CN107665836B - Fluid process treatment device - Google Patents
Fluid process treatment device Download PDFInfo
- Publication number
- CN107665836B CN107665836B CN201710574742.9A CN201710574742A CN107665836B CN 107665836 B CN107665836 B CN 107665836B CN 201710574742 A CN201710574742 A CN 201710574742A CN 107665836 B CN107665836 B CN 107665836B
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- CN
- China
- Prior art keywords
- substrate
- height
- parameter
- difference
- driving device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000012530 fluid Substances 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims description 47
- 239000000758 substrate Substances 0.000 claims abstract description 97
- 239000007788 liquid Substances 0.000 claims abstract description 50
- 238000012545 processing Methods 0.000 claims abstract description 44
- 230000003287 optical effect Effects 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 241001269238 Data Species 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 description 9
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 6
- 238000011084 recovery Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 241000208340 Araliaceae Species 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000000153 supplemental effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
Abstract
A fluid processing apparatus. The fluid processing device comprises a device main body, a parameter obtaining module and a height adjusting module. The device main body comprises a substrate bearing unit and a liquid collecting unit, wherein the substrate bearing unit is used for bearing a substrate, and the liquid collecting unit is arranged around the substrate bearing unit. The parameter obtaining module is electrically connected with the device main body and obtains substrate parameters of the substrate. The height adjusting module is electrically connected with the parameter obtaining module so as to adjust the height difference between the substrate bearing unit and the liquid collecting unit according to the substrate parameters.
Description
Technical field
The present invention about a kind of fluids process processing unit, about it is a kind of according to substrate parameter adjust base plate carrying unit with
Difference in height improves the fluids process processing unit of the treatment fluid rate of recovery between liquid collecting unit.
Background technique
The processing unit of semiconductor substrate collects the treatment fluid of ring collection semiconductor chip, the prior art using lifting mostly
To use the collector unit for including multiple liquid collection ring, multiple liquid is collected ring and must be driven using elevating mechanism with opposite
Lifting actuation is carried out, ring is collected so that particular liquid when carrying out different liquids collection, can be gone up and down in advance, makes liquid runs down respectively liquid
The guidance that body collects ring is discharged by the drain pipe below the respectively collection ring.
However as the fast development of science and technology, to adapt to different process or package application, the kenel of semiconductor chip also by
Gradually polynary, the processing unit of right semiconductor substrate used at present does not develop to the kenel for different semiconductor chips to adjust
Liquid collects the technology of the height of ring, only fixed each collection ring adjustable height in whole semiconductor processing device, causes to handle
Device for the semiconductor chip of different kenels can not accurate alignment processing so that the treatment fluid rate of recovery of semiconductor chip drops
It is low, therefore have improved necessity.
Summary of the invention
The main object of the present invention a kind of adjusts base plate carrying unit and liquid collecting unit according to substrate parameter providing
Between difference in height improve the fluids process processing unit of the treatment fluid rate of recovery.
To reach above-mentioned purpose, fluids process processing unit of the invention include apparatus main body, parameter obtain module with
And height adjustment module.Apparatus main body includes base plate carrying unit and liquid collecting unit, wherein base plate carrying unit to
Bearing substrate, liquid collecting unit are compassingly set at base plate carrying unit.Parameter obtains module electrical connection device main body, parameter
Obtain the substrate parameter that module obtains substrate.Height adjustment module is electrically connected parameter and obtains module, so as to according to substrate parameter
Adjust difference in height between base plate carrying unit and liquid collecting unit.
Obtain height adjustment module that module is electrically connected according to substrate parameter using with parameter, by base plate carrying unit with
Difference in height is adjusted between liquid collecting unit, and fluids process processing of the invention can be improved to the optimum height of counterpart substrate parameter
The treatment fluid rate of recovery of device.
Detailed description of the invention
Fig. 1 is the hardware architecture diagram of fluids process processing unit of the invention.
Fig. 2 is the diagrammatic cross-section of fluids process processing unit of the invention.
Fig. 3 is put into the sectional view of the substrate of different kenels from Fig. 4 fluids process processing unit.
Wherein appended drawing reference are as follows:
Fluids process processing unit 1,1a apparatus main body 10
11 base plate carrying unit 12 of pedestal
13 liquid collecting unit 14 of rotation motor
It collects 141,142,143 parameter of ring and obtains module 20
Height adjustment 30 driving device 31 of module
311 second driving device 312 of first driving device
32 difference in height database 33 of control module
Substrate 100,100a, 100b difference in height D1, D2, D3
Specific embodiment
For that can allow your juror that can know more about technology contents of the invention, spy lifts preferred embodiment and is described as follows.
Hardware architecture diagram please also refer to Fig. 1 to Fig. 4 about fluids process processing unit of the invention, fluids process processing dress below
The diagrammatic cross-section and fluids process processing unit set are put into the sectional view of the substrate of different kenels.
As shown in Figure 1, fluids process processing unit 1 of the invention is applied to a treatment process of substrate 100, wherein at this
The substrate 100 of embodiment is semiconductor chip, and treatment process is in supplying in fluids process processing unit 1 surface of substrate 100
It the processing routines such as is etched, cleans to treatment fluid (such as chemicals or deionized water etc.), and handle and fill by fluids process
Set 1 collection, drain, the used treatment fluid of recycling.
In the present embodiment, fluids process processing unit 1 includes apparatus main body 10, parameter obtains module 20 and height is adjusted
Mould preparation block 30, wherein apparatus main body 10 includes pedestal 11, base plate carrying unit 12, rotation motor 13 and liquid collecting unit
14.To bearing substrate 100, liquid collecting unit 14 is about cylindric and is compassingly set at substrate and holds base plate carrying unit 12
Carrier unit 12, in the present embodiment, liquid collecting unit 14 include 3 collection rings 141,142,143, but the present invention not as
Limit, the number for the collection ring that liquid collecting unit 14 includes can modify design according to different demands.
As shown in Figure 1, parameter obtains 20 electrical connection device main body 10 of module, parameter obtains module 20 to obtain substrate
100 substrate parameter.According to a particular embodiment of the invention, parameter, which obtains module 20, can be optical measuring device, substrate ginseng
Number input interface or parameter database.When it is optical measuring device that parameter, which obtains module 20, base is examined using optical sensor
The device of 100 kenel of plate, and optical measuring device can be complete module and be installed in fluids process processing unit 1, or in
Before substrate 100 is placed in base plate carrying unit 12, the substrate parameter that optical measuring device obtains substrate 100 is advanced with.Work as parameter
When acquirement module 20 is substrate parameter input interface, it is built-in that substrate parameter input interface can be fluids process processing unit 1
Parameter input interface, operator are manually entered substrate parameter.When parameter obtain module 20 be parameter database when, then must in advance by
The related substrate parameter of the substrate 100 of various difference kenels establishes a parameter database for operation and selects substrate parameter, and this joins
Number database can be stored directly in the built-in memory of fluids process processing unit 1, or be stored in and can be handled with fluids process
In the online external server of device 1.Wherein substrate parameter can be various different kenels, example: type, the technique of substrate to be processed
Mode, the flow speed characteristic of alignment processing liquid water, alignment processing liquid water splash characteristic, shape, size, thickness or angularity at least
One.
As shown in Fig. 2, Fig. 3 and Fig. 4, when fluids process processing unit 1 of the invention operates, substrate 100,100a,
100b is rotated synchronously with rotation motor 13, at this time the substrate 100 of different kenels, 100a, 100b (example: different-thickness or angularity
Substrate) by centrifugal force will cause substrate surface process liquid, to be detached from substrate 100, the height of 100a, 100b not identical therefore each
Substrate 100,100a, 100b have corresponding treatment fluid optimum recovery area between base plate carrying unit 12 and liquid collecting unit 14
Section, therefore the substrate parameter that module 20 obtains substrate 100,100a, 100b need to be obtained using parameter, and obtain module using with parameter
20 be electrically connected height adjust modules 30, according to substrate parameter by between base plate carrying unit 12 and liquid collecting unit 14 height
Difference adjusts the treatment fluid time that fluids process processing unit 1 of the invention can be improved to the optimum height of the corresponding substrate parameter
Yield.
A specific embodiment according to the present invention, height adjust module 30 and include driving device 31 and control module 32,
Wherein as shown in Figures 1 and 2, control module 32 is electrically connected driving device 31.An embodiment according to the present invention, height adjust
A difference in height database 33 is stored in module 30, which stores substrate corresponding to each substrate parameter and hold
Height difference data between carrier unit 12 and liquid collecting unit 14 controls mould after height adjusts 30 As-received board parameter of module
Block 32 can find base plate carrying unit 12 corresponding with the specific substrate parameter and liquid collecting unit 14 according to substrate parameter
Between height difference data, then control driving device 31 by between base plate carrying unit 12 and liquid collecting unit 14 difference in height adjust
To the difference in height.
A specific embodiment according to the present invention is substrate parameter input interface or supplemental characteristic when parameter obtains module 20
When library, operator, which adopts, is manually entered substrate parameter or operation selection substrate parameter, when height adjusts 30 As-received board parameter of module
Afterwards, to adjust the difference in height between base plate carrying unit 12 and the liquid collecting unit 14 according to substrate parameter, wherein height is adjusted
Mould preparation block 30 can manually perform confirmation for automatic execution or operator.
Herein it is noted that according to a particular embodiment of the invention, height adjustment module 30 can adjust separately substrate and hold
Carrier unit 12 forms the difference in height of corresponding particular substrate parameter with the height of liquid collecting unit 14.Alternatively, height adjustment mould
Block 30 only individually adjusts base plate carrying unit 12 or only individually adjusts the height of liquid collecting unit 14 and form corresponding specific base
The difference in height of board parameter.In addition, height adjustment module 30 can be held in the initial stage for the treatment of process or intermediate stage adjustment substrate
Difference in height between carrier unit 12 and liquid collecting unit 14.
One of according to the present invention specific embodiment, it includes driving device 31 and control module 32 that height, which adjusts module 30,
Wherein as shown in Figures 1 and 2, driving device 31 includes first driving device 311, and control module 32 is electrically connected the first driving dress
311 are set, first driving device 311 is set to pedestal 11, and connect setting with base plate carrying unit 12, can adjust mould according to height
Block 30 adjusts the height of base plate carrying unit 12 and forms the difference in height of corresponding particular substrate parameter.In this embodiment, liquid is received
Collection unit 14 only goes up and down a specific collection ring (collect ring 141, collect ring 142 or collect ring 143) to a fixed preset height.
According to another embodiment of the present invention, wherein as shown in Figure 3 and Figure 4, driving device 31 includes the second driving
Device 312, control module 32 are electrically connected the second driving device 312, and the second driving device 312 is fixed on pedestal 11, and and liquid
The connection setting of body collector unit 14 can adjust the height of liquid collecting unit 14 according to height adjustment module 30, and formed and corresponded to
The difference in height of particular substrate parameter, wherein a specific collection ring (collect ring 141, collect ring 142 or collect ring 143) must be gone up and down extremely
The difference in height of corresponding particular substrate parameter.Wherein driving second device 312 corresponding to liquid collecting unit 14 can be single drive
Dynamic device or corresponding each multiple independent driving devices for collecting ring (example: collect ring 141, collect ring 142 or collect ring 143).?
This embodiment, base plate carrying unit 12 are fixed on a preset height.
According to another embodiment of the present invention, wherein as shown in Figure 3 and Figure 4, driving device 31 includes the first driving
Device 311 and the second driving device 312, control module 32 are electrically connected first driving device 311 and the second driving device 312,
First driving device 311 is fixed on pedestal 11, and setting is connect with base plate carrying unit 12, and the second driving device 312 is fixed on
Pedestal 11, and setting is connect with liquid collecting unit 14, height adjusts module 30 and adjusts separately base plate carrying unit 12 and liquid
The height of collector unit 14 and the difference in height for forming corresponding particular substrate parameter.
Height adjustment module 30 adjusts the height of liquid collecting unit 14, and forms the height of corresponding particular substrate parameter
Difference must go up and down a specific collection ring (collect ring 141, collect ring 142 or collect ring 143) to the height of corresponding particular substrate parameter
Difference.The difference in height of a specific collection ring to corresponding particular substrate parameter is wherein gone up and down, can be directly lifting to a corresponding specific base
The difference in height of board parameter or after first going up and down to a fixed preset height again according to the height adjustment adjustment of module 30 lifting to correspondence
The difference in height of particular substrate parameter.
As shown in Fig. 2, Fig. 3 and Fig. 4, for the kenel of cooperation substrate 100,100a, 100b, height adjusts the control of module 30
Module 32 receives base plate carrying unit 12 and liquid through driving device 31 according to the substrate parameter of substrate 100,100a, 100b
Difference in height between collection unit 14 is adjusted to D1, D2, D3, so as to corresponding from different substrates 100,100a, 100b, improves whereby not
The recovery efficiency of same substrate 100,100a, 100b treatment fluid.In the present embodiment, driving device 31 is stepper motor, control
Module 32 can be microprocessor, control chip or the hardware device in addition to aforementioned hardware, software program, firmware (firmware)
Or combinations thereof it is outer, can also be configured by circuit loop or other appropriate patterns.Substrate 100, the thickness of 100a, 100b or angularity in
It is only to illustrate, rather than be limited to embodiment in figure.
As shown in Fig. 2, Fig. 3 and Fig. 4, the liquid collecting unit 14 of the present embodiment includes multiple collection rings 141,142,143,
Control module 32 adjusts multiple liters for collecting one of rings 141,142,143 according to the substrate driving parameter driving device 31
Drop recycles different types for the treatment of fluid for cooperation, and how this adjusts the adjustable height for collecting ring 141,142,143, or is adjusted
Collection ring 141,142,143 number, can for particular liquid collect when, go up and down specific collection ring difference in height or can be by controlling
Molding block 32 is adjusted according to the height difference data in storage difference in height database 33.
Herein it is noted that in the present embodiment, the difference in height that Fig. 2, Fig. 3 and Fig. 4 are painted is base plate carrying unit 12
With the difference in height between collection ring 141.A right specific embodiment according to the present invention, fluids process processing unit 1 are carrying out a spy
When determining liquid collection, a specific collection ring (collect ring 141, collect ring 142 or collect ring 143) and control module must be gone up and down
32 according to the substrate driving parameter driving device 31 adjust specific collection ring (such as: collect ring 141, collect ring 142 or collect ring
143) or the lifting of base plate carrying unit 12 forms a difference in height.
It is noted that above are only embodiment, rather than it is limited to embodiment.For example this does not depart from basic framework of the present invention
Person all should be the interest field that this patent is advocated, and should be subject to scope of the claims.
Claims (12)
1. a kind of fluids process processing unit, the treatment process applied to a substrate, which is characterized in that fluids process processing
Device includes:
One apparatus main body, including a base plate carrying unit and a liquid collecting unit, wherein the base plate carrying unit is to hold
The substrate is carried, which is compassingly set at the base plate carrying unit；
One parameter obtains module, is electrically connected the apparatus main body, which obtains the substrate parameter that module obtains the substrate；With
And
One height adjustment module, is electrically connected the parameter and obtains module, which includes a driving device and one
Control module, wherein the control module is electrically connected the driving device, and the control module is according to the substrate driving parameter driving
Device adjusts the difference in height between the base plate carrying unit and the liquid collecting unit.
2. fluids process processing unit as described in claim 1, which is characterized in that the height adjustment module is in the treatment process
An initial stage or an intermediate stage adjust the difference in height.
3. fluids process processing unit as described in claim 1, which is characterized in that it is an optical measurement that the parameter, which obtains module,
Device, a substrate parameter input interface or a parameter database.
4. fluids process processing unit as described in claim 1, which is characterized in that the height adjustment module includes a difference in height
Database, the difference in height database store corresponding to the respectively substrate parameter between the base plate carrying unit and the liquid collecting unit
A height difference data, wherein when the height adjustment module receive the substrate parameter after, the control module find and the substrate join
After the corresponding height difference datas of number, then drive the driving device according to the difference in height data point reuse base plate carrying unit with
Difference in height between the liquid collecting unit.
5. fluids process processing unit as described in claim 1, which is characterized in that the driving device includes one first driving dress
It sets, which adjusts the lifting of the base plate carrying unit according to the substrate driving parameter first driving device, to be formed
The difference in height.
6. fluids process processing unit as described in claim 1, which is characterized in that the driving device includes one second driving dress
It sets, which includes multiple collection rings, and the control module is according to the substrate driving parameter the second driving device tune
Whole multiple lifting for collecting ring, to form the difference in height.
7. fluids process processing unit as claimed in claim 6, which is characterized in that when carrying out particular liquid collection, rise
Dropping a specific collection ring and the control module, second driving device adjusts the specific collection ring according to the substrate driving parameter
Lifting, to form the difference in height.
8. fluids process processing unit as claimed in claim 7, which is characterized in that go up and down the specific collection ring to the corresponding base
Board parameter, for directly lifting to the difference in height.
9. fluids process processing unit as claimed in claim 7, which is characterized in that go up and down the specific collection ring to the corresponding base
Board parameter, first to go up and down to a fixed preset height, then according to substrate parameter adjustment lifting to the difference in height.
10. fluids process processing unit as described in claim 1, which is characterized in that the driving device includes one first driving
Device and one second driving device, the control module respectively drive the first driving device according to the substrate parameter and adjust the substrate
The lifting of load bearing unit and second driving device is driven to adjust the lifting of the liquid collecting unit, to form the corresponding substrate
The difference in height of parameter.
11. fluids process processing unit as described in claim 1, which is characterized in that the substrate parameter includes an at least substrate
Thickness or a substrate warp degree.
12. fluids process processing unit as described in claim 1, which is characterized in that the substrate parameter is corresponding including at least one
The splash characteristic of the flow speed characteristic for the treatment of fluid water or a corresponding treatment fluid water.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW105123712 | 2016-07-27 | ||
| TW105123712 | 2016-07-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107665836A CN107665836A (en) | 2018-02-06 |
| CN107665836B true CN107665836B (en) | 2019-10-11 |
Family
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710574742.9A Active CN107665836B (en) | 2016-07-27 | 2017-07-14 | Fluid process treatment device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN107665836B (en) |
| TW (1) | TWI646575B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111146122B (en) * | 2019-12-26 | 2022-10-28 | 厦门通富微电子有限公司 | Liquid collection device, developing/etching machine table and developing/etching method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090012054A (en) * | 2007-07-26 | 2009-02-02 | 도쿄엘렉트론가부시키가이샤 | Substrate transfer module and substrate process system |
| TW201544895A (en) * | 2014-02-26 | 2015-12-01 | Tokyo Electron Ltd | Substrate processing method, program, computer-readable storage medium, and substrate processing system |
| CN204991662U (en) * | 2015-01-22 | 2016-01-20 | 辛耘企业股份有限公司 | Fluid process treatment device |
-
2017
- 2017-06-29 TW TW106121840A patent/TWI646575B/en active
- 2017-07-14 CN CN201710574742.9A patent/CN107665836B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090012054A (en) * | 2007-07-26 | 2009-02-02 | 도쿄엘렉트론가부시키가이샤 | Substrate transfer module and substrate process system |
| TW201544895A (en) * | 2014-02-26 | 2015-12-01 | Tokyo Electron Ltd | Substrate processing method, program, computer-readable storage medium, and substrate processing system |
| CN204991662U (en) * | 2015-01-22 | 2016-01-20 | 辛耘企业股份有限公司 | Fluid process treatment device |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI646575B (en) | 2019-01-01 |
| TW201812837A (en) | 2018-04-01 |
| CN107665836A (en) | 2018-02-06 |
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