CN107714491A - One kind, which is releived, repairs parent-offspring's facial mask - Google Patents

One kind, which is releived, repairs parent-offspring's facial mask Download PDF

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Publication number
CN107714491A
CN107714491A CN201711080674.7A CN201711080674A CN107714491A CN 107714491 A CN107714491 A CN 107714491A CN 201711080674 A CN201711080674 A CN 201711080674A CN 107714491 A CN107714491 A CN 107714491A
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CN
China
Prior art keywords
phases
facial mask
essence
parent
offspring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201711080674.7A
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Chinese (zh)
Inventor
李嘉欣
杨翠兰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nox Bellcow Cosmetics Co Ltd
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Nox Bellcow Cosmetics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
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Priority to CN201711080674.7A priority Critical patent/CN107714491A/en
Publication of CN107714491A publication Critical patent/CN107714491A/en
Pending legal-status Critical Current

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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/02Cosmetics or similar toiletry preparations characterised by special physical form
    • A61K8/0212Face masks
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/63Steroids; Derivatives thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/30Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
    • A61K8/67Vitamins
    • A61K8/673Vitamin B group
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/72Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
    • A61K8/73Polysaccharides
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K8/00Cosmetics or similar toiletry preparations
    • A61K8/18Cosmetics or similar toiletry preparations characterised by the composition
    • A61K8/96Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
    • A61K8/965Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution of inanimate origin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61QSPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
    • A61Q19/00Preparations for care of the skin
    • A61Q19/005Preparations for sensitive skin

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Birds (AREA)
  • Epidemiology (AREA)
  • Dermatology (AREA)
  • Cosmetics (AREA)

Abstract

One kind, which is releived, repairs parent-offspring's facial mask, including facial mask cloth and Essence, and the Essence contains, allantoin, EDTA 2NA, xanthans, small molecule carboxymethylchitosan, hydroxyethyl cellulose, parahydroxyacet-ophenone:0.35% 0.4%, extra large sludge extract, D panthenols, dipotassium glycyrrhizinate, beta glucan, Phenoxyethanol, the rilanit specials of PEG 60;Gentle not sticky, skin feels more salubrious gentle, and facial mask essence is applied to child adult.Different stamp tencel facial mask cloths is mixed, it is a for child, it is a to be used to father and mother.It is not only the enjoyment of mother from this face mask film, the participation for having baby and father, face mask film can turns into a part for homely pleasure.A releive repairs parent-offspring's facial mask, and while giving child's adult skin and more take good care of, increase family is interesting, promotes harmonious warm family relationship, allows you and your baby to enjoy the warm time for calmness of releiving.

Description

One kind, which is releived, repairs parent-offspring's facial mask
Technical field
The present invention relates to a kind of facial mask.
Background technology
Child can receive different challenges in each age bracket, skin, not developed also completely in the child of infancy, all with life The sebum diaphragm come is just slowly decorporated, along with childhood, can touch more external environment conditions stimulates, and skin is compared with infancy more For drying, dehydration, the natural acid man-tle of skin surface is more easily damaged, in particular to summer, sunny, Hai Zidou Like under sunlight playing, then child can be allowed to enjoy the sunlight of abundance, and do not allow the tender skin of child by the sun Burn, the juvenile product of a reparation of releiving can just escort for their tender and lovely skins, keep high face value.
According to everybody understanding, the skin of adult and the skin of children are otherwise varied.Children are in growth and development stage, skin Sebaceous glands in corium is not yet ripe, rich blood vessel, and for rete vasculosum close to epidermis, heat dissipation capacity is big, sensitive to extraneous thermotonus;Again In addition surface is tender and lovely very thin, and the collagenous fibres and elastomer of corium are fragile, and antibacterial ability and immunity are all very weak, run into external Stimulate the reaction for just having sensitivity.It is more much better than than babies to environmental stimuli resistance and the skin surface being grown up is thick, so The skin care item of adult are not suitable for using to babies, on the contrary, the adult of sensitive flesh can just be reduced from the skin-protection product of children Sensitive risk.
The content of the invention
The purpose of the present invention is:One kind be provided releived and repair parent-offspring's facial mask, it rich in glacial water, D-pantothenyl aleohol (Panthenol) etc. into Point, coordinate pH faintly acid formulas, gently not sticky, skin feels more salubrious gentle, calmness of releiving;Facial mask essence is applied to big Child people.
What the present invention was realized in:One kind, which is releived, repairs parent-offspring's facial mask, including facial mask cloth and Essence, the Essence are matched somebody with somebody Square weight percent matches:
A phases:
Purified water:87.623-92.338%, allantoin:0.08%-0.15%,
EDTA-2NA:0.02%-0.05%;
B phases:
Xanthans:0.05%-0.1%, small molecule carboxymethylchitosan:0.01%-0.03%,
Hydroxyethyl cellulose:0.05%-0.08%, butanediol:5.0%-8.0%
C phases:
Parahydroxyacet-ophenone:0.35%-0.4%;
D phases:
Extra large sludge extract:1.5%-2.5%, D-pantothenyl aleohol:0.25%-0.4%,
Dipotassium glycyrrhizinate:0.1%-0.2%, beta glucan:0.15%-0.25%,
Phenoxyethanol:0.08%-0.15%;
E phases:
PEG-60 rilanit specials:0.02%-0.06%, essence:0.002%-0.007%;
Each raw material weight percentage sum is 100% above.
Described one kind, which is releived, repairs parent-offspring's facial mask, and it is characterized in that, preparation method is according to the following steps:
(1) first the purified water in A phases is added in aqueous phase cylinder, opens stirring, design temperature is 80 DEG C;Under stirring, add Enter EDTA-2NA, allantoin, it is fully dissolved;
(2) in advance in container by the small molecule carboxymethylchitosan in B phases, xanthans and hydroxyethyl cellulose fourth Glycol disperses;
(3) emulsion tank temperature is set as 80 DEG C;When aqueous phase cylinder dissolution of raw material is complete, it is pumped into emulsion tank;Add and divide in advance The B phase raw materials dissipated, open homogeneous 3-5 minutes, high speed homogenization 1500-2500r/min, until forming water white transparency viscous fluid Body, after being incubated 5-10 minutes, open cooling water temperature.
(4) when temperature is reduced to 65 DEG C, C phase raw material parahydroxyacet-ophenones are slowly added to;Open homogeneous 2 minutes, low speed homogeneous 1500r/min, homogeneous finish, and continue to stir and cool.
(5) PEG-60 rilanit specials and essence in E phases are mixed evenly in container in advance;
(6) when temperature is reduced to 40 DEG C, D phases, E phase raw materials are sequentially added, continues to stir 10-15 minutes, until dissolving is complete.
(7) physical and chemical index of product is examined, is discharged after qualified;
(8) discharge censorship, after indices are qualified in the filling facial mask cloth to tencel.
One kind of the present invention, which is releived, repairs parent-offspring's facial mask, has advantages below:(1) a variety of Shu Min agent are with the addition of, can be moistened, alleviate flesh Anti-irritant, reparation impaired tender and lovely skin while skin dry sensation;(2) formula is gentle, quality is not clearly sticky, and water content is high, It is applicable not only to be grown up, is more suitable for children;(3) a father and mother's money, a children's money, child's adult face mask film together, jointly Parent-offspring's time of warmth can also be enjoyed after skin care, maintains parent child relationship, along with Essence coordinates interesting stamp tencel, Increase the entertaining sense of skin care.
Embodiment
With reference to embodiment, the invention will be further described.
Embodiment 1
One kind, which is releived, repairs parent-offspring's facial mask, including facial mask cloth and Essence, the formulation weight per distribution ratio of the Essence are:
A phases:
Purified water:92.338%, allantoin:0.08%, EDTA-2NA:0.02%,
B phases:
Xanthans:0.05%, small molecule carboxymethylchitosan:0.01%,
Hydroxyethyl cellulose:0.05%, butanediol:5.0%;
C phases:
Parahydroxyacet-ophenone:0.35%;
D phases:
Extra large sludge extract:1.5%, D-pantothenyl aleohol:0.25%,
Dipotassium glycyrrhizinate:0.1%, beta glucan:0.15%,
Phenoxyethanol:0.08%;
E phases:
PEG-60 rilanit specials:0.02%, essence:0.002%.
Its preparation method is according to the following steps:
(1) first the purified water in A phases is added in aqueous phase cylinder, opens stirring, design temperature is 80 DEG C;Under stirring, add Enter EDTA-2NA, allantoin, it is fully dissolved;
(2) in advance in container by the small molecule carboxymethylchitosan in B phases, xanthans and hydroxyethyl cellulose fourth Glycol disperses;
(3) emulsion tank temperature is set as 80 DEG C;When aqueous phase cylinder dissolution of raw material is complete, it is pumped into emulsion tank;Add and divide in advance The B phase raw materials dissipated, open homogeneous 3-5 minutes, high speed homogenization 1500-2500r/min, until forming water white transparency viscous fluid Body, after being incubated 5-10 minutes, open cooling water temperature.
(4) when temperature is reduced to 65 DEG C, C phase raw material parahydroxyacet-ophenones are slowly added to;Open homogeneous 2 minutes, low speed homogeneous 1500r/min, homogeneous finish, and continue to stir and cool.
(5) PEG-60 rilanit specials and essence in E phases are mixed evenly in container in advance;
(6) when temperature is reduced to 40 DEG C, D phases, E phase raw materials are sequentially added, continues to stir 10-15 minutes, until dissolving is complete.
(7) physical and chemical index of product is examined, is discharged after qualified;
(8) discharge censorship, filling into facial mask cloth after indices are qualified.
It contains a variety of NMFs, Shu Min agent.The beta glucan wherein extracted from yeast can reduce the allergy induced by inflammation Reaction, being one contributes to reduction stress be with the active component of inflammation.By testing, after showing beta glucan to ultraviolet light Cell have protection and the ability recovered, it effectively removes antigen as caused by being stimulated UV, reduces the susceptibility of skin, thus make The more aobvious pure and fresh vigor of skin, it is soft flexible.The provitamin D-pantothenyl aleohol of Panthenol is mixed simultaneously, is as a kind of active matter Key effect is played in the metabolism of human body, can prevent from producing erythema by ultraviolet light irradiation, epidermal wound can be accelerated The time of healing about 30%, the moisture for being greatly improved Dry and other effects.D-pantothenyl aleohol can stimulate in the product Skin is newborn, promotes the effect of wound healing and anti-inflammatory.
In addition, also added Canadian glacier ooze extract, its contain the mineral elements of a variety of nourishing skin, rare earth element and Ion, electric conductivity, ion exchange and osmosis are made it have, therefore bring instantaneous cooling effect, there is anti-inflammatory efficacy, have Help reduce pore, reduce sebaceous gland activity.Dipotassium glycyrrhizinate is wide variety of one kind in the industries such as medicine, daily use chemicals, food Anti-inflammatory, antiallergy, moisturizing, the Shu Min agent of cleaning skin.On the whole, such facial mask essence reaches reparation of releiving from many aspects Effect.Different stamp tencel facial mask cloths is mixed, it is a for child, it is a to be used to father and mother.From this face mask film not only It is the enjoyment of mother, the participation for having baby and father, face mask film can turns into a part for homely pleasure.A reparation of releiving Parent-offspring's facial mask, while giving child's adult skin and more take good care of, increase family is interesting, promotes harmonious warm family to close System, you and your baby is allowed to enjoy the warm time for calmness of releiving.
Embodiment 2
One kind, which is releived, repairs parent-offspring's facial mask, including facial mask cloth and Essence, the formulation weight per distribution ratio of the Essence are:
A phases:
Purified water:90.555%, allantoin:0.10%, EDTA-2NA:0.03%;
B phases:
Xanthans:0.08%, small molecule carboxymethylchitosan:0.02%,
Hydroxyethyl cellulose:0.06%, butanediol:6.0%;
C phases:
Parahydroxyacet-ophenone:0.35%;
D phases:
Extra large sludge extract:2.0%, D-pantothenyl aleohol:0.3%,
Dipotassium glycyrrhizinate:0.15%, beta glucan:0.20%,
Phenoxyethanol:0.10%;
E phases:
PEG-60 rilanit specials:0.05%, essence:0.005%.
Its preparation method is according to the following steps:
(1) first the purified water in A phases is added in aqueous phase cylinder, opens stirring, design temperature is 80 DEG C;Under stirring, add Enter EDTA-2NA, allantoin, it is fully dissolved;
(2) in advance in container by the small molecule carboxymethylchitosan in B phases, xanthans and hydroxyethyl cellulose fourth Glycol disperses;
(3) emulsion tank temperature is set as 80 DEG C;When aqueous phase cylinder dissolution of raw material is complete, it is pumped into emulsion tank;Add and divide in advance The B phase raw materials dissipated, open homogeneous 3-5 minutes, high speed homogenization 1500-2500r/min, until forming water white transparency viscous fluid Body, after being incubated 5-10 minutes, open cooling water temperature.
(4) when temperature is reduced to 65 DEG C, C phase raw material parahydroxyacet-ophenones are slowly added to;Open homogeneous 2 minutes, low speed homogeneous 1500r/min, homogeneous finish, and continue to stir and cool.
(5) PEG-60 rilanit specials and essence in E phases are mixed evenly in container in advance;
(6) when temperature is reduced to 40 DEG C, D phases, E phase raw materials are sequentially added, continues to stir 10-15 minutes, until dissolving is complete.
(7) physical and chemical index of product is examined, is discharged after qualified;
(8) discharge censorship, filling into facial mask cloth after indices are qualified.
Embodiment 3
One kind, which is releived, repairs parent-offspring's facial mask, including facial mask cloth and Essence, the formulation weight per distribution ratio of the Essence are:
A phases:
Purified water:87.623%, allantoin:0.15%, EDTA-2NA:0.05%,
B phases:
Xanthans:0.10%, small molecule carboxymethylchitosan:0.03%,
Hydroxyethyl cellulose:0.08%, butanediol:8.0%,
C phases:
Parahydroxyacet-ophenone:0.4%,
D phases:
Extra large sludge extract:2.5%, D-pantothenyl aleohol:0.4%,
Dipotassium glycyrrhizinate:0.2%, beta glucan:0.25%,
Phenoxyethanol:0.15%;
E phases:
PEG-60 rilanit specials:0.06%, essence:0.007%.
Its preparation method is according to the following steps:
(1) first the purified water in A phases is added in aqueous phase cylinder, opens stirring, design temperature is 80 DEG C;Under stirring, add Enter EDTA-2NA, allantoin, it is fully dissolved;
(2) in advance in container by the small molecule carboxymethylchitosan in B phases, xanthans and hydroxyethyl cellulose fourth Glycol disperses;
(3) emulsion tank temperature is set as 80 DEG C;When aqueous phase cylinder dissolution of raw material is complete, it is pumped into emulsion tank;Add and divide in advance The B phase raw materials dissipated, open homogeneous 3-5 minutes, high speed homogenization 1500-2500r/min, until forming water white transparency viscous fluid Body, after being incubated 5-10 minutes, open cooling water temperature.
(4) when temperature is reduced to 65 DEG C, C phase raw material parahydroxyacet-ophenones are slowly added to;Open homogeneous 2 minutes, low speed homogeneous 1500r/min, homogeneous finish, and continue to stir and cool.
(5) PEG-60 rilanit specials and essence in E phases are mixed evenly in container in advance;
(6) when temperature is reduced to 40 DEG C, D phases, E phase raw materials are sequentially added, continues to stir 10-15 minutes, until dissolving is complete.
(7) physical and chemical index of product is examined, is discharged after qualified;
(8) discharge censorship, after indices are qualified in the filling patch to tencel facial mask cloth.
Above-described is only the preferred embodiments of the present invention.It should be pointed out that for one of ordinary skill in the art For, without departing from the principles of the present invention, some improvement and modification can also be made, this is also considered as the protection of the present invention Scope.

Claims (2)

1. one kind, which is releived, repairs parent-offspring's facial mask, including facial mask cloth and Essence, it is characterised in that:The formulation weight of the Essence Per distribution ratio is:
A phases:
Purified water:87.623-92.338%, allantoin:0.08%-0.15%,
EDTA-2NA:0.02%-0.05%;
B phases:
Xanthans:0.05%-0.1%, small molecule carboxymethylchitosan:0.01%-0.03%,
Hydroxyethyl cellulose:0.05%-0.08%, butanediol:5.0%-8.0%;
C phases:
Parahydroxyacet-ophenone:0.35%-0.4%;
D phases:
Extra large sludge extract:1.5%-2.5%, D-pantothenyl aleohol:0.25%-0.4%,
Dipotassium glycyrrhizinate:0.1%-0.2%, beta glucan:0.15%-0.25%,
Phenoxyethanol:0.08%-0.15%;
E phases:
PEG-60 rilanit specials:0.02%-0.06%, essence:0.002%-0.007%;
Each raw material weight percentage sum is 100% above.
2. one kind according to claim 1, which is releived, repairs parent-offspring's facial mask, it is characterised in that preparation method is according to the following steps:
(1) first the purified water in A phases is added in aqueous phase cylinder, opens stirring, design temperature is 80 DEG C;Under stirring, add Enter EDTA-2NA, allantoin, it is fully dissolved;
(2) in advance in container by the small molecule carboxymethylchitosan in B phases, xanthans and hydroxyethyl cellulose fourth Glycol disperses;
(3) emulsion tank temperature is set as 80 DEG C;When aqueous phase cylinder dissolution of raw material is complete, it is pumped into emulsion tank;Add and divide in advance The B phase raw materials dissipated, open homogeneous 3-5 minutes, high speed homogenization 1500-2500r/min, until forming water white transparency viscous fluid Body, after being incubated 5-10 minutes, open cooling water temperature.
(4) when temperature is reduced to 65 DEG C, C phase raw material parahydroxyacet-ophenones are slowly added to;Open homogeneous 2 minutes, low speed homogeneous 1500r/min, homogeneous finish, and continue to stir and cool.
(5) PEG-60 rilanit specials and essence in E phases are mixed evenly in container in advance;
(6) when temperature is reduced to 40 DEG C, D phases, E phase raw materials are sequentially added, continues to stir 10-15 minutes, until dissolving is complete.
(7) physical and chemical index of product is examined, is discharged after qualified;
(8) discharge censorship, after indices are qualified in the filling facial mask cloth to tencel.
CN201711080674.7A 2017-11-06 2017-11-06 One kind, which is releived, repairs parent-offspring's facial mask Pending CN107714491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201711080674.7A CN107714491A (en) 2017-11-06 2017-11-06 One kind, which is releived, repairs parent-offspring's facial mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201711080674.7A CN107714491A (en) 2017-11-06 2017-11-06 One kind, which is releived, repairs parent-offspring's facial mask

Publications (1)

Publication Number Publication Date
CN107714491A true CN107714491A (en) 2018-02-23

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108113945A (en) * 2018-03-09 2018-06-05 河南荟仁堂生物科技有限公司 A kind of facial mask essence and preparation method thereof
CN109077962A (en) * 2018-09-19 2018-12-25 李燕 A kind of whitening Face-protecting mask of preservative free and preparation method thereof
CN113318013A (en) * 2021-06-16 2021-08-31 深圳莱特尼森生物科技有限公司 Mineral sea mud film for infants
CN114601771A (en) * 2022-04-28 2022-06-10 广州欧兰化妆品有限公司 Soothing essence and preparation method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106551869A (en) * 2016-11-28 2017-04-05 诺斯贝尔化妆品股份有限公司 A kind of moisture-holding purifying bamboo charcoal face pack
CN106727164A (en) * 2017-02-16 2017-05-31 中山卡丝生物科技有限公司 A kind of moisture-keeping composition and its preparation method and application

Patent Citations (2)

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Publication number Priority date Publication date Assignee Title
CN106551869A (en) * 2016-11-28 2017-04-05 诺斯贝尔化妆品股份有限公司 A kind of moisture-holding purifying bamboo charcoal face pack
CN106727164A (en) * 2017-02-16 2017-05-31 中山卡丝生物科技有限公司 A kind of moisture-keeping composition and its preparation method and application

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108113945A (en) * 2018-03-09 2018-06-05 河南荟仁堂生物科技有限公司 A kind of facial mask essence and preparation method thereof
CN109077962A (en) * 2018-09-19 2018-12-25 李燕 A kind of whitening Face-protecting mask of preservative free and preparation method thereof
CN113318013A (en) * 2021-06-16 2021-08-31 深圳莱特尼森生物科技有限公司 Mineral sea mud film for infants
CN114601771A (en) * 2022-04-28 2022-06-10 广州欧兰化妆品有限公司 Soothing essence and preparation method thereof

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Application publication date: 20180223