CN107614739A - The calciner and method of roasting of cylindrical sputtering target material - Google Patents
The calciner and method of roasting of cylindrical sputtering target material Download PDFInfo
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- CN107614739A CN107614739A CN201680002852.1A CN201680002852A CN107614739A CN 107614739 A CN107614739 A CN 107614739A CN 201680002852 A CN201680002852 A CN 201680002852A CN 107614739 A CN107614739 A CN 107614739A
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- sputtering target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B1/00—Shaft or like vertical or substantially vertical furnaces
- F27B1/005—Shaft or like vertical or substantially vertical furnaces wherein no smelting of the charge occurs, e.g. calcining or sintering furnaces
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
- C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B1/00—Shaft or like vertical or substantially vertical furnaces
- F27B1/10—Details, accessories, or equipment peculiar to furnaces of these types
- F27B1/12—Shells or casings; Supports therefor
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B1/00—Shaft or like vertical or substantially vertical furnaces
- F27B1/10—Details, accessories, or equipment peculiar to furnaces of these types
- F27B1/20—Arrangements of devices for charging
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D3/00—Charging; Discharging; Manipulation of charge
- F27D3/12—Travelling or movable supports or containers for the charge
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Furnace Charging Or Discharging (AREA)
- Furnace Details (AREA)
- Resistance Heating (AREA)
Abstract
The present invention provides a kind of calciner for the cylindrical sputtering target for manufacturing long size, and the cylindrical sputtering target of the long size is used in the case where being produced on the nesa coating used in liquid crystal display cells and/or solar cell etc. using sputtering method.The calciner is characterised by that there is provided following component：Fixed siege, the cylindrical sputtering target material of long size is calcined body mounting by the fixation siege with upright state, it is calcined furnace main body, fixed siege is configured at center and is provided with multiple sections of heater and oxygen inflow entrance in stove internal face by the roasting furnace main body, and roasting furnace main body is placed on driving car, it may be such that roasting furnace main body, along rail running, in addition seals stove between the bottom of roaster and fixed siege the mechanism being opened and closed between roasting position and holding fix.
Description
Technical field
The present invention relates to a kind of calciner of cylindrical sputtering target material, and in particular to a kind of oxide is calcined the roasting of body
Burn device, its be used for manufacture be produced on using sputtering method used in liquid crystal display cells and/or solar cell etc. it is transparent
The cylindrical sputtering target of used long size in the case of conducting film.
Background technology
Nesa coating has high electric conductivity and the high transmissivity in visible region, thus is applied to liquid crystal
In various photo detector electrodes of display element, solar cell etc. etc..As nesa coating, due to high-transmission rate can be obtained
And low-resistance film, thus extensively using tin oxide-indium oxide mesentery (ito film), alumina-silica zinc mesentery (AZO
Film), indium oxide-gallium oxide-zinc oxide film (IGZO films).
As the manufacture method of the nesa coating formed by such oxidation film, sputtering method is used.In sputtering method,
Generally by 100% argon gas for importing about below 10Pa, negative electrode will be arranged to as the sputtering target of film raw material, parallel with target
Ground is provided with the state of substrate, produces argon plasma, when argon cation is collided in target, the particle heap of the winged target composition of bullet
Product on substrate so as to forming film.At present, in sputtering method, in order to improve rate of film build, employ while applying magnetic field to negative electrode
While the magnetron sputtering sputtered.
In the case of tabular sputtering target has been used in the sputtering target, in magnetron sputtering method, due to being made using magnetic field
Plasma concentrates on the privileged site of tabular sputtering target material and corroded, thus when backboard is arrived in the most deep of erosion
Service life is then arrived, as a result, the problem of service efficiency that there are the target stays in 20~30%.
In order to tackle in this problem thus use cylindrical sputtering target, by cylindrical penstock (backing tube)
Inner side sets magnetic field generating apparatus and cooling device, while cylindrical sputtering target is subjected to rotation while being sputtered, as a result,
The service efficiency of target can be improved to 60~70%.One of manufacture method as the cylindrical sputtering target, there is sintering process.
Sintering process be by adding water into raw material oxide powder, adhesive mixed with dispersant and slurried,
Pelletizing is made with spray dryer etc., then molds cylindrical sputtering target using cold isostatic press (CIP methods) etc., will be obtained
The method that the formed body obtained is calcined shaping in the atmosphere for the high temperature that oxygen-containing gas flows, at ambient pressure, can manufacture relative density
More than 90% highdensity target.
But in the case of forming cylindrical sputtering target by sintering process, when oxidate sintered body is calcined, it there are
The problem of rupture and/or crackle, deformation, warpage, fine crackle are produced in sintered body.In addition, in sputtering method, in order to steady
Surely the film of the characteristic of homogeneous is obtained with uniform thickness, it is intended that the density of oxidate sintered body, size of microcrystal, body is electric
Resistance homogenization.
For this problem, someone discloses a kind of showing for cylindrical sputtering target oxidate sintered body for obtaining high-quality
There is technology, the density of the cylindrical sputtering target oxidate sintered body is high, and block uniformity is high, not only in roasting but also is roasting
Suppress the bad phenomenons such as crackle, rupture, deformation when the manufacturing process of cylindrical sputtering target after burning and/or sputtering.
Prior art literature
Patent document
Patent document 1：Japanese Unexamined Patent Publication 2012-126587 publications ([0019~0021], [0024~0026], [Fig. 1])
The content of the invention
The problem solved is wanted in invention
It is 15cm diameters × 20cm length~20cm diameters × 30cm length using by size on foregoing prior art
In rectangular electric furnace of the cylindrical sputtering target formed body as roasting object, make the gas such as oxygen underneath towards top out of stove
In the case that atmosphere gas circulates, solve the inner side of short transverse and/or formed body in stove, on outside oxygen-containing gas stream
Road becomes uneven and then in-furnace temperature distribution becomes the problem of uneven；By rightly setting matching somebody with somebody for supply atmosphere gas
The position of pipe and quantity, so that the short transverse of the formed body in cylinder, makes respectively between outside and inner side in addition
The stream of even atmosphere gas, in-furnace temperature distribution is set to uniform, is equably sintered, as a result, uniformity can be obtained
High cylindrical oxidate sintered body.
On the other hand, the length of the cylindrical sputtering target obtained using prior art is 20~30cm, in order that using it
And the cylindrical sputtering target of 1.5~3m long size is made, it is necessary to accumulate 5~10, the target is mutual to be engaged through utilizing weldering
Connect and carry out, but if the difference of height as the cutting part of the engagement is not set into below 0.5mm, then can not suppress electric arc and put
The generation of electricity and/or particle.Therefore, during the quantity increase of segmentation, then the generation number increase of arc discharge, easy generation cause
In the rupture of cutting part, labour and time that consuming is welded are additionally, there are, what production efficiency was deteriorated in manufacture asks
Topic.
In order to solve the problem, people require to manufacture the cylindrical sputtering target of size as long as possible and use, and are used as it
One, it is desirable to which the roasting of the cylindrical sputtering target material of long size may achieve fine quality.Conventional tabular sputtering target material and/
Or in the roasting of the cylindrical sputtering target material of short size, the highly low roaster of stove is used.These roasters are will to be used as quilt
The cylindrical sputtering target material of the tabular of calcining matter and/or short size, which is moved into, to be transferred in the roaster for the form being calcined in stove.
In the case where the stove to be applied to the roasting of cylindrical sputtering target material of long size, the thing that is calcined of long size is being moved into stove
When interior, if can not entirely prevent collapsing and/or tilting, uniform roasting can not be realized, is existed in worst case
There is the worry for collapsing and damaging.
The present invention solves these problems, and its object is to provide a kind of calciner and method of roasting, it is being erected
The cylindrical sputtering target material of more root long sizes and when being calcined, the thing that is calcined of long size will not be damaged, can be calcined in addition
The deviation of quality is reduced in the height and/or diametric(al) of thing it is calcined.
The solution used to solve the problem
To achieve these goals, thus the present invention claim 1 cylindrical sputtering target material calciner length
Spend for 1.5~2m, it includes：Fixed siege, the fixation siege by the cylindrical sputtering target material of the long size be calcined body with
Upright state mounting；Furnace main body is calcined, the roasting furnace main body configures and in stove in the way of the interior foregoing fixed siege of bag
Internal face is provided with multiple heaters；Foregoing roasting furnace main body is placed in by roaster mobile devices, the roaster mobile devices
On driving car, may be such that foregoing roasting furnace main body from the position isolation of the foregoing fixed siege of interior bag and along rail running to wait
Position, it is foregoing roasting furnace main body sidepiece one side set can not interfere when foregoing fixed siege is wrapped inside in the way of open
The furnace shell door closed, and setting prevents gas leakage between the peripheral part of the furnace shell bottom of foregoing roaster and foregoing fixed siege
Sealing, there is provided in roasting by make foregoing roasting furnace main body decline it is mobile so as to by sealing depress contiguity and
The stove sealing lowering or hoisting gear of sealing.
The cylindrical sputtering target material of the present invention is the length that 150~300mm of diameter, thickness 10mm are front and rear, length is 1.5~2m
The cylindrical sputtering target material of size.It was calcined at a high temperature of 1250~1700 DEG C of temperature in oxygen atmosphere with 3~30 hours
Carry out.By using the technical scheme of claim 1, so as to be carried out just by the cylindrical sputtering target material of multiple foregoing long sizes
When formula is calcined, due to roasting furnace main body is isolated in into holding fix with mobile devices, thus it can positively enter and be about to foregoing circle
Columnar sputtering target material is placed in the operation of the appropriate location in fixed siege.Further, it enables roaster main body run to roasting position
Put and return to the fixed siege of encirclement, but travelled due to causing the furnace shell door standard-sized sheet of roaster, thus cylinder can not damaged
It is configured in roaster and is calcined in the state of sputtering target material.In addition, in roasting position, setting prevents from being calcined furnace main body and fixation
The stove sealing lowering or hoisting gear in the gap of siege, so as to be completely carried out in stove with outside stove between sealing, thus can be in stove
Each position suitably keep the sintering temperature of high temperature.Thus the long size of homogeneous and appropriate quality can be obtained by roasting
Cylindrical sputtering target.
In addition, the calciner of the cylindrical sputtering target material of claim 2 cylinder sputtering according to claim 1
The calciner of target, it is characterised in that foregoing stove sealing lowering or hoisting gear is formed as follows：In foregoing roasting body of heater
Bottom possess support stove 4 support beams and connected gear drive screwdown gear, from 1 lifting gear drive
Motor drives each gear drive screwdown gear via driving force distribution device.
, can be by 1 drive because 4 positions set gear drive screwdown gear around roaster according to this technical scheme
The revolving force of moving gear drive motor is suitably divided into 4 parts and applies the pressure of sealing, thus rightly equably enters
Sealing between row roasting furnace main body and fixed siege, can be rightly so as to which high temperature in-furnace temperature will not be interfered because of gas leakage
Keep.
In addition, the calciner cylinder according to claim 1 or 2 of the cylindrical sputtering target material of claim 3
The calciner of sputtering target material, it is characterised in that on being arranged on the heater of foregoing roaster internal face, in each stove inwall
More than three sections are divided into short transverse and is arranged.
In addition, the calciner of the cylindrical sputtering target material of claim 4 cylinder sputtering according to claim 3
The calciner of target, it is characterised in that foregoing heater is by MoSi2The U-shaped ceramic heater of formation.
In addition, cylinder of the calciner of the cylindrical sputtering target material of claim 5 according to claim 3 or 4
The calciner of sputtering target material, it is characterised in that foregoing heater arranges in couples with in-furnace temperature meter.
Using these compositions, the distribution of the interior sintering temperature in short transverse of roaster can be equably adjusted.Specifically,
The region of short transverse division temperature by setting thermometer there to determine, can be by increasing and decreasing the heater in the region
Thermal output and control as predetermined temperature.Typically, it is high for for the temperature of low position on in-furnace temperature
The temperature of position uprise, can be by adjusting the respective thermal output in each region so as to equably close to pre- constant temperature
Degree.So that the cylindrical sputtering target material of long size does not have the deviation of roasting degree on height (length) direction, contribute to product
The stabilization of matter.
In addition, as heater, MoSi is employed2U-shaped ceramic heater, thus in oxygen atmosphere highest roast
Burning 1700 DEG C of temperature nearby also has a sufficient heat-resisting, oxidative resistance and long lifespan, due to sufficient heating efficiency can be played, because
And it is most suitable for the roasting of the cylindrical sputtering target material of roasting for a long time.Further, since U-shaped is made in the shape of heater, because
But it is also resistant to the heating and/or cooling with heater and the thermal expansion occurred and/or the shape of thermal contraction, and be used as
The heater for each zoning that short transverse, peripheral direction zoning go out, it is from the viewpoint of heating intensity, heating density
Optimal shape.Further, since configure heater and thermometer in couples in each region, thus can precision is well exactly
Carry out short transverse, peripheral direction each zoning temperature control.
In addition, the calciner of the cylindrical sputtering target material of claim 6 is according to any one institute in claim 1 to 5
The calciner for the cylindrical sputtering target material stated, it is characterised in that foregoing roasting furnace main body sets single or multiple gas on top
Body tap, and from the bottom of the cylindrical sputtering target material placed by fixed siege, in addition stove inwall short transverse/
There is provided multiple oxygen to be blown into hole for peripheral direction.
By using the structure, the stream that may be such that the oxygen in roaster is the same for profile direction, so that
The difference for making the oxygen concentration at each position is minimum.And then due to in-furnace temperature distribution and/or oxygen concentration distribution can be set
To be the same, thus the roasting of the cylindrical sputtering target material as the long size for being calcined thing can be promoted substantially perfectly homogenously, can
Relative density is stably improved, and can substantially eliminate deviation of the relative density on length direction and/or profile direction.
In addition, the method for roasting of the cylindrical sputtering target material of claim 7 is characterised by, in usage right requirement 1 to 6
The calciner of cylindrical sputtering target material described in any one, by the cylinder of 1.5~2m of single or more root long degree long size
The thing that is calcined of shape sputtering target material is placed in fixed siege in the state of supporting oneself separating predetermined space, then, in order to will before
State fixed siege and put into center in stove, open the furnace shell door of roaster, roaster is moved to roasting position from holding fix traveling
Put, then by foregoing furnace shell door locking, by roasting furnace temperature elevation, 1250~1700 DEG C of high temperature and in oxygen atmosphere with 3~
Thing roasting will be calcined within 30 hours so as to obtain cylindrical sputtering target.
In addition, the method for roasting of the cylindrical sputtering target material of claim 8 cylindrical sputtering target material according to claim 7
Method of roasting, it is characterised in that aforementioned cylindrical sputtering target material be ITO (tin oxide-indium oxide system) material, AZO (oxidation
Aluminium-Zinc oxide) material or IGZO (indium oxide-gallium oxide-zinc oxide) material.
The cylindrical sputtering target material of the present invention is 150~300mm of diameter, and before and after thickness 10mm, length is 1.5~2m length
The cylindrical sputtering target material of size.It is excellent in 1450~1700 DEG C of high temperature of temperature in the case of ITO materials on the roasting
The high temperature of 1500~1600 DEG C of temperature is selected in, in addition, in the case of AZO or IGZO materials, in 1250~1500 DEG C of temperature
High temperature, the preferably high temperature in 1300~1450 DEG C of temperature, with 3~30 hours in oxygen atmosphere, were preferably entered with 5~10 hours
OK.If this time is long, it there are sintering structure and hypertrophyization occur and becomes crackly possibility.In roasting until
Programming rate untill target sintering temperature is 100~500 DEG C/h, from the cooling rate of target sintering temperature for 10~150 DEG C/
h。
When the roasting of foregoing cylindrical sputtering target material is carried out, by using the roasting of foregoing cylindrical sputtering target material
Device is burnt, the cylindrical sputtering target material of long size can be loaded with stable posture on fixed siege, and due to being carried
The operation put, thus in the absence of the worry for damaging cylindrical sputtering target material.Further, since having used formal roaster, lead in addition
Control oxygen atmosphere is crossed, so as to easily assign appropriate sintering temperature and its distribution, thus the total length side of thing can be calcined
To identical sintering temperature is equally applied, the surface texture not being cracked etc. and/or relative density can be improved, can be obtained stable
Cylindrical sputtering target.
The effect of invention
The calciner and method of roasting of cylindrical sputtering target material according to described in the claim 1 to 8 of the present invention,
Fixed siege is placed in roasting operation without movement as the cylindrical sputtering target material for being calcined thing, alternatively causes roasting
Burn stove to be moved to roasting position from position of readiness and be calcined, thus do not cause because mobile to be calcined thing and tilt, with heating
The interval in source does not also change, in addition, the worry damaged as caused by movement is also not present, stably obtains the roasting for being calcined thing
Quality.In addition, on the heating from furnace wall from four directions, due to dividedly setting heater in short transverse, because
And the Temperature Distribution in stove short transverse easily is adjusted to necessarily, conduce to the roasting product of the cylindrical sputtering target of long size
The stabilization of matter, improve.Further, since by the ostium of oxygen of adjustment oxygen atmosphere, the quantity of tap hole, position also according to relative
The mode that the same stream is obtained for thing is calcined is arranged, thus with the sealing effectiveness phase of the fixation siege of roaster
Auxiliaryly, for the cylindrical sputtering target material of long size, oxygen concentration, sintering temperature can be stably assigned as target.
As described above, easily will be long according to the calciner and method of roasting of the cylindrical sputtering target material of the present invention
With target quality mutually, equipment is also too much without change for the cylindrical sputtering target of size.In addition, calciner is：To have makes
Collected with the facility compact of actual effect and formed, setting area is also small, and cost of equipment does not become very big, does not have yet yet
The also excellent equipment in the environment of atmosphere pollution.Further, since easily the cylindrical sputtering target of 1.5~2m long size is changed
It is apt to as high-quality, thus by using the cylindrical sputtering target, so as to manufacture large-scale liquid crystal display device and/or large-scale
Solar power generating device nesa coating when, there is provided the high optimal sputtering target of service efficiency.
Brief description of the drawings
Fig. 1 is the illustrative arrangement of the calciner of the cylindrical sputtering target material for implementing embodiments of the present invention
Figure, configuration (section) figure when being roasting.
Configuration (section) figure when Fig. 2 is the wait in Fig. 1.
Fig. 3 is the schematic cross sectional views of the A-A direction of arrow views in Fig. 1.
Fig. 4 is the schematic cross sectional views of the B-B direction of arrow views in Fig. 1.
Embodiment
Illustrate (the hereinafter referred to as calciner of calciner 1 of the cylindrical sputtering target material of the present invention using Fig. 1,2,3,4
1。)。
The cylindrical sputtering target material M that uses is in the calciner and method of roasting of the cylindrical sputtering target material of the present invention
The cylindrical sputtering target material for the long size that 150~300mm of diameter, thickness 10mm are front and rear, length is 1.5~2m.The material is ITO
(tin oxide-indium oxide system) material, AZO (alumina-silica zinc system) materials or IGZO (indium oxide-gallium oxide-zinc oxide)
Material.On the roasting, in the case of ITO materials, in 1450~1700 DEG C of high temperature of temperature, preferably temperature 1500~
1600 DEG C of high temperature, in addition, in the case of AZO or IGZO materials, in 1250~1500 DEG C of high temperature of temperature, preferably in temperature
1300~1450 DEG C of high temperature, carry out in oxygen atmosphere 3~30 hours, preferably carry out 5~10 hours.Heating speed in roasting
It is 10~150 DEG C/h to spend for 100~500 DEG C/h, cooling rate.
Fig. 1 is the schematic plan configuration diagram of calciner 1, represents configuration during roasting.Shape of the fixed siege 3 to erect
State loads 4 as cylindrical sputtering target material and is calcined thing M, and the fixation siege 3 is put into the roasting furnace main body 2 in center
It is loaded on roaster mobile devices 4, so as to be travelled on running rail 4-3.In roasting, on being calcined furnace main body 2, press
The mode by fixed siege 3 from four directions encirclement around under central portion is impinged upon, furnace shell 2-c and furnace wall refractory body 2-a is 3 faces,
Having in 1 face of residual can be opened and closed and the interior shutter door 2-2 for posting refractory body 2-a, in addition, though do not illustrate, but
Stove top has stove ceiling refractory body 2-b, in this wise close to refractory body in the inside of roasting furnace main body 2.As refractory body,
Sizing or unbodied refractory material using the high temperature resistants such as aluminum oxide, magnesia and/or oxidative resistance, in furnace shell side
Use the heat-barrier material of conventional method.In addition, as shown in Fig. 3,4, fixed siege 3 is the refractory body of quadrangular shape, is used
The sizing of the high temperature resistants such as aluminum oxide, magnesia and/or oxidative resistance or unbodied refractory material.In addition, in fixation
It is erected on siege 3 in the case that mounting is calcined thing M, mounting table 3-a is added between, so as to maintain to be calcined thing M's
The sintering temperature of lower end, easily keep roasting quality.Mounting table 3-a uses the refractory body of the character equal with fixed siege 3 to be
Can.
What Fig. 2 was represented is that the roasting furnace main body 2 of calciner 1 is moved to the holding state waited from fixed siege 3
Position.In the case, fixed siege 3, which is in, strips out state, will be calcined thing M and carries out loading mounting or complete roasting
Be calcined in the case that thing M takes out, due to not harming the article of operation around, thus can be easily and before positively carrying out
State operation.On the other hand, on being calcined furnace main body 2, shutter door 2-2 is full-gear, can be accessible and have easily implemented oneself
Fixed siege 3 etc. it is to be moved.In addition, it is mobile be calcined furnace main body 2 when, it is necessary to make stove sealing lowering or hoisting gear 5 action so as to
Release stove sealing.
Then, illustrated based on Fig. 3,4 pairs of roaster mobile devices 4, be calcined support beam of the furnace main body 2 by four positions
5-5 and be loaded into driving car 4-4.Driving car 4-4 possesses total four Travel vehicles being loaded on two running rail 4-3
A running vehicle wheel in wheel 4-2, each unilateral running vehicle wheel 4-2 rotates drive using drive gear drive motor 4-1
It is dynamic.On driving car 4-4, though it is not illustrated, be using be arranged on running rail 4-3 be calcined furnace main body 2
The roasting position proximity switch suitable with holding fix and the predetermined distance of automatic running.
Then, illustrated based on the stove sealing between Fig. 1,3,4 pairs of roasting furnace main bodies 2 and fixed siege 3, roaster master
Body 2 moves the roasting position for driving to Fig. 1, stops fixed siege 3 is put into the state of in stove, then by shutter door 2-
During 2 locking, then as shown in Fig. 3,4, step is provided between the peripheral part of the bottom of roasting furnace main body 2 and fixed siege 3
The gap of shape.The gap is blocked by declining roasting furnace main body 2 so as to complete stove sealing.By realizing that the stove seals,
So that the oxygen atmosphere gas in the situation or stove that fully prevent from air from passing through sealing to be immersed in stove escapes to stove
Outer situation, disturbed so as to prevent from forming sintering temperature.
As it was previously stated, roasting furnace main body 2 is loaded into driving car by support beam 5-5, gear drive screwdown gear 5-4
4-4.Stove seal lowering or hoisting gear 5 by a drive gear drive motor 5-1,2, two driving force distribution device 5-3 of drive shaft,
Four gear drive screwdown gear 5-4 are formed.On 1 drive gear drive motor 5-1 output, first with 1 drive
Distributing means for power supply 5-3 and be allocated in main force axle 5-2 and orthogonal output shaft 5-2, an output shaft 5-2 is linked to two gears
It is driven screwdown gear 5-4.The output shaft 5-2 orthogonal on another, using driving force distribution device 5-3 via orthogonal output
Axle 5-2 and be linked to two gear drive screwdown gear 5-4.In this wise, with 1 drive gear drive motor 5-1 output
The synchronous people having the same aspiration and interest so that four gear drive screwdown gear 5-4 link with support beam 5-5 eachly, so as to make roasting furnace main body 2
Move in the vertical direction, carry out the implementation and releasing of stove sealing being calcined between furnace main body 2 and fixed siege 3.
In addition, as shown in Fig. 1,2,3, on being attached to the shutter door 2-2 of roasting furnace main body 2, roaster master is arranged at
The furnace side face opposite with waiting moving direction of body 2 is all.Shutter door 2-2 be using the opening and closing shaft 2-2-a installed in furnace shell in
The heart and the structure singly opened rotated, when being calcined furnace main body 2 and moving, can in the way of not interfered with fixed siege 3 into
For full-gear.Shutter door 2-2 stove inwall sets door refractory body 2-2-c, further since door refractory body 2-2-c highlightedly
In the height direction in four sections of multistage, there is provided heater 2-d and in-furnace temperature meter 2-e.Shutter door 2-2 opening and closing can be with
It can also be automatic manually to be, but in the case of automatically, with roasting furnace main body 2 and the connection of the positional information of fixed siege 3
Lock is required.
In addition, being based on Fig. 1,2,3,4, roasting furnace main body 2 is illustrated.Roasting furnace main body 2 be used as by external diameter 150~
The cylindrical sputtering target material of the long size of 300mm × 1.5~2m length under the design temperature of 1250~1700 DEG C of scope
The roaster of 3~30 hours is calcined in oxygen atmosphere.On being calcined the stove inside dimension of furnace main body 2, in case of the present embodiment,
It is about 1.1m square × 2.2m height.In detail in this figure, to the embodiment that thing is calcined that is calcined of 4 root long sizes is entered
Row explanation, but the present invention be not bound in the radical, if can be calcined thing equably implement radiation, convection heat transfer' heat-transfer by convection row
Row, if the arrangement of 2 × N row, then the applicable present invention.Additionally, it is desirable to by the length of long size also identical quilt
Calcining matter is calcined, and this is due to be readily available identical roasting quality.
On being calcined furnace main body 2, in side, furnace shell 2-c has 3 faces, and remaining 1 face forms gabarit by shutter door 2-2.Stove
It is interior respectively on the inside of shell 2-c and shutter door 2-2 stove to paste furnace wall refractory body 2-a and door refractory body 2-2-c.It is calcined the top of furnace main body 2
The inwall in portion is formed by stove ceiling refractory body 2-b.As refractory body, using high temperature resistants such as aluminum oxide, magnesias and/or
The sizing of oxidative resistance or unbodied refractory material, the heat-barrier material of conventional method is used in furnace shell side.
In addition, as shown in Fig. 3,4, on heater 2-d, portion of terminal is set in furnace shell 2-c etc., it is resistance to run through furnace wall
Fiery thing 2-a and door refractory body 2-2-c and the shape being provided projectingly from stove inner surface is provided with heater portion.In addition, heater
2-d divides into four sections and set in stove short transverse.In addition, on heater 2-d, by MoSi2The U-shaped ceramics of formation add
Hot device is good, nearby also has sufficient heat-resisting, oxidative resistance in 1700 DEG C of highest sintering temperature in oxygen atmosphere, because
And long lifespan, sufficient heating efficiency can be played, thus it is most suitable for the roasting of the cylindrical sputtering target material M of roasting for a long time.Separately
Outside, due to heater 2-d shape is made into U-shaped, thus be also resistant to heating and/or cooling with heater 2-d and
The thermal expansion of generation and/or the shape of thermal contraction, and as each dividing regions that zoning goes out in short transverse, peripheral direction
The heater 2-d in domain, it is optimal shape from the viewpoint of heating intensity, heating density.
In addition, can insert in-furnace temperature meter 2-e into stove from furnace shell 2-c in each section of heater 2-d central portion, can
In-furnace temperature is determined with heater 2-d with arranging in couples.Thus, can equably adjust in the stove of roasting furnace main body 2 in height
The distribution of the sintering temperature in direction.Specifically, the temperature in the region divided in the height direction is by setting stove there
Interior thermometer 2-e measure, so as to the thermal output of the heater 2-d by increasing and decreasing the region so as to controlling as predetermined temperature.It is logical
Chang Eryan, on in-furnace temperature, the tendency uprised for the temperature of high position for the temperature of low position, it can lead to
The respective thermal output in each region is overregulated so as to equably close to predetermined temperature.So that the cylindrical sputtering target of long size
Material M does not have the deviation of roasting degree on height (length) direction, contributes to the stabilization of quality.As in-furnace temperature meter 2-e, can make
With known platinum rhodium system thermocouple.
In addition, as shown in Fig. 3,4, oxygen atmosphere is maintained by being calcined in the stove of furnace main body 2, in order to which sintering temperature is protected
Hold as setting, single or multiple gas discharge hole 2-g are set on the top of roasting furnace main body 2, and it is contained from fixed siege
The cylindrical sputtering target material M put bottom is risen, and is provided with addition from stove inwall 2-b, 2-2-c in short transverse/peripheral direction more
Individual oxygen is blown into hole (not shown).Using this composition, the stream for the oxygen being calcined in furnace main body 2 can be set to the same in profile direction,
So that the difference of the oxygen concentration at each position is minimum.And then due to in-furnace temperature distribution and/or oxygen concentration can be divided
Cloth is set to the same, thus can promote the roasting of the cylindrical sputtering target material M as the long size for being calcined thing substantially perfectly homogenously
Burn, can stably improve relative density, and it is inclined on length direction and/or profile direction substantially to eliminate relative density
Difference.
In addition, the method for roasting of the cylindrical sputtering target material calciner of the present invention has been used to enter using Fig. 1,2,3,4 pair
Row explanation.On cylindrical sputtering target material, can be used selected from ITO (tin oxide-indium oxide system) material, AZO (alumina-silicas
Zinc system) material in material or IGZO (indium oxide-gallium oxide-zinc oxide) material.On cylindrical sputtering target material, can pass through
Add water, adhesive into foregoing raw material oxide powder to be mixed with dispersant and slurried, with spray dryer etc.
Pelletizing is made, is then molded using cold isostatic press (CIP methods) etc. so as to make.Cylindrical sputtering target material is, directly
The cylindrical sputtering target material for the long size that 150~300mm of footpath, thickness 10mm are front and rear, length is 1.5~2m.
The method of roasting of cylindrical sputtering target material is carried out as follows.By the length 1.5 of single or more (in this figure be 4)~
The cylindrical sputtering target material M of the long size of the 2m scope thing that is calcined is loaded in the state of having supported oneself separating predetermined space
In fixed siege 3, then according to foregoing fixed siege 3 to be put into opening and closing that roasting furnace main body 2 is opened in mode central in stove
Door 2-2, roasting furnace main body 2 is moved to roasting position from holding fix traveling, then by foregoing shutter door 2-2 lockings, will roast
Burn furnace main body 2 to heat up, thing M roastings will be calcined with 3~30 hours in 1250~1700 DEG C of high temperature and in oxygen atmosphere, from
And cylindrical sputtering target can be obtained.
On the roasting, in the case of ITO materials, in 1450~1700 DEG C of high temperature of temperature, preferably in temperature 1500
~1600 DEG C of high temperature, in addition, in the case of AZO or IGZO materials, in 1250~1500 DEG C of high temperature of temperature, preferably in temperature
The high temperature of 1300~1450 DEG C of degree, with 3~30 hours in oxygen atmosphere, preferably carried out with 5~10 hours.This time is long
When, then it there are sintering structure and hypertrophyization occur and becomes crackly possibility.In roasting process until target be calcined temperature
Programming rate untill degree is 100~500 DEG C/h, and the cooling rate after roasting finishes is 10~150 DEG C/h.
On the cylindrical sputtering target being calcined, magnetic field generating apparatus and cooling device have been attached at it built-in by welding
Penstock, so as to carry out magnetron sputtering, the evaporation using the sputtering to substrate implementation goal oxide, so as to really stably
Manufacture the nesa coating used in liquid crystal display cells and/or solar cell etc..
Industrial applicability
May be applied not only to the roasting field of cylindrical sputtering target material, and be applicable to by long size thing oxidisability,
The field of high-temperature roasting processing is carried out in reducing atmosphere.
Description of reference numerals
1：Cylindrical sputtering target material calciner
2：It is calcined furnace main body 2-a：Furnace wall refractory body 2-b：Stove ceiling refractory body
2-c：Furnace shell 2-d：Heater 2-e：In-furnace temperature meter
2-f：Oxygen inflow entrance 2-g：Oxygen flow export 2-2：Shutter door
2-2-a：Opening and closing shaft 2-2-b：Locking handle 2-2-c：Door refractory body
3：Fixed siege 3-a：Mounting table
4：Roaster mobile devices 4-1：Drive gear drive motor 4-2：Running vehicle wheel
4-3：Running rail 4-4：Driving car
5：Stove sealing lowering or hoisting gear 5-1 drive gear drive motors 5-2：Drive shaft
5-3：Driving force distribution device 5-4：Gear drive screwdown gear 5-5：Support beam
M：It is calcined thing (cylindrical sputtering target material).
Claims (8)
1. a kind of calciner of cylindrical sputtering target material, it is the cylindrical sputtering target material of 1.5~2m of length long size
Calciner, it is characterised in that including：
Fixed siege, the fixation siege load the body that is calcined of the cylindrical sputtering target material of the long size with upright state；
Furnace main body is calcined, the roasting furnace main body configures in the way of the interior bag fixed siege, and is provided with stove internal face
Multiple heaters；
The roasting furnace main body is placed on driving car by roaster mobile devices, the roaster mobile devices, can cause institute
State roasting furnace main body from the position of the interior bag fixed siege leave and along rail running to the position of wait,
In the sidepiece one side of the roasting furnace main body, furnace shell door is set, the furnace shell door can according to when wrapping the fixed siege inside not
The mode of interference is opened and closed, also, is set and prevented between the peripheral part of the furnace shell bottom of the roaster and the fixed siege
The sealing of leak-stopping gas, there is provided depressed sealing by making the roasting furnace main body decline mobile in roasting
The stove sealing lowering or hoisting gear for touching and sealing.
2. the calciner of cylindrical sputtering target material according to claim 1, it is characterised in that the stove sealing lifting dress
Put and form as follows：There are support 4 support beams of stove and connected in the bottom of the roasting body of heater
Gear drive screwdown gear, each gear drive is driven from 1 lifting gearmotor via driving distributor
Screwdown gear.
3. the calciner of cylindrical sputtering target material according to claim 1 or 2, it is characterised in that on being arranged on
The heater of roaster internal face is stated, more than three sections is divided into the short transverse of each stove inwall and arranges.
4. the calciner of cylindrical sputtering target material according to claim 3, it is characterised in that the heater be by
MoSi2The U-shaped ceramic heater of formation.
5. the calciner of the cylindrical sputtering target material according to claim 3 or 4, it is characterised in that the heater with
In-furnace temperature meter arranges in couples.
6. the calciner of cylindrical sputtering target material as claimed in any of claims 1 to 5, it is characterised in that institute
State roasting furnace main body and single or multiple gas discharge holes are set on top, and from the cylindrical sputtering target placed by fixed siege
The bottom of material is risen, and in stove inwall, in short transverse/peripheral direction, there is provided multiple oxygen to be blown into hole in addition.
7. a kind of method of roasting of cylindrical sputtering target material, it is characterised in that in usage right requirement 1 to 6 described in any one
Cylindrical sputtering target material calciner, by the cylindrical sputtering target material of 1.5~2m of single or more root long degree long size
It is calcined thing and is placed in fixed siege in the state of supporting oneself separating predetermined space, then, in order to which the fixed siege is filled
Enter center in stove, the furnace shell door of roaster is opened, roaster is moved to roasting position from holding fix traveling, then by institute
Furnace shell door locking is stated, roasting furnace temperature elevation will be roasted in 1250~1700 DEG C of high temperature and in oxygen atmosphere with 3~30 hours
Thing roasting is burnt so as to obtain cylindrical sputtering target.
8. the method for roasting of cylindrical sputtering target material according to claim 7, it is characterised in that the cylindrical sputtering target
Material is ITO (tin oxide-indium oxide system) material, AZO (alumina-silica zinc system) materials or IGZO (indium oxides-gallium oxide-oxygen
Change zinc system) material.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2016/064097 WO2017195311A1 (en) | 2016-05-12 | 2016-05-12 | Baking device and baking method for cylindrical sputtering target material |
Publications (2)
| Publication Number | Publication Date |
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| CN107614739A true CN107614739A (en) | 2018-01-19 |
| CN107614739B CN107614739B (en) | 2020-08-14 |
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| CN201680002852.1A Active CN107614739B (en) | 2016-05-12 | 2016-05-12 | Cylindrical sputtering target material roasting device and roasting method |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6198363B1 (en) |
| KR (1) | KR101892877B1 (en) |
| CN (1) | CN107614739B (en) |
| TW (1) | TWI636227B (en) |
| WO (1) | WO2017195311A1 (en) |
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| CN108097530B (en) * | 2018-01-19 | 2023-12-29 | 广西晶联光电材料有限责任公司 | Plane target back metallization equipment and method |
| CN109706285B (en) * | 2018-11-29 | 2020-07-31 | 沧州中铁装备制造材料有限公司 | Bottom anti-splashing collecting seat device for smelting furnace transfer furnace |
| CN111485218B (en) * | 2020-04-22 | 2022-06-17 | 广东生波尔光电技术有限公司 | Automatic control system for auxiliary coating of special workpiece |
| CN114107929A (en) * | 2021-11-29 | 2022-03-01 | 青岛科技大学 | Rotary target tube device capable of preheating sputtering target material |
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2016
- 2016-05-12 KR KR1020177004552A patent/KR101892877B1/en active IP Right Grant
- 2016-05-12 CN CN201680002852.1A patent/CN107614739B/en active Active
- 2016-05-12 JP JP2016555619A patent/JP6198363B1/en active Active
- 2016-05-12 WO PCT/JP2016/064097 patent/WO2017195311A1/en active Application Filing
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2017
- 2017-03-16 TW TW106108715A patent/TWI636227B/en active
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| JPS62222004A (en) * | 1986-03-20 | 1987-09-30 | Tohoku Metal Ind Ltd | Production of high-density sintered body containing rare earth alloy powder |
| US5094787A (en) * | 1990-01-08 | 1992-03-10 | Nippon Mining Co., Ltd. | Method of manufacturing ito sputtering target |
| CN1984855A (en) * | 2004-10-01 | 2007-06-20 | 三井金属矿业株式会社 | Method for manufacturing target material for sputtering target |
| JP2008120653A (en) * | 2006-11-15 | 2008-05-29 | Denso Corp | Placing table for firing ceramic honeycomb-formed body |
| JP2012126587A (en) * | 2010-12-13 | 2012-07-05 | Sumitomo Metal Mining Co Ltd | Oxide sintered body for cylindrical sputtering target and method for producing the same |
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Also Published As
| Publication number | Publication date |
|---|---|
| TWI636227B (en) | 2018-09-21 |
| WO2017195311A1 (en) | 2017-11-16 |
| TW201740068A (en) | 2017-11-16 |
| JPWO2017195311A1 (en) | 2018-05-24 |
| KR20170138986A (en) | 2017-12-18 |
| CN107614739B (en) | 2020-08-14 |
| JP6198363B1 (en) | 2017-09-20 |
| KR101892877B1 (en) | 2018-08-28 |
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