ordinary skill in the art will appreciate that realizing all or part of flow of the above embodiment, and Yi Benfa
The equivalent variations that bright claim is made still fall within and invent covered range.
Claims (10)
1. a kind of photoresist real-time detection apparatus, which is characterized in that including work platform, the substrate being set on the work platform, mouth gold, institute
Mouth gold is stated for being coated with photoresist on the substrate, be additionally provided on the work platform detection optics and with the detection optics
The control piece of electrical connection, the mouth gold the substrate along the first direction on be coated with photoresist when, the detection optics are to described
Photoresist is detected, and feeds back detection signal to the control piece, the control piece by the detection signal and standard signal into
Row compares and determines whether the photoresist is up to standard.
2. photoresist real-time detection apparatus as described in claim 1, which is characterized in that the control piece includes memory module and letter
Number processing module, the memory module is for storing the standard signal of zero defect photoresist that the detection optics are fed back, institute
Signal processing module is stated for the detection signal to be compared with the standard signal.
3. photoresist real-time detection apparatus as described in claim 1, which is characterized in that the detection optics are included in the base
The optical transmitting set and optical receiver that plate both sides are oppositely arranged, the optical transmitting set emit beam, and the light penetrates the photoresist
It is received by the optical receiver, the optical transmitting set and the optical receiver follow the mouth gold to move the first direction is synchronous
It is dynamic.
4. photoresist real-time detection apparatus as claimed in claim 3, which is characterized in that the institute that the optical receiver can will receive
It states light and is converted to electric signal, and by the electric signal transmission to the control piece.
5. photoresist real-time detection apparatus as claimed in claim 3, which is characterized in that the optical transmitting set and the optical receiver
It is set on guide rail, the guide rail is set on the work platform and extends along the first direction.
6. a kind of photoresist real-time detection method, which is characterized in that include the following steps：
An optical transmitting set and optical receiver are provided, the substrate that the optical transmitting set and the optical receiver are set on work platform is opposite
Both sides；
While mouth gold is coated with photoresist on the substrate along the first direction, the optical transmitting set and the optical receiver follow
The mouth gold synchronizing moving；
The optical transmitting set emits beam, and the light penetrates the photoresist and received by the optical receiver；
The light received is converted to electric signal by the optical receiver, and by the electric signal transmission to control piece；
The control piece compares the electric signal with standard signal, so that it is determined that whether the photoresist is up to standard.
7. photoresist real-time detection method as claimed in claim 6, which is characterized in that the control piece includes memory module and letter
Number processing module, the memory module store the standard signal of the zero defect photoresist of the optical receiver transmission, at the signal
Reason module compares the electric signal and the standard signal.
8. photoresist real-time detection method as claimed in claim 6, which is characterized in that guide rail is set on the work platform, by institute
It states guide rail to set along the first direction, the optical transmitting set and the optical receiver is set on the guide rail.
9. photoresist real-time detection method as claimed in claim 8, which is characterized in that position of the guide rail on the work platform
It can adjust.
10. a kind of light blockage coating equipment, which is characterized in that detect dress in real time including the photoresist as described in claim 1 to 5 is any
It puts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711445985.9A CN108170004A (en) | 2017-12-27 | 2017-12-27 | Photoresist real-time detection apparatus, photoresist real-time detection method and light blockage coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711445985.9A CN108170004A (en) | 2017-12-27 | 2017-12-27 | Photoresist real-time detection apparatus, photoresist real-time detection method and light blockage coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108170004A true CN108170004A (en) | 2018-06-15 |
Family
ID=62518460
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711445985.9A Pending CN108170004A (en) | 2017-12-27 | 2017-12-27 | Photoresist real-time detection apparatus, photoresist real-time detection method and light blockage coating equipment |
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| Country | Link |
|---|---|
| CN (1) | CN108170004A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI714301B (en) * | 2019-10-08 | 2020-12-21 | 由田新技股份有限公司 | Defect of photoresist chip detection system and method thereof |
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Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant after: TCL China Star Optoelectronics Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Applicant before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
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