CN107863181A - A kind of ITO conducting films - Google Patents
A kind of ITO conducting films Download PDFInfo
- Publication number
- CN107863181A CN107863181A CN201610961045.4A CN201610961045A CN107863181A CN 107863181 A CN107863181 A CN 107863181A CN 201610961045 A CN201610961045 A CN 201610961045A CN 107863181 A CN107863181 A CN 107863181A
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- conductive film
- ito
- thickness
- film layers
- resin matrix
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
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Abstract
The invention discloses a kind of ITO conducting films, the conductive film structure is arranged in order from top to bottom sets matcoveredn, resin matrix, silver nanoparticle film layer, the first ITO conductive film layers, the 2nd ITO conductive film layers, tack coat and substrate layer；The first ITO conductive film layers and the 2nd ITO conductive film layers are transparent conductive film layer, and the refractive index of two conductive film layers is different, the thickness of the first ITO conductive film layers is 20 30nm, the thickness of 2nd ITO conductive film layers is 10 20nm, the thickness of the resin matrix is 110 140mm, the thickness of the silver nanoparticle film layer is 45 55nm, and the thickness of the tack coat is 20 50nm.The present invention provides a kind of ITO conducting films, and it is strong with resin matrix adhesion, transmitance is high, resistivity is low, chemical stability is good.
Description
Technical field
The present invention relates to optical technical field, and in particular to a kind of ITO conducting films.
Background technology
In recent years, advancing by leaps and bounds with semiconductor fabrication, such as photocell, flat-panel screens, LED illumination, touch
The new device such as screen is touched to develop rapidly and largely apply in our daily life.These new devices will use transparent lead
Electrolemma is as smooth surface either light-emitting area electrode.If the transmitance of the nesa coating in these devices, light can be improved
Battery can increase the absorption to light so as to change out more electricity, luminescent device can increase in the case where not increasing energy consumption
Brightness, touch-screen can improve brightness and definition；Equally, if the resistivity of nesa coating can be reduced, light can be reduced
The transmission loss of battery and luminescent device, improve energy utilization rate.Nowadays, photocell and the annual yield of all kinds of luminescent devices with
Hundred million calculate, and in today that energy resources are increasingly in short supply, lifting nesa coating transmitance, reduce its sheet resistance, can save a large amount of energy
Source, its economic value are self-evident with the value of environmental protection.In the nesa coating of routine, ITO（Tin indium oxide mixture）
Film is the most frequently used, and one kind that performance is best.ITO is a kind of mixture of tin oxide and indium sesquioxide, not only electric conductivity
With the transparency better than other such as：The materials such as AZO, alundum (Al2O3), and with the height not available for other nesa coatings
Hardness and high chemical stability, so, at present in large-scale production, select materials of the ITO as nesa coating mostly.
In film layer design, more preferable transmitance is obtained, air, film, the refractive index of substrate must carry out good matching, to individual layer
For single refractive index plated film, if plated film refractive index square is multiplied by substrate refractive index equal to air refraction, then theoretical
The reflectivity of upper plated film will minimize.
Existing ito film, ITO layer and resin matrix adhesion are poor, and resistivity is high, transmitance is poor and poor chemical stability,
Production requirement can not be met.In addition, in the case of the monofilm growth technique of single refractive index, relatively low reflection is obtained
Rate, it is necessary to using the high oxidation ITO compared with low-refraction, so the sheet resistance of ito film can be caused to greatly increase, so as to cause device
Increase the waste of electric energy during work.
The content of the invention
Based on this, in view of the above-mentioned problems, be necessary to propose a kind of ITO conducting films, it is strong with resin matrix adhesion, passes through
Rate is high, resistivity is low, chemical stability is good.
The technical scheme is that：
A kind of ITO conducting films, the conductive film structure is arranged in order from top to bottom sets matcoveredn, resin matrix, silver nanofilm
Layer, the first ITO conductive film layers, the 2nd ITO conductive film layers, tack coat and substrate layer；The first ITO conductive film layers and second
ITO conductive film layers are transparent conductive film layer, and the refractive index of two conductive film layers is different, the first ITO conductive film layers
Thickness is 20-30nm, and the thickness of the 2nd ITO conductive film layers is 10-20nm, and the thickness of the resin matrix is 110-140mm, institute
The thickness for stating silver nanoparticle film layer is 45-55nm, and the thickness of the tack coat is 20-50nm.
In the technical program, using protective layer, resin matrix, silver nanoparticle film layer, the first ITO conductive film layers, the 2nd ITO
The mode that conductive film layer, tack coat and substrate layer are arranged in order from top to bottom, protect ITO conducting films in process of production not by
Scratch, while good matching is carried out to the refractive index of air and base material by choosing appropriate ito film layer combination, overcome
Conventional monolayers ito film refractive index is higher than caused by base material refractive index the problem of reflectivity increase, not only reaches using ito film
Do not increase reflectivity, the effect for making the visible light wave range average reflectance after film forming be less than 0.5% on the contrary, due to the second ito film layer
The suboxides ITO of high index of refraction can be used so that the sheet resistance of ito thin film prepared by this technique, per side, is far below less than 2 ohm
The sheet resistance of conventional monolayers unirefringence rate ito film, so as to reduce resistivity, reduces the consumption of electric energy.Also, ITO sinks every time
Crystallization process can be all undergone after product, has been effectively promoted the perfect crystallization of ITO layer.To sum up, the ITO described in the technical program is conductive
Film is strong with resin matrix adhesion, transmitance is high, resistivity is low, chemical stability is good.
In a preferred embodiment, the resin matrix is that thickness ratio is 2-4:1 polyethylene terephthalate tree
Aliphatic radical body and the pressing of polyimide resin matrix form, and the silver nanoparticle film layer is located at below polyimide resin matrix.Mesh
Be high osmosis and electric conductivity using Nano Silver, substantially increase adhesion between silver nanoparticle film layer and resin matrix and
The electric conductivity of the present invention, while the ratio of pet resin matrix and polyimide resin matrix is resin
Obvious action the most is played in the optimal proportion of matrix thickness, the enhancing of raising and adhesion to electric conductivity.
In further preferably embodiment, the refractive indexes of the first ITO conductive film layers is 2.0-2.2, described second
The refractive index of ITO conductive film layers is 1.4-1.5.Purpose is to match to cause greatly with the brand new technical compensated using double reflective index
Ground eliminates the problem of ITO nesa coating product etching line is obvious.
In further preferably embodiment, the substrate layer is PET.Purpose is that it has excellent physical property, changed
Performance and dimensional stability, the transparency and recuperability are learned, there is Electrostatic Absorption function, the conducting film is had more stability,
Play a part of protection.
In still more preferably embodiment, the protective layer is metallic copper Nitinol film layer.Purpose is to film layer
Play a protective role.
In still more preferably embodiment, the thickness of the first ITO conductive film layers is 24nm, and the 2nd ITO is conductive
The thickness of film layer is 12nm, and the thickness of the resin matrix is 120mm, and the thickness of the silver nanoparticle film layer is 50nm, described viscous
The thickness for tying layer is 40nm.Purpose be still more preferably the first ITO conductive film layers, the 2nd ITO conductive film layers, resin matrix,
The thickness of silver nanoparticle film layer and tack coat, make can realizing and resin matrix adhesion is strong, transmitance is high, resistance for the conducting film
Rate is low and the good function of chemical stability, reduces cost again.
The beneficial effects of the invention are as follows：
1st, the conducting film and resin matrix adhesion are strong, transmitance is high, resistivity is low, chemical stability is good.
2nd, using the high osmosis and electric conductivity of Nano Silver, the knot between silver nanoparticle film layer and resin matrix is substantially increased
With joint efforts with the electric conductivity of the present invention, while the ratio of pet resin matrix and polyimide resin matrix
For the optimal proportion of resin matrix thickness, obvious action the most is played in the enhancing of raising and adhesion to electric conductivity.
3rd, matched using double reflective index and cause greatly to eliminate ITO nesa coating product etching line with the technology compensated
The problem of obvious.
4th, using PET base material layer, it has excellent physical property, chemical property and dimensional stability, the transparency and can
Recyclability, there is Electrostatic Absorption function, the conducting film is had more stability, play a part of protection.
Brief description of the drawings
Fig. 1 is the structural representation of ITO conducting films described in the embodiment of the present invention.
Description of reference numerals：
10- substrate layers；20- tack coats；30-ITO conducting films；The ITO conductive film layers of 301- the 2nd；The ITO conductive film layers of 302- the first；
40- silver nanoparticle film layers；50- resin matrixes；501- pet resin matrixes；502- polyimide resin bases
Body；60- protective layers.
Embodiment
Embodiments of the invention are described in detail below in conjunction with the accompanying drawings.
Embodiment 1：
As shown in figure 1, a kind of ITO conducting films, the conductive film structure is arranged in order from top to bottom sets matcoveredn 60, resin base
Body 50, silver nanoparticle film layer 40, the first ITO conductive film layers 301, the 2nd ITO conductive film layers 302, tack coat 20 and substrate layer 10；Institute
It is transparent conductive film layer to state the first ITO conductive film layers 301 and the 2nd ITO conductive film layers 302, and the refraction of two conductive film layers
Rate is different, and the thickness of the first ITO conductive film layers 301 is 20-30nm, and the thickness of the 2nd ITO conductive film layers 302 is 10-
20nm, the thickness of the resin matrix 50 are 110-140mm, and the thickness of the silver nanoparticle film layer 40 is 45-55nm, the bonding
The thickness of layer 20 is 20-50nm.
Embodiment 2：
As shown in figure 1, a kind of ITO conducting films, the conductive film structure is arranged in order from top to bottom sets matcoveredn 60, resin base
Body 50, silver nanoparticle film layer 40, the first ITO conductive film layers 301, the 2nd ITO conductive film layers 302, tack coat 20 and substrate layer 10；Institute
It is transparent conductive film layer to state the first ITO conductive film layers 301 and the 2nd ITO conductive film layers 302, and the refraction of two conductive film layers
Rate is different, and the thickness of the first ITO conductive film layers 301 is 20-30nm, and the thickness of the 2nd ITO conductive film layers 302 is 10-
20nm, the thickness of the resin matrix 50 are 110-140mm, and the thickness of the silver nanoparticle film layer 40 is 45-55nm, the bonding
The thickness of layer 20 is 20-50nm.
As shown in figure 1, it is 2-4 that the resin matrix 50, which is thickness ratio,:1 pet resin matrix
501 and polyimide resin matrix 502 pressing form, the silver nanoparticle film layer 40 be located under polyimide resin matrix 502
Side.
Embodiment 3：
As shown in figure 1, a kind of ITO conducting films, the conductive film structure is arranged in order from top to bottom sets matcoveredn 60, resin base
Body 50, silver nanoparticle film layer 40, the first ITO conductive film layers 301, the 2nd ITO conductive film layers 302, tack coat 20 and substrate layer 10；Institute
It is transparent conductive film layer to state the first ITO conductive film layers 301 and the 2nd ITO conductive film layers 302, and the refraction of two conductive film layers
Rate is different, and the thickness of the first ITO conductive film layers 301 is 20-30nm, and the thickness of the 2nd ITO conductive film layers 302 is 10-
20nm, the thickness of the resin matrix 50 are 110-140mm, and the thickness of the silver nanoparticle film layer 40 is 45-55nm, the bonding
The thickness of layer 20 is 20-50nm.
As shown in figure 1, it is 2-4 that the resin matrix 50, which is thickness ratio,:1 pet resin matrix
501 and polyimide resin matrix 502 pressing form, the silver nanoparticle film layer 40 be located under polyimide resin matrix 502
Side.
The refractive index of the first ITO conductive film layers 301 is 2.0-2.2, the refraction of the 2nd ITO conductive film layers 302
Rate is 1.4-1.5.
Embodiment 4：
As shown in figure 1, a kind of ITO conducting films, the conductive film structure is arranged in order from top to bottom sets matcoveredn 60, resin base
Body 50, silver nanoparticle film layer 40, the first ITO conductive film layers 301, the 2nd ITO conductive film layers 302, tack coat 20 and substrate layer 10；Institute
It is transparent conductive film layer to state the first ITO conductive film layers 301 and the 2nd ITO conductive film layers 302, and the refraction of two conductive film layers
Rate is different, and the thickness of the first ITO conductive film layers 301 is 20-30nm, and the thickness of the 2nd ITO conductive film layers 302 is 10-
20nm, the thickness of the resin matrix 50 are 110-140mm, and the thickness of the silver nanoparticle film layer 40 is 45-55nm, the bonding
The thickness of layer 20 is 20-50nm.
As shown in figure 1, it is 2-4 that the resin matrix 50, which is thickness ratio,:1 pet resin matrix
501 and polyimide resin matrix 502 pressing form, the silver nanoparticle film layer 40 be located under polyimide resin matrix 502
Side.
The refractive index of the first ITO conductive film layers 301 is 2.0-2.2, the refraction of the 2nd ITO conductive film layers 302
Rate is 1.4-1.5.
The substrate layer 10 is PET.
Embodiment 5：
As shown in figure 1, a kind of ITO conducting films, the conductive film structure is arranged in order from top to bottom sets matcoveredn 60, resin base
Body 50, silver nanoparticle film layer 40, the first ITO conductive film layers 301, the 2nd ITO conductive film layers 302, tack coat 20 and substrate layer 10；Institute
It is transparent conductive film layer to state the first ITO conductive film layers 301 and the 2nd ITO conductive film layers 302, and the refraction of two conductive film layers
Rate is different, and the thickness of the first ITO conductive film layers 301 is 20-30nm, and the thickness of the 2nd ITO conductive film layers 302 is 10-
20nm, the thickness of the resin matrix 50 are 110-140mm, and the thickness of the silver nanoparticle film layer 40 is 45-55nm, the bonding
The thickness of layer 20 is 20-50nm.
As shown in figure 1, it is 2-4 that the resin matrix 50, which is thickness ratio,:1 pet resin matrix
501 and polyimide resin matrix 502 pressing form, the silver nanoparticle film layer 40 be located under polyimide resin matrix 502
Side.
The refractive index of the first ITO conductive film layers 301 is 2.0-2.2, the refraction of the 2nd ITO conductive film layers 302
Rate is 1.4-1.5.
The substrate layer 10 is PET.
The protective layer 60 is metallic copper Nitinol film layer.
Embodiment 6：
As shown in figure 1, a kind of ITO conducting films, the conductive film structure is arranged in order from top to bottom sets matcoveredn 60, resin base
Body 50, silver nanoparticle film layer 40, the first ITO conductive film layers 301, the 2nd ITO conductive film layers 302, tack coat 20 and substrate layer 10；Institute
It is transparent conductive film layer to state the first ITO conductive film layers 301 and the 2nd ITO conductive film layers 302, and the refraction of two conductive film layers
Rate is different, and the thickness of the first ITO conductive film layers 301 is 20-30nm, and the thickness of the 2nd ITO conductive film layers 302 is 10-
20nm, the thickness of the resin matrix 50 are 110-140mm, and the thickness of the silver nanoparticle film layer 40 is 45-55nm, the bonding
The thickness of layer 20 is 20-50nm.
As shown in figure 1, it is 2-4 that the resin matrix 50, which is thickness ratio,:1 pet resin matrix
501 and polyimide resin matrix 502 pressing form, the silver nanoparticle film layer 40 be located under polyimide resin matrix 502
Side.
The refractive index of the first ITO conductive film layers 301 is 2.0-2.2, the refraction of the 2nd ITO conductive film layers 302
Rate is 1.4-1.5.
The substrate layer 10 is PET.
The protective layer 60 is metallic copper Nitinol film layer.
The thickness of the first ITO conductive film layers 301 is 24nm, and the thickness of the 2nd ITO conductive film layers 302 is 12nm, institute
The thickness for stating resin matrix 50 is 120mm, and the thickness of the silver nanoparticle film layer 40 is 50nm, and the thickness of the tack coat 20 is
40nm。
Embodiment described above only expresses the embodiment of the present invention, and its description is more specific and detailed, but can not
Therefore it is interpreted as the limitation to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art,
Without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the protection model of the present invention
Enclose.
Claims (6)
1. a kind of ITO conducting films, it is characterised in that the conductive film structure is arranged in order from top to bottom sets matcoveredn, resin
Matrix, silver nanoparticle film layer, the first ITO conductive film layers, the 2nd ITO conductive film layers, tack coat and substrate layer；First ITO is led
Electrolemma layer and the 2nd ITO conductive film layers are transparent conductive film layer, and the refractive index of two conductive film layers is different, and described first
The thickness of ITO conductive film layers is 20-30nm, and the thickness of the 2nd ITO conductive film layers is 10-20nm, the thickness of the resin matrix
For 110-140mm, the thickness of the silver nanoparticle film layer is 45-55nm, and the thickness of the tack coat is 20-50nm.
2. ITO conducting films according to claim 1, it is characterised in that the resin matrix is that thickness ratio is 2-4:Poly- pair of 1
PET resin matrix and the pressing of polyimide resin matrix form, and the silver nanoparticle film layer is located at sub- in polyamides
Below polyimide resin matrix.
3. ITO conducting films according to claim 1 or claim 2, it is characterised in that the refractive index of the first ITO conductive film layers is
2.0-2.2, the refractive index of the 2nd ITO conductive film layers is 1.4-1.5.
4. ITO conducting films according to claim 1 or claim 2, it is characterised in that the substrate layer is PET.
5. ITO conducting films according to claim 1 or claim 2, it is characterised in that the protective layer is metallic copper Nitinol film
Layer.
6. ITO conducting films according to claim 1 or claim 2, it is characterised in that the thickness of the first ITO conductive film layers is
24nm, the thickness of the 2nd ITO conductive film layers are 12nm, and the thickness of the resin matrix is 120mm, the thickness of the silver nanoparticle film layer
Spend for 50nm, the thickness of the tack coat is 40nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610961045.4A CN107863181A (en) | 2016-11-04 | 2016-11-04 | A kind of ITO conducting films |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610961045.4A CN107863181A (en) | 2016-11-04 | 2016-11-04 | A kind of ITO conducting films |
Publications (1)
| Publication Number | Publication Date |
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| CN107863181A true CN107863181A (en) | 2018-03-30 |
Family
ID=61698901
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610961045.4A Pending CN107863181A (en) | 2016-11-04 | 2016-11-04 | A kind of ITO conducting films |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108520793A (en) * | 2018-05-10 | 2018-09-11 | 重庆新康意安得达尔新材料有限公司 | A kind of ITO conductive films |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202930065U (en) * | 2012-11-22 | 2013-05-08 | 上海理工大学 | Composite refractive index ITO film |
| CN203535977U (en) * | 2013-10-12 | 2014-04-09 | 东莞市平波电子有限公司 | Touch screen ITO conductive film with improved structure |
| US20140202734A1 (en) * | 2011-09-06 | 2014-07-24 | Lg Innotek Co., Ltd. | Transparent Conductive Film, Method of Manufacturing the Same, and Touch Panel Having the Same |
| CN104240799A (en) * | 2014-09-28 | 2014-12-24 | 张家港康得新光电材料有限公司 | ITO (indium tin oxide) transparent conductive film |
-
2016
- 2016-11-04 CN CN201610961045.4A patent/CN107863181A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140202734A1 (en) * | 2011-09-06 | 2014-07-24 | Lg Innotek Co., Ltd. | Transparent Conductive Film, Method of Manufacturing the Same, and Touch Panel Having the Same |
| CN202930065U (en) * | 2012-11-22 | 2013-05-08 | 上海理工大学 | Composite refractive index ITO film |
| CN203535977U (en) * | 2013-10-12 | 2014-04-09 | 东莞市平波电子有限公司 | Touch screen ITO conductive film with improved structure |
| CN104240799A (en) * | 2014-09-28 | 2014-12-24 | 张家港康得新光电材料有限公司 | ITO (indium tin oxide) transparent conductive film |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108520793A (en) * | 2018-05-10 | 2018-09-11 | 重庆新康意安得达尔新材料有限公司 | A kind of ITO conductive films |
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Application publication date: 20180330 |