CN107722312A - A kind of quantum dot optical thin film of no Obstruct membrane and preparation method thereof - Google Patents

A kind of quantum dot optical thin film of no Obstruct membrane and preparation method thereof Download PDF

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Publication number
CN107722312A
CN107722312A CN201710916018.XA CN201710916018A CN107722312A CN 107722312 A CN107722312 A CN 107722312A CN 201710916018 A CN201710916018 A CN 201710916018A CN 107722312 A CN107722312 A CN 107722312A
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CN
China
Prior art keywords
quantum dot
solution
optical thin
thin film
resin
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Pending
Application number
CN201710916018.XA
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Chinese (zh)
Inventor
张彦兵
张立强
张力广
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Have New Materials (huizhou) Co Ltd
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Have New Materials (huizhou) Co Ltd
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Priority to CN201710916018.XA priority Critical patent/CN107722312A/en
Publication of CN107722312A publication Critical patent/CN107722312A/en
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2327/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2327/02Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2327/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing chlorine atoms
    • C08J2327/06Homopolymers or copolymers of vinyl chloride
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2333/10Homopolymers or copolymers of methacrylic acid esters
    • C08J2333/12Homopolymers or copolymers of methyl methacrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2369/00Characterised by the use of polycarbonates; Derivatives of polycarbonates

Abstract

The present invention discloses a kind of quantum dot optical thin film of no Obstruct membrane and preparation method thereof, it includes body, body is by quantum dot colloidal solution film-forming, quantum dot colloidal solution includes 0.5 part of quantum dot solution and resin solution, the concentration of quantum dot solution is 15mg/L, and it is parts by weight that resin solution, which includes 10 parts of organic resins, 100~400 parts of diluents and 0.1 part of auxiliary agent, number, by the way that each component to be mixed to prepare to quantum dot colloidal solution, naturally dry film forming in proportion.Quantum dot is coated in organic resin by the quantum dot optical thin film of the application by the film forming of organic resin, is protected without substrate support and Obstruct membrane, can be used directly after film-forming; waterproof and oxidation proof propertiess are excellent; and light transmittance is improved, manufacture craft is simplified, reduces material cost.

Description

A kind of quantum dot optical thin film of no Obstruct membrane and preparation method thereof
Technical field
The present invention relates to quantum dot optical film technology field, in particular it relates to a kind of quantum dot optics of no Obstruct membrane Film and preparation method thereof.
Background technology
Display Technique develops into today, from monochrome to colour, from obscuring to clear, size from small to large, after countless Change, the production technology of display disappear in the hope of what its product can adapt to that consumer changes increasingly in continuous improve and perfect Take a lot of trouble reason and consumer behavior.
At present, quantum dot optical film is applied in Display Technique.Quantum dot is semiconductor nanocrystal, for showing skill Art can accurately convey light, have efficient display color gamut value, make color more pure bright-coloured, color representation is more opened Power.
Quantum dot optical film is by the way that quantum dot colloidal solution is made.The preparation of quantum dot colloidal solution is production without cadmium amount One of core technology of son point optical thin film.The levelability and viscosity of colloidal solution directly affect the scattered and optics of quantum dot The performance such as the water proofing property of film, light transmittance, ageing-resistant, all constrains the development of this technology.Existing backlight shows quantum dot Optical thin film uses two layers of Obstruct membrane coated quantum dots colloidal solution, adds the cost of optical thin film, and its light transmittance is low, Water oxygen resistant performance is not excellent, is always a difficult point for preparing quantum dot backlight display optical films.
The content of the invention
In view of the shortcomings of the prior art, the present invention provides quantum dot optical thin film and its preparation side of a kind of no Obstruct membrane Method.
A kind of quantum dot optical thin film of no Obstruct membrane disclosed by the invention, it includes body, and body is by quantum dot colloid Solution film-forming, quantum dot colloidal solution include 0.5 part of quantum dot solution and resin solution, and the concentration of quantum dot solution is 15mg/L, it is parts by weight that resin solution, which includes 10 parts of organic resins, 100~400 parts of diluents and 0.1 part of auxiliary agent, number,.
According to an embodiment of the present invention, above-mentioned organic resin is water white transparency and the macromolecule material with film forming Material.
According to an embodiment of the present invention, above-mentioned organic resin includes polymethyl methacrylate, makrolon or poly- Vinyl chloride.
According to an embodiment of the present invention, above-mentioned diluent is the corresponding solution for dissolving organic resin.
According to an embodiment of the present invention, above-mentioned diluent includes one kind of dimethylbenzene, toluene, acetone or tetrahydrofuran It is or a variety of.
According to an embodiment of the present invention, above-mentioned auxiliary agent includes one kind of coupling agent, defoamer, dispersant or levelling agent It is or a variety of.
The invention also discloses a kind of preparation method of the quantum dot optical thin film of no Obstruct membrane, comprise the following steps:
Organic resin is mixed with diluent, and heated 1~10 hour in 50~120 DEG C, until organic resin is completely molten Solution, resin solution is made;
Quantum dot is added in resin solution, adds diluent, vacuum mixing is scattered, stands more than 3 hours, and amount is made Son point colloidal solution;
Quantum dot colloidal solution is coated on substrate surface, coating thickness is 0.05~0.3mm, dries film forming, by film from Substrate surface peels off, and quantum dot optical thin film is made.
According to an embodiment of the present invention, above-mentioned base material is PET.
According to an embodiment of the present invention, after resin solution being made, auxiliary agent is added, mixing is scattered.
Compared with prior art, the present invention can be obtained including following technique effect:
Quantum dot is coated in organic resin by the quantum dot optical thin film of the application by the film forming of organic resin, Protect, can be used directly after film-forming, waterproof and oxidation proof propertiess are excellent, and improve without substrate support and Obstruct membrane Light rate, manufacture craft is simplified, reduce material cost.
Embodiment
Multiple embodiments of the application will be disclosed below, as clearly stated, details in many practices will with Illustrate in the lump in lower narration.It should be appreciated, however, that the details in these practices is not applied to limit the application.That is, In some embodiments of the application, the details in these practices is non-essential.
In addition, the technical scheme between each embodiment can be combined with each other, but must be with ordinary skill Personnel can be implemented as basis, and this technical side is will be understood that when the combination appearance of technical scheme is conflicting or can not realize The combination of case is not present, also not within the protection domain of application claims.
The quantum dot optical thin film without Obstruct membrane of the application includes body, and body is solidified into by quantum dot colloidal solution Film, quantum dot colloidal solution include 0.5 part of quantum dot solution and resin solution, and the concentration of quantum dot solution is 15mg/L, resin Solution is parts by weight including 10 parts of organic resins, 100~400 parts of diluents and 0.1 part of auxiliary agent number.
Specifically, organic resin need to select water white transparency and the high polymer material with good film forming, pass through choosing With the raw material of water white transparency, light transmittance is improved;By from good film forming raw material, can naturally dry into Film, its internal and external environment, waterproof is anti-oxidation.Preferably, organic resin can be polymethyl methacrylate, poly- carbonic acid Ester or polyvinyl chloride, raw material are readily available.Diluent is used to dilute organic resin, therefore need to select what can be blended with organic resin Raw material, meanwhile, diluent is additionally operable to scattered quantum dot and quantum dot is quenched, and prevents quantum dot from reuniting and causes to disperse not .Preferably, diluent can be one or more kinds of mixing of dimethylbenzene, toluene, acetone or tetrahydrofuran.
By the way that organic resin is mixed with diluent, mixed in proportion according to the demand of required viscosity and mobility, then Heated 1 hour~10 hours in 50 DEG C~120 DEG C, it is ensured that organic resin is dissolved completely in diluent, if having undissolved residual Thing is stayed to pull out, it is ensured that the homogeneity of solution, resin solution to be made.Appropriate addition coupling agent, defoamer, dispersant as needed Or one or more auxiliary agents of levelling agent.Adding quantum dot, quantum dot can be powder, or the solution mixed with quantum dot, then Add appropriate diluent to adjust to appropriate viscosity, mixed using high-speed vacuum, quantum dot is dispersed in organic solvent, it is quiet Put more than 3 hours until defoaming and finish, quantum dot colloidal solution is made.Quantum dot colloidal solution is coated on poly terephthalic acid On the base material of second diester, coating thickness is 0.05~0.3mm, after coating wait quantum dot colloidal solution naturally dry into Film, film is peeled off from substrate surface, required size is cut to according to needs of production, base material is repeatable to be utilized, cost-effective. Quantum dot optical thin film is made to can be used directly in display.
Influence of the content to finished product thickness of diluent will be illustrated by 6 embodiments below.It is as shown in table 1 below, each In the case of the content identical of the organic resin of embodiment, quantum dot solution and auxiliary agent, the diluent of different content is added.
Table 1
After quantum dot colloidal solution is made according to the method described above, it is respectively coated in substrate surface, each embodiment Coating thickness is all 0.15mm, after having coated, waits its naturally dry film forming, then measures the thickness after film forming one by one with slide calliper rule, is surveyed It is as shown in table 2 below to try data.
Table 2
Embodiment 1 2 3 4 5 6
Thickness (mm) 0.1 0.09 0.08 0.07 0.06 0.06
In summary, quantum dot has been coated on by the quantum dot optical thin film of the application by the film forming of organic resin In machine resin, to protect without substrate support and Obstruct membrane, can be used directly after film-forming, waterproof and oxidation proof propertiess are excellent, And light transmittance is improved, manufacture craft is simplified, reduces material cost.
The upper only embodiments of the present invention, are not intended to limit the invention.For those skilled in the art For, the present invention can have various modifications and variations.All any modifications made in spirit and principles of the present invention, it is equal Replace, improve etc., it all should be included within scope of the presently claimed invention.

Claims (9)

1. a kind of quantum dot optical thin film of no Obstruct membrane, it is characterised in that including body, the body is molten by quantum dot colloid Liquid film-forming, the quantum dot colloidal solution include 0.5 part of quantum dot solution and resin solution, the quantum dot solution it is dense Spend includes 10 parts of organic resins, 100~400 parts of diluents and 0.1 part of auxiliary agent, the number for 15mg/L, the resin solution For parts by weight.
2. quantum dot optical thin film according to claim 1, it is characterised in that the organic resin is water white transparency and tool There is the high polymer material of film forming.
3. quantum dot optical thin film according to claim 2, it is characterised in that the organic resin includes polymethyl Sour methyl esters, makrolon or polyvinyl chloride.
4. quantum dot optical thin film according to claim 3, it is characterised in that the diluent has to correspond to described in dissolving The solution of machine resin.
5. quantum dot optical thin film according to claim 4, it is characterised in that the diluent include dimethylbenzene, toluene, The one or more of acetone or tetrahydrofuran.
6. according to any described quantum dot optical thin films of claim 1-5, it is characterised in that the auxiliary agent include coupling agent, The one or more of defoamer, dispersant or levelling agent.
A kind of 7. preparation method of the quantum dot optical thin film of no Obstruct membrane according to claim 6, it is characterised in that bag Include following steps:
Organic resin is mixed with diluent, and heated 1~10 hour in 50~120 DEG C, until organic resin is completely dissolved, is made Obtain resin solution;
Quantum dot is added in the resin solution, adds the diluent, vacuum mixing is scattered, stands more than 3 hours, system Obtain quantum dot colloidal solution;
The quantum dot colloidal solution is coated on substrate surface, coating thickness is 0.05~0.3mm, dries film forming, by film from The substrate surface peels off, and quantum dot optical thin film is made.
8. preparation method according to claim 7, it is characterised in that the base material is PET.
9. preparation method according to claim 7, it is characterised in that after the resin solution is made, add auxiliary agent, mixing It is scattered.
CN201710916018.XA 2017-09-30 2017-09-30 A kind of quantum dot optical thin film of no Obstruct membrane and preparation method thereof Pending CN107722312A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109082050A (en) * 2018-08-15 2018-12-25 武汉理工大学 A kind of preparation method of CQDs@PVP/PVDF compound dielectric film
CN109320753A (en) * 2018-11-21 2019-02-12 衡山县佳诚新材料有限公司 A kind of quantum dot film of water resistant oxygen
CN110962427A (en) * 2019-11-25 2020-04-07 Tcl华星光电技术有限公司 Quantum dot film
CN111273484A (en) * 2020-03-11 2020-06-12 宁波东旭成新材料科技有限公司 Barrier-free diaphragm quantum dot film
CN113061273A (en) * 2021-03-10 2021-07-02 西南科技大学 Preparation method of high-performance polaroid
CN114889308A (en) * 2022-04-18 2022-08-12 南京贝迪新材料科技股份有限公司 Barrier-free quantum dot film processing device and processing method thereof

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CN104861958A (en) * 2015-05-14 2015-08-26 北京理工大学 Perovskite/polymer composite luminescent material and preparation method thereof
CN105315621A (en) * 2014-07-10 2016-02-10 Tcl集团股份有限公司 Quantum dot/epoxy resin particle, preparation method thereof, quantum dot optical film and backlight module
CN105425540A (en) * 2016-01-04 2016-03-23 京东方科技集团股份有限公司 Quantum dot film, preparing method thereof, quantum dot film patterning method and displayer
US20160161066A1 (en) * 2014-12-08 2016-06-09 Lg Electronics Inc. Method for preparing quantum dot-polymer complex, quantum dot-polymer complex, light conversion film, backlight unit and display device having the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105315621A (en) * 2014-07-10 2016-02-10 Tcl集团股份有限公司 Quantum dot/epoxy resin particle, preparation method thereof, quantum dot optical film and backlight module
US20160161066A1 (en) * 2014-12-08 2016-06-09 Lg Electronics Inc. Method for preparing quantum dot-polymer complex, quantum dot-polymer complex, light conversion film, backlight unit and display device having the same
CN104861958A (en) * 2015-05-14 2015-08-26 北京理工大学 Perovskite/polymer composite luminescent material and preparation method thereof
CN105425540A (en) * 2016-01-04 2016-03-23 京东方科技集团股份有限公司 Quantum dot film, preparing method thereof, quantum dot film patterning method and displayer

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109082050A (en) * 2018-08-15 2018-12-25 武汉理工大学 A kind of preparation method of CQDs@PVP/PVDF compound dielectric film
CN109320753A (en) * 2018-11-21 2019-02-12 衡山县佳诚新材料有限公司 A kind of quantum dot film of water resistant oxygen
CN110962427A (en) * 2019-11-25 2020-04-07 Tcl华星光电技术有限公司 Quantum dot film
CN111273484A (en) * 2020-03-11 2020-06-12 宁波东旭成新材料科技有限公司 Barrier-free diaphragm quantum dot film
CN111273484B (en) * 2020-03-11 2023-08-22 宁波东旭成新材料科技有限公司 Non-resistance diaphragm quantum dot film
CN113061273A (en) * 2021-03-10 2021-07-02 西南科技大学 Preparation method of high-performance polaroid
CN113061273B (en) * 2021-03-10 2022-05-17 西南科技大学 Preparation method of high-performance polaroid
CN114889308A (en) * 2022-04-18 2022-08-12 南京贝迪新材料科技股份有限公司 Barrier-free quantum dot film processing device and processing method thereof

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Application publication date: 20180223