CN107748402A - Double plate optics Whispering-gallery-mode lithium niobate microcavity and preparation method thereof - Google Patents
Double plate optics Whispering-gallery-mode lithium niobate microcavity and preparation method thereof Download PDFInfo
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0147—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on thermo-optic effects
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Abstract
A kind of double plate optics Whispering-gallery-mode lithium niobate microcavity, the microcavity is the first lithium niobate disk, the thin disk of silica, the second lithium niobate disk, silica pillar and lithium niobate base bottom successively from top to bottom, and preparation method thereof, including prepare five layer films, processing column structure and steps of chemical attack.Double plate optics Whispering-gallery-mode lithium niobate microcavity of the present invention has high surface smoothness, small mode volume and high quality factor (actual measurement 105, theoretical value is up to 107)。
Description
Technical field
The present invention relates to micro-processing technology, particularly a kind of double plate optics Whispering-gallery-mode lithium niobate microcavity and its preparation side
Method.
Background technology
The devices of a variety of accurate measurement positions changes be by measure the electromagnetic field in optical interdferometer or optics cavity come
It is inferred to mechanical movement information, nowadays chamber-opto-mechanical system covers various geometries and size【Referring to document：Regal C
A,Teufel J D,Lehnert K W.Nature Physics,2008,4(7):555】.These systems detect small position
Change relies on the effect for being referred to as " dynamical feedback ", and this effect refers to electromagnetic field intensity point of the position minor variations dependent on intracavitary
Cloth【Referring to document：Kippenberg T J,Vahala K J.science,2008,321(5893):1172-1176】.In the recent period
All it is a lot (come the mechanical oscillation for exciting and suppressing microcavity using light scattering radiation pressure in the work of optical field【Referring to document：
Schliesser A,Del’Haye P,Nooshi N,et al.Physical Review Letters,2006,97(24):
243905】.A kind of optical gradient forces in microcavity are proposed again recently, several orders of magnitude also bigger than light scattering radiation pressure【Ginseng
See document：Eichenfield M,Camacho R,Chan J,et al.Nature,2009,459(7246):550-555.】.
In all multi-cavities-opto-mechanical system, echo wall mode optical micro-cavity is exactly wherein Typical Representative.Echo wall mode optical micro-cavity leads to
The high index of refraction ratio for crossing cavity and surrounding environment realizes light in the continuous total internal reflection of intracavitary, and light field is limited in for a long time micro-
In small cavity, therefore there is high quality factor, so as to effectively strengthen light-matter interaction.And include two vertical point
The double plate micro-cavity structure of cloth then has stronger dynamical feedback, several order of magnitude higher than other chambers-opto-mechanical system, is passing
Sense and Eurytrema coelomatium say there is wider array of application prospect【Referring to document：Lin Q,Rosenberg J,Jiang X,et
al.Physical review letters,2009,103(10):103601】。
Double plate microcavity is mainly double plate optics Whispering-gallery-mode quartz microcavity at present【Referring to document：Jiang X,Lin Q,
Rosenberg J,et al.High-Q double-disk microcavities for cavity
optomechanics.Optics Express,2009,17(23):20911-20919.】.Because quartz material attribute itself limits
System, double plate optics Whispering-gallery-mode quartz microcavity is without effects such as non-linear, hot light and photoelectricity.And lithium columbate crystal have it is non-
Linearly, the effect such as hot light and photoelectricity is equivalent answers, therefore double plate optics Whispering-gallery-mode quartz microcavity has wider array of application.
Femto-second laser pulse has extremely short pulse width and high peak power, with that can be produced during matter interaction
Strong nonlinear effect, the progress to transparent medium be can be achieved, and rapidly three-D micro-nano is processed, then assisted focused ion beam
(FIB) nano high-precision etches, and three-dimensional fast precise can be achieved and process micro-nano device.Electronics is that a kind of wavelength is extremely short
Ripple, therefore the precision for focusing on electron beam just can reach nanometer scale, so as to provide very useful instrument to make micro-nano device.
Based on above-mentioned advantage, both processing methods all prepare various for a kind of suitable scheme of searching on transparent multilaminar thin-film material
Size double plate optics Whispering-gallery-mode lithium niobate microcavity provides effective technological approaches.
The content of the invention
The technical problem to be solved in the present invention is to overcome existing technology to process single-deck optics Whispering-gallery-mode
The shortcomings that lithium niobate microcavity, there is provided a kind of preparation method of double plate optics Whispering-gallery-mode lithium niobate microcavity, described film material
Material includes various dielectric thin-film materials.
Technical scheme is as follows：
A kind of double plate optics Whispering-gallery-mode lithium niobate microcavity, its feature are that the microcavity is first successively from top to bottom
The thin disk of lithium niobate disk, silica, the second lithium niobate disk, silica pillar and lithium niobate base bottom, the first described niobium
The thickness of sour lithium disk and the second lithium niobate disk is between 100nm to 1 μm, between 5 μm to 200 μm of lithium niobate disk diameter；
The thin disk diameter of described silica is less than the first described lithium niobate disk, and thickness range is 20nm to 1 μm, described dioxy
SiClx strut diameter is less than the second described lithium niobate disk, and thickness range is 1 μm to 5 μm, the thickness at described lithium niobate base bottom
400 μm to 600 μm of degree.
The preparation method of above-mentioned double plate optics Whispering-gallery-mode lithium niobate microcavity, comprises the following steps：
1) five layer films are prepared：
Feasibility on combined process, further according to commercialization simulation softward COMSOL change the first lithium niobate disk tangentially and
Thickness, three, the tangential interval between thickness, the double plate parameter of the second lithium niobate disk obtains double plate lithium niobate microcavity to have
Optimistic coupling efficiency and high q-factor, the first LiNbO_3 film layer and the 3rd LiNbO_3 film layer are then chosen according to obtained parameter
Tangential (tangentially have three kinds：X is cut, Y cuts and cut with Z), determine the first LiNbO_3 film layer, the second silica membrane layer, the 3rd
The thickness of LiNbO_3 film layer, the 4th silica membrane layer and the 5th lithium columbate crystal basalis, after He isotopic geochemistry
The method of bonding chip prepares five layer films for meeting to require；
2) column structure is processed：
The method that described column structure is prepared in five described layer films has two kinds：After method one is femtosecond laser direct write
Assisted focused ion beam grinding, method two is photoetching technique；
3) chemical attack：
Described column structure is placed in hydrofluoric acid solution, makes described the second silica membrane layer and the 4th dioxy
SiClx film layer from column structure side wall gradually to internal corrosion, until described the second silica membrane layer and the 4th titanium dioxide
Form the described thin disk of silica, silica pillar after silicon membrane layer corrosion respectively, and the thin disk of described silica and
The diameter of silica pillar is respectively less than the diameter of the first described lithium niobate disk or the second lithium niobate disk, then from hydrofluoric acid
Take out in solution, and fully cleaned with deionized water, that is, obtain double plate optics Whispering-gallery-mode lithium niobate microcavity.
Above-mentioned processing column structure, including following two methods：
1) assisted focused ion beam grinding after femtosecond laser direct write：
Five described layer films are fixed on three-D displacement platform, using the femtosecond laser focused on through object lens described
Five layer films are successively machined to the upper surface of the 5th lithium columbate crystal basalis, and direct write goes out a column structure；By focused ion
Beam focuses on the upper surface of the first LiNbO_3 film layer of described column structure, and the scanning area of described focused ion beam is set
The annulus that a diameter meets to require is set to, described column structure is ground, makes the lateral surface of described column structure
It is smooth；
2) photoetching technique：
Five described layer films are fixed on platform, the circle using electron beam to five described layer film upper surfaces
The photoresist in domain is exposed, and recycles argon plasma to be etched to the 4th silica on successively in five described layer films
The upper surface of film layer, etch a smooth column structure of lateral surface.
Compared with prior art, effect of the invention is as follows：
1st, prepared double plate microcavity is by the first lithium niobate disk of the parallel distribution of vertical direction and the second lithium niobate circle
The micro- disk of two, disk is formed, relative to two micro- disks in same level are distributed in, the coupling between the two micro- disks greatly strengthened
Close efficiency；
2nd, Whispering-gallery-mode microcavity edge of the present invention separates with substrate, is effectively increased the refractive index of microcavity and surrounding environment
Than improving the Q values of microcavity；
3rd, the roughness at edge is improved by focused-ion-beam lithography, mean roughness is less than 2nm, ensure that microcavity
With higher Q values；
4th, the present invention can the tangential of unrestricted choice LiNbO_3 film, thickness and silicon dioxide layer thickness, be advantageous to fully
The thermo-optic effect and piezo-electric effect of lithium niobate thin-film materials in itself are make use of, compared to materials such as the quartz without these special natures
Expect the double plate microcavity prepared, double plate optics Whispering-gallery-mode lithium niobate microcavity has bigger application.
Brief description of the drawings
Fig. 1 is the schematic diagram of double plate optics Whispering-gallery-mode lithium niobate microcavity of the present invention；
Fig. 2 is the work flow schematic diagram for preparing double plate optics Whispering-gallery-mode lithium niobate microcavity；
Fig. 3 is that optical microscope, the scanning electron for preparing the double plate optics Whispering-gallery-mode lithium niobate microcavity finished show
Micro mirror figure, experiment measure the mould field figure of Q values and theoretical modeling, wherein, (a) is the top view of double plate microcavity, and (b) is double plate microcavity
Side view, (b) medium and small figure be double plate microcavity side view edge amplification, (c) be double plate microcavity experiment measure its Q value, (d) is
The double plate microcavity mould field figure that theoretical modeling is drawn.
Embodiment
Below by embodiment and accompanying drawing, the present invention will be further described, but the protection model of the present invention should not be limited with this
Enclose.
Embodiment 1
Referring to Fig. 1, Fig. 1 is the schematic diagram of double plate optics Whispering-gallery-mode lithium niobate microcavity of the present invention, as seen from the figure, this
Invention double plate optics Whispering-gallery-mode lithium niobate microcavity, the microcavity is the first lithium niobate disk 1, silica successively from top to bottom
Thin disk 2, the second lithium niobate disk 3, silica pillar 4 and lithium niobate base bottom 5, the first described lithium niobate disk 1 and second
3 tangential X of lithium niobate disk cuts thickness 300nm, 30 μm of lithium niobate disk diameter；Thin 25 μm of 2 diameter of disk of described silica is thick
Spend 200nm, 25 μm described of 4 diameter of silica pillar, 2 μm of thickness, 500 μm of the thickness at described lithium niobate base bottom 5.
The preparation method of the double plate optics Whispering-gallery-mode lithium niobate microcavity of embodiment 1, comprises the following steps：
1) five layer films are prepared：
Feasibility on combined process, change the first lithium niobate disk 1 further according to commercialization simulation softward COMSOL simulations
Tangential and thickness, that three, the tangential interval between thickness, the double plate parameter of the second lithium niobate disk 3 obtains double plate lithium niobate is micro-
Chamber can have optimistic coupling efficiency and high q-factor, then choose the first LiNbO_3 film layer 6 and the 3rd lithium niobate according to obtained parameter
Film layer 8 is that X cuts 300nm thickness, determines the thickness 200nm of the second silica membrane layer 7, the thickness 2 of the 4th silica membrane layer 9
μm, 500 μm of the thickness of the 5th lithium columbate crystal basalis 10, satisfaction is prepared using the method for bonding chip after He isotopic geochemistry
It is required that five layer films；
2) column structure is processed：
Assisted focused ion beam grinding after the femtosecond laser direct write of method one：
As shown in Fig. 2 (b), five layer films are immersed in distilled water, are fixed on programmable three-D displacement platform, by putting
Big multiple 100 ×, the microcobjective of numerical aperture 0.8 mean power 0.4mW femtosecond laser 11 is focused on into described five layers
On film, while being moved by the described three-D displacement platform of programming driving, optical gate is opened, starts femtosecond laser 11 to described five
Layer film carries out successively direct write, and, to the upper surface of the 5th lithium columbate crystal basalis 10, one reserved as shown in Fig. 2 (c) is straight
Footpath is 33 μm of column structure blank, 3 μm of write-through depth；As shown in Fig. 2 (c), the etching parameters of focused ion beam 13 select 30kV
1nA, focused ion beam 13 is focused on column structure blank as described in Fig. 2 (c) first layer LiNbO_3 film layer 6 it is upper
Surface, described focused ion beam scanning area are defined as a fine circle, to the first layer niobium of described column structure blank
The grinding of the sour side wall of lithium film layer 6, makes to leave that side is smooth, a diameter of 30 μm of circular first layer niobium inside the circle ring area of scanning
Sour lithium film, 2 μm of etching depth, it is carved into the upper surface of the 5th lithium columbate crystal basalis 10；
The photoetching technique of method two：
Five described layer films are fixed on platform as shown in Fig. 2 (d), using electron beam 16 to five described layer films
The photoresist 17 of 30 μm of border circular areas of upper surface diameter is exposed, and recycles argon plasma 18 in five described layer films
The upper surface of the 4th silica membrane layer 9 is etched on successively, etches the smooth column structure 12 of a lateral surface, etching is deep
1 μm of degree.
(3) chemical attack：
Material after focused ion beam is ground is placed in 2% hydrofluoric acid solution, is corroded 2 minutes, is made described column knot
Second silicon dioxide layer 7 of structure 12 and the 4th silica membrane layer 9, gradually to internal corrosion, are only left such as Fig. 2 from cylindrical side wall
(h) shown in, described silica pillar 4 holds up described double plate lithium niobate microcavity 15, makes the edge of double plate lithium niobate microcavity
Vacantly, equidistant slight gap is kept between double plate.
Fig. 3 is that optical microscope, the scanning electron for preparing the double plate optics Whispering-gallery-mode lithium niobate microcavity finished show
Micro mirror figure, experiment measure the mould field figure of Q values and theoretical modeling, wherein (a) is the top view of double plate microcavity, (b) is double plate microcavity
Side view, (b) medium and small figure be double plate microcavity side view edge amplification.As seen from the figure, described double plate lithium niobate microcavity it
Between keep equidistant slight gap, described double plate lithium niobate microcavity 15 is held up by described silica pillar 4, and described
Lithium niobate base bottom 5 apart from about 2 μm, chamber mould distributed areas are completely hanging, and side wall is smooth.(c) be prepare completion double plate it is micro-
Chamber experiment measures its Q value up to 1.2 × 105, (d) is the microcavity mould field figure that theoretical modeling is drawn, theoretical Q values are up to 107。
Following table lists the relevant parameter of the embodiment of the present invention 2, embodiment 3, embodiment 4 and embodiment 5, preparation method and reality
It is similar to apply example 1, difference is relevant parameter difference.
Above-described embodiment shows that the present invention can prepare double plate optics Whispering-gallery-mode microcavity on various dielectric films.Pole
Coupling efficiency between two micro- disks of the earth enhancing；Whispering-gallery-mode microcavity edge of the present invention separates with substrate, completely exposed
In atmosphere, microcavity and the refractive index ratio of surrounding environment are effectively increased, the coarse of edge is improved by focused-ion-beam lithography
Degree, makes the edge of microcavity become extremely smooth, ensure that microcavity has higher Q values；The present invention can unrestricted choice lithium niobate
The thickness of the tangential of film, thickness and silicon dioxide layer, be advantageous to take full advantage of the property of lithium niobate thin-film materials in itself, open up
The application of wide microcavity.
Claims (3)
1. a kind of double plate optics Whispering-gallery-mode lithium niobate microcavity, it is characterised in that the microcavity is the first niobium successively from top to bottom
Sour lithium disk (1), the thin disk of silica (2), the second lithium niobate disk (3), silica pillar (4) and lithium niobate base bottom (5),
The first described lithium niobate disk (1) and the thickness of the second lithium niobate disk (3) are between 100nm to 1 μm, 5 μm of disk diameter
To between 200 μm；The diameter of the thin disk of described silica (2) is less than the first described lithium niobate disk (1), and thickness range is
20nm to 1 μm, the diameter of described silica pillar (4) is less than the second described lithium niobate disk (3), and thickness range is 1 μ
M to 5 μm, 400 μm to 600 μm of the thickness at described lithium niobate base bottom (5), the first described lithium niobate disk (1) and the second niobium
Sour lithium disk (3) forms double plate lithium niobate microcavity.
2. the preparation method of the double plate optics Whispering-gallery-mode lithium niobate microcavity described in claim 1, it is characterised in that including under
Row step：
1) five layer films are prepared：
Feasibility on combined process, change the first lithium niobate disk (1) further according to commercialization simulation softward COMSOL simulations and cut
To and thickness, that three, the tangential interval between thickness, the double plate parameter of the second lithium niobate disk (3) obtains double plate lithium niobate is micro-
Chamber can have optimistic coupling efficiency and high q-factor, then choose the first LiNbO_3 film layer (6) and the 3rd niobic acid according to obtained parameter
Lithium film layer (8) it is tangential, determine that the first LiNbO_3 film layer (6), the second silica membrane layer (7), the 3rd lithium niobate are thin
The thickness of film layer (8), the 4th silica membrane layer (9) and the 5th lithium columbate crystal basalis (10), utilizes He isotopic geochemistry
The method of bonding chip prepares five layer films for meeting to require, including top-down first LiNbO_3 film layer (6), the afterwards
Two silica membrane layers (7), the 3rd LiNbO_3 film layer (8), the 4th silica membrane layer (9) and the 5th lithium columbate crystal
Basalis (10)；
2) column structure is processed：On five described layer films the smooth described post of lateral surface is processed using micro-processing method
Shape structure (12)；
3) chemical attack：Described column structure (12) is placed in hydrofluoric acid solution (14), makes the second described silica
Film layer (7) and the 4th silica membrane layer (9) from column structure side wall gradually to internal corrosion, until the second described dioxy
The described thin disk of silica (2), dioxy are formed respectively after SiClx film layer (7) and the corrosion of the 4th silica membrane layer (9)
SiClx pillar (4), and the diameter of the thin disk of described silica (2) and silica pillar (4) is respectively less than the first described niobium
Sour lithium disk (1) and the diameter of the second lithium niobate disk (3), then taken out from hydrofluoric acid solution, and fully washed with deionized water
Only, that is, double plate optics Whispering-gallery-mode lithium niobate microcavity (15) is obtained.
3. it is according to claim 2 processing column structure preparation method, it is characterised in that five described layer films it is micro-
Processing method has following two kinds：
1) assisted focused ion beam grinding after femtosecond laser direct write：
Five described layer films are fixed on three-D displacement platform, using the femtosecond laser (11) focused on through object lens described
Five layer films are successively machined to the upper surface of the 5th lithium columbate crystal basalis (10), and direct write goes out a column structure (12)；Will
Focused ion beam (13) focuses on the upper surface of the first LiNbO_3 film layer (6) of described column structure (12), and described is poly-
The scanning area of pyrophosphate ion beam (13) is arranged to the annulus that a diameter meets to require, described column structure (12) is ground
Mill, makes the lateral surface of described column structure (12) smooth；
2) photoetching technique：
Five described layer films are fixed on platform, the circle using electron beam (16) to five described layer film upper surfaces
The photoresist (17) in domain is exposed, and recycles argon plasma (18) to be etched to the 4th on successively in five described layer films
The upper surface of silica membrane layer (9), etch a smooth column structure of lateral surface (12).
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| CN110854662A (en) * | 2019-11-07 | 2020-02-28 | 中国科学院西安光学精密机械研究所 | Mid-infrared optical frequency comb generation system and method based on lithium niobate microcavity |
| CN111129934A (en) * | 2019-11-26 | 2020-05-08 | 华东师范大学 | Microcavity-adjustable optical frequency comb based on lithium niobate and preparation method thereof |
| CN111367013A (en) * | 2020-03-12 | 2020-07-03 | 华东师范大学 | Lithium niobate micro-ring and waveguide integrated device and preparation method thereof |
| WO2022077997A1 (en) * | 2020-10-16 | 2022-04-21 | 南京南智先进光电集成技术研究院有限公司 | Miniature mid-infrared laser based on double microdisks |
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| CN116045951A (en) * | 2023-03-31 | 2023-05-02 | 中国船舶集团有限公司第七〇七研究所 | Method for inhibiting reverse noise of fiber optic gyroscope based on etched ribbon structure |
| CN116045951B (en) * | 2023-03-31 | 2023-06-02 | 中国船舶集团有限公司第七〇七研究所 | Method for inhibiting reverse noise of fiber optic gyroscope based on etched ribbon structure |
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