CN107703104A - Wavelength modulation system surface plasma microscope equipment based on microcobjective - Google Patents
Wavelength modulation system surface plasma microscope equipment based on microcobjective Download PDFInfo
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- CN107703104A CN107703104A CN201710938103.6A CN201710938103A CN107703104A CN 107703104 A CN107703104 A CN 107703104A CN 201710938103 A CN201710938103 A CN 201710938103A CN 107703104 A CN107703104 A CN 107703104A
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- microcobjective
- surface plasma
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/552—Attenuated total reflection
- G01N21/553—Attenuated total reflection and using surface plasmons
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- Life Sciences & Earth Sciences (AREA)
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- General Health & Medical Sciences (AREA)
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- Pathology (AREA)
- Spectrometry And Color Measurement (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
The invention discloses a kind of wavelength modulation system surface plasma microscope equipment based on high-NA microcobjective with nanometer resolution.The device is divided into the axis Nano-positioners of surface plasma activating system, surface plasma signal detection system and sample.Wherein activating system uses the light source of wide wavelength as incident light, and adjusts incident light and incide sample surfaces through microcobjective by a certain special angle；Microcobjective can use oil immersion microcobjective or soak microcobjective admittedly；By spectrometer collection reflected light and by reflected light spectrum and determine the local characteristicses of sample.The device can realize the positioning to sample or the sign to sample topography by displacement controlled system.The present apparatus can effectively improve the lateral resolution of surface plasma microscopic system, and can effectively reduce the requirement to the numerical aperture of microcobjective, reduce cost.
Description
Technical field
The present invention relates to a kind of light microscope, more particularly to a kind of wavelength modulation system surface based on microcobjective etc. from
Daughter microscope equipment.
Background of invention
Surface plasma (Surface plasmon resonance, SPR) is a kind of along metal and dielectric surface biography
The electromagnetic wave broadcast, it to metal and dielectric interface change it is very sensitive, can to subcellular structure, sub- nanometer scale it is thin
The interaction etc. of film, macromolecular structure, molecule and molecule is detected, and the result detected has high sensitivity, stably
Property and high duplication, are widely used in the field such as chemistry, medical treatment, biology, semi-conducting material, information.The surface of lens type
Plasma microscope can reach the superelevation longitudinal frame of Nano grade, but due to being limited by SPR ripple spread lengths
System, its resolution ratio in the horizontal are up to several microns.Can be by Jiao using the oil immersion microcobjective SPR system of high-NA
Point strictly focuses on sub-micron rank, it is achieved thereby that the lateral resolution of submicron-scale.But this use microcobjective
Numerical aperture of the system when carrying out the detection of some material such as liquid samples for microcobjective require high so that should
System is difficult to the detection to these samples, and with high costs.We have proposed a kind of wavelength tune based on microcobjective
Standard surface plasma microscope equipment, not only maintains very high lateral resolution, while reduces to used oil immersion
The requirement of the numerical aperture of microcobjective.
The content of the invention
(1) technical problems to be solved
The problem of present invention is to overcome lens type SPR micro-imaging technique lateral resolution deficiencies, and Single wavelength
Oil immersion microcobjective SPR micro-imaging technique logarithm values aperture require the problem of high, there is provided it is a kind of with nanometer resolution
Wavelength modulation system surface plasma microscope equipment.
(2) technical scheme
In order to solve the above-mentioned technical problem, the invention provides a kind of wavelength modulation system surface with nanometer resolution etc.
Gas ions microscope equipment, realize the SPR sensorgram with three-dimensional nano-resolution rate or imaging.The microscope mainly by surface etc. from
The axis Nano-positioners of daughter activating system, surface plasma signal detection system and sample.
Wherein surface plasma activating system include wide wavelength illumination light source, expand device, incident angle modulating system,
Spectroscope, high-NA microcobjective.Incident light with wide wavestrip wavelength is launched by wide wavelength illumination light source, by expanding
Lens expand incident light radius with full of clear aperature；Incident angle modulating system adds Modulation and Amplitude Modulation dress in input path
Put so that by inciding sample surfaces after microcobjective with single angle, incident angle modulating system can use incident light
Spatial light modulator or a physical optical stop realize the control to incidence angle；High-NA microscope can be shown using oil immersion
Speck mirror soaks microcobjective admittedly, and sample surfaces are focused on the light after angle modulated by expanding.Surface plasma signal
Detecting system is used to gather reflected light signal, mainly includes imaging lens group and spectrometer.Imaging lens group converges reflected light, can
Think odd number or even number lens, the corresponding imaging for realizing microcobjective focus or back focal plane；Spectrometer can be placed in focus
Or the conjugate planes of back focal plane, for gathering reflected light, and the light to collecting carries out wavelength analysis.The polarization state of light source can be with
For linear polarization or radial polarisation；When for radial polarisation when, spectrometer can be acquired in focus or back focal plane；When for line
Property polarization when, spectrometer can be acquired in focus, or reflected light is acquired in back focal plane p-polarization direction.Due to SPR
Phenomenon, a certain wave band of reflected light can be absorbed, and an obvious trough is formed on curve.The wavelength of the trough corresponds to
The local feature information of testing sample.
Axis Nano-positioners, including sample clamping device, surface plasma print and micro-nano mobile platform.Wherein
Sample clamping device is used for clamping surface plasma sample；Micro-nano mobile platform moves in the direction of the optical axis, for adjusting
Section sample is located at the position of microcobjective focus；The microscope equipment can obtain the local of all single-points in region by scanning
Characteristic information；Local Features information is reconstructed, realizes the surface topography imaging to sample.
The foregoing describe the microscopical main operational principle and feature.This instrument can carry out superelevation to micro-nano specimen material
The detection of resolution ratio, realize that Subnano-class is other in the vertical, reach the other detection of submicron order in the horizontal.The invention is except having
High-resolution, it is label-free the advantages that outside, moreover it is possible to effectively reduce to the demand of microcobjective numerical aperture.
Brief description of the drawings
Fig. 1 is the structure chart in the wavelength modulation system surface plasma microscope equipment of focus acquisition；
Fig. 2 is the schematic diagram of incident angle modulating system；
Fig. 3 is the relation of reflective light intensity and wavelength when sample is 46nm gold thin films；
Fig. 4 is that spectrometer gathers position view on back focal plane and focus under linear polarization；
In wherein Fig. 1：1 is wide wavelength light source, and 2 be extender lens group, and 3 be incident angle modulating system, and 4 be spectroscope, 5
It is plasma print to be measured for high-NA microcobjective, 6,7 be imaging lens group, and 8 be spectrometer；
In wherein Fig. 2：9 be clear aperature, and 10 be the scope of incident light that incident angle modulating system allows to pass through, and 5 are
High-NA microcobjective, 6 be surface plasma print, and θ is to incide sample surfaces after incident angle modulating system
Incidence angle；
In wherein Fig. 4：5 be high-NA microcobjective, and 11 be the back focal plane of microcobjective, and 12 be entering on back focal plane
Angular regions are penetrated, 13 be spectrometer optimal acquisition position on back focal plane under linear polarization, and 14 be focal point spectrometer collection position
Put.
Embodiment
With reference to the accompanying drawings and examples, the embodiment of the present invention is described in further detail.Following instance
For illustrating the present invention, but it is not limited to the scope of the present invention.
Embodiment one：A kind of wavelength modulation system surface plasma based on microcobjective described in present embodiment
Body microscope equipment, its surface plasma microscope equipment of focus acquisition structure chart as shown in Figure 1, including SPR is excited
In system：Wide wavelength illumination light source (1), extender lens group (2), incident angle modulating system (3), spectroscope (4), high numerical value
Aperture micro objective (5)；In surface plasma signal detection system：Surface plasma print (6) to be measured, imaging len
Group (7), spectrometer (8).Wide wavelength illumination light source (1), extender lens group (2), incident angle modulating system (3), spectroscope (4)
It is centrally located in same optical axis；High-NA microcobjective (5), surface plasma print (6) to be measured, imaging lens group
(7) in same optical axis.
System is illuminated using wide wavelength illumination light source, and lighting source is radial polarisation state.Extender lens group (2) compares
Mingguang City source is expanded with the clear aperature full of high-NA microcobjective.
Incident angle modulating system (3) operation principle as shown in Figure 2, can in the range of the clear aperature (9) of back focal plane
To be modulated using spatial light modulator or physical optical stop in microcobjective, the light (10) of only fixed range can lead to
Cross, its form is a very narrow annulus, so that incident light can only incide table by microcobjective (5) with special angle θ
Surface plasma sample (6) surface.
The wavelength modulation system surface plasma microscope equipment based on microcobjective described in present embodiment, sample clamping
Device is used for clamping surface plasma sample, and connects on a mobile platform；Micro-nano scanning mobile platform moves along optical axis
It is dynamic, sample is moved into focal position.
Reflected light is received by imaging lens group (7) optically focused by spectrometer (8), imaging lens group convergence reflected light,
Can be odd number lens, it is corresponding to realize microcobjective focus imaging, imaging lens group (7) or even number lens, spectrum
Instrument can be acquired to the reflected light of the conjugate planes of microcobjective back focal plane, and its pickup area can back focal plane in figure 4
On incident angular zone (12) or in focal point (14).Absorption according to a certain wave band in collection light carries out sample local characteristicses
Identification.Accompanying drawing 3 is that plasma sample is 46nm gold thin films, when wide wavelength light source incides sample surfaces with 43 °, reflected light
With the relation of wavelength.
Embodiment two：The wavelength modulation system surface plasma based on microcobjective described in present embodiment shows
Microdevice, system can be operated under linear polarization pattern, and this time width lighting source is linear polarization state.In such a mode,
When imaging lens group (7) is odd number lens, as shown in Figure 4, spectrometer can gather reflected light in focal position (14).
When imaging lens group (7) is even number lens, spectrometer gathers reflected light in back focal plane, due to the s polarization directions on back focal plane
On will not excite SPR, therefore spectrometer should be placed on the p-polarization direction of reflected light to be acquired to reflected light, in incidence
In angular regions (12), reflected light is acquired on p-polarization direction, i.e., pickup area is in accompanying drawing 4 (13) position or another
The p-polarization direction of side.For signal collected processing and embodiment one after the completion of being gathered under linear polarization pattern
It is identical.
Embodiment three：The wavelength modulation system surface plasma based on microcobjective described in present embodiment shows
It microdevice, can carry out characterizing sample surface morphology, the reflected light light corresponding to each single-point is obtained by scanning
Spectrum.The local features such as refractive index or the thickness that each is put on sample can obtain by the operation of embodiment one or two
Information, so as to obtain the surface topography of sample.
Claims (8)
1. a kind of wavelength modulation system surface plasma microscope equipment based on microcobjective, including surface plasma excite and are
The axis Nano-positioners of system, surface plasma signal detection system and sample.
2. a kind of wavelength modulation system surface plasma microscope equipment based on microcobjective as claimed in claim 1, it is special
Sign is, the surface plasma activating system include wide wavelength illumination light source, expand device, incident angle modulating system,
Spectroscope, high-NA microcobjective.
3. wide wavelength illumination light source as claimed in claim 2, its light beam have the spectrum of wide light belt, the polarization state of the light source
Can be linear polarization or radial polarisation.
4. incident angle modulating system as claimed in claim 2, physical optical stop or spatial light modulator can be used to exist
Incident light is modulated on back focal plane so that incident light with single angle after microcobjective by inciding sample surfaces.
5. high-NA microcobjective as claimed in claim 2 can use oil immersion microcobjective or soak micro- thing admittedly
Mirror, for focusing the light into sample surfaces and excitating surface plasma.
6. a kind of wavelength modulation system surface plasma microscope equipment based on microcobjective as claimed in claim 1, it is special
Sign is that the surface plasma signal detection system includes imaging lens group and spectrometer.
7. surface plasma signal detection system as claimed in claim 6, imaging lens group can be odd number or even number
Individual lens, the imaging of focal plane or back focal plane is carried out respectively；When system is radial polarisation mode, spectrometer can focus or after
Focal plane is acquired to reflected light；When for linear polarization mode when, spectrometer can be acquired in focus, or in back focal plane
P-polarization direction is acquired to reflected light.
8. a kind of wavelength modulation system surface plasma microscope equipment based on microcobjective as claimed in claim 1, its feature
It is, print regulation is arrived focal position by described axis Nano-positioners.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710938103.6A CN107703104A (en) | 2017-09-30 | 2017-09-30 | Wavelength modulation system surface plasma microscope equipment based on microcobjective |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710938103.6A CN107703104A (en) | 2017-09-30 | 2017-09-30 | Wavelength modulation system surface plasma microscope equipment based on microcobjective |
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| CN107703104A true CN107703104A (en) | 2018-02-16 |
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| CN201710938103.6A Pending CN107703104A (en) | 2017-09-30 | 2017-09-30 | Wavelength modulation system surface plasma microscope equipment based on microcobjective |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022042189A1 (en) * | 2020-08-27 | 2022-03-03 | 厦门大学 | Objective lens, optical imaging device, optical system, and test method of optical system |
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| CN202351017U (en) * | 2011-11-03 | 2012-07-25 | 中国科学技术大学 | Measuring instrument based on microscopic imaging for optical parameters of polymer planar waveguide |
| CN104849237A (en) * | 2015-05-25 | 2015-08-19 | 黑龙江大学 | Refractive index measuring device based on wavelength modulation SPR (surface plasmon resonance) |
| CN106841122A (en) * | 2017-04-18 | 2017-06-13 | 北京航空航天大学 | A kind of coaxial interference surface plasma microscopic method and system for exempting from pupil modulation |
| CN106872413A (en) * | 2017-04-18 | 2017-06-20 | 北京航空航天大学 | Coaxial interference surface plasma microscopic method and system based on pupil modulation |
| CN106908222A (en) * | 2017-03-15 | 2017-06-30 | 北京航空航天大学 | A kind of measuring method and system of high accuracy microcobjective numerical aperture |
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2017
- 2017-09-30 CN CN201710938103.6A patent/CN107703104A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202351017U (en) * | 2011-11-03 | 2012-07-25 | 中国科学技术大学 | Measuring instrument based on microscopic imaging for optical parameters of polymer planar waveguide |
| CN104849237A (en) * | 2015-05-25 | 2015-08-19 | 黑龙江大学 | Refractive index measuring device based on wavelength modulation SPR (surface plasmon resonance) |
| CN106908222A (en) * | 2017-03-15 | 2017-06-30 | 北京航空航天大学 | A kind of measuring method and system of high accuracy microcobjective numerical aperture |
| CN106841122A (en) * | 2017-04-18 | 2017-06-13 | 北京航空航天大学 | A kind of coaxial interference surface plasma microscopic method and system for exempting from pupil modulation |
| CN106872413A (en) * | 2017-04-18 | 2017-06-20 | 北京航空航天大学 | Coaxial interference surface plasma microscopic method and system based on pupil modulation |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2022042189A1 (en) * | 2020-08-27 | 2022-03-03 | 厦门大学 | Objective lens, optical imaging device, optical system, and test method of optical system |
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