CN107748402B - Double plate optics Whispering-gallery-mode lithium niobate microcavity and preparation method thereof - Google Patents
Double plate optics Whispering-gallery-mode lithium niobate microcavity and preparation method thereof Download PDFInfo
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0147—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on thermo-optic effects
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Abstract
A kind of double plate optics Whispering-gallery-mode lithium niobate microcavity, the microcavity is successively the first lithium niobate disk, the thin disk of silica, the second lithium niobate disk, silica pillar and lithium niobate base bottom from top to bottom, and preparation method thereof, including five layer films of preparation, processing column structure and steps of chemical attack.Double plate optics Whispering-gallery-mode lithium niobate microcavity of the present invention has high surface smoothness, small mode volume and the (actual measurement 10 of high quality factor5, theoretical value is up to 107)。
Description
Technical field
The present invention relates to micro-processing technology, especially a kind of double plate optics Whispering-gallery-mode lithium niobate microcavity and its preparation side
Method.
Background technique
The device of a variety of precise measurement change in location be by measurement optical interdferometer or optics cavity in electromagnetic field come
It is inferred to mechanical movement information, nowadays chamber-opto-mechanical system covers various geometries and size [referring to document: Regal C
A,Teufel J D,Lehnert K W.Nature Physics,2008,4(7):555].These systems detect small position
Variation relies on the effect for being known as " dynamical feedback ", and this effect refers to position minor change dependent on intracavitary electromagnetic field intensity point
Cloth [referring to document: Kippenberg T J, Vahala K J.science, 2008,321 (5893): 1172-1176].In the recent period
Much the work of optical field be all using light scattering radiation pressure (come excite and inhibit microcavity mechanical oscillation [referring to document:
Schliesser A,Del’Haye P,Nooshi N,et al.Physical Review Letters,2006,97(24):
243905].It is proposed a kind of optical gradient forces in microcavity again recently, the several order of magnitude [ginsengs also bigger than light scattering radiation pressure
See document: Eichenfield M, Camacho R, Chan J, et al.Nature, 2009,459 (7246): 550-555.].
In all multi-cavities-opto-mechanical system, echo wall mode optical micro-cavity is exactly wherein Typical Representative.Echo wall mode optical micro-cavity is logical
The high refractive index of cavity and ambient enviroment is crossed than realizing that light in intracavitary continuous total internal reflection, and light field is limited in for a long time micro-
In small cavity, therefore there is high quality factor, to effectively enhance light-matter interaction.And include two vertical point
The double plate micro-cavity structure of cloth then has stronger dynamical feedback, and several order of magnitude higher than other chambers-opto-mechanical system is passing
Sense and Eurytrema coelomatium, which are said, has wider array of application prospect [referring to document: Lin Q, Rosenberg J, Jiang X, et
al.Physical review letters,2009,103(10):103601】。
At present double plate microcavity be mainly double plate optics Whispering-gallery-mode quartz microcavity [referring to document: Jiang X, Lin Q,
Rosenberg J,et al.High-Q double-disk microcavities for cavity
optomechanics.Optics Express,2009,17(23):20911-20919.].Because quartz material attribute itself limits
System, double plate optics Whispering-gallery-mode quartz microcavity do not have the effects such as non-linear, hot light and photoelectricity.And lithium columbate crystal is with non-
Linearly, the effects such as hot light and photoelectricity are equivalent answers, therefore double plate optics Whispering-gallery-mode quartz microcavity has wider array of application range.
Femto-second laser pulse has extremely short pulse width and high peak power, can generate when with matter interaction
Strong nonlinear effect is, it can be achieved that rapidly three-D micro-nano is processed to the progress of transparent medium, then assisted focused ion beam
(FIB) nano high-precision etching is, it can be achieved that three-dimensional fast precise processes micro-nano device.Electronics is that a kind of wavelength is extremely short
Wave, therefore the precision for focusing electron beam just can reach nanometer scale, to provide very useful tool for production micro-nano device.
Based on above-mentioned advantage, both processing methods be all find a kind of suitable scheme prepared on transparent multilaminar thin-film material it is various
Size double plate optics Whispering-gallery-mode lithium niobate microcavity provides effective technological approaches.
Summary of the invention
The technical problem to be solved in the present invention is that overcoming existing technology that can only process single-deck optics Whispering-gallery-mode
The shortcomings that lithium niobate microcavity, provides a kind of preparation method of double plate optics Whispering-gallery-mode lithium niobate microcavity, the film material
Material includes various dielectric thin-film materials.
Technical scheme is as follows:
A kind of double plate optics Whispering-gallery-mode lithium niobate microcavity, it is characterized in that, which is successively first from top to bottom
The thin disk of lithium niobate disk, silica, the second lithium niobate disk, silica pillar and lithium niobate base bottom, first niobium
The thickness of sour lithium disk and the second lithium niobate disk is between 100nm to 1 μm, between 5 μm to 200 μm of lithium niobate disk diameter；
The thin disk diameter of the silica is less than the first lithium niobate disk, and thickness range is 20nm to 1 μm, the dioxy
SiClx strut diameter is less than the second lithium niobate disk, and thickness range is 1 μm to 5 μm, the thickness at the lithium niobate base bottom
400 μm to 600 μm of degree.
The preparation method of above-mentioned double plate optics Whispering-gallery-mode lithium niobate microcavity, including the following steps:
1) five layer films are prepared:
Feasibility on combined process, further according to commercialization simulation softward COMSOL change the first lithium niobate disk tangentially and
Thickness, the second lithium niobate disk three, the tangential interval between thickness, double plate parameter obtain double plate lithium niobate microcavity and can have
Then optimistic coupling efficiency and high q-factor choose the first LiNbO_3 film layer and third LiNbO_3 film layer according to obtained parameter
Tangential (tangential there are three types of: X is cut, Y cuts and cuts with Z), determine the first LiNbO_3 film layer, the second silica membrane layer, third
The thickness of LiNbO_3 film layer, the 4th silica membrane layer and the 5th lithium columbate crystal basal layer, after He isotopic geochemistry
The method of bonding chip prepares five layer films met the requirements；
2) column structure is processed:
There are two ways to column structure described in the five layer films preparation: method is first is that after femtosecond laser direct write
Assisted focused ion beam grinding, method is second is that photoetching technique；
3) chemical attack:
The column structure is placed in hydrofluoric acid solution, the second silica membrane layer and the 4th dioxy are made
SiClx film layer from column structure side wall gradually to internal corrosion, until the second silica membrane layer and the 4th titanium dioxide
Be respectively formed the thin disk of silica, silica pillar after silicon membrane layer corrosion, and the thin disk of silica and
The diameter of silica pillar is respectively less than the diameter of the first lithium niobate disk or the second lithium niobate disk, then from hydrofluoric acid
It takes out in solution, and is sufficiently cleaned with deionized water to get double plate optics Whispering-gallery-mode lithium niobate microcavity is arrived.
Above-mentioned processing column structure, including following two methods:
1) assisted focused ion beam grinding after femtosecond laser direct write:
Five layer films are fixed on three-D displacement platform, using the femtosecond laser focused through object lens described
Five layer films are successively machined to the upper surface of the 5th lithium columbate crystal basal layer, and direct write goes out a column structure；By focused ion
Beam focuses on the upper surface of the first LiNbO_3 film layer of the column structure, and the scanning area of the focused ion beam is set
It is set to the annulus that a diameter is met the requirements, the column structure is ground, makes the lateral surface of the column structure
It is smooth；
2) photoetching technique:
Five layer films are fixed on platform, using electron beam to the circle of the five layer film upper surfaces
The photoresist in domain is exposed, and argon plasma is recycled to be etched to the 4th silica on five layer films are layer-by-layer
The upper surface of film layer etches the smooth column structure of lateral surface.
Compared with prior art, effect of the invention is as follows:
1, prepared double plate microcavity is by the first lithium niobate disk of vertical direction parallelly distribute on and the second lithium niobate circle
Two, disk micro- disks are constituted, relative to two micro- disks in same level are distributed in, the coupling between two micro- disks that greatly enhances
Close efficiency；
2, Whispering-gallery-mode microcavity of the present invention edge is separated with substrate, effectively increases the refractive index of microcavity and ambient enviroment
Than improving the Q value of microcavity；
3, the roughness at edge is improved by focused-ion-beam lithography, mean roughness is less than 2nm, ensure that microcavity
Q value with higher；
4, the present invention can the tangential of unrestricted choice LiNbO_3 film, thickness and silicon dioxide layer thickness, be conducive to sufficiently
The thermo-optic effect and piezoelectric effect of lithium niobate thin-film materials itself is utilized, compared to materials such as quartz without these special natures
Expect that the double plate microcavity of preparation, double plate optics Whispering-gallery-mode lithium niobate microcavity have bigger application range.
Detailed description of the invention
Fig. 1 is the schematic diagram of double plate optics Whispering-gallery-mode lithium niobate microcavity of the present invention；
Fig. 2 is the schematic diagram of the process for preparing double plate optics Whispering-gallery-mode lithium niobate microcavity；
Fig. 3 is that the optical microscope for preparing the double plate optics Whispering-gallery-mode lithium niobate microcavity finished, scanning electron are aobvious
Micro mirror figure, experiment measure the mould field figure of Q value and theoretical modeling, wherein (a) is the top view of double plate microcavity, (b) is double plate microcavity
Side view, (b) medium and small figure be double plate microcavity side view edge amplification, (c) for double plate microcavity experiment measure its Q value, (d) be
The double plate microcavity mould field figure that theoretical modeling obtains.
Specific embodiment
Below by embodiment and attached drawing, the present invention will be further described, but protection model of the invention should not be limited with this
It encloses.
Embodiment 1
Referring to Fig. 1, Fig. 1 is the schematic diagram of double plate optics Whispering-gallery-mode lithium niobate microcavity of the present invention, as seen from the figure, this
Invention double plate optics Whispering-gallery-mode lithium niobate microcavity, which is successively the first lithium niobate disk 1, silica from top to bottom
Thin disk 2, the second lithium niobate disk 3, silica pillar 4 and lithium niobate base bottom 5, the first lithium niobate disk 1 and second
The tangential X of lithium niobate disk 3 cuts thickness 300nm, and 30 μm of lithium niobate disk diameter；The silica is 25 μm of 2 diameter of disk thin, thick
Degree 200nm, 25 μm of 4 diameter of silica pillar, 2 μm of thickness, 500 μm of the thickness at the lithium niobate base bottom 5.
The preparation method of the double plate optics Whispering-gallery-mode lithium niobate microcavity of embodiment 1, including the following steps:
1) five layer films are prepared:
Feasibility on combined process changes the first lithium niobate disk 1 further according to commercialization simulation softward COMSOL simulation
It is micro- that tangential and thickness, the second lithium niobate disk 3 three, the tangential interval between thickness, double plate parameter obtains double plate lithium niobate
Chamber can have optimistic coupling efficiency and high q-factor, then choose the first LiNbO_3 film layer 6 and third lithium niobate according to obtained parameter
Film layer 8 is that X cuts 300nm thickness, determines 7 thickness 200nm of the second silica membrane layer, 9 thickness 2 of the 4th silica membrane layer
μm, 500 μm of the thickness of the 5th lithium columbate crystal basal layer 10 prepares satisfaction using the method for bonding chip after He isotopic geochemistry
It is required that five layer films；
2) column structure is processed:
Assisted focused ion beam grinding after one femtosecond laser direct write of method:
As shown in Fig. 2 (b), five layer films are immersed in distilled water, are fixed on programmable three-D displacement platform, by putting
Big multiple 100 ×, the microcobjective of numerical aperture 0.8 femtosecond laser 11 of mean power 0.4mW is focused on into described five layers
On film, while moving by the programming driving three-D displacement platform, optical gate is opened, starts femtosecond laser 11 to described five
Layer film carries out layer-by-layer direct write to the upper surface of the 5th lithium columbate crystal basal layer 10, reserve as shown in Fig. 2 (c) one it is straight
The column structure blank that diameter is 33 μm, 3 μm of write-through depth；As shown in Fig. 2 (c), 13 etching parameters of focused ion beam select 30kV
Focused ion beam 13 is focused on the upper of the first layer LiNbO_3 film layer 6 of the column structure blank as described in Fig. 2 (c) by 1nA
Surface, the focused ion beam scanning area are defined as a fine circle, to the first layer niobium of the column structure blank
The grinding of sour 6 side wall of lithium film layer, makes to leave that side is smooth, 30 μm of diameter of round first layer niobium inside the circle ring area of scanning
Sour lithium film, is carved into the upper surface of the 5th lithium columbate crystal basal layer 10 by 2 μm of etching depth；
Two photoetching technique of method:
Five layer films are fixed on platform as shown in Fig. 2 (d), using electron beam 16 to five layer films
The photoresist 17 of 30 μm of border circular areas of upper surface diameter is exposed, and recycles argon plasma 18 in five layer films
It is etched to the upper surface of the 4th silica membrane layer 9 on successively, etches the smooth column structure 12 of a lateral surface, etching is deep
1 μm of degree.
(3) chemical attack:
Material after focused ion beam is ground is placed in 2% hydrofluoric acid solution, is corroded 2 minutes, is made the column knot
Second silicon dioxide layer 7 of structure 12 and the 4th silica membrane layer 9, gradually to internal corrosion, are only left such as Fig. 2 from cylindrical side wall
(h) shown in, the silica pillar 4 holds up the double plate lithium niobate microcavity 15, makes the edge of double plate lithium niobate microcavity
Vacantly, equidistant slight gap is kept between double plate.
Fig. 3 is that the optical microscope for preparing the double plate optics Whispering-gallery-mode lithium niobate microcavity finished, scanning electron are aobvious
Micro mirror figure, experiment measure the mould field figure of Q value and theoretical modeling, wherein (a) is the top view of double plate microcavity, it (b) is double plate microcavity
Side view, (b) medium and small figure be double plate microcavity side view edge amplification.As seen from the figure, the double plate lithium niobate microcavity it
Between keep equidistant slight gap, the double plate lithium niobate microcavity 15 is held up by the silica pillar 4, and described
Lithium niobate base bottom 5 apart from about 2 μm, cavity mold distributed areas are completely hanging, and side wall is smooth.(c) be prepare completion double plate it is micro-
Chamber experiment measures its Q value up to 1.2 × 105, (d) it is microcavity mould field figure that theoretical modeling obtains, theoretical Q value is up to 107。
Following table lists the relevant parameter of the embodiment of the present invention 2, embodiment 3, embodiment 4 and embodiment 5, preparation method and reality
It is similar to apply example 1, difference is relevant parameter difference.
Above-described embodiment shows that the present invention can prepare double plate optics Whispering-gallery-mode microcavity on various dielectric films.Pole
Coupling efficiency between two micro- disks of the earth enhancing；Whispering-gallery-mode microcavity of the present invention edge is separated with substrate, completely exposed
In air, the refractive index ratio for effectively increasing microcavity and ambient enviroment, improves the coarse of edge by focused-ion-beam lithography
Degree, makes the edge of microcavity become extremely smooth, ensure that the Q value with higher of microcavity；The present invention can unrestricted choice lithium niobate
The tangential of film, thickness and silicon dioxide layer thickness, be conducive to the property for taking full advantage of lithium niobate thin-film materials itself, open up
The application range of wide microcavity.
Claims (2)
1. a kind of preparation method of double plate optics Whispering-gallery-mode lithium niobate microcavity, which is successively the first niobic acid from top to bottom
Lithium disk (1), the thin disk of silica (2), the second lithium niobate disk (3), silica pillar (4) and lithium niobate base bottom (5), institute
Between 100nm to 1 μm, 5 μm of disk diameter are arrived the thickness of the first lithium niobate disk (1) and the second lithium niobate disk (3) stated
Between 200 μm；The diameter of the thin disk of the silica (2) is less than the first lithium niobate disk (1), and thickness range is
20nm to 1 μm, the diameter of the silica pillar (4) is less than the second lithium niobate disk (3), and thickness range is 1 μ
M to 5 μm, 400 μm to 600 μm of thickness of the lithium niobate base bottom (5), the first lithium niobate disk (1) and the second niobium
Sour lithium disk (3) constitutes double plate lithium niobate microcavity；It is characterized in that, the preparation method of the microcavity includes the following steps:
1) five layer films are prepared:
Feasibility on combined process changes the first lithium niobate disk (1) further according to commercialization simulation softward COMSOL simulation and cuts
To and three, the tangential interval between thickness, the double plate parameter of thickness, the second lithium niobate disk (3) to obtain double plate lithium niobate micro-
Chamber can have optimistic coupling efficiency and high q-factor, then choose the first LiNbO_3 film layer (6) and third niobic acid according to obtained parameter
Lithium film layer (8) it is tangential, determine that the first LiNbO_3 film layer (6), the second silica membrane layer (7), third lithium niobate are thin
The thickness of film layer (8), the 4th silica membrane layer (9) and the 5th lithium columbate crystal basal layer (10), utilizes He isotopic geochemistry
The method of bonding chip prepares five layer films met the requirements, including top-down first LiNbO_3 film layer (6), afterwards
Two silica membrane layers (7), third LiNbO_3 film layer (8), the 4th silica membrane layer (9) and the 5th lithium columbate crystal
Basal layer (10)；
2) it processes column structure: processing the smooth column of lateral surface using micro-processing method on five layer films
Shape structure (12)；
3) chemical attack: the column structure (12) is placed in hydrofluoric acid solution (14), second silica is made
Film layer (7) and the 4th silica membrane layer (9) from column structure side wall gradually to internal corrosion, until second dioxy
The thin disk of silica (2), dioxy are respectively formed after SiClx film layer (7) and the corrosion of the 4th silica membrane layer (9)
SiClx pillar (4), and the diameter of the thin disk of silica (2) and silica pillar (4) is respectively less than first niobium
The diameter of sour lithium disk (1) and the second lithium niobate disk (3), then taken out from hydrofluoric acid solution, and sufficiently washed with deionized water
Only to get arrive double plate optics Whispering-gallery-mode lithium niobate microcavity (15).
2. the preparation method of double plate optics Whispering-gallery-mode lithium niobate microcavity according to claim 1, which is characterized in that institute
That states has following two methods using micro-processing method processing column structure (12) on five layer films:
1) assisted focused ion beam grinding after femtosecond laser direct write:
Five layer films are fixed on three-D displacement platform, using the femtosecond laser (11) focused through object lens described
Five layer films are successively machined to the upper surface of the 5th lithium columbate crystal basal layer (10), and direct write goes out a column structure (12)；It will
Focused ion beam (13) focuses on the upper surface of the first LiNbO_3 film layer (6) of the column structure (12), and described is poly-
The scanning area of pyrophosphate ion beam (13) is set as the annulus that a diameter is met the requirements, and grinds to the column structure (12)
Mill, keeps the lateral surface of the column structure (12) smooth；
2) photoetching technique:
Five layer films are fixed on platform, using electron beam (16) to the circle of the five layer film upper surfaces
The photoresist (17) in domain is exposed, and argon plasma (18) is recycled to be etched to the 4th on five layer films are layer-by-layer
The upper surface of silica membrane layer (9) etches the smooth column structure of lateral surface (12).
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| CN110854662B (en) * | 2019-11-07 | 2024-08-02 | 中国科学院西安光学精密机械研究所 | Mid-infrared optical frequency comb generation system and method based on lithium niobate microcavity |
| CN111129934B (en) * | 2019-11-26 | 2021-10-12 | 华东师范大学 | Microcavity-adjustable optical frequency comb based on lithium niobate and preparation method thereof |
| CN111367013B (en) * | 2020-03-12 | 2021-11-19 | 华东师范大学 | Lithium niobate micro-ring and waveguide integrated device and preparation method thereof |
| CN112271537B (en) * | 2020-10-16 | 2021-07-23 | 南京南智先进光电集成技术研究院有限公司 | Miniature intermediate infrared laser based on double microdisks |
| CN116045951B (en) * | 2023-03-31 | 2023-06-02 | 中国船舶集团有限公司第七〇七研究所 | Method for inhibiting reverse noise of fiber optic gyroscope based on etched ribbon structure |
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