CN107870081A - Test high power UV laser M2The detection means of the factor - Google Patents
Test high power UV laser M2The detection means of the factor Download PDFInfo
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- CN107870081A CN107870081A CN201711059474.3A CN201711059474A CN107870081A CN 107870081 A CN107870081 A CN 107870081A CN 201711059474 A CN201711059474 A CN 201711059474A CN 107870081 A CN107870081 A CN 107870081A
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- laser
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- shaped mirrors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
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Abstract
The present invention relates to one kind test high power UV laser M2The detection means of the factor, including laser adjustment seat, attenuation system and M2Factor measuring instrument；Detection means also includes the first aperture, second orifice diaphragm, the first total reflective mirror and the second total reflective mirror, first aperture and second orifice diaphragm are removable installed in attenuation system, the reflecting surface of first total reflective mirror and the second total reflective mirror is oppositely arranged, and can be relatively rotated.The light path of attenuation system can be formulated as being available for M by the first aperture and second orifice diaphragm2Factor measuring instrument carries out M2The state of the factor, so when carrying out batch testing to laser, adjustment attenuation system can not had to, the laser emitting direction of laser is only adjusted by laser adjustment seat and the first total reflective mirror and the second total reflective mirror, make light beam while pass the first aperture and second orifice diaphragm, just complete testing laser device and M2Light is debugged between factor measuring instrument, to improve detection efficiency.
Description
Technical field
The invention belongs to laser assistance field, more particularly to a kind of detection means test high power UV laser M2
The detection means of the factor.
Background technology
Laser beam quality M2The factor is known as evaluating an important finger of the quality of Optical Maser System by international light circle
Mark.It is different with refraction angle typically using 1064nm and 532nm and frequency generation 355nm ultraviolet lights in high power UV laser
Form the light of two kinds of different wave lengths is separated.Because debugging difference, the ultraviolet light of laser output may result in slightly not
Same deflection angle.Therefore the M of such high power UV laser is being tested2When, every laser all needs and M2Factor measuring instrument enters
Row is debugged to light repeatedly.
However, current detection means needs to calibrate light path repeatedly when laser is carried out and debugs light.At the same time,
The high power-beam for needing rational configuration attenuation factor to export laser decays, and regulation is extremely onerous, and causes list
Platform laser M2The cycle of factor test is longer, is unfavorable for the M of batch testing laser2The factor, influence the outbound of industrial laser
Speed.
The content of the invention
Based on this, it is necessary to which quick test high power UV laser M can be realized by providing one kind2The detection dress of the factor
Put.
One kind test high power UV laser M2The detection means of the factor, including laser adjustment seat, attenuation system
System and M2Factor measuring instrument；The laser adjustment seat is used for the laser emitting direction for adjusting testing laser device, swashs to be measured
The laser of light device is transmitted to the M through the attenuation system2Factor measuring instrument carries out M2The factor is tested；The detection means
Also include the first aperture, second orifice diaphragm, the first total reflective mirror and the second total reflective mirror, first aperture and described
Second orifice diaphragm is removable installed in the attenuation system, for calibrating the laser of testing laser device through the light
Road attenuation factor is transmitted to the M2The light path of factor measuring instrument；The reflecting surface of first total reflective mirror and the second total reflective mirror is relative
Set, and can relatively rotate, be adjusted with the direction of attenuation system described in the laser light incident to laser to be measured.
In one of the embodiments, the attenuation system includes first order damping assemblies, second level damping assemblies
And bandpass filter, the laser after first total reflective mirror and the regulation of the second total reflective mirror pass through the first order decay group successively
After part, second level damping assemblies and bandpass filter are decayed, into the M2Factor measuring instrument carries out M2The factor is tested.
In one of the embodiments, the detection means also includes sealing duct, the bandpass filter and the M2
Factor measuring instrument is connected by the sealing duct.
In one of the embodiments, the first order damping assemblies include half slide and polarizer；Half slide is set
Between second total reflective mirror and the polarizer, the side of the polarizer is provided with one-level cone, incides described inclined
The laser part on piece of shaking is reflected in the one-level cone, and another part is through the polarizer and through described second
Level damping assemblies incide M after being decayed2Factor measuring instrument.
In one of the embodiments, first aperture be located at second total reflective mirror and half slide it
Between, the second orifice diaphragm is between the polaroid and the second level damping assemblies.
In one of the embodiments, the second level damping assemblies include multiple wedge-shaped mirrors being correspondingly arranged and two level hides
Light cylinder, and the reflecting surface of the adjacent wedge-shaped mirrors is oppositely arranged, transmission light path quilt of the laser between multiple wedge-shaped mirrors
It is arranged to：By the laser of wedge-shaped mirrors, a part is reflected onto the latter wedge-shaped mirrors, and another part is transmitted to accordingly from wedge-shaped mirrors
Two level cone in.
In one of the embodiments, the reflectivity of the wedge-shaped mirrors is 3%~5%.
In one of the embodiments, the wedge-shaped mirrors have 4, respectively the first wedge-shaped mirrors, the second wedge-shaped mirrors, the 3rd
Wedge-shaped mirrors and the 4th wedge-shaped mirrors, first wedge-shaped mirrors, second wedge-shaped mirrors, the 3rd wedge-shaped mirrors and the 4th wedge shape
Mirror is set in turn between the polarizer and the bandpass filter, and the laser after first order decay is successively through the
One wedge-shaped mirrors, the second wedge-shaped mirrors, the 3rd wedge-shaped mirrors and the 4th wedge-shaped mirrors reflect and are ultimately incident upon bandpass filter.
In one of the embodiments, the laser adjustment seat includes level(l)ing mechanism, vertical governor motion and turned
Motivation structure, the level(l)ing mechanism are used for the horizontal level for adjusting testing laser device, and the vertical governor motion is used to adjust
The vertical position of testing laser device, the rotating mechanism are used for the laser emitting angle for adjusting testing laser device.
In one of the embodiments, the detection means also includes aligner, and the aligner is complete close to described first
One end of anti-mirror is relative with the center of rotation of first total reflective mirror.
A kind of test high power UV laser M provided by the invention2The detection means of the factor, pass through the first aperture
The light path of attenuation system can be formulated as being available for M with second orifice diaphragm2Factor measuring instrument carries out M2The state of the factor,
So when carrying out batch testing to laser, adjustment attenuation system can not had to, it is only necessary to pass through laser adjustment seat
And first total reflective mirror and the second total reflective mirror adjustment laser laser emitting direction, make light beam while pass the first aperture
With second orifice diaphragm, testing laser device and M are just completed2Light is debugged between factor measuring instrument, to improve detection efficiency.
Brief description of the drawings
Fig. 1 is the test high power UV laser M of an embodiment2The structure chart of the detection means of the factor.
Embodiment
For the ease of understanding the present invention, the present invention is described more fully below with reference to relevant drawings.In accompanying drawing
Give the better embodiment of the present invention.But the present invention can realize in many different forms, however it is not limited to herein
Described embodiment.On the contrary, the purpose for providing these embodiments is to make to understand more the disclosure
Add thorough and comprehensive.
It should be noted that when element is referred to as " being fixed on " another element, it can be directly on another element
Or there may also be element placed in the middle.When an element is considered as " connection " another element, it can be directly connected to
To another element or it may be simultaneously present centering elements.Term as used herein " interior ", " outer ", "left", "right" and
For illustrative purposes only, it is unique embodiment to be not offered as similar statement.
Refering to Fig. 1, a kind of detection means of test high power UV laser factor of an embodiment, including laser
Adjustment seat 10, attenuation system and M2Factor measuring instrument 100.
In the embodiment, laser adjustment seat 10 is used for the laser emitting direction for adjusting testing laser device 20, and makes to swash
The laser of light device 20 can accurately incide attenuation system and be decayed, and the laser after overdamping is transferred to M2Cause
Sub- measuring instrument 100 carries out M2The factor is tested.It is that is, most in laser after attenuation system is decayed
Light beam is filtered, and only least a portion of light beam enters M2Factor measuring instrument 100 carries out M2The factor is tested, so as to avoid high power
Laser damage M2Factor measuring instrument 100.
It should be noted that testing laser device 20 is fixed in laser adjustment seat 10, laser adjustment seat 10 can divide
The other laser emitting angle to the horizontal level of laser 20 to be measured, vertical position and laser 20 is adjusted, and makes adjustment
Laser afterwards incides attenuation system with accurate direction and decayed.In present embodiment, laser adjustment seat 10 is wrapped
Level(l)ing mechanism 11, vertical governor motion 12 and rotating mechanism 13 are included, level(l)ing mechanism 11 is used to adjust testing laser device
20 horizontal level, vertical governor motion 12 are used for the vertical position for adjusting testing laser device 20, and rotating mechanism 13 is used to adjust
The laser emitting angle of testing laser device 20.Specifically, level(l)ing mechanism 11 can be to laser 20 parallel to work
Translated in platform (not shown)；Vertical governor motion 12 can carry out upper downward to laser 20 with respect to workbench
Section, makes the shoot laser in certain working depth of laser 20；Rotating mechanism 13 can rotate to laser 20, and then make
Testing laser device 20 is obtained laser light incident is decayed to attenuation system with certain shooting angle.
, can be by other knots when the laser emitting direction of laser 20 to be measured is adjusted laser adjustment seat 10
The chi mark that structure is adjusted as direction.For example, aligner (not shown) is set on the table, in swashing for testing laser device 20
When light ray passes aligner, laser can be incided accurately in attenuation system.Due to laser 20 export it is ultraviolet
Small deflection angle occurs in light, and M is being carried out to high power ultraviolet laser 202When the factor is tested, it can influence to test effect.
Need that the laser after the adjustment of laser adjustment seat 10 is adjusted so that laser more accurately incides attenuation
In system.
Specifically, as shown in figure 1, the first aperture 50, second orifice diaphragm 70, first are set in the detection means
The total reflective mirror 40 of total reflective mirror 30 and second.Wherein, the first aperture 50 and second orifice diaphragm 70 are removable installed in light path
In attenuation factor, school can be carried out to the light path of attenuation system by the first aperture 50 and second orifice diaphragm 70
Standard, make to be in M by the light beam of the attenuation factor2In the working range of factor measuring instrument 100.
In above-mentioned embodiment, in debugging detection device, by the way that attenuation system is adjusted, make through first
The laser of aperture 50 and second orifice diaphragm 70 can effectively be decayed by attenuation system, that is to say, that now
Attenuation system light path by reasonable disposition, fixes the attenuation system and M2The light path of factor measuring instrument 100 is set.
The detection means being armed carries out M to laser 20 to be measured2When the factor is tested, due to through the first aperture 50 and second
The laser of aperture 70 can effectively be decayed by attenuation system, therefore, need to only adjust the laser of testing laser device 20
It is made into also cross the first aperture 50 and second orifice diaphragm 70, you can with by testing laser device 20 and M2Factor measuring instrument
Light path between 100 configures, that is to say, that in present embodiment, the first aperture 50 and second orifice diaphragm 70 can be with
The light modulation standard unified as one, the laser for calibrating testing laser device 20 are transmitted to M through attenuation system2The factor is surveyed
Measure the light path of instrument 100.
It should be noted that in above-mentioned embodiment, the reflecting surface of the first total reflective mirror 30 and the second total reflective mirror 40 is relative to be set
Put, and can relatively rotate, be adjusted with the direction of the laser light incident light path attenuation factor to laser 20 to be measured.
Specifically, the laser light incident of testing laser device 20 reflexes to after the first total reflective mirror 30 through the first total reflective mirror 30
Two total reflective mirrors 40 carry out secondary reflection.Due to that can be relatively rotated between the first total reflective mirror 30 and the second total reflective mirror 40, Jin Erke
So that the transmission direction of the laser of testing laser device 20 to be adjusted, make the light beam after adjustment also cross the first aperture 50
With second orifice diaphragm 70.Because the first aperture 50 and second orifice diaphragm 70 are removable installed in attenuation system
In, therefore, the first aperture 50 can be removed after the light path between testing laser device 20 and attenuation system is adjusted
With second orifice diaphragm 70, so as to avoid the first aperture 50 and second orifice diaphragm 70 from being in the light, M is influenceed2Factor measuring instrument
The laser of 100 pairs of lasers 20 to be measured carries out M2The factor tests effect.
The laser emitting direction of laser 20 to be measured is adjusted it should be noted that being adjusted by laser adjustment seat 10
, can be by the axis of rotation of laser light incident to the first total reflective mirror 30 after section.That is, the first total reflective mirror 30 is all-trans in second
Mirror 40 relatively rotate when, the first total reflective mirror 30 to laser reflection adjustment be based on unified incidence point, and then can by turn
Dynamic first total reflective mirror 30 quickly adjusts exit direction of the laser after the first total reflective mirror 30.In the present embodiment, can will be right
Quasi- device is relative with the center of rotation of the first total reflective mirror 30 close to one end of the first total reflective mirror 30, i.e., center of rotation is located across being aligned
Where the laser of device on straight line；That is, inciding the laser of the first total reflective mirror 30 along aligner, to incide first complete
The axis of rotation of anti-mirror 30.It is used as the reference in laser light incident direction using aligner, will quickly can be adjusted by laser
Laser after section seat 10 is adjusted accurately is incided on the axis of rotation of the first total reflective mirror 30.
In above-mentioned embodiment, aligner is provided in the calibration console on workbench, is provided with calibration console complete towards first
The calibration slit that anti-mirror 30 extends.It should be noted that institute of the axis of rotation of the first total reflective mirror 30 positioned at calibration slit extension
On straight line, when the laser after the regulation of laser adjustment seat 10 is hinted obliquely in the calibration slit, i.e., when testing laser device 20
Laser emitting direction with calibration slit bearing of trend coincide when, testing laser device 20 laser emitting direction alignment first
The axis of rotation of total reflective mirror 30.
As shown in figure 1, attenuation system includes first order damping assemblies 60, second level damping assemblies 80 and bandpass filter
Piece 90, the laser after the first total reflective mirror 30 and the regulation of the second total reflective mirror 40 is successively by first order damping assemblies 60, the second level
After damping assemblies 80 and bandpass filter 90 are decayed, into M2Factor measuring instrument 100 carries out M2The factor is tested.
First order damping assemblies 60 include half slide 61 and polarizer 62；Half slide 61 is located at the second total reflective mirror 40 and polarization
Between piece 62, the side of polarizer 62 is provided with one-level cone 63, and the laser part incided on polarizer 62 is reflected to
In one-level cone 63, another part through polarizer 62 and incides M after second level damping assemblies 80 are decayed2The factor
Measuring instrument 100.It should be noted that by adjusting half slide 61 most of laser can be made to reflex to one-level through polarizer 62
In cone 63, and only a small amount of light beam can enter two level damping assemblies and further decay, so as to which the power attenuation of laser be arrived
Suitable scope, for M2Factor measuring instrument 100 is tested.
In above-mentioned embodiment, the first aperture 50 is between the second total reflective mirror 40 and half slide 61, second orifice
Diaphragm 70 is between polaroid and second level damping assemblies 80.Because attenuation system is by the first aperture 50 and the
Two apertures 70 have carried out standard correction, that is to say, that by the first aperture 50 and the laser of second orifice diaphragm 70
Effective attenuation can be carried out by attenuation system.Therefore, the first aperture 50 and second orifice diaphragm 70 are arranged on
The both sides of one-level damping assemblies 60, you can be carried out when adjusting the laser light incident first order damping assemblies 60 of testing laser device 20
Light path is corrected, and operation is simplicity, it is not necessary to whole light path system is repeatedly corrected, and only needs to be all-trans by adjustment first
The total reflective mirror 40 of mirror 30 and second makes the light path after regulation while completed by the first aperture 50 and second orifice diaphragm 70
The configuration of optical system for testing, and then testing efficiency is improved, realize the M of batch testing laser 202The factor.
Second level damping assemblies 80 include multiple wedge-shaped mirrors being correspondingly arranged and two level cone, and adjacent wedge-shaped mirrors
Reflecting surface is oppositely arranged, and transmission light path of the laser between multiple wedge-shaped mirrors is arranged to：By the laser of wedge-shaped mirrors, a part
The latter wedge-shaped mirrors are reflected onto, another part is transmitted in corresponding two level cone from wedge-shaped mirrors.In present embodiment, wedge
The reflectivity of shape mirror is 3%~5% so that only a small amount of light beam is reflected to M2Factor measuring instrument 100, most light beam pass through
Wedge-shaped mirrors are collected by two level cone, avoid injecting environment and triggering security incident.
Specifically, wedge-shaped mirrors have 4, respectively the first wedge-shaped mirrors 81, the second wedge-shaped mirrors 83, the 3rd wedge-shaped mirrors 85 and the
Four wedge-shaped mirrors 87, accordingly, two level cone are also 4, respectively the first cone 82, the second cone 84, the 3rd cone
86 and the 4th cone 88.First wedge-shaped mirrors 81, the second wedge-shaped mirrors 83, the 3rd wedge-shaped mirrors 85 and the 4th wedge-shaped mirrors 87 are set gradually
Between polarizer 62 and bandpass filter 90, the laser after the first order decays is successively through the first wedge-shaped mirrors 81, the second wedge
Shape mirror 83, the 3rd wedge-shaped mirrors 85 and the 4th wedge-shaped mirrors 87 reflect and are ultimately incident upon bandpass filter 90.
In above-mentioned embodiment, the first cone 82 is located at the side of the first wedge-shaped mirrors 81, to receive from the first wedge-shaped mirrors 81
The light beam transmitted；Second cone 84 is located at the side of the second wedge-shaped mirrors 83, to receive the light transmitted from the second wedge-shaped mirrors 83
Beam；3rd cone 86 is located at the side of the 3rd wedge-shaped mirrors 85 3, to receive the light beam transmitted from the 3rd wedge-shaped mirrors 85；4th shading
Cylinder 88 is located at the side of the 4th wedge-shaped mirrors 87 4, to receive the light beam transmitted from the 4th wedge-shaped mirrors 87.To avoid laser from injecting environment
And produce potential safety hazard.It should be noted that in the present embodiment, the light beam after polarizer 62 is decayed incides
On first wedge-shaped mirrors 81, a part of light beam is reflexed on the second wedge-shaped mirrors 83 by the first wedge-shaped mirrors 81, and another part light beam passes through
First wedge-shaped mirrors 81 are incided in the first cone 82.Accordingly, reflexed to through the first wedge-shaped mirrors 81 on the second wedge-shaped mirrors 83
Light beam can be decayed again by the second wedge-shaped mirrors 83, and only segment beam is reflected on latter wedge-shaped mirrors.In present embodiment, light
Beam passes through the multiple reflections of multiple wedge-shaped mirrors, and every time when passing through wedge-shaped mirrors, most of light beam is transmitted to corresponding cone
It is interior, and only segment beam is finally decayed again through bandpass filter 90.Thus, the laser power of testing laser device can be by
Microwatt magnitude is decayed to, meets M2The test condition of factor measuring instrument 100, carry out the M of testing laser device2The factor is tested.
In above-mentioned embodiment, detection means also includes sealing duct 91, bandpass filter 90 and M2Factor measuring instrument 100
It is connected by sealing duct 91.And then can be by the beam Propagation after bandpass filter 90 is decayed to M2Factor measuring instrument
100 are tested.
Each technical characteristic of embodiment described above can be combined arbitrarily, to make description succinct, not to above-mentioned reality
Apply all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, the scope that this specification is recorded all is considered to be.
Embodiment described above only expresses the several embodiments of the present invention, and its description is more specific and detailed, but simultaneously
Can not therefore it be construed as limiting the scope of the patent.It should be pointed out that come for one of ordinary skill in the art
Say, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the protection of the present invention
Scope.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (10)
1. one kind test high power UV laser M2The detection means of the factor, it is characterised in that including laser adjustment seat, light
Road attenuation factor and M2Factor measuring instrument；The laser adjustment seat is used for the laser emitting direction for adjusting testing laser device, with
The laser of testing laser device is transmitted to the M through the attenuation system2Factor measuring instrument carries out M2The factor is tested；It is described
Detection means also includes the first aperture, second orifice diaphragm, the first total reflective mirror and the second total reflective mirror, the first aperture light
Late and described second orifice diaphragm is removable installed in the attenuation system, for calibrating the laser of testing laser device
Transmitted through the attenuation system to the M2The light path of factor measuring instrument；First total reflective mirror and the second total reflective mirror it is anti-
The face of penetrating is oppositely arranged, and can be relatively rotated, and is carried out with the direction of attenuation system described in the laser light incident to laser to be measured
Regulation.
2. detection means according to claim 1, it is characterised in that the attenuation system includes first order decay group
Part, second level damping assemblies and bandpass filter, the laser after first total reflective mirror and the regulation of the second total reflective mirror pass through successively
Cross after the first order damping assemblies, second level damping assemblies and bandpass filter decayed, into the M2The factor measures
Instrument carries out M2The factor is tested.
3. detection means according to claim 2, it is characterised in that the detection means also includes sealing duct, described
Bandpass filter and the M2Factor measuring instrument is connected by the sealing duct.
4. detection means according to claim 2, it is characterised in that the first order damping assemblies are including half slide and partially
Shake piece；Half slide is located between second total reflective mirror and the polarizer, and the side of the polarizer hides provided with one-level
Light cylinder, incide the laser part on the polarizer and be reflected in the one-level cone, described in another part transmission
Polarizer simultaneously incides M after the second level damping assemblies are decayed2Factor measuring instrument.
5. detection means according to claim 4, it is characterised in that first aperture is all-trans positioned at described second
Between mirror and half slide, the second orifice diaphragm is between the polaroid and the second level damping assemblies.
6. according to the detection means described in claim any one of 2-5, it is characterised in that the second level damping assemblies include more
The individual wedge-shaped mirrors being correspondingly arranged and two level cone, and the reflecting surface of the adjacent wedge-shaped mirrors is oppositely arranged, laser is multiple
Transmission light path between the wedge-shaped mirrors is arranged to：By the laser of wedge-shaped mirrors, a part is reflected onto the latter wedge-shaped mirrors,
Another part is transmitted in corresponding two level cone from wedge-shaped mirrors.
7. detection means according to claim 6, it is characterised in that the reflectivity of the wedge-shaped mirrors is 3%~5%.
8. detection means according to claim 6, it is characterised in that the wedge-shaped mirrors have 4, the respectively first wedge shape
Mirror, the second wedge-shaped mirrors, the 3rd wedge-shaped mirrors and the 4th wedge-shaped mirrors, first wedge-shaped mirrors, second wedge-shaped mirrors, the 3rd wedge
Shape mirror and the 4th wedge-shaped mirrors are set in turn between the polarizer and the bandpass filter, are declined by the first order
Laser after subtracting reflects and is ultimately incident upon through the first wedge-shaped mirrors, the second wedge-shaped mirrors, the 3rd wedge-shaped mirrors and the 4th wedge-shaped mirrors successively
Bandpass filter.
9. detection means according to claim 1, it is characterised in that the laser adjustment seat includes Level tune machine
Structure, vertical governor motion and rotating mechanism, the level(l)ing mechanism is used for the horizontal level for adjusting testing laser device, described perpendicular
Straight governor motion is used for the vertical position for adjusting testing laser device, and the laser that the rotating mechanism is used to adjust testing laser device goes out
Firing angle degree.
10. detection means according to claim 9, it is characterised in that the detection means also includes aligner, described right
Quasi- device is relative with the center of rotation of first total reflective mirror close to one end of first total reflective mirror.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711059474.3A CN107870081B (en) | 2017-11-01 | 2017-11-01 | Testing of high Power ultraviolet lasers M2Factor detection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711059474.3A CN107870081B (en) | 2017-11-01 | 2017-11-01 | Testing of high Power ultraviolet lasers M2Factor detection device |
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| Publication Number | Publication Date |
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| CN107870081A true CN107870081A (en) | 2018-04-03 |
| CN107870081B CN107870081B (en) | 2020-06-09 |
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| CN1766531A (en) * | 2005-09-28 | 2006-05-03 | 中国科学院上海光学精密机械研究所 | Laser beam mass M2Factor real-time detector |
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| JP2009065064A (en) * | 2007-09-10 | 2009-03-26 | Ricoh Co Ltd | Monitoring device, light source apparatus, optical scanning apparatus, and image forming device |
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| CN102494639A (en) * | 2011-10-18 | 2012-06-13 | 北京理工大学 | Laser divergence angle measuring device and measuring method based on full-automatic hole alignment method |
| CN103017664A (en) * | 2012-11-28 | 2013-04-03 | 中国计量科学研究院 | Method and system for calibrating laser beam analyzer |
| CN104006892A (en) * | 2014-05-22 | 2014-08-27 | 华中科技大学 | Device and method for measuring quality of laser beam and light path collimating method |
| CN105680300A (en) * | 2016-04-29 | 2016-06-15 | 江苏师范大学 | Accurate calibration method for He-Ne |
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2017
- 2017-11-01 CN CN201711059474.3A patent/CN107870081B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1766531A (en) * | 2005-09-28 | 2006-05-03 | 中国科学院上海光学精密机械研究所 | Laser beam mass M2Factor real-time detector |
| JP2009065064A (en) * | 2007-09-10 | 2009-03-26 | Ricoh Co Ltd | Monitoring device, light source apparatus, optical scanning apparatus, and image forming device |
| CN101393050A (en) * | 2008-11-07 | 2009-03-25 | 四川大学 | Laser beam M* factor matrix measuring method and measuring instrument |
| CN102445280A (en) * | 2011-10-18 | 2012-05-09 | 中国科学院光电技术研究所 | Detection device and method for small hole calibration |
| CN102494639A (en) * | 2011-10-18 | 2012-06-13 | 北京理工大学 | Laser divergence angle measuring device and measuring method based on full-automatic hole alignment method |
| CN103017664A (en) * | 2012-11-28 | 2013-04-03 | 中国计量科学研究院 | Method and system for calibrating laser beam analyzer |
| CN104006892A (en) * | 2014-05-22 | 2014-08-27 | 华中科技大学 | Device and method for measuring quality of laser beam and light path collimating method |
| CN105680300A (en) * | 2016-04-29 | 2016-06-15 | 江苏师范大学 | Accurate calibration method for He-Ne |
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| Publication number | Publication date |
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| CN107870081B (en) | 2020-06-09 |
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