CN107577002A - A kind of device for making large area multiple-beam interference - Google Patents
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Abstract
Description
技术领域technical field
本发明属于光子晶体结构领域，具体涉及一种制作大面积多光束干涉的装置。The invention belongs to the field of photonic crystal structures, and in particular relates to a device for producing large-area multi-beam interference.
背景技术Background technique
光子微结构是一类性能优异的人工微结构材料，在实现人为控制和操纵光的传播方面具有良好的应用前景。光波在光子微结构中传播时，光波的传输行为会受到微结构的调制作用影响，这为控制光波的传输行为提供了新的思路。准晶是一种具有长程有序性和特定的衍射图案，但不具备平移对称性的固体结构。准晶具有高度的旋转对称性，具有一些在周期性晶体中不存在的独特性质。把准晶结构的特点和光子微结构结合起来，形成一种新的材料结构，叫做光子准晶。相比于周期性光子微结构，光子准晶在较低的折射率对比度下就能产生更加均匀和各项同性的光子带隙，更容易实现完备的光子禁带。因此，光子准晶是一种更具应用前景的光子微结构。Photonic microstructures are a class of artificial microstructure materials with excellent properties, which have good application prospects in realizing artificial control and manipulation of light propagation. When the light wave propagates in the photonic microstructure, the transmission behavior of the light wave will be affected by the modulation of the microstructure, which provides a new idea for controlling the transmission behavior of the light wave. A quasicrystal is a solid structure with long-range order and specific diffraction patterns, but no translational symmetry. Quasicrystals have a high degree of rotational symmetry and have some unique properties not found in periodic crystals. Combining the characteristics of the quasicrystal structure with the photonic microstructure, a new material structure is formed, called the photonic quasicrystal. Compared with periodic photonic microstructures, photonic quasicrystals can produce more uniform and isotropic photonic bandgap at lower refractive index contrast, and it is easier to achieve a complete photonic bandgap. Therefore, photonic quasicrystals are a more promising photonic microstructure.
目前典型的光子微结构制备技术主要有半导体精密加工、电子束光刻、激光直写技术、以及反蛋白石法等。这些制备方法虽然在不同程度上实现了光子微结构的制作，但是大部分都存在设备复杂，工艺繁琐、成本昂贵，生产效率较低，制备面积小的缺点，这限制了光子微结构实用化的进一步发展。光感应法是一种结合了多束相干光的干涉特性和光折变材料的激光敏感特性的方法，常用来制作光折变光子微结构，也叫做光子晶格。光感应法具有灵活性强、工艺简单、成本低廉的特点。光折变材料中制作的光子微结构面积取决于光折变材料被光波辐照的面积。当辐照光的辐照面积较大时，制作的光折变光子微结构也会具有比较大的面积，从而提高了制备效率。然而用传统的干涉方法产生大面积的多光束干涉比较困难，所需的光路复杂程度高，难以调节。尤其是在制作光子准晶微结构时，随着结构对称性的增加，需要更多的光束参与干涉，用传统干涉方法是难以实现的。At present, typical photonic microstructure preparation technologies mainly include semiconductor precision machining, electron beam lithography, laser direct writing technology, and inverse opal method, etc. Although these preparation methods have achieved the production of photonic microstructures to varying degrees, most of them have the disadvantages of complex equipment, cumbersome process, high cost, low production efficiency, and small preparation area, which limits the practical application of photonic microstructures. Further development. The photoinduction method is a method that combines the interference characteristics of multiple beams of coherent light and the laser sensitivity characteristics of photorefractive materials. It is often used to make photorefractive photonic microstructures, also known as photonic lattices. The light induction method has the characteristics of strong flexibility, simple process and low cost. The area of the photonic microstructure fabricated in the photorefractive material depends on the area of the photorefractive material irradiated by light waves. When the irradiated area of the irradiated light is large, the fabricated photorefractive photon microstructure will also have a relatively large area, thereby improving the preparation efficiency. However, it is difficult to produce large-area multi-beam interference with traditional interference methods, and the required optical path is highly complex and difficult to adjust. Especially in the fabrication of photonic quasicrystal microstructures, as the structure symmetry increases, more light beams are required to participate in the interference, which is difficult to achieve with traditional interference methods.
因此，如何提供一种能简便实现大面积多光束干涉的方法和装置是本领域技术人员一个亟待解决的技术问题。Therefore, how to provide a method and device that can easily realize large-area multi-beam interference is a technical problem to be solved urgently by those skilled in the art.
发明内容Contents of the invention
本发明提供了一种大面积多光束干涉产生方法及装置，本发明通过单个拼接透镜元件完成了光束的分解与叠加干涉，可产生多种光强分布图案呈周期性、准周期性分布的大面积干涉光场，具有良好的明暗对比度，可用于制作高质量的周期型、准晶型大面积光子微结构。The invention provides a method and device for generating large-area multi-beam interference. The invention completes the decomposition and superposition interference of beams through a single spliced lens element, and can produce a variety of light intensity distribution patterns that are periodically and quasi-periodically distributed. The area interference light field has good light and dark contrast, and can be used to make high-quality periodic and quasi-crystalline large-area photonic microstructures.
实现本发明的技术方案是：一种制作大面积多光束干涉的装置，包括点光源和拼接透镜。The technical solution for realizing the present invention is: a device for producing large-area multi-beam interference, including a point light source and a splicing lens.
所述拼接透镜为将一个凸透镜均匀分割为3-6部分，将每部分经过磨边处理，之后将每部分进行拼接制成拼接透镜。The spliced lens is to divide a convex lens evenly into 3-6 parts, each part is subjected to edge grinding, and then each part is spliced to form a spliced lens.
所述磨边处理为将每部分沿着切割面磨去0.1-3mm。The edge grinding treatment is to grind each part along the cutting surface by 0.1-3mm.
所述点光源发出单色球面波，单色球面波照射到拼接透镜上，形成大面积多光束干涉。The point light source emits monochromatic spherical waves, and the monochromatic spherical waves irradiate onto the spliced lens to form large-area multi-beam interference.
所述点光源与拼接透镜之间的距离等于凸透镜的焦距。The distance between the point light source and the spliced lens is equal to the focal length of the convex lens.
本发明的有益效果是：本发明的方法简便易行，装置结构简单、易于实现、成本低廉，只需一个拼接透镜就能产生多种大面积的多光束干涉。例如：利用等分切割成三部分的拼接透镜可以产生大面积三角晶格型干涉光场，等分切割成四部分的拼接透镜可以产生大面积四方晶格型干涉光场，等分切割成五部分的拼接透镜可以产生大面积的十倍对称准晶型干涉光场，等分切割成六部分的拼接透镜可以产生大面积六角晶格型干涉光场。所述方法产生的大面积多光束干涉可用于大面积周期型、准晶型光子微结构的制作。所述方法有助于简化光子微结构的制作过程，降低光子微结构的制作成本，提高制备效率。The beneficial effects of the present invention are: the method of the present invention is simple and easy to implement, the device has a simple structure, is easy to implement, and has low cost, and only one splicing lens can produce multiple large-area multi-beam interferences. For example: a spliced lens cut into three parts can produce a large-area triangular lattice type interference light field, a spliced lens cut into four parts can produce a large area of square lattice type interference light field, and a spliced lens cut into five parts Part of the spliced lens can produce a large-area decasymmetric quasi-crystal interference light field, and a spliced lens that is equally cut into six parts can produce a large-area hexagonal lattice type interference light field. The large-area multi-beam interference generated by the method can be used in the manufacture of large-area periodic and quasi-crystal photonic microstructures. The method is helpful to simplify the manufacturing process of the photonic microstructure, reduce the manufacturing cost of the photonic microstructure and improve the preparation efficiency.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present invention. Those skilled in the art can also obtain other drawings based on these drawings without creative work.
图1是位于凸透镜前焦平面上的点光源发出光束经过凸透镜转变成平行光束的示意图。Fig. 1 is a schematic diagram of a light beam emitted by a point light source located on the front focal plane of a convex lens and transformed into a parallel light beam through a convex lens.
图2是本发明拼接透镜产生大面积干涉光场的原理图。Fig. 2 is a principle diagram of the large-area interference light field generated by the spliced lens of the present invention.
图3是本发明大面积多光束干涉产生方法的装置示意图。Fig. 3 is a schematic diagram of the apparatus of the large-area multi-beam interference generation method of the present invention.
图4是本发明实施例1中四部分拼接透镜的切割、磨边、拼接方法。Fig. 4 shows the cutting, edging and splicing methods of the four-part spliced lens in Embodiment 1 of the present invention.
图5是本发明实施例2中五部分拼接透镜的切割、磨边、拼接方法。Fig. 5 shows the cutting, edging and splicing methods of the five-part spliced lens in Embodiment 2 of the present invention.
图6是实施例1产生的大面积四方晶格型干涉光场的光强分布图案。FIG. 6 is the light intensity distribution pattern of the large-area tetragonal lattice type interference light field generated in Example 1. FIG.
图7是实施例2产生的大面积十倍对称准晶型干涉光场的光强分布图案。Fig. 7 is the light intensity distribution pattern of the large-area decasymmetric quasicrystal interference light field generated in Example 2.
具体实施方式detailed description
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有付出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
一种大面积多光束干涉的产生方法及装置，将相干点光源1发出的单色球面波照射到一个拼接透镜2上，在拼接透镜的出射端会产生多光束干涉光场。该干涉光场具有较大的面积，可用于制作大面积的周期型、准晶型光子微结构。A method and device for generating large-area multi-beam interference. The monochromatic spherical wave emitted by a coherent point light source 1 is irradiated onto a spliced lens 2, and a multi-beam interference light field is generated at the output end of the spliced lens. The interference light field has a relatively large area and can be used to manufacture large-area periodic and quasi-crystal photonic microstructures.
本发明所述拼接透镜其产生大面积多光束干涉的原理如附图1和附图2所示。在图1中，有一个焦距为f，直径为D的凸透镜。设一个点光源S位于该凸透镜的前焦平面上，并且点光源S到透镜光轴的垂直距离为a，此时点光源发出的一束球面波经过透镜的折射作用后，变为向光轴方向偏转的一束平面波。该平面波与光轴的夹角A满足关系式tanA= a/f。如图2所示，如果将该凸透镜从中间切开，并且将切口的剖面部分磨去厚度为a的一小段，然后再把两部分拼接粘合起来，组成一个新的拼接透镜。由于拼接的两部分具有相同的参数（焦距相同，磨去的部分宽度相同，尺寸相等），所以当拼接透镜的的光轴上距离为f处放置一点光源时，拼接透镜的每一部分都会发出一束向光轴方向偏转的平行光，每个平行光与光轴的夹角大小均满足关系式tanA= a/f。在拼接透镜的输出端这些平行光束必然会发生叠加干涉，改变a和f的比值即可改变光束之间的夹角。由于透镜具有较大的通光孔径，因此产生的干涉区域就具有较大的面积，这样一块拼接透镜就能实现多个宽平行光束的干涉，产生大面积的干涉光场。如果将凸透镜均匀切割成三、四、五、六部分，可分别实现三、四、五、六束宽平行光干涉。产生的大面积干涉光强图案可用于制作大面积周期型、准晶型光子微结构。The principle of large-area multi-beam interference generated by the spliced lens of the present invention is shown in Figure 1 and Figure 2 . In Figure 1, there is a convex lens with focal length f and diameter D. Suppose a point light source S is located on the front focal plane of the convex lens, and the vertical distance from the point light source S to the optical axis of the lens is a. At this time, a beam of spherical waves emitted by the point light source is refracted by the lens and becomes toward the optical axis A beam of plane waves deflected in direction. The angle A between the plane wave and the optical axis satisfies the relational expression tan A = a/f. As shown in Figure 2, if the convex lens is cut from the middle, and a small section of thickness a is ground off the section of the cut, then the two parts are spliced together to form a new spliced lens. Since the two parts of the splicing have the same parameters (the same focal length, the same width and the same size of the worn part), when a light source is placed at a distance f on the optical axis of the splicing lens, each part of the splicing lens will emit a light The parallel light whose beam is deflected toward the optical axis, the angle between each parallel light and the optical axis satisfies the relational expression tan A = a/f. At the output end of the splicing lens, these parallel beams will inevitably overlap and interfere, and changing the ratio of a to f can change the angle between the beams. Since the lens has a larger clear aperture, the generated interference area has a larger area, so that a spliced lens can realize the interference of multiple wide parallel light beams and generate a large-area interference light field. If the convex lens is evenly cut into three, four, five, and six parts, three, four, five, and six beams of wide parallel light interference can be realized respectively. The generated large-area interference light intensity pattern can be used to fabricate large-area periodic and quasi-crystalline photonic microstructures.
本发明的装置示意图如图3所示，其中相干点光源的产生是采用氦氖激光管配合短焦距透镜来实现的。使用的氦氖激光管波长为632.8nm，输出功率10mW，短焦距透镜的焦距为4.5mm。The schematic diagram of the device of the present invention is shown in Figure 3, wherein the coherent point light source is realized by using a He-Ne laser tube with a short focal length lens. The wavelength of the He-Ne laser tube used is 632.8nm, the output power is 10mW, and the focal length of the short focal length lens is 4.5mm.
实施例1Example 1
本实施例以切割为四部分的拼接透镜为例，产生大面积四方晶格型干涉光场。具体方法如下：In this embodiment, a spliced lens cut into four parts is taken as an example to generate a large-area tetragonal lattice interference light field. The specific method is as follows:
如图4所示，将一个直径为50mm的凸透镜均匀切割成相等的四部分，把每部分沿着切边磨去2mm，然后再粘合拼接起来，组成一个四拼接透镜。将四拼接透镜应用于附图2的装置中，可产生大面积的四方晶格型干涉光场，如图6所示。干涉光场的面积约为285mm2。该大面积干涉光场可用于制作周期型光子微结构。As shown in Figure 4, a convex lens with a diameter of 50 mm is evenly cut into four equal parts, and each part is ground off 2 mm along the cutting edge, and then glued and spliced together to form a four-spliced lens. Applying the four-split lens to the device in Fig. 2 can generate a large-area tetragonal lattice-type interference light field, as shown in Fig. 6 . The area of the interference light field is about 285mm 2 . The large-area interference light field can be used to make periodic photonic microstructures.
实施例2Example 2
本实施例以切割为五部分的拼接透镜为例，产生大面积十倍对称准晶型干涉光场。具体方法如下：In this embodiment, a spliced lens cut into five parts is taken as an example to generate a large-area decasymmetric quasi-crystal interference light field. The specific method is as follows:
如图5所示，将一个直径为50mm的凸透镜均匀切割成相等的五部分，把每部分沿着切边磨去2mm，然后再粘合拼接起来，组成一个五拼接透镜。将五拼接透镜应用于附图3的装置中，可产生大面积的十倍对称准晶型干涉光场，如图7所示。干涉光场的面积约为227mm2。该大面积干涉光场可用于制作十倍对称的准晶型光子微结构。As shown in Figure 5, a convex lens with a diameter of 50 mm is evenly cut into five equal parts, and each part is ground off 2 mm along the cutting edge, and then glued and spliced together to form a five-spliced lens. Applying the five-split lens to the device in Fig. 3 can generate a large-area decasymmetric quasicrystal interference light field, as shown in Fig. 7 . The area of the interference light field is about 227mm 2 . The large-area interference light field can be used to fabricate ten-fold symmetric quasi-crystal photonic microstructures.
以上所述仅为本发明的较佳实施例而已，并不用以限制本发明，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included in the scope of the present invention. within the scope of protection.
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| CN110441834A (en) * | 2018-06-07 | 2019-11-12 | 华东师范大学 | The control method and control device of three dimensional photonic crystal lattice period and queueing discipline |
| CN117872514A (en) * | 2024-01-03 | 2024-04-12 | 郑州工程技术学院 | Manufacturing and using method of cutting combined lens |
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| CN117872514A (en) * | 2024-01-03 | 2024-04-12 | 郑州工程技术学院 | Manufacturing and using method of cutting combined lens |
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