CN107588747A - Measure height correction rule generating means and method, height measuring device and method - Google Patents
Measure height correction rule generating means and method, height measuring device and method Download PDFInfo
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- CN107588747A CN107588747A CN201710075742.4A CN201710075742A CN107588747A CN 107588747 A CN107588747 A CN 107588747A CN 201710075742 A CN201710075742 A CN 201710075742A CN 107588747 A CN107588747 A CN 107588747A
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- 238000012937 correction Methods 0.000 title claims abstract description 158
- 238000000034 method Methods 0.000 title claims abstract description 44
- 238000005259 measurement Methods 0.000 claims abstract description 82
- 238000004364 calculation method Methods 0.000 claims description 7
- 238000000691 measurement method Methods 0.000 claims description 6
- 238000012545 processing Methods 0.000 description 12
- 238000004590 computer program Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
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- 238000009434 installation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/08—Monitoring manufacture of assemblages
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/04—Mounting of components, e.g. of leadless components
- H05K13/0404—Pick-and-place heads or apparatus, e.g. with jaws
- H05K13/0413—Pick-and-place heads or apparatus, e.g. with jaws with orientation of the component while holding it; Drive mechanisms for gripping tools, e.g. lifting, lowering or turning of gripping tools
Abstract
The present invention relates to one kind measurement height correction rule generating means and method, height measuring device and method.Comprised the following steps according to the measurement height correction rule generating method of the present invention：Obtain the first data of the height away from reference plane comprising the more than one position on sample；First mask of the scale factor for the height for first position that generation includes the relativeness between height and altitude datum based on first position to determine；Second mask of the first correction rule of the height for first position that generation includes the relativeness between the height based on first position and the height of the more than one second place adjacent with first position to determine；Calculate the height of first position and the ratio between height of the 3rd position of preset relation be in first position, and generate comprising based on the relativeness between the ratio and average ratio calculated come the 3rd mask of the second correction rule of the height for the first position that determines.
Description
Technical field
Embodiments of the invention are related to measurement height correction rule generating means and method, height measuring device and method.
Background technology
Picking machine system is the system being mounted on surface attaching type part automatically on printed circuit board, and by as follows
Key element is formed：Part supply department, supply need the part being arranged on printed circuit board；Drive division, for practically
The placing component on printed circuit board；Deng.
This picking machine system in order to reach judgement part whether correctly mount the purpose of and the attachment of measuring part height,
Yet with the error of measurement apparatus, there is the elevation carrection degree of accuracy it is not high the problem of.
The content of the invention
Embodiments of the invention aim to solve the problem that the problem of above-mentioned, and it provides a kind of following measurement height correction rule generation
Device and method：More accurate height measurement results are obtained by performing for measuring the ratio correction of height.
In addition, the present invention is intended to provide a kind of following measurement height correction rule generating means and method：For measurement
The correction based on the measurement height and the relativeness between adjacent position and the height of symmetric position is highly performed, so as to enter
One step improves the degree of accuracy.
In addition, the present invention is intended to provide a kind of following height measuring device and method：Perform one for measurement height
Correction more than individual, so as to measure more accurate height.
It may include steps of according to the measurement height correction rule generating method of one embodiment of the invention：Obtain bag
First data of the height away from reference plane containing the more than one position on sample (Sample)；Generation is included for described the
First mask of the scale factor of the height of one position, wherein, for the scale factor (Scale of the height of the first position
Factor) based between the height as the first position of any one in one position above and altitude datum
Relativeness determines；Second mask of first correction rule of the generation comprising the height for the first position, wherein, pin
To the height of the first correction rule of height of the first position based on the first position and adjacent with the first position
The more than one second place height between relativeness determine；Calculate the first position height and with institute
State first position and be in the ratio between height of the 3rd position of preset relation, and generate comprising the height for the first position
3rd mask of the second correction rule, wherein, for the first position height the second correction rule based on calculating
Relativeness between the ratio and average ratio determines.
In the step of generating second mask, the second mask for the second data, second number can be generated
According to being the data that first data are applicable with first mask.
In the step of generating three mask, the 3rd mask for the 3rd data, the 3rd number can be generated
According to being the data that second data are applicable with second mask.
The altitude datum can be the height of the reference plane based on the sample, generate first mask the step of wrap
Include following steps：Determined in a manner of the product of the height of the first position and the scale factor corresponds to the altitude datum
The scale factor of the first position；And generation includes described first of the respective scale factor in position more than one
Mask.
The step of generating second mask can include the steps：Calculate and be used as one second above
The average average height for the height put；More than the height of the first position and the difference of the average height is critical differences
In the case of, generate the first correction rule that the height of the first position is replaced with to the average height；And generation includes
Second mask of respective first correction rule in position more than one.
The second place can include：Along a first direction and the opposite direction of first direction and with the first position phase
Two adjacent positions；And along the opposite direction of second direction and second direction and two positions adjacent with the first position,
In the step of calculating the average height, the mean value calculation for the height that will be contained in four positions of the second place is
The average height.Now, the first direction and the second direction are orthogonal.
The step of generating three mask can include the steps：With the first direction on the sample or second
Calculated on the basis of the datum line in direction the first position height and positioned at the symmetrical position of first position line
The 3rd position height ratio；In the situation that the ratio and the difference of the average ratio calculated is more than critical difference
Under, calibrated altitude is calculated based on the height of the average ratio and the 3rd position；The ratio that calculates with
The difference of the average ratio be it is more than critical difference in the case of, generate that the height of the first position is replaced with into the correction is high
Second correction rule of degree；The comprising one respective second correction rule in position above the described 3rd is generated to cover
Code.
The average ratio can be right on the basis of first direction or the datum line of second direction on the sample
Claim it is multiple symmetrically to height ratio average value.
The steps can be included according to the height measurement method of one embodiment of the invention：Obtain to include and judge object
4th data of the height away from reference plane of the more than one position on object；Generation is applicable first to the 4th data and covered
5th data of code, the second mask and at least one mask in the 3rd mask；And based on the 5th data to determine
State the height away from the reference plane of more than one position.Now, first mask is included for the first position
The scale factor of height, wherein, for the first position height scale factor based on be used as it is one more than position
Relativeness between the height and altitude datum of the first position for any one position put determines；Second mask
The first correction rule including the height for the first position, wherein, for the first school of the height of the first position
The height of height and with the first position adjacent more than one second place of the positive rule based on the first position it
Between relativeness determine；3rd mask includes the second correction rule of the height for the first position, wherein,
For the first position height the second correction rule calculate the height of the first position and with described first
After putting the ratio between height of the 3rd position in preset relation, based on the phase between the ratio calculated and average ratio
Relation is determined.
In the step of generating five data, first mask, institute can be applicable successively to the 4th data
State the second mask and the 3rd mask and generate the 5th data.
It is described judgement object object can be the printed circuit board for being provided with more than one part, it is one with
On position can be mount it is one more than part position.
It can be included according to the measurement height correction rule generating means of one embodiment of the invention：Control unit, based on
One data and altitude datum generate at least one mask, wherein, the first packet containing the more than one position on sample away from
The height of reference plane, and the control unit can obtain first data, and generate including for the first position
First mask of the scale factor of height, wherein, it is based on being used as described one for the scale factor of the height of the first position
Relativeness between the height of the first position of any one position in position more than individual and the altitude datum is come true
It is fixed；The second mask of the first correction rule including the height for the first position can be generated, wherein, for described
Height of first correction rule of the height of one position based on the first position and adjacent with the first position one with
On the second place height between relativeness determine；And it can generate including the height for the first position
3rd mask of the second correction rule, wherein, for the first position height the second correction rule calculate it is described
The height of first position and it is in the first position after the ratio between height of the 3rd position of preset relation, based on calculating
The ratio and average ratio between relativeness determine.
The control unit can generate to be covered for the second mask of the second data and generation for the 3rd of the 3rd data
Code, second data are that first data are applicable with the data of first mask；3rd data are to described
Two data are applicable the data of second mask.
The altitude datum can be the height of the reference plane based on the sample, and the control unit can be with described
The height of first position and the product of the scale factor determine the ratio of the first position corresponding to the mode of the altitude datum
The example factor, and generate first mask comprising one respective scale factor in position above.
The control unit can calculate the average average height of the height as one second place above, and
And can in the case where the height of the first position and the difference of the average height is more than critical differences generation by described the
The height of one position replaces with the first correction rule of the average height, and can generate comprising one position above
Put second mask of respective first correction rule.
The second place can include：Along a first direction and the opposite direction of first direction and with the first position phase
Two adjacent positions；And along the opposite direction of second direction and second direction and two positions adjacent with the first position,
And the control unit can will be contained in the mean value calculation of the height of four positions of the second place to be described average
Highly, the first direction and the second direction can be orthogonal.
The control unit can be calculated on the basis of first direction or the datum line of second direction on the sample
The ratio of the height of the first position and height positioned at the 3rd position with the symmetrical position of first position line, is being counted
The ratio and the difference of the average ratio calculated be it is more than critical difference in the case of, based on the average ratio and described the
The height of three positions is critical difference in the ratio and the difference of the average ratio calculated to calculate calibrated altitude
Generation replaces with the height of the first position second correction rule of the calibrated altitude in the case of above, and can
To generate the 3rd mask comprising one respective second correction rule in position above.
The average ratio can be right on the basis of first direction or the datum line of second direction on the sample
Claim it is multiple symmetrically to height ratio average value.
It can be included according to the height measuring device of one embodiment of the invention：Control unit, for obtaining comprising judgement pair
As the 4th data of the height away from reference plane of the more than one position on object, and generate and the 4th data are applicable with the
5th data of one mask, the second mask and at least one mask in the 3rd mask, and based on the 5th data come really
It is fixed it is one more than position the height away from the reference plane, here, first mask can be included for described the
The scale factor of the height of one position, wherein, it is based on for the scale factor of the height of the first position as one
More than position in any one position first position height and altitude datum between relativeness determine；It is described
Second mask can include the first correction rule of the height for the first position, wherein, for the first position
Height and with the first position adjacent more than one second of first correction rule of height based on the first position
Relativeness between the height of position determines；3rd mask can include the of the height for the first position
Two correction rules, wherein, calculating the height of the first position for the second correction rule of the height of the first position
Degree and be in the first position after the ratio between height of the 3rd position of preset relation, based on the ratio that calculates with
Relativeness between average ratio determines.
The control unit can be applicable the 4th data first mask, second mask and described successively
Three masks and generate the 5th data.
Embodiments of the invention aim to solve the problem that the problem of above-mentioned, and it can realize following measurement height correction rule generation
Device and method：More accurate height measurement results are obtained by performing for measuring the ratio correction of height.
In addition, the present invention can realize a kind of following measurement height correction rule generating means and method：For measurement
The correction based on the measurement height and the relativeness between adjacent position and the height of symmetric position is highly performed, so as to enter
One step lifts the degree of accuracy.
In addition, the present invention can realize a kind of following height measuring device and method：Perform one for measurement height
Correction more than individual, so as to measure more accurate height.
Brief description of the drawings
Fig. 1 is to show the chip mounter equipped with measurement height correction rule generating means according to one embodiment of the invention
The figure of system.
Fig. 2 schematically shows basis in the picking machine system of one embodiment of the invention, in order to generate correction rule
And measure the composition of the height of sample.
Fig. 3 is the example for the first data that height measuring device is generated.
Fig. 4, which is schematically shown, to be generated the first mask according to first control unit of one embodiment of the invention and is counted to first
According to the process of the second data using the first mask.
Fig. 5, which is schematically shown, to be generated the second mask according to first control unit of one embodiment of the invention and is counted to second
According to the process of the 3rd data using the second mask.
Fig. 6, which is schematically shown, to be generated the 3rd mask according to first control unit of one embodiment of the invention and is counted to the 3rd
According to the process of the 4th data using the 3rd mask.
Fig. 7 is for illustrating to generate by the measurement height correction rule for measuring height correction rule generating means to perform
The flow chart of method.
Fig. 8 is for illustrating to measure measurement device printed circuit board height according to the height side of one embodiment of the invention
Process figure.
Fig. 9 is for illustrating to fill elevation carrection using the first to the 3rd mask that correction rule generating means are generated
Put the figure for the process that measured height value is corrected.
Figure 10 is for illustrating by height measuring device the flow chart of height measurement method that performs.
Symbol description
10：Measure height correction rule generating means 20：Height measuring device
30：Image acquiring device 40：Judge object object
50：Reference plane
Embodiment
The present invention can be subject to various conversion, and can have various embodiments, below by way of being shown in the drawings,
And specific embodiment is explained in detailed description..If referring to the drawings and the embodiment that explains, this hair
Bright effect and feature, realize that these method will be definitely.But the invention is not limited in the implementation of following discloses
Example, but can be implemented as various form.
Hereinafter, embodiments of the invention are described in detail referring to the drawings, illustrated referring to the drawings
During, identical reference numeral will be assigned for identical or corresponding inscape, and omit saying for the repetition to it
It is bright.
Below in an example, the term such as " first ", " second " and do not have limited implication, but for distinguishing
One inscape and another inscape.Below in an example, when being expressed in without other clear and definite implications of odd number
Include the statement of plural number.Below in an example, " comprising (including) ", the term such as " having (possessing) " expression be recorded in explanation
The presence of feature or inscape in book, and and non-predetermined exclude more than one other features or the additional of inscape can
Can property.In accompanying drawing, for convenience of explanation, the size of inscape may be exaggerated or minimized.For example, due to showing in accompanying drawing
Each composition is expressed as arbitrary size i.e. form, so the present invention is not necessarily limited to the size and shape shown in accompanying drawing
State.
<First embodiment>：Measure height correction rule generating means and method
Fig. 1 is to show the paster equipped with measurement height correction rule generating means 10 according to one embodiment of the invention
The figure of machine system.
In the present invention, picking machine system (Chip Mounter System) can be represented on printed circuit board certainly
Various system of dynamic installation surface pasting type part.Accordingly, as follows general can be included according to the picking machine system of the present invention
Logical inscape：Part supply department (not shown), need to be mounted on the part on printed circuit board for supply；Driving
Portion's (not shown), part is practically placed on printed circuit board.Only, the present invention relates to be provided to chip mounter system
The measurement height correction rule generating means 10 of system, therefore will omit to the above-mentioned detailed description commonly formed.
It can be included according to the picking machine system of one embodiment of the invention：Measurement height correction rule generating means 10,
Height measuring device 20, image acquiring device 30, judge object object 40 and reference plane 50.
Image acquiring device 30 according to one embodiment of the invention can be used to obtain to include to judge object object 40
Range information image various means.For example, image acquiring device 30 can as shown in Figure 1 include two images
The stereoscopic camera (Stereo Camera) of acquiring unit.In this case, image acquiring device 30 can be based on two images
Image acquired in acquiring unit exports the range information away from the ad-hoc location for judging object object 40.Now, image obtains
Two image acquisition units of device 30 can be based on any in run-in index, rectilinear, horizontal, staggered form, horizontal movable type
A kind of mode is arranged.
In addition, image acquiring device 30 can be for exporting between all positions in scene from camera to shooting
Distance apart from camera (Depth Camera).In the case, image acquiring device 30 can be exported in each pixel
(pixel) range information as the distance away from subject of shooting in.
Only two kinds of above-mentioned image acquiring devices 30 are an examples, and thought of the invention is not limited thereto, and
As long as the unit of the range information on judging multiple positions on object 40 can be exported, then can unrestrictedly use.
According to the height measuring device 20 of one embodiment of the invention can based on image acquiring device 30 acquired in away from
Judge the elevation information of object object 40 from information to generate.
For example, height measuring device 20 can calculate the distance between reference plane 50 and image acquiring device 30 and figure
Picture acquisition device 30 and the difference for judging the distance between object object 40, so as to generate the elevation information for judging object object 40.
In addition, height measuring device 20 can be only extracted for needing from the range information acquired in image acquiring device 30
The range information in the region to be judged, and it is supplied to following measurement height correction rule generating means 10.
As described above, height measuring device 20 generates judgement pair based on the range information acquired in image acquiring device 30
As the elevation information of object 40, and provide it to correction rule generating means 10.
In addition, height measuring device 20 can be generated according to following measurement height correction rule generating means 10 one
Correction rule more than individual and calibrated altitude information, so as to generate the elevation information being directed to after judging the correction of object object 40.
On the other hand, it will be described in more detail in following second embodiment.
In one embodiment of this invention, it can be the various visitor for needing to obtain elevation information to judge object object 40
Body.For example, judge that object object 40 can be the printed circuit board for being provided with part.Moreover, it is judged that object object 40 is also
It can be the sample (sample) for making the known altitude of the generation correction rule of measurement height correction rule generating means 10.Separately
Outside, reference plane 50 is that the surface of object object 40 is judged for placing, and can be the height that measurement judges object object 40
Reference plane.
Fig. 2 schematically shows basis in the picking machine system of one embodiment of the invention, in order to generate correction rule
And measure the composition of sample 40A height.
In the present invention, sample 40A can represent known judgement on the basis of reference plane 50, height h1 as described above
Object object.For example, sample 40A can be object of the height for 40 μm uniform thin slice (sheet) form.In addition, sample
The height of the position of the 40A position correspondence with mounted member is identical, and for 80 μm, and remaining position of non-mounted member
Put can be common lamellar form object.
In addition, for Fig. 2 situation, the purpose that height measuring device 20 measures sample 40A height is to make measurement
Height correction rule generating means 10 generate correction rule, and and do not lie in for sample 40A height measurement in itself.
According to the measurement height correction rule generating means 10 of one embodiment of the invention can include be used for generate for
Judge the first control unit 110 and first memory 120 of the correction rule of the elevation information of object object.
According to the first control unit 110 of an embodiment can include processor (processor) etc. can processing data institute
There is the device of species.Here, " processor (processor) " can represent the code or life performed with being included in program
Make the function of representing and be equipped with data processing equipment circuit, being built in hardware with physical arrangement.As described above, conduct
One of the data processing equipment of hardware is built in, can be included：Microprocessor (microprocessor), central processing unit
(central processing unit：CPU), processor core (processor core), multiprocessor
(multiprocessor), application specific integrated circuit (application-specific integrated circuit：ASIC)、
Field programmable gate array (fieldprogrammable gate array：The processing unit such as FPGA), but the model of the present invention
Enclose and be not limited thereto.
According to the first memory 120 of an embodiment perform temporarily or permanently by the first control unit 110 handled by number
According to the function of the storage such as, order (instruction), program, program code or their combining form.In addition, first deposits
Reservoir 120 can temporarily and/or for good and all store the elevation information for judging object object obtained from height measuring device 20.This
Outside, first memory 120 temporarily and/or can permanently store the first mask (Mask) generated to the 3rd mask.First
Memory 120 can include magnetic storage medium (magnetic storage media) or flash media (flash storage
Media), but the scope of the present invention is not limited thereto.
In addition, measurement height correction rule generating means 10 and height measuring device 20 are shown in Fig. 1, Fig. 2 and Fig. 8
The situation being equipped with relatively independently, but its purpose is the convenience indicated that, measures height correction rule generating means
10 and height measuring device 20 can also be integrated into a height measuring device and form.Hereinafter, it is real to one according to the present invention
The process that the measurement height correction rule generating means 10 for applying example generate correction rule using sample 40A measurement height is carried out
Explanation.
First number can be obtained from height measuring device 20 according to first control unit 110 of one embodiment of the invention
According to more than one position height away from reference plane of first packet containing sample.
Fig. 3 is the example for the first data that height measuring device 20 is generated.
Reference picture 3, height measuring device 20 can measure the height away from reference plane of sample 40A more than one position
Degree.Here, reference plane 50 can be floor.For example, height measuring device 20 can measure 16 positions for sample 40A
Height.
In addition, height measuring device 20 can contemplate position corresponding with each height, and utilize the multiple positions measured
The height put generates the first data 111 in the form of form (table) or matrix (matrix).For example, on any one position
Putting 41 height can be stored in and the 41 corresponding post-11.2 of position in form.
In addition, in the present invention, " position " is denoted as the place of the object of height measurement of height measuring device 20, and it can be with
Represent any one place in three dimensions.For example, in the case where sample 40A is located on X-Y plane, a certain position can be with
It is any one point that can be expressed as in the three dimensions of (X, Y, Z).Now, the height of the position can be Z.
The ratio for including the height for first position can be generated according to first control unit 110 of one embodiment of the invention
First mask of the example factor (scale factor), wherein, for the scale factor (scale of the height of first position
Factor) relativeness between the height based on first position and altitude datum determines.Now, first position can be sample
Some position in the more than one position of product (40A).
In the present invention, when the reason for the lamellar form that sample 40A is the high uniformity with predetermined thickness and upper face
In the case of thinking object, " altitude datum " can represent the height from reference plane 50 to upper face.As described above, sample 40A
The judgement object object of the known height (h1 in Fig. 2) on the basis of reference plane 50 can be represented, therefore can pass through and compare
Sample 40A altitude datum and the height of measurement and judge the error which kind of degree is the height of measurement include.It is height in sample 40A
When spending the object of uniform lamellar form, altitude datum as described above can be identical value for all positions；In sample
When product 40A is the height of portion different object, altitude datum as described above can have difference on each position
Value.
Fig. 4 is schematically shown generates the first mask 210 and right according to first control unit 110 of one embodiment of the invention
First data 111A uses the process of the second data 220 of the first mask 210.
Reference picture 4, the first control unit 110 can be with so that the height of first position correspond to benchmark height with the product of scale factor
The mode of degree determines the scale factor of first position.Now, first position can also be one on sample (Fig. 3 40A) with
On position in any one position.
Assuming that altitude datum is 1.0 and the height 112A of first position is 1.5, then the first control unit 110 can be by ratio
The factor 211 is defined as 0.6, so that the height 112A of first position, which is 1.5 and the product of scale factor 211, turns into altitude datum, i.e.,
1.0.Now, the unit of height can be μm, nm etc..
First control unit 110 can generate the first mask 210 comprising the respective scale factor in more than one position.Change
Yan Zhi, the first control unit 110 can determine the scale factor for each position, and generate comprising identified multiple ratios because
First mask 210 of son.
In addition, the first control unit 110 can be by being obtained to the first data 111A using the first generated mask 210
The second data 220 comprising more accurate height.For example, the height 112A of the first position included in the first data is
1.5, on the contrary, the height 221 of the first position included in the second data 220 is 0.9, it is possible thereby to confirm the second data 220
In first position height 221 closer to 1.0 of the altitude datum as sample (40A in Fig. 3).
In the present invention, " using B masks to A data " can represent to include A data by each position using in B masks
Operation rule.For example, because the first above-mentioned mask includes the scale factor by each position, so being using the first mask
It may imply that the height of each position is multiplied by scale factor corresponding with the height.In addition, the use of the second following masks
And the 3rd mask using also mean that will be used in each mask by each position come the operation rule that includes it is each
The height value of position.
As described above, the present invention can obtain more accurate height by performing for measuring the ratio correction of height
Measurement result.Generally, height measuring device 20 is with for identical position and with the tendency of identical error.Therefore, may be used
This inclined first mask of error is reflected with generation, and is used measurement data, it is more accurate so as to perform
Elevation carrection.
It can be generated according to first control unit 110 of one embodiment of the invention and include the of the height for first position
Second mask of one correction rule, height based on first position of the first correction rule of the height for first position and
Relativeness between the height of the more than one second place adjacent with first position determines.
In the present invention, the second place can represent the various position adjacent with first position.For example, the second place can be with
Including along a first direction and the reverse direction of first direction and two positions adjacent with first position, along second direction and
The opposite direction in two directions and two positions adjacent with first position.Now, first direction and second direction can be hung down mutually
Straight direction.
In addition, in the present invention, " correction rule " can represent the operation rule for a certain height value.For example, corrective gauge
It can be then the rule that the height value of corresponding position is replaced by preset value.
Fig. 5 schematically shows the first control unit 110 according to an embodiment of the invention and generates the second mask 310 and to the
Two data 220A use the process of the 3rd data 320 of the second mask 310.
First, the first control unit 110 can calculate the more than one second place 222A, 223A, 224A, 225A height
The average value of degree, i.e. average height.For example, as described above, when the second place 222A, 223A, 224A, 225A are represented with " ten " word
In the case of form four positions adjacent with first position 221A, the first control unit 110 can be by the height of four positions
Mean value calculation is average height.For Fig. 5 first position 221A, its average height can be 1.0.
Afterwards, in the case where first position 221A height and the difference of average height are more than critical difference, the first control
Portion 110 can generate the first correction rule that the height of first position is replaced with to average height.For example, example described above,
In first position, 221A average height is 1.0, in the case that first position 221A height is 7.0, and critical difference is 3.0,
First position 221A height and the difference of average height be can correspond to as situation more than critical difference.In the case, first
Control unit 110 can generate the first correction rule 312 that first position 221A height is replaced with to average height.
In addition, the first control unit 110 can generate the comprising the first correction rule respective to more than one position
Two masks 310.In other words, the first control unit 110 can generate the first correction rule for each position, and generate and include pin
Second mask 310 of the first correction rule generated to each position.
In addition, the first control unit 110 using the second generated mask 310 to the second data 220A to obtain by being included
3rd data 320 of more accurate height.For example, the height of the first position 221A included in the second data 220A is
7.0, on the contrary, the height 332 of the first position included in the 3rd data 320 is 1.0, it is possible thereby to confirm the 3rd data 320
In the height 322 of first position that includes closer to 1.0 of the altitude datum as sample 40A.
As described above, the present invention can be directed to measurement height perform based on the measurement height and the height of adjacent position it
Between relativeness correction, so as to obtain more accurate height measurement results.
According to first control unit 110 of one embodiment of the invention calculate first position height and with first position
In the ratio between height of the 3rd position of preset relation, and generate the second correction rule for including the height for the first position
The 3rd mask, wherein, for the first position height the second correction rule based on the ratio and average specific calculated
Relativeness between rate and determine.
Fig. 6 is schematically shown generates the 3rd mask 410 and right according to first control unit 110 of one embodiment of the invention
3rd data 320A uses the process of the 4th data 420 of the 3rd mask 410.
First, the first control unit 110 can calculate first position 321A height and as with the 321A of first position
In the ratio of the 3rd position 322A of the position of preset relation height.Now, the 3rd position 322A can be with sample
On the basis of first direction or the datum line of second direction 350 and with the first position symmetrical position of 321A lines.For example, to Fig. 6
Situation for, the ratio between first position 321A height and the 3rd position 322A height can be 3 (3.0/1.0=3).
Afterwards, in the case where the ratio and the difference of average ratio calculated is more than critical difference, the first control unit 110 can
To calculate calibrated altitude based on the height of average ratio and the 3rd position.
Now, average ratio can be on the basis of first direction or the datum line of second direction 350 and symmetrical multiple
Symmetrically to height ratio average value.For example, for Fig. 6 situation, on the basis of datum line 350 and formed with eight
It is symmetrical right, and their average ratio value is 1.25 ((1x7+3)/8).In other words, for Fig. 6 situation, average ratio can
Think 1.25.Now, if it is assumed that critical difference is 1, then the ratio of first position 321A height and the 3rd position 322A height
Rate is 3, average ratio 1.25, therefore difference between the two is more than critical difference.In the case, the first control unit 110 can
So that the product of the position 322A of average ratio 1.25 and the 3rd height 1.0, i.e., 1.25 is calculated as into calibrated altitude (1.25x1.0).
In addition, in the ratio calculated, i.e., the ratio of first position 321A height and the 3rd position 322A height with
The difference of average ratio be critical difference more than in the case of, the first control unit 110, which can generate, replaces with the height of first position
Second correction rule of the calibrated altitude calculated.That is, for Fig. 6 situation, the first control unit 110 can generate by
First position 321A height 3.0 is replaced by the second correction rule of calibrated altitude 1.25.
Finally, the first control unit 110 can generate the comprising the second correction rule respective to more than one position
Three masks 410.In other words, the first control unit 110 generation is directed to the second correction rule of each position, and can generate and include
3rd mask 410 of the second correction rule generated for each position.
And then first control unit 110 can by the 3rd data 320A using the 3rd generated mask 410 and obtain
Include the 4th data 420 of more accurate height.For example, the height of the first position 321A included in the 3rd data 320A
For 3.0, on the contrary, the height 421 of the first position included in the 4th data 420 is 1.25, it is possible thereby to confirm to be included in the
The height 421 of first position in four data 420 is closer to 1.0 of the altitude datum as sample 40A.
As described above, the present invention can be directed to measurement height perform based on the measurement height and the height of symmetric position it
Between relativeness correction, so as to obtain more accurate height measurement results.
In addition, the purpose of above-mentioned content is to generate correction rule, it is clear that is generating corrective gauge by said process
In the case of then, in addition to sample 40A, it is various that measurement height correction rule generating means 10 can also measure wiring plate etc.
The height of object.
Fig. 7 is for illustrating to measure height correction rule generating method by correction rule generating means 10 and what is performed
Flow chart.Hereinafter, the detailed description being directed to Fig. 1 to content illustrated in fig. 6 contents repeated will be omitted.
First data can be obtained from height measuring device 20 according to first control unit 110 of one embodiment of the invention,
Wherein, first data include height (S710) of the more than one position away from reference plane on sample.
In the present invention, " position " refers to the place of the object of height measurement as height measuring device 20, can represent three-dimensional
Any one place spatially.For example, in the case where sample 40A is positioned on X-Y plane, a certain position can be can
Any one point being expressed as on the three dimensions of (X, Y, Z).Now, the height of the position can be Z.
The ratio for including the height for first position can be generated according to first control unit 110 of one embodiment of the invention
First mask of the example factor (scale factor), wherein, for the scale factor (scale of the height of first position
Factor) relativeness between the height based on first position and altitude datum determines (S720).Now, first position can
To be any one position in the more than one position on sample 40A.In addition, " altitude datum " in the present invention can be with table
Show the height of the reference plane 50 away from sample 40A.As described above, sample 40A can represent the known height on the basis of reference plane 50
The judgement object object of degree, therefore can be by the way that sample 40A altitude datum and the height measured are compared to judge to measure
The height gone out includes the error of which kind of degree.
First control unit 110 can be in a manner of so that the height of first position corresponds to altitude datum with the product of scale factor
Determine the scale factor of first position.For example, be 1 in altitude datum, in the case that the height of first position is 1.5, the first control
Scale factor can be defined as 0.6 by portion 110 processed, so that the height 1.5 of first position and the product of scale factor are 1, i.e. benchmark
Highly.In addition, the first control unit 110 can generate the first mask for including the respective scale factor in more than one position.
In addition, the first control unit 110 can use the first generated mask to the first data, and obtain to include and be more defined
Second data of true height.As described above, the present invention can be obtained more by performing for measuring the ratio correction of height
For accurate height measurement results.Generally, height measuring device 20 has for identical position and shows identical error
Tendency.Therefore, generation reflects the first mask of this error tendency, and is used measurement data, so as to perform
More accurate elevation carrection.
It can be generated according to first control unit 110 of one embodiment of the invention and include the of the height for first position
Second mask of one correction rule, height based on first position of the first correction rule of the height for first position and
Relativeness between the height of the more than one second place adjacent with first position determines (S730).Specifically,
First control unit 110 can calculate the average value of the height of the more than one second place, i.e. average height.For example, as above
Described, the second place can be represented with " ten " font state four positions adjacent with first position, in the case, the first control
The mean value calculation of the height of four positions can be average height by portion 110.
Afterwards, in the case where the height of first position and the difference of average height are more than critical difference, the first control unit 110
The first correction rule that the height of first position is replaced with to average height can be generated.In addition, the first control unit 110 can give birth to
Into including the first mask to respective first correction rule in more than one position.In other words, the first control unit 110 can give birth to
Into the first correction rule for each position, and generate and include the second of the first correction rule generated for each position
Mask 310.
In addition, the first control unit 110 can be by being included more to the second data using the second generated mask to obtain
For the 3rd data of accurate height.As described above, the present invention can be directed to measurement height perform based on it is described measurement height with
The correction of relativeness between the height of adjacent position, so as to obtain more accurate height measurement results.
According to first control unit 110 of one embodiment of the invention calculate first position height and with first position
In the ratio between height of the 3rd position of preset relation, and generate the second correction rule for including the height for the first position
The 3rd mask, wherein, for the first position height the second correction rule based on the ratio and average specific calculated
Relativeness between rate and determine (S740).
First, the first control unit 110 can calculate the ratio of the height of first position and the height of the 3rd position.This
When, the 3rd position can be on the basis of first direction or the datum line of second direction on sample 40A and and first position
The symmetrical position of line.
Afterwards, in the case where the ratio and the difference of average ratio calculated is more than critical difference, the first control unit 110 can
To calculate calibrated altitude based on the height of average ratio and the 3rd position.Now, average ratio can be with sample 40A
First direction or second direction datum line on the basis of and it is symmetrical it is multiple symmetrically to height ratio average value.
And then in the case where the ratio and the difference of average ratio calculated is more than critical difference, the first control unit 110 can
To generate second correction rule that the height of first position is replaced with to the calibrated altitude calculated.
Finally, the first control unit 110, which can generate, includes the 3rd of respective second correction rule in more than one position
Mask 310.In other words, the first control unit 110 can generate the second correction rule for each position, and generate to include and be directed to
Each position and the 3rd mask 310 of the second correction rule generated.
In addition, the first control unit 110 can be by being included more to the 3rd data using the 3rd generated mask to obtain
For the 4th data of accurate height.As described above, the present invention can be directed to measurement height perform based on it is described measurement height with
The correction of relativeness between the height of symmetric position, so as to obtain more accurate height measurement results.
<Second embodiment>：Height measuring device and method
Above-mentioned first embodiment measures measurement height correction rule generating means 10 height of the sample of known altitude
And the method for generating correction rule is illustrated.
In the present embodiment, correction rule next life for being generated to height measuring device 20 based on correction rule generating means 10
Method into the elevation information after correction illustrates.
Fig. 8 is for illustrating that measuring device 20 according to the height side of one embodiment of the invention measures printed circuit board
The figure of the process of 40B height.
It can be included according to the height measuring device 20 of one embodiment of the invention and be used to generate printed circuit board 40B
Elevation information and printed circuit board 40B correction after elevation information the second control unit 250 and second memory
260。
Processor (processor) etc. can be included according to the second control unit 250 of an embodiment and be capable of processing data
The device of all kinds.Show as being included in program here, " processor (processor) " can for example represent execution
Code or order function and be equipped with data processing equipment circuit, being built in hardware with physical arrangement.As above institute
State, as one of the data processing equipment for being built in hardware, can include：Microprocessor (microprocessor), center
Processing unit (central processing unit：CPU), processor core (processor core), multiprocessor
(multiprocessor), application specific integrated circuit (application-specific integrated circuit：ASIC)、
Field programmable gate array (field programmable gate array：The processing unit such as FPGA), but the model of the present invention
Enclose and be not limited thereto.
Performed according to the second memory 260 of an embodiment handled by temporarily or permanently storing the second control unit 250
The function of data, order (instruction), program, program code or these combining form etc..In addition, the second storage
Device 260 can temporarily and/or for good and all memory print circuit layout card 40B elevation information.In addition, second memory 260 can
First generated with storing correction rule generating means 10 temporarily and/or for good and all is masked to the 3rd mask.Second memory
260 can include magnetic storage medium (magnetic storage media) or flash media (flash storage
Media), but the scope of the present invention is not limited thereto.
4th data can be obtained according to second control unit 250 of one embodiment of the invention, the 4th packet contains
Height h2 of the more than one part 42 away from reference plane 50 on printed circuit board 40B.
In addition, the 5th data, the 5th data can be generated according to second control unit 250 of one embodiment of the invention
4th data are employed in the first mask, the second mask and the 3rd mask that correction rule generating means 10 are generated at least
One mask.For example, the second control unit 250 can use the first mask, the second mask and the 3rd mask successively to the 4th data
And generate the 5th data.
Second control unit 250 can be determined based on the 5th data generated more than one part 42 away from reference plane
50 height h2.
According to prior art, picking machine system is only equipped with height measuring device 20, even if therefore there is elevation carrection dress
There is error in the height for putting the part 42 measured by 20, the problem of can not being also corrected.Therefore, picking machine system can not be abundant
Reaches the purpose of whether judgement part is mounted exactly.
The present invention can be to the height measurements for sample (Fig. 2 40A) using measurement height correction rule generation dress
10 the first to the 3rd masks generated, and the height value measured by calibrated altitude measurement apparatus 20 are put, is more defined so as to obtain
True height measurement results.
Fig. 9 is for illustrating using the first to the 3rd mask that correction rule generating means 10 are generated and to elevation carrection
The figure for the process that height value measured by device 20 is corrected.
Reference picture 9, it is assumed that be pasted with 16 parts 43 on printed circuit board 40B altogether, and elevation carrection fills
Put 20 and measure 16 height of the part 43 away from reference plane 50.Moreover, it is assumed that measurement height correction rule generating means 10
The first mask 210, the second mask 310 and the 3rd mask 410 are generated according to the method illustrated in the first embodiment.
Under these assumptions, height measuring device 20 can use the first mask 210, second successively to measurement data 500
The mask 410 of mask 310 and the 3rd and generate final data 600.The final data 600 generated is reflected for chip mounter system
The data of the compensation deals of error caused by the characteristic of system, therefore can have the degree of accuracy higher than measurement data 500.
Figure 10 is for illustrating by height measuring device 20 and the flow chart of the height measurement method of execution.Hereinafter, will
Omit the detailed description of the content with being repeated in Fig. 8 to content illustrated in fig. 9.
4th data can be obtained according to the height measuring device 20 of one embodiment of the invention, the 4th data include
Judge the height (S910) away from reference plane of the more than one position on object object.
In addition, the 5th data, the 5th number can be generated according to the height measuring device 20 of one embodiment of the invention
The first mask, the second mask and the 3rd mask that correction rule generating means 10 are generated are employed according to the 4th data to acquisition
In at least one mask (S920).For example, as illustrated, height measuring device 20 can use first successively to the 4th data
Mask, the second mask and the 3rd mask and generate the 5th data.
Height measuring device 20 can determine more than one position away from reference plane based on the 5th data generated
Highly (S930).
According to prior art, picking machine system is only equipped with height measuring device 20, even if therefore there is elevation carrection dress
There is error in the height for putting the part measured by 20, the problem of can not being also corrected.Accordingly, picking machine system can not fully reach
The purpose of whether being mounted exactly to judgement part.
The present invention can be to the height measurements for sample (Fig. 2 40A) using measurement height correction rule generation dress
10 the first to the 3rd masks generated, and the height value measured by calibrated altitude measurement apparatus 20 are put, so as to obtain more
For accurate height measurement results.
It is described above to can be implemented as to count by various inscape according to an embodiment of the invention
The form of the computer program performed on calculation machine, and this computer program can be recorded in computer-readable medium.
This, medium can include：The magnetizing mediums of hard disk, floppy disk and tape etc；CD-ROM, DVD etc optical recording media；It is optomagnetic
Floppy disk (floptical disk) equimagnetic-optical medium (magneto-optical medium)；And ROM, RAM, flash memory etc. are
Storage and configuration processor order and the hardware unit being specially constructed.And then medium can include that be presented as can be on network
The intangible medium of the form of transmission, for example, it may be the medium of following form：The form of software or application program is presented as, from
And it can transmit and circulate by network.
In addition, the computer program can be the program that especially designs and form for the present invention, or can be with
It is the program that known in the technical staff of computer software fields and can be used.As the example of computer program, not only wrap
The machine language code (machine language code) using compiler generation is included, can also include using and explain
Device etc. and the higher-level language code being computer-executed.
The specific execution illustrated in the present invention is only an embodiment, and does not limit the model of the present invention in any way
Enclose.In order that specification is succinct, may omit for existing electronics inscape, control system, software, the system its
The record of his functional side.In addition, connection or the connection member example of the line being illustrated between the inscape in accompanying drawing
Property show it is functional connection and/or it is physical connection or circuit connection, and reality device in can be expressed as
Replaceable either addible various feature connection, physical connection or circuit connection.If in addition, without specific
" necessary ", " important " etc. are mentioned in ground, then may not be inscape necessary to the application of the present invention.
Therefore, thought of the invention should not be limited to embodiment described above and be determined, claims and
All scopes such as the scope being equal with claims or the change of equal value of claims can be considered to belong to the present invention
Thought range in.
Claims (20)
1. one kind measurement height correction rule generating method, comprises the following steps：
Obtain the first data of the height away from reference plane comprising the more than one position on sample；
Generation bag
First mask of the scale factor containing the height for the first position, wherein, for the height of the first position
Scale factor based on the height as the first position of any one in the position more than one and altitude datum it
Between relativeness determine；
Second mask of first correction rule of the generation comprising the height for the first position, wherein, for described first
Height and with the first position adjacent more than one of first correction rule of the height of position based on the first position
The second place height between relativeness determine；
Calculate the height of the first position and the ratio between height of the 3rd position of preset relation be in the first position,
And the 3rd mask of the second correction rule comprising the height for the first position is generated, wherein, for described first
Second correction rule of the height put is determined based on the relativeness between the ratio calculated and average ratio.
2. measurement height correction rule generating method as claimed in claim 1, wherein,
In the step of generating second mask, for the second mask of the second data, second data are to institute for generation
State the data that the first data are applicable first mask.
3. measurement height correction rule generating method as claimed in claim 2, wherein,
In the step of generating three mask, for the 3rd mask of the 3rd data, the 3rd data are to institute for generation
State the data that the second data are applicable second mask.
4. measurement height correction rule generating method as claimed in claim 1, wherein,
The altitude datum is the height of the reference plane based on the sample,
The step of generating first mask comprises the following steps：
Described the is determined in a manner of the product of the height of the first position and the scale factor corresponds to the altitude datum
The scale factor of one position；And
First mask of the generation comprising one respective scale factor in position above.
5. measurement height correction rule generating method as claimed in claim 1, wherein,
The step of generating second mask includes the steps：
Calculate the average height of the average value of the height as one second place above；
In the case where the height of the first position and the difference of the average height are more than critical difference, generate described first
The height of position replaces with the first correction rule of the average height；And
Second mask of the generation comprising one respective first correction rule in position above.
6. measurement height correction rule generating method as claimed in claim 5, wherein,
The second place includes：Along a first direction and the opposite direction of first direction and two adjacent with the first position
Position；And
Along the opposite direction of second direction and second direction and two positions adjacent with the first position,
In the step of calculating the average height,
The mean value calculation that will be contained in the height of four positions of the second place is the average height,
The first direction and the second direction are orthogonal.
7. measurement height correction rule generating method as claimed in claim 1, wherein,
The step of generating three mask includes the steps：
The height of the first position is calculated on the basis of first direction or the datum line of second direction on the sample
With the ratio of the height positioned at the 3rd position with the symmetrical position of first position line；
In the case where the ratio and the difference of the average ratio calculated is more than critical difference, based on the average ratio
And the height of the 3rd position calculates calibrated altitude；
In the case where the ratio and the difference of the average ratio calculated is more than critical difference, generate described first
The height put replaces with second correction rule of the calibrated altitude；
Threeth mask of the generation comprising one respective second correction rule in position above.
8. measurement height correction rule generating method as claimed in claim 7, wherein,
The average ratio is on the basis of first direction or the datum line of second direction on the sample and symmetrical multiple
Symmetrically to height ratio average value.
9. a kind of height measurement method, including the steps：
Obtain the 4th data of the height away from reference plane comprising the more than one position judged on object object；
Generation is applicable the 4th data the 5th number of at least one mask in the first mask, the second mask and the 3rd mask
According to；And
The height away from the reference plane of the position more than one is determined based on the 5th data,
First mask includes the scale factor of the height for the first position, wherein, for the first position
Height and base of the scale factor of height based on the first position as any one position in one position above
Relativeness between quasi- height determines；
Second mask includes the first correction rule of the height for the first position, wherein, for described first
Height of first correction rule of the height put based on the first position and adjacent with the first position more than one
Relativeness between the height of the second place determines；
3rd mask includes the second correction rule of the height for the first position, wherein, for described first
Second correction rule of the height put is calculating the height of the first position and is being in preset relation with the first position
The ratio between the height of the 3rd position after, determined based on the relativeness between the ratio calculated and average ratio.
10. height measurement method as claimed in claim 9, wherein,
In the step of generating five data, the 4th data are applicable with first mask successively, described second is covered
Code and the 3rd mask and generate the 5th data.
11. height measurement method as claimed in claim 9, wherein,
The judgement object object is the printed circuit board for being provided with more than one part,
Position more than one is the position for mounting the part more than one.
12. one kind measurement height correction rule generating means, including：
Control unit, at least one mask is generated based on the first data and altitude datum, wherein, the first packet is containing on sample
The height away from reference plane of more than one position,
The control unit obtains first data, and generates the of the scale factor for including the height for the first position
One mask, wherein, for the first position height scale factor based on as appointing in the position more than one
Anticipate a position first position height and the altitude datum between relativeness determine,
Generation includes the second mask of the first correction rule of the height for the first position, wherein, for described first
Height and with the first position adjacent more than one of first correction rule of the height of position based on the first position
The second place height between relativeness determine；
Generation includes the 3rd mask of the second correction rule of the height for the first position, wherein, for described first
Second correction rule of the height of position is calculating the height of the first position and is being in default pass with the first position
After the ratio between height of the 3rd position of system, based on the relativeness between the ratio calculated and average ratio come really
It is fixed.
13. measurement height correction rule generating means as claimed in claim 12, wherein,
Control unit generation for the second data the second mask and generation for the 3rd data the 3rd mask, described the
Two data are that first data are applicable with the data of first mask；3rd data are that second data are applicable
The data of second mask.
14. measurement height correction rule generating means as claimed in claim 12, wherein,
The altitude datum is the height of the reference plane based on the sample,
The control unit is in a manner of the height of the first position and the product of the scale factor correspond to the altitude datum
The scale factor of the first position is determined,
And generate first mask comprising one respective scale factor in position above.
15. measurement height correction rule generating means as claimed in claim 12, wherein,
The control unit calculates the average height of the average value of the height as one second place above；
In the case where the height of the first position and the difference of the average height are more than critical difference, generate described first
The height of position replaces with the first correction rule of the average height；
Second mask of the generation comprising one respective first correction rule in position above.
16. measurement height correction rule generating means as claimed in claim 15, wherein,
The second place includes：Along a first direction and the opposite direction of first direction and two adjacent with the first position
Position；And
Along the opposite direction of second direction and second direction and two positions adjacent with the first position,
The mean value calculation that the control unit will be contained in the height of four positions of the second place is the average height,
The first direction and the second direction are orthogonal.
17. measurement height correction rule generating means as claimed in claim 12, wherein,
The control unit calculates described first on the basis of first direction or the datum line of second direction on the sample
The ratio of the height of position and height positioned at the 3rd position with the symmetrical position of first position line；
In the case where the ratio and the difference of the average ratio calculated is more than critical difference, based on the average ratio
And the height of the 3rd position calculates calibrated altitude；
In the case where the ratio and the difference of the average ratio calculated is more than critical difference, generate described first
The height put replaces with second correction rule of the calibrated altitude；
Threeth mask of the generation comprising one respective second correction rule in position above.
18. measurement height correction rule generating means as claimed in claim 17, wherein,
The average ratio is on the basis of first direction or the datum line of second direction on the sample and symmetrical multiple
Symmetrically to height ratio average value.
19. a kind of height measuring device, including：
Control unit, for obtaining the 4th number of the height away from reference plane comprising the more than one position judged on object object
According to, and generate and the 5th of at least one mask in the first mask, the second mask and the 3rd mask is applicable to the 4th data
Data, and based on the 5th data come determine it is one more than position the height away from the reference plane,
First mask includes the scale factor of the height for the first position, wherein, for the first position
Height and base of the scale factor of height based on the first position as any one position in one position above
Relativeness between quasi- height determines；
Second mask includes the first correction rule of the height for the first position, wherein, for described first
Height of first correction rule of the height put based on the first position and adjacent with the first position more than one
Relativeness between the height of the second place determines；
3rd mask includes the second correction rule of the height for the first position, wherein, for described first
Second correction rule of the height put is calculating the height of the first position and is being in preset relation with the first position
The ratio between the height of the 3rd position after, determined based on the relativeness between the ratio calculated and average ratio.
20. height measuring device as claimed in claim 19, wherein,
The control unit the 4th data are applicable with first mask, second mask and the 3rd mask successively and
Generate the 5th data.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020160086263A KR102477658B1 (en) | 2016-07-07 | 2016-07-07 | Method for generating conpensation rule |
| KR10-2016-0086263 | 2016-07-07 |
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| CN201710075742.4A Active CN107588747B (en) | 2016-07-07 | 2017-02-13 | Measurement height correction rule generation device and method, height measurement device and method |
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| Country | Link |
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| JP (1) | JP6768533B2 (en) |
| KR (1) | KR102477658B1 (en) |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108844469A (en) * | 2018-06-14 | 2018-11-20 | 电子科技大学 | A kind of method and system based on laser testing workpiece step height |
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| CN107588747B (en) | 2020-10-16 |
| JP6768533B2 (en) | 2020-10-14 |
| KR102477658B1 (en) | 2022-12-14 |
| KR20180005931A (en) | 2018-01-17 |
| JP2018004620A (en) | 2018-01-11 |
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