CN107686971A - A kind of durable coating process of high thang-kng of eyeglass multilayer - Google Patents

A kind of durable coating process of high thang-kng of eyeglass multilayer Download PDF

Info

Publication number
CN107686971A
CN107686971A CN201710734643.2A CN201710734643A CN107686971A CN 107686971 A CN107686971 A CN 107686971A CN 201710734643 A CN201710734643 A CN 201710734643A CN 107686971 A CN107686971 A CN 107686971A
Authority
CN
China
Prior art keywords
layers
eyeglass
layer
kng
coating process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201710734643.2A
Other languages
Chinese (zh)
Other versions
CN107686971B (en
Inventor
杨晓燕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suzhou Xin River Mirror Co Ltd
Original Assignee
Suzhou Xin River Mirror Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou Xin River Mirror Co Ltd filed Critical Suzhou Xin River Mirror Co Ltd
Priority to CN201710734643.2A priority Critical patent/CN107686971B/en
Publication of CN107686971A publication Critical patent/CN107686971A/en
Application granted granted Critical
Publication of CN107686971B publication Critical patent/CN107686971B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0652—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0694—Halides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements

Abstract

The invention discloses a kind of durable coating process of high thang-kng of eyeglass multilayer, including step：Eyeglass is chosen, determines that refractive index and plated film film structure are A+ (B+C)m+D+E；Wherein A layers are SiO2, B layers, the oxide or fluoride that C layers are metal, D is inner protective layer, and E is external protection；A layers are plated using sputtering method；Vapour deposition method plates each layer B layers and C layers；D layers and E layers are plated with e-beam evaporation.The present invention combines a variety of existing process and different film layers is selectively handled, and rationally design film structure, the reliability of membrane system and the retentivity of optical property is set to obtain guarantee substantially, the film that the present invention is plated has preferable optical property, 96.7% is reached as high as to visible light transmissivity, and there is longer service life.

Description

A kind of durable coating process of high thang-kng of eyeglass multilayer
Technical field
The present invention relates to optical mirror slip manufacturing technology field, the especially a kind of durable coating process of high thang-kng of eyeglass multilayer.
Background technology
Optical mirror slip is generally glass or resin material, etc., no matter it is any, radical needs of production, The film layer of the specific uses such as last layer anti-reflection film, Anti-reflective coating, enhancing film will be plated to its surface.And plated film is to cleaning ambient and mirror Piece surfacing, the requirement of uniformity it is higher, it is necessary to carry out plated film to it before clean.
Coating effects be related to that the eyeglass later stage uses except eyeglass in itself in addition to maximum effect factor.Anti-reflection film, increasing Anti- film, selective band of light are important plated film resultant effects through film etc..In order to obtain targetedly coating effects, need The method of plated film is further improved, there is evaporation, sputter coating etc. at present, suitable for different operating modes, but it is each excellent Inferior position is also obvious.
The content of the invention
Goal of the invention：In order that the coating process flexibility of eyeglass is improved, plated film is controllable and obtains preferably thoroughly Cross rate and filter off specific light（Ultraviolet, infrared lamp）, a kind of compact-sized durable plating of the high thang-kng of eyeglass multilayer of present invention design Membrane process, to solve problems of the prior art.
The content of the invention：A kind of durable coating process of high thang-kng of eyeglass multilayer, comprises the following steps：
（1）, choose eyeglass, for refractive index between 1.45-1.8, it is A+ (B+C) to determine plated film film structurem+D+E；Wherein A layers For SiO2, B layers, the oxide or fluoride that C layers are metal, D is inner protective layer, and E is external protection；
（2）, A layers are plated using sputtering method；
（3）, eyeglass is placed on rotatable workpiece plate, choose evaporation angular range at 55 ~ 75 °, be put into thermal current deposited chamber, It is deposited 80 ~ 88 DEG C of room temperature, relative humidity 75 ± 5%, while workpiece disc spins, eyeglass makees plane rotation around its centre of form during rotation Motion, each layer B layers and C layers are plated by this method successively；
（4）、（3）Step rear lens Slow cooling, D layers and E layers are plated to eyeglass with e-beam evaporation.
Preferably, the inner protective layer D is TiO2Layer or Ti3O5Layer, thickness 60-95nm, the external protection E are Si3N4Layer, thickness 100-150nm.Inner protective layer D layers are fast light ultraviolet, external protection E layer scratch resistances, increases the service life.
Preferably, the first layer of m=2 or 3, B layer is close to A layers, the B layers are in aluminum oxide, magnesia, zinc oxide One kind, thickness 45-60nm, the C are magnesium fluoride, one kind in calcirm-fluoride, thickness 30-50nm, then plate second successively Layer B layers, C layers, so circulation.B and C layers are main optical layers, and main function is anti-reflection and filter off other for visible light wave range The light of wavelength.
Preferably, the A layers SiO2Thickness be 80-120nm.Silica plays last layer of protective effect, together When required surface nature is provided for B, C layer, to control diffusion mode.
Preferably, the step（4）, eyeglass enter electron beam evaporation plating room evaporation process condition be：Room temperature is deposited 15-22 DEG C, relative humidity 40-49%.Electron beam evaporation plating temperature can be suitably lower.
Preferably, the step（3）Cool time be no less than 6h.Cool time long film layer is sprawled uniformly, film layer knot Brilliant degree is good.
Preferably, thicknesses of layers increases successively respectively from inside to outside for the B layers or C layers.Outer layer precision can require lower, Therefore it is controllable rough, while so operating procedure condition is easier to control.
Compared to the prior art, the beneficial effects of the present invention are：A kind of durable plating of high thang-kng of eyeglass multilayer of the present invention Membrane process, efficiently and film quality is good.A layers ensure surface nature, and B, C layer are to increase optical transmittance and the fluoride of filterability And oxidation film, multilayer quality will get well more than individual layer；D, the protection of E layers is comprehensive, including machinery defence and Chemical defense, can make With by；Sputtering plating, thermal current evaporation and electron beam evaporation plating handle different layers respectively, play the advantages of respective, make this technique whole Body formula is optimized.The present invention combines a variety of existing process and different film layers is selectively handled, and rationally designs film structure, The reliability of membrane system and the retentivity of optical property is set to obtain guarantee substantially, the film that the present invention is plated has preferable optics Performance, 96.7% is reached as high as to visible light transmissivity, and there is longer service life.
Embodiment
In order to illustrate more clearly of the embodiment of the present application or technical scheme of the prior art, letter will be made to embodiment below Single introduction.
A kind of durable coating process of high thang-kng of eyeglass multilayer, comprises the following steps：
（1）, choose eyeglass, for refractive index between 1.45-1.8, it is A+ (B+C) to determine plated film film structurem+ D+E, m=2 or 3； Wherein A layers are SiO2, thickness 80-120nm, B layer, the oxide or fluoride that C layers are metal, D is inner protective layer, and E is outer Protective layer, the inner protective layer D are TiO2Layer or Ti3O5Layer, thickness 60-95nm, the external protection E are Si3N4Layer, thickness For 100-150nm；
（2）, A layers are plated using sputtering method；
（3）, eyeglass is placed on rotatable workpiece plate, choose evaporation angular range at 55 ~ 75 °, be put into thermal current deposited chamber, It is deposited 80 ~ 88 DEG C of room temperature, relative humidity 75 ± 5%, while workpiece disc spins, eyeglass makees plane rotation around its centre of form during rotation Motion, each layer B layers and C layers are plated by this method successively；
The first layer of B layers is close to A layers, and the B layers are aluminum oxide, one kind in magnesia, zinc oxide, thickness 45-60nm, institute C is stated as one kind in magnesium fluoride, calcirm-fluoride, thickness 30-50nm, then plates second layer B layers, C layers successively, so circulation, the The thickness of two layers of B layers, the thickness of C layers respectively than first layer B layers, C layers increases, if any third layer B, C, third layer B layers, C layers Thickness reduces than the thickness of second layer B layers, C layers respectively；
（4）、（3）Step rear lens Slow cooling, cool time are no less than 6h, and D layers and E are plated to eyeglass with e-beam evaporation Layer, e-beam evaporation condition：15-22 DEG C of room temperature, relative humidity 40-49% is deposited.
Finally, it is to be noted that, term " comprising ", "comprising" or its any other variant be intended to it is non-exclusive Property includes, so that process, method, article or equipment including a series of elements not only include those key elements, and Also include the other element that is not expressly set out, or also include for this process, method, article or equipment inherently Key element.

Claims (7)

1. the durable coating process of a kind of high thang-kng of eyeglass multilayer, it is characterised in that comprise the following steps：
（1）, choose eyeglass, for refractive index between 1.45-1.8, it is A+ (B+C) to determine plated film film structurem+D+E；Wherein A layers are SiO2, B layers, the oxide or fluoride that C layers are metal, D is inner protective layer, and E is external protection；
（2）, A layers are plated using sputtering method；
（3）, eyeglass is placed on rotatable workpiece plate, choose evaporation angular range at 55 ~ 75 °, be put into thermal current deposited chamber, It is deposited 80 ~ 88 DEG C of room temperature, relative humidity 75 ± 5%, while workpiece disc spins, eyeglass makees plane rotation around its centre of form during rotation Motion, each layer B layers and C layers are plated by this method successively；
（4）、（3）Step rear lens Slow cooling, D layers and E layers are plated to eyeglass with e-beam evaporation.
A kind of 2. durable coating process of high thang-kng of eyeglass multilayer according to claim 1, it is characterised in that the interior protection Layer D is TiO2Layer or Ti3O5Layer, thickness 60-95nm, the external protection E are Si3N4Layer, thickness 100-150nm.
3. the durable coating process of a kind of high thang-kng of eyeglass multilayer according to claim 1, it is characterised in that m=2 or 3, B layer First layer be close to A layers, the B layers are one kind in aluminum oxide, magnesia, zinc oxide, and thickness 45-60nm, the C are fluorine Change one kind in magnesium, calcirm-fluoride, thickness 30-50nm, then plate second layer B layers, C layers successively, so circulation.
A kind of 4. durable coating process of high thang-kng of eyeglass multilayer according to claim 1, it is characterised in that the A layers SiO2 Thickness be 80-120nm.
A kind of 5. durable coating process of high thang-kng of eyeglass multilayer according to claim 1, it is characterised in that the step （4）, eyeglass enter electron beam evaporation plating room evaporation process condition be：15-22 DEG C of room temperature, relative humidity 40-49% is deposited.
A kind of 6. durable coating process of high thang-kng of eyeglass multilayer according to claim 1, it is characterised in that the step （3）Cool time be no less than 6h.
7. the durable coating process of a kind of high thang-kng of eyeglass multilayer according to claim 3, it is characterised in that the B layers or C Thicknesses of layers increases layer successively respectively from inside to outside.
CN201710734643.2A 2017-08-24 2017-08-24 A kind of durable coating process of high light passing of eyeglass multilayer Active CN107686971B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710734643.2A CN107686971B (en) 2017-08-24 2017-08-24 A kind of durable coating process of high light passing of eyeglass multilayer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710734643.2A CN107686971B (en) 2017-08-24 2017-08-24 A kind of durable coating process of high light passing of eyeglass multilayer

Publications (2)

Publication Number Publication Date
CN107686971A true CN107686971A (en) 2018-02-13
CN107686971B CN107686971B (en) 2019-04-26

Family

ID=61153694

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710734643.2A Active CN107686971B (en) 2017-08-24 2017-08-24 A kind of durable coating process of high light passing of eyeglass multilayer

Country Status (1)

Country Link
CN (1) CN107686971B (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101162270A (en) * 2006-10-12 2008-04-16 余章军 Manufacturing technology of colorful display screen glasses lens
US20120044570A1 (en) * 2010-08-18 2012-02-23 Seiko Epson Corporation Interference filter, optical module, and analysis device
CN104250068A (en) * 2014-08-15 2014-12-31 中国科学院上海技术物理研究所 Vanadium dioxide film system for intelligent energy saving window and preparation method thereof
CN205484888U (en) * 2015-12-02 2016-08-17 利达光电股份有限公司 Blue glass infrared cutoff filter
CN205670198U (en) * 2016-05-24 2016-11-02 蓝思科技股份有限公司 A kind of damage resistant hyaline membrane
CN205880256U (en) * 2016-05-17 2017-01-11 上海科比斯光学科技有限公司 Camera lens demister

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101162270A (en) * 2006-10-12 2008-04-16 余章军 Manufacturing technology of colorful display screen glasses lens
US20120044570A1 (en) * 2010-08-18 2012-02-23 Seiko Epson Corporation Interference filter, optical module, and analysis device
CN104250068A (en) * 2014-08-15 2014-12-31 中国科学院上海技术物理研究所 Vanadium dioxide film system for intelligent energy saving window and preparation method thereof
CN205484888U (en) * 2015-12-02 2016-08-17 利达光电股份有限公司 Blue glass infrared cutoff filter
CN205880256U (en) * 2016-05-17 2017-01-11 上海科比斯光学科技有限公司 Camera lens demister
CN205670198U (en) * 2016-05-24 2016-11-02 蓝思科技股份有限公司 A kind of damage resistant hyaline membrane

Also Published As

Publication number Publication date
CN107686971B (en) 2019-04-26

Similar Documents

Publication Publication Date Title
US20080231979A1 (en) Low-emissivity glass
JP4854552B2 (en) Antireflection film and optical component having the same
EP1211524B1 (en) Method for producing composition for vapor deposition, composition for vapor deposition, and method for producing optical element with antireflection film
TW201706628A (en) Substrate provided with low-reflective film
JP6862192B2 (en) Optical element
JP2006267561A (en) Optical element and manufacturing method thereof
JPH04229805A (en) Durable low-emissivity thin-film interference filter
WO2021253549A1 (en) Film-coated glass and manufacturing method therefor
US10718961B2 (en) Spectacle lens
JPH01273001A (en) Antireflection film of optical parts made of synthetic resin
WO2021024834A1 (en) Antireflection film-equipped optical member and production method therefor
CN107686971A (en) A kind of durable coating process of high thang-kng of eyeglass multilayer
JP2004334012A (en) Antireflection film and optical filter
US20120263885A1 (en) Method for the manufacture of a reflective layer system for back surface mirrors
JP2006072031A (en) Antireflection film for infrared region, and infrared lens using the same
NZ773387A (en) Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same
CN110221368B (en) Single-element multilayer infrared high-reflection film and preparation method thereof
JP3361621B2 (en) Anti-reflection coating for infrared region
JP4793011B2 (en) Antireflection film forming method
CN203818661U (en) Multilayered film anti-reflective glass
JP3610777B2 (en) Infrared antireflection film and transmission window
Fulton et al. Approaches explored for producing a variety of ion-assisted deposited thin film coatings using an end-Hall ion source
RU2611101C2 (en) Low-emissivity coated glass
WO2023008123A1 (en) Film-equipped base material and manufacturing method for same
JP4690065B2 (en) Antireflection film and optical component

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant