CN108387562B - Method for adjusting axial position of pinhole in confocal microscope system - Google Patents
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Abstract
A method for adjusting the position of a pinhole in a confocal microscope system utilizes the nonlinear absorption effect of a phase-change material to judge the accurate focal position of the system by detecting an extreme point of a transmittance signal or a concave point of a reflectance signal, and then quickly and accurately determines the position of the pinhole in a reflected light detection module in the confocal microscope system according to the focal position. The invention realizes the rapid and accurate determination of the pinhole position in the confocal microscopic system, can achieve the nanometer-level precision, only needs one piece of coating material and has low cost.
Description
Technical Field
The invention relates to the technical field of confocal microscopy systems, in particular to a method for debugging the position of a middle pinhole based on the nonlinear absorption characteristic of a phase-change material.
Background
The laser confocal microscope is an epoch-making high-tech product developed in the 80 th century, a laser scanning device is additionally arranged on the basis of fluorescence microscope imaging, image processing is carried out by utilizing a computer, the resolution of optical imaging is improved by 30-40%, and the laser confocal microscope is widely applied to the fields of medicine, biochemistry, materials science and the like.
The traditional optical microscope is wide-field imaging, namely, an image of a part of a sample is reflected on an imaging surface in real time by utilizing an object-image relation. The laser confocal technology is established on a scanning microscopy technology, which adopts a point scanning mode, and is characterized in that a beam of parallel light beams is focused on a sample through an objective lens to form a light spot with the size of a diffraction limit, then the light spot is scanned point by point, a detector is utilized to receive a reflected signal in a return light path point by point, and finally the signal is converted into an image. The biggest difference between the laser confocal technology and the scanning microscopy technology is that a pinhole is arranged in front of a reflected signal detector, the size of the pinhole is matched with a diffraction limit light spot focused by an objective lens, most of stray signals can be filtered by the pinhole, high signal-to-noise ratio three-dimensional imaging can be realized due to the fact that the position of the pinhole is matched with the objective lens, the pinhole can filter the stray signals reflected from the upper part and the lower part of a focus point space, the function enables the pinhole to be widely applied to the field of biochemical research, and finally, the transverse resolution can be improved by 30% -40% by the pinhole.
Laser confocal technology powerful, the application is extensive, many laboratories can be directed against different needs oneself and build laser confocal microsystem, the regulation of pinhole axial position becomes the most difficult point of device construction this moment, because only when the incident light is strictly parallel, and focus on the sample surface just be its diffraction limit size, the reverberation is strict parallel light, focus the reverberation in the reflection light path, then adjust the axial position of pinhole, let when the signal that the detector in pinhole rear detected is the strongest, true conjugate position, the imaging effect is just the best. However, in practical operation, it is difficult to ensure that the incident light is strictly parallel, and it is difficult to ensure that the incident light is focused on the sample surface just at the focal position, so that the reflected light beam cannot be strictly parallel. Therefore, the axial position of the pinhole is adjusted by firstly accurately judging the position of the focus of the sample by means of some methods.
The existing common method is to accurately position the axial position of the pinhole according to the focal length of the focusing lens in front of the pinhole on the premise of assuming that the reflected light is parallel light, but the method has too ideal requirements on the system and is difficult to enable the system to achieve the optimal imaging effect. Another common method is to add an optical fiber light source behind the pinhole, so that the light emitted by the optical fiber light source becomes parallel light after passing through a collecting lens in a reflection light path, and then is collected onto a focal plane through an optical system. However, since noise exists when the image point is detected, there is a large error when it is judged to be the minimum, and quantitative judgment cannot be performed.
Phase change materials, e.g. Sb, Te, Sb2Te3、Sb70Te30、InSb、Ge2Sb2Te5Or the AgInSbTe material has strong nonlinear absorption effect, and when the intensity of laser irradiated on the surface of the material is changed, the transmittance and the reflectivity of the material are also changed. The saturated absorption material has the advantages that when the incident light intensity is enhanced, the light beam transmittance is enhanced, and the reflectivity is reduced; when the incident light intensity is increased, the transmittance of the light beam is reduced, and the reflectivity is increased. In a confocal imaging system, an objective lens focuses parallel light beams into a diffraction-limited spot to scan a sample, so that the light beams are focused and then amplified in the direction of an optical axisWhen the phase-change film material moves near the focusing point along the axial direction, the light intensity on the surface of the phase-change film material changes, so that the transmittance and the reflectivity of the film material to the light beam change. When the transmitted light detection method is adopted, the phase-change material passes through the focus position of the system along the same direction, then the signal of the light beam after transmitting the phase-change material is collected, and the transmittance signal can be in a state of increasing gradually and then decreasing gradually (saturated absorption) or in a state of decreasing gradually and then increasing gradually (reverse saturated absorption). Since the light intensity at the focus is strongest, the transmittance is an extreme point in a transmittance curve, the focus position is a maximum value position for the saturated absorption material, and the focus position is a minimum value position for the anti-saturated absorption material. According to the method, the accurate position of the focus in the optical path can be judged, then the thin film material is moved to the position, the axial position of the pinhole in the optical path reflection detection module is adjusted at the moment, the light intensity received by the detector behind the pinhole is the maximum, and the pinhole position at the moment is the conjugate position required by the confocal system. Thereby realizing the fast and accurate positioning of the position of the pinhole in the confocal microscopic system.
When the reflected light detection method is adopted, because the diffusion angle of a reflected light beam in a reflection light path is changed greatly, the objective lens in front of a pinhole can only focus the light beam irradiating on the entrance pupil of the objective lens, the detected signal is a signal which is gradually increased and then reduced no matter where the axial position of the pinhole is arranged, the characteristic of the phase-change material is utilized, namely, the stronger the incident light is, the weaker the reflectivity is, a notch appears at a certain position on a reflection curve at the moment, so that the accurate position of the focus in the light path is judged, then, a sample is moved to the position, the axial distance of the pinhole is adjusted, the position with the strongest reflected light is the axial position of the pinhole, and the fast and accurate positioning of the pinhole position in the confocal microscope system can.
Disclosure of Invention
The present invention is directed to overcome the above-mentioned deficiencies in the prior art, and to provide a method for accurately adjusting the position of a pinhole in a confocal microscopy system. By utilizing the nonlinear absorption effect of the phase-change material, when the intensity of laser irradiated on the surface of the material is changed, the transmittance and the reflectivity of the material are also changed. When the transmitted light detection method is adopted, the phase-change material passes through the focus position of the system along the same direction, then the signal of the light beam after transmitting the phase-change material is collected, and the transmittance signal can be in a state of increasing gradually and then decreasing gradually (saturated absorption) or in a state of decreasing gradually and then increasing gradually (reverse saturated absorption). The light intensity at the focus is strongest, so that the transmittance of the light path is an extreme point in a transmittance curve, the focus position is a maximum value position for the saturated absorption material, and the focus position is a minimum value position for the anti-saturated absorption material, and the accurate position of the focus in the light path can be judged according to the maximum value position and the minimum value position. When the reflected light detection method is adopted, the phase-change material passes through the position of the system focus along the same direction to detect a reflected signal, and due to the characteristics of the phase-change material, a notch appears at a certain position on a reflection curve, namely, the reflectivity is reduced due to the fact that the incident light intensity near the focus is enhanced, so that the accurate position of the focus in the light path is judged. After finding the accurate focus position, the film material is moved to the focus position, the axial position of a pinhole in the light path reflection detection module is adjusted at the moment, the light intensity received by a detector behind the pinhole is maximized, and the pinhole position at the moment is the conjugate position required by a confocal system.
In order to achieve the purpose, the technical scheme of the invention is as follows:
a transmission detection type adjusting method for the pinhole position of a confocal microscope system comprises the following steps:
a) plating a layer of phase change film material on the cover glass by a magnetron sputtering method;
b) placing the cover glass on a sample stage, and using a beam with power density less than 5 × 109W/m2The parallel light irradiates the cover glass through the focusing of an objective lens;
c) the sample stage was moved along the incident light direction so that the coverslip passed through the focus of the incident light.
d) Measuring a light intensity signal of cover glass transmission light through a detector, and judging a focus position according to an extreme value of the light intensity signal:
when the phase change film material is a saturated absorption material, selecting the maximum value on the light intensity signal curve as a focus position;
when the phase change film material is a reverse saturation absorption material, selecting the minimum value on the light intensity signal curve as a focus position;
e) moving the cover glass to a focus position, and adjusting the axial position of a pinhole in the light path reflection detection module to maximize the light intensity received by a detector behind the pinhole, wherein the pinhole position is the conjugate position required by a confocal system;
the phase-change material in the step a) is Sb, Te or Sb2Te3、Sb70Te30、InSb、Ge2Sb2Te5Or AgInSbTe material.
The thickness of the phase-change material in the step a) is between 10 and 100 nm.
The wavelength of the parallel light in the step b) is 405 nm.
A reflection detection type adjusting method for the pinhole position of a confocal microscope system comprises the following steps:
a) plating a layer of phase change film material on the cover glass by a magnetron sputtering method;
b) placing the cover glass on a sample stage, and using a beam with power density less than 5 × 109W/m2The parallel light irradiates the cover glass through the focusing of an objective lens;
c) the sample stage was moved along the incident light direction so that the coverslip passed through the focus of the incident light.
d) Measuring a light intensity signal of the reflected light of the cover glass by a detector, and selecting the lowest point of a notch near the maximum value on a light intensity signal curve as a focus position;
e) moving the cover glass to a focus position, and adjusting the axial position of a pinhole in the light path reflection detection module to maximize the light intensity received by a detector behind the pinhole, wherein the pinhole position is the conjugate position required by a confocal system;
the phase-change thin film material in the step a) is Sb, Te or Sb2Te3、Sb70Te30、InSb、Ge2Sb2Te5Or AgInSbTe.
The thickness of the phase-change material in the step a) is between 10 and 100 nm.
The wavelength of the parallel light in the step b) is 405 nm.
In the confocal microscope system, Sb, Te and Sb are utilized2Te3、Sb70Te30、InSb、Ge2Sb2Te5Or the nonlinear absorption characteristic of the AgInSbTe material, when the cover glass plated with one of the materials moves along the Z axis near the system focus, the accurate focus position of the system is judged by detecting the extreme point of the transmittance signal or the concave point of the reflectance signal, and then the pinhole position in the reflected light detection module in the confocal microscope system is rapidly and accurately determined according to the focus position. The advantages are that:
1) the precision is high, and the nanometer level can be achieved.
2) The speed is high, and the axial position of the pinhole can be determined at one time.
3) The cost is low, and only one piece of coating material is needed.
Drawings
FIG. 1 is a schematic diagram of the cover glass coated with a phase change material film according to the present invention
FIG. 2 is a schematic view of the cover glass of the present invention placed in the light path
FIG. 3 is a schematic diagram of the variation of a transmission signal through near focus movement according to an exemplary embodiment of the present invention
FIG. 4 is a template diagram of a sample for imaging a lattice structure according to the present invention
FIG. 5 is a diagram of imaging after testing the positions of the needle holes according to different positions on the transmission variation data, wherein a is a schematic diagram of the variation of the transmission signal of Sb thin film material moving through the vicinity of the focus, b is a diagram of the imaging after testing the positions of the needle holes with the position b as the focus position in a, c is a diagram of the imaging after testing the positions of the needle holes with the position c as the focus position in a, d is a diagram of the imaging after testing the positions of the needle holes with the position d as the focus position in a, e is a diagram of the imaging after testing the positions of the needle holes with the position e as the focus position in a, and f is a diagram of the imaging after testing the positions of the needle holes with the position f as the focus position in a.
FIG. 6 is a schematic diagram showing the change of transmission signal of the InSb thin film material moving through the vicinity of the focus in the present invention
FIG. 7 is a high-precision transmittance signal test chart of the present invention using InSb thin film material moving through the vicinity of the focus
FIG. 8 is a graph comparing reflection signals and transmission signals measured by using an InSb thin film material according to the present invention
FIG. 9 is a graph comparing the reflected and transmitted signals measured for an offset pinhole optimum position
In the figure: 1-cover glass, 2-phase change material layer, 3-laser light source, 4-incident light beam, 5-focusing objective lens, 6-transmission focusing lens, 7-transmission light detector, 8-reflection light beam, 9-reflection focusing lens, 10-pinhole, 11-reflection light detector and 12-sample stage
Detailed Description
The present invention is further illustrated by the following examples and figures, but should not be construed as being limited thereby.
Example 1:
a transmission detection type adjusting method for the pinhole position of a confocal microscope system comprises the following steps:
a) plating a layer of phase change film material 2 on the cover glass 1 by a magnetron sputtering method;
b) the cover glass 1 was placed on a sample stage using a beam of power density less than 5 × 109W/m2The cover glass 1 is irradiated by the parallel light 4 through the focusing of an objective lens 5;
c) the stage 12 is moved in the direction of the incident light 4 so that the cover glass 1 passes through the focal point of the incident light 4.
d) The light intensity signal of the transmitted light of the cover glass 1 is measured by the transmitted light detector 7, and the focus position is judged according to the extreme value of the light intensity signal:
when the phase change film material 2 is a saturated absorption material, selecting the maximum value on the light intensity signal curve as the focal position;
when the phase change film material 2 is a reverse saturation absorption material, selecting the minimum value on the light intensity signal curve as the focal position;
e) moving the cover glass 1 to a focus position, adjusting the axial position of a pinhole 10 in the light path reflection detection module at the moment, and enabling the light intensity received by a reflected light detector 11 behind the pinhole to be maximum, wherein the position of the pinhole 10 at the moment is the conjugate position required by a confocal system;
after the cover glass 1 is coated with the phase-change material film 2, as shown in figure 1, Sb material is adopted as a coating material, and the thickness is 20 nm. The coverslip 1 is then placed in the confocal system on the stage 12 as shown in figure 2, i.e. in the vicinity of the focus of the system, the stage is moved from bottom to top along the Z-axis (longitudinal axis) by a distance of 40um, the objective 5 with a numerical aperture of 0.8 is selected, and the change in the transmittance signal is measured by means of the transmitted light detector 7.
Fig. 5a shows the transmittance signal variation, where the horizontal axis is the scanning point in the Z-axis direction, and the vertical axis is the intensity amplitude, and it can be observed that the intensity variation is firstly stable, and then there is a gradually increasing process, which slowly approaches the focus position, so the nonlinear saturated absorption effect starts to appear, when the phase-change material film 2 is at the focus position, its intensity is maximum, and then the phase-change material film 2 starts to be far from the focus, the surface power density decreases, and the nonlinear effect weakens. From this map the true focus position of the system can be determined.
Fig. 4 is a template diagram of a lattice structure imaging sample, and fig. 5b, 5c, 5d, 5e, and 5f are diagrams of imaging conditions after adjusting the positions of the pinholes 10 according to different positions on the transmission change data, where the point of fig. 5b is a position b far away from the peak on fig. 5a, after moving the system platform 12 to the position, the position of the pinhole 10 in the reflection detection module is adjusted to maximize the intensity received by the reflected light detector 11 behind the pinhole 10, and then the system platform is placed in the lattice structure imaging sample template shown in fig. 4, and the measured result is shown in fig. 5b, which can distinguish the adjacent pinholes implicitly, but the overall imaging is fuzzy. The position c of the point closer to the extreme value in fig. 5a is selected, and after the position of the pinhole 10 is adjusted by repeating the previous steps, the imaging result is as shown in fig. 5c, and it is obvious that the imaging definition is higher than the position b. And then, selecting the position of the d point which is closer to the extreme value in fig. 5a, and after the position of the pinhole 10 is adjusted by repeating the previous steps, the imaging result is shown in fig. 5d, so that the imaging definition is obviously improved again and is higher than the position of the c point. Then, the position of the maximum point in fig. 5a is selected, and after the position of the pinhole 10 is adjusted by repeating the previous steps, the imaging result is as shown in fig. 5e, and it is obvious that the imaging definition is improved again and is higher than the position of the d point. Finally, the position f in fig. 5a after the maximum value is selected, and after the position of the pinhole 10 is adjusted by repeating the previous steps, the imaging result is as shown in fig. 5f, the imaging resolution is greatly reduced, the lattice structure on the sample can not be resolved any more, and the resolution is reduced so quickly, and probably because the platform 12 moves along the Z axis from bottom to top, the focus position at the point f is located in the lattice structure imaging sample template, so that the imaging resolution is greatly reduced.
The imaging results of the positions can obviously present the imaging result conditions corresponding to the points on the curves with different transmittances, so that the focal position can be quickly determined by testing the transmittance curve of the phase-change film material along the axial direction, and the position of the pinhole in the reflection detection module can be accurately determined.
Example 2:
a transmission detection type adjusting method for the pinhole position of a confocal microscope system comprises the following steps:
a) plating a layer of phase change film material 2 on the cover glass 1 by a magnetron sputtering method;
b) the cover glass 1 was placed on a sample stage using a beam of power density less than 5 × 109W/2The cover glass 1 is irradiated by the parallel light 4 through the focusing of an objective lens 5;
c) the stage 12 is moved in the direction of the incident light 4 so that the cover glass 1 passes through the focal point of the incident light 4.
d) The light intensity signal of the transmitted light of the cover glass 1 is measured by the transmitted light detector 7, and the focus position is judged according to the extreme value of the light intensity signal:
when the phase change film material 2 is a saturated absorption material, selecting the maximum value on the light intensity signal curve as the focal position;
when the phase change film material 2 is a reverse saturation absorption material, selecting the minimum value on the light intensity signal curve as the focal position;
e) moving the cover glass 1 to a focus position, adjusting the axial position of a pinhole 10 in the light path reflection detection module at the moment, and enabling the light intensity received by a reflected light detector 11 behind the pinhole to be maximum, wherein the position of the pinhole 10 at the moment is the conjugate position required by a confocal system;
after the cover glass 1 is coated with the phase-change material film 2, as shown in fig. 1, an InSb material is adopted as a coating material, and the thickness is 20 nm. Then, as shown in FIG. 2, the cover glass 1 is placed on the stage 12 in the confocal system, i.e., in the vicinity of the focal point of the system, the stage 12 is moved from bottom to top along the Z-axis by a distance of 60 μm, the objective lens 5 having a numerical aperture of 0.65 is selected, and the change in transmittance signal is measured by the transmitted light detector 7.
Fig. 6 is a schematic diagram of a change of a transmission signal of an InSb thin film material moving through the vicinity of a focus, where a horizontal axis is a scanning point in a Z-axis direction, a movement distance is 60um, a distance between each point is 100nm, and a vertical axis is an intensity amplitude, it can be observed that intensity change is firstly stable, and then there is a gradually decreasing process, which slowly approaches a focus position, so that a nonlinear reverse saturation absorption effect starts to appear at this time, when the phase change material thin film 2 is located at the focus position, a transmittance intensity thereof is minimum, and then the phase change material thin film 2 starts to be away from the focus, a surface power density decreases, and the nonlinear effect is reduced. From this figure, the true focus position of the system can be determined, but the relative accuracy is low, if the accuracy of the determination is measured by the point where the extremum changes by 95%, the accuracy is around 500 nm.
FIG. 7 is a high-precision transmittance signal test chart of the present invention using InSb thin film material moving near the focus, wherein the horizontal axis is the scanning point in the Z-axis direction, the distance of 35um is moved, the distance between each point is 20nm, the vertical axis is the intensity amplitude, if the judgment precision is measured by the point whose extreme value changes 95%, the precision is near 100nm, which is far smaller than the system focal depth.
Example 3:
a reflection detection type adjusting method for the pinhole position of a confocal microscope system comprises the following steps:
a) plating a layer of phase change film material 2 on the cover glass 1 by a magnetron sputtering method;
b) the cover glass 1 was placed on a sample stage using a beam of power density less than 5 × 109W/m2The cover glass 1 is irradiated by the parallel light 4 through the focusing of an objective lens 5;
c) the stage 12 is moved in the direction of the incident light 4 so that the cover glass 1 passes through the focal point of the incident light 4.
d) Measuring a light intensity signal of the cover glass reflected light 8 by a detector 11 of the reflection detection module, and selecting the lowest point of a notch near the maximum value on a light intensity signal curve as a focus position;
e) moving the cover glass 1 to a focus position, adjusting the axial position of a pinhole in the light path reflection detection module at the moment to maximize the light intensity received by a detector behind the pinhole, wherein the pinhole position at the moment is the conjugate position required by a confocal system;
after the cover glass 1 is coated with the phase-change material film 2, as shown in fig. 1, an InSb material is adopted as a coating material, and the thickness is 20 nm. Then, as shown in fig. 2, the cover glass 1 is placed on the sample stage 12 in the confocal system, that is, in the vicinity of the focal point of the system, the sample stage 12 is moved 1000 points from bottom to top along the Z axis, each point is spaced by 100nm, the objective lens 5 with a numerical aperture of 0.65 is selected, and the changes in the signals of the transmitted light and the reflected light 8 are measured by the transmitted light detector 7 and the reflected light detector 11, respectively.
The reflected signal is received by the reflected light detector 11 after the reflected focusing lens 9 is focused on the pinhole 10, and the reflected focusing lens 9 acts as a diaphragm, so when the thin-film material 2 moves along with the Z-axis (axial direction), the reflected signal has a process of gradually becoming larger and then becoming smaller because the reflected signal cannot collect all signals, and the maximum value cannot be used for judgment even if the material has no nonlinear effect.
The measured reflected and transmitted signals are shown in fig. 8. It can be seen that a pit is present near the peak of the reflected signal, which is due to the phase change material properties: when the light intensity irradiated on the surface of the thin film material 2 gradually increases, the reflectivity thereof decreases and becomes more obvious closer to the focal point, so that a pit is formed on the reflected signal, which can be used as a basis for judging the focal point. Fig. 8 also shows the transmittance signal variation under the same condition, and according to the comparison between the two, the lowest point of the pit in the reflected signal is found to correspond to the extreme point in the transmitted signal, which further proves that the pit in the reflected signal is also the basis for determining the focal point.
In order to further verify the correctness of the pit determination focal position in the reflection signal, the pinhole 10 is artificially shifted from the optimal position, and then the reflection signal and the transmission signal are simultaneously detected, and the result is shown in fig. 9. It can be seen that in the reflected signal, the position of the pit is shifted and is not at the maximum of the peak value of the reflected signal, and the extreme point of the transmitted signal is also shifted to a certain extent and still keeps consistent with the position of the lowest point of the pit, thereby verifying the correctness of the reflection alignment.
Therefore, the positions of the pinholes in the confocal microscopy system can be quickly and accurately determined by aligning the pits of the reflected signals with the positions of the maximum points of the reflected signals.
Claims (8)
1. A transmission detection type adjusting method for the position of a pinhole in a confocal microscopy system is characterized by comprising the following steps:
a) plating a layer of phase change film material on the cover glass by a magnetron sputtering method;
b) placing the cover glass on a sample stage, and using a beam with power density less than 5 × 109W/m2The parallel light irradiates the cover glass through the focusing of an objective lens;
c) moving the sample stage along the incident light direction to make the cover glass pass through the incident light focus;
d) measuring a light intensity signal of cover glass transmission light through a detector, and judging a focus position according to an extreme value of the light intensity signal:
when the phase change film material is a saturated absorption material, selecting the maximum value on the light intensity signal curve as a focus position;
when the phase change film material is a reverse saturation absorption material, selecting the minimum value on the light intensity signal curve as a focus position;
e) the cover glass is moved to the focus position, the axial position of a pinhole in the light path reflection detection module is adjusted at the moment, the light intensity received by a detector behind the pinhole is the maximum, and the pinhole position at the moment is the conjugate position required by a confocal system.
2. The method as claimed in claim 1, wherein the phase-change material in step a) is Sb, Te, Sb2Te3、Sb70Te30、InSb、Ge2Sb2Te5Or AgInSbTe.
3. The method as claimed in claim 1, wherein the thickness of the phase change material in step a) is between 10 and 100 nm.
4. The method as claimed in claim 1, wherein the parallel light wavelength in step b) is 405 nm.
5. A reflection detection type adjusting method for the pinhole position of a confocal microscope system is characterized by comprising the following steps:
a) plating a layer of phase change film material on the cover glass by a magnetron sputtering method;
b) placing the cover glass on a sample stage, and using a beam with power density less than 5 × 109W/m2The parallel light irradiates the cover glass through the focusing of an objective lens;
c) moving the sample stage along the incident light direction to make the cover glass pass through the incident light focus;
d) measuring a light intensity signal of the reflected light of the cover glass by a detector, and selecting the lowest point of a notch near the maximum value on a light intensity signal curve as a focus position;
e) the cover glass is moved to the focus position, the axial position of a pinhole in the light path reflection detection module is adjusted at the moment, the light intensity received by a detector behind the pinhole is the maximum, and the pinhole position at the moment is the conjugate position required by a confocal system.
6. The method as claimed in claim 5, wherein the phase-change thin film material in step a) is Sb, Te, Sb2Te3、Sb70Te30、InSb、Ge2Sb2Te5Or AgInSbTe.
7. The method as claimed in claim 5, wherein the thickness of the phase change material in step a) is between 10 and 100 nm.
8. The method as claimed in claim 5, wherein the wavelength of the parallel light in step b) is 405 nm.
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| JPH1195109A (en) * | 1997-09-16 | 1999-04-09 | Yokogawa Electric Corp | Confocal optical scanner |
| KR100421427B1 (en) * | 2001-01-11 | 2004-03-09 | 한국과학기술원 | High precision displacement gauge and variable displacement measuring method used a unit displacement using conforcal theory |
| JP4594208B2 (en) * | 2005-10-25 | 2010-12-08 | 株式会社スペクトラテック | Functional confocal image display device |
| JP2007248414A (en) * | 2006-03-20 | 2007-09-27 | Opcell Co Ltd | Optical displacement gage |
| JP5038094B2 (en) * | 2007-10-31 | 2012-10-03 | オリンパス株式会社 | Laser scanning microscope |
| CN103698880B (en) * | 2013-12-26 | 2016-01-27 | 中国科学院苏州生物医学工程技术研究所 | The laser scanning co-focusing microscope electronic real-time regulating system of two-dimentional pin hole |
| CN104849212B (en) * | 2014-02-19 | 2019-04-23 | 中国科学院上海高等研究院 | Pinhole device and pin hole adjusting method |
| CN103940537A (en) * | 2014-04-10 | 2014-07-23 | 中国科学院半导体研究所 | Material microscopic stress testing system |
| JP6241858B2 (en) * | 2016-06-02 | 2017-12-06 | レーザーテック株式会社 | Confocal microscope |
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2018
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