CN102530852A - Method for fabricating three-dimensional optical echo wall mode micro-cavity by using femtosecond laser - Google Patents
Method for fabricating three-dimensional optical echo wall mode micro-cavity by using femtosecond laser Download PDFInfo
- Publication number
- CN102530852A CN102530852A CN201210056401XA CN201210056401A CN102530852A CN 102530852 A CN102530852 A CN 102530852A CN 201210056401X A CN201210056401X A CN 201210056401XA CN 201210056401 A CN201210056401 A CN 201210056401A CN 102530852 A CN102530852 A CN 102530852A
- Authority
- CN
- China
- Prior art keywords
- little
- femtosecond laser
- dish
- microcavity
- transparent material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The invention discloses a method for fabricating a three-dimensional optical echo wall mode micro-cavity with high-quality factors by using femtosecond laser. The method comprises the following steps of femtosecond laser irradiation on a transparent material, chemical corrosion, carbon dioxide laser annealing and the like. According to the three-dimensional optical echo wall mode micro-cavity, fabricated according to the method disclosed by the invention, the size of a small support column, the size of a micro disc, and included angles of the small support column and the micro disc relative to a substrate are determined by a design. The profile of the micro-cavity is of a micro ring structure, the surface finish quality is extremely high, and the quality factors are very high.
Description
Technical field
The present invention relates to femtosecond laser processing, particularly a kind of method of utilizing the three-dimensional optics Whispering-gallery-mode microcavity of femtosecond laser preparation.This method is applicable at various transparent glass, crystal and the three-dimensional optics Whispering-gallery-mode microcavity of pottery preparation.
Background technology
Optics Whispering-gallery-mode (whispering-gallery mode) microcavity is limited in light in the small size through the continuous several times total internal reflection of the circular boundary between dielectric cavity and surrounding environment for a long time; Had quite high quality factor; In basic research and practical applications; Such as fields such as quantum optices, nonlinear optics, quantrm electrodynamics, low threshold laser, minimal type wave filter, biology sensor, optical frequency coms, important use is arranged.And the present microcavity of the Whispering-gallery-mode on the chip of main flow, as little dish chamber (referring to document 1:S. L. McCall, A. F. J. Levi, et al.; Applied Physics Letters, Vol. 60, P 289,1992), little ring cavity is (referring to document 2:D. K. Armani; T. I. Kippenberg, et al., Nature, Vol. 421; P 925,2003), the distortion microcavity (referring to document 3:C. Gmachl, F. Capasso, Science; Vol. 280, P 1556,1998), manufacturing technology is by means of semiconductor photolithography method; It is quite ripe in the preparation of material surface micro-structural, but can only prepare the Whispering-gallery-mode microcavity parallel with substrate, and this will cause great difficulty to the coupling and the extraction with respect to substrate tilting of chamber mould (with the microcavity coplane).Although people have proposed on the border in little dish chamber (referring to document 4:A.F. J. Levi, R. E. Slusher, et al., Applied Physics Letters; Vol. 62, P 561,1993) or upper surface (referring to document 5:L. Mahler, A. Tredicucci; Et al., Nature Photonics, Vol. 3; P 46,2009) method that increases optical grating construction realizes the Vertical Launch of light with respect to substrate, but also fails to realize the emission of tilting at any angle.This has limited the Whispering-gallery-mode microcavity need be to light with respect to the tilt application of situation of extraction of substrate.
In recent years, femto-second laser pulse has extremely short pulse width and high peak power, demonstrates the strong nonlinear effect during with matter interaction.Its multi-photon mechanism of absorption can be used to process the transparent medium that long pulse can't be processed.Because femtosecond pulse is extremely short action time, fuel factor is very little, thereby has improved machining accuracy greatly.Utilize the femtosecond laser direct writing technology, can process at the inner 3 D stereo micro-nano of realizing of transparent material.Based on above-mentioned advantage, this technology has become little manufacturing hot research fields, and fields such as the biomedicine of unifying at microfluid, microelectronics, micro-optic, micro-electro-mechanical systems have demonstrated out important application prospects.Utilize the femtosecond laser parallel micromachining technology can prepare Whispering-gallery-mode microcavity based on polymer (referring to document 6:Z.-P. Liu, Y. Li, et al., Applied Physics Letters, Vol. 97, P 211105,2010).But with respect to polymer, transparent material (such as vitreous silica) is owing to having the substrate that wide transparent optical spectral limit, extremely low intrinsic material loss and durability are considered to more attractive.How seeking a kind of suitable scheme, on transparent material, to prepare three-dimensional Whispering-gallery-mode microcavity be the major issue that present microcavity photonic propulsion field faces.
Summary of the invention
The technical problem that the present invention will solve is to overcome above-mentioned existing femtosecond laser parallel micromachining technology can only prepare microcavity on polymer; And the quality factor of the microcavity for preparing is lower; Shortcomings such as durable; A kind of method that on transparent material, prepares three-dimensional optical Whispering-gallery-mode microcavity is provided, and the three-dimensional optical Whispering-gallery-mode microcavity of this method preparation has high-quality-factor, durable characteristics.
Technical scheme of the present invention is following:
A kind of method of utilizing femtosecond laser to prepare three-dimensional echo wall mode optical micro-cavity, its characteristics are to comprise the following steps:
(1) femtosecond laser irradiation:
Described three-dimensional Whispering-gallery-mode microcavity is a kind of little dish structure by little shore supports; Be the little dish of preparation by little shore supports; Little pillar, little dish of processing are fixed on the position on the three-D displacement platform with respect to the size and the transparent material sample of the size of the angle of substrate, little pillar, little dish at first as required, and the motion of described three-D displacement platform is programmed;
The transparent material sample is fixed on the described three-D displacement platform; Through microcobjective femtosecond laser is focused on the described transparent material sample; When driving described three-D displacement platform motion by programming; Start described femtosecond laser light beam described transparent material sample is carried out irradiation, laser is irradiation successively around the zone of described little pillar and little dish, the motion of described three-D displacement platform and the same EOS of described femtosecond laser irradiation;
(2) chemical attack:
Transparent material sample behind the femtosecond laser irradiation is put into HF solution or KOH solution, described irradiated site is carried out selective chemical corrosion, obtain on the transparent material substrate by little dish little shore supports, that tilt with design angle with respect to substrate;
(3) carbon dioxide laser annealing:
Carbon dioxide laser beam is focused on and aims at the center of little dish through lens; The upper surface that impinges perpendicularly on little dish heats; And monitor annealing process in real time with microcobjective and ccd detector: in time adjust mean power, the dutycycle of carbon dioxide laser pulse, be heated to the softening temperature of material when little dish after, will cause the thermal contraction at edge; Produce backflow effeet; Surface tension impels the script rough edge to become the microcavity edge of little ring-type, and when described microcavity obtained appropriate shrinkage degree, annealing finished.
Described transparent material is glass, crystal or pottery.
The size of described little pillar is much smaller than the size of described little dish, and the size of described little pillar, the size of little dish, little pillar and little dish are confirmed by design with respect to the angle of substrate.
Key of the present invention was (3) step, and the irradiated site of carbon dioxide laser on little dish is central authorities with little dish, and the area of irradiated site is greater than the area of little dish upper surface.The transparent material of little disk area is heated to melt temperature by carbon dioxide laser; The pattern of little dish will receive the strong influence of surface tension of liquid under this liquid phase state; Little dish of molten state can automatic thermal contraction under self capillary driving becomes the edge of little ring-type, and it has high surface smoothness; Through the parameter (such as mean power, dutycycle) of real-time regulated annealing time and carbon dioxide laser pulse, can obtain the microcavity of different shrinkage degrees simultaneously.
Compared with prior art, the invention has the advantages that:
1, broken through the femtosecond laser parallel micromachining technology and can only prepare bottleneck, widened the kind of substrate, and be easy to microfluid or optical fiber integrated based on the optics Whispering-gallery-mode microcavity of polymer;
2, little ring-shaped edge of causing of reflux course has reduced the effective model volume of microcavity, and this plays an important role in the quantum optices field;
3, the cross-sectional type of microcavity is very round: pass through femtosecond laser irradiation originally; Little dish that the irradiation chemical attack obtains after handling; The edge is very coarse, is similar to jagged roughness, and reflux course has obviously improved the roughness at edge; Make the edge of microcavity become very mellow and full smooth, guaranteed high quality factor;
4, can prepare three-dimensional optics Whispering-gallery-mode microcavity, the gradient of microcavity and substrate can freely be set as required, has overcome the difficult problem that can't prepare three-dimensional microcavity based on the planar light lithography.
5, femtosecond laser irradiation allows the size of little dish, the height of pillar are carried out freely selecting; The annealing of follow-up carbon dioxide laser can also realize the adjustment once more (mainly being reduced in size) to the microcavity size through the condition of control annealing, like this with regard to very convenient on same transparent substrates the microcavity of integrated a plurality of differing heights, different size.
Description of drawings
Fig. 1 is that the present invention utilizes femtosecond laser to prepare the schematic flow sheet of optics Whispering-gallery-mode microcavity method of the three-dimensional of high-quality-factor.
Fig. 2 is the micro-image of the three-dimensional optical Whispering-gallery-mode microcavity before and after the annealing of process carbon dioxide laser on the quartz glass samples.
The specific embodiment
Through embodiment and accompanying drawing the present invention is further specified below, but should not limit protection scope of the present invention with this.
See also Fig. 1 earlier; Fig. 1 is that the present invention utilizes femtosecond laser to prepare the schematic flow sheet of method of optics Whispering-gallery-mode microcavity of the three-dimensional of high-quality-factor; Existing is that example is explained the inventive method with the quartz glass; Visible by figure, the method that the present invention utilizes femtosecond laser to prepare three-dimensional optical Whispering-gallery-mode microcavity comprises following three steps:
(1) femtosecond laser irradiation: get the quartz glass samples 4 that is of a size of 10mm * 5mm * 1mm and upper and lower surfaces polishing, be fixed on the three-D displacement platform after cleaning with absolute ethyl alcohol; Pulsewidth when femtosecond laser is directly write three-D pattern in quartz glass samples inside is 58fs, and centre wavelength is 800nm, and repetition rate is 250kHz; Adopting numerical aperture when directly writing three-dimensional microcavity pattern is that 0.9 microcobjective focuses on, and the femtosecond laser mean power is 50mW; Sweep speed is 600 μ m/s; During laser scanning; Be the little dish 7 of preparation by 6 supports of ramuscule post; Round the near zone 5 of little pillar and little dish by laser irradiation successively from the bottom up; Wherein ramuscule post 6, little dish 7 are set at
respectively with respect to the angle of substrate, and the radius of the radius of ramuscule post 6, little dish 7 is respectively 12 μ m, 29 μ m;
(2) chemical attack: the quartz glass samples behind the femtosecond laser irradiation 4 is put into 5% HF (generally requiring the concentration below 20%) solution or 5mol/L KOH solution (generally getting the concentration below the 20mol/L); Until being removed, on quartz glass samples, form little dish 7 structures that supporting by ramuscule post 6 by the zone 5 of laser irradiation;
(3) carbon dioxide laser annealing: the quartz glass samples 4 that has little dish 7 structures that supported by ramuscule post 6 that will pass through after step (2) is handled is fixed on the three-dimensional trim holder; Make the carbon dioxide laser beam that focuses on through lens aim at the upper surface of the center normal incidence of little dish 7 to little dish 7; And carbon dioxide laser beam drops on the size of the irradiated site of little dish 7 upper surfaces greater than little dish 7; Little dish 7 is heated to the automatic thermal contraction of softening temperature back edge, forms circular edge.
Fig. 2 (a) and (b) represent respectively on the quartz specimen 4 by the optical microphotograph picture of the optics Whispering-gallery-mode microcavity of the three-dimensional before and after the carbon dioxide laser annealing; Illustration is a vertical view; Visible by figure; After carbon dioxide laser annealing, the roughness at microcavity edge significantly improves, and is quite smooth; The circumferential boundary that has the zigzag fluctuating is shunk the smooth torus that becomes little ring-type; (c) the ESEM picture of the optics Whispering-gallery-mode microcavity of the three-dimensional after the process carbon dioxide laser annealing on the expression quartz specimen 4; (d) the ESEM picture through latter two microcavity of carbon dioxide laser annealing on the expression quartz specimen 4, different edge amounts of contraction is to be caused by different annealing times.
The inventive method can utilize femtosecond laser to prepare three-dimensional optical Whispering-gallery-mode microcavity on material substrate such as various transparent glass, crystal and pottery, and the size of described little pillar, the size of little dish, little pillar and little dish are confirmed by design with respect to the angle of substrate.This three-dimensional optical Whispering-gallery-mode microcavity has high-quality-factor, durable characteristics.Be higher than 10 through the test article prime factor
6
Claims (3)
1. a method of utilizing femtosecond laser to prepare three-dimensional echo wall mode optical micro-cavity is characterized in that comprising the following steps:
(1) femtosecond laser irradiation:
Described three-dimensional Whispering-gallery-mode microcavity is a kind of little dish structure by little shore supports; Be the little dish of preparation by little shore supports; Little pillar, little dish of processing are fixed on the position on the three-D displacement platform with respect to the size and the transparent material sample of the size of the angle of substrate, little pillar, little dish at first as required, and the motion of described three-D displacement platform is programmed;
The transparent material sample is fixed on the described three-D displacement platform; Through microcobjective femtosecond laser is focused on the described transparent material sample; When driving described three-D displacement platform motion by programming; Start described femtosecond laser light beam described transparent material sample is carried out irradiation, laser is irradiation successively around the zone of described little pillar and little dish, the motion of described three-D displacement platform and the same EOS of described femtosecond laser irradiation;
(2) chemical attack:
Transparent material sample behind the femtosecond laser irradiation is put into HF solution or KOH solution, described irradiated site is carried out selective chemical corrosion, obtain on the transparent material substrate by little dish little shore supports, that tilt with design angle with respect to substrate;
(3) carbon dioxide laser annealing:
Carbon dioxide laser beam is focused on and aims at the center of little dish through lens; The upper surface that impinges perpendicularly on little dish heats; And monitor annealing process in real time with microcobjective and ccd detector: in time adjust mean power, the dutycycle of carbon dioxide laser pulse, be heated to the softening temperature of material when little dish after, will cause the thermal contraction at edge; Produce backflow effeet; Surface tension impels the script rough edge to become the microcavity edge of little ring-type, and when described microcavity obtained appropriate shrinkage degree, annealing finished.
2. according to the described method of utilizing femtosecond laser to prepare three-dimensional Whispering-gallery-mode microcavity of claim 1, it is characterized in that described transparent material is glass, crystal or pottery.
3. according to the described method of utilizing femtosecond laser to prepare three-dimensional Whispering-gallery-mode microcavity of claim 1; It is characterized in that the size of the size of described little pillar much smaller than described little dish, the size of described little pillar, the size of little dish, little pillar and little dish are confirmed by design with respect to the angle of substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210056401XA CN102530852A (en) | 2012-03-06 | 2012-03-06 | Method for fabricating three-dimensional optical echo wall mode micro-cavity by using femtosecond laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210056401XA CN102530852A (en) | 2012-03-06 | 2012-03-06 | Method for fabricating three-dimensional optical echo wall mode micro-cavity by using femtosecond laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102530852A true CN102530852A (en) | 2012-07-04 |
Family
ID=46339083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210056401XA Pending CN102530852A (en) | 2012-03-06 | 2012-03-06 | Method for fabricating three-dimensional optical echo wall mode micro-cavity by using femtosecond laser |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102530852A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103738915A (en) * | 2014-01-03 | 2014-04-23 | 中国科学院上海光学精密机械研究所 | Preparation method for three-dimensional crystal optics echo wall micro-cavity |
| CN104439710A (en) * | 2014-11-07 | 2015-03-25 | 江南大学 | Water jet assisted laser chemical etching device and method |
| CN104868351A (en) * | 2015-04-27 | 2015-08-26 | 清华大学 | Method for adjusting resonant frequency of echo wall mode microcavity |
| CN106374335A (en) * | 2016-10-31 | 2017-02-01 | 中国科学院上海光学精密机械研究所 | Fabrication method for electro-optical tuning whispering gallery mode microcavity of integrated electrode |
| CN106891092A (en) * | 2015-12-15 | 2017-06-27 | 航天科工惯性技术有限公司 | A kind of silica micro structure processing method |
| CN107748402A (en) * | 2017-10-16 | 2018-03-02 | 中国科学院上海光学精密机械研究所 | Double plate optics Whispering-gallery-mode lithium niobate microcavity and preparation method thereof |
| CN111158082A (en) * | 2020-02-17 | 2020-05-15 | 北京工业大学 | Preparation method for forming optical echo wall micro-cavity by using fluid instability in fiber |
| EP4311611A1 (en) * | 2022-07-29 | 2024-01-31 | Richemont International S.A. | Methods of manufacturing a composite horological or jewelry component |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050163185A1 (en) * | 2002-10-02 | 2005-07-28 | Vahala Kerry J. | Surface functionalization of micro-resonators |
| CN101257185A (en) * | 2008-02-28 | 2008-09-03 | 复旦大学 | Method for manufacturing organic and inorganic composite echo wall mode optical micro-cavity laser |
| CN101549852A (en) * | 2009-05-22 | 2009-10-07 | 中国科学院上海光学精密机械研究所 | Method for preparing uniform three dimensional nanometer fluid passage by femto-second laser |
-
2012
- 2012-03-06 CN CN201210056401XA patent/CN102530852A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050163185A1 (en) * | 2002-10-02 | 2005-07-28 | Vahala Kerry J. | Surface functionalization of micro-resonators |
| CN101257185A (en) * | 2008-02-28 | 2008-09-03 | 复旦大学 | Method for manufacturing organic and inorganic composite echo wall mode optical micro-cavity laser |
| CN101549852A (en) * | 2009-05-22 | 2009-10-07 | 中国科学院上海光学精密机械研究所 | Method for preparing uniform three dimensional nanometer fluid passage by femto-second laser |
Non-Patent Citations (1)
| Title |
|---|
| JINTIAN LIN ET AL.: ""On-chip three-dimensional high-Q microcavities fabricated by femtosecond laser direct writing"", 《HTTP://ARXIV.ORG/ABS/1112.5702V2》 * |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103738915A (en) * | 2014-01-03 | 2014-04-23 | 中国科学院上海光学精密机械研究所 | Preparation method for three-dimensional crystal optics echo wall micro-cavity |
| CN103738915B (en) * | 2014-01-03 | 2015-10-28 | 中国科学院上海光学精密机械研究所 | The preparation method of three-dimensional crystal optics Echo Wall microcavity |
| CN104439710A (en) * | 2014-11-07 | 2015-03-25 | 江南大学 | Water jet assisted laser chemical etching device and method |
| CN104868351A (en) * | 2015-04-27 | 2015-08-26 | 清华大学 | Method for adjusting resonant frequency of echo wall mode microcavity |
| CN104868351B (en) * | 2015-04-27 | 2018-08-03 | 清华大学 | A method of adjusting Whispering-gallery-mode microcavity resonant frequency |
| CN106891092A (en) * | 2015-12-15 | 2017-06-27 | 航天科工惯性技术有限公司 | A kind of silica micro structure processing method |
| CN106891092B (en) * | 2015-12-15 | 2018-10-26 | 航天科工惯性技术有限公司 | A kind of silica micro structure processing method |
| CN106374335A (en) * | 2016-10-31 | 2017-02-01 | 中国科学院上海光学精密机械研究所 | Fabrication method for electro-optical tuning whispering gallery mode microcavity of integrated electrode |
| CN107748402A (en) * | 2017-10-16 | 2018-03-02 | 中国科学院上海光学精密机械研究所 | Double plate optics Whispering-gallery-mode lithium niobate microcavity and preparation method thereof |
| CN107748402B (en) * | 2017-10-16 | 2019-10-18 | 中国科学院上海光学精密机械研究所 | Double plate optics Whispering-gallery-mode lithium niobate microcavity and preparation method thereof |
| CN111158082A (en) * | 2020-02-17 | 2020-05-15 | 北京工业大学 | Preparation method for forming optical echo wall micro-cavity by using fluid instability in fiber |
| EP4311611A1 (en) * | 2022-07-29 | 2024-01-31 | Richemont International S.A. | Methods of manufacturing a composite horological or jewelry component |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102530852A (en) | Method for fabricating three-dimensional optical echo wall mode micro-cavity by using femtosecond laser | |
| Sugioka et al. | Femtosecond laser processing for optofluidic fabrication | |
| Ovsianikov et al. | Ultra-low shrinkage hybrid photosensitive material for two-photon polymerization microfabrication | |
| Butkutė et al. | 3D manufacturing of glass microstructures using femtosecond laser | |
| CN101549852B (en) | Method for preparing uniform three dimensional nanometer fluid passage by femto-second laser | |
| FR3024446A1 (en) | METHOD OF MANUFACTURING MOLDED GLASS ARTICLE AS PREDETERMINED GEOMETRY, USE OF GLASS ARTICLE MADE THEREFROM, AND METHOD OF GLASS PRODUCT | |
| TWI407135B (en) | Structure and manufacturing method of the same | |
| US11305482B2 (en) | Continuous and scalable 3D nanoprinting | |
| Abolmaali et al. | Photonic jets for highly efficient mid-IR focal plane arrays with large angle‐of‐view | |
| CN104625415A (en) | Method and device for preparing bionic super-hydrophobic micro-nano surface through femtosecond laser | |
| CN101571603A (en) | Method for preparing micro optical element on quartz glass substrate by applying femto-second laser | |
| CN101101356A (en) | Method for preparing microfluid optical waveguide on glass substrate using femtosecond laser | |
| Wang et al. | Three-dimensional integration of microoptical components buried inside photosensitive glass by femtosecond laser direct writing | |
| CN107748402B (en) | Double plate optics Whispering-gallery-mode lithium niobate microcavity and preparation method thereof | |
| CN110989085A (en) | Binary diffraction lens based on optical fiber | |
| JP6469717B2 (en) | Variable photothermal lens | |
| CN108620728A (en) | Semiconductor silicon surface large area regular distribution nano-pore array structure preparation method | |
| Hasse et al. | Selective etching of fs-laser inscribed high aspect ratio microstructures in YAG | |
| Wlodarczyk et al. | Direct CO 2 laser-based generation of holographic structures on the surface of glass | |
| CN107357044A (en) | A kind of step multimode fibre optical tweezer based on skew ray annular light field | |
| CN103738915B (en) | The preparation method of three-dimensional crystal optics Echo Wall microcavity | |
| Kostyuk et al. | Microlens array fabrication on fused silica influenced by NIR laser | |
| CN111025466A (en) | Multi-focus diffraction lens based on optical fiber | |
| Zakoldaev et al. | Laser-induced Black-body Heating (LIBBH) as a Method for Glass Surface Modification. | |
| Itoh | Ultrafast laser processing of glass |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120704 |